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JPS6248903B2 - - Google Patents
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JPS6248903B2 - - Google Patents

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Publication number
JPS6248903B2
JPS6248903B2 JP54124586A JP12458679A JPS6248903B2 JP S6248903 B2 JPS6248903 B2 JP S6248903B2 JP 54124586 A JP54124586 A JP 54124586A JP 12458679 A JP12458679 A JP 12458679A JP S6248903 B2 JPS6248903 B2 JP S6248903B2
Authority
JP
Japan
Prior art keywords
temperature
semiconductor integrated
equation
resistance layer
resistance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54124586A
Other languages
Japanese (ja)
Other versions
JPS5648166A (en
Inventor
Hiroshi Gomi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP12458679A priority Critical patent/JPS5648166A/en
Publication of JPS5648166A publication Critical patent/JPS5648166A/en
Publication of JPS6248903B2 publication Critical patent/JPS6248903B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D84/00Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
    • H10D84/201Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits
    • H10D84/204Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits of combinations of diodes or capacitors or resistors
    • H10D84/209Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of only components covered by H10D1/00 or H10D8/00, e.g. RLC circuits of combinations of diodes or capacitors or resistors of only resistors

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  • Semiconductor Integrated Circuits (AREA)

Description

【発明の詳細な説明】 本発明は半導体集積装置における温度補償回路
装置に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a temperature compensation circuit device in a semiconductor integrated device.

半導体集積装置においては、各回路素子、例え
ばトランジスタに対して動作上必要な所定のバイ
アス電位を与えるべく電圧供給回路や、電流供給
回路が設けられている。かかるバイアス供給回路
によつて各回路素子を安定に動作させるために
は、必要に応じて温度依存性の度合を設定しなけ
ればならない。
2. Description of the Related Art In a semiconductor integrated device, a voltage supply circuit and a current supply circuit are provided to provide each circuit element, for example, a transistor, with a predetermined bias potential necessary for operation. In order to stably operate each circuit element using such a bias supply circuit, the degree of temperature dependence must be set as necessary.

先ず第1図に示す如き定電圧回路について検討
するに、この場合トランジスタQ3のベースバイ
アス回路にベース及びコレクタを直結してなるト
ランジスタQ1及びQ2を接続してダイオードとし
て動作させる。しかるに半導体集積装置の製造
上、トランジスタQ1,Q2及びQ3としてほぼ同一
特性のものを作ることができる。従つてそのベー
ス、エミツタ間の順方向電圧をVFとすれば、ト
ランジスタQ3のエミツタから導出された出力端
子に供給される定電圧出力V0は、 V0=R/R+R(VCC−2VF)+VF ……(1) となる。ただし、トランジスタQ3のベース電流
はベースバイアス抵抗R1,R2に流れる電流と比
較して十分小さく無視できるものとし、VCCは電
源電圧である。
First, consider a constant voltage circuit as shown in FIG. 1. In this case, transistors Q1 and Q2 , whose bases and collectors are directly connected, are connected to the base bias circuit of transistor Q3 to operate as diodes. However, in manufacturing a semiconductor integrated device, transistors Q 1 , Q 2 and Q 3 can be made to have substantially the same characteristics. Therefore, if the forward voltage between the base and emitter is V F , the constant voltage output V 0 supplied to the output terminal derived from the emitter of transistor Q 3 is V 0 = R 2 /R 1 +R 2 (V CC −2V F )+V F ……(1). However, it is assumed that the base current of the transistor Q 3 is sufficiently small compared to the current flowing through the base bias resistors R 1 and R 2 and can be ignored, and V CC is the power supply voltage.

第1図の回路を半導体集積装置上に構成した場
合に、各素子の温度依存性を考えてみると、抵抗
R1,R2の温度変化に対する抵抗値の変化は互い
にほぼ等しいと考えられるので、(1)式において抵
抗値の比で表わされている項は温度依存性がほと
んどないとしても良い。従つて(1)式において定電
圧出力V0の温度依存性は、トランジスタQ1,Q2
及びQ3の順方向電圧VFの温度依存性によつて決
まることになる。
When the circuit shown in Figure 1 is configured on a semiconductor integrated device, considering the temperature dependence of each element, the resistance
Since it is considered that the changes in resistance values of R 1 and R 2 with respect to temperature changes are almost equal to each other, the term expressed by the ratio of resistance values in equation (1) may have almost no temperature dependence. Therefore, in equation (1), the temperature dependence of the constant voltage output V 0 is
and the temperature dependence of the forward voltage V F of Q 3 .

この観点から(1)式を変形して V0=R/R+RCC+(1−2R/R+R
)VF……(2) と表現し、順方向電圧VFの項の係数が零になる
ように抵抗R1,R2をR1=R2に選定し、これによ
り全体として定電圧出力V0の温度依存性をなく
すように従来から工夫がされている。
From this point of view, formula (1) is modified to obtain V 0 =R 2 /R 1 +R 2 V CC +(1-2R 2 /R 1 +R
2 ) V F ...(2) is expressed as, and the resistors R 1 and R 2 are selected so that R 1 = R 2 so that the coefficient of the forward voltage V F term becomes zero, and as a result, the voltage is constant as a whole. Conventionally, efforts have been made to eliminate the temperature dependence of the output V 0 .

しかしこのようにすると、定電圧出力電圧V0
が V0=1/2VCC ……(3) に一律に決つてしまうため、温度係数と出力電圧
とを必要に応じて任意に設定できず、結局この回
路を実際に使用するにつき大きな制限がある。
However, if you do this, the constant voltage output voltage V 0
is uniformly determined to be V 0 = 1/2V CC (3), so the temperature coefficient and output voltage cannot be set arbitrarily as necessary, and in the end there are major limitations in actually using this circuit. be.

また上述の(1)式は、理論上トランジスタQ1
Q2及びQ3の順方向電圧VFが互いにほぼ等しいと
いう条件の下に求めたものであるが、実際には各
トランジスタの順方向電圧VFの温度係数は流れ
る電流の大きさに応じて決まる。しかるにトラン
ジスタQ1〜Q3のうち、トランジスタQ3に流れる
電流は負荷を駆動するための必要から値が大きい
ため、実際上完全な温度補償が実現できない問題
がある。
In addition, the above equation (1) theoretically indicates that the transistor Q 1 ,
This was determined under the condition that the forward voltages V F of Q 2 and Q 3 are almost equal to each other, but in reality, the temperature coefficient of the forward voltage V F of each transistor varies depending on the magnitude of the flowing current. It's decided. However, among the transistors Q1 to Q3 , the current flowing through the transistor Q3 is large because it is necessary to drive the load, so there is a problem that complete temperature compensation cannot be achieved in practice.

第1図について上述したように、出力電圧V0
を導く式の中で順方向電圧VFの係数を零にする
ような手法を用いて温度依存性を改善することが
その他の回路例えば第2図及び第3図においても
広く行われているが、その場合にも第1図につい
て上述したと同様の問題がある。
As discussed above with respect to FIG. 1, the output voltage V 0
It is widely practiced in other circuits, such as Figs. 2 and 3, to improve the temperature dependence by reducing the coefficient of the forward voltage V F to zero in the equation deriving the equation. , in that case as well, there are problems similar to those described above with respect to FIG.

第2図の場合トランジスタQ4のエミツタにお
ける出力電圧V0は、 V0=R/R+R−VF ……(4) となる。この式において順方向電圧VFの項は零
にはできないのに対して、第1項は抵抗比の表現
に変形できることにより温度依存性がほとんどな
くなる。依つて第2図の場合は温度補償ができな
いことになる。
In the case of FIG. 2, the output voltage V 0 at the emitter of the transistor Q 4 is V 0 =R 5 /R 4 +R 5 -V F (4). In this equation, the forward voltage V F term cannot be made zero, whereas the first term can be transformed into an expression of resistance ratio, thereby almost eliminating temperature dependence. Therefore, in the case of FIG. 2, temperature compensation cannot be performed.

第3図の場合トランジスタQ5のコレクタにお
ける出力電圧V0は、 V0=R/RF ……(5) となる。この式において順方向電圧VFの項は零
にできないので、温度補償ができないことにな
る。
In the case of FIG. 3, the output voltage V 0 at the collector of the transistor Q 5 is V 0 =R 8 /R 7 V F (5). In this equation, the forward voltage V F term cannot be made zero, so temperature compensation cannot be performed.

以上の点を考慮して本発明においては、従来の
手法では温度補償ができないと考えられていたも
のであつても、精度良く温度補償ができるように
した温度補償回路装置を提案しようとするもので
ある。
In consideration of the above points, the present invention attempts to propose a temperature compensation circuit device that can perform temperature compensation with high accuracy even if it is thought that temperature compensation cannot be performed using conventional methods. It is.

以下図面について本発明の一例を詳述しよう。 An example of the present invention will be described in detail below with reference to the drawings.

本発明においては、半導体集積装置上に拡散抵
抗層を形成するにつき、抵抗層の抵抗値の温度係
数が抵抗層の幅方向の寸法に応じて、温度係数が
決まることを利用して温度補償を実現しようとす
るものである。
In the present invention, when forming a diffused resistance layer on a semiconductor integrated device, temperature compensation is performed by utilizing the fact that the temperature coefficient of the resistance value of the resistance layer is determined according to the widthwise dimension of the resistance layer. This is what we are trying to achieve.

すなわち、拡散抵抗層1は通常第4図に示す如
く、幅w及び長さlの細長い直線状抵抗層部1
と、この抵抗層部1の両端において中央にコンタ
クト2を有する例えば方形のコンタクト拡散層部
3とで構成され、両端のコンタクト2間の抵抗値
Rは近似的に R=Rsl/w ……(6) となる。
That is, the diffused resistance layer 1 usually has an elongated linear resistance layer portion 1 having a width w and a length l, as shown in FIG.
and, for example, a rectangular contact diffusion layer 3 having a contact 2 at the center at both ends of the resistance layer 1, and the resistance value R between the contacts 2 at both ends is approximately R=Rsl/w...( 6) becomes.

一方この抵抗Rの単位抵抗値当りの温度係数は
第5図に示す如く実験的に、幅wが大きくなるに
従つて低下して行くことが確められた。
On the other hand, as shown in FIG. 5, it has been experimentally confirmed that the temperature coefficient per unit resistance value of this resistance R decreases as the width w increases.

このことを第3図の構成に適用してみるに、抵
抗R7及びR8の拡散抵抗層の幅wを変更した場合
の出力電圧V0の温度係数は前述の(5)式を微分し
て求められる。すなわち、 ただしTは温度である。
Applying this to the configuration shown in Figure 3, the temperature coefficient of the output voltage V 0 when the width w of the diffused resistance layer of the resistors R 7 and R 8 is changed can be calculated by differentiating the above equation (5). is required. That is, However, T is the temperature.

ここで温度係数を零にするには、(7)式の右辺を
零にする条件を求めれば良いから、 となる。この(8)式の関係が成立つように抵抗R7
及びR8の幅を選定すれば、温度補償をすること
ができる。
In order to make the temperature coefficient zero here, we need to find the conditions that make the right side of equation (7) zero, so becomes. The resistance R 7 is set so that the relationship in equation (8) holds true.
Temperature compensation can be performed by selecting the width of R8 and R8 .

(7)式及び(8)式から明らかなように温度係数の異
なる抵抗の比で決まる項の温度係数は一般的にま
とめると次のようになる。
As is clear from equations (7) and (8), the temperature coefficient of the term determined by the ratio of resistances with different temperature coefficients is generally summarized as follows.

ただしRa,Rbは抵抗層の幅が互いに異なる任
意の抵抗の値である。(9)式から分るように抵抗比
/Rの温度係数は抵抗Ra及びRbの温度係数を選
択 することにより、正又は負のいずれにも選定でき
る。
However, R a and R b are arbitrary resistance values in which the widths of the resistance layers are different from each other. As can be seen from equation (9), the temperature coefficient of the resistance ratio R a /R b can be selected to be either positive or negative by selecting the temperature coefficients of the resistors R a and R b .

以上は第3図について考察したものであるが、
同様に第2図について考えてみれば、(4)式から出
力電圧V0の温度係数を求めれば dV/dT=−1/(1+k(dk/dT
)−dV/dT……(10) となる。ただし、k1=R4/R5である。
The above is a consideration of Figure 3, but
Similarly, considering Figure 2, if we calculate the temperature coefficient of the output voltage V 0 from equation (4), we get dV 0 /dT=-1/(1+k 1 ) 2 (dk 1 /dT
)-dV F /dT...(10). However, k 1 =R 4 /R 5 .

ここで、dk1/dTは負の値に設定できるから(10)
式の右辺は零又はほとんど零に補償することがで
きる。
Here, dk 1 /dT can be set to a negative value (10)
The right side of the equation can be compensated to zero or almost zero.

次に第1図の場合について考えてみれば、トラ
ンジスタQ1及びQ2に流れる電流は等しいからベ
ース、エミツタ電圧VF1,VF2も互いに等しい。
そこでトランジスタQ3のベース、エミツタ電圧
をVF3とすると、(1)式に対応する出力電圧V0の式
は V0=R/R+R(VCC−2VF1)+2VF1−VF3
…(11) ここでR1/R2=k2とおいて出力電圧V0の温度係
数を求めれば、 dV/dT=2VF1−VCC/(1+k
dk/dT +2k/1+k・dVF1/dT−dVF3
/dT……(12) しかるにトランジスタQ1〜Q3のベース、エミツ
タの順方向電圧VFは負の温度係数をもつので、
(12)式の第2項は負、第3項は正、第1項は正又は
負いずれにもとれる。従つてk2の温度係数の値
dk2/dTを選定することによつて出力電圧V0の温
度係数を所望の値に決めることができる。
Next, considering the case of FIG. 1, since the currents flowing through transistors Q 1 and Q 2 are equal, the base and emitter voltages V F1 and V F2 are also equal.
Therefore, if the base and emitter voltages of the transistor Q 3 are V F3 , the formula for the output voltage V 0 corresponding to equation (1) is V 0 = R 2 /R 1 +R 2 (V CC −2V F1 )+2V F1 −V F3 ...
...(11) Here, if we calculate the temperature coefficient of the output voltage V 0 by setting R 1 /R 2 =k 2 , then dV 0 /dT=2V F1 -V CC /(1+k 2 ) 2 .
dk 2 /dT +2k 2 /1+k 2・dV F1 /dT-dV F3
/dT……(12) However, since the forward voltage V F at the base and emitter of transistors Q 1 to Q 3 has a negative temperature coefficient,
The second term of equation (12) can be negative, the third term can be positive, and the first term can be positive or negative. Therefore the value of the temperature coefficient of k 2
By selecting dk 2 /dT, the temperature coefficient of the output voltage V 0 can be determined to a desired value.

例えばR1=R2に選定すれば、k2=1であるか
ら(12)式から dV/dT=2VF1−VCC/4・dk/dT
+dVF1/dT−dVF3/dT…… (13) となる。しかるにトランジスタQ1及びQ2に流す
電流はバイアス回路の損失を減少させるために小
さい方が良いのに対して、トランジスタQ3に流
す電流は負荷電流を大きくとるため大きくせざる
を得ない。従つてトランジスタQ1及びQ2の順方
向電圧VF1,VF2の方が、トランジスタQ3の順方
向電圧VF3より大きくなる。今VF1=VF2=0.7
(V),VCC=12(V),dVF1/dT=dVF2/dT=
−2(mV/℃),dVF3/dT=−0.5(mV/℃)
とすると、(13)式の右辺を零にするためには、 −2.65×dk/dT−2×10-3−(−0.5×10-3)=
0…… (14) が成立つことが必要であり、依つて dk/dT=−0.57×10-3(1/℃) ……(15) になるように、抵抗R1及びR2の抵邸層1の幅w
を決めれば良い。すなわち(15)式の結果を(9)式
に代入して そこで抵抗R1の温度係数を抵抗R2の温度係数よ
り小さい値に選定し、例えば抵抗R1の温度係数
を1.43×10-3〔1/℃〕、抵抗R2の温度係数を
2.00×10-3〔1/℃〕となるように抵抗層1の幅
wを設計すれば良い。
For example, if R 1 = R 2 is selected, k 2 = 1, so from equation (12), dV 0 /dT = 2V F1 -V CC /4・dk 2 /dT
+dV F1 /dT - dV F3 /dT... (13) However, the current flowing through the transistors Q 1 and Q 2 is preferably small in order to reduce loss in the bias circuit, whereas the current flowing through the transistor Q 3 must be large because it requires a large load current. Therefore, the forward voltages V F1 and V F2 of the transistors Q 1 and Q 2 are larger than the forward voltage V F3 of the transistor Q 3 . Now V F1 = V F2 = 0.7
(V), V CC =12 (V), dV F1 /dT=dV F2 /dT=
-2 (mV/℃), dV F3 /dT=-0.5 (mV/℃)
Then, in order to make the right side of equation (13) zero, −2.65×dk 2 /dT−2×10 −3 −(−0.5×10 −3 )=
0... (14) It is necessary that dk 2 /dT=-0.57×10 -3 (1/℃) ...( 15 ) Width of mansion layer 1 w
All you have to do is decide. In other words, by substituting the result of equation (15) into equation (9), Therefore, the temperature coefficient of resistor R 1 is selected to be smaller than the temperature coefficient of resistor R 2. For example, the temperature coefficient of resistor R 1 is 1.43 × 10 -3 [1/℃], and the temperature coefficient of resistor R 2 is
The width w of the resistance layer 1 may be designed to be 2.00×10 −3 [1/° C.].

次に第6図について、トランジスタのコレクタ
の動作点の温度安定を考えた温度補償の例を説明
する。第6図において、トランジスタQ7のコレ
クタ電位V0は V0=VCC−{R/R+R10(VCC−VF8) +VF8−VF7}R12/R11……(17) となる。ただし、VF7,VF8はトランジスタQ7
Q8のベース・エミツタ順方向電圧である。ここ
でトランジスタQ7のベース電流を無視すれば、
F7≒VF8とし得るが、トランジスタQ7,Q8
温度係数は流れる電流が相違することにより相違
する。しかるに抵抗R9及びR10の抵抗層1の幅が
互いに等しく、従つて温度係数がほぼ等しいとす
れば、出力電圧V0の温度係数を(17)式から求
めれば、 となる。従つて温度係数dV/dTを0にするには、 が成立するようにすれば良い。
Next, with reference to FIG. 6, an example of temperature compensation that takes into consideration the temperature stability of the operating point of the transistor collector will be explained. In FIG. 6, the collector potential V 0 of the transistor Q 7 is V 0 =V CC −{R 9 /R 9 +R 10 (V CC −V F8 ) +V F8 −V F7 }R 12 /R 11 ……(17 ) becomes. However, V F7 and V F8 are transistors Q 7 ,
This is the base-emitter forward voltage of Q8 . If we ignore the base current of transistor Q7 here, we get
Although V F7 ≈V F8 can be satisfied, the temperature coefficients of transistors Q 7 and Q 8 are different due to different flowing currents. However, if the widths of the resistance layers 1 of the resistors R 9 and R 10 are equal and therefore the temperature coefficients are approximately equal, then the temperature coefficient of the output voltage V 0 can be found from equation (17) as follows: becomes. Therefore, to make the temperature coefficient dV 0 /dT 0, All you have to do is make sure that this holds true.

実例として、R9=2(kΩ),R10=10(k
Ω),R11=1(kΩ),R12=2(kΩ),VCC
12(V),VF8=VF7=0.7(V),dVF7/dT=
−1 (mV/℃),dVF8/dT=−2(mV/℃)とすると
、 (19)式から とすれば良いことが分る。
As an example, R 9 = 2 (kΩ), R 10 = 10 (k
Ω), R 11 = 1 (kΩ), R 12 = 2 (kΩ), V CC =
12 (V), V F8 = V F7 = 0.7 (V), dV F7 /dT=
-1 (mV/℃), dV F8 /dT=-2 (mV/℃), then from equation (19), It turns out that it is good to do this.

以上のように温度係数の異なる抵抗の比を用い
て正又は負の温度係数をつくることにより回路全
体として温度補償をすることができるが、半導体
集積装置上に所定の温度係数を作るには、抵抗層
の形状を近似させることが有効である。
As described above, temperature compensation can be performed for the entire circuit by creating a positive or negative temperature coefficient using the ratio of resistors with different temperature coefficients, but in order to create a predetermined temperature coefficient on a semiconductor integrated device, It is effective to approximate the shape of the resistance layer.

因みに、半導体集積装置上に形状の異なる多数
の抵抗を組合せ形成することは試行錯誤的な煩雑
な作業及び多くの手間が必要であり、その割には
所定の温度係数を得るにつき部留りが悪い問題が
ある。しかも半導体集積装置の製造上、パターン
の写真処理を行う等の微細加工技術を複数回くり
返しながら各素子を半導体基板上に形成するの
で、形状の異なる多数の抵抗が配置されることは
所定の温度係数を得ることが容易ではないことに
つながる。
Incidentally, forming a combination of a large number of resistors with different shapes on a semiconductor integrated device requires a complicated process of trial and error and a lot of effort. There's a bad problem. Moreover, in manufacturing semiconductor integrated devices, each element is formed on a semiconductor substrate by repeating microfabrication techniques such as pattern photo processing multiple times, so many resistors with different shapes are placed at a certain temperature. This leads to the fact that it is not easy to obtain the coefficients.

この点の改善ができる構成を第7図に示せば、
この場合第1図について上述した形状の抵抗拡散
層でなる抵抗R1(長さがl1で、幅がw1)と、抵抗
R2(長さl2で、幅がw2)とをほぼ平行に延長する
ように近接させて配置する。抵抗R1及びR2のコ
ンタクト部分はすべて同一形状となされ、直線部
1の長さは割当てられた抵抗値と、温度補償のた
めに選定された幅とが決まればこれに応じて決ま
るようになされている。しかし実際上は、長さl1
及びl2はできるだけ近い値に選定することが望ま
しい。
Figure 7 shows a configuration that can improve this point.
In this case, a resistance R 1 (length l 1 and width w 1 ) consisting of a resistance diffusion layer having the shape described above with respect to FIG.
R 2 (length l 2 and width w 2 ) are arranged close to each other so as to extend substantially parallel to each other. The contact parts of resistors R 1 and R 2 are all of the same shape, and the length of the straight part 1 is determined according to the assigned resistance value and the width selected for temperature compensation once they are determined. being done. But in practice, the length l 1
It is desirable to select values for and l 2 as close as possible.

ここでl1及びl2が近い値にならない場合、例え
ばl1<l2の場合は、第8図に示す如く長い方の抵
抗R2を2つに分け、その一方R2aの長さを抵抗R1
に合せてl1とする(すなわち長さl1、幅w2とす
る)と共に、他方R2bの長さを残る長さl3(=l2
−l1)とし(すなわち長さl3、幅w2とする)、これ
ら2つの部分R2a及びR2bをアルミニウム層4で
電気的に接触する。このようにすれば、全体とし
て抵抗層の形状を互いに近似させるようにでき、
これによりパターン誤差や、拡散分布の誤差を少
なくすることができる。
If l 1 and l 2 are not close values, for example l 1 < l 2 , divide the longer resistor R 2 into two as shown in Fig. 8, and divide the length of R 2a into two. Resistance R 1
(i.e., the length l 1 and the width w 2 ), and the length of R 2b is the remaining length l 3 (=l 2
-l 1 ) (that is, length l 3 and width w 2 ), and these two portions R 2a and R 2b are electrically contacted by the aluminum layer 4 . In this way, the shapes of the resistance layers as a whole can be approximated to each other,
This makes it possible to reduce pattern errors and diffusion distribution errors.

さらに抵抗層の形状を互いに一段と近似させる
ためには、第9図に示す如く2つの抵抗R1及び
R2を必要に応じてさらに細かく分割し、所望の
長さになるようにアルミニウム層4a,4b,4
cで接続するようにすれば、さらに一段と温度補
償精度を上げることができる。
Furthermore, in order to make the shapes of the resistive layers even more similar to each other, two resistors R1 and R1 are used as shown in FIG.
Divide R2 into smaller pieces if necessary, and add the aluminum layers 4a, 4b, 4 to the desired length.
If the connection is made at c, the temperature compensation accuracy can be further improved.

上述のように本発明に依れば、回路素子を構成
する抵抗をその抵抗比が正又は負となるように選
定して組合せることにより、回路全体として所望
の温度係数をもつたものを容易に得ることができ
る。従つて従来は補償できないと考えられて来た
回路構成の温度補償を容易になし得、依つて一段
と温度補償精度の良い半導体集積回路を得ること
ができる。
As described above, according to the present invention, by selecting and combining the resistors constituting the circuit elements such that their resistance ratios are positive or negative, it is possible to easily create a circuit having a desired temperature coefficient as a whole. can be obtained. Therefore, it is possible to easily compensate for the temperature of a circuit configuration that has conventionally been thought to be impossible to compensate for, and it is therefore possible to obtain a semiconductor integrated circuit with even better temperature compensation accuracy.

なお上述の実施例においては抵抗の直線状抵抗
層部1の両端にコンタクト部3を設けたが、必要
に応じてその一端のみに設けるようにしても本発
明を適用し得る。
In the above-described embodiment, the contact portions 3 are provided at both ends of the linear resistance layer portion 1 of the resistor, but the present invention may be applied even if the contact portions 3 are provided only at one end, if necessary.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図ないし第3図は本発明を適用し得る回路
を示す接続図、第4図は本発明に依る温度補償回
路装置に用いられる拡散抵抗層の一例を示す平面
図、第5図はその幅に対する温度係数の変化を示
す曲線図、第6図は本発明を適用し得る他の回路
例を示す接続図、第7図ないし第9図は拡散抵抗
層の他の例を示す平面図である。 1……直線状抵抗層部、2……コンタクト、3
……コンタクト層部、4,4a〜4c……アルミ
ニウム層。
1 to 3 are connection diagrams showing a circuit to which the present invention can be applied, FIG. 4 is a plan view showing an example of a diffused resistance layer used in a temperature compensation circuit device according to the present invention, and FIG. A curve diagram showing changes in temperature coefficient with respect to width, FIG. 6 is a connection diagram showing another example of a circuit to which the present invention can be applied, and FIGS. 7 to 9 are plan views showing other examples of a diffused resistance layer. be. 1... Linear resistance layer section, 2... Contact, 3
. . . Contact layer portion, 4, 4a to 4c . . . Aluminum layer.

Claims (1)

【特許請求の範囲】 1 半導体集積装置上に形成すべき予定の回路を
構成する素子としての第1及び第2の抵抗を、上
記半導体集積装置上に互いに長さ方向に平行に形
成した一定幅の直線状抵抗層部と、これら直線状
抵抗層部の一端又は両端にそれぞれがほぼ等しい
形状にて形成したコンタクト部とで構成し、上記
第1及び第2の抵抗の抵抗比が正又は負の温度係
数となるように上記直線状抵抗層部の幅を互いに
異なる値に選定したことを特徴とする半導体集積
装置における温度補償回路装置。 2 上記第1及び第2の抵抗の少なくとも一方
を、それぞれ上記直線状抵抗層部及び上記コンタ
クト部でなる複数の抵抗部分に分割してなる特許
請求の範囲第1項に記載の半導体集積装置におけ
る温度補償回路装置。
[Scope of Claims] 1. First and second resistors as elements constituting a circuit to be formed on a semiconductor integrated device are formed on the semiconductor integrated device in parallel with each other in the length direction and have a constant width. a linear resistance layer portion, and a contact portion formed at one end or both ends of the linear resistance layer portion, each having a substantially equal shape, and the resistance ratio of the first and second resistances is positive or negative. 1. A temperature compensation circuit device in a semiconductor integrated device, characterized in that the widths of the linear resistance layer portions are set to different values so as to have a temperature coefficient of . 2. In the semiconductor integrated device according to claim 1, wherein at least one of the first and second resistors is divided into a plurality of resistance parts each consisting of the linear resistance layer part and the contact part. Temperature compensation circuit device.
JP12458679A 1979-09-27 1979-09-27 Temperature compensating circuit device in semiconductor integrated device Granted JPS5648166A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12458679A JPS5648166A (en) 1979-09-27 1979-09-27 Temperature compensating circuit device in semiconductor integrated device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12458679A JPS5648166A (en) 1979-09-27 1979-09-27 Temperature compensating circuit device in semiconductor integrated device

Publications (2)

Publication Number Publication Date
JPS5648166A JPS5648166A (en) 1981-05-01
JPS6248903B2 true JPS6248903B2 (en) 1987-10-16

Family

ID=14889126

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12458679A Granted JPS5648166A (en) 1979-09-27 1979-09-27 Temperature compensating circuit device in semiconductor integrated device

Country Status (1)

Country Link
JP (1) JPS5648166A (en)

Also Published As

Publication number Publication date
JPS5648166A (en) 1981-05-01

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