JPS625001B2 - - Google Patents
Info
- Publication number
- JPS625001B2 JPS625001B2 JP6834581A JP6834581A JPS625001B2 JP S625001 B2 JPS625001 B2 JP S625001B2 JP 6834581 A JP6834581 A JP 6834581A JP 6834581 A JP6834581 A JP 6834581A JP S625001 B2 JPS625001 B2 JP S625001B2
- Authority
- JP
- Japan
- Prior art keywords
- shelf
- liquid
- gas
- overflow pipe
- receiving plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000007788 liquid Substances 0.000 claims description 146
- 230000003014 reinforcing effect Effects 0.000 claims description 4
- 230000002093 peripheral effect Effects 0.000 claims 2
- 230000005855 radiation Effects 0.000 description 15
- 238000005194 fractionation Methods 0.000 description 5
- 230000000630 rising effect Effects 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 2
- 238000005187 foaming Methods 0.000 description 2
- 238000004508 fractional distillation Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Description
【発明の詳細な説明】
本発明は、気液接触装置に係わり、特に、大量
の液体および気体の処理に好適な気液接触装置に
関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a gas-liquid contact device, and particularly to a gas-liquid contact device suitable for processing large amounts of liquid and gas.
概略、棚段の多孔板上で被処理液体を膜状とし
て、気体と気液接触を行わせる気液接触装置は、
圧力損失が小さく、気液接触効率が高く、かつ、
構造が簡単なため、従来より、蒸留、蒸発、吸収
等の化学工業の種々の気液接触操作に広く用いら
れている。また、最近は、更に大量の液体および
気体を処理したいとの要求が強く出され、これを
良好に満足する気液接触装置の開発が急務となつ
ている。しかし、これに対処するには、唯単に気
液接触装置の大形化を図るだけでは充分でなく、
多孔板上に分布する液膜の厚さ、すなわち、液深
の増加、それに伴う運転費の増大、気液接触効率
の低下といつた問題を解決する必要がある。 Generally speaking, a gas-liquid contact device that makes a liquid to be treated into a film on a perforated plate of a shelf and brings it into gas-liquid contact is as follows:
Low pressure loss, high gas-liquid contact efficiency, and
Because of its simple structure, it has been widely used in various gas-liquid contact operations in the chemical industry, such as distillation, evaporation, and absorption. In addition, recently there has been a strong demand for processing even larger amounts of liquid and gas, and there is an urgent need to develop a gas-liquid contact device that satisfies this demand. However, to deal with this problem, it is not enough to simply increase the size of the gas-liquid contact device;
It is necessary to solve problems such as an increase in the thickness of the liquid film distributed on the porous plate, that is, an increase in the liquid depth, an accompanying increase in operating costs, and a decrease in gas-liquid contact efficiency.
従来の溢流管を有する気液接触装置には、旋回
流気液接触装置とマルチパス分留気液接触装置が
ある。 Conventional gas-liquid contact devices with overflow tubes include swirling flow gas-liquid contact devices and multi-pass fractional gas-liquid contact devices.
従来の旋回流気液接触装置例を第1図により説
明する。なお、旋回流気液接触装置には、多孔板
上の液体流路数により1方流方式、2方流方式、
4方流方式および6方流方式等があるが、基本的
な構造および考え方は同一であるため、この場合
は、多孔板上の液体流路数が4方流方式につき説
明する。第1図で、1aは旋回流形式の棚段で、
2個の液受板2a、2個の溢流管3a、4個の多
孔板4aから構成され、溢流管3aの両縁に出口
堰5aを有している。棚段1aは、円筒状容器6
とその中心に設けられた心金7とに設置される。
上方に設置された棚段の溢流管より液受板2a上
に流入した液体は、多孔板4a上に溢れ、液膜を
形成し、下方から多孔板4aの孔(図示せず)を
通り上昇する気体と気液接触しつつ、心金7を旋
回するように矢印方向に多孔板4a上を横断し、
出口堰5aで液深を調節され、溢流管3aに流入
し、その後、溢流管3aより下方に設置された棚
段へと流下する。 An example of a conventional swirling flow gas-liquid contact device will be explained with reference to FIG. Note that the swirling flow gas-liquid contact device is available in one-way flow type, two-way flow type, and
There are a four-way flow system, a six-way flow system, etc., but the basic structure and concept are the same, so in this case, the four-way flow system will be described with respect to the number of liquid flow channels on the perforated plate. In Fig. 1, 1a is a swirling flow type shelf;
It is composed of two liquid receiving plates 2a, two overflow pipes 3a, and four perforated plates 4a, and has outlet weirs 5a on both edges of the overflow pipes 3a. The shelf 1a has a cylindrical container 6
and a mandrel 7 provided at its center.
The liquid that has flowed onto the liquid receiving plate 2a from the overflow pipe of the shelf installed above overflows onto the perforated plate 4a, forms a liquid film, and passes through the holes (not shown) in the perforated plate 4a from below. While in gas-liquid contact with the rising gas, it traverses the perforated plate 4a in the direction of the arrow so as to rotate the mandrel 7,
The liquid depth is adjusted by the outlet weir 5a, flows into the overflow pipe 3a, and then flows down to a shelf installed below the overflow pipe 3a.
普通、多孔板上の液膜の厚さ、すなわち、液深
hは、処理液量をQ、出口堰の合計長さをb、比
例定数をkとすると、h=k(Q/b)〓で与え
られる。なお、出口堰の長さとは、液体が多孔板
上より溢流管内へ流入する際通過する稜線の長さ
を表わすものである。ここで、出口堰の合計長さ
bは、気液接触装置の円筒状容器直径(以下、塔
径と略)にほぼ比例し、処理液量Qは、塔径のほ
ぼ二乗に比例するため、液深hは塔径とともに大
きくなる性質がある。したがつて、気液接触装置
が大形化すれば液深も増加し、このため、気体が
液膜を通過する際の圧力損失が大きくなるため、
気体を気液接触装置へ供給する送風機あるいは圧
縮機等の動力消費が大きくなり、運転費が増大す
るといつた問題があつた。更に、液深の増加は、
多孔板上の液体がその孔を通つて直接直下の多孔
板上へ落下する、いわゆる、ウイーピング現象
と、下方からの気体が、多孔板の一部の孔を通つ
て上昇する、いわゆる、液膜の部分発泡現象を引
き起こし、気液接触効率が著しく低下るという問
題もあつた。 Normally, the thickness of the liquid film on the perforated plate, i.e., the liquid depth h, is calculated as follows: where Q is the amount of liquid to be treated, b is the total length of the outlet weir, and k is the proportionality constant, h=k(Q/b)〓 is given by Note that the length of the outlet weir represents the length of the ridgeline through which the liquid flows from the perforated plate into the overflow pipe. Here, the total length b of the outlet weir is approximately proportional to the diameter of the cylindrical container of the gas-liquid contact device (hereinafter referred to as the column diameter), and the amount of liquid to be treated Q is approximately proportional to the square of the column diameter, so The liquid depth h tends to increase with the column diameter. Therefore, as the gas-liquid contact device becomes larger, the liquid depth also increases, which increases the pressure loss when gas passes through the liquid film.
There was a problem in that the power consumption of the blower or compressor for supplying gas to the gas-liquid contacting device increased, resulting in increased operating costs. Furthermore, the increase in liquid depth is
There is a so-called weeping phenomenon in which liquid on a perforated plate falls directly onto the perforated plate directly below it through the holes, and a so-called liquid film in which gas from below rises through some holes in the perforated plate. There was also the problem that the gas-liquid contact efficiency was significantly lowered due to partial foaming phenomenon.
次に、従来のマルチパス分留気液接触装置例と
して特開昭54―107473号公報記載のものを第2図
により説明する。第2図で、1bはマルチパス分
留形式の棚段で、棚段の中心から半径方向に設け
られ、両縁に出口堰5bを有する樋8と、各樋8
の端部に接続された弦月状の溢流管3bと、液受
板2bおよび多孔板4bにより構成され、円筒状
容器6に内設される。上方に設置された棚段の溢
流管より液受板2b上に流入した液体は、多孔板
4b上に溢れ、液膜を形成し、下方から多孔板4
の孔を通り上昇する気体と気液接触しつつ、多孔
板4b上を矢印方向に横断し、出口堰5bで液深
を調節され、樋8に流れ込み、更に、樋8中を半
径方向に流れて溢流管3bに流入し、その後、溢
流管3bより更に下方に設置された棚段へと流下
する。 Next, an example of a conventional multi-pass fractional gas-liquid contacting apparatus described in Japanese Patent Application Laid-Open No. 107473/1982 will be described with reference to FIG. In Fig. 2, reference numeral 1b indicates a multi-pass fractional distillation type tray, which is provided in the radial direction from the center of the tray and has an outlet weir 5b on both edges, and each gutter 8.
It consists of a moon-shaped overflow pipe 3b connected to the end of the container, a liquid receiving plate 2b, and a perforated plate 4b, and is installed inside the cylindrical container 6. The liquid that has flowed onto the liquid receiving plate 2b from the overflow pipe of the shelf installed above overflows onto the perforated plate 4b, forms a liquid film, and then flows into the perforated plate 4 from below.
The liquid crosses the porous plate 4b in the direction of the arrow while being in gas-liquid contact with the gas rising through the holes, the liquid depth is adjusted at the outlet weir 5b, flows into the gutter 8, and further flows in the radial direction in the gutter 8. The water flows into the overflow pipe 3b, and then flows down to a shelf installed further below the overflow pipe 3b.
この場合、前記した出口堰の合計長さbが長く
なり、液深を浅くできるが、しかし、気液接触装
置が大形化し、処理液量が大量になると樋8の幅
と深さを大きくしなければならず、気液接触面積
が減少するため、多孔板4bの孔を通り上昇する
気体の速度を増すか、又は、気液接触装置の塔径
を大きくして、多孔板4bの面積、つまり、気液
接触面積の減少を防止する必要がある。しかし、
多孔板4bの孔を通り上昇する気体の速度を増す
ことは、気体の圧力損失を大きくし、したがつ
て、気体を気液接触装置に供給する送風機あるい
は圧縮機等の動力消費が大きくなり、運転費が増
大するといつた問題があつた。また、気液接触装
置の塔径を大きくすることは、装置価格の増加を
招き、更に、樋8の深さを深くすることは、棚段
間の距離、すなわち、段間隔を大きくし、このた
め、気液接触装置の高さが高くなり、この場合も
装置価格が増加する問題があつた。 In this case, the total length b of the outlet weir becomes longer and the liquid depth can be made shallower. However, if the gas-liquid contact device becomes larger and the amount of liquid to be treated becomes large, the width and depth of the gutter 8 will be increased. Therefore, the area of the perforated plate 4b must be increased by increasing the velocity of the gas rising through the holes in the perforated plate 4b, or by increasing the column diameter of the gas-liquid contacting device. In other words, it is necessary to prevent a decrease in the gas-liquid contact area. but,
Increasing the speed of the gas rising through the holes in the perforated plate 4b increases the pressure loss of the gas, and therefore increases the power consumption of the blower or compressor that supplies the gas to the gas-liquid contact device. There was a problem with increased operating costs. In addition, increasing the column diameter of the gas-liquid contact device will increase the cost of the device, and furthermore, increasing the depth of the gutter 8 will increase the distance between the trays, that is, the gap between the trays. Therefore, the height of the gas-liquid contacting device becomes high, and in this case as well, there is a problem that the cost of the device increases.
本発明は、上記の従来技術が有する問題の解決
を目的としたもので、棚段の中心から半径方向に
放射状に設けられる少なくとも2個以上の放射数
の溢流管と、溢流管で放射数と等しい数に分割さ
れた多孔板と、円筒状容器内壁に沿つて棚段の周
辺部に設けられる少なくとも放射数に等しい個数
の液受板により構成される棚段と、この棚段の溢
流管の放射数に等しい放射数で半径方向に放射状
に設けられる液受板と、液受板で放射数に等しい
数に分割された多孔板と、円筒状容器内壁に沿つ
て棚段の周辺部に設けられる少なくとも放射数に
等しい個数の溢流管により構成される別の棚段と
を、円筒状容器の高さ方向に交互に内設すること
を特徴とする気液接触装置を提供するものであ
る。 The present invention is aimed at solving the problems of the above-mentioned prior art, and includes at least two or more overflow pipes provided radially in a radial direction from the center of the shelf; A shelf consisting of a perforated plate divided into a number equal to the number of holes, a liquid receiving plate of at least equal to the number of radials provided along the inner wall of the cylindrical container around the periphery of the shelf, and an overflow of the shelf. A liquid receiving plate provided radially in the radial direction with a number of radials equal to the number of radials of the flow tube, a perforated plate divided by the liquid receiving plate into a number equal to the number of radials, and a periphery of the shelf along the inner wall of the cylindrical container. To provide a gas-liquid contact device characterized in that separate shelves constituted by a number of overflow pipes at least equal to the number of radials provided in a cylindrical container are arranged alternately in the height direction of a cylindrical container. It is something.
本発明の一実施例を第3図から第7図により説
明する。なお、この場合は放射数が、基本的放射
数の3での実施例である。第3図から第7図で、
1cは棚段Aで、棚段の中心から半径方向に放射
状に設けられ、かつ、両縁に出口堰5cを有した
放射数が3の溢流管3cと、溢流管3cで放射数
に等しい数に分割された多孔板4cと、円筒状容
器6の内壁に沿つて棚段の周縁部に設けられた放
射数の2倍の個数、合計6個の、形状がほぼ弦月
状の液受板2cから構成され、液受板2cの多孔
板4c側の一部に入口堰9aを有している。1d
は棚段Bで、棚段の中心から半径方向に放射状に
設けられ、かつ、両側に一部入口堰9bを有した
放射数が3の液受板2dと、液受板2dで放射数
に等しい数に分割された多孔板4dと、円筒状容
器6の内壁に沿つて棚段の周辺部に設けられた放
射数の2倍の個数で、2個を1組とする合計3組
の、形状がほぼ弦月状の溢流管3dから構成さ
れ、溢流管3dの多孔板4d側に出口堰5dを有
している。 An embodiment of the present invention will be described with reference to FIGS. 3 to 7. Note that this is an example in which the number of radiations is three, which is the basic number of radiations. In Figures 3 to 7,
1c is a shelf A, which is provided radially from the center of the shelf and has an outlet weir 5c on both edges and has an overflow pipe 3c with a radiation number of 3; Perforated plates 4c divided into equal numbers and twice the number of radials provided along the inner wall of the cylindrical container 6 at the periphery of the shelf, a total of 6 liquids each having an approximately crescent-shaped shape. It is composed of a receiving plate 2c, and has an inlet weir 9a in a part of the liquid receiving plate 2c on the perforated plate 4c side. 1d
is the shelf B, which is provided radially in the radial direction from the center of the shelf, and has a partial inlet weir 9b on both sides, and has a liquid receiving plate 2d with a radiation number of 3; A total of 3 sets of perforated plates 4d divided into equal numbers and 2 sets each with twice the number of radials provided along the inner wall of the cylindrical container 6 at the periphery of the shelf. It is composed of an overflow pipe 3d having a substantially crescent-shaped shape, and has an outlet weir 5d on the side of the perforated plate 4d of the overflow pipe 3d.
上記のように構成された棚段A1cと棚段B1
dとは、第5図のように円筒状容器6の高さ方向
に交互に内設され、気液接触装置が構成される。
なお、この場合、第6図のように棚段A1cの溢
流管3c側壁10aの下端の半径方向端部11a
を、下方に設置されている棚段B1dの液受板2
dに密着させ、また、端部11aを除く側壁10
aの下端は予め切欠かれているため、この状態
で、液受板2dとの間に、端部11aを除く部分
で開口部12aが生じ、また、第7図のように棚
段B1dの溢流管3d側壁10bの下端の両端部
11bを、更に下方に設置されている棚段A1c
の液受板2cに密着させ、また、両端11bを除
く側壁10bの下端は予め切欠かれているため、
この状態で、液受板2cとの間に、両端部11b
を除く部分で開口部12bが生じる。 Shelf A1c and shelf B1 configured as above
d are arranged alternately in the height direction of the cylindrical container 6 as shown in FIG. 5, and constitute a gas-liquid contact device.
In this case, the lower radial end 11a of the side wall 10a of the overflow pipe 3c of the shelf A1c is
, the liquid receiving plate 2 of the shelf B1d installed below
d, and the side wall 10 excluding the end portion 11a.
Since the lower end of a is notched in advance, in this state, an opening 12a is formed between it and the liquid receiving plate 2d except for the end 11a, and as shown in FIG. Both ends 11b of the lower end of the flow tube 3d side wall 10b are connected to a shelf A1c installed further below.
Since the lower end of the side wall 10b except for both ends 11b is cut out in advance,
In this state, both ends 11b are connected to the liquid receiving plate 2c.
An opening 12b is formed in the area excluding the area.
上記のように構成された気液接触装置におい
て、上方に設置された棚段Bの溢流管より、棚段
A1cの液受板2cに流入した液体は、開口部1
2bを通り、入口堰9aで流入量を調節され多孔
板4c上に流入し、液膜を形成しつつ、第3図の
矢印方向に多孔板4c上を横断し、出口堰5cで
液深を調節され、溢流管3cに流入する。その
後、液体は、溢流管3cより、棚段A1cの下方
に設置された棚段B1dの液受板2d上に流下
し、開口部12aを通り、入口堰9bで流入量を
調節され多孔板4d上に流入し、液膜を形成しつ
つ、第4図の矢印方向に多孔板4d上を横断し、
出口堰5dで液深を調節され、溢流管3dに流入
する。その後、液体は、溢流管3dより、棚段B
1dの更に下方に設置された棚段Aへ流下し、上
記の作用が繰返される。この場合、液体が、溢流
管3c,3dより多孔板4d,4c上へ流入する
際に、溢流管3c,3d側壁10a,10bの下
端のそれぞれの端部11a,11bが下方に設置
された棚段の液受板2d,2c面と互に密着して
いるため、液体は、それぞれの開口部12a,1
2bから多孔板4d,4c上に流入することにな
り、したがつて、下方より多孔板4d,4c上の
孔を通つて上昇する気体と多孔板4d,4c上で
必ず気液接触を行つた後に、溢流管3d,3cに
流入する。 In the gas-liquid contact device configured as described above, the liquid flowing into the liquid receiving plate 2c of the shelf A1c from the overflow pipe of the shelf B installed above is transferred to the opening 1.
2b, the inflow rate is adjusted at the inlet weir 9a, and the liquid flows onto the perforated plate 4c, forming a liquid film while crossing the perforated plate 4c in the direction of the arrow in FIG. The water is regulated and flows into the overflow pipe 3c. Thereafter, the liquid flows down from the overflow pipe 3c onto the liquid receiving plate 2d of the shelf B1d installed below the shelf A1c, passes through the opening 12a, and the inflow amount is adjusted by the inlet weir 9b. 4d, crosses over the perforated plate 4d in the direction of the arrow in FIG. 4 while forming a liquid film,
The liquid depth is adjusted by the outlet weir 5d, and the liquid flows into the overflow pipe 3d. After that, the liquid flows from the overflow pipe 3d to the shelf B.
It flows down to the shelf A installed further below 1d, and the above action is repeated. In this case, when the liquid flows from the overflow pipes 3c, 3d onto the perforated plates 4d, 4c, the respective ends 11a, 11b of the lower ends of the side walls 10a, 10b of the overflow pipes 3c, 3d are installed downward. Since the liquid receiving plates 2d and 2c of the shelves are in close contact with each other, the liquid flows through the openings 12a and 1, respectively.
2b and onto the perforated plates 4d and 4c. Therefore, the gas rising from below through the holes on the perforated plates 4d and 4c always comes into contact with the gas on the perforated plates 4d and 4c. Later, it flows into overflow pipes 3d and 3c.
第8図は、本発明を適用し得られた多孔板上の
液深を、塔径、液体量とも同一条件である従来技
術でのそれと比較した図で、第9図は、同じく、
従来の旋回流形式棚段の気液接触面積に対する本
発明による棚段の気液接触面積の比と従来のマル
チパス分留形式棚段の気液接触面積の比とを比較
した図である。第8図で、本発明による棚段A1
cと棚段B1dのそれぞれの出口堰5c,5dの
合計長さが、従来の旋回流形式棚段1aのそれに
比べ長くとれるため、本発明による棚段A1c,
B1dでの液深は、従来の旋回流形式棚段1aで
の液深の約60%と、従来のマルチパス分留形式棚
段1bでの液深と比べても更に数%程度浅くな
る。また、第9図で、本発明による棚段A1c,
B1dの気液接触面積は、従来の旋回流形式棚段
1aのそれと等しく広いが、しかし、従来のマル
チパス分留形式棚段1bの気液接触面積は、従来
の旋回流形式棚段1aのそれに対し約65%と狭
い。このように、本発明による棚段A1c,B1
dおよび従来の旋回流形式棚段1aの気液接触面
積が広いのは、従来のマルチパス分留棚段1bの
樋8の占める面積に比べて、本発明による棚段A
1cの溢流管3c、棚段B1dの溢流管3dおよ
び従来の旋回流形式棚段1aの溢流管3aの占め
る面積が狭くて済むためである。以上のように、
本発明による気液接触装置は、従来の旋回流およ
びマルチパス分流気液接触装置それぞれの長所の
みを兼備しており、多孔板上の液深を浅く、か
つ、気液接触面積を広くとることができる。 FIG. 8 is a diagram comparing the liquid depth on the perforated plate obtained by applying the present invention with that in the prior art under the same conditions for both column diameter and liquid amount.
FIG. 3 is a diagram comparing the ratio of the gas-liquid contact area of the tray according to the present invention to the gas-liquid contact area of the conventional swirl flow type tray and the ratio of the gas-liquid contact area of the conventional multi-pass fractionation type tray. In FIG. 8, shelf A1 according to the present invention
Since the total length of the outlet weirs 5c and 5d of each of the trays A1c and B1d can be longer than that of the conventional swirling flow type tray 1a, the trays A1c and B1d according to the present invention
The liquid depth at B1d is approximately 60% of the liquid depth in the conventional swirl flow type tray 1a, and is several percent shallower than the liquid depth in the conventional multi-pass fractionation type tray 1b. Moreover, in FIG. 9, the shelf A1c according to the present invention,
The gas-liquid contact area of B1d is equally wide as that of the conventional swirl flow type tray 1a, but the gas-liquid contact area of the conventional multi-pass fractionation type tray 1b is larger than that of the conventional swirl flow type tray 1a. On the other hand, it is narrower at about 65%. In this way, the shelves A1c, B1 according to the present invention
d and the gas-liquid contact area of the conventional swirl flow type tray 1a is larger than that of the tray A according to the present invention compared to the area occupied by the gutter 8 of the conventional multi-pass fractionation tray 1b.
This is because the area occupied by the overflow pipe 3c of B1c, the overflow pipe 3d of the shelf B1d, and the overflow pipe 3a of the conventional swirl flow type shelf 1a can be small. As mentioned above,
The gas-liquid contact device according to the present invention has only the advantages of the conventional swirl flow and multi-pass split flow gas-liquid contact devices, and has a shallow liquid depth on the perforated plate and a wide gas-liquid contact area. I can do it.
なお、第10図、第11図は、それぞれ放射数
4および2とした場合の応用実施例である。第1
0図は、放射数が4の場合の本発明による気液接
触装置の棚段1e(第3図の棚段A1cに相当)
で、特に、被処理液体量が大量で、気液接触装置
が大形になる場合に好適である。第11図は、放
射数が2の場合の本発明による気液接触装置の棚
段1f(第3図の棚段A1cに相当)で、特に、
被処理液体量が比較的少量で、気液接触装置が小
形になる場合に好適である。 Note that FIG. 10 and FIG. 11 are applied examples in which the number of radiations is 4 and 2, respectively. 1st
Figure 0 shows shelf 1e (corresponding to shelf A1c in Figure 3) of the gas-liquid contact device according to the present invention when the number of radiations is 4.
This is particularly suitable when the amount of liquid to be treated is large and the gas-liquid contact device is large in size. FIG. 11 shows the shelf 1f (corresponding to the shelf A1c in FIG. 3) of the gas-liquid contact device according to the present invention when the number of radiations is 2, and in particular,
This method is suitable when the amount of liquid to be treated is relatively small and the gas-liquid contact device is small.
本発明の他の実施例を第12図から第14図に
より説明する。なお、第12図から第14図で、
第3図から第5図と同一部分等は、同一符号で示
し説明を省略する。第12図の棚段A′1gと第
3図の棚段A1cおよび第13図の棚段B′1hと
第4図の棚段B1dで構成上異なる点は、棚段A
1cおよび棚段B1dの出口堰5c,5dおよび
入口堰9a,9bを除去した点である。このよう
に、出口堰5c,5dおよび入口堰9a,9bが
除去された棚段A′1gと棚段B′1hとを第5図
の場合と同じく第14図のように円筒状容器6の
高さ方向に交互に内設する。このような棚段は、
溢流管3c,3dの出口部における多孔板上の液
深が、開口部12a,12bの高さよりも深く、
また、塔径が更に大きく液深がある一定の深さで
保持される場合に好適であり、出口堰、入口堰を
設けないため棚段の構造が簡単で製造が容易にな
る。 Another embodiment of the present invention will be described with reference to FIGS. 12 to 14. In addition, in Figures 12 to 14,
The same parts as in FIGS. 3 to 5 are denoted by the same reference numerals, and the explanation thereof will be omitted. The structural differences between shelf A'1g in FIG. 12 and shelf A1c in FIG. 3, and between shelf B'1h in FIG. 13 and shelf B1d in FIG.
1c and the outlet weirs 5c, 5d and inlet weirs 9a, 9b of the shelf B1d have been removed. In this way, the shelf A'1g and the shelf B'1h from which the outlet weirs 5c, 5d and the inlet weirs 9a, 9b have been removed are reassembled into the cylindrical container 6 as shown in FIG. 14 in the same manner as in FIG. Installed alternately in the height direction. Such shelves are
The depth of the liquid on the perforated plate at the outlet portions of the overflow pipes 3c and 3d is deeper than the height of the openings 12a and 12b,
In addition, it is suitable when the column diameter is larger and the liquid depth is maintained at a certain constant depth, and since no outlet weir or inlet weir is provided, the tray structure is simple and manufacturing is easy.
本発明の更に他の実施例を第15図から第17
図により説明する。なお、第15図から第17図
で、第3図、第4図と同一部品は、同一符号で示
し説明を省略する。第15図の棚段A″1iは、
第3図の棚段A1cに相当する棚段である。棚段
A1cで、円筒状容器6の内壁に沿つて棚段の周
辺部に設けられる液受板2cの個数が、放射数の
2倍の個数、また、その形状が、ほぼ弦月状であ
るのに対し、棚数A″1iでは、円筒状容器6の
内壁に沿つて棚段の周辺部に設けられる液受板2
eの個数は、少なくとも放射数と等しい個数、ま
た、その形状は、部分円環状である。次に第16
図の棚段B″1jは、第4図の棚段B1dに相当
する棚段である。棚段B1dで、円筒状容器6の
内壁に沿つて棚段の周辺部に設けられる溢流管3
dの個数が、放射数の2倍の個数で、かつ、2個
を1組として合計3組で、また、その形状が、ほ
ぼ弦月状であるのに対し、棚段B″1jでは、円
筒状容器6の内壁に沿つて棚段の周辺部に設けら
れる溢流管3eの個数が、少なくとも放射数に等
しい個数、また、その形状は、部分円環状であ
る。液受板および溢流管の設置個数、形状を、上
記のような設置個数、形状とすることにより棚段
の構造が簡単になり、製造が更に容易になる。次
に、第17図の棚段B1kは、第16図の棚段
B″1jの部分円環状溢流管3eを、少なくとも
放射数の2倍の数に分割し、分割された部分円環
状溢流管3fの間に多孔板4dから補強部材13
を突出し、この補強部材13を円筒状容器6内壁
に固設したもので、これにより、多孔板の強度を
更に向上できる。 Still other embodiments of the present invention are shown in FIGS. 15 to 17.
This will be explained using figures. Note that in FIGS. 15 to 17, parts that are the same as those in FIGS. 3 and 4 are designated by the same reference numerals, and explanations thereof will be omitted. The shelf A″1i in Fig. 15 is
This shelf corresponds to the shelf A1c in FIG. 3. In the shelf A1c, the number of liquid receiving plates 2c provided at the periphery of the shelf along the inner wall of the cylindrical container 6 is twice the number of radials, and the shape is approximately crescent-shaped. On the other hand, when the number of shelves is A″1i, the liquid receiving plate 2 provided at the periphery of the shelf along the inner wall of the cylindrical container 6 is
The number of e is at least equal to the number of radiations, and the shape is partially annular. Then the 16th
The shelf B''1j in the figure corresponds to the shelf B1d in FIG.
The number of pieces d is twice the number of rays, and there are three sets in total, each consisting of two pieces, and the shape is almost crescent moon-shaped, whereas in the shelf B″1j, The number of overflow pipes 3e provided at the periphery of the shelf along the inner wall of the cylindrical container 6 is at least equal to the number of radials, and the shape is partially annular.Liquid receiving plate and overflow By setting the installed number and shape of the pipes as described above, the structure of the shelf becomes simple and manufacturing becomes easier.Next, the shelf B1k in FIG. Figure shelf
The partial annular overflow pipe 3e of B″1j is divided into at least twice the number of radials, and the reinforcing member 13 is inserted from the perforated plate 4d between the divided partial annular overflow pipes 3f.
This reinforcing member 13 is fixed to the inner wall of the cylindrical container 6, thereby further improving the strength of the perforated plate.
本発明は、以上説明したように、棚段の中心か
ら半径方向に放射状に設けられた少なくとも2個
以上の放射数の溢流管と、溢流管で放射数と等し
い数に分割された多孔板と、円筒状容器内壁に沿
つて棚段の周辺部に設けられた少なくとも放射数
に等しい個数の液受板により構成された棚段と、
この棚段の溢流管の放射数に等しい放射数で半径
方向に放射状に設けられた液受板と、液受板で放
射数に等しい数に分割された多孔板と、円筒状容
器内壁に沿つて棚段の周辺部に設けられた少なく
とも放射数に等しい個数の溢流管により構成され
た別の棚段とを、円筒状容器の高さ方向に交互に
内設したことで、多孔板上の液深を浅く、かつ、
気液接触面積を広くとることができ、気液接触装
置の運転費並びに装置価格を低減できると共に、
ウイーピング現象および液膜の部分発泡現象を抑
制し、高い気液接触効率が得られる効果がある。 As explained above, the present invention provides at least two or more radial overflow pipes provided radially from the center of the shelf, and a porous hole divided into a number equal to the radial number in the overflow pipe. A shelf configured with a plate and a number of liquid receiving plates at least equal to the number of rays provided along the inner wall of the cylindrical container around the periphery of the shelf;
A liquid receiving plate provided radially in the radial direction with a number of radiations equal to the number of radiations of the overflow pipe of this shelf, a perforated plate divided by the liquid receiving plate into a number equal to the number of radiations, and a perforated plate on the inner wall of the cylindrical container. A perforated plate is constructed by alternately installing in the height direction of the cylindrical container another shelf consisting of a number of overflow pipes at least equal to the number of radials provided on the periphery of the shelf along the cylindrical container. Shallow the upper liquid depth, and
The gas-liquid contact area can be widened, and the operating cost and equipment price of the gas-liquid contact device can be reduced.
It has the effect of suppressing the weeping phenomenon and the partial foaming phenomenon of the liquid film, and obtaining high gas-liquid contact efficiency.
第1図、第2図は、従来技術による気液接触装
置例を説明するもので、第1図は旋回流気液接触
装置の一棚段の平面図、第2図は、マルチパス分
留気液接触装置の一棚段の平面図である。第3図
から第7図は、本発明の一実施例を説明するもの
で、第3図は、棚段Aの平面図、第4図は、棚段
Bの平面図、第5図は、棚段A,Bを円筒状容器
に内設した状態の部分縦断面図、第6図、第7図
は、棚段の溢流管と液受板との取付け状態を示す
部分正面図である。第8図、第9図は、本発明に
よる気液接触装置の効果を従来の旋回流およびマ
ルチパス分留気液接触装置と比較し説明するもの
で、第8図は、気液接触装置の塔径と多孔板上の
液深との関係図、第9図は、気液接触装置の塔径
と気液接触面積比との関係図である。第10図、
第11図は、放射数を変えた場合の本発明の応用
実施例を説明するもので、第10図は、放射数が
4の場合の棚段の平面図、第11図は、放射数が
2の場合の棚段の平面図である。第12図から第
14図は、本発明の他の実施例を説明するもの
で、第12図は、棚段A′の平面図、第13図
は、棚段B′の平面図、第14図は、棚段A′,
B′を円筒状容器に内設した状態の部分縦断面図で
ある。第15図から第17図は、本発明の更に他
の実施例を説明するもので、第15図は、棚段
A″の平面図、第16図は、棚段B″の平面図、第
17図は、棚段Bの平面図である。
1a……旋回流形式棚段、1b……マルチパス
分留形式棚段、1c……棚段A、1d……棚段
B、1e……放射数4棚段、1f……放射数2棚
段、1g……棚段A′、1h……棚段B′、1i…
…棚段A″、1j……棚段B″、1k……棚段B
、2c,2d,2e……液受板、3c,3d,
3e,3f……溢流管、4c,4d……多孔板、
5c,5d……出口堰、6……円筒状容器、9
a,9b……入口堰、12a,12b……開口
部、13……補強部材。
Figures 1 and 2 are for explaining an example of a gas-liquid contacting device according to the prior art. FIG. 3 is a plan view of one shelf of the gas-liquid contact device. 3 to 7 illustrate one embodiment of the present invention. FIG. 3 is a plan view of shelf A, FIG. 4 is a plan view of shelf B, and FIG. FIGS. 6 and 7 are partial vertical cross-sectional views of the shelves A and B installed inside the cylindrical container, and are partial front views showing how the overflow pipes and liquid receiving plates of the shelves are attached. . 8 and 9 illustrate the effects of the gas-liquid contact device according to the present invention in comparison with conventional swirling flow and multi-pass fractional distillation gas-liquid contact devices. FIG. 9 is a diagram showing the relationship between the column diameter and the liquid depth on the porous plate, and FIG. 9 is a diagram showing the relationship between the column diameter and the gas-liquid contact area ratio of the gas-liquid contact device. Figure 10,
FIG. 11 explains an applied example of the present invention when the number of radiations is changed. FIG. 10 is a plan view of the shelf when the number of radiations is 4, and FIG. FIG. 2 is a plan view of the shelves in case 2; 12 to 14 are for explaining other embodiments of the present invention, in which FIG. 12 is a plan view of shelf A', FIG. 13 is a plan view of shelf B', and FIG. The figure shows shelf A′,
FIG. 3 is a partial longitudinal cross-sectional view of B′ installed inside a cylindrical container. FIGS. 15 to 17 explain still other embodiments of the present invention, and FIG. 15 shows shelf shelves.
A'' is a plan view, FIG. 16 is a plan view of shelf B'', and FIG. 17 is a plan view of shelf B. 1a...Swirl flow type tray, 1b...Multi-pass fractionation type tray, 1c...Shelf A, 1d...Shelf B, 1e...Shelf number of 4 radiations, 1f...Shelf number of radiation number 2 Tier, 1g...Shelf A', 1h...Shelf B', 1i...
...shelf A'', 1j...shelf B'', 1k...shelf B
, 2c, 2d, 2e...liquid receiving plate, 3c, 3d,
3e, 3f... Overflow pipe, 4c, 4d... Perforated plate,
5c, 5d... Outlet weir, 6... Cylindrical container, 9
a, 9b... Inlet weir, 12a, 12b... Opening, 13... Reinforcement member.
Claims (1)
り流入した被処理液体を受ける液受板および被処
理液体を膜状とし、気体と気液接触させる多孔板
から構成される棚段を複数個円筒状容器の高さ方
向に内設されてなる気液接触装置において、中心
から半径方向に放射状に設けられる少なくとも2
個以上の放射数の溢流管と、該溢流管で前記放射
数と等しい数に分割された多孔板と、前記円筒状
容器内壁に沿つて周辺部に設けられる少なくとも
前記放射数に等しい個数の液受板から構成される
棚段と、該棚段の前記溢流管の放射数に等しい数
で中心から半径方向に放射状に設けられる液受板
と、該液受板で放射数と等しい数に分割された多
孔板と、前記円筒状容器内壁に沿つて周辺部に設
けられる少なくとも前記放射数に等しい個数の溢
流管から構成される別の棚段とを、前記円筒状容
器の高さ方向に交互に内設したことを特徴とする
気液接触装置。 2 前記棚段の溢流管側壁下端の半径方向外端部
を、下方に設置された前記別の棚段の液受板に密
着させ、この端部を除く前記棚段の溢流管側壁下
端を切欠き開口部を形成させ、また、前記別の棚
段の溢流管側壁下端の両端部を、更に下方に設置
された前記棚段の液受板に密着させ、この両端部
を除く前記別の棚段の溢流管側壁下端を切欠き開
口部を形成させた特許請求の範囲第1項記載の気
液接触装置。 3 前記棚段の溢流管の両縁に出口堰を、液受板
の多孔板側の一部に入口堰を設け、並びに、前記
別の棚段の溢流管の多孔板側に出口堰を、液受板
の両側に一部入口堰を設けた特許請求の範囲第1
項記載の気液接触装置。 4 前記棚段並びに前記別の棚段から出口堰、入
口堰を除去した特許請求の範囲第1項記載の気液
接触装置。 5 前記棚段の液受板の形状を、ほぼ弦月状並び
に部分円環状とし、また、前記別の棚段の溢流管
の形状を、ほぼ弦月状並びに部分円環状とした特
許請求の範囲第1項記載の気液接触装置。 6 多孔板外周縁より補強部材を突出し、該補強
部材を前記円筒状容器内壁に固設した特許請求の
範囲第1項記載の気液接触装置。[Scope of Claims] 1. An overflow pipe that collects and flows out the liquid to be treated, a liquid receiving plate that receives the liquid to be treated that flows in from the overflow pipe, and a porous plate that makes the liquid to be treated into a film and brings it into gas-liquid contact with gas. In a gas-liquid contact device comprising a plurality of shelves arranged in the height direction of a cylindrical container, at least two shelves are provided radially from the center in a radial direction.
overflow pipes having a number of rays or more, a perforated plate divided into a number equal to the number of rays by the overflow pipe, and a number of at least equal to the number of rays provided at a peripheral portion along the inner wall of the cylindrical container. A shelf consisting of liquid receiving plates, a liquid receiving plate provided radially from the center in a number equal to the number of radials of the overflow pipes of the shelf, and a liquid receiving plate having a number equal to the number of radials in the liquid receiving plate. A perforated plate divided into a number of holes and another shelf consisting of a number of overflow pipes provided at the periphery along the inner wall of the cylindrical container, the number of which is at least equal to the number of radials, are arranged at the height of the cylindrical container. A gas-liquid contact device characterized in that the devices are installed alternately in the horizontal direction. 2. Bring the radially outer end of the lower end of the side wall of the overflow pipe of the shelf into close contact with the liquid receiving plate of the other shelf installed below, and the lower end of the side wall of the overflow pipe of the shelf excluding this end. to form a notch opening, and both ends of the lower end of the side wall of the overflow pipe of the other shelf are brought into close contact with the liquid receiving plate of the shelf installed further below, and the The gas-liquid contact device according to claim 1, wherein a cutout opening is formed in the lower end of the side wall of the overflow pipe of another shelf. 3 An outlet weir is provided on both edges of the overflow pipe of the shelf, an inlet weir is provided on a part of the perforated plate side of the liquid receiving plate, and an outlet weir is provided on the perforated plate side of the overflow pipe of the other shelf. Claim 1, in which part of the inlet weir is provided on both sides of the liquid receiving plate.
Gas-liquid contact device described in Section 1. 4. The gas-liquid contact device according to claim 1, wherein the outlet weir and the inlet weir are removed from the shelf and the other shelf. 5. The shape of the liquid receiving plate of the shelf is substantially crescent-shaped and partially annular, and the overflow pipe of the other shelf is shaped substantially crescent-shaped and partially annular. The gas-liquid contact device according to scope 1. 6. The gas-liquid contact device according to claim 1, wherein a reinforcing member protrudes from the outer peripheral edge of the perforated plate, and the reinforcing member is fixed to the inner wall of the cylindrical container.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6834581A JPS57184429A (en) | 1981-05-08 | 1981-05-08 | Gas-liquid contact apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6834581A JPS57184429A (en) | 1981-05-08 | 1981-05-08 | Gas-liquid contact apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57184429A JPS57184429A (en) | 1982-11-13 |
| JPS625001B2 true JPS625001B2 (en) | 1987-02-03 |
Family
ID=13371147
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6834581A Granted JPS57184429A (en) | 1981-05-08 | 1981-05-08 | Gas-liquid contact apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57184429A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6339401U (en) * | 1986-08-28 | 1988-03-14 |
-
1981
- 1981-05-08 JP JP6834581A patent/JPS57184429A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57184429A (en) | 1982-11-13 |
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