JPS6251216B2 - - Google Patents
Info
- Publication number
- JPS6251216B2 JPS6251216B2 JP9604181A JP9604181A JPS6251216B2 JP S6251216 B2 JPS6251216 B2 JP S6251216B2 JP 9604181 A JP9604181 A JP 9604181A JP 9604181 A JP9604181 A JP 9604181A JP S6251216 B2 JPS6251216 B2 JP S6251216B2
- Authority
- JP
- Japan
- Prior art keywords
- silica glass
- acid
- glass powder
- sol
- optical fibers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/10—Forming beads
- C03B19/1005—Forming solid beads
- C03B19/106—Forming solid beads by chemical vapour deposition; by liquid phase reaction
- C03B19/1065—Forming solid beads by chemical vapour deposition; by liquid phase reaction by liquid phase reactions, e.g. by means of a gel phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/0128—Manufacture of preforms for drawing fibres or filaments starting from pulverulent glass
- C03B37/01291—Manufacture of preforms for drawing fibres or filaments starting from pulverulent glass by progressive melting, e.g. melting glass powder during delivery to and adhering the so-formed melt to a target or preform, e.g. the Plasma Oxidation Deposition [POD] process
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Dispersion Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Glass Melting And Manufacturing (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
- Silicon Compounds (AREA)
Description
【発明の詳細な説明】
本発明は、高い製造速度で気泡のない均質且つ
透明な光フアイバ用シリカガラスを製造する方法
に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing bubble-free, homogeneous and transparent silica glass for optical fibers at a high production rate.
従来、光フアイバ用シリカガラス、特にドープ
トシリカガラスの製造方法(特願昭55−126556号
明細書等参照)においては、例えば四塩化けい素
の蒸気とドーパント例えば四塩化ゲルマニウムの
蒸気のようなガラス形成原料ガスを酸素及び必要
に応じて担持ガスと共に両端で保持回転され周囲
から火炎バーナー等で加熱して吹込んで火炎加水
分解又は熱酸化してガラス微粒子を生成させてい
た。この場合、ガラス微粒子は気相から固相への
反応によつて生成されるため、その微粒子の大き
さは、火炎加水分解(1000〜1300℃)の場合で
500〜2000Å、熱酸化(1000〜1300℃)の場合で
100〜500Å程度と極めて小さかつた。一方、ガラ
ス微粒子を火炎又はプラズマ炎中に供給して溶融
し、気泡のない透明なドープトシリカガラスを高
速で製造するためには、該微粒子の大きさは10〜
100μm程度が最適であることが知られている。 Conventionally, in the manufacturing method of silica glass for optical fibers, especially doped silica glass (see Japanese Patent Application No. 55-126556, etc.), for example, silicon tetrachloride vapor and a dopant such as germanium tetrachloride vapor have been used. Glass-forming raw material gas, together with oxygen and optionally a carrier gas, is held and rotated at both ends, heated with a flame burner, etc., and blown in from the surroundings to undergo flame hydrolysis or thermal oxidation to produce glass particles. In this case, the glass particles are generated by the reaction from the gas phase to the solid phase, so the size of the particles is different from that in the case of flame hydrolysis (1000-1300℃).
500~2000Å, in case of thermal oxidation (1000~1300℃)
It was extremely small, about 100 to 500 Å. On the other hand, in order to produce bubble-free transparent doped silica glass at high speed by feeding glass particles into a flame or plasma flame and melting them, the size of the particles must be 10 to 10.
It is known that about 100 μm is optimal.
したがつて、従来の方法で生成したガラス微粒
子の場合、次工程の火炎又はプラズマ炎による溶
融、透明ガラス化(1400〜1800℃)により残留気
泡のないドープトシリカガラスを高い製造速度で
得るためには、溶融透明ガラス化に先立ち、該微
粒子を熱処理(1200〜1500℃)し、粒径10〜100
μm程度の2次粒子を生成させる必要があるとい
う欠点があつた。 Therefore, in the case of glass particles produced by conventional methods, in order to obtain doped silica glass without residual bubbles at a high production rate by melting with flame or plasma flame in the next step and turning it into transparent vitrification (1400-1800°C). In this method, the fine particles are heat-treated (1200-1500°C) to reduce the particle size to 10-100℃ prior to melting and transparent vitrification.
There was a drawback that it was necessary to generate secondary particles of about μm size.
本発明の目的は、この欠点を解消し、特定の手
段により粒径の大きいシリカ系のガラス粉末を生
成させ、高い製造速度で均質な光フアイバ用シリ
カガラスを製造する方法を提供することにある。 An object of the present invention is to eliminate this drawback and provide a method for producing homogeneous silica glass for optical fibers at a high production rate by producing silica-based glass powder with a large particle size by specific means. .
本発明につき概説すれば、本発明の光フアイバ
用シリカガラスの製造方法は、アルキルシリケー
トを加水分解してゾル状溶液を生成し、該ゾル状
溶液を噴霧ノズルより加熱帯域中に噴霧してシリ
カガラス粉末を生成し、次いで該ガラス粉末を火
炎又はプラズマ炎中に供給して溶融、透明ガラス
化することを特徴とするものである。 To summarize the present invention, the method for producing silica glass for optical fibers of the present invention involves hydrolyzing alkyl silicate to produce a sol solution, and spraying the sol solution into a heating zone from a spray nozzle to form silica glass. This method is characterized in that glass powder is produced, and then the glass powder is fed into a flame or plasma flame to melt it and turn it into transparent vitrification.
本発明においては、ガラス原料としてアルキル
シリケート(けい酸の部分又は完全アルキルエス
テル)を使用し、更には所望に応じて、これにド
ーパント材料(ガラスの屈折率を変化させる添加
物)として、リン酸、スズ酸、鉛酸、亜鉛酸、ホ
ウ酸、チタン酸、アルミン酸及びゲルマニウム酸
よりなる群から選ばれた少なくとも1種の酸の部
分又は完全アルキルエステルを混合して用いるこ
とができる。 In the present invention, an alkyl silicate (partial or complete alkyl ester of silicic acid) is used as a glass raw material, and if desired, phosphoric acid is added to this as a dopant material (an additive that changes the refractive index of the glass). A partial or complete alkyl ester of at least one acid selected from the group consisting of , stannic acid, lead acid, zinc acid, boric acid, titanic acid, aluminic acid, and germanic acid can be used in combination.
これらのアルキルエステルとしては、代表的
に、テトラメチルシリケート、テトラエチルシリ
ケート、テトラプロピルシリケート、テトラブチ
ルシリケート並びにテトラメチルゲルマネート、
テトラエチルゲルマネート、テトラプロピルゲル
マネート、テトラブチルゲルマネート等を好適に
使用することができるが、必ずしもこれらに限定
されず、それらの部分エステルでもよい。 These alkyl esters typically include tetramethyl silicate, tetraethyl silicate, tetrapropyl silicate, tetrabutyl silicate, and tetramethyl germanate.
Tetraethyl germanoate, tetrapropyl germanoate, tetrabutyl germanoate, etc. can be suitably used, but the present invention is not necessarily limited to these, and partial esters thereof may also be used.
アルキルシリケートとドーパント材料の配合割
合は、目的とする光フアイバ母材の屈折率及び、
該材料の種類に応じて適宜選択することができ、
特に限定されない。 The blending ratio of alkyl silicate and dopant material is determined by the refractive index of the target optical fiber base material,
Can be selected appropriately depending on the type of material,
Not particularly limited.
本発明においては、例えば上記テトラメチルシ
リケートのようなアルキルシリケートとメチルア
ルコールのようなアルコールとを体積比1:9程
度に混合し、これに水を添加して加水分解し、ゾ
ル状溶液(シリカゾル液)を生成し、このゾル状
溶液を毎分100c.c.程度、そして又2気圧程度の圧
縮ガスを毎分10程度の割合でそれぞれ噴霧ノズ
ルに供給し、大きさ10〜100μm程度、望ましく
は70〜80μm程度のゾル液滴として噴霧ノズルの
先端から噴霧する。この際圧縮ガスとしてはアル
ゴン等の不活性ガスを使用し、圧縮ガス圧は1〜
3気圧とすることが適当であり、圧力を高めると
液滴の径が小さくなり、生成するシリカガラスの
粒径が小さくなる。炉心管内(加熱帯域)の雰囲
気は、雰囲気ガス供給口から、所望に応じてゲル
化促進剤としてアンモニア(NH4OH)を5モル
%以上含むアルゴンガス等の不活性ガスを雰囲気
ガスとして毎分10程度供給する。 In the present invention, for example, an alkyl silicate such as the above-mentioned tetramethyl silicate and an alcohol such as methyl alcohol are mixed at a volume ratio of about 1:9, water is added to the mixture for hydrolysis, and a sol-like solution (silica sol) is prepared. This sol-like solution is supplied to the spray nozzle at a rate of about 100 c.c. per minute, and compressed gas of about 2 atmospheres is supplied to the spray nozzle at a rate of about 10 per minute. is sprayed from the tip of a spray nozzle as sol droplets of approximately 70 to 80 μm. At this time, an inert gas such as argon is used as the compressed gas, and the compressed gas pressure is 1 to 1.
It is appropriate to set the pressure to 3 atm, and as the pressure is increased, the diameter of the droplets becomes smaller and the particle size of the silica glass produced becomes smaller. The atmosphere inside the reactor core tube (heating zone) is controlled by inert gas such as argon gas containing 5 mol% or more of ammonia (NH 4 OH) as a gelling promoter from the atmosphere gas supply port every minute as the atmosphere gas. Supply about 10.
雰囲気ガス中のアンモニアは必ずしも必要では
ないが、ゲル化促進のため使用することが望まし
い。アンモニアが高濃度であるほど促進効果は大
きいが上記5モル%以上あれば十分である。又、
炉心管内(加熱帯域)の温度は、100〜1000℃の
範囲内が適当であるが、温度が低いと水又はアル
キルエステル等が残留しやすく製品の光学特性及
び機械的特性(強度)が低下する。他方、あまり
高温では不都合である。それ故、炉心管内の最高
温度は、500℃程度とするのが最適であり、それ
によつて粒径20〜30μmのシリカガラス粉末を得
ることができる。又、上記ゾル状溶液の粘度が高
いと噴霧時に霧状になり難く、103ポイズ以下と
することが必要である。 Although ammonia in the atmospheric gas is not necessarily necessary, it is desirable to use it to promote gelation. The higher the concentration of ammonia, the greater the promoting effect, but the above 5 mol% or more is sufficient. or,
The appropriate temperature in the furnace tube (heating zone) is within the range of 100 to 1000℃, but if the temperature is low, water or alkyl esters are likely to remain, reducing the optical properties and mechanical properties (strength) of the product. . On the other hand, too high a temperature is inconvenient. Therefore, it is optimal that the maximum temperature in the furnace tube is about 500°C, thereby making it possible to obtain silica glass powder with a particle size of 20 to 30 μm. Furthermore, if the viscosity of the sol-like solution is high, it is difficult to form a mist during spraying, so it is necessary to keep the viscosity at 10 3 poise or less.
更に、本発明においては、上記した水又はアル
キルエステル等の残留をなくすため、生成したシ
リカガラス粉末を溶融、透明ガラス化するに先立
ち、熱処理を行うことが好ましい。熱処理条件は
800〜1500℃の温度で30分〜2時間とすることが
適当である。 Furthermore, in the present invention, in order to eliminate the residual water or alkyl ester, etc., it is preferable to heat-treat the produced silica glass powder before melting it to make it transparent vitrified. The heat treatment conditions are
It is appropriate to heat at a temperature of 800 to 1500°C for 30 minutes to 2 hours.
以上の処理により、粒径10〜100μm程度のシ
リカガラス粉末を高い製造速度(例えば毎時500
〜1000g)で形成することができ、且つ粒径が均
一でばらつきがなく、所望の粒径のものを得るこ
とができる。 Through the above processing, silica glass powder with a particle size of about 10 to 100 μm can be produced at a high production rate (for example, 500 μm/hour).
~1000g), and the particle size is uniform with no variation, making it possible to obtain particles of the desired particle size.
次いで、このシリカガラス粉末を、既知の方法
によりトーチから吹出す火炎又はプラズマ炎
(1400〜1800℃)中に供給し、溶融、透明ガラス
化して気泡のない均質な光フアイバ用シリカガラ
ス母材を高速度で製造することができる。 Next, this silica glass powder is fed into a flame or plasma flame (1400 to 1800°C) blown out from a torch by a known method, and is melted and turned into transparent vitrification to produce a bubble-free homogeneous silica glass base material for optical fiber. Can be manufactured at high speed.
次に、本発明を図面を参照して説明する。 Next, the present invention will be explained with reference to the drawings.
図面は本発明におけるシリカガラス粉末の生成
装置の一具体例を示した断面概略図であり、符号
1はゾル状溶液の加圧用ガス供給口、2はゾル状
溶液、3はゾル状溶液の収納容器、4は輸送管、
5は流量調整器、6は噴霧ノズル、7は雰囲気ガ
ス供給口、8は圧縮ガス供給口、9はゾル液滴、
10は発熱体、11は炉心管、12は排気口、1
3はシリカガラス粉末の収納容器、14はシリカ
ガラス粉末を示す。 The drawing is a schematic cross-sectional view showing a specific example of the silica glass powder production apparatus according to the present invention, in which reference numeral 1 indicates a gas supply port for pressurizing a sol solution, 2 indicates a sol solution, and 3 indicates a housing for the sol solution. container, 4 is a transport pipe,
5 is a flow rate regulator, 6 is a spray nozzle, 7 is an atmospheric gas supply port, 8 is a compressed gas supply port, 9 is a sol droplet,
10 is a heating element, 11 is a furnace tube, 12 is an exhaust port, 1
3 is a storage container for silica glass powder, and 14 is a silica glass powder.
ゾル状溶液の収納容器3内に収納したアルキル
シリケートを加水分解して得たゾル状溶液(シリ
カゾル液)2は、加圧用ガス供給口1より供給さ
れるガスにより加圧され、輸送管4を通つて噴霧
ノズル6内に供給される。ゾル状溶液2の供給量
は流量調整器5により調整される。噴霧ノズル6
内に供給されたゾル状溶液2は、噴霧ノズル6の
先端から噴出すると同時に、圧縮ガス供給口8か
ら供給される圧縮ガスにより霧状になり、ゾル液
滴9(大きさ10〜100μm程度)を形成し、発熱
体10により加熱された炉心管11内(加熱帯
域)でゲル化し、シリカガラス粉末の収納容器1
3内にシリカガラス粉末14が得られる。この
時、ゲル化に伴つて発生するガス及び噴霧ノズル
6から噴出する圧縮ガスは排気口12から排気さ
れる。 The sol solution (silica sol liquid) 2 obtained by hydrolyzing the alkyl silicate stored in the sol solution storage container 3 is pressurized by the gas supplied from the pressurizing gas supply port 1, and is passed through the transport pipe 4. is supplied into the spray nozzle 6 through the spray nozzle 6. The supply amount of the sol solution 2 is adjusted by a flow rate regulator 5. Spray nozzle 6
The sol-like solution 2 supplied into the interior is ejected from the tip of the spray nozzle 6, and at the same time becomes atomized by the compressed gas supplied from the compressed gas supply port 8, forming sol droplets 9 (about 10 to 100 μm in size). is formed and gelled in the furnace tube 11 (heating zone) heated by the heating element 10, and the silica glass powder is stored in the storage container 1.
Silica glass powder 14 is obtained in 3. At this time, the gas generated as a result of gelation and the compressed gas ejected from the spray nozzle 6 are exhausted from the exhaust port 12.
このようにして生成されたシリカガラス粉末の
溶融、透明ガラス化は前記既知の方法により、酸
素、水素ガスと共に吹出す火炎中に供給し、この
火炎の熱により溶融、透明ガラス化することによ
り行われ、光フアイバ用シリカガラスが製造され
る(図面は省略する)。 The silica glass powder thus produced is melted and made into transparent vitrification by being supplied into a flame blowing out together with oxygen and hydrogen gas, and the silica glass powder produced in this way is melted and made into transparent vitrification by the heat of the flame. Then, silica glass for optical fibers is manufactured (the drawings are omitted).
次に、本発明を実施例により説明するが、本発
明はこれらによりなんら限定されるものではな
い。 Next, the present invention will be explained with reference to Examples, but the present invention is not limited to these in any way.
実施例 1
テトラメチルシリケート〔Si(OCH3)4〕とメチ
ルアルコールとを体積比1:9で混合し、これに
水を添加して加水分解し、ゾル状溶液を得た。こ
のゾル状溶液を前記図面に示した方法により処理
し、シリカガラス粉末を生成させた。すなわち、
このゾル状溶液を毎分100c.c.、2気圧の圧縮アル
ゴンガスを毎分10の割合でそれぞれ噴霧ノズル
6に供給し、大きさ70〜80μmのゾル液滴9を噴
霧ノズル6の先端から噴霧した。更に、雰囲気ガ
ス供給口7から雰囲気ガスとしてアンモニア5モ
ル%を含むアルゴンガスを毎分10の量で供給
し、炉心管11(加熱帯域)内の温度を最高約
500℃に保持した。その結果、収納容器13に粒
径20〜30μmのゲル化したシリカガラス粉末が得
られた。Example 1 Tetramethylsilicate [Si(OCH 3 ) 4 ] and methyl alcohol were mixed at a volume ratio of 1:9, and water was added to the mixture for hydrolysis to obtain a sol solution. This sol-like solution was treated by the method shown in the drawing to produce silica glass powder. That is,
This sol-like solution is supplied to the spray nozzle 6 at a rate of 100 c.c. per minute and compressed argon gas at 2 atmospheres at a rate of 10 per minute, respectively, and sol droplets 9 with a size of 70 to 80 μm are released from the tip of the spray nozzle 6. Sprayed. Furthermore, argon gas containing 5 mol% ammonia is supplied as an atmospheric gas from the atmospheric gas supply port 7 at a rate of 10% per minute to maintain the temperature in the furnace core tube 11 (heating zone) at a maximum of approximately
It was maintained at 500°C. As a result, gelled silica glass powder with a particle size of 20 to 30 μm was obtained in the storage container 13.
次いで常法に従い、酸素毎分100、水素毎分
100で吹き出す火炎中に上記シリカガラス粉末
を毎分10g供給し、1600〜1800℃の温度で溶融、
透明ガラス化し、シリカガラスを得た。このシリ
カガラスの屈折率をアツベ屈折計で測定したとこ
ろ、1.458の値が得られ、又、ガラス中に気泡も
みられず光フアイバ用母材ガラスとして十分使用
することができた。 Then, according to the usual method, oxygen per minute and hydrogen per minute were applied.
10 g of the above silica glass powder was fed per minute into the flame blowing out at 100 °C, and it was melted at a temperature of 1600 to 1800 °C.
Transparent vitrification was performed to obtain silica glass. When the refractive index of this silica glass was measured with an Atsube refractometer, a value of 1.458 was obtained, and no bubbles were observed in the glass, so it could be used satisfactorily as a base material glass for optical fibers.
実施例 2
テトラメチルシリケート〔Si(OCH3)4〕とドー
パントとしてテトラメチルゲルマネート〔Ge
(OCH3)4〕とを体積比9:1の割合で混合し、こ
の混合物とメチルアルコールとを体積比1:9で
混合し、これに水を添加して加水分解し、ゾル状
溶液を得た。以下、実施例1と同様の条件で操作
し、酸化ゲルマニウム(GeO2)約10モル%を含む
シリカガラス粉末(粒径20〜30μm)が得られ
た。Example 2 Tetramethyl silicate [Si(OCH 3 ) 4 ] and tetramethyl germanate [Ge
(OCH 3 ) 4 ] at a volume ratio of 9:1, this mixture and methyl alcohol at a volume ratio of 1:9, water is added to this for hydrolysis, and a sol-like solution is obtained. Obtained. Thereafter, the operation was carried out under the same conditions as in Example 1, and silica glass powder (particle size 20 to 30 μm) containing about 10 mol % of germanium oxide (GeO 2 ) was obtained.
以下、溶融、透明ガラス化温度を1500〜1700℃
とした以外は実施例1と同様の操作によりドープ
トシリカガラスを得た。このガラスの屈折率は
1.472であり、石英ガラスの屈折率(1.458)に比
べて約1%程度高く、又、ガラス中に気泡もみら
れず均一で光フアイバ用母材ガラスとして十分使
用することができた。 The melting and transparent vitrification temperature is below 1500~1700℃
Doped silica glass was obtained by the same operation as in Example 1 except for the following. The refractive index of this glass is
The refractive index of the glass was 1.472, which was approximately 1% higher than the refractive index of silica glass (1.458), and there were no bubbles in the glass, which was uniform and could be used satisfactorily as a base glass for optical fibers.
実施例 3
実施例1と同一原料及び操作により、粒径20〜
30μmのゲル化したシリカガラス粉末を得た。Example 3 Using the same raw materials and operations as Example 1, a particle size of 20~
A gelled silica glass powder of 30 μm was obtained.
次いで、生成した上記シリカガラス粉末を1000
℃で約2時間熱処理して水及びアルキルエステル
等の含有量の少ない天然石英に近いシリカガラス
粉末を得た。 Next, the generated silica glass powder was mixed with 1000
A heat treatment was performed at ℃ for about 2 hours to obtain a silica glass powder close to natural quartz with a low content of water and alkyl esters.
以下、実施例1と同様の条件で操作し、屈折率
1.458の値を有する透明シリカガラスを得た。こ
のガラス中には気泡もみられず光フアイバ用母材
ガラスとして十分使用することができた。 Hereinafter, operations were performed under the same conditions as in Example 1, and the refractive index
A transparent silica glass with a value of 1.458 was obtained. No air bubbles were observed in this glass, and it could be used satisfactorily as a base material glass for optical fibers.
以上説明したように、本発明によれば、粒径の
大きい(10〜100μm)シリカガラス粉末を生成
し、これを常法により溶融、透明ガラス化してシ
リカガラスを高速で製造することができる。又、
ゾル状溶液からシリカガラス粉末を生成するた
め、製造した各種のドーパントを添加したドープ
トシリカガラスは、両材料が分子レベルで均一に
混合(結合)しており、気泡のない非常に均質な
組成を有するという利点を有する。 As explained above, according to the present invention, silica glass powder can be produced at high speed by producing silica glass powder with a large particle size (10 to 100 μm), and melting this by a conventional method to make it transparent vitrified. or,
In order to generate silica glass powder from a sol-like solution, the doped silica glass produced by adding various dopants has a very homogeneous composition with no bubbles, as both materials are evenly mixed (combined) at the molecular level. It has the advantage of having
図面は本発明におけるシリカガラス粉末の生成
装置の一具体例を示した断面概略図である。
1……ゾル状溶液の加圧用ガス供給口、2……
ゾル状溶液、3……ゾル状溶液の収納容器、4…
…輸送管、5……流量調整器、6……噴霧ノズ
ル、7……雰囲気ガス供給口、8……圧縮ガス供
給口、9……ゾル液滴、10……発熱体、11…
…炉心管、12……排気口、13……シリカガラ
ス粉末の収納容器、14……シリカガラス粉末。
The drawing is a schematic cross-sectional view showing a specific example of a silica glass powder production apparatus according to the present invention. 1... Gas supply port for pressurizing sol solution, 2...
Sol-like solution, 3... Storage container for sol-like solution, 4...
...Transport pipe, 5...Flow rate regulator, 6...Spray nozzle, 7...Atmospheric gas supply port, 8...Compressed gas supply port, 9...Sol droplet, 10...Heating element, 11...
... Furnace core tube, 12 ... Exhaust port, 13 ... Storage container for silica glass powder, 14 ... Silica glass powder.
Claims (1)
液を生成し、該ゾル状溶液を噴霧ノズルより加熱
帯域中に噴霧してシリカガラス粉末を生成し、次
いで該ガラス粉末を火炎又はプラズマ炎中に供給
して溶融、透明ガラス化することを特徴とする光
フアイバ用シリカガラスの製造方法。 2 加水分解前のアルキルシリケートにドーパン
ト材料としてリン酸、スズ酸、鉛酸、亜鉛酸、ホ
ウ酸、チタン酸、アルミン酸及びゲルマニウム酸
よりなる群から選ばれた少なくとも1種の酸の部
分又は完全アルキルエステルを混合して加水分解
する特許請求の範囲第1項記載の光フアイバ用シ
リカガラスの製造方法。 3 シリカガラス粉末を溶融、透明ガラス化する
に先立ち熱処理する特許請求の範囲第1項又は第
2項記載の光フアイバ用シリカガラスの製造方
法。[Claims] 1. Hydrolyze an alkyl silicate to produce a sol solution, spray the sol solution from a spray nozzle into a heating zone to produce silica glass powder, and then spray the glass powder with a flame or A method for producing silica glass for optical fibers, which comprises supplying silica glass to a plasma flame to melt it and turn it into transparent glass. 2 Partial or complete addition of at least one acid selected from the group consisting of phosphoric acid, stannic acid, lead acid, zinc acid, boric acid, titanic acid, aluminic acid and germanic acid as a dopant material to the alkyl silicate before hydrolysis. The method for producing silica glass for optical fibers according to claim 1, wherein alkyl esters are mixed and hydrolyzed. 3. The method for producing silica glass for optical fibers according to claim 1 or 2, wherein the silica glass powder is heat-treated before being melted and turned into transparent vitrification.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9604181A JPS582233A (en) | 1981-06-23 | 1981-06-23 | Manufacture of silica glass for optical fiber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9604181A JPS582233A (en) | 1981-06-23 | 1981-06-23 | Manufacture of silica glass for optical fiber |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS582233A JPS582233A (en) | 1983-01-07 |
| JPS6251216B2 true JPS6251216B2 (en) | 1987-10-29 |
Family
ID=14154401
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9604181A Granted JPS582233A (en) | 1981-06-23 | 1981-06-23 | Manufacture of silica glass for optical fiber |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS582233A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS642106U (en) * | 1987-06-24 | 1989-01-09 |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2545282B2 (en) * | 1989-04-17 | 1996-10-16 | 日東化学工業株式会社 | Method for producing spherical silica particles |
| FR3043683B1 (en) | 2015-11-12 | 2019-04-12 | Pylote | SPHERICAL PARTICLES CHARGED WITH COLORING AGENTS |
-
1981
- 1981-06-23 JP JP9604181A patent/JPS582233A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS642106U (en) * | 1987-06-24 | 1989-01-09 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS582233A (en) | 1983-01-07 |
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