JPS6251760B2 - - Google Patents
Info
- Publication number
- JPS6251760B2 JPS6251760B2 JP54163709A JP16370979A JPS6251760B2 JP S6251760 B2 JPS6251760 B2 JP S6251760B2 JP 54163709 A JP54163709 A JP 54163709A JP 16370979 A JP16370979 A JP 16370979A JP S6251760 B2 JPS6251760 B2 JP S6251760B2
- Authority
- JP
- Japan
- Prior art keywords
- boron
- tip
- vapor deposition
- nib
- small tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910052796 boron Inorganic materials 0.000 claims description 34
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 31
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 14
- 239000010936 titanium Substances 0.000 claims description 14
- 229910052719 titanium Inorganic materials 0.000 claims description 14
- 238000005229 chemical vapour deposition Methods 0.000 claims description 8
- 238000005240 physical vapour deposition Methods 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 4
- -1 boron halide Chemical class 0.000 claims description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 2
- 239000001257 hydrogen Substances 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 238000000034 method Methods 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910001220 stainless steel Inorganic materials 0.000 description 4
- 239000010935 stainless steel Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 2
- 150000001638 boron Chemical class 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 1
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Pens And Brushes (AREA)
- Recording Measured Values (AREA)
Description
【発明の詳細な説明】
本発明は墨汁あるいはインク等の記録用液体を
用いて図面、グラフ等を作成する際に必要な精密
な細線を引き描くに好適な耐摩耗性に優れ、滑り
が良く、書き易い小管ペン先用チツプの製造方法
に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention has excellent abrasion resistance and good sliding properties, making it suitable for drawing precise thin lines necessary when creating drawings, graphs, etc. using recording liquids such as India ink or ink. , relates to a method for manufacturing a tip for a small tube nib that is easy to write with.
一般に製図あるいは地震計等の自記記録装置に
よる記録図の作成に当つて、筆記具あるいは記録
針の先端部には小管よりなるペン先が使用されて
いるが、このペン先には耐摩耗性に優れ、すべり
が良く書き易いこと、加工性の良いこと、記録用
液体によつて侵されないこと等が要求されてい
る。 In general, when drawing or creating recorded maps using self-recording devices such as seismographs, a pen nib consisting of a small tube is used at the tip of a writing instrument or recording needle, but this nib has excellent wear resistance. It is required to be smooth and easy to write on, have good workability, and not be attacked by recording liquid.
この要求を満すため、小管ペンにはステンレス
等の加工性の良い安価な金属の細管よりなるペン
先支持体に耐摩耗性の優れた材料よりなる円筒状
の小管ペン先用チツプを取りつけることでペン先
部の耐摩耗性を向上させている。 To meet this requirement, small-tube pens are equipped with a cylindrical small-tube nib tip made of a material with excellent wear resistance to a nib support made of a thin tube of an inexpensive metal that is easy to work with, such as stainless steel. This improves the wear resistance of the pen tip.
しかしながらペン先用チツプに一般に用いられ
ているステンレス等の金属は加工容易で安価では
あるが、耐摩耗性が劣り摩耗が早いため、近時で
は材料加工技術の進歩に伴い超硬合金（タングス
テンカーバイト、シリコンカーバイトおよびこれ
らの焼結物）超硬皮膜（炭化チタン、窒化チタン
などの蒸着膜）イオン窒化物、イオン硼化物、あ
るいは宝石類を用いてペン先チツプを形成する試
みがなされているが、超硬合金や宝石類では加工
性が悪く、高価となり、超硬皮膜やイオン窒化
物、イオン硼化物などの拡散被覆でも表面処理で
あるため耐摩耗性に問題がある。 However, although the metals commonly used for pen nibs, such as stainless steel, are easy to process and inexpensive, they have poor abrasion resistance and wear out quickly. Attempts have been made to form pen nib tips using carbide coatings (vapor-deposited films such as titanium carbide and titanium nitride), ion nitrides, ion borides, or jewelry. However, the workability of cemented carbide and jewelry is poor and expensive, and even cemented carbide coatings and diffusion coatings such as ion nitrides and ion borides are surface treatments, so there are problems with wear resistance.
本発明はこれらの欠点を解消するため硬度がダ
イヤモンドに次いで高く、すべりが良く、書き易
い非晶質ボロンを物理蒸着法（イオンプレーテイ
ング、高速スパツタリング等）、化学蒸着法（ハ
ロゲン化ボロンの水素還元法）によりチタンパイ
プの表面に形成させた小管ペン先用チツプの製造
方法に関するもので、大量かつ安価に小管ペン先
用チツプを製作しうるものである。 In order to eliminate these drawbacks, the present invention has developed amorphous boron, which has the second highest hardness after diamond, has good slipperiness, and is easy to write. This invention relates to a method for manufacturing small tube nib tips formed on the surface of a titanium pipe by a reduction method, which allows small tube nib tips to be manufactured in large quantities and at low cost.
以下本発明の詳細を図面について説明する。第
１図は本発明により製造された小管ペン先用チツ
プ１が、製図用筆記具の先端にあるステンレスス
チール等の金属パイプよりなるペン先チツプ支持
体４の先端に装着された状態の一例を示す。又第
２図は本発明により製造された小管ペン先用チツ
プを自記記録装置用の記録針の先端にあるペン先
用チツプ支持体４の先端に装着した一例を示す。
第３図は本発明により製造された小管ペン先用チ
ツプの一例を示すもので、基体となるチタンパイ
プ２の表面上にボロン薄層を物理的蒸着法で形成
し、しかる後更にこのボロン薄層の上に化学蒸着
法により非晶質ボロン層を形成したもので、チタ
ンパイプ上の表面に非晶質ボロン層よりなるボロ
ン層３を設けた小管ペン先用チツプ１を得ること
が出来る。 The details of the present invention will be explained below with reference to the drawings. FIG. 1 shows an example of a state in which a small tube nib tip 1 manufactured according to the present invention is attached to the tip of a pen nib tip support 4 made of a metal pipe such as stainless steel at the tip of a writing instrument for drafting. . FIG. 2 shows an example in which a small tube nib tip manufactured according to the present invention is attached to the tip of a pen nib tip support 4 at the tip of a recording stylus for a self-recording device.
FIG. 3 shows an example of a tip for a small tube nib manufactured according to the present invention, in which a thin layer of boron is formed by physical vapor deposition on the surface of a titanium pipe 2 serving as a base, and then this thin layer of boron is further formed. An amorphous boron layer is formed on the layer by chemical vapor deposition, and it is possible to obtain a tip 1 for a small tube nib in which a boron layer 3 made of an amorphous boron layer is provided on the surface of a titanium pipe.
本発明の具体的実施例の１つとして、第３図の
チタンパイプ２を外径0.35mmのチタンパイプとな
し、これを溶剤、脱脂、酸洗いにて表面処理を施
した後、10-5〜10-6Torrの真空中にて電子ビーム
加熱法でチタンパイプ２を回転させながらその表
面にボロンを２〜３μの厚さに被着させ、ボロン
薄層を形成しその後チタンパイプ２とボロン薄層
の接着強度を増すため400゜〜500℃に真空熱処理
を施す。次にこのボロン被着チタンパイプを化学
蒸着反応管内に設置して通電加熱法にて900゜〜
1200℃に加熱し三塩化ボロンと水素の混合ガスを
通じ電子ビーム加熱法で形成されたボロン薄層の
上に第２のボロン層を折出させる。このボロン層
は非晶質で硬度9.5、ヤング率42000×108dyne1cm2
の特性を有し耐摩耗性と高強度を有する優れた小
管ペン先用チツプを形成する。第３図において、
３は物理蒸着法及び化学蒸着法により形成された
ボロン層を示す。 As one specific embodiment of the present invention, the titanium pipe 2 shown in FIG . While rotating the titanium pipe 2 in a vacuum of ~10 -6 Torr using an electron beam heating method, boron is deposited on the surface to a thickness of 2 to 3 μm to form a thin layer of boron, and then the titanium pipe 2 and the boron are bonded together. Vacuum heat treatment is performed at 400° to 500°C to increase the adhesive strength of the thin layer. Next, this boron-coated titanium pipe was placed inside a chemical vapor deposition reaction tube and heated to 900° by electrical heating.
A second boron layer is deposited on the thin boron layer formed by electron beam heating by heating to 1200°C and passing a mixed gas of boron trichloride and hydrogen. This boron layer is amorphous with a hardness of 9.5 and a Young's modulus of 42000×10 8 dyne1cm 2
It forms an excellent small tube nib tip that has the following characteristics and has wear resistance and high strength. In Figure 3,
3 shows a boron layer formed by physical vapor deposition and chemical vapor deposition.
なお、第３図においてボロン層３を形成するの
に物理蒸着法のみを用い例えば真空度10-5Torr
以下の電子ビーム蒸着機にてイオンプレーテイン
グでボロン層３をチタンを材料とするチタンパイ
プ２の表面上に10〜25μの厚さに被着させる方法
も考えられる。しかしながら、物理蒸着法では得
られるボロン層が薄く、又機械的強度も低いとい
う欠点がある。一方化学蒸着法は得られる膜圧が
大きく、ボロン層の機械的強度も大きいが、ボロ
ン化学蒸着中にボロンと金属パイプとが反応し、
ボロン層に欠陥を作る等のため次第にボロン層に
割れを生じたり、ボロン層の機械的強度が低下す
る。これに対して上述の如くすれば、あらかじめ
物理蒸着法によりボロン層が形成されているの
で、化学蒸着法によるボロン層の強度が低下する
ことはない。 In addition, in FIG. 3, only the physical vapor deposition method is used to form the boron layer 3 at a vacuum degree of 10 -5 Torr.
Another possible method is to deposit the boron layer 3 to a thickness of 10 to 25 μm on the surface of the titanium pipe 2 made of titanium by ion plating using the following electron beam evaporator. However, the physical vapor deposition method has the disadvantage that the boron layer obtained is thin and has low mechanical strength. On the other hand, with the chemical vapor deposition method, the film thickness obtained is large and the mechanical strength of the boron layer is high, but the boron reacts with the metal pipe during boron chemical vapor deposition.
Due to the creation of defects in the boron layer, the boron layer gradually cracks and the mechanical strength of the boron layer decreases. On the other hand, if the above method is used, since the boron layer is formed in advance by physical vapor deposition, the strength of the boron layer formed by chemical vapor deposition will not be reduced.
上記の如く形成された小管ペン先用チツプは適
当な長さに切断され更にその先端を磨いて第４図
に示すごとく製図用紙に接する一端を丸めてすべ
り易く形成する。この様にして形成されたペン先
用チツプは第４図に示すごとくステンレススチー
ル等よりなる小管ペン先チツプ支持体４の先端に
装着される。 The tip for the small tube nib formed as described above is cut to a suitable length, and its tip is polished, and the one end in contact with the drawing paper is rounded to make it slippery, as shown in FIG. The pen nib tip formed in this manner is attached to the tip of a small tube nib tip support 4 made of stainless steel or the like, as shown in FIG.
以上の様に本発明によれば、チタンパイプに先
ず物理蒸着法によりボロン層を被着せしめ、しか
る後に化学蒸着法により、ボロン層を形成させる
ので、化学蒸着法によるボロンとチタンとの無用
の反応による強度の低下もなく、高強度のボロン
層を得ることが出来、従つて、かくの如く本発明
により作成されたチタンパイプとボロン層よりな
る新規な小管ペン先用チツプを筆記用具あるいは
記録針の先端部に装着するときは、従来の材料を
使用した小管ペン先に比し安い製造コストでペン
先の寿命を大幅に延長する大きな効果を上げるこ
とが出来る。 As described above, according to the present invention, a boron layer is first deposited on a titanium pipe by physical vapor deposition, and then a boron layer is formed by chemical vapor deposition. A high-strength boron layer can be obtained without any decrease in strength due to reaction, and therefore, the new small tube nib tip made of a titanium pipe and a boron layer produced according to the present invention can be used as a writing instrument or recording tool. When attached to the tip of a needle, it has a great effect of greatly extending the life of the pen tip at a lower manufacturing cost than small tube nibs made of conventional materials.
第１図、第２図は本発明の一実施例を示すもの
であり、第３図は本発明の要部拡大傾視図、第４
図は第３図の本発明の要部拡大断面図である。
１は小管ペン先用チツプ、２はチタンパイプ、
３はボロン層、４は小管ペン先チツプ支持体であ
る。
1 and 2 show one embodiment of the present invention, FIG. 3 is an enlarged perspective view of the main part of the present invention, and FIG.
The figure is an enlarged sectional view of the main part of the present invention shown in FIG. 3. 1 is a small tube nib tip, 2 is a titanium pipe,
3 is a boron layer, and 4 is a small tube nib tip support.
Claims (1)
ン被着チタンパイプの表面にハロゲン化ボロンの
水素還元による化学蒸着法でボロン層を形成する
ことを特徴とする小管ペン先用チツプの製造方
法。1. A method for producing a tip for a small tube pen nib, which comprises forming a boron layer on the surface of a boron-coated titanium pipe by chemical vapor deposition using hydrogen reduction of boron halide on the surface of a titanium pipe coated with boron by physical vapor deposition.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16370979A JPS5686799A (en) | 1979-12-17 | 1979-12-17 | Chip for small tube pen point |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16370979A JPS5686799A (en) | 1979-12-17 | 1979-12-17 | Chip for small tube pen point |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5686799A JPS5686799A (en) | 1981-07-14 |
| JPS6251760B2 true JPS6251760B2 (en) | 1987-10-31 |
Family
ID=15779136
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16370979A Granted JPS5686799A (en) | 1979-12-17 | 1979-12-17 | Chip for small tube pen point |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5686799A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6011398A (en) * | 1983-06-30 | 1985-01-21 | ぺんてる株式会社 | Pen point for writing utensil |
-
1979
- 1979-12-17 JP JP16370979A patent/JPS5686799A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5686799A (en) | 1981-07-14 |
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