JPS6252039B2 - - Google Patents
Info
- Publication number
- JPS6252039B2 JPS6252039B2 JP13502184A JP13502184A JPS6252039B2 JP S6252039 B2 JPS6252039 B2 JP S6252039B2 JP 13502184 A JP13502184 A JP 13502184A JP 13502184 A JP13502184 A JP 13502184A JP S6252039 B2 JPS6252039 B2 JP S6252039B2
- Authority
- JP
- Japan
- Prior art keywords
- nickel
- layer
- sulfur content
- additive compound
- bath
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 145
- 229910052759 nickel Inorganic materials 0.000 claims description 73
- 229910052717 sulfur Inorganic materials 0.000 claims description 57
- 239000011593 sulfur Substances 0.000 claims description 54
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 53
- 238000007747 plating Methods 0.000 claims description 40
- 238000000034 method Methods 0.000 claims description 29
- 150000001875 compounds Chemical class 0.000 claims description 26
- 239000000654 additive Substances 0.000 claims description 21
- 230000000996 additive effect Effects 0.000 claims description 20
- -1 2-mercaptothiazolepropanesulfonic acid Chemical compound 0.000 claims description 16
- 239000002131 composite material Substances 0.000 claims description 15
- 239000000758 substrate Substances 0.000 claims description 10
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical compound C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 claims description 9
- 239000000203 mixture Substances 0.000 claims description 9
- CBDKQYKMCICBOF-UHFFFAOYSA-N thiazoline Chemical compound C1CN=CS1 CBDKQYKMCICBOF-UHFFFAOYSA-N 0.000 claims description 9
- WGJCBBASTRWVJL-UHFFFAOYSA-N 1,3-thiazolidine-2-thione Chemical compound SC1=NCCS1 WGJCBBASTRWVJL-UHFFFAOYSA-N 0.000 claims description 6
- 238000004070 electrodeposition Methods 0.000 claims description 4
- 229910052708 sodium Inorganic materials 0.000 claims description 4
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 claims description 2
- 229910001453 nickel ion Inorganic materials 0.000 claims description 2
- 150000003839 salts Chemical class 0.000 claims 4
- FQXRYSVAAGAHLP-UHFFFAOYSA-N 2-amino-4,5-dihydro-1,3-thiazole-5-sulfonic acid Chemical compound NC1=NCC(S(O)(=O)=O)S1 FQXRYSVAAGAHLP-UHFFFAOYSA-N 0.000 claims 1
- 239000000853 adhesive Substances 0.000 claims 1
- 230000001070 adhesive effect Effects 0.000 claims 1
- 239000010410 layer Substances 0.000 description 70
- 239000012085 test solution Substances 0.000 description 29
- 238000005260 corrosion Methods 0.000 description 9
- 230000007797 corrosion Effects 0.000 description 9
- 239000011229 interlayer Substances 0.000 description 9
- 230000008901 benefit Effects 0.000 description 8
- 239000000243 solution Substances 0.000 description 7
- 150000003464 sulfur compounds Chemical class 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 239000011888 foil Substances 0.000 description 4
- 229920003023 plastic Polymers 0.000 description 4
- 239000004033 plastic Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 3
- 239000004327 boric acid Substances 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 239000010941 cobalt Substances 0.000 description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 150000002815 nickel Chemical class 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- 239000000080 wetting agent Substances 0.000 description 3
- SOSQXPIKTBUEKF-UHFFFAOYSA-N 1,4-dihexoxy-1,4-dioxobutane-2-sulfonic acid Chemical compound CCCCCCOC(=O)CC(S(O)(=O)=O)C(=O)OCCCCCC SOSQXPIKTBUEKF-UHFFFAOYSA-N 0.000 description 2
- 229910001369 Brass Inorganic materials 0.000 description 2
- 239000010953 base metal Substances 0.000 description 2
- 239000010951 brass Substances 0.000 description 2
- 239000006172 buffering agent Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- LAIZPRYFQUWUBN-UHFFFAOYSA-L nickel chloride hexahydrate Chemical compound O.O.O.O.O.O.[Cl-].[Cl-].[Ni+2] LAIZPRYFQUWUBN-UHFFFAOYSA-L 0.000 description 2
- RRIWRJBSCGCBID-UHFFFAOYSA-L nickel sulfate hexahydrate Chemical compound O.O.O.O.O.O.[Ni+2].[O-]S([O-])(=O)=O RRIWRJBSCGCBID-UHFFFAOYSA-L 0.000 description 2
- 229940116202 nickel sulfate hexahydrate Drugs 0.000 description 2
- 150000002825 nitriles Chemical class 0.000 description 2
- 150000003557 thiazoles Chemical class 0.000 description 2
- 150000003549 thiazolines Chemical class 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- RILZRCJGXSFXNE-UHFFFAOYSA-N 2-[4-(trifluoromethoxy)phenyl]ethanol Chemical compound OCCC1=CC=C(OC(F)(F)F)C=C1 RILZRCJGXSFXNE-UHFFFAOYSA-N 0.000 description 1
- JHUFGBSGINLPOW-UHFFFAOYSA-N 3-chloro-4-(trifluoromethoxy)benzoyl cyanide Chemical compound FC(F)(F)OC1=CC=C(C(=O)C#N)C=C1Cl JHUFGBSGINLPOW-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- KHBQMWCZKVMBLN-UHFFFAOYSA-N Benzenesulfonamide Chemical compound NS(=O)(=O)C1=CC=CC=C1 KHBQMWCZKVMBLN-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 229910001313 Cobalt-iron alloy Inorganic materials 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000003929 acidic solution Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- JEHKKBHWRAXMCH-UHFFFAOYSA-N benzenesulfinic acid Chemical class O[S@@](=O)C1=CC=CC=C1 JEHKKBHWRAXMCH-UHFFFAOYSA-N 0.000 description 1
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 1
- 229940092714 benzenesulfonic acid Drugs 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000000872 buffer Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 238000004512 die casting Methods 0.000 description 1
- 239000002659 electrodeposit Substances 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- NIAGBSSWEZDNMT-UHFFFAOYSA-N hydroxidotrioxidosulfur(.) Chemical class [O]S(O)(=O)=O NIAGBSSWEZDNMT-UHFFFAOYSA-N 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- GPUMPJNVOBTUFM-UHFFFAOYSA-N naphthalene-1,2,3-trisulfonic acid Chemical compound C1=CC=C2C(S(O)(=O)=O)=C(S(O)(=O)=O)C(S(=O)(=O)O)=CC2=C1 GPUMPJNVOBTUFM-UHFFFAOYSA-N 0.000 description 1
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 description 1
- 150000002898 organic sulfur compounds Chemical class 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 description 1
- 229940081974 saccharin Drugs 0.000 description 1
- 235000019204 saccharin Nutrition 0.000 description 1
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- MNCGMVDMOKPCSQ-UHFFFAOYSA-M sodium;2-phenylethenesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C=CC1=CC=CC=C1 MNCGMVDMOKPCSQ-UHFFFAOYSA-M 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000003463 sulfur Chemical class 0.000 description 1
- 238000004018 waxing Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Landscapes
- Electroplating Methods And Accessories (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Chemically Coating (AREA)
Description
〔関連する出願〕
本発明は米国特許出願第495793号(出願日1983
年5月23日)についての一部継続出願(CIP)に
対応するものであり、該米国特許出願は米国特許
第4384929号公報の関連発明である。
〔産業上の利用分野〕
この発明は腐蝕に弱い金属素地上にニツケル含
有複合めつき膜を電着して腐蝕防止を行なうため
の改良方法に関する。
〔発明の背景〕
複合電気めつきは相互に隣接して密着している
3層のニツケル含有層から成つていてそれぞれの
層は一定に制御された膜厚と一定に制御された硫
黄含有量を示し、最も外側のめつき層は通常、公
知のクロムめつきがその上に施されて、同じ膜厚
の単層又は2層のニツケル含有めつきに比べて屋
外における素地金属の耐食性を著しく高めたもの
である。かかるニツケル含有複合めつきは、鋼、
銅、真鍮、アルミニウム又は亜鉛ダイカスト等、
特に海洋条件、自動車サービス条件等の屋外条件
にさらされる素地金属を保護するために工業上広
く使用されている。また公知の手段を用いて、そ
の表面に銅金属層のような導電性皮膜を予備的に
施したプラスチツク素地の表面に、かかるニツケ
ル含有複合めつき層を施すと耐食性について好ま
しい結果が達成できる。めつきが可能なかかるプ
ラスチツク材料の代表的なものは、ABS、ポリ
オレフイン、ポリ塩化ビニル及びフエノール・ホ
ルムアルデヒド樹脂である。プラスチツク素地と
の関連においてかかる複合ニツケル含有めつきを
使用すると、銅層又はフラツシユ層上えの腐蝕作
用によつて生ずるいわゆる“グリーン”腐蝕斑点
が実質的に減少又は除去される。
〔従来の技術に関する文献〕
ニツケル含有複合電気めつき方法及びこの組成
物の代表例については米国特許第3090733号公報
及び同第3703448号公報に開示がある。前記米国
特許第3090733号公報によれば、素地上に3層の
ニツケル含有めつき膜を電着する方法であつて、
この中間ニツケル層を施すためのめつき浴中には
少なくともある種の硫黄化合物が含まれていて、
これによつて該ニツケル含有中間層中に一定量の
硫黄分が混入されるようにして、これによつて複
合層相互間に所要の密着性を付与せしめ、下地素
地の耐食を達成せしめる方法が開示されている。
この方法の改良については前記米国特許第
3703448号公報に開示があり、この方法では中間
層を電着するための浴中に少なくともニトリル又
はアミドのチオスルホネートから成るいずれかの
硫黄化合物が用いられている。
〔発明の目的〕
〔発明による利益、利点〕
この発明の方法は前記の二つの特許に開示され
ている組成物及び方法を凌駕するような、さらに
改良された方法を提供するものであつて、中間層
電着用のめつき浴中に少なくとも新規・貴重な硫
黄化合物を含有せしめることによつて、かくはん
下の浴の安定性を改善させ、高温及び低PH下での
操業によつてめつき速度を上げ、かつ添加剤化合
物の消費量の低減を可能にするものである。この
発明で用いる硫黄化合物は浴中での分析が容易な
ので最適濃度に維持し易く、かつ外側ニツケル含
有層用の浴が中間層用浴から持ち込まれたこの硫
黄添加剤化合物によつて汚染されても外側ニツケ
ル含有層中の硫黄濃度には、それ程の影響がない
という利点を有する。後段に記載した利点は、中
間めつき工程と外側ニツケルめつき工程間では通
常は水洗を行なわないために、また外側ニツケル
層中の硫黄分が不必要なまで増加すると、ある場
合には最終的なクロム電着膜の被覆が阻害される
ことがあるという事実のために重要な利点であ
る。
〔発明の構成〕
本発明の利益と有利性とは、ニツケル含有中間
層を析出せしめるのに十分な量のニツケルイオン
と、析出したニツケル含有中間層中の硫黄含量が
約0.05〜約0.5重量%になるような量で存在する
一般式
[Related Applications] The present invention is disclosed in U.S. Patent Application No. 495,793 (filing date 1983).
This corresponds to a continuation-in-part application (CIP) filed on May 23, 2007), which is a related invention of U.S. Pat. No. 4,384,929. [Industrial Application Field] This invention relates to an improved method for preventing corrosion by electrodepositing a nickel-containing composite plating film on a metal substrate that is susceptible to corrosion. BACKGROUND OF THE INVENTION Composite electroplating consists of three nickel-containing layers in close contact with each other, each layer having a controlled thickness and a controlled sulfur content. The outermost plating layer is usually coated with a known chrome plating, which significantly improves the corrosion resistance of the base metal outdoors compared to a single or double layer of nickel-containing plating of the same thickness. It is elevated. Such nickel-containing composite plating can be applied to steel,
Copper, brass, aluminum or zinc die casting, etc.
It is widely used in industry to protect base metals exposed to outdoor conditions, especially marine conditions and automotive service conditions. Favorable results in terms of corrosion resistance can also be achieved by applying such a nickel-containing composite plating layer to the surface of a plastic substrate which has previously been provided with a conductive coating such as a copper metal layer, using known means. Representative of such plastic materials that can be plated are ABS, polyolefins, polyvinyl chloride and phenol formaldehyde resins. The use of such composite nickel-containing platings in conjunction with plastic substrates substantially reduces or eliminates so-called "green" corrosion spots caused by corrosive action on copper or flash layers. [References related to the prior art] Typical examples of nickel-containing composite electroplating methods and compositions thereof are disclosed in US Pat. No. 3,090,733 and US Pat. No. 3,703,448. According to the above-mentioned US Pat. No. 3,090,733, there is a method of electrodepositing three layers of nickel-containing plating film on a substrate,
The plating bath for applying this intermediate nickel layer contains at least some sulfur compounds;
This method allows a certain amount of sulfur to be mixed into the nickel-containing intermediate layer, thereby imparting the required adhesion between the composite layers and achieving corrosion resistance of the base material. Disclosed.
Improvements in this method are described in the aforementioned U.S. Pat.
No. 3,703,448 discloses a method in which a sulfur compound consisting of at least a nitrile or an amide thiosulfonate is used in the bath for electrodepositing the intermediate layer. [Object of the Invention] [Benefits and Advantages of the Invention] The method of the present invention provides a further improved method over the compositions and methods disclosed in the two aforementioned patents, By incorporating at least a new and valuable sulfur compound into the plating bath for interlayer electrodeposition, the stability of the bath under agitation is improved and the plating speed is increased by operating at high temperature and low pH. This makes it possible to increase the amount of additive compounds and reduce the consumption of additive compounds. The sulfur compounds used in this invention are easily maintained at optimum concentrations because they are easy to analyze in the bath, and the bath for the outer nickel-containing layer is not contaminated by this sulfur additive compound carried over from the bath for the intermediate layer. It also has the advantage that it does not significantly affect the sulfur concentration in the outer nickel-containing layer. The advantages listed below are because water washing is not normally performed between the intermediate plating step and the outer nickel plating step, and in some cases the final This is an important advantage due to the fact that the coverage of electrodeposited chromium films may be inhibited. DESCRIPTION OF THE INVENTION Benefits and advantages of the present invention include sufficient nickel ions to precipitate a nickel-containing interlayer and a sulfur content in the precipitated nickel-containing interlayer of from about 0.05 to about 0.5% by weight. A general formula that exists in such quantities that
【式】及び[Formula] and
で示される化合物並びにこれらの混合物から成る
群から選択されるチアゾール化合物及び/又はチ
アゾリン化合物を含有する水性・酸性溶液を本発
明の組成物に関する提案にしたがつて調製するこ
とによつて達成することができる。
中間層中の硫黄濃度を上記したような範囲以内
に納めるためには、このチアゾール化合物及び/
又はチアゾリン化合物は典型的には約0.01〜約
0.4g/、好ましくは約0.03〜約0.1g/の量
で含有させる。この中間層用の浴中にはまた任意
成分として湿潤剤及びホウ酸のような緩衝剤が含
まれることが望ましい。
この発明の方法に関する提案によれば、金属素
地又は表面に導電性を付与したプラスチツク素地
は先ず約0.15〜約1.5ミル(3.8〜38μ)の膜厚で
平均硫黄濃度が約0.03重量%以下のニツケル含有
内側層を電着し、次いで膜厚が約0.005〜約0.2ミ
ル(0.127〜5.1μ)で平均硫黄濃度約0.05〜約0.5
重量%のニツケル含有中間層を電着し、さらに膜
厚約0.2〜約1.5ミル(5.1〜38μ)で平均硫黄濃度
が約0.02〜約0.15重量%のニツケル含有外側層を
電着する。外側のニツケル層の硫黄濃度は中間層
の硫黄濃度よりも低いが、実質的に硫黄分を含ま
ない内側層のそれよりも高い。この3層から成る
ニツケル含有量のそれぞれは、ワツト型のニツケ
ルめつき浴から電着され、中間層用の浴中にはチ
アゾール及び/又はチアゾリン添加剤化合物が、
その層中に必要とする硫黄含有量を共析せしめる
のに十分な量で含まれている。また外側用の浴中
には後述するような有機硫黄化合物がその層中に
必要とする硫黄含有量を共析せしめうる量で含ま
れている。個々の浴は約室温(20℃)〜約85℃以
内で運転し、酸性浴の場合には約1〜6のPH範囲
で操作するのが一般的である。
〔好ましい実施態様の説明〕
このニツケル含有複合めつきは、少なくとも中
間層用の浴中に、後述するような特殊な型のチア
ゾール及び/又はチアゾリン化合物もしくはこれ
らの誘導体から成る硫黄化合物が含まれること以
外は、米国特許第3090733号公報及び同第3703448
号公報に記載された型のわつき浴を用いて析出さ
せる。したがつて、内側層のニツケルめつきを析
出させるためのめつき浴はワツト型浴、フツ化ホ
ウ素酸塩浴、高塩化物浴、スルフアメートニツケ
ルめつき浴又は公知の型の実質的に硫黄を含まな
い半光沢性ニツケル浴から成る。ニツケル含有中
間層を電着させるための浴は内側層用の浴と同一
の型のものであるが、必要な硫黄含有量を中間層
中に共析せしめるのに適切な量のチアゾール及
び/又はチアゾリン添加剤化合物をさらに含んで
いる。同様に、外側のニツケル含有層を電着せし
めるための浴は中間層用の浴と類似しているが、
浴中のチアゾール及び/又はチアゾリン化合物以
外の硫黄含有化合物の量は、外側層中の正味の硫
黄含有量が中間層中の硫黄含有量よりも低くなる
ように制御されることだけが異つている。装飾用
の仕上げが要求される場合には、ニツケル含有外
側層は米国特許第2512280号公報の表及び同第
2800440号公報の表に挙げられているような有
機スルホ酸素化合物の一種又は数種を用いた光沢
性ニツケルめつき浴を用いて膜を生成せしめるの
が好ましく、またこれらの光沢剤化合物は不飽和
化合物又はアミン化合物と併用することによつて
平滑性と光輝性の双方を付与せしめるのが好まし
い。ニツケル含有のこの3種の浴はまた、任意成
分としてピツト発生防止用の浴可溶性・相溶性湿
潤剤、ホウ酸、ギ酸、クエン酸、酢酸、フツ化ホ
ウ素酸その他の緩衝剤を含んでもよい。
内側のニツケル含有層の電着に適する浴はワツ
ト型の浴であつて、約200〜約400g/の硫酸ニ
ツケル・6水和物、約30〜約100g/の塩化ニ
ツケル・6水和物、及び約30〜約60g/のホウ
素を緩衝剤として含んでいる。この浴温は約室温
(20℃)から約85℃以下で用い、PHは約1〜約6
の範囲である。
硫黄含有量が多いニツケル含有中間層は内側層
用に用いためつき浴であつて、これに更に約0.01
〜約0.4g/、好ましくは約0.03〜約0.1g/
の次の一般式
This is achieved by preparing an aqueous acidic solution containing a thiazole compound and/or a thiazoline compound selected from the group consisting of the compounds represented by and mixtures thereof according to the proposal for the composition of the invention. Can be done. In order to keep the sulfur concentration in the intermediate layer within the above range, the thiazole compound and/or
or the thiazoline compound is typically about 0.01 to about
It is included in an amount of 0.4g/, preferably about 0.03 to about 0.1g/. The interlayer bath also desirably includes optional wetting agents and buffering agents such as boric acid. According to the method proposal of the present invention, the metal substrate or the plastic substrate having a conductive surface is first made of nickel having a film thickness of about 0.15 to about 1.5 mils (3.8 to 38 microns) and an average sulfur concentration of less than about 0.03% by weight. A containing inner layer is then electrodeposited with a film thickness of about 0.005 to about 0.2 mil (0.127 to 5.1μ) and an average sulfur concentration of about 0.05 to about 0.5.
A nickel-containing middle layer is electrodeposited, and a nickel-containing outer layer having a thickness of about 0.2 to about 1.5 mils (5.1 to 38 microns) and an average sulfur concentration of about 0.02 to about 0.15 weight percent. The sulfur concentration in the outer nickel layer is lower than that in the middle layer, but higher than that in the substantially sulfur-free inner layer. Each of the three layers of nickel content is electrodeposited from a Watt-type nickel plating bath, with thiazole and/or thiazoline additive compounds in the bath for the intermediate layer.
It is contained in an amount sufficient to eutectoid the required sulfur content in the layer. Further, the outer bath contains an organic sulfur compound as described below in an amount sufficient to eutectoid the required sulfur content in the layer. Individual baths typically operate within about room temperature (20°C) to about 85°C, and in the case of acidic baths, a pH range of about 1 to 6. [Description of preferred embodiments] This nickel-containing composite plating is characterized in that at least the bath for the intermediate layer contains a sulfur compound consisting of a special type of thiazole and/or thiazoline compound or a derivative thereof as described below. Other than that, U.S. Patent No. 3090733 and U.S. Patent No. 3703448
Precipitation is carried out using a waxing bath of the type described in the publication. Therefore, the plating bath for depositing the nickel plating of the inner layer may be a Watt type bath, a fluoroborate bath, a high chloride bath, a sulfamate nickel plating bath or substantially any of the known types. Consists of a sulfur-free semi-bright nickel bath. The bath for electrodepositing the nickel-containing interlayer is of the same type as the bath for the inner layer, but with an appropriate amount of thiazole and/or to eutectoid the required sulfur content into the interlayer. It further includes a thiazoline additive compound. Similarly, the bath for electrodepositing the outer nickel-containing layer is similar to that for the intermediate layer, but
The only difference is that the amount of sulfur-containing compounds other than thiazole and/or thiazoline compounds in the bath is controlled such that the net sulfur content in the outer layer is lower than the sulfur content in the middle layer. . If a decorative finish is required, the nickel-containing outer layer may be used as described in U.S. Pat. No. 2,512,280.
Preferably, the film is produced using a bright nickel plating bath using one or more organic sulfooxygen compounds as listed in the table of publication No. 2800440, and these brightener compounds are unsaturated. It is preferable to impart both smoothness and glitter by using a compound or an amine compound in combination. These three nickel-containing baths may also optionally contain bath-soluble and compatible wetting agents to prevent pitting, boric acid, formic acid, citric acid, acetic acid, fluoroboric acid, and other buffers. Suitable baths for the electrodeposition of the inner nickel-containing layer are Watt-type baths containing about 200 to about 400 g of nickel sulfate hexahydrate, about 30 to about 100 g of nickel chloride hexahydrate, and about 30 to about 60 g/b of boron as a buffering agent. This bath temperature is from about room temperature (20℃) to about 85℃ or less, and the pH is about 1 to about 6.
is within the range of The nickel-containing intermediate layer with a high sulfur content is the soaking bath used for the inner layer, with an additional layer of about 0.01
~about 0.4g/, preferably about 0.03 to about 0.1g/
The following general expression for
【式】及び[Formula] and
にて示される化合物並びにこれらの混合物から成
る群から選択されるチアゾール及び/又はチアゾ
リン添加剤化合物を含む浴から析出させる。
第一の構造式に概当するもので特に好ましいチ
アゾール化合物は2−メルカプトチアゾールプロ
パンスルホン酸ナトリウム及び2−アミノチアゾ
ールプロパンスルホン酸ナトリウムである。第二
の構造式に概当するもので特に好ましいチアゾリ
ン化合物は1−アミノ−5−スルホチアゾリンナ
トリウム及び2−メルカプトチアゾリンである。
中間のニツケル含有層用のめつき浴中に加える
チアゾール及び/又はチアゾリン添加剤化合物の
所要量は使用する化合物又は混合物の分子量、浴
中の他の成分の濃度、浴の運転パラメータ及び外
側ニツケル層中の硫黄の相対濃度によつて変化す
る。通常は、中間層中の硫黄含有量が約0.05〜約
0.5重量%、好ましくは約0.1〜約0.2重量になるよ
うにチアゾール及び/又はチアゾリン添加物化合
物を制御する。かかる硫黄含有量は、これらのい
ずれか又は混合物の約0.03〜約0.1g/濃度を
用いるときに達成されるのが普通である。
外側のニツケル含有層は内側のニツケル層を電
着するのに用いたと同様の浴から電着させるが、
この外側層用の浴中には適当な硫黄化合物が含ま
れていて外側ニツケル層中に共析する硫黄分が約
0.02〜約0.15重量%の範囲以内になるようにする
点だけが異なつている。適切な硫黄化合物として
は、例えばナトリウムアリルスルホネート、スチ
レンスルホン酸ナトリウム、サツカリン、ベンゼ
ンスルホンアミド、ナフタレントリスルホン酸、
ベンゼンスルホン酸及びその他のような光沢性の
なし地仕上げニツケルめつき浴に通常使用される
ような化合物である。チアゾール及び/又はチア
ゾリン添加剤、ベンゼンスルフイン酸塩及びニト
リル又はアミドのチオスルホネートは一般的には
好ましくない。いかなる場合でも、外側層中の硫
黄分は中間層中の硫黄分より少なく、かつ内側層
のそれよりも多い。内側層の硫黄含有量は約0.03
重量%以下、好ましくは約0.01重量%以下である
べきである。
この発明の方法に関する提案では、この3層複
合ニツケル含有めつきは、通常は中間的な水洗工
程なしに引き続いて施工する。そしてこの複合め
つき層は、通常は銅、真鍮、ニツケル、コバルト
又はニツケル−鉄合金ストライクを有する素地面
に施される。内側ニツケル層は外側層よりも肉厚
を大きくとるのが普通である。この複合めつき膜
の耐食性能について最善の結果を生むためには、
内側層膜厚対外側層膜厚の比は約50:50から約
80:20の範囲にするとよい。中間層の膜厚は約
0.005〜約0.2ミル(0.127〜5.1μ)とし、この外
側に約0.2〜約1.5ミル(5.1〜38μ)のニツケル含
有層を施すのが普通である。
最善の耐食性と装飾用外観を達成するために
は、通常は最終的に、明るい公知のクロムめつき
又はマイクロクラツククロムめつき又はマイクロ
ポーラスクロムめつきを、外側層の表面に約
0.005〜約0.2ミル(0.127〜5.1μ)の膜厚で施す
のがよい。もつと温和な腐食条件をさらされるよ
うな素地に対しては、内側及び外側のニツケル含
有層はわずかに約0.15ミル(4.2μ)の膜厚でも
十分に改良された耐食性が得られる。
複合めつきから成るこのニツケル含有層は他の
通常の汚染成分を公知の量で含んでいて、この成
分は持ち込みその他によつて浴中に入り込み、め
つき膜中に取り込まれる。その他、コバルトもま
た相当量がニツケル含有層中に存在しうるもの
で、その量は約50%コバルト量以下に達しうる。
しかし一般の目的では、内側のニツケル含有層は
できるだけ純度のよいニツケルから成ることが好
ましいことが判つている。
〔実施例〕
以下、本発明を実施例によつて詳述するが、本
発明の要旨を逸脱しない限り、これらの実施例に
限定されるものではない。
実施例 1
約40オンス/ガロン(300g/)の硫酸ニツ
ケル・6水和物、8オンス/ガロン(60g/)
の塩化ニツケル・6水和物及び6オンス/ガロン
(45g/)のホウ酸を含むワツト型ニツケルめ
つき溶液から成る試験溶液Aを調製した。800ml
の試験溶液Aを、ニツケルアノード及び空気かく
はん機を備えた1の容器中に入れた。この試験
溶液AのPHを2.5に調節し、浴温を60℃に昇温し
た。ジヘキシルスルホコハク酸塩から成る75mg/
の潤滑剤をこの試験容液A中に添加した。
試験溶液A中に、35mg/の2−メルカプトチ
アゾールプロパンスルホン酸ナトリウムを加えて
試験容液Bを調製した。試験溶液Bからニツケル
フオイルを析出させたところ、このフオイルは
0.127%の硫黄を含んでいた。
このニツケルフオイルの作成方法は次のようで
あつた。2インチ×4インチ(5cm/10cm)の鋼
製パネルを、先ずアルカリ性清浄剤中で電解的に
清浄化したのち水洗して20%硫酸溶液に浸漬し
た。次いで水洗してからWoodsニツケルストライ
ク液中でニツケルストライク層を施した。このパ
ネルをアルカリ性清浄剤中で1〜2秒間、アノー
ド的に電解して不動態化した。次いでこのパネル
を、電流密度45ASF(4.8A/Dm2)において35
分間、試験溶液B中でめつきした。次いでパネル
を水洗し、乾燥してから、端部を切り、生じたニ
ツケルフオイルを取り除いた。
実施例 2
試験溶液A中に50mg/の2−メルカプトチア
ゾールプロパンスルホン酸ナトリウムを加えるこ
とによつて、実施例1の方法にしたがつて試験溶
液Cを調製した。実施例1の方法によつてニツケ
ルフオイルを作つたところ、0.175%の硫黄を含
んでいた。
実施例 3
試験容液A中に35mg/の2−アミノ−5−ス
ルホチアゾリンナトリウム塩を添加することによ
つて試験溶液Dを調製した。実施例1に記載の方
法に準じてニツケルフオイルを作つたところ、そ
の硫黄含有量は0.150%であつた。
実施例 4
試験溶液A中に50mg/の2−アミノ−5−ス
ルホチアゾリナトリウム塩を加えることにより試
験溶液Eを調製し、実施例1に準じてニツケルフ
オイルを作つたところ硫黄含有量は0.201%を示
した。
実施例 5
試験溶液A中に35mg/の2−アミノチアゾー
ルプロパンスルホン酸ナトリウムを添加して試験
溶液Fを調製し、実施例1の方法に準じてニツケ
ルフオイルを作成した。このフオイルの硫黄含有
量は0.132%であつた。
実施例 6
試験溶液A中に50mg/の2−アミノチアゾー
ルプロパンスルホン酸ナトリウムを添加して試験
溶液Gを調製し、実施例1の方法に準じてニツケ
ルフオイルを作成した。このフオイルの硫黄含有
量は0.178%であることが分つた。
実施例 7
試験溶液A中に10mg/の2−メルカプトチア
ゾリンを添加することにより試験溶液Hを調製
し、実施例1に記載の方法に準じてニツケルフオ
イルを作成した。このフオイルの硫黄含有量は化
学分析によれば0.139%であることが分つた。
実施例 8
試験溶液A中に20mg/の2−メルカプトチア
ゾリンを添加することにより試験溶液を調製
し、実施例1に記載の方法に準じてニツケルフオ
イルを作成した。このフオイルの硫黄含有量は
0.305%を示した。
実施例 9
実施例2に記載のような試験溶液Cを調製し、
実施例1に記載の条件下で、一端をまるめて著し
く低い電流密度領域をつくつた1.25インチ×6イ
ンチ(3.2cm×15cm)鋼製パネルをめつきした。
電流密度30ASF(3.2A/Dm2)において7分間
めつきした。析出したニツケル皮膜は低電流密度
ないし高電流密度領域全般に亘つて半光沢で良好
な被覆のものであつた。
前記実施例に記載の試験溶液BないしIは、硫
黄濃度が約0.05〜0.3重量%という好ましい範囲
以内のニツケル含有中間めつき層を析出させるた
めのめつき浴として極めて満足なものである。こ
のチアゾール及び/又はチアゾリン添加化合物は
浴の安定性を改善し高速めつきを可能にする許り
でなく、中間層用めつき浴が外側層用めつき浴中
に持ち込まれた場合でも、外側のニツケル含有層
の物性と硫黄含有量とに対して著しい影響を及ぼ
さないという利点がある。かかるチアゾール及
び/又はチアゾリン添加剤化合物を用いる際には
浴のPHを増加させるとめつき膜中の硫黄含有量が
減少するということが判つた。したがつてPH約
2.5において中間めつき層用浴を運転することに
よつて中間層中に満足できる硫黄量が含まれるこ
とになる。しかし、典型的にPH約3.5〜約4.5で運
転される外側のニツケル含有層用の光沢ニツケル
浴中にこの添加物が持ち込まれても、光沢ニツケ
ル外側めつき中の硫黄含有量は目立つて増加する
ことはない。
実施例 10
試験溶液Aに対して、分子量119.2の2−メル
カプトチアゾリンをそれぞれ25mg/、50mg/
及び100mg/添加して、試験溶液J、K及びL
を調製した。
真鍮様外観パネル及びニツケルフオイルを、試
験溶液J、K及びLのそれぞれから浴温約135〜
145〓(57〜63℃)、PH2.5において空気かくはん
しながらめつきを行なつた。それぞれの溶液中に
はジヘキシルスルホコハク酸塩75mg/が湿潤剤
として加えられていた。この1インチ×6インチ
(2.5cm×15cm)真鍮様外観パネルは先ずアルカリ
性清浄剤中で電解的に清浄にし、一端部をまるめ
て低電流密度領域を作り、水洗、20%硫酸浸漬、
水洗、次いでこの試験溶液中で約40ASF
(4.3A/Dm2)で、5分間めつきした。次いでこ
の真鍮様パネルのまるめを解き高電流密度及び低
電流密度領域に亘つての全般の皮膜外観と密着性
を評価した。実施例1に記載のように作成したこ
のニツケルフオイルもまた硫黄含有量%について
化学分析を行なつた。
この結果では、溶液Jによるニツケルフオイル
の硫黄分は0.348%、溶液Kによるニツケルフオ
イルの硫黄分は0.396%、溶液Lによるニツケル
フオイルの硫黄分は0.848%であつた。この添加
剤化合物は、これまでの実施例中に記載の化合物
と同じ一般的分子濃度で使用すると、ニツケル層
中の硫黄分が著しく増加して、この複合めつきの
外側ニツケル層を満足しうる程度に密着せしめう
るのに通常望ましい水準以上の硫黄分に達するこ
とが分かる。それにもかかわらず、このパネルの
一般的外観は満足なものであつて、密着性も合格
であつた。したがつて、2−メルカプトチアゾリ
ンの濃度は、実施例7及び8の試験溶液H及びI
の組成に準じて約60mg/以下に制御して、好ま
しい硫黄含有量の中間ニツケル層が生ずるように
することが好ましい。
この発明の精神と範囲に反することなしに、広
範に異る実施態様を構成することができることは
明白なので、この発明は前記の特許請求の範囲に
おいて限定した以外は、その特定の実施態様に制
約されるものではない。
and mixtures thereof. Particularly preferred thiazole compounds falling within the first structural formula are sodium 2-mercaptothiazolepropanesulfonate and sodium 2-aminothiazolepropanesulfonate. Particularly preferred thiazoline compounds falling within the second structural formula are sodium 1-amino-5-sulfothiazoline and 2-mercaptothiazoline. The required amount of thiazole and/or thiazoline additive compounds to be added to the plating bath for the middle nickel-containing layer depends on the molecular weight of the compound or mixture used, the concentration of other components in the bath, the operating parameters of the bath and the outer nickel layer. It varies depending on the relative concentration of sulfur in it. Typically, the sulfur content in the interlayer is between about 0.05 and about
The thiazole and/or thiazoline additive compound is controlled at 0.5% by weight, preferably about 0.1 to about 0.2% by weight. Such sulfur content is typically achieved when using a concentration of about 0.03 to about 0.1 g/concentration of either or a mixture thereof. The outer nickel-containing layer is electrodeposited from the same bath used to electrodeposit the inner nickel layer, but
The bath for this outer layer contains a suitable sulfur compound to reduce the amount of sulfur eutectoided into the outer nickel layer.
The only difference is that it is within the range of 0.02 to about 0.15% by weight. Suitable sulfur compounds include, for example, sodium allylsulfonate, sodium styrenesulfonate, saccharin, benzenesulfonamide, naphthalenetrisulfonic acid,
Compounds such as benzenesulfonic acid and others commonly used in bright, blank finish nickel plating baths. Thiazole and/or thiazoline additives, benzenesulfinates and nitrile or amide thiosulfonates are generally not preferred. In any case, the sulfur content in the outer layer is less than the sulfur content in the middle layer and greater than that in the inner layer. The sulfur content of the inner layer is approximately 0.03
It should be less than or equal to 0.01% by weight, preferably less than about 0.01% by weight. In the proposed method of the invention, this three-layer composite nickel-containing plating is usually applied subsequently without an intermediate water washing step. This composite plating layer is then applied to a substrate surface, typically having a copper, brass, nickel, cobalt or nickel-iron alloy strike. The inner nickel layer is usually thicker than the outer layer. In order to produce the best results regarding the corrosion resistance performance of this composite plating film,
The ratio of inner layer thickness to outer layer thickness is approximately 50:50 to approximately
A range of 80:20 is recommended. The thickness of the intermediate layer is approx.
It is typically 0.005 to about 0.2 mils (0.127 to 5.1 microns) with a nickel-containing layer of about 0.2 to about 1.5 mils (5.1 to 38 microns) on the outside. To achieve the best corrosion resistance and decorative appearance, a final bright known chrome plating or microcrack chrome plating or microporous chrome plating is usually applied to the surface of the outer layer.
A coating thickness of 0.005 to about 0.2 mils (0.127 to 5.1 microns) is preferred. For substrates that are exposed to milder corrosive conditions, the inner and outer nickel-containing layers can be as thick as about 0.15 mils (4.2 microns) to provide significantly improved corrosion resistance. This nickel-containing layer of composite plating contains known amounts of other conventional contaminant components which enter the bath by entrainment or otherwise and become incorporated into the plating film. Additionally, cobalt can also be present in significant amounts in the nickel-containing layer, and the amount can be up to about 50% cobalt.
However, for general purposes it has been found that it is preferable for the inner nickel-containing layer to consist of nickel as pure as possible. [Examples] Hereinafter, the present invention will be explained in detail with reference to Examples, but the present invention is not limited to these Examples unless it departs from the gist of the present invention. Example 1 Approximately 40 oz/gal (300 g/) of nickel sulfate hexahydrate, 8 oz/gal (60 g/)
Test Solution A was prepared consisting of a Watt-type nickel plating solution containing 6 oz/gal (45 g/) of nickel chloride hexahydrate and 6 oz/gal (45 g/) of boric acid. 800ml
of test solution A was placed in one container equipped with a nickel anode and an air agitator. The pH of this test solution A was adjusted to 2.5, and the bath temperature was raised to 60°C. 75 mg of dihexyl sulfosuccinate/
of lubricant was added to this test solution A. Test solution B was prepared by adding 35 mg of sodium 2-mercaptothiazolepropanesulfonate to test solution A. When nickel oil was precipitated from test solution B, this oil was
It contained 0.127% sulfur. The method for producing this Nickelf oil was as follows. A 2 inch by 4 inch (5 cm/10 cm) steel panel was first electrolytically cleaned in an alkaline cleaner, then rinsed with water and immersed in a 20% sulfuric acid solution. It was then washed with water and a nickel strike layer was applied in Woods nickel strike solution. The panels were passivated by anodic electrolysis in an alkaline detergent for 1-2 seconds. The panel was then subjected to 35
Plated in test solution B for 1 minute. The panels were then rinsed with water, dried and the edges were cut to remove the resulting Nickelf oil. Example 2 Test Solution C was prepared according to the method of Example 1 by adding 50 mg/sodium 2-mercaptothiazolepropanesulfonate into Test Solution A. Nickelf oil was prepared by the method of Example 1 and contained 0.175% sulfur. Example 3 Test solution D was prepared by adding 35 mg/l of 2-amino-5-sulfothiazoline sodium salt to test solution A. When Nickelf oil was prepared according to the method described in Example 1, the sulfur content was 0.150%. Example 4 Test solution E was prepared by adding 50 mg of 2-amino-5-sulfothiazoli sodium salt to test solution A, and nickel oil was prepared according to Example 1. The sulfur content was It showed 0.201%. Example 5 Test solution F was prepared by adding 35 mg of sodium 2-aminothiazolepropanesulfonate to test solution A, and nickel oil was prepared according to the method of Example 1. The sulfur content of this foil was 0.132%. Example 6 Test solution G was prepared by adding 50 mg of sodium 2-aminothiazolepropanesulfonate to test solution A, and nickel oil was prepared according to the method of Example 1. The sulfur content of this foil was found to be 0.178%. Example 7 Test solution H was prepared by adding 10 mg/2-mercaptothiazoline to test solution A, and nickel oil was prepared according to the method described in Example 1. The sulfur content of this foil was found to be 0.139% by chemical analysis. Example 8 A test solution was prepared by adding 20 mg/2-mercaptothiazoline to test solution A, and a nickel oil was prepared according to the method described in Example 1. The sulfur content of this foil is
It showed 0.305%. Example 9 Prepare test solution C as described in Example 2,
A 1.25 inch x 6 inch (3.2 cm x 15 cm) steel panel was plated under the conditions described in Example 1 with one edge rolled to create an area of significantly lower current density.
Plating was carried out for 7 minutes at a current density of 30 ASF (3.2 A/Dm 2 ). The deposited nickel film was semi-glossy and had good coverage throughout the low current density to high current density range. The test solutions B to I described in the examples above are very satisfactory as plating baths for depositing nickel-containing intermediate plating layers with sulfur concentrations within the preferred range of about 0.05 to 0.3% by weight. This thiazole and/or thiazoline additive compound improves the stability of the bath and enables high speed plating, and even if the intermediate layer plating bath is brought into the outer layer plating bath, the outer It has the advantage that it does not significantly affect the physical properties and sulfur content of the nickel-containing layer. It has been found that increasing the bath PH reduces the sulfur content in the plated film when using such thiazole and/or thiazoline additive compounds. Therefore PH approx.
Operating the interlayer bath at 2.5 will result in a satisfactory amount of sulfur in the interlayer. However, even when this additive is introduced into the bright nickel bath for the outer nickel-containing layer, which is typically operated at a pH of about 3.5 to about 4.5, the sulfur content in the bright nickel outer plating increases noticeably. There's nothing to do. Example 10 To test solution A, 25 mg/50 mg/2-mercaptothiazoline with a molecular weight of 119.2 was added.
and 100 mg/added to test solutions J, K and L
was prepared. Brass-like exterior panels and Nickelf oil from each of test solutions J, K, and L at bath temperatures of approximately 135 to
Plating was carried out at 145°C (57 to 63°C) and pH 2.5 with air stirring. In each solution 75 mg/dihexyl sulfosuccinate was added as a wetting agent. This 1" x 6" (2.5cm x 15cm) brass-like appearance panel was first electrolytically cleaned in an alkaline cleaner, rounded at one end to create a low current density area, rinsed with water, soaked in 20% sulfuric acid,
Wash with water, then about 40 ASF in this test solution
(4.3A/Dm 2 ) for 5 minutes. This brass-like panel was then unrolled and the overall appearance and adhesion of the film in the high current density and low current density regions was evaluated. This nickel oil made as described in Example 1 was also chemically analyzed for percent sulfur content. According to the results, the sulfur content of the Nickelf oil prepared from Solution J was 0.348%, the sulfur content of the Nickelf oil prepared from Solution K was 0.396%, and the sulfur content of the Nickelf oil prepared from Solution L was 0.848%. This additive compound, when used at the same general molecular concentration as the compounds described in the previous examples, significantly increases the sulfur content in the nickel layer to the extent that it is sufficient for the outer nickel layer of this composite plating. It can be seen that the sulfur content is higher than the level normally desired to achieve close adhesion. Nevertheless, the general appearance of this panel was satisfactory and the adhesion was acceptable. Therefore, the concentration of 2-mercaptothiazoline in test solutions H and I of Examples 7 and 8
It is preferable to control the sulfur content to about 60 mg/or less according to the composition of the sulfur content, so as to form an intermediate nickel layer with a preferable sulfur content. Since it is evident that widely different embodiments may be constructed without departing from the spirit and scope of the invention, this invention is not limited to the specific embodiments thereof, except as limited in the scope of the following claims. It is not something that will be done.
Claims (1)
有内側層を素地上に電着し、平均硫黄含量が0.05
〜0.5重量%の密着性ニツケル含有中間層を該内
側層上に電着し、平均硫黄含量が0.02〜0.15重量
%の密着性ニツケル含有外側層を該中間層上に電
着する複合めつき層の電着方法であつて該外側層
の平均硫黄含有量が該中間層の平均硫黄含有量よ
りも低く、かつ該内側層の平均硫黄含有量よりも
高くしてなる3層ニツケル含有層から成る複合ニ
ツケルめつきの素地上えの電着方法において、所
望のニツケル含有中間層を析出せしめるのに十分
な量のニツケルイオンと、及び析出するニツケル
含有中間層中の硫黄含有量が所望の含有量になる
のに十分な量で存在するチアゾール及び/又はチ
アゾリン添加剤化合物とを含有する水性・酸性溶
液から該中間ニツケル含有層を電着せしめること
から成る改良方法であつて、該チアゾール及び/
又はチアゾリン添加化合物が一般式 【式】及び【式】 〔式中、 XはS、NH; RはH、R1; R1は−(CH2)o、−SO3M、−(CH2)oCO2M; nは1〜4の整数; Yは−SO3M; MはNa、K、NH4、Hを示す〕 にて示される化合物並びにこれらの混合物から成
る群から選択されてなる改良方法。 2 析出する中間層中の硫黄含有量が0.1〜0.2重
量%になるような量で該添加剤化合物が浴中に存
在することを特徴とする特許請求の範囲第1項に
記載の方法。 3 該添加剤化合物が2−メルカプトチアゾール
プロパンスルホン酸及びその塩から選択されるこ
とを特徴とする特許請求の範囲第1項に記載の方
法。 4 該添加剤化合物が2−アミノ−5−スルホチ
アゾリン及びその塩から選択されることを特徴と
する特許請求の範囲第1項に記載の方法。 5 該添加剤化合物が2−アミノチアゾールプロ
パンスルホン酸及びその塩から選択されることを
特徴とする特許請求の範囲第1項に記載の方法。 6 該添加剤化合物が2−メルカプトチアゾリン
及びその塩から選択されることを特徴とする特許
請求の範囲第1項に記載の方法。 7 該添加剤化合物が0.01〜0.4g/の量で存
在することを特徴とする特許請求の範囲第1項に
記載の方法。 8 該添加剤化合物が0.03〜0.1g/の量で存
在することを特徴とする特許請求の範囲第1項に
記載の方法。 9 該内側層が0.15〜1.5ミル(3.8〜38μ)、該中
間層が0.005〜0.2ミル(0.127〜5.1μ)及び該外
側層が0.2〜1.5ミル(5.1〜38μ)であることを特
徴とする特許請求の範囲第1項に記載の方法。[Claims] 1. A nickel-containing inner layer having an average sulfur content of 0.3% by weight or less is electrodeposited on a substrate, and the average sulfur content is 0.05% by weight.
A composite plated layer comprising a cohesive nickel-containing intermediate layer of ~0.5% by weight electrodeposited on the inner layer and an adhesive nickel-containing outer layer having an average sulfur content of 0.02 to 0.15% by weight electrodeposited on the intermediate layer. A method of electrodeposition comprising three nickel-containing layers, wherein the average sulfur content of the outer layer is lower than the average sulfur content of the intermediate layer and higher than the average sulfur content of the inner layer. In a method of electrodeposition on a substrate for composite nickel plating, a sufficient amount of nickel ions is deposited to deposit a desired nickel-containing intermediate layer, and the sulfur content in the deposited nickel-containing intermediate layer is adjusted to a desired content. a thiazole and/or a thiazoline additive compound present in an amount sufficient to provide the intermediate nickel-containing layer;
Or the thiazoline additive compound has the general formula [Formula] and [Formula] [wherein, X is S, NH; R is H, R 1 ; R 1 is -(CH 2 ) o , -SO 3 M, -(CH 2 ) o CO2M ; n is an integer from 1 to 4; Y is -SO3M ; M represents Na, K, NH4 , H] and mixtures thereof; An improvement method. 2. Process according to claim 1, characterized in that the additive compound is present in the bath in such an amount that the sulfur content in the intermediate layer that is precipitated is between 0.1 and 0.2% by weight. 3. Process according to claim 1, characterized in that the additive compound is selected from 2-mercaptothiazolepropanesulfonic acid and its salts. 4. Process according to claim 1, characterized in that the additive compound is selected from 2-amino-5-sulfothiazoline and its salts. 5. Process according to claim 1, characterized in that the additive compound is selected from 2-aminothiazolepropanesulfonic acid and its salts. 6. Process according to claim 1, characterized in that the additive compound is selected from 2-mercaptothiazoline and its salts. 7. Process according to claim 1, characterized in that the additive compound is present in an amount of 0.01 to 0.4 g/g. 8. Process according to claim 1, characterized in that the additive compound is present in an amount of 0.03 to 0.1 g/g. 9. The inner layer is 0.15-1.5 mil (3.8-38μ), the middle layer is 0.005-0.2 mil (0.127-5.1μ), and the outer layer is 0.2-1.5 mil (5.1-38μ). A method according to claim 1.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US601350 | 1984-04-20 | ||
| US06/601,350 US4549942A (en) | 1981-07-06 | 1984-04-20 | Process for electrodepositing composite nickel layers |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60224798A JPS60224798A (en) | 1985-11-09 |
| JPS6252039B2 true JPS6252039B2 (en) | 1987-11-02 |
Family
ID=24407171
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13502184A Granted JPS60224798A (en) | 1984-04-20 | 1984-06-29 | Electrodeposition of composite nickel plating layer |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPS60224798A (en) |
| AU (1) | AU563637B2 (en) |
| CA (1) | CA1255620A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2975162B1 (en) * | 2014-07-18 | 2018-09-05 | FRANZ Oberflächentechnik GmbH & Co KG | Method for providing a workpiece with a protective coating |
| US12410534B2 (en) | 2022-09-26 | 2025-09-09 | Dupont Electronic Materials International, Llc | Nickel electroplating compositions for rough nickel |
| US12428744B2 (en) * | 2022-09-26 | 2025-09-30 | Rohm And Haas Electronic Materials Llc | Nickel electroplating compositions for rough nickel |
-
1984
- 1984-05-16 AU AU28096/84A patent/AU563637B2/en not_active Ceased
- 1984-06-29 JP JP13502184A patent/JPS60224798A/en active Granted
- 1984-08-14 CA CA000460967A patent/CA1255620A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| AU563637B2 (en) | 1987-07-16 |
| AU2809684A (en) | 1985-10-24 |
| CA1255620A (en) | 1989-06-13 |
| JPS60224798A (en) | 1985-11-09 |
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