JPS6252843B2 - - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an image forming member that forms an image using a difference in distributed voltage caused by a change in resistance of a photoconductive layer.

Conventionally, an electrophotographic photoreceptor has been used as an image forming member using an electrical method. A typical configuration of a photoreceptor used in the most common electrophotographic process, that is, a process in which an electrostatic image is formed by charging and imagewise exposure, is one in which a photoconductive layer is formed on a support. It is. An electrostatic image is generally formed by charging the surface of a photoreceptor by corona discharge, and then selectively dissipating the charges in the exposed areas by imagewise exposure. This electrostatic image is developed with toner charged with a polarity opposite to that of the electrostatic image, and is transferred onto transfer paper. It has been pointed out that this type of electrophotographic process requires wires and shield cases to perform corona charging, as well as high voltage to generate corona discharge, making it difficult to make the equipment more compact. .

On the other hand, conventionally known electrophotographic photoreceptors that can be easily made compact have also been proposed. As a representative example, JP-A No. 48-68238
Publication No. 150342, Japanese Patent Publication No. 150342, Japanese Patent Publication No. 1983-1503-
Examples include photoreceptors disclosed in JP-A No. 1027, JP-A-54-61534, and JP-A-54-61537. These photoreceptors do not require corona charging and can form potential images that can be developed with charged toner. Image exposure is performed by applying a voltage to the photoconductive layer on which electrodes are provided, and a potential image is created by creating a difference in distributed voltage between the exposed and unexposed areas of the applied voltage. It forms the However, in the process of forming this potential image, a change in the resistance of the photoconductive layer causes a voltage change on the surface of the photoreceptor, thereby forming a developable potential image. It is necessary to apply a voltage to the photoreceptor, expose the image, and develop the image at the same time, which brings about restrictions in terms of process or equipment.

Therefore, the main object of the present invention is to provide an image forming member that does not have such restrictions, that is, it can sequentially form a polarized image by image exposure and convert the polarized image into a visible image. shall be.

In the image forming member according to the present invention, the pattern electrode and the conductive layer are connected by forming a large number of discontinuous transparent isolated conductors, polarized layers, pattern electrodes, photoconductive layers, conductive layers, and positions corresponding to the pattern electrodes. and a means for applying a voltage between the patterned electrode and the conductive layer, the transparent isolated conductor is formed on the polarized layer, and the transparent isolated conductor is formed on the polarized layer. A layer is formed on the patterned electrode and the photoconductive layer, and the conductive layer is formed below the patterned member and the photoconductive layer.

A typical configuration of the imaging member used in the present invention is shown in FIG. The image forming member shown in FIG. 1 has a transparent conductive layer 2 laminated on a transparent support 1, a patterned opaque layer 3, on which a photoconductive layer 4 and a patterned insulating layer 6 are formed. and a patterned electrode 5, and a polarized layer 7 having a discontinuous isolated conductor 8 on its surface is further formed on the patterned electrode 5. The transparent support is formed from a synthetic resin film or sheet, glass, ceramic, or the like. Further, this transparent support may not necessarily be provided. For example, if the support is glass, the surface of the transparent conductive layer is conductively treated with In ₂ O ₃ or SnO ₂ , or if the support is a synthetic resin film such as polyimide film, it can be made of Al, Ag, Pb, etc. ,Zn,
It is formed by processing metals such as Ni, Au, Cr, Mo, Ir, Nb, Ta, V, Ti, Pt, etc. by vacuum evaporation, electron beam evaporation, sputtering, etc.

The patterned opaque layer is provided to prevent the transparent conductive layer and the patterned electrode from being connected to each other by the photoconductive layer in a low resistance state in the exposed portion of the image forming member during image exposure. and is formed at a position corresponding to the pattern electrode. The patterned opaque layer is made of, for example, C,
It is formed using materials such as Cr, Ag, Au, Al, Ni, Fe, or gelatin mixed with black pigment by photoetching, mask vapor deposition, etc.

The photoconductive layer includes S, Se, Si, PbO, and S,
It is formed by vacuum deposition of an inorganic photoconductive material such as an alloy or intermetallic compound containing Se, Te, As, Sb, etc.
In addition, when using the sputtering method, Si, ZnO,
A high melting point photoconductive material such as CdS, CdSe, _TiO2 , etc. can also be attached to the support to form the photoconductive layer.
In addition, when forming a photoconductive layer by coating, organic photoconductive materials such as polyvinylcarbazole, anthracene, phthalocyanine, dye-sensitized or Lewis acid-sensitized products of these materials, and mixtures of these with insulating binders are used. Can be used. Also, ZnO,
Mixtures of inorganic photoconductors such as CdS, TiO ₂ , PbO, etc. with insulating layer binders are also suitable. Note that various resins are used as the insulating binder.

FIG. 2 is a plan view of the image holding member shown in FIG. 1 with the isolated conductor 8 and polarized layer 7 removed, and shows the shape of the pattern electrode 5. FIG. That is, the pattern electrode 5 has a stripe shape, and the photoconductive layer 4 is also exposed in a stripe shape. Further, the patterned insulating layer 6 also has a striped shape sandwiching the patterned electrode 5. The pattern electrode is made of, for example, Cr, Ni, Fe, Al, Au,
It is formed from Ag, Pd, C, etc. The insulating layer is formed of, for example, epoxy resin, vinyl chloride resin, silicone resin, vinyl acetate resin, polyparaxylylene resin, polyethylene resin, urethane resin, acrylic resin, or the like.

The polarized layer is formed from a ferroelectric material that is not polarized in a fixed direction under normal conditions, but is microscopically polarized. As a ferroelectric material, a material in which the two axes perpendicular to the polarization axis are reversed in the polarization direction is suitable, such as KH ₂ PO ₄ ,
Borasite compound Me ₃ B ₇ O ₁₃ X Me: Divalent metal X:
Halogen atom, cadmium molybdate Gd ₂
(M ₀ O ₄ ) ₃ , etc.

A transparent isolated conductor is a discontinuous island-shaped transparent conductor, and is an important conductor that becomes a pixel of an image to be formed. The shape of the isolated electrode is an isolated square, as shown in the plan view of FIG. Transparent isolated conductors can be formed by various methods.
The typical manufacturing method is vapor deposition and chemical etching using photoresist. When using this method, first the material that forms the transparent isolated conductor on the surface of the polarized layer, such as metal oxides such as In ₂ O ₃ and SnO ₂ , Al, Ag, Pb, Zn, Ni, Au, Cr, Mo,
A layer of various metals such as In, Nb, Ta, U, Ti, Pt, etc. is formed on the polarization layer by vapor deposition, electron beam vapor deposition, sputtering vapor deposition, or the like. Next, an island-shaped masking pattern is formed using a photoresist, and then a layer such as In ₂ O ₃ is selectively etched away using a predetermined etching solution such as acid or alkali, and then the masking pattern of the photoresist is removed. can form an isolated conductor.

As the photoresist, any conventionally commonly used materials can be used. For example, as commercially available products, product name: KPR (Kodak photo resist, made by Kodatsu... developer: methylene chloride, trichlene, etc.), product name: KMER (Kodak Metal
Etch Resist, made by Kodatsu...Developer: xylene, trichlene, etc.), Product name: TPR (manufactured by Tokyo Ohka...Developer: xylene, trichlene, etc.), Product name: Situpre AZ1300 (made by Situprey...Developer: alkaline aqueous solution) ), Product name: KTFR (KodaK
Thin Film Resist, manufactured by Kodatsuku...developer: xylene, trichlene, etc.), product name: FNRR (Fuji Pharmaceutical Co., Ltd....developer: chlorocene), product name:
FPER (Fuji Photo Etching Resist, manufactured by Fuji Photo Film...Developer: Triclean), Product name:
TESH DOOL (manufactured by Okamoto Chemical Industry...Developer:
water), and product name: Fujiresist 7 (manufactured by Fuji Pharmaceutical Co., Ltd., developer: water). After using the mask, remove the mask using Triclean, Methylene Chloride, Product Name: AZ Remover (manufactured by Shitspray),
Sulfuric acid etc. are used.

The transparent isolated conductor can also be formed by depositing the transparent isolated conductor forming material onto the polarized layer through a mask having island-shaped openings, and then removing the mask.

The size of each component of the image forming member is determined as appropriate, but is generally as follows. The thickness of the photoconductive layer is 1μ to 100μ, the stripe width of the pattern electrode is 1μ to 50μ, and the thickness of the polarization layer is 5 to 100μ.
500μ, and the area of one isolated conductor is 1μ ²
~ ^0.1mm2 is suitable.

A typical method of forming an image using the imaging member shown in FIG.
This is shown in Figure 2. First, a voltage 9 is applied between the transparent conductive layer 2 and the patterned electrode 5 as shown in FIG. The magnitude of this voltage is made sufficient to impart directivity to the polarization of the polarized layer 7. As a result, directionality is imparted to the polarization state as shown by arrows 10 and 11. Next, as shown in FIG. 5, a voltage 12 in the opposite direction is applied between the transparent conductive layer 2 and the patterned electrode 5. The magnitude of this voltage is in the dark, that is, in a state where the resistance of the photoconductive layer is not reduced.
It is set to a level that does not change the polarization state of the polarization layer 7. Under such voltage conditions, image exposure is performed as shown in FIG. The original image 14 has a dark area 15 and a bright area 16, and by performing light irradiation 17, the light that has passed through the bright area 16 is transmitted through the gap 13 between the patterned opaque layers 3, and the photoconductive layer in this area is 4 to lower resistance. As a result, in the exposed area, most of the voltage 12 is applied to the polarized layer, exceeding the coercive electric field of the polarized layer, and the polarization state is reversed to the state shown by arrows 18 and 19, and the original A polarization image corresponding to the image is formed. As shown in Figure 7, this polarization image can be converted into a potential image by applying a voltage 20 that is smaller than the coercive electric field of the polarized layer (the minimum electric field required to change the direction of polarization). . That is, if the voltage applied to the polarized layer is E, the charge density applied to the polarized layer is D, the dielectric constant of the polarized layer is ε, and the magnitude of polarization is P, then in the non-exposed area, D=εE+P In the exposed area becomes D=εE−P. Therefore, the amount of charge on the isolated conductor differs by 2P between the exposed area and the non-exposed area. Further, the effective capacitance C _F of the polarized layer at this time is expressed as C _F =∂D/∂V. V is the magnitude of the voltage 20. D
is larger in the non-exposed part, so the capacitance C _FD in the non-exposed part of the polarized layer and the capacitance C _FL in the exposed part are C _FD >C _FL .

Further, when the potential of the isolated conductor is V ₀ and the capacitance of the photoconductive layer is _CP , V ₀ is given by V ₀ =C _F /C _F +C _P V . By the way, since C _FD > C _FL , the potential V _0D in the non-exposed part of the isolated conductor and the potential V _0L in the exposed part become V _0D >V _0L , and a potential image corresponding to the original image is formed. Ru. Therefore, by applying an ordinary electrophotographic developer in the state shown in FIG. A visible image is formed by adhering the developer to the image, and if necessary, this is transferred and fixed onto a transfer paper or the like. After image exposure as shown in Figure 6, the image is stored as a change in the polarization state of the polarized layer, and as shown in Figure 7, a voltage is applied to form a potential image. The processing for developing can be carried out after an arbitrary period of time has elapsed (for example, 24 hours) after image exposure. The specific method of converting the polarization image shown in Figure 6 into a color image and reading it out is shown in Figures 11 to 1.
This is shown in Figure 2. First, in order to explain the mechanism of forming a color image based on interference colors using the image forming member according to the present invention, cadmium molybdate Gd ₂
The formation mechanism of a color image will be explained using an example in which a single crystal of (M ₀ O ₄ ) ₃ is used as a sample crystal plate.

First, powders of Gd ₂ O ₃ and M ₀ O ₃ were weighed at a molar ratio of 1:3, melted in a platinum crucible heated by high frequency heating at 1150°C, and a seed crystal was immersed in it.
By rotating at a speed of 100 rpm and pulling at a speed of 1 mm/hr, a single crystal with a diameter of 20φ was created. From this, a thin piece of (001) plane 10 x 10 mm
A sample crystal plate of (area) x 20μ (thickness) was created.
This sample crystal plate is a transparent ferroelectric material with a symmetry of mm ² at room temperature, and has the property that the a-axis and b-axis of the crystal axes are swapped due to polarization reversal. When linearly polarized light whose vibration plane is set in only one direction is incident on this sample crystal plate through a polarizer, a phase difference R=Δn·d occurs as a phase difference R proportional to the distance traveled inside the sample crystal plate. Here, △n is the magnitude of birefringence of the sample crystal plate, d is the thickness of the sample crystal plate, and △n=na−nb
(na: refractive index of the a-axis, nb: refractive index of the b-axis). When the light that has passed through the sample crystal plate is passed through an analyzer arranged so that the polarizer and the polarizer are orthogonal Nicols, interference colors can be seen.

However, in this case, no difference in interference color occurs depending on the polarity of polarization of the sample crystal plate. but,
If an auxiliary birefringent body other than the sample crystal plate is inserted between the sample crystal plate and the analyzer to superimpose the phase difference, the interference color will differ depending on the direction of polarization. Therefore, the phase difference between normal light and extraordinary light among the light transmitted through the sample crystal plate is R, the phase difference between the normal light and extraordinary light among the light transmitted through the auxiliary birefringent body is △R, and the phase difference between the normal light and extraordinary light among the light transmitted through the sample crystal plate is R. If the polarization direction is reversed depending on the polarization state, the vibration direction of the auxiliary birefringent body and the vibration direction of the light in one polarization state of the sample crystal plate will be the same and will pass through the analyzer. The phase difference between the normal light and the extraordinary light is R+ΔR, and interference colors based on this phase difference are observed. Also, the phase difference between the normal light and the extraordinary light that pass through the analyzer with the vibration direction of the light of the auxiliary birefringent body and the vibration direction of the light of the other polarization state of the sample crystal plate orthogonal to each other is R-△R. Therefore, interference colors based on this phase difference are observed. If the polarization state thus formed on the sample crystal plate is a polarization image, a color image based on interference colors corresponding to the polarization image can be observed.

Here, the size of △R can be determined arbitrarily depending on the material and shape of the auxiliary birefringent body. Therefore, by changing the material and shape of the auxiliary birefringent body, the size of △R can be adjusted to the original value. The interference color of the light that passes through the Zuku analyzer can be arbitrarily determined. The fact that a color image can be observed using a sample crystal plate on which a polarization image is formed can be explained using the following physical relational expression. As shown in Figure 10,
In general, linearly polarized light 24 transmitted through a polarizer 23
When incident on the sample crystal plate 25 of thickness d and birefringence Δn, a phase difference R occurs. The magnitude of this phase difference is R
=Δn·d. Therefore, the light transmitted through the sample crystal plate 25 placed between the polarizer 23 and the analyzer 28, which are two orthogonal polarizing plates, causes interference, and the intensity I of the transmitted light coming out of the analyzer is: I=I ₀ sin ² (Rπ/λ) I ₀ : Intensity of light transmitted through the polarizer, λ : Expressed in wavelength of light.

Therefore, when Rπ/λ=(2n+1)π/2 (n is an integer), I=I ₀ and the light becomes brighter.

Further, when Rπ/λ=nπ, I=0 and the light becomes dark. In this way, the light emitted from the analyzer is observed as unique colored light due to interference due to the phase difference of the sample crystal plate.

To explain Gd ₂ (M ₀ O ₄ ) ₃ crystal as a specific example, the Gd ₂ (M ₀ O ₄ ) ₃ sample crystal plate is optically biaxial, and the polarization direction can be changed by applying an electric field. When the a-axis and the b-axis are reversed (polarization reversal), the a-axis and the b-axis are swapped with each other. Therefore, when observing the conoscopic image using a polarizing microscope, the development in which the two melatopes are rotated by 90 degrees is observed, and the optical axis plane is changed due to polarization reversal.
Verify that it rotates 90°. Gd ₂ (M ₀ O ₄ ) ₃ crystal can be converted into 2 by changing the polarization direction by applying an electric field opposite to the polarization direction in the c-axis direction (polarization axis direction).
The two optical elastic axes are swapped. Therefore, by changing the direction of polarization using an electric field, it is possible to switch the polarity of the phase difference R, that is, the polarity of the birefringence Δn. However, even if the sample crystal plate 25 with one polarization direction 26 and the other polarization direction 27 is irradiated with the linearly polarized light 24 as shown in FIG. Together R
It exhibits a phase difference R of =△n・d, and the analyzer 28
Since there is no difference in interference between transmitted light 29 (transmitted light corresponding to the part in the polarization direction 26) and transmitted light 30 (transmitted light corresponding to the part in the polarization direction 27), the color of both transmitted lights 29 and 30 due to interference does not occur. are the same and cannot be identified.

Therefore, if another auxiliary birefringent body 34 such as a crystal plate is interposed as shown in FIG.
The interference colors of 9' and 30' are observed differently.
This means that if the phase difference of the auxiliary birefringent body is _R1 and the phase difference of the sample crystal plate is _R2 , the transmitted light 29' corresponding to the polarization direction 26 is _R1 + _R2 (or _R1 - _R2 )
This is because the transmitted light 30' corresponding to the portion in the polarization direction 27 exhibits an interference color of R ₁ -R ₂ (or R ₁ +R ₂ ). Therefore, the sample crystal plate 25 in FIG.
Instead, by arranging an imaging member according to the present invention in which polarization images are formed in the polarization directions 32 and 33 in the polarization layer as shown in FIG. 35 and the transmitted light 36 corresponding to the polarization direction 33 exhibit different interference colors, and the polarization image can be observed as a color image.

The typical process of the image forming method according to the present invention has been described above, but other embodiments are also possible. For example, the polarity of the voltage applied to the image holding member to form a polarized image can be arbitrarily selected. In particular, the polarity and magnitude of the voltage during development shown in FIG. 7 may be determined as appropriate so as to produce a necessary difference in potential between the exposed and non-exposed areas in the isolated conductor. Further, the positions of the auxiliary birefringent body and the image forming member may be interchanged in FIG. 12.

The image forming member used in the present invention may also have other configurations in addition to the configuration shown in FIG. For example, both the patterned insulating layer 6 and the patterned opaque layer 3 in FIG. The patterned opaque layer or the patterned insulating layer may be omitted. Further, members other than the patterned insulating layer or the patterned opaque layer may be used as long as they have such an effect. FIG. 8 shows an imaging member in which the patterned insulating layer is omitted. In addition, FIG. 9 shows an embodiment of an image forming member in which the patterned opaque layer is omitted, in which the patterned insulating layer 21 is formed thickly and the photoconductive layer 22 is formed in the form of stripes. It is. Moreover, the formation of the isolated conductor can be arbitrarily determined, such as circular or triangular. In addition, pattern electrodes,
The patterned insulating layer, patterned opaque layer, etc. can also be formed into arbitrary shapes such as dots, meshes, and combs.

Furthermore, when image exposure is performed from the side of the isolated conductor, the transparent support and the transparent conductive layer do not need to be transparent. The support may be omitted if necessary.

Example Powders of Gd ₂ O ₃ and M ₀ O ₃ were weighed to have a molar ratio of 1:3, and melted in a high-frequency heated platinum crucible at 1150°C, in which Gd ₂ (M ₀ O ₄ ) A single crystal with a diameter of 20φ was prepared by dipping the seed crystal of No. ₃ and pulling it up at a speed of 1 mm/hr while rotating at a speed of about 100 rpm.

From this, each axis direction was determined by X-ray diffraction,
A polarized layer with a (001) plane of 10 × 10 mm and a thickness of 20 μ was created.

Using a mask, band-shaped patterned electrodes as shown in FIG. 2 with a width of about 10 .mu.m and an interval of 30 .mu.m as shown in FIG. 2 are formed thereon to a thickness of 500 .ANG. by vacuum evaporation of Al using a resistance heating method.

On top of that, UV-curable urethane/acrylic resin is applied to a thickness of approximately 5 μm, and using a mask method, only the strip-shaped resin layer with a width of 30 μm and an interval of 10 μm is irradiated with UV rays around the patterned electrode to cure it. The exposed areas were removed with methyl ethyl ketone solvent to form a patterned insulating layer.

Thereon, an amorphous Si film with a thickness of about 5 μm was formed as a photoconductive layer by high frequency glow discharge of 1 MHz in a H ₂ gas atmosphere of 0.1 Torr.

Using a mask, Cr was deposited to a thickness of about 500 Å using an electron beam, and a band-shaped opaque layer with a width of 30 μm and an interval of 10 μm was formed at a position corresponding to the patterned insulating layer as shown in Figure 1. Formed.

On top of this, In ₂ O ₃ was uniformly electron beam deposited to a thickness of about 1000 Å, and then heat treated in an oxygen gas atmosphere to create a transparent conductive layer. In addition, a mask was placed on the surface of the polarized layer, and In ₂ O ₃ was electron beam evaporated to a thickness of about 1000 Å, followed by heat treatment in an oxygen gas atmosphere to form an area a x a = 30 μ x as shown in Figure 3.
A transparent isolated conductor of 30 μm and a spacing b = 10 μm was formed. An imaging member was thus produced.

A voltage of about 600 V was applied between the transparent conductive layer of this image forming member and the patterned electrode. In this electric field, polarization reversal of the polarized layer occurred even in the dark, and the polarization was aligned in the direction of the electric field as shown in FIG. After this, apply a voltage of about 300V in the opposite direction. In this case, as shown in FIG. 5, the polarization is not reversed at this strength. This is because the resistance of the photoconductive layer is sufficiently high in the dark, so about half of the applied voltage is absorbed by the photoconductive layer, so the electric field necessary for inversion is not generated in the polarization layer. .

If the image is exposed from the transparent conductive layer side as shown in Figure 6, the resistance of the photoconductive layer becomes small in the exposed area, and most of the voltage is applied to the polarized layer, so the polarization inversion electric field required by the polarized layer ( (that is, a coercive electric field), and polarization reversal occurs. On the other hand, since there is no change in the non-exposed area, polarization reversal does not occur. Therefore, the direction of polarization is opposite depending on the bright and dark areas of the image.

This state does not change even if the electric field is removed or image exposure is stopped. When this image holding member was placed between orthogonal polarizing plates as shown in FIG. 12 and exposed to white light, all of the light transmitted by the analyzer was green interference light in the absence of the auxiliary birefringent material. Next, as a result of observation with a quartz crystal plate placed as an auxiliary birefringent material, the interference light in the potential image part corresponding to the image area is yellow, and the interference light in the potential image part corresponding to the non-image area is blue, indicating polarization. The image could be observed as a colored image. Furthermore, when the vibration direction of the crystal plate was reversed, the interference light in the image area and the non-image area were swapped.

Note that when an electric field below polarization reversal is applied again to a state where the polarization directions are arranged in different directions according to the polarization image, the potential on the isolated conductor will differ depending on the polarization state.

In fact, as shown in Figure 7, when a voltage of 200V is applied between the transparent conductor and the patterned electrode, about 180V appears on the isolated conductor in the dark part of the image, and about 180V in the bright part of the image.
A potential image of 50V was obtained. In this state, when a negatively charged toner and a liquid developer were sprinkled onto the isolated conductor, a good image was formed. When the image was transferred onto paper from this state, an image was formed on the paper.

Further, residual toner on the isolated conductor was removed and left as it was for one day.

Thereafter, a color image could be formed again by the method shown in FIG. Furthermore, when a voltage of 200 V was applied, a similar potential contrast was obtained, and when liquid developer was sprinkled, a good image was again formed.

Even after repeating this process over 100 times, the same image was obtained every time.

[Brief explanation of the drawing]

FIG. 1 shows one embodiment of the imaging member used in the present invention. 2 is a plan view of the patterned electrode surface of the imaging member of FIG. 1; FIG. 3 is a plan view of the surface of the imaging member of FIG. 1; FIG. 4 to 6 show one aspect of polarized image formation of the image forming member according to the present invention, in which FIG. 4 shows the step of imparting directionality to the polarized state, FIG. 5 shows the voltage application step, and FIG. Figure 6 shows the image exposure process. FIG. 7 shows one mode of forming a potential image. FIGS. 8 and 9 each show another embodiment of the imaging member used in the present invention. 10th
The figure shows a method for extracting colored light by interference using a crystal plate that exhibits birefringence. FIG. 11 shows a method of extracting colored light by interference between a crystal plate exhibiting birefringence and an auxiliary birefringent body. FIG. 12 shows one embodiment of the process of converting a polarized image of an imaging member into a color image according to the present invention. DESCRIPTION OF SYMBOLS 1... Transparent support, 2... Transparent conductive layer, 3... Patterned opaque layer, 4... Photoconductive layer, 5... Patterned electrode, 6... Patterned insulating layer, 7... Polarized layer, 8... Transparent isolated conductor, 23 ... polarizer, 24 ... linear deflection, 28 ... analyzer, 31 ... image forming member,
32 and 33...Polarization direction, 34...Auxiliary birefringent body, 35 and 36...Transmitted light.

Claims (1)

[Claims] 1. A large number of discontinuous transparent isolated conductors, polarized layers, patterned electrodes, photoconductive layers, conductive layers, and formed at positions corresponding to the patterned electrodes prevent the patterned electrodes and the conductive layers from becoming connected. and a means for applying a voltage between the patterned electrode and the conductive layer, the transparent isolated conductor is formed on the polarized layer, and the polarized layer is formed on the patterned electrode and the conductive layer. An image forming member formed on a photoconductive layer, the conductive layer being formed under the pattern member and the photoconductive layer.