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JPS6253764B2 - - Google Patents
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JPS6253764B2 - - Google Patents

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Publication number
JPS6253764B2
JPS6253764B2 JP6867478A JP6867478A JPS6253764B2 JP S6253764 B2 JPS6253764 B2 JP S6253764B2 JP 6867478 A JP6867478 A JP 6867478A JP 6867478 A JP6867478 A JP 6867478A JP S6253764 B2 JPS6253764 B2 JP S6253764B2
Authority
JP
Japan
Prior art keywords
interference
valleys
peaks
flatness
photodiode array
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP6867478A
Other languages
Japanese (ja)
Other versions
JPS54159258A (en
Inventor
Toshiaki Wada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Proterial Ltd
Original Assignee
Sumitomo Special Metals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Special Metals Co Ltd filed Critical Sumitomo Special Metals Co Ltd
Priority to JP6867478A priority Critical patent/JPS54159258A/en
Publication of JPS54159258A publication Critical patent/JPS54159258A/en
Publication of JPS6253764B2 publication Critical patent/JPS6253764B2/ja
Granted legal-status Critical Current

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Description

【発明の詳細な説明】 本発明はフイゾー干渉或はマイケルソン干渉光
学系による主として一次干渉縞をフオトダイオー
ドアレイで受光、自己走査、演算することによつ
て平面度を表示する平面度測定方法に関するもの
であり、平面度を経済的に、簡易且つ確実に0.01
μmの高精度に測定表示することを目的とするも
のである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a flatness measuring method for displaying flatness by receiving, self-scanning, and calculating mainly primary interference fringes by a Fizeau interference or Michelson interference optical system with a photodiode array. It is possible to reduce the flatness to 0.01 economically, easily and reliably.
The purpose is to measure and display with high precision of μm.

物体表面の平面度は一般に、白色光或は単色光
の下でオプチカルフラツトを使用して其の干渉縞
模様から読取る方法が広く行なわれている。即ち
第1図イ,ロに於て、1はオプチカルフラツトに
よる干渉縞パターンで其の干渉縞ピツチPに対し
干渉縞パターンの撓みΔpを目測或はスケールに
よつて読取り、下記の式によつて平面度を計算す
る。
Generally, the flatness of an object's surface is measured by using an optical flat under white light or monochromatic light and reading its interference fringe pattern. That is, in Fig. 1 A and B, 1 is an interference fringe pattern formed by optical flat, and the deflection Δp of the interference fringe pattern is read by visual measurement or a scale with respect to the interference fringe pitch P, and is calculated by the following formula. Then calculate the flatness.

平面度=λ/2n×Δp/P 但し、上の式中 λ=干渉波長、n=干渉次数、 一般には、此の次数nは、n=1であり、又
△p/Pを判読出来る分解能は一般的に20%程度のも のである。従つてλ=0.6μm(一例としてHe−
Neレーザー光は、λ=0.633μm)とすれば、平
面度は0.06μm(0.6μm/2×20/100=0.06
μm)のオ ーダーの精度で表わされていることになり、現在
要求されている0.01μmのオーダーの平面度測定
精度を得るためには、n=3〜5の高次の正確な
干渉縞を得る必要がある。其のためには強大な光
源を必要とすると共に光学系の部品の精度を高く
し、他のノイズが入らないよう光の進路を選択す
る必要があり、従つて装置は高価なものになり又
其の調整、維持も困難である。
Flatness = λ/2n x Δp/P However, in the above formula, λ = interference wavelength, n = interference order, generally, this order n is n = 1, and the resolution that can read △p/P is generally around 20%. Therefore, λ = 0.6 μm (He-
For Ne laser light, if λ = 0.633 μm), the flatness is 0.06 μm (0.6 μm/2 x 20/100 = 0.06
In order to obtain the currently required flatness measurement accuracy of the order of 0.01 μm, accurate high-order interference fringes of n = 3 to 5 are required. need to get it. For this purpose, a powerful light source is required, the precision of the optical system components is high, and the path of the light must be selected so as not to introduce other noises, which makes the equipment expensive and complicated. It is also difficult to adjust and maintain it.

上述のような従来の測定方法に対し本発明は、
フイゾー干渉或はマイケルソン干渉光学系による
一次干渉縞をフオトダイオードアレイで受光、自
己走査、演算して平面度を0.01μmのオーダーの
高精度で平面度を表示することを特徴とするもの
で、以下に本発明の平面度測定方法について詳細
に説明する。
In contrast to the conventional measurement method as described above, the present invention
It is characterized by receiving the primary interference fringes produced by the Fizeau interference or Michelson interference optical system with a photodiode array, self-scanning it, and calculating it to display the flatness with high accuracy on the order of 0.01 μm. The flatness measuring method of the present invention will be explained in detail below.

第2図は本発明の測定方法の一実施例をブロツ
ク図式に示しており、2はフイゾー干渉或はマイ
ケルソン干渉光学系による一次干渉縞のパターン
で、其の縞模様を構成している実線3及び点線4
は夫々干渉縞の山と谷を表わしている。5は自己
走査機能を持つたフオトダイオードアレイ(イメ
ージセンサー)で、干渉縞に略々直交するよう配
置され且つ矢印で示すように一直線上を平行移動
するよう設けられている。本実施例の場合、フオ
トダイオードアレイは512ビツト(素子)を有
し、後述のA/D(アナログ/デイジタル)コン
バータの処理速度10kHzと同等以上の自己走査機
能、つまり1走査約1/20秒以下の機能を備えてい
る。このフオトダイオードアレイを例えば5mm/
秒の速度で適当な距離、矢印方向につまり干渉縞
の延在方向に移動させる。この距離はその間にお
ける干渉縞のパターンの撓み△pがフオトダイオ
ードアレイの素子間ピツチに比して十分大きな値
となるように選定される。第2図の例では干渉縞
のパターン2の左側の鎖線6から右側の破線迄の
間を移動させている。なお干渉縞のパターンは図
示の如く複数の山、谷が現れた状態とし、フオト
ダイオードアレイはこの複数の干渉縞を捉える状
態で平行に移動する。
FIG. 2 shows a block diagram of an embodiment of the measurement method of the present invention, and 2 is a pattern of primary interference fringes produced by Fizeau interference or Michelson interference optical system, and the solid lines constituting the fringe pattern are 3 and dotted line 4
represent the peaks and valleys of the interference fringes, respectively. Reference numeral 5 denotes a photodiode array (image sensor) having a self-scanning function, which is arranged so as to be substantially orthogonal to the interference fringes, and is provided so as to move in parallel on a straight line as shown by the arrow. In the case of this example, the photodiode array has 512 bits (elements) and has a self-scanning function that is equivalent to or higher than the processing speed of 10 kHz of the A/D (analog/digital) converter described later, that is, one scan is approximately 1/20 seconds. It has the following functions. This photodiode array is, for example, 5mm/
It is moved an appropriate distance at a speed of seconds in the direction of the arrow, that is, in the direction in which the interference fringes extend. This distance is selected so that the deflection Δp of the pattern of interference fringes therebetween is sufficiently large compared to the pitch between elements of the photodiode array. In the example of FIG. 2, the interference fringe pattern 2 is moved between a chain line 6 on the left side and a broken line on the right side. As shown in the figure, the interference fringe pattern has a plurality of peaks and valleys, and the photodiode array moves in parallel while capturing the plurality of interference fringes.

このようにフオトダイオードアレイを矢印方向
に移動させる間、移動方向の適当な3位置でその
自己走査を行わせる。前述のようにフオトダイオ
ードアレイの自己走査速度は移動速度に比して十
分速いから自己走査の間その移動を停止する必要
はない。フオトダイオードアレイの各素子の出力
はブロツク図に示すように順次増幅回路にて増幅
され、ピークホールド回路にてピークホールドさ
れ、そのホールド信号値をA/Dコンバーターで
デイジタル値に変換してマイクロプロセツサーに
読込ませ、これに演算処理を行わせて平面度を求
めてこれを表示装置に表示させる。
While the photodiode array is thus moved in the direction of the arrow, self-scanning is performed at three appropriate positions in the direction of movement. As mentioned above, the self-scanning speed of the photodiode array is sufficiently faster than the movement speed, so there is no need to stop its movement during self-scanning. As shown in the block diagram, the output of each element of the photodiode array is sequentially amplified by an amplifier circuit, peak-held by a peak-hold circuit, and the hold signal value is converted into a digital value by an A/D converter and sent to the microprocessor. The data is read into a setter, which performs arithmetic processing to determine the flatness, and displays this on a display device.

この演算処理を少し詳しく説明する。マイクロ
プロセツサーにはフオトダイオードアレイの1回
の自己走査によつて512素子分の各素子が捉えた
領域の明るさに関するデータが得られることにな
る。これらのデータは各素子の出力特性のバラツ
キを補正するために各素子とこれに相隣する2つ
の素子の3素子の平均値を算出して当該素子(3
つの中央に位置する素子)の値とする処理を行
う。このように補正して得た512素子分のデータ
に基づき、干渉縞の山3つまり明縞、又は谷(4)つ
まり暗縞の中心に相当する素子、つまり極大値又
は極小値をとる素子の番号(フオトダイオードア
レイの一端を基準として順次的に定めておく)を
特定する。このような素子数は縞数だけ、つまり
第2図の例では4又は5個存在する。なお一般的
には検出信号のピーク、つまり山3を求めるよう
にすればよいがフオトダイオードの出力の飽和を
考慮してボトム、つまり谷4を求めるようにして
もよい。
This arithmetic processing will be explained in a little more detail. One self-scanning of the photodiode array provides the microprocessor with data regarding the brightness of the area captured by each of the 512 elements. These data are calculated by calculating the average value of three elements, each element and two adjacent elements, in order to correct variations in the output characteristics of each element.
Processing is performed to set the value of the element located in the center of the two elements. Based on the data for 512 elements obtained by correcting in this way, the elements corresponding to the center of peak 3 (bright fringe) or trough (4) or dark fringe of the interference fringe, that is, the element that takes the maximum value or minimum value, are calculated. Identify the number (defined sequentially with one end of the photodiode array as a reference). The number of such elements is equal to the number of stripes, that is, 4 or 5 in the example of FIG. 2. In general, the peak of the detection signal, that is, the peak 3, may be determined, but the bottom, that is, the valley 4, may be determined in consideration of the saturation of the output of the photodiode.

以上の如くして素子番号の特定が移動方向の3
位置において行われると次のようにして△pを算
出する。いまこの3位置を第2図の鎖線6及び中
央、右側の破線の位置とし、同一の山3〔又は谷
4〕についての鎖線6位置での素子番号を
(Min)1、中央の破線位置での素子番号を
(Max)、右側の破線位置での素子番号を(Min)2
とすると △p=K{(Max)−(Min)+(Min)
2} 但し、Kはフオトダイオードアレイの素子間ピ
ツチ として求める。このような△pは山又は谷の数だ
け算出されるが、それらの1つを用いるか、平均
値、中央値を用いるかは任意である。
As described above, the element number can be specified in the 3rd direction of movement.
When performed at the position, Δp is calculated as follows. Now let these three positions be the positions of the chain line 6 and the center, right dashed line in Figure 2, and the element number at the chain line 6 position for the same peak 3 [or valley 4] is (Min) 1 , and at the center dashed line position. The element number at (Max) and the element number at the dashed line position on the right (Min) 2
Then, △p=K{(Max)−(Min) 1 +(Min) 2 /
2} However, K is determined as the pitch between elements of the photodiode array. Such Δp is calculated as many times as there are peaks or valleys, but it is arbitrary whether one of them is used or the average value or median value is used.

次にPを求めるが、これは例えば中央の破線位
置において、相隣る2つの山又は谷の各中心に
夫々位置するとして番号を特定された素子の各番
号(MAX)、(MAX)′を用いて P=K|(MAX)−(MAX)′| として算出する。このPも複数算出し得るが、そ
の一つを用いるか平均値、中央値を用いるかは任
意である。また左右の鎖線、破線の位置で同様に
算出してもよいことは勿論である。
Next, P is determined, for example, at the center dashed line position, each number (MAX), (MAX)' of the element whose number is specified as being located at the center of two adjacent peaks or valleys, respectively. P=K|(MAX)−(MAX)′| This P can also be calculated in multiple numbers, but it is optional whether one of them is used, or the average value or median value is used. It goes without saying that calculations may be made in the same way at the positions of the left and right dashed lines and broken lines.

なお△Pの算出に際しては寸法換算でλ/4以
上離れたデータは別個の山又は谷に相当する値で
あるとして、誤算出の防止を図る。これはフオト
ダイオードアレイの自己走査を行わせる位置にて
縞間ピツチ(λ/2)の1/2以上ずれたパターン
は実際には現れることが極めて少ないということ
を利用している。
Note that when calculating ΔP, it is assumed that data separated by λ/4 or more in terms of dimensions are values corresponding to separate peaks or valleys to prevent miscalculations. This takes advantage of the fact that a pattern that is shifted by more than 1/2 of the inter-fringe pitch (λ/2) at the position where the photodiode array performs self-scanning is actually extremely rare.

以上のようにして△p,Pを求めたあとは、 平面度=λ/2n×△p/P として平面度を算出する。なおこの式から理解さ
れるように△p,Pはその比として用いられるか
ら△p,P夫々の実際の計算には前述のKは不要
である。
After determining Δp and P as described above, the flatness is calculated as follows: flatness=λ/2n×Δp/P. As understood from this equation, since Δp and P are used as their ratios, the above-mentioned K is not necessary for the actual calculation of Δp and P, respectively.

以上に説明したように、本発明の測定方法は干
渉縞の山又は谷の同定を山又は谷がλ/4以上離
れているものを除外することによつて行つている
ので、△p或いは平面度の測定に著しく大きな誤
差を含むことがない。そしてフオトダイオードア
レイの自己走査を用いることによつて、例えば自
己走査に際してフオトダイオードアレイの512ビ
ツトの範囲内に5本の干渉縞が入るとしても、干
渉縞1本当り約100ビツトの分解能が得られ、山
又は谷の中心の算出精度を±1ビツトとしても
2/100=2%の分解能を持ち、従つてλ=0.6μm
と して0.006μm(0.6μm/2×0.02=0.006μm)の
オ ーダーの精度で平面度を表示することが出来、当
初に記述した0.01μmのオーダーの平面度測定、
表示を簡易且つ確実に達成することが出来る。
As explained above, the measurement method of the present invention identifies peaks or valleys in interference fringes by excluding peaks or valleys that are separated by λ/4 or more. There is no significantly large error in the measurement of degree. By using self-scanning of the photodiode array, for example, even if five interference fringes fall within the 512-bit range of the photodiode array during self-scanning, a resolution of about 100 bits per interference fringe can be obtained. Even if the calculation accuracy of the center of the peak or valley is ±1 bit, the resolution is 2/100 = 2%, so λ = 0.6 μm.
It is possible to display flatness with an accuracy of the order of 0.006 μm (0.6 μm/2 x 0.02 = 0.006 μm), and the flatness measurement of the order of 0.01 μm as described at the beginning,
Display can be achieved simply and reliably.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図イ,ロは公知のオプチカルフラツトによ
る干渉縞のパターンを示す説明図、第2図は本発
明の平面度測定方法をブロツク図式に表わした説
明図である。以下図中の符号の説明。 1:オプチカルフラツトによる干渉縞のパター
ン、2:フイゾー干渉或はマイケルソン工学系に
よる干渉縞のパターン、3:パターン2の干渉縞
の山(実線で表示)、4:仝上の谷(点線で表
示)、5:フオトダイオードアレイ(イメージセ
ンサー)、6:フオトダイオードアレイ5の自己
走査スタート位置(鎖線で表示)。
FIGS. 1A and 1B are explanatory diagrams showing patterns of interference fringes by a known optical flat, and FIG. 2 is an explanatory diagram showing a flatness measuring method of the present invention in a block diagram. Below is an explanation of the symbols in the figure. 1: Pattern of interference fringes due to optical flats, 2: Pattern of interference fringes due to Fizeau interference or Michelson engineering, 3: Peaks of interference fringes of pattern 2 (shown as solid lines), 4: Valleys above (dotted lines) ), 5: photodiode array (image sensor), 6: self-scanning start position of photodiode array 5 (represented by a chain line).

Claims (1)

【特許請求の範囲】 1 フイゾー干渉或いはマイケルソン干渉光学系
による干渉縞に対して略々直交するよう配置した
フオトダイオードアレイを縞目に沿う方向の相異
なる複数の位置にて自己走査させ、その出力から
マイクロプロセツサーによつて干渉縞の山又は谷
を読み取り、読取つた山又は谷のデータに基づき
干渉縞のピツチPを演算し、また前記相異なる複
数の位置にて読み取られた山又は谷のうちλ/4
(但しλ=波長)以上離れていないものを同一の
山又は谷としてパターンの撓みΔpを演算すると
同時に平面度 (λ/2×Δp/P)を演算表示することを特徴とす
る 平面度測定方法。
[Claims] 1. A photodiode array arranged to be substantially orthogonal to the interference fringes produced by Fizeau interference or Michelson interference optical system is self-scanned at a plurality of different positions in the direction along the fringes; A microprocessor reads the peaks or valleys of the interference fringe from the output, calculates the pitch P of the interference fringe based on the data of the read peaks or valleys, and calculates the peaks or valleys read at the plurality of different positions. λ/4 inside the valley
A flatness measuring method characterized by calculating and displaying the flatness (λ/2×Δp/P) at the same time as calculating the deflection Δp of the pattern by assuming that the peaks or valleys are the same when the distance is not more than λ=wavelength. .
JP6867478A 1978-06-06 1978-06-06 Method of measuring flatness Granted JPS54159258A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6867478A JPS54159258A (en) 1978-06-06 1978-06-06 Method of measuring flatness

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6867478A JPS54159258A (en) 1978-06-06 1978-06-06 Method of measuring flatness

Publications (2)

Publication Number Publication Date
JPS54159258A JPS54159258A (en) 1979-12-15
JPS6253764B2 true JPS6253764B2 (en) 1987-11-12

Family

ID=13380488

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6867478A Granted JPS54159258A (en) 1978-06-06 1978-06-06 Method of measuring flatness

Country Status (1)

Country Link
JP (1) JPS54159258A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58111709A (en) * 1981-12-25 1983-07-02 Sumitomo Special Metals Co Ltd Flatness measuring device
US4627733A (en) * 1981-12-25 1986-12-09 Sumitomo Special Metals Co., Ltd. Flatness measuring apparatus
JPS5960505U (en) * 1982-10-14 1984-04-20 株式会社山武 shape recognition device
JP4529227B2 (en) * 2000-04-19 2010-08-25 Nok株式会社 Plane inspection apparatus and plane inspection method

Also Published As

Publication number Publication date
JPS54159258A (en) 1979-12-15

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