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JPS6255705B2 - - Google Patents
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JPS6255705B2 - - Google Patents

Info

Publication number
JPS6255705B2
JPS6255705B2 JP55005775A JP577580A JPS6255705B2 JP S6255705 B2 JPS6255705 B2 JP S6255705B2 JP 55005775 A JP55005775 A JP 55005775A JP 577580 A JP577580 A JP 577580A JP S6255705 B2 JPS6255705 B2 JP S6255705B2
Authority
JP
Japan
Prior art keywords
semiconductor chip
glass sleeve
pair
semiconductor device
electrodes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55005775A
Other languages
Japanese (ja)
Other versions
JPS56104463A (en
Inventor
Masahiko Yamada
Kenzo Shima
Kensuke Suzuki
Mitsusachi Matsuzaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Minebea Power Semiconductor Device Inc
Original Assignee
Hitachi Ltd
Hitachi Haramachi Electronics Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Hitachi Haramachi Electronics Ltd filed Critical Hitachi Ltd
Priority to JP577580A priority Critical patent/JPS56104463A/en
Publication of JPS56104463A publication Critical patent/JPS56104463A/en
Publication of JPS6255705B2 publication Critical patent/JPS6255705B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W76/00Containers; Fillings or auxiliary members therefor; Seals
    • H10W76/10Containers or parts thereof
    • H10W76/12Containers or parts thereof characterised by their shape
    • H10W76/13Containers comprising a conductive base serving as an interconnection
    • H10W76/138Containers comprising a conductive base serving as an interconnection having another interconnection being formed by a cover plate parallel to the conductive base, e.g. sandwich type
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages

Landscapes

  • Electrodes Of Semiconductors (AREA)

Description

【発明の詳細な説明】 本発明はガラススリーブを溶着して半導体チツ
プとその両端に延在する外部引き出し電極を挾着
するような構造を有する半導体装置(ガラススリ
ーブ型半導体装置と呼ぶ)に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a semiconductor device (referred to as a glass sleeve type semiconductor device) having a structure in which a glass sleeve is welded to clamp a semiconductor chip and external extraction electrodes extending to both ends of the semiconductor chip.

ガラススリーブ型半導体装置は、第1図、第2
図にその一例の構造を示すように、通常シリコン
から成り所定のpn接合を有する半導体6と、該
半導体の少なくとも一主表面に形成された、熱、
電気伝導性の良好な金属電極部5および他方の金
属電極膜7により構成される半導体チツプと、
その両端に存在する一対の外部引き出し電極2
(例えば、鉄とニツケルの合金が中央部に存在
し、該合金部を銅管で被覆してなる導電性物質
で、ガラススリーブ3の溶着部には、硼砂を焼き
付けてあり、ガラスとのぬれ性を良くしてあ
る。)と、該外部引き出し電極2のそれぞれの一
端に溶接され、外部引き出し電極と一体構造を有
する導電性の良好な一対のリード線4(例えば銅
線が利用される)そして前記ガラススリーブ3と
を有する。
The glass sleeve type semiconductor device is shown in Figures 1 and 2.
As shown in the figure, a semiconductor 6, which is usually made of silicon and has a predetermined pn junction, and a heat source formed on at least one main surface of the semiconductor,
A semiconductor chip 1 composed of a metal electrode portion 5 with good electrical conductivity and the other metal electrode film 7;
A pair of external extraction electrodes 2 present at both ends
(For example, an alloy of iron and nickel is present in the center, and the alloy is covered with a copper tube, which is a conductive material. Borax is baked into the welded part of the glass sleeve 3, so that it does not wet with the glass.) ) and a pair of lead wires 4 (copper wires are used, for example) with good conductivity, which are welded to one end of each of the external extraction electrodes 2 and have an integral structure with the external extraction electrodes. and the glass sleeve 3.

このようなガラススリーブ型半導体装置の製造
に際しては、前記半導体チツプ1と、その両端に
一体構造化された外部引き出し電極2とリード線
4を所定関係に置き、両端の外部引き出し電極2
を包むように、ガラススリーブ3を耐熱性のある
カーボン等の治具を用いて固定し、ガラススリー
ブが溶解するのに十分な温度の不活性雰囲気内に
必要な時間保持し、ガラススリーブが溶解したの
ちに、冷却する工程よりなる。ある温度まで冷却
するとガラススリーブ3は外部引き出し電極2と
固着する。半導体チツプの主表面面積は通常外部
引き出し電極面積に比べて小さいので、ガラスと
半導体チツプとは直接固着しない。
When manufacturing such a glass sleeve type semiconductor device, the semiconductor chip 1, the external lead-out electrodes 2 and lead wires 4 integrally formed at both ends are placed in a predetermined relationship, and the external lead-out electrodes 2 at both ends are placed in a predetermined relationship.
The glass sleeve 3 is fixed using a jig made of heat-resistant carbon or the like so as to enclose the glass sleeve, and is kept in an inert atmosphere at a temperature sufficient to melt the glass sleeve for the necessary time, until the glass sleeve melts. This is followed by a cooling process. When cooled to a certain temperature, the glass sleeve 3 is fixed to the external lead electrode 2. Since the main surface area of the semiconductor chip is usually smaller than the area of the external lead electrodes, the glass and the semiconductor chip are not directly bonded to each other.

そしてガラススリーブの固着温度以下の冷却過
程において、半導体チツプ全体の見かけ上の熱膨
脹係数とガラススリーブの見かけ上の熱膨脹係数
では、通常、ガラススリーブの見かけ上の熱膨脹
係数が大であるので、半導体チツプ1はその両端
から圧接され、半導体チツプ1と外部引き出し電
極2とが、電気的、機械的に接続され、半導体装
置としての機能を有するようになる。
During the cooling process below the fixing temperature of the glass sleeve, the apparent coefficient of thermal expansion of the glass sleeve is usually larger than that of the entire semiconductor chip and that of the glass sleeve. 1 is pressed from both ends thereof, and the semiconductor chip 1 and the external lead electrode 2 are electrically and mechanically connected to have a function as a semiconductor device.

この種半導体装置の圧接強度は、前述したよう
に半導体チツプとガラススリーブの熱膨脹係数の
差によつて決まるが、圧接力が弱いと外部から加
わる引張力に弱い欠点があり、反対に圧接力が強
過ぎると半導体チツプ上に形成された金属電極部
材のそ性変形による素子の劣化または残留応力に
よるガラススリーブの破損を生じる欠点がある。
As mentioned above, the pressure bonding strength of this type of semiconductor device is determined by the difference in thermal expansion coefficient between the semiconductor chip and the glass sleeve, but if the pressure bonding force is weak, it will be weak against tensile force applied from outside, and conversely, the pressure bonding force will be weak. If it is too strong, there is a drawback that the metal electrode member formed on the semiconductor chip may deteriorate due to warp deformation or the glass sleeve may be damaged due to residual stress.

従つて圧接力をいかにコントロールするかがこ
の構造での素子の信頼性を大きく左右する。
Therefore, how the pressure contact force is controlled greatly influences the reliability of the device with this structure.

本発明は、前記の半導体チツプへの圧接力を適
度にすることによつて半導体装置の信頼性を向上
することを目的とし、従来のガラススリーブ型半
導体装置の製造方法を変更することなく、該半導
体装置の信頼性向上を得ることができるものであ
る。
The present invention aims to improve the reliability of a semiconductor device by making the pressing force on the semiconductor chip moderate, and without changing the conventional manufacturing method of glass sleeve type semiconductor devices. This makes it possible to improve the reliability of the semiconductor device.

本発明者らの実験によれば、電極材の硬度と圧
接力との関連は、第3図に示すようになる。この
結果から、該半導体チツプ上に形成された金属電
極のビツカース硬度が20以下になると、該半導体
チツプにかかる圧接力は、急激に低下することが
確認された。さらに、圧接力が低下する原因につ
いて調べた結果、電極材の硬度が低過ぎると、素
子製造時にスリーブより加わる圧接力により、電
極材が変形し、実質的な締付け代が減少するため
であることがわかつた。
According to experiments conducted by the present inventors, the relationship between the hardness of the electrode material and the pressure contact force is as shown in FIG. From this result, it was confirmed that when the Vickers hardness of the metal electrode formed on the semiconductor chip becomes 20 or less, the pressure applied to the semiconductor chip decreases rapidly. Furthermore, as a result of investigating the cause of the decrease in pressure contact force, it was found that if the hardness of the electrode material is too low, the electrode material will be deformed by the pressure contact force applied from the sleeve during element manufacturing, reducing the actual tightening allowance. I understood.

また、本発明者らの他の実験によれば、電極の
硬度とくり返し熱疲労との関連は第4図に示すよ
うになり、この結果から該半導体チツプ上に形成
される金属電極のビツカース硬度が50以上になる
と、該半導体装置にかかるくり返し熱疲労による
不良発生率が急激に増大することが確認された。
Furthermore, according to other experiments conducted by the present inventors, the relationship between the hardness of the electrode and repeated thermal fatigue is shown in FIG. It has been confirmed that when the number of defects exceeds 50, the failure rate due to repeated thermal fatigue of the semiconductor device increases rapidly.

なお、以上の実験では、該金属電極として、メ
ツキにより形成したAgを用い、メツキ条件、熱
処理条件等を可変することにより、ビツカース硬
度の異なる数種の実験サンプルを作製した。
In the above experiments, Ag formed by plating was used as the metal electrode, and by varying the plating conditions, heat treatment conditions, etc., several types of experimental samples with different Vickers hardness were prepared.

以上のことから本発明による該半導体上に形成
される金属のビツカース硬度の最適値は20〜50の
範囲にあることが明らかである。
From the above, it is clear that the optimum value of the Vickers hardness of the metal formed on the semiconductor according to the present invention is in the range of 20 to 50.

本発明によれば、半導体チツプ製造工程におい
て、半導体上の金属電極のビツカース硬度が、20
〜50の範囲となるように製造した半導体チツプを
用い、従来の工程にしたがつてガラススリーブ型
半導体装置を製造することにより、ガラススリー
ブ型半導体装置の信頼性を向上させるという効果
がある。
According to the present invention, in the semiconductor chip manufacturing process, the Vickers hardness of the metal electrode on the semiconductor is 20
By manufacturing a glass sleeve type semiconductor device according to a conventional process using a semiconductor chip manufactured to have a temperature in the range of .about.50, the reliability of the glass sleeve type semiconductor device can be improved.

なお、以上では金属電極材料としてAgを用い
た場合について述べたが、他の金属材料をも使用
できることは当然であり、その硬度は金属膜付着
条件や熱処理条件を変えることによつて制御する
ことが可能である。
In addition, although the case where Ag is used as the metal electrode material has been described above, it is obvious that other metal materials can also be used, and the hardness can be controlled by changing the metal film adhesion conditions and heat treatment conditions. is possible.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はガラススリーブ型半導体装置の断面
図、第2図は半導体チツプの断面図、第3図は、
半導体上の金属電極のビツカース硬度に対する、
該半導体チツプにかかる圧接力の関係を示す図、
第4図は、半導体上の金属電極のビツカース硬度
に対する、該半導体装置のくり返し熱疲労による
不良発生率の関係を示す図である。 1……半導体チツプ、2……外部引き出し電
極、3……ガラススリーブ、4……リード線、5
……半導体チツプの金属電極、6……半導体。
Fig. 1 is a sectional view of a glass sleeve type semiconductor device, Fig. 2 is a sectional view of a semiconductor chip, and Fig. 3 is a sectional view of a glass sleeve type semiconductor device.
Regarding the Vickers hardness of metal electrodes on semiconductors,
A diagram showing the relationship between the pressure contact force applied to the semiconductor chip,
FIG. 4 is a diagram showing the relationship between the Vickers hardness of a metal electrode on a semiconductor and the failure rate due to repeated thermal fatigue of the semiconductor device. 1... Semiconductor chip, 2... External extraction electrode, 3... Glass sleeve, 4... Lead wire, 5
...Metal electrode of semiconductor chip, 6...Semiconductor.

Claims (1)

【特許請求の範囲】[Claims] 1 一対の主表面間に所定のpn接合を有し、一
対の主表面上にそれぞれ電極膜を有する半導体チ
ツプと、上記一対の電極膜にそれぞれ接続された
一対の電極と、一対の電極と加熱下で接着され、
半導体チツプを一対の電極間に挾着するガラスス
リーブとを有するガラススリーブ型半導体装置に
おいて、上記半導体チツプの少なくとも一方の電
極膜の硬度が、ビツカース法による硬度表現にお
いて、20〜50の範囲にあることを特徴とする半導
体装置。
1. A semiconductor chip having a predetermined pn junction between a pair of main surfaces and having electrode films on each of the pair of main surfaces, a pair of electrodes respectively connected to the pair of electrode films, and a pair of electrodes and heating. Glued under;
In a glass sleeve type semiconductor device having a glass sleeve that clamps a semiconductor chip between a pair of electrodes, the hardness of at least one electrode film of the semiconductor chip is in the range of 20 to 50 in terms of hardness expressed by the Vickers method. A semiconductor device characterized by:
JP577580A 1980-01-23 1980-01-23 Semiconductor device Granted JPS56104463A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP577580A JPS56104463A (en) 1980-01-23 1980-01-23 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP577580A JPS56104463A (en) 1980-01-23 1980-01-23 Semiconductor device

Publications (2)

Publication Number Publication Date
JPS56104463A JPS56104463A (en) 1981-08-20
JPS6255705B2 true JPS6255705B2 (en) 1987-11-20

Family

ID=11620484

Family Applications (1)

Application Number Title Priority Date Filing Date
JP577580A Granted JPS56104463A (en) 1980-01-23 1980-01-23 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS56104463A (en)

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS553259B2 (en) * 1972-08-10 1980-01-24
JPS5336496B2 (en) * 1973-03-16 1978-10-03
JPS5317070A (en) * 1976-07-30 1978-02-16 Nec Corp Semiconductor device

Also Published As

Publication number Publication date
JPS56104463A (en) 1981-08-20

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