JPS62730B2 - - Google Patents
Info
- Publication number
- JPS62730B2 JPS62730B2 JP2660679A JP2660679A JPS62730B2 JP S62730 B2 JPS62730 B2 JP S62730B2 JP 2660679 A JP2660679 A JP 2660679A JP 2660679 A JP2660679 A JP 2660679A JP S62730 B2 JPS62730 B2 JP S62730B2
- Authority
- JP
- Japan
- Prior art keywords
- laser
- nozzle
- irradiation chamber
- valve
- isotopic compounds
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 150000001875 compounds Chemical class 0.000 claims description 22
- 238000000034 method Methods 0.000 claims description 20
- 230000000155 isotopic effect Effects 0.000 claims description 19
- 238000005372 isotope separation Methods 0.000 claims description 9
- 238000000926 separation method Methods 0.000 claims description 6
- 239000008246 gaseous mixture Substances 0.000 claims description 4
- 230000003447 ipsilateral effect Effects 0.000 claims 1
- 239000000203 mixture Substances 0.000 description 11
- 239000000463 material Substances 0.000 description 9
- 230000005284 excitation Effects 0.000 description 7
- 238000010586 diagram Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 229910052770 Uranium Inorganic materials 0.000 description 3
- JFALSRSLKYAFGM-UHFFFAOYSA-N uranium(0) Chemical compound [U] JFALSRSLKYAFGM-UHFFFAOYSA-N 0.000 description 3
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 238000007725 thermal activation Methods 0.000 description 1
- 150000003671 uranium compounds Chemical class 0.000 description 1
- JFALSRSLKYAFGM-OIOBTWANSA-N uranium-235 Chemical compound [235U] JFALSRSLKYAFGM-OIOBTWANSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000010626 work up procedure Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D59/00—Separation of different isotopes of the same chemical element
- B01D59/34—Separation by photochemical methods
Landscapes
- Life Sciences & Earth Sciences (AREA)
- Biophysics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Lasers (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
【発明の詳細な説明】
本発明はガス状同位体化合物の混合物からレー
ザパルス光を用いてその中に含まれる同位体化合
物の同位体選択励起とそれに続く同位体化合物の
化学的又は物理的分離による経済的な同位体分離
方法に関する。このような方法においてはすべ
て、一つの同位体化合物のみを励起することによ
り、この同位体化合物が一つの化合物となり、こ
の新しい化合物は通常の機械的および化学的手段
で最初の混合物質から比較的容易に分離すること
ができる。その結果この新しい化合物はとりわ
け、例えばウラン235のような所望の同位体を
を含む。この原理による同位体分離は、特にウラ
ンに対し工業的に重要である。何故なら、天然ウ
ラン中には利用可能な該分裂性同位体ウラン23
5がもともと0.7%までしか存在せず、軽水形原
子炉に対する燃料物質としては約2〜3%に濃縮
しなければならないからである。DETAILED DESCRIPTION OF THE INVENTION The present invention provides isotopic selective excitation of isotopic compounds contained in a mixture of gaseous isotopic compounds using pulsed laser light and subsequent chemical or physical separation of the isotopic compounds. Concerning an economical isotope separation method. In all such methods, only one isotopic compound is excited, so that this isotopic compound becomes a single compound, and this new compound is relatively removed from the initial mixture by conventional mechanical and chemical means. Can be easily separated. As a result, this new compound contains, inter alia, the desired isotope, such as, for example, uranium-235. Isotope separation based on this principle is particularly important industrially for uranium. This is because natural uranium contains the available fissile isotope uranium-23.
This is because 5 is originally present at only up to 0.7% and must be enriched to about 2-3% for use as a fuel material for light water reactors.
一つの同位体化合物の励起はしかし、これをイ
オン化し、それにより電気的手段で分離可能にす
るか、又はレーザ光線自体の電界による偏向が可
能になるように同位体化合物の双極子特性を変え
るためにも用いられる。物理的および化学的分離
によるレーザ誘導の同位体分離方法の詳細はドイ
ツ連邦共和国特許出願公開第2311584号及び第
2324797号明細書に記載されている。分子エネル
ギーレベルの選択的励起を介しての同位体分離の
ための別の提案はドイツ連邦共和国特許出願公開
第2459989号明細書に見られ、そこでは特に赤外
および紫外領域における波長の利用について述べ
られている。 Excitation of one isotopic compound, however, ionizes it, thereby changing the dipole properties of the isotopic compound so that it can be separated by electrical means or deflected by the electric field of the laser beam itself. It is also used for Details of laser-induced isotope separation methods by physical and chemical separation can be found in German Patent Applications No. 2311584 and No.
It is described in the specification of No. 2324797. Another proposal for isotopic separation via selective excitation of molecular energy levels can be found in German Patent Application No. 2459989, which specifically describes the use of wavelengths in the infrared and ultraviolet regions. It is being
すべてのウラン同位体分離方法は、実際に単一
のウラン化合物として十分な蒸気圧を有する化合
物UF6から出発する。しかし通常の温度で行われ
る選択的励起は、その吸収バンド、共鳴交換およ
び熱的活性化反応の重畳のために所望の濃縮値が
得られず、その結果改善のために蒸気状同位体化
合物を100K以下の温度に断熱的に膨張し、そし
てなおその凝結の前に共振器にに導かれる適当な
周波数のレーザ光線によつて照射することが望ま
しいことが判つた。それについてはドイツ連邦共
和国特許出願公開第2447762号明細書に記載され
ている。又断熱膨張の代わりに、導くべき中性の
著しく過冷却された添加ガスにより同位体混合物
の冷却を行うこともドイツ連邦共和国特許出願公
開打2651306号明細書に見られるようにすでに提
案されている。 All uranium isotope separation methods start from the compound UF 6 , which has sufficient vapor pressure to be practically a single uranium compound. However, selective excitation carried out at normal temperatures does not yield the desired enrichment values due to the superposition of absorption bands, resonance exchange and thermal activation reactions, and as a result vaporized isotopic compounds are used for improvement. It has been found desirable to expand adiabatically to a temperature below 100 K and still before condensation be irradiated by a laser beam of a suitable frequency directed into the resonator. This is described in German Patent Application No. 2447762. It has also already been proposed, instead of adiabatic expansion, to carry out cooling of the isotope mixture by means of a neutral, highly supercooled additive gas to be introduced, as can be seen in German Patent Application No. 2,651,306. .
しかしこれらの同位体分離方法の経済性は、い
わゆる連続発振レーザを用いるときにのみ可能で
ある。このような装置はしかし必要な出力をもつ
ものが実際にはまだ提供されていない。 However, the economy of these isotope separation methods is only possible when using so-called continuous wave lasers. Such devices, however, are not yet available in practice with the necessary output.
それ故レーザ開発の現在の状態においては、パ
ルス発振レーザによつて同位体分離方法を実施す
る課題が存在する。1ns程度のレーザパルスは非
常に短く、パルス繰返し周波数も最大約100Hzで
あるから、そのようなパルス発振レーザを使用し
た従来の方法は非常に僅かな物質量しか励起でき
ず、その結果上述の方法におけるパルス発振レー
ザの使用は経済的な面から不利である。その場合
導かれたガス混合物はつねに再び戻されなければ
ならず、それ故法外なポンプ出力が必要となる。 Therefore, in the current state of laser development, there is a problem in implementing isotope separation methods with pulsed lasers. Since the laser pulse of about 1 ns is very short and the pulse repetition frequency is up to about 100 Hz, conventional methods using such pulsed lasers can only excite a very small amount of material, and as a result, the method described above The use of pulsed lasers is economically disadvantageous. In that case, the gas mixture introduced must always be returned again, thus requiring an exorbitant pump power.
本発明の目的は、パルス発振レーザを経済的に
使用でき、導かれたすべての混合物質がその全体
にわたつて照射され励起可能の分子が実際に励起
されることを保証する方法を得ることにある。 The object of the invention is to obtain a method which allows the use of pulsed lasers economically and which ensures that all guided mixtures are irradiated throughout and that the excitable molecules are actually excited. be.
この目的は本発明によれば、ガス状混合物の同
位体化合物を特定の周波数のレーザパルス光によ
り選択励起し、次いで励起されない同位体化合物
から励起された同位体化合物を化学的又は物理的
に分離する方法において、同位体化合物のガス状
混合物を一定の時間間隔ΔT1でノズルを介して
断熱的に膨張せしめ100K以下に冷却し、その通
流時間ΔT2はそれぞれミリ秒の範囲に置き、ノ
ズルから周期的に出る流れを、全通流時間ΔT2
にわたつて、n個の順次発光するレーザの等間隔
で連続するパルスにさらし、nは通流時間ΔT2
と照射路内にガス分子が滞留する時間との比に等
しくすることによつて達成される。 This purpose, according to the invention, involves selectively exciting isotopic compounds of a gaseous mixture by laser pulsed light of a specific frequency and then chemically or physically separating the excited isotopic compounds from the unexcited isotopic compounds. In this method, a gaseous mixture of isotopic compounds is adiabatically expanded through a nozzle in a fixed time interval ΔT 1 and cooled to below 100 K, the flow time ΔT 2 being in the range of milliseconds respectively, and the nozzle The total flow time ΔT 2
exposure to equally spaced successive pulses of n sequentially emitting lasers over a period of time, where n is the conduction time ΔT 2
This is achieved by making the ratio equal to the residence time of the gas molecules in the irradiation path.
この方法はそれ故次の二つの特徴の組合わせに
基礎を置く。すなわち同位体分離装置に導かれる
ガス混合物は照射室を通じてつねに反覆する間隔
で短い通流期間の間送ること、およびその際多数
の順次発光すべきそれぞれ同じ周波数のレーザ装
置によりその全体にわたつて照射することの二つ
である。その場合次の考慮に基づいている。 This method is therefore based on a combination of two features: This means that the gas mixture introduced into the isotope separation device is passed through the irradiation chamber for short flow periods at repeating intervals and is then irradiated over its entirety by a number of successively emitting laser devices, each of the same frequency. There are two things to do. This is based on the following considerations:
研究の結果によれば、ガス混合物の動的冷却の
際に所望の同位体化合物の選択的励起と分離が約
2cmの道程で起るに違いないことを示した。照射
室に入る物質混合物の噴流速度が約500msの場
合、この道程を通ずる分子の飛行時間は約40μs
になる。いまこの2cm長さの区域全体をレーザパ
ルスで照射し、さらに40μsの後に次のレーザパ
ルスが続くようにすると、混合物質噴流の照射さ
れた領域は隙間なく相接して続く。そのために勿
論25kHzのパルス周波数を持つレーザが必要であ
るが、このような望ましい波長と出力範囲にある
レーザはまだ存在しない。必要なパルスエネルギ
ーは紫外領域(0.3〜0.4μm)で1Ws付近であ
り、赤外領域(16μm)では0.025Ws付近であ
る。 The results of the study showed that during dynamic cooling of the gas mixture selective excitation and separation of the desired isotopic compounds must occur over a path of about 2 cm. If the jet velocity of the material mixture entering the irradiation chamber is approximately 500 ms, the flight time of the molecules through this path is approximately 40 μs.
become. If this entire 2 cm long area is now irradiated with a laser pulse, and the next laser pulse follows after a further 40 μs, the irradiated areas of the mixed material jet will continue adjacent to each other without any gaps. Of course, this requires a laser with a pulse frequency of 25 kHz, but a laser in this desired wavelength and power range does not yet exist. The required pulse energy is around 1 Ws in the ultraviolet region (0.3 to 0.4 μm) and around 0.025 Ws in the infrared region (16 μm).
この困難は本発明によれば必要なパルス繰返し
周波数が多数の同様なレーザ装置の連続する発光
により形成されることにより克服される。しかし
このレーザ装置の数は、経済的な面から、又装置
技術的な面から、レーザ光線が照射室を同じ道で
通過するようにすべてのレーザ装置を配置しなけ
ればならないため制限されるから、順次発光すべ
きレーザ装置の照射時間の間だけ混合物質噴流が
照射室を通過するように配慮される。これは膨張
ノズルの前に弁を接続し、この弁はレーザの可能
なパルス繰返し周波数に対応する周期的間隔でそ
の長さが限定された混合物質の噴流を照射室を通
じて送ることによつて達成される。 This difficulty is overcome according to the invention in that the required pulse repetition frequency is generated by successive emission of a large number of similar laser devices. However, the number of laser devices is limited, both economically and technically, since all laser devices must be arranged so that the laser beam passes through the irradiation chamber in the same path. , care is taken that the mixed substance jet passes through the irradiation chamber only during the irradiation time of the laser device to emit light sequentially. This is accomplished by connecting a valve in front of the expansion nozzle, which sends a jet of mixed material through the irradiation chamber whose length is limited at periodic intervals corresponding to the possible pulse repetition frequency of the laser. be done.
次に本発明を図面について詳細に説明する。 The invention will now be explained in detail with reference to the drawings.
第1図は照射室3、ノズル2および弁4の空間
配置を概略的に示す。本方法は次のように進めら
れる。混合物46は流入導管45を経て弁4に流
れこむ。この弁4は筒状ハウジング41を備え、
それに一側で流入導管45が、他側で膨張ノズル
2が接続される。このハウジング41の内部にお
いて、スリツト43および44(これらは同様に
同じ直径上に向い合つて位置する)をそなえる回
転子42が一定り回転速度で回転する。このスリ
ツト43および44は、流入導管45とノズル2
との間の結合を形成するときは必ず、常に同じ長
さの混合物質噴流が照射室3を通り抜ける。この
照射室の長さはsで示されている。噴流速度が
500msの場合、一つの分子はこの行程を40μs
で通り抜ける。今ノズルを離れるガス流の前面が
照射室3の終端の前に到着すると、第一のレーザ
装置を発光させて、次いでそれぞれ40μsの間隔
をおいて次のレーザ装置を発光させる。それによ
つて相接して隙間なく続いた照射領域g1ないし
gnへの混合物質噴流の分割が行われる。第1図
にはちようど最後の噴流領域gnが、最後の、す
なわちn番目のレーザ装置によつて照射される状
態が示されている。それからノズル2を間隔をお
いて離れる混合物質噴流の全長Sが照射室の長さ
sとレーザ装置の数nとの積から得られる。 FIG. 1 schematically shows the spatial arrangement of the irradiation chamber 3, the nozzle 2 and the valve 4. The method proceeds as follows. Mixture 46 flows into valve 4 via inlet conduit 45 . This valve 4 includes a cylindrical housing 41,
An inlet conduit 45 is connected to it on one side and an expansion nozzle 2 on the other side. Inside this housing 41, a rotor 42 with slots 43 and 44 (which are also located opposite each other on the same diameter) rotates at a constant rotational speed. The slits 43 and 44 connect the inlet conduit 45 and the nozzle 2.
A jet of mixed material of always the same length passes through the irradiation chamber 3 whenever a bond is formed between the two. The length of this irradiation chamber is designated by s. The jet velocity is
In the case of 500ms, one molecule completes this process for 40μs.
Go through it. When the front of the gas stream now leaving the nozzle arrives before the end of the irradiation chamber 3, it fires the first laser device and then, at an interval of 40 μs each, the next laser device. As a result, the irradiation area g 1 or
A division of the mixed material jet into gn takes place. FIG. 1 shows the situation in which the last jet region gn has just been irradiated by the last, ie the nth laser device. The total length S of the mixture jet leaving the nozzle 2 at a distance is then obtained from the product of the length s of the irradiation chamber and the number n of laser devices.
第2図は弁4およびn個のレーザ装置のスイツ
チング順序の時間線図を示す。弁4はそれぞれΔ
T1の間隔を置いて流路を開き、その際ΔT1は例
えば100msの値をとる。弁の開放時間はそれに
対し、例えば1msでありΔT2で示す。この時
間領域ΔT2の間にレーザ装置1〜nが順次発光
し、その際選ばれた数値例では2個のレーザの間
の発光間隔はそれぞれ一つの分子が照射室3を通
り過ぎるのに必要な時間である40μsになる。 FIG. 2 shows a time diagram of the switching sequence of the valve 4 and the n laser devices. Valve 4 is Δ
The channels are opened at intervals of T 1 , where ΔT 1 takes a value of, for example, 100 ms. The opening time of the valve, on the other hand, is, for example, 1 ms and is denoted by ΔT 2 . During this time domain ΔT 2 , the laser devices 1 to n emit light in sequence, and in the numerical example chosen, the emission interval between the two lasers is in each case the same as that required for one molecule to pass through the irradiation chamber 3. The time becomes 40μs.
第3図と第4図には異なるレーザ装置から出る
光線の照射室3への導入のための例を概略的に示
す。そのために膨張ノズル2がスリツト状の形を
有することがなお述べられねばならない。それは
その最も狭い箇所で例えば約0.1〜0.5mmの間隔と
約1mの幅を持つ。第3図と第4図はノズル2を
平面図で、すなわち幅の側から見て示している。
レーザ装置の数は先に与えられた数値例に従えば
ΔT2=1msが40μsによつて分けられてn=
25となる。第3図には見やすくするため10個のレ
ーザ装置のみが示され、その光は偏向鏡6を介し
て回転鏡61上に偏向し、この回転鏡61は個々
のレーザ装置の繰返し周波数に同期して回転し、
レーザ光線を同じ経路を通つて照射室3へ進ませ
る。照射室3においては光線は鏡面とされた壁で
往復反射し、その結果レーザパルス継続中に照射
室3内に存在する物質全体が各レーザ装置のこの
光線によつてとらえられる。 3 and 4 schematically show examples for the introduction of light beams from different laser devices into the irradiation chamber 3. In FIG. It must be mentioned that the expansion nozzle 2 has a slit-like shape for this purpose. It has, for example, a spacing of about 0.1-0.5 mm and a width of about 1 m at its narrowest point. 3 and 4 show the nozzle 2 in plan view, ie viewed from the width side.
The number of laser devices is calculated according to the numerical example given earlier, where ΔT 2 = 1 ms is divided by 40 μs and n =
It becomes 25. Only 10 laser devices are shown in FIG. 3 for clarity, and their light is deflected via a deflection mirror 6 onto a rotating mirror 61, which is synchronized with the repetition frequency of the individual laser devices. and rotate,
The laser beam is advanced to the irradiation chamber 3 through the same path. In the irradiation chamber 3, the light beam is reflected back and forth on the mirrored walls, so that during the duration of the laser pulse the entire material present in the irradiation chamber 3 is captured by this beam of each laser device.
冒頭に述べたように、混合物質の励起のために
二つの周波数を用いることができる。この異なる
両レーザ光線の導入が第4図に示されている。こ
の図はやはりノズル2とsの長さを持つ照射室3
を平面図で示す。円柱レンズ8を経て第3図に示
すレーザ装置Lの光線が照射室3に導かれ、そこ
で往復反射する。 As mentioned in the introduction, two frequencies can be used for excitation of the mixed material. The introduction of these two different laser beams is illustrated in FIG. This figure also shows nozzle 2 and irradiation chamber 3 with length s.
is shown in a plan view. The light beam from the laser device L shown in FIG. 3 is guided through the cylindrical lens 8 to the irradiation chamber 3, where it is reflected back and forth.
これは例えば100cmの幅、2cmの長さsおよび
0.5cmの厚さの寸法を持つ。その側壁は0.4μmの
波長においては99.7%の反射率の誘電多重層を蒸
着され、16μmの光が妨げられることなく透過す
るKCl又はNaClの窓から成る。両窓の一方72
は100cmの曲率半径の円筒鏡の切片に対応する。
この処置により16μmの光も0.4μmの光も、16
μmにおけるUF6の吸収能の0.4μmにおけるそ
れに対する比が光路の比の逆数に相当するからほ
とんど完全に吸収される。照射室において十分に
幾度も反射されるように焦点が合わせられる0.4
μmの波長の光と反対に、16μmの光は、照射室
全体を一様に照射するために2cm×0.5cmに広げ
られる。この形の装置は励起と分離のために唯一
の照射方式又は唯一の紫外量子をも必要とする方
法に対しても適当であることはもちろんである。 For example, the width is 100cm, the length is 2cm, and
With dimensions of 0.5cm thickness. Its side walls consist of a KCl or NaCl window deposited with a dielectric multilayer with 99.7% reflection at a wavelength of 0.4 μm and through which 16 μm light passes unhindered. One side of both windows 72
corresponds to a section of a cylindrical mirror with a radius of curvature of 100 cm.
With this treatment, both 16 μm light and 0.4 μm light can be
Since the ratio of the absorption capacity of UF 6 at μm to that at 0.4 μm corresponds to the reciprocal of the optical path ratio, it is almost completely absorbed. 0.4, which is focused so that it is reflected many times in the irradiation chamber.
In contrast to the μm wavelength light, the 16 μm light is spread out to 2 cm x 0.5 cm to evenly illuminate the entire irradiation chamber. Of course, a device of this type is also suitable for processes requiring only one radiation method or only one ultraviolet quantum for excitation and separation.
弁4が常に開いている場合には、上述の寸法と
データをもつ装置は50Kに冷却したときは104
m3/hの混合物質流量をもつ。それに対して必要
なポンプ出力は非常に高い。しかし上述の方法に
おいては必要なポンプ容量は100m3/hに下が
り、それ故大きな費用なしに得られる容量であ
る。 If valve 4 is always open, a device with the above dimensions and data will have a temperature of 10 4 when cooled to 50 K.
It has a mixed material flow rate of m 3 /h. The required pump power, on the other hand, is very high. However, in the method described above, the required pump capacity is reduced to 100 m 3 /h, which is therefore a capacity that can be obtained without great expense.
この方法を更に説明するために、急速開閉弁4
の大きさについて更に述べる。この弁は1mのノ
ズル幅に対応して1mの幅を持つ。この様にして
回転子42のスリツト43および44を経てノズ
ル2の一様な供給(その全幅にわたつて見て)が
達せられる。600rpmの回転数と20cmの回転子周
においては、1msの開放時間ΔT2に対して2
mmの入口スリツトおよび出口スリツト43/44
の幅が生ずる。弁のハウジング壁と回転子との間
の間隔は、回転数が小さいめに比較的小さく保つ
ことができ、その結果弁4の閉鎖時間中良好なシ
ールが与えられる。 To further explain this method, the quick-open/close valve 4
Let us further discuss the size of . This valve has a width of 1 m, corresponding to a nozzle width of 1 m. In this way, uniform feeding of the nozzle 2 (viewed over its entire width) is achieved via the slots 43 and 44 of the rotor 42. At a rotation speed of 600 rpm and a rotor circumference of 20 cm, 2 for an opening time ΔT 2 of 1 ms.
mm inlet and outlet slits 43/44
This results in a width of . The spacing between the valve housing wall and the rotor can be kept relatively small due to the low rotational speeds, so that a good seal is provided during the closing time of the valve 4.
上述の数値例はもちろん一つの例であり、これ
に限定されるものではない。これは例えばパルス
繰返し周波数、可能なレーザ数などのような他の
パラメータに対応して適当に合わせることができ
る。後処理又は所望の励起された同位体化合物又
は濃縮された同位体化合物の実際の分離について
は、公知で一部すでに最初に述べた方法によつて
実施できるものであるから詳述しない。それは本
発明の対象とは全く無関係である。 The above-mentioned numerical example is, of course, one example, and is not limited thereto. This can be adjusted accordingly depending on other parameters such as, for example, pulse repetition frequency, number of possible lasers, etc. The work-up or the actual separation of the desired excited or enriched isotopic compounds will not be described in detail, as they are known and can be carried out in part by the methods already mentioned at the outset. It is completely irrelevant to the subject matter of the present invention.
第1図は本発明装置の一実施例の説明図、第2
図は本発明方法の作用を説明するための線図、第
3図、第4図は本発明装置のレーザ光線を照射室
へ導く部分の異なる例の説明図である。
2……ノズル、3……照射室、4……弁、41
……弁ハウジング、42……回転子、43,44
……スリツト、45……ガス導管、46……ガス
混合物、6……偏向鏡、L……レーザ装置。
FIG. 1 is an explanatory diagram of one embodiment of the device of the present invention, and FIG.
The figure is a diagram for explaining the operation of the method of the present invention, and FIGS. 3 and 4 are explanatory diagrams of different examples of the portion of the apparatus of the present invention that guides the laser beam to the irradiation chamber. 2...Nozzle, 3...Irradiation chamber, 4...Valve, 41
... Valve housing, 42 ... Rotor, 43, 44
... Slit, 45 ... Gas conduit, 46 ... Gas mixture, 6 ... Deflection mirror, L ... Laser device.
Claims (1)
のレーザパルス光により選択励起し、次いで励起
されない同位体化合物から励起された同位体化合
物を化学的又は物理的に分離する方法において、
同位体化合物のガス状混合物を一定の時間間隔Δ
T1でノズルを介して断熱的に膨張せしめ100K以
下に冷却し、その通流時間ΔT2はそれぞれミリ
秒の範囲に置き、ノズルから周期的に出る噴流
を、全通流時間ΔT2にわたつて、n個の順次発
光するレーザ装置の等間隔で連続するパルスにさ
らし、nは通流時間ΔT2と照射路内にガス分子
が滞留する時間との比に等しくすることを特徴と
する同位体分離方法。 2 ノズルから周期的に出る噴流を異なる周波数
のレーザ光にさらし、各周波数に対し同じ数のレ
ーザ装置を用いることを特徴とする特許請求の範
囲第1項記載の方法。 3 ガス導入口を有するスリツト状の膨張ノズル
2と、照射室3と、複数のレーザ装置Lとを備
え、ガス流を制御するためスリツト状の膨張ノズ
ル2の前に全ノズル幅にわたつて延びる弁4を設
け、この弁4は直径上で相対向する2つの長手ス
リツト43/44を有し一定速度で回転する筒状
の回転子42と、この回転子42を内部に封止す
るハウジング41とから成り、このハウジング4
1は一側で膨張ノズル2に、それと直径上で相対
する他側においてガス流入導管45に接続したこ
とを特徴とする同位体分離装置。 4 レーザ装置Lは偏向鏡6により照射室3に向
くように配置し、偏向鏡6から発するレーザパル
スが照射室3の内部で同じ経路を取るようになつ
ていることを特徴とする特許請求の範囲第3項記
載の装置。[Claims] 1. A method of selectively exciting isotopic compounds in a gaseous mixture with laser pulse light of a specific frequency, and then chemically or physically separating the excited isotopic compounds from unexcited isotopic compounds. In,
A gaseous mixture of isotopic compounds is collected over a fixed time interval Δ
The jet is adiabatically expanded through the nozzle at T 1 and cooled to below 100 K, and the flow time ΔT 2 is set in the range of milliseconds, and the jet periodically exits from the nozzle over the entire flow time ΔT 2. The ipsilateral laser is exposed to continuous pulses at equal intervals from n sequentially emitting laser devices, where n is equal to the ratio of the flow time ΔT 2 to the residence time of the gas molecules in the irradiation path. Body separation method. 2. A method according to claim 1, characterized in that the jets periodically emerging from the nozzle are exposed to laser light of different frequencies, and the same number of laser devices is used for each frequency. 3. Comprising a slit-shaped expansion nozzle 2 having a gas inlet, an irradiation chamber 3, and a plurality of laser devices L, extending across the entire nozzle width in front of the slit-shaped expansion nozzle 2 to control gas flow. A valve 4 is provided, and the valve 4 includes a cylindrical rotor 42 having two diametrically opposed longitudinal slits 43/44 and rotating at a constant speed, and a housing 41 that seals the rotor 42 inside. This housing 4 consists of
An isotope separation device characterized in that 1 is connected to an expansion nozzle 2 on one side and to a gas inflow conduit 45 on the other side diametrically opposed to the expansion nozzle 2. 4. The laser device L is arranged to face the irradiation chamber 3 by means of a deflection mirror 6, and the laser pulses emitted from the deflection mirror 6 take the same path inside the irradiation chamber 3. Apparatus according to scope 3.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19782810791 DE2810791C3 (en) | 1978-03-13 | 1978-03-13 | Method and device for separating a gaseous mixture of isotope compounds |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS54126895A JPS54126895A (en) | 1979-10-02 |
| JPS62730B2 true JPS62730B2 (en) | 1987-01-09 |
Family
ID=6034279
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2660679A Granted JPS54126895A (en) | 1978-03-13 | 1979-03-07 | Method and device for separating isotope by its selective excitation |
Country Status (6)
| Country | Link |
|---|---|
| JP (1) | JPS54126895A (en) |
| AU (1) | AU526626B2 (en) |
| CA (1) | CA1117471A (en) |
| DE (1) | DE2810791C3 (en) |
| FR (1) | FR2419753A1 (en) |
| GB (1) | GB2016795B (en) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5579030A (en) * | 1978-12-08 | 1980-06-14 | Rikagaku Kenkyusho | Uranium isotope concentration unit |
| DE3010178C2 (en) * | 1980-03-17 | 1985-10-03 | Kraftwerk Union AG, 4330 Mülheim | Slotted nozzle equipped with a quick-acting valve to induce pulsed gas flows |
| US4401507A (en) * | 1982-07-14 | 1983-08-30 | Advanced Semiconductor Materials/Am. | Method and apparatus for achieving spatially uniform externally excited non-thermal chemical reactions |
| DE3735200A1 (en) * | 1987-10-17 | 1989-05-03 | Siemens Ag | METHOD FOR GENERATING LASER RADIATION HIGH REPEAT FREQUENCY IN THE INFRARED AREA, IN PARTICULAR FOR URAN ISOTOPE SEPARATION |
| DE3828052A1 (en) * | 1988-08-18 | 1990-02-22 | Siemens Ag | Slot die arrangement and use thereof for the adiabatic expansion of a gas mixture in the separation of uranium isotopes |
| GB2256079B (en) * | 1991-05-24 | 1994-10-05 | Synergetic Resources Ltd | A simple high selectivity, high dissociation system for laser isotope separation |
| DE4331267A1 (en) * | 1993-09-15 | 1995-03-16 | Uranit Gmbh | Multiple-orifice nozzle arrangement |
| RU2119816C1 (en) * | 1996-06-10 | 1998-10-10 | Василий Иванович Держиев | Method for separation of ytterbium isotopes |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3924937A (en) * | 1974-01-30 | 1975-12-09 | Jersey Nuclear Avco Isotopes | Method and apparatus for sequentially combining pulsed beams of radiation |
| IL47139A (en) * | 1974-05-13 | 1977-07-31 | Jersey Nuclear Avco Isotopes | Method and apparatus for impact ionization of particles |
| DE2447762C2 (en) * | 1974-10-07 | 1987-10-01 | Kraftwerk Union AG, 4330 Mülheim | Method and device for separating mixtures of substances and application of the same for the production of chemical compounds |
| US4000423A (en) * | 1974-12-05 | 1976-12-28 | Jersey Nuclear-Avco Isotopes, Inc. | Fast response high temperature evaporation control |
| DE2458563A1 (en) * | 1974-12-11 | 1976-06-16 | Uranit Gmbh | PROCESS FOR ISOTOPE SEPARATION BY USING LASER |
| US4734177A (en) * | 1975-11-26 | 1988-03-29 | The United States Of America As Represented By The United States Department Of Energy | Laser isotope separation |
-
1978
- 1978-03-13 DE DE19782810791 patent/DE2810791C3/en not_active Expired
-
1979
- 1979-02-27 FR FR7905076A patent/FR2419753A1/en active Granted
- 1979-03-07 JP JP2660679A patent/JPS54126895A/en active Granted
- 1979-03-12 GB GB7908555A patent/GB2016795B/en not_active Expired
- 1979-03-13 AU AU45030/79A patent/AU526626B2/en not_active Ceased
- 1979-03-13 CA CA000323342A patent/CA1117471A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2810791C3 (en) | 1985-06-05 |
| GB2016795B (en) | 1982-06-03 |
| AU4503079A (en) | 1979-09-20 |
| CA1117471A (en) | 1982-02-02 |
| DE2810791A1 (en) | 1979-09-20 |
| DE2810791B2 (en) | 1980-01-31 |
| AU526626B2 (en) | 1983-01-20 |
| FR2419753A1 (en) | 1979-10-12 |
| GB2016795A (en) | 1979-09-26 |
| FR2419753B1 (en) | 1983-07-18 |
| JPS54126895A (en) | 1979-10-02 |
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