JPS6289B2 - - Google Patents
Info
- Publication number
- JPS6289B2 JPS6289B2 JP23324483A JP23324483A JPS6289B2 JP S6289 B2 JPS6289 B2 JP S6289B2 JP 23324483 A JP23324483 A JP 23324483A JP 23324483 A JP23324483 A JP 23324483A JP S6289 B2 JPS6289 B2 JP S6289B2
- Authority
- JP
- Japan
- Prior art keywords
- glass
- fluorine
- gas
- fluoride
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01446—Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01446—Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
- C03B37/0146—Furnaces therefor, e.g. muffle tubes, furnace linings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
- C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Thermal Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Melting And Manufacturing (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
- Glass Compositions (AREA)
Description
【発明の詳細な説明】
本発明は光伝送用ガラスフアイバの素材を製造
する方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing a material for a glass fiber for light transmission.
光伝送用ガラス素材は通常中心部が光の通る部
分であり、コアと呼ばれ屈折率が高く外周部はク
ラツドと呼ばれ屈折率が低くなつている。屈折率
に変化をつける方法として、石英ガラスにGeO2
等のドーパントを添加する方法がある。従来使用
されているドーパント類は、ガラス生成時に同時
に添加されるため非常に高純度のものが要求さ
れ、極めて高価格の薬品であつた。ところが本発
明による方法ではガラス微粒子体を生成したのち
にドーパント剤としてのフツ素を添加する。フツ
素化合物ガスの分解によつて生成したフツ素は、
非常に反応性に富むため、他の不純物がガラスに
添加されない条件下でも充分に添加される。その
ため比較的純度も低く低価格のものを使用しても
光を減衰させないことがわかつた。またフツ素
は、ガラスの屈折率を低める働きをするドーパン
トであるため屈折率が階段状に変化した形のステ
ツプインデツクス型フアイバーでは光のとおるコ
ア部にはフツ素は添加されない。 A glass material for optical transmission usually has a central part through which light passes, called the core, which has a high refractive index, and an outer peripheral part, called the cladding, which has a low refractive index. GeO 2 is added to silica glass as a method to change the refractive index.
There is a method of adding dopants such as. Conventionally used dopants are added at the same time as glass is produced, so they are required to be extremely pure and are extremely expensive chemicals. However, in the method according to the present invention, fluorine as a dopant agent is added after the glass fine particles are produced. Fluorine produced by the decomposition of fluorine compound gas is
Because it is highly reactive, it can be sufficiently added to glass even when other impurities are not added to the glass. Therefore, it was found that even if a material with relatively low purity and low price was used, the light would not be attenuated. In addition, fluorine is a dopant that lowers the refractive index of glass, so in a step-index type fiber in which the refractive index changes stepwise, fluorine is not added to the core portion through which light passes.
したがつて添加剤に起因する光の散乱損失を最
低限におさえることができる。ここで、クラツド
用ガラスはフツ素が均一に添加されていることが
必要である。 Therefore, light scattering loss caused by additives can be minimized. Here, it is necessary that fluorine is added uniformly to the glass for the cladding.
本発明の結論を得るまでに比較的低温(800
℃)でフツ素雰囲気中にガラス微粒子体を導入し
て熱処理するとフツ素は容易にガラス微粒子体中
に浸入し、かつ脱水効果のよいことが解つた。 It took a relatively low temperature (800
It was found that when the glass fine particles were introduced into a fluorine atmosphere and heat-treated at a temperature of 100°F (°C), the fluorine easily penetrated into the glass fine particles and had a good dehydration effect.
ところが、引続きこのガラス微粒子体を溶融
し、ガラス化するために高温で焼結すると生成さ
れたガラス体の周辺部は内部に比べフツ素の含有
が少なく均一なガラスの得られないという問題が
生じた。この点について検討した結果、ガラス化
するために処理温度を上昇するとSiO2が溶融ガ
ラス化する1400℃に近づく程、一旦添加されたフ
ツ素が著しく揮散し、また主にガラス体の表面に
生じていることが解つた。本発明はこの課題につ
いてなされた発明であり、特許請求の範囲に記載
の通り、火炎加水分解により形成されたガラス微
粒子の積層体をフツ素化合物ガスおよび不活性ガ
スの雰囲気中で1400℃以上に加熱してフツ素を均
一に含有するガラス体を形成せしめることを特徴
とする光伝送用ガラス素材の製造方法を提供する
ものである。またフツ素は、ガラス中にあるOH
基から水素を脱離させることがわかつた。これは
フツ素とガラスとの反応の仕方の一つだと考えら
れ次式で表わされる。 However, when this glass particulate body is subsequently melted and sintered at a high temperature to vitrify it, a problem arises in that the periphery of the resulting glass body contains less fluorine than the inside, making it difficult to obtain a uniform glass. Ta. As a result of considering this point, we found that when the treatment temperature is increased to vitrify, the closer to 1400℃, which is the point at which SiO 2 melts and vitrifies, the more fluorine that has been added evaporates significantly, and the more fluorine is formed mainly on the surface of the glass body. I understood that. The present invention has been made to solve this problem, and as described in the claims, a laminate of glass particles formed by flame hydrolysis is heated to 1400°C or higher in an atmosphere of fluorine compound gas and inert gas. The present invention provides a method for producing a glass material for optical transmission, which comprises heating to form a glass body uniformly containing fluorine. In addition, fluorine is OH in glass.
It was found that hydrogen can be eliminated from the group. This is considered to be one of the ways in which fluorine reacts with glass, and is expressed by the following formula.
SiOH+F2→Si−O−F+HF
このため、本発明によるフツ素添加効果として
火炎加水分解反応の欠点であるガラス中のOH基
濃度が、数10ppmから数ppmに低下され、OH基
に起因する波長0.95μm付近での光の吸収損失が
大幅に改善され、通常光通信で使われる0.85μm
あるいは、1.05μmでの光の吸収損失をさらに小
さくできるという利点も兼ね備なえている。 SiOH+F 2 →Si-O-F+HF Therefore, as a result of the fluorine addition effect of the present invention, the OH group concentration in glass, which is a drawback of flame hydrolysis reaction, is reduced from several tens of ppm to several ppm, and the wavelength caused by OH groups is reduced. Light absorption loss in the vicinity of 0.95μm has been significantly improved, making it possible to improve the optical absorption loss in the vicinity of 0.85μm, which is normally used in optical communications.
Alternatively, it also has the advantage of further reducing light absorption loss at 1.05 μm.
以下に本発明の詳細について述べる。 The details of the present invention will be described below.
火炎加水分解反応によつて、石英ガラス微粒子
体を生成させるには、第1図に示すように、石英
製同心多重管バーナー1を用いて、酸素2、水素
3と原料ガスとしてSiCl4を用いArガスをキヤリ
ヤーガスに用い酸水素炎の中心5に送り込み反応
させればよい。図中4は、原料ガスがバーナーの
先端より数mmはなれた空間で反応するように遮へ
い用としてArガスを流す。ガラス微粒子体のロ
ツドを得る場合には回転する出発部材6の先端か
ら軸方向にガラス微粒子を積層させる。また、パ
イプ状ガラス微粒子体を得る場合には第2図に示
すように回転する石英棒あるいは、炭素棒7の外
周部にバーナー1をトラバースさせながら、ガラ
ス微粒子を積層させる。 In order to generate quartz glass fine particles by a flame hydrolysis reaction, as shown in Fig. 1, a quartz concentric multi-tube burner 1 is used, oxygen 2, hydrogen 3 and SiCl 4 are used as the raw material gas. Ar gas may be used as a carrier gas and sent to the center 5 of the oxyhydrogen flame to cause a reaction. At 4 in the figure, Ar gas is flowed as a shield so that the raw material gas reacts in a space several mm away from the tip of the burner. When obtaining a rod of glass fine particles, glass fine particles are laminated in the axial direction from the tip of the rotating starting member 6. Further, when obtaining a pipe-shaped glass particle body, glass particles are laminated on the outer circumference of a rotating quartz rod or carbon rod 7 while traversing the burner 1 as shown in FIG.
フツ素添加ガラス微粒子体の透明化温度は、フ
ツ素添加量、雰囲気ガスの種類、処理時間により
異なる。光フアイバとして用いるガラスの場合、
フツ素添加量としては高々10重量%がその限度で
ある。この濃度よりも多くなるとガラスの粘性が
低くなり、石英ガラスとの適合性が悪くなり、本
発明で得られる構造をもつフアイバの構成上不都
合が生じる。この成分内のガラス微粒子体の透明
化温度としては1400℃以上が好ましい。フツ素添
加量が少ない場合にはこの温度をより高くとる必
要がある。 The transparentization temperature of the fluorine-doped glass particles varies depending on the amount of fluorine added, the type of atmospheric gas, and the processing time. In the case of glass used as optical fiber,
The maximum amount of fluorine added is 10% by weight. When the concentration is higher than this, the viscosity of the glass becomes low and the compatibility with quartz glass deteriorates, causing problems in the structure of the fiber having the structure obtained by the present invention. The transparentization temperature of the glass fine particles in this component is preferably 1400°C or higher. When the amount of fluorine added is small, it is necessary to set this temperature higher.
処理時の雰囲気ガスとしては、フツ素を導入す
る上で不活性ガスとすることが望ましい。不活性
ガス以外のガスの存在は高温下での有効フツ素ガ
ス(ガラス中のSi−O結合中の酸素をもしくはSi
−OHの水素をフツ素に置換する活性度の高いフ
ツ素種)量を低減せしめるため好ましくない。 As for the atmospheric gas during the treatment, it is desirable to use an inert gas in order to introduce fluorine. The presence of gases other than inert gases is due to the effective fluorine gas (oxygen in Si-O bonds in glass or Si
This is not preferable because it reduces the amount of highly active fluorine species that replace hydrogen in -OH with fluorine.
本プロセスでフツ素添加反応を生ぜしめ、かつ
ガラス微粒子体を溶融透明化していくという点で
最も好ましい不活性ガスはHeである。Ar,N2な
ど分子半径のより大きな場合には透明化時間が長
くかかり、また気泡をガラス中に残留させ易い。 In this process, He is the most preferable inert gas in terms of causing the fluorine addition reaction and melting and making the glass particles transparent. When the molecular radius is larger, such as Ar or N 2 , it takes a long time to clear the glass, and bubbles tend to remain in the glass.
以上の様にフツ素化合物ガスを焼結炉の不活性
ガス中に混合し一段階で、必要とするガラス素材
を得ることができる。 As described above, the required glass material can be obtained in one step by mixing the fluorine compound gas into the inert gas of the sintering furnace.
フツ素化合物ガスとして使用できるものは、そ
の化合物ガスの分解生成物がガラス中に取り込ま
れても光の伝送損失に影響を与えないものを選ば
なければならない。 The fluorine compound gas that can be used must be one that does not affect the transmission loss of light even if the decomposition products of the compound gas are incorporated into the glass.
フツ素ガスを発生させる補助手段として、第3
図において熱処理用の加熱炉11中に紫外線ラン
プ12を設け、紫外線による光分解によつてフツ
素化合物ガスを分解し、フツ素ガスを発生させる
と、加熱のみの場合より反応時間が40%にまで短
縮させうることがわかつた。高エネルギーを持つ
紫外線によつてフツ素の結合を解離させることが
できるために処理時間が短縮されたのであろう。
もちろんここで示したフツ素化合物ガスとして
は、フツ化炭素ガス、フツ化塩化炭素ガス、フツ
化イオウ、フツ化ケイ素、フツ素単体、フツ化水
素、フツ化ハロゲンガス等が上げられるが、フツ
化炭素ガス、フツ化塩化炭素ガス、フツ化ケイ
素、フツ素単体ガス、等がガス化が容易なこと、
分解物がガラス中で光の伝送損失に影響を与えに
くいこと等から、本発明に使用するに好ましいも
のである。また、各々の化合物によつて処理条件
が変わることは、充分理解されるところである。 As an auxiliary means for generating fluorine gas, the third
In the figure, an ultraviolet lamp 12 is installed in a heating furnace 11 for heat treatment, and when fluorine compound gas is decomposed by photolysis using ultraviolet rays and fluorine gas is generated, the reaction time is 40% faster than when only heating is used. It turns out that it can be shortened to. The processing time may have been shortened because the high-energy ultraviolet rays can dissociate the fluorine bonds.
Of course, the fluorine compound gases shown here include fluorinated carbon gas, fluorinated carbon chloride gas, sulfur fluoride, silicon fluoride, elemental fluorine, hydrogen fluoride, fluorinated halogen gas, etc. Carbon dioxide gas, fluorochloride carbon gas, silicon fluoride, fluorine gas, etc. are easy to gasify;
This is preferable for use in the present invention because the decomposed products hardly affect the transmission loss of light in the glass. Furthermore, it is well understood that treatment conditions vary depending on each compound.
実施例
同心4重管バーナを用いて、中心から順にAr
ガスをキヤリヤーとしたSiCl4,Ar,H2,O2を
各々0.3,2,5,10/分の流量で流し、回転
する出発炭素棒(外径10mm)上にガラス微粒子を
堆積させてゆき外径30mmのガラス微粒子体を形成
した。出発炭素棒を除去して上記ガラス微粒子体
を炉体中にセツトし、SF6を500c.c./分、Heを10
/分の流量で炉体の下部より炉体全域に流しな
がら800℃から1450℃まで昇温速度5℃/分にて
昇温し、3時間この温度に保持した。フツ素濃度
がほぼ均一のガラス管が得られた。次にこのガラ
ス管の内面を研摩し、内径10mmφ、肉厚2mmφの
ガラス管とした。Example Using a concentric quadruple tube burner, Ar
SiCl 4 , Ar, H 2 , and O 2 using gas as a carrier were flowed at flow rates of 0.3, 2, 5, and 10/min, respectively, and glass particles were deposited on a rotating starting carbon rod (outer diameter 10 mm). Glass fine particle bodies with an outer diameter of 30 mm were formed. The starting carbon rod was removed, the glass particles were set in the furnace body, and SF 6 was fed at 500 c.c./min and He was heated at 10 c.c./min.
The temperature was raised from 800° C. to 1450° C. at a rate of 5° C./min while flowing from the lower part of the furnace body to the entire area of the furnace body at a flow rate of 5° C./min, and maintained at this temperature for 3 hours. A glass tube with almost uniform fluorine concentration was obtained. Next, the inner surface of this glass tube was polished to obtain a glass tube with an inner diameter of 10 mmφ and a wall thickness of 2 mmφ.
これとは別に用意した外径9mmの純粋石英ガラ
ス棒と組合せて線引しフアイバとした。得られた
フアイバは屈折率差が0.5%で、クラツド層の不
純物損失のみられない特性の優れたフアイバが得
られた。 This was combined with a separately prepared pure quartz glass rod having an outer diameter of 9 mm to form a drawn fiber. The resulting fiber had a refractive index difference of 0.5%, and had excellent properties with no impurity loss in the cladding layer.
比較例
実施例と同様にガラス微粒子体を形成し、これ
を炉体中にセツトしてSF6を500c.c./分、Heを10
/分流しながら800℃から1200℃まで昇温速度
5℃/分で昇温し、3時間この温度に保持した
後、SF6を止めて透明なガラス管に焼結した。Comparative Example A glass particle body was formed in the same manner as in the example, and this was set in a furnace body, and SF 6 was fed at 500 c.c./min and He was heated at 10 c.c./min.
The temperature was raised from 800° C. to 1200° C. at a temperature increase rate of 5° C./min with a split flow of 100° C./minute, and after holding at this temperature for 3 hours, the SF 6 was stopped and sintered into a transparent glass tube.
得られたガラス管は管の肉厚中央部に対し、周
辺部がフツ素の含有が少なく均一な状態のものは
得られなかつた。これは一旦ドープされたフツ素
が焼結時に揮散したためと考えられる。 The obtained glass tube contained less fluorine in the periphery than in the central part of the wall thickness of the tube, and a uniform condition could not be obtained. This is thought to be because the fluorine doped once volatilized during sintering.
以上のように本発明はドーパントとして、フツ
素を用いることによりドーパントによる光散乱損
失を最低限におさえ、かつ、火炎加水分解法の欠
点であつたガラス中のOH基濃度を著しく減少さ
せうる利点を持つ。 As described above, the present invention has the advantage that by using fluorine as a dopant, light scattering loss due to the dopant can be minimized, and the OH group concentration in glass, which was a drawback of flame hydrolysis, can be significantly reduced. have.
第1図は棒状のガラス微粒子積層体の製法を示
す図
1……多重管バーナー(図は4重管)、2……
酸素供給口、3……水素供給口、4……Arガス
供給口、5……原料ガス供給口、6……シード棒
第2図は筒状のガラス微粒子積層体の製法を示
す図
7……中心芯棒(出発部材)
第3図は焼結、透明ガラス化用の高温炉の図で
あり、
10……焼結炉、11……加熱体、12……紫
外線ランプを示す。
Figure 1 is a diagram showing the manufacturing method of a rod-shaped glass fine particle laminate. 1...Multi-tube burner (the figure shows a quadruple tube), 2...
Oxygen supply port, 3...Hydrogen supply port, 4...Ar gas supply port, 5...Raw material gas supply port, 6...Seed rod Fig. 2 is a diagram showing the manufacturing method of a cylindrical glass particle laminate.7... ...Central core rod (starting member) Fig. 3 is a diagram of a high-temperature furnace for sintering and transparent vitrification, and shows 10...sintering furnace, 11...heating body, 12...ultraviolet lamp.
Claims (1)
形成し、次いでフツ素を均一に含有する光伝送用
ガラス素材を製造する方法において、該ガラス微
粒子の積層体をフツ素化合物ガスおよび不活性ガ
スを導入し、かつ1400℃以上に加熱した雰囲気中
で処理することを特徴とする光伝送用ガラス素材
の製法。 2 フツ素化合物としてフツ化炭素ガス、フツ化
塩化炭素ガス、フツ化イオウ、フツ化ケイ素、フ
ツ素、フツ化ハロゲンの何れかを用いることを特
徴とする特許請求の範囲第1項に記載の光伝送用
ガラスの製法。[Scope of Claims] 1. A method for producing a glass material for optical transmission that uniformly contains fluorine by forming a laminate of glass particles by flame hydrolysis, and then treating the laminate of glass particles with a fluorine compound gas. A method for producing a glass material for optical transmission, characterized by introducing an inert gas and processing in an atmosphere heated to 1400°C or higher. 2. The method according to claim 1, wherein any one of carbon fluoride gas, carbon fluoride chloride gas, sulfur fluoride, silicon fluoride, fluorine, and halogen fluoride is used as the fluorine compound. Manufacturing method of glass for optical transmission.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23324483A JPS6036343A (en) | 1983-12-09 | 1983-12-09 | Production of glass material for optical transmission |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23324483A JPS6036343A (en) | 1983-12-09 | 1983-12-09 | Production of glass material for optical transmission |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13765978A Division JPS6038345B2 (en) | 1978-11-07 | 1978-11-07 | Manufacturing method of glass material for optical transmission |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6036343A JPS6036343A (en) | 1985-02-25 |
| JPS6289B2 true JPS6289B2 (en) | 1987-01-06 |
Family
ID=16952026
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23324483A Granted JPS6036343A (en) | 1983-12-09 | 1983-12-09 | Production of glass material for optical transmission |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6036343A (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0627260Y2 (en) * | 1988-03-31 | 1994-07-27 | 三菱重工業株式会社 | Underwater welding shield jig |
| US5045346A (en) * | 1990-07-31 | 1991-09-03 | Gte Laboratories Incorporated | Method of depositing fluorinated silicon nitride |
| WO2008156177A1 (en) | 2007-06-20 | 2008-12-24 | Asahi Glass Company, Limited | Method for treatment of surface of oxide glass |
| JP2009023898A (en) | 2007-06-20 | 2009-02-05 | Asahi Glass Co Ltd | Synthetic quartz glass body, method for producing the same, optical element and optical device |
| JP5077110B2 (en) * | 2007-07-23 | 2012-11-21 | 旭硝子株式会社 | Nanoimprint mold and manufacturing method thereof |
-
1983
- 1983-12-09 JP JP23324483A patent/JPS6036343A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6036343A (en) | 1985-02-25 |
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