JPS629579B2 - - Google Patents
Info
- Publication number
- JPS629579B2 JPS629579B2 JP55135176A JP13517680A JPS629579B2 JP S629579 B2 JPS629579 B2 JP S629579B2 JP 55135176 A JP55135176 A JP 55135176A JP 13517680 A JP13517680 A JP 13517680A JP S629579 B2 JPS629579 B2 JP S629579B2
- Authority
- JP
- Japan
- Prior art keywords
- acid
- meth
- parts
- reaction
- oligo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000006243 chemical reaction Methods 0.000 claims description 51
- 150000001875 compounds Chemical class 0.000 claims description 34
- 239000002253 acid Substances 0.000 claims description 28
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 24
- 125000002947 alkylene group Chemical group 0.000 claims description 22
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 claims description 22
- 239000003112 inhibitor Substances 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 238000010526 radical polymerization reaction Methods 0.000 claims description 11
- 150000001252 acrylic acid derivatives Chemical class 0.000 claims description 10
- 239000003054 catalyst Substances 0.000 claims description 9
- 150000007513 acids Chemical class 0.000 claims description 6
- SIOXPEMLGUPBBT-UHFFFAOYSA-N picolinic acid Chemical class OC(=O)C1=CC=CC=N1 SIOXPEMLGUPBBT-UHFFFAOYSA-N 0.000 claims description 5
- LOAUVZALPPNFOQ-UHFFFAOYSA-N quinaldic acid Chemical class C1=CC=CC2=NC(C(=O)O)=CC=C21 LOAUVZALPPNFOQ-UHFFFAOYSA-N 0.000 claims description 4
- SYUYTOYKQOAVDW-UHFFFAOYSA-N 2-nitrosonaphthalen-1-ol Chemical class C1=CC=C2C(O)=C(N=O)C=CC2=C1 SYUYTOYKQOAVDW-UHFFFAOYSA-N 0.000 claims description 3
- SEEZWGFVHCMHJF-UHFFFAOYSA-N 2-nitrosophenol Chemical class OC1=CC=CC=C1N=O SEEZWGFVHCMHJF-UHFFFAOYSA-N 0.000 claims description 3
- ZFRUGZMCGCYBRC-UHFFFAOYSA-N 1h-1,8-naphthyridin-2-one Chemical class C1=CC=NC2=NC(O)=CC=C21 ZFRUGZMCGCYBRC-UHFFFAOYSA-N 0.000 claims description 2
- 150000004325 8-hydroxyquinolines Chemical class 0.000 claims description 2
- ROFVEXUMMXZLPA-UHFFFAOYSA-N Bipyridyl Chemical compound N1=CC=CC=C1C1=CC=CC=N1 ROFVEXUMMXZLPA-UHFFFAOYSA-N 0.000 claims description 2
- 150000001413 amino acids Chemical class 0.000 claims description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 14
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 14
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 12
- -1 trimethylbenzyl Amines Chemical class 0.000 description 12
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 10
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 10
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 9
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- 239000011347 resin Substances 0.000 description 8
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 7
- 238000001879 gelation Methods 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 239000007788 liquid Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 4
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 230000008719 thickening Effects 0.000 description 4
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- 230000002159 abnormal effect Effects 0.000 description 3
- IFQUWYZCAGRUJN-UHFFFAOYSA-N ethylenediaminediacetic acid Chemical compound OC(=O)CNCCNCC(O)=O IFQUWYZCAGRUJN-UHFFFAOYSA-N 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- AZQWKYJCGOJGHM-UHFFFAOYSA-N 1,4-benzoquinone Chemical compound O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- RNMCCPMYXUKHAZ-UHFFFAOYSA-N 2-[3,3-diamino-1,2,2-tris(carboxymethyl)cyclohexyl]acetic acid Chemical compound NC1(N)CCCC(CC(O)=O)(CC(O)=O)C1(CC(O)=O)CC(O)=O RNMCCPMYXUKHAZ-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 2
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 2
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- VYTBPJNGNGMRFH-UHFFFAOYSA-N acetic acid;azane Chemical compound N.N.CC(O)=O.CC(O)=O.CC(O)=O.CC(O)=O VYTBPJNGNGMRFH-UHFFFAOYSA-N 0.000 description 2
- 150000003863 ammonium salts Chemical class 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- UCMIRNVEIXFBKS-UHFFFAOYSA-N beta-alanine Chemical compound NCCC(O)=O UCMIRNVEIXFBKS-UHFFFAOYSA-N 0.000 description 2
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 2
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical compound C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 2
- 125000003700 epoxy group Chemical group 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 239000000499 gel Substances 0.000 description 2
- YMAWOPBAYDPSLA-UHFFFAOYSA-N glycylglycine Chemical compound [NH3+]CC(=O)NCC([O-])=O YMAWOPBAYDPSLA-UHFFFAOYSA-N 0.000 description 2
- NBZBKCUXIYYUSX-UHFFFAOYSA-N iminodiacetic acid Chemical compound OC(=O)CNCC(O)=O NBZBKCUXIYYUSX-UHFFFAOYSA-N 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical compound [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 150000002989 phenols Chemical class 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- SCVFZCLFOSHCOH-UHFFFAOYSA-M potassium acetate Chemical compound [K+].CC([O-])=O SCVFZCLFOSHCOH-UHFFFAOYSA-M 0.000 description 2
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical compound [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 description 2
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- FSYKKLYZXJSNPZ-UHFFFAOYSA-N sarcosine Chemical compound C[NH2+]CC([O-])=O FSYKKLYZXJSNPZ-UHFFFAOYSA-N 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- ZWAJLVLEBYIOTI-OLQVQODUSA-N (1s,6r)-7-oxabicyclo[4.1.0]heptane Chemical compound C1CCC[C@@H]2O[C@@H]21 ZWAJLVLEBYIOTI-OLQVQODUSA-N 0.000 description 1
- JHPBZFOKBAGZBL-UHFFFAOYSA-N (3-hydroxy-2,2,4-trimethylpentyl) 2-methylprop-2-enoate Chemical group CC(C)C(O)C(C)(C)COC(=O)C(C)=C JHPBZFOKBAGZBL-UHFFFAOYSA-N 0.000 description 1
- WHFQWQIDXMOZBD-UHFFFAOYSA-N 1,6-naphthyridin-8-ol Chemical compound C1=CN=C2C(O)=CN=CC2=C1 WHFQWQIDXMOZBD-UHFFFAOYSA-N 0.000 description 1
- FLBAYUMRQUHISI-UHFFFAOYSA-N 1,8-naphthyridine Chemical compound N1=CC=CC2=CC=CN=C21 FLBAYUMRQUHISI-UHFFFAOYSA-N 0.000 description 1
- YXAOOTNFFAQIPZ-UHFFFAOYSA-N 1-nitrosonaphthalen-2-ol Chemical compound C1=CC=CC2=C(N=O)C(O)=CC=C21 YXAOOTNFFAQIPZ-UHFFFAOYSA-N 0.000 description 1
- QZTKDVCDBIDYMD-UHFFFAOYSA-N 2,2'-[(2-amino-2-oxoethyl)imino]diacetic acid Chemical compound NC(=O)CN(CC(O)=O)CC(O)=O QZTKDVCDBIDYMD-UHFFFAOYSA-N 0.000 description 1
- QWQNFXDYOCUEER-UHFFFAOYSA-N 2,3-ditert-butyl-4-methylphenol Chemical compound CC1=CC=C(O)C(C(C)(C)C)=C1C(C)(C)C QWQNFXDYOCUEER-UHFFFAOYSA-N 0.000 description 1
- SPSSULHKWOKEEL-UHFFFAOYSA-N 2,4,6-trinitrotoluene Chemical compound CC1=C([N+]([O-])=O)C=C([N+]([O-])=O)C=C1[N+]([O-])=O SPSSULHKWOKEEL-UHFFFAOYSA-N 0.000 description 1
- UFBJCMHMOXMLKC-UHFFFAOYSA-N 2,4-dinitrophenol Chemical compound OC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O UFBJCMHMOXMLKC-UHFFFAOYSA-N 0.000 description 1
- QYXHDJJYVDLECA-UHFFFAOYSA-N 2,5-diphenylcyclohexa-2,5-diene-1,4-dione Chemical compound O=C1C=C(C=2C=CC=CC=2)C(=O)C=C1C1=CC=CC=C1 QYXHDJJYVDLECA-UHFFFAOYSA-N 0.000 description 1
- JCARTGJGWCGSSU-UHFFFAOYSA-N 2,6-dichlorobenzoquinone Chemical compound ClC1=CC(=O)C=C(Cl)C1=O JCARTGJGWCGSSU-UHFFFAOYSA-N 0.000 description 1
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 1
- QWCKQJZIFLGMSD-UHFFFAOYSA-N 2-Aminobutanoic acid Natural products CCC(N)C(O)=O QWCKQJZIFLGMSD-UHFFFAOYSA-N 0.000 description 1
- NBYLBWHHTUWMER-UHFFFAOYSA-N 2-Methylquinolin-8-ol Chemical compound C1=CC=C(O)C2=NC(C)=CC=C21 NBYLBWHHTUWMER-UHFFFAOYSA-N 0.000 description 1
- JDWONELOFVWXDC-UHFFFAOYSA-N 2-[(2,3,4-tribromophenoxy)methyl]oxirane Chemical compound BrC1=C(Br)C(Br)=CC=C1OCC1OC1 JDWONELOFVWXDC-UHFFFAOYSA-N 0.000 description 1
- URDCARMUOSMFFI-UHFFFAOYSA-N 2-[2-[bis(carboxymethyl)amino]ethyl-(2-hydroxyethyl)amino]acetic acid Chemical compound OCCN(CC(O)=O)CCN(CC(O)=O)CC(O)=O URDCARMUOSMFFI-UHFFFAOYSA-N 0.000 description 1
- XNCSCQSQSGDGES-UHFFFAOYSA-N 2-[2-[bis(carboxymethyl)amino]propyl-(carboxymethyl)amino]acetic acid Chemical compound OC(=O)CN(CC(O)=O)C(C)CN(CC(O)=O)CC(O)=O XNCSCQSQSGDGES-UHFFFAOYSA-N 0.000 description 1
- SJBOEHIKNDEHHO-UHFFFAOYSA-N 2-[2-aminoethyl(carboxymethyl)amino]acetic acid Chemical compound NCCN(CC(O)=O)CC(O)=O SJBOEHIKNDEHHO-UHFFFAOYSA-N 0.000 description 1
- DMQQXDPCRUGSQB-UHFFFAOYSA-N 2-[3-[bis(carboxymethyl)amino]propyl-(carboxymethyl)amino]acetic acid Chemical compound OC(=O)CN(CC(O)=O)CCCN(CC(O)=O)CC(O)=O DMQQXDPCRUGSQB-UHFFFAOYSA-N 0.000 description 1
- RFPMBNQRCCSCMH-UHFFFAOYSA-N 2-[5-[bis(carboxymethyl)amino]pentyl-(carboxymethyl)amino]acetic acid Chemical compound OC(=O)CN(CC(O)=O)CCCCCN(CC(O)=O)CC(O)=O RFPMBNQRCCSCMH-UHFFFAOYSA-N 0.000 description 1
- GWTCYDOFEZQSAB-UHFFFAOYSA-N 2-[8-[bis(carboxymethyl)amino]octyl-(carboxymethyl)amino]acetic acid Chemical compound OC(=O)CN(CC(O)=O)CCCCCCCCN(CC(O)=O)CC(O)=O GWTCYDOFEZQSAB-UHFFFAOYSA-N 0.000 description 1
- WYMDDFRYORANCC-UHFFFAOYSA-N 2-[[3-[bis(carboxymethyl)amino]-2-hydroxypropyl]-(carboxymethyl)amino]acetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)CN(CC(O)=O)CC(O)=O WYMDDFRYORANCC-UHFFFAOYSA-N 0.000 description 1
- GGJBWKXZCQRJAV-UHFFFAOYSA-N 2-[carboxymethyl(2-methoxyethyl)amino]acetic acid Chemical compound COCCN(CC(O)=O)CC(O)=O GGJBWKXZCQRJAV-UHFFFAOYSA-N 0.000 description 1
- KVXNVGOPYHGVQT-UHFFFAOYSA-N 2-[carboxymethyl(2-sulfanylethyl)amino]acetic acid Chemical compound OC(=O)CN(CCS)CC(O)=O KVXNVGOPYHGVQT-UHFFFAOYSA-N 0.000 description 1
- UYIZJTNMCWIYHZ-UHFFFAOYSA-N 2-[carboxymethyl(3,3-dimethylbutyl)amino]acetic acid Chemical compound CC(C)(C)CCN(CC(O)=O)CC(O)=O UYIZJTNMCWIYHZ-UHFFFAOYSA-N 0.000 description 1
- XWSGEVNYFYKXCP-UHFFFAOYSA-N 2-[carboxymethyl(methyl)amino]acetic acid Chemical compound OC(=O)CN(C)CC(O)=O XWSGEVNYFYKXCP-UHFFFAOYSA-N 0.000 description 1
- ITEOCPCEMFPZAC-UHFFFAOYSA-N 2-[carboxymethyl-(2-hydroxycyclohexyl)amino]acetic acid Chemical compound OC1CCCCC1N(CC(O)=O)CC(O)=O ITEOCPCEMFPZAC-UHFFFAOYSA-N 0.000 description 1
- WEEDGRHKIMNHJA-UHFFFAOYSA-N 2-[carboxymethyl-[(2-hydroxyphenyl)methyl]amino]acetic acid Chemical compound OC(=O)CN(CC(O)=O)CC1=CC=CC=C1O WEEDGRHKIMNHJA-UHFFFAOYSA-N 0.000 description 1
- VTWDKFNVVLAELH-UHFFFAOYSA-N 2-methylcyclohexa-2,5-diene-1,4-dione Chemical compound CC1=CC(=O)C=CC1=O VTWDKFNVVLAELH-UHFFFAOYSA-N 0.000 description 1
- XIRDTMSOGDWMOX-UHFFFAOYSA-N 3,4,5,6-tetrabromophthalic acid Chemical compound OC(=O)C1=C(Br)C(Br)=C(Br)C(Br)=C1C(O)=O XIRDTMSOGDWMOX-UHFFFAOYSA-N 0.000 description 1
- WZHHYIOUKQNLQM-UHFFFAOYSA-N 3,4,5,6-tetrachlorophthalic acid Chemical compound OC(=O)C1=C(Cl)C(Cl)=C(Cl)C(Cl)=C1C(O)=O WZHHYIOUKQNLQM-UHFFFAOYSA-N 0.000 description 1
- TXPKUUXHNFRBPS-UHFFFAOYSA-N 3-(2-carboxyethylamino)propanoic acid Chemical compound OC(=O)CCNCCC(O)=O TXPKUUXHNFRBPS-UHFFFAOYSA-N 0.000 description 1
- KWYJDIUEHHCHCZ-UHFFFAOYSA-N 3-[2-[bis(2-carboxyethyl)amino]ethyl-(2-carboxyethyl)amino]propanoic acid Chemical compound OC(=O)CCN(CCC(O)=O)CCN(CCC(O)=O)CCC(O)=O KWYJDIUEHHCHCZ-UHFFFAOYSA-N 0.000 description 1
- SNUCIYVBALVWTO-UHFFFAOYSA-N 3-[2-aminoethyl(2-carboxyethyl)amino]propanoic acid Chemical compound OC(=O)CCN(CCN)CCC(O)=O SNUCIYVBALVWTO-UHFFFAOYSA-N 0.000 description 1
- OINWUNFJHGRRPU-UHFFFAOYSA-N 3-[2-carboxyethyl(2-hydroxyethyl)amino]propanoic acid Chemical compound OC(=O)CCN(CCO)CCC(O)=O OINWUNFJHGRRPU-UHFFFAOYSA-N 0.000 description 1
- MIBFXMQUCUPXOD-UHFFFAOYSA-N 3-[2-carboxyethyl(3-hydroxypropyl)amino]propanoic acid Chemical compound OCCCN(CCC(O)=O)CCC(O)=O MIBFXMQUCUPXOD-UHFFFAOYSA-N 0.000 description 1
- OZPCFHQGYPXBGG-UHFFFAOYSA-N 3-[2-carboxyethyl(carboxymethyl)amino]propanoic acid Chemical compound OC(=O)CCN(CC(O)=O)CCC(O)=O OZPCFHQGYPXBGG-UHFFFAOYSA-N 0.000 description 1
- IWTIBPIVCKUAHK-UHFFFAOYSA-N 3-[bis(2-carboxyethyl)amino]propanoic acid Chemical compound OC(=O)CCN(CCC(O)=O)CCC(O)=O IWTIBPIVCKUAHK-UHFFFAOYSA-N 0.000 description 1
- FSTPGJJFBSOEPY-UHFFFAOYSA-N 3-[bis(carboxymethyl)amino]benzoic acid Chemical compound OC(=O)CN(CC(O)=O)C1=CC=CC(C(O)=O)=C1 FSTPGJJFBSOEPY-UHFFFAOYSA-N 0.000 description 1
- UDYXBGRPILRBKA-UHFFFAOYSA-N 4-methoxy-2-nitrosophenol Chemical compound COC1=CC=C(O)C(N=O)=C1 UDYXBGRPILRBKA-UHFFFAOYSA-N 0.000 description 1
- CMMURVLHXMNTHY-UHFFFAOYSA-N 4-methylpyridine-2-carboxylic acid Chemical class CC1=CC=NC(C(O)=O)=C1 CMMURVLHXMNTHY-UHFFFAOYSA-N 0.000 description 1
- OYUKRQOCPFZNHR-UHFFFAOYSA-N 4-methylquinolin-8-ol Chemical compound C1=CC=C2C(C)=CC=NC2=C1O OYUKRQOCPFZNHR-UHFFFAOYSA-N 0.000 description 1
- XESZUVZBAMCAEJ-UHFFFAOYSA-N 4-tert-butylcatechol Chemical compound CC(C)(C)C1=CC=C(O)C(O)=C1 XESZUVZBAMCAEJ-UHFFFAOYSA-N 0.000 description 1
- PMYYGAMMFAQAGL-UHFFFAOYSA-N 4-tert-butylcyclohexa-1,5-diene-1,4-diol Chemical compound CC(C)(C)C1(O)CC=C(O)C=C1 PMYYGAMMFAQAGL-UHFFFAOYSA-N 0.000 description 1
- OBXWZJVKXGQPTG-UHFFFAOYSA-N 5-methyl-2-nitrosonaphthalen-1-ol Chemical compound Cc1cccc2c(O)c(ccc12)N=O OBXWZJVKXGQPTG-UHFFFAOYSA-N 0.000 description 1
- 229940105058 5-methyl-8-hydroxyquinoline Drugs 0.000 description 1
- SVLTVRFYVWMEQN-UHFFFAOYSA-N 5-methylcyclohex-3-ene-1,2-dicarboxylic acid Chemical compound CC1CC(C(O)=O)C(C(O)=O)C=C1 SVLTVRFYVWMEQN-UHFFFAOYSA-N 0.000 description 1
- OLNYCZXIKIMHBJ-UHFFFAOYSA-N 5-methylquinoline-2-carboxylic acid Chemical compound OC(=O)C1=CC=C2C(C)=CC=CC2=N1 OLNYCZXIKIMHBJ-UHFFFAOYSA-N 0.000 description 1
- GPYZZWFCOCCLQZ-UHFFFAOYSA-N 6-methylcyclohex-3-ene-1,2-dicarboxylic acid Chemical compound CC1CC=CC(C(O)=O)C1C(O)=O GPYZZWFCOCCLQZ-UHFFFAOYSA-N 0.000 description 1
- SEHJLFKUWOXPRP-UHFFFAOYSA-N 6-tert-butyl-1-nitrosonaphthalen-2-ol Chemical compound O=NC1=C(O)C=CC2=CC(C(C)(C)C)=CC=C21 SEHJLFKUWOXPRP-UHFFFAOYSA-N 0.000 description 1
- LUOZEWPJSYBORW-UHFFFAOYSA-N 7-methylquinolin-8-ol Chemical compound C1=CC=NC2=C(O)C(C)=CC=C21 LUOZEWPJSYBORW-UHFFFAOYSA-N 0.000 description 1
- VTUQISVBYRDYAW-UHFFFAOYSA-N 7h-1,7-naphthyridin-8-one Chemical compound C1=CN=C2C(=O)NC=CC2=C1 VTUQISVBYRDYAW-UHFFFAOYSA-N 0.000 description 1
- 239000005725 8-Hydroxyquinoline Substances 0.000 description 1
- LGDFHDKSYGVKDC-UHFFFAOYSA-N 8-hydroxyquinoline-5-sulfonic acid Chemical compound C1=CN=C2C(O)=CC=C(S(O)(=O)=O)C2=C1 LGDFHDKSYGVKDC-UHFFFAOYSA-N 0.000 description 1
- 229910015900 BF3 Inorganic materials 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 1
- OIRNOUMBFUDDJV-UHFFFAOYSA-N C(C)(C)(C)OC=1C=CC(=C(C1)O)N=O Chemical compound C(C)(C)(C)OC=1C=CC(=C(C1)O)N=O OIRNOUMBFUDDJV-UHFFFAOYSA-N 0.000 description 1
- SQQNQZURMNFTBO-UHFFFAOYSA-N C(C)C1=C2C=CC=NC2=C(N=C1)O Chemical compound C(C)C1=C2C=CC=NC2=C(N=C1)O SQQNQZURMNFTBO-UHFFFAOYSA-N 0.000 description 1
- TZUOXGURAMAJBF-UHFFFAOYSA-N CN.C(C)N(CC(=O)O)CC(=O)O.C(C)N(CC(=O)O)CC(=O)O Chemical compound CN.C(C)N(CC(=O)O)CC(=O)O.C(C)N(CC(=O)O)CC(=O)O TZUOXGURAMAJBF-UHFFFAOYSA-N 0.000 description 1
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- FCKYPQBAHLOOJQ-UHFFFAOYSA-N Cyclohexane-1,2-diaminetetraacetic acid Chemical compound OC(=O)CN(CC(O)=O)C1CCCCC1N(CC(O)=O)CC(O)=O FCKYPQBAHLOOJQ-UHFFFAOYSA-N 0.000 description 1
- QWCKQJZIFLGMSD-GSVOUGTGSA-N D-alpha-aminobutyric acid Chemical compound CC[C@@H](N)C(O)=O QWCKQJZIFLGMSD-GSVOUGTGSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- 229910052688 Gadolinium Inorganic materials 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 239000004471 Glycine Substances 0.000 description 1
- 108010008488 Glycylglycine Proteins 0.000 description 1
- PMMYEEVYMWASQN-DMTCNVIQSA-N Hydroxyproline Chemical compound O[C@H]1CN[C@H](C(O)=O)C1 PMMYEEVYMWASQN-DMTCNVIQSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- XUJNEKJLAYXESH-REOHCLBHSA-N L-Cysteine Chemical compound SC[C@H](N)C(O)=O XUJNEKJLAYXESH-REOHCLBHSA-N 0.000 description 1
- QNAYBMKLOCPYGJ-REOHCLBHSA-N L-alanine Chemical compound C[C@H](N)C(O)=O QNAYBMKLOCPYGJ-REOHCLBHSA-N 0.000 description 1
- AYFVYJQAPQTCCC-GBXIJSLDSA-N L-threonine Chemical compound C[C@@H](O)[C@H](N)C(O)=O AYFVYJQAPQTCCC-GBXIJSLDSA-N 0.000 description 1
- 239000002841 Lewis acid Substances 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- QPCDCPDFJACHGM-UHFFFAOYSA-N N,N-bis{2-[bis(carboxymethyl)amino]ethyl}glycine Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(=O)O)CCN(CC(O)=O)CC(O)=O QPCDCPDFJACHGM-UHFFFAOYSA-N 0.000 description 1
- JLTDJTHDQAWBAV-UHFFFAOYSA-N N,N-dimethylaniline Chemical compound CN(C)C1=CC=CC=C1 JLTDJTHDQAWBAV-UHFFFAOYSA-N 0.000 description 1
- FFDGPVCHZBVARC-UHFFFAOYSA-N N,N-dimethylglycine Chemical compound CN(C)CC(O)=O FFDGPVCHZBVARC-UHFFFAOYSA-N 0.000 description 1
- JYXGIOKAKDAARW-UHFFFAOYSA-N N-(2-hydroxyethyl)iminodiacetic acid Chemical compound OCCN(CC(O)=O)CC(O)=O JYXGIOKAKDAARW-UHFFFAOYSA-N 0.000 description 1
- 229930192627 Naphthoquinone Natural products 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- FQYUMYWMJTYZTK-UHFFFAOYSA-N Phenyl glycidyl ether Chemical compound C1OC1COC1=CC=CC=C1 FQYUMYWMJTYZTK-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 108010077895 Sarcosine Proteins 0.000 description 1
- AWMVMTVKBNGEAK-UHFFFAOYSA-N Styrene oxide Chemical compound C1OC1C1=CC=CC=C1 AWMVMTVKBNGEAK-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- AYFVYJQAPQTCCC-UHFFFAOYSA-N Threonine Natural products CC(O)C(N)C(O)=O AYFVYJQAPQTCCC-UHFFFAOYSA-N 0.000 description 1
- 239000004473 Threonine Substances 0.000 description 1
- 239000005703 Trimethylamine hydrochloride Substances 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- NHPKMFIBLXEDBI-UHFFFAOYSA-N acetic acid butane-1,4-diamine Chemical compound CC(O)=O.CC(O)=O.CC(O)=O.CC(O)=O.NCCCCN NHPKMFIBLXEDBI-UHFFFAOYSA-N 0.000 description 1
- 235000004279 alanine Nutrition 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000005215 alkyl ethers Chemical class 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 235000001014 amino acid Nutrition 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 1
- HTZCNXWZYVXIMZ-UHFFFAOYSA-M benzyl(triethyl)azanium;chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC1=CC=CC=C1 HTZCNXWZYVXIMZ-UHFFFAOYSA-M 0.000 description 1
- 229940000635 beta-alanine Drugs 0.000 description 1
- JWEXHQAEWHKGCW-UHFFFAOYSA-N bis[2-(6-fluoro-3,4-dihydro-2h-chromen-2-yl)-2-hydroxyethyl]azanium;chloride Chemical compound Cl.C1CC2=CC(F)=CC=C2OC1C(O)CNCC(O)C1OC2=CC=C(F)C=C2CC1 JWEXHQAEWHKGCW-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 229940120693 copper naphthenate Drugs 0.000 description 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 1
- SEVNKWFHTNVOLD-UHFFFAOYSA-L copper;3-(4-ethylcyclohexyl)propanoate;3-(3-ethylcyclopentyl)propanoate Chemical compound [Cu+2].CCC1CCC(CCC([O-])=O)C1.CCC1CCC(CCC([O-])=O)CC1 SEVNKWFHTNVOLD-UHFFFAOYSA-L 0.000 description 1
- IFDVQVHZEKPUSC-UHFFFAOYSA-N cyclohex-3-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCC=CC1C(O)=O IFDVQVHZEKPUSC-UHFFFAOYSA-N 0.000 description 1
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 description 1
- 235000018417 cysteine Nutrition 0.000 description 1
- XUJNEKJLAYXESH-UHFFFAOYSA-N cysteine Natural products SCC(N)C(O)=O XUJNEKJLAYXESH-UHFFFAOYSA-N 0.000 description 1
- 229960002433 cysteine Drugs 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- LJSQFQKUNVCTIA-UHFFFAOYSA-N diethyl sulfide Chemical compound CCSCC LJSQFQKUNVCTIA-UHFFFAOYSA-N 0.000 description 1
- QHNXEVRKFKHMRL-UHFFFAOYSA-N dimethylazanium;acetate Chemical compound CNC.CC(O)=O QHNXEVRKFKHMRL-UHFFFAOYSA-N 0.000 description 1
- 108700003601 dimethylglycine Proteins 0.000 description 1
- WJJMNDUMQPNECX-UHFFFAOYSA-N dipicolinic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=N1 WJJMNDUMQPNECX-UHFFFAOYSA-N 0.000 description 1
- VNEBWJSWMVTSHK-UHFFFAOYSA-L disodium;3-hydroxynaphthalene-2,7-disulfonate Chemical compound [Na+].[Na+].C1=C(S([O-])(=O)=O)C=C2C=C(S([O-])(=O)=O)C(O)=CC2=C1 VNEBWJSWMVTSHK-UHFFFAOYSA-L 0.000 description 1
- HQWKKEIVHQXCPI-UHFFFAOYSA-L disodium;phthalate Chemical compound [Na+].[Na+].[O-]C(=O)C1=CC=CC=C1C([O-])=O HQWKKEIVHQXCPI-UHFFFAOYSA-L 0.000 description 1
- PMMYEEVYMWASQN-UHFFFAOYSA-N dl-hydroxyproline Natural products OC1C[NH2+]C(C([O-])=O)C1 PMMYEEVYMWASQN-UHFFFAOYSA-N 0.000 description 1
- JRBPAEWTRLWTQC-UHFFFAOYSA-N dodecylamine Chemical compound CCCCCCCCCCCCN JRBPAEWTRLWTQC-UHFFFAOYSA-N 0.000 description 1
- GKIPXFAANLTWBM-UHFFFAOYSA-N epibromohydrin Chemical compound BrCC1CO1 GKIPXFAANLTWBM-UHFFFAOYSA-N 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- OUDSFQBUEBFSPS-UHFFFAOYSA-N ethylenediaminetriacetic acid Chemical compound OC(=O)CNCCN(CC(O)=O)CC(O)=O OUDSFQBUEBFSPS-UHFFFAOYSA-N 0.000 description 1
- UIWYJDYFSGRHKR-UHFFFAOYSA-N gadolinium atom Chemical compound [Gd] UIWYJDYFSGRHKR-UHFFFAOYSA-N 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 229940043257 glycylglycine Drugs 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229960002591 hydroxyproline Drugs 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 150000007517 lewis acids Chemical class 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- MJIVRKPEXXHNJT-UHFFFAOYSA-N lutidinic acid Chemical compound OC(=O)C1=CC=NC(C(O)=O)=C1 MJIVRKPEXXHNJT-UHFFFAOYSA-N 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 229910000000 metal hydroxide Inorganic materials 0.000 description 1
- 150000004692 metal hydroxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- MGFYIUFZLHCRTH-UHFFFAOYSA-N nitrilotriacetic acid Chemical compound OC(=O)CN(CC(O)=O)CC(O)=O MGFYIUFZLHCRTH-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- JKXONPYJVWEAEL-UHFFFAOYSA-N oxiran-2-ylmethyl acetate Chemical compound CC(=O)OCC1CO1 JKXONPYJVWEAEL-UHFFFAOYSA-N 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- 229960003540 oxyquinoline Drugs 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 229960003330 pentetic acid Drugs 0.000 description 1
- HTIXSIBTBYVJHX-UHFFFAOYSA-N phenyl nitrite Chemical class O=NOC1=CC=CC=C1 HTIXSIBTBYVJHX-UHFFFAOYSA-N 0.000 description 1
- 150000003009 phosphonic acids Chemical class 0.000 description 1
- 150000004714 phosphonium salts Chemical class 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 235000011056 potassium acetate Nutrition 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- CBPYOHALYYGNOE-UHFFFAOYSA-M potassium;3,5-dinitrobenzoate Chemical compound [K+].[O-]C(=O)C1=CC([N+]([O-])=O)=CC([N+]([O-])=O)=C1 CBPYOHALYYGNOE-UHFFFAOYSA-M 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 229940079877 pyrogallol Drugs 0.000 description 1
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical compound C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 description 1
- QRDZFPUVLYEQTA-UHFFFAOYSA-N quinoline-8-carboxylic acid Chemical compound C1=CN=C2C(C(=O)O)=CC=CC2=C1 QRDZFPUVLYEQTA-UHFFFAOYSA-N 0.000 description 1
- GJAWHXHKYYXBSV-UHFFFAOYSA-N quinolinic acid Chemical compound OC(=O)C1=CC=CN=C1C(O)=O GJAWHXHKYYXBSV-UHFFFAOYSA-N 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 150000003460 sulfonic acids Chemical class 0.000 description 1
- STOSPPMGXZPHKP-UHFFFAOYSA-N tetrachlorohydroquinone Chemical compound OC1=C(Cl)C(Cl)=C(O)C(Cl)=C1Cl STOSPPMGXZPHKP-UHFFFAOYSA-N 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- DDFYFBUWEBINLX-UHFFFAOYSA-M tetramethylammonium bromide Chemical compound [Br-].C[N+](C)(C)C DDFYFBUWEBINLX-UHFFFAOYSA-M 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 229960002898 threonine Drugs 0.000 description 1
- RPVGLMKJGQMQSN-UHFFFAOYSA-N tiliquinol Chemical compound C1=CC=C2C(C)=CC=C(O)C2=N1 RPVGLMKJGQMQSN-UHFFFAOYSA-N 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 1
- FGMPLJWBKKVCDB-UHFFFAOYSA-N trans-L-hydroxy-proline Natural products ON1CCCC1C(O)=O FGMPLJWBKKVCDB-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- SZYJELPVAFJOGJ-UHFFFAOYSA-N trimethylamine hydrochloride Chemical compound Cl.CN(C)C SZYJELPVAFJOGJ-UHFFFAOYSA-N 0.000 description 1
- 239000000015 trinitrotoluene Substances 0.000 description 1
- ZFEAYIKULRXTAR-UHFFFAOYSA-M triphenylsulfanium;chloride Chemical compound [Cl-].C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 ZFEAYIKULRXTAR-UHFFFAOYSA-M 0.000 description 1
- IZYFBZDLXRHRLF-UHFFFAOYSA-N tritylphosphane;hydroiodide Chemical compound [I-].C=1C=CC=CC=1C(C=1C=CC=CC=1)([PH3+])C1=CC=CC=C1 IZYFBZDLXRHRLF-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- DUNKXUFBGCUVQW-UHFFFAOYSA-J zirconium tetrachloride Chemical compound Cl[Zr](Cl)(Cl)Cl DUNKXUFBGCUVQW-UHFFFAOYSA-J 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Description
本発明はオリゴ(メタ)アクリレートの製造方
法に関するものである。更に詳しくは、(メタ)
アクリル酸、多塩基カルボン酸無水物およびアル
キレンオキサイドよりオリゴ(メタ)アクリレー
トを安定に製造する方法に関するものである。
尚、本明細書においては、アクリル酸および/ま
たはメタアクリル酸の総称として(メタ)アクリ
ル酸なる用語を用い、又、アクリル酸および/ま
たはメタアクリル酸、多塩基カルボン酸無水物お
よびアルキレンオキサイドの反応によつて生成す
るアクリル酸エステル基および/またはメタアク
リル酸エステル基を有するエステルオリゴマーの
総称としてオリゴ(メタ)アクリレートなる用語
を用いることとする。
オリゴ(メタ)アクリレートは通常70〜150℃
の温度範囲で触媒およびラジカル重合禁止剤の存
在下に(メタ)アクリル酸、多塩基カルボン酸無
水物およびアルキレンオキサイドを反応させる方
法により製造されている。しかし、(メタ)アク
リル酸や反応によつて生成したオリゴ(メタ)ア
クリレートは、ラジカル重合性に富むために製造
反応中に系全体が異常に増粘したりゲル化したり
するトラブルが発生し易い。このようなトラブル
は通常使用される鉄系の反応装置を用いたり、鉄
系の容器に保存されていた原料を用いた場合に特
に発生し易く、オリゴ(メタ)アクリレート製造
上の大きな問題となつている。また、一方、この
種の製造反応中のトラブルを防止するためにハイ
ドロキノン等の通常の重合禁止剤を増量すると、
得られたオリゴ(メタ)アクリレートはその使用
時の硬化反応性が著しく悪くなるという新たな問
題が生じる。
本発明者等はこの様な現状に鑑み、(メタ)ア
クリル酸、多塩基カルボン酸無水物およびアルキ
レンオキサイドよりオリゴ(メタ)オクリレート
を製造する際の反応中に系全体が異常に増粘した
りゲル化したりするトラブルを防止する方法につ
いて鋭意研究した結果、反応系中にキレート形成
能を有する特定の化合物を共存させることにより
上記トラブルを防止し得ることを見出し、本発明
を完成させるに到つた。
従つて本発明の目的は、(メタ)アクリル酸、
多塩基カルボン酸無水物およびアルキレンオキサ
イドよりオリゴ(メタ)アクリレートを異常な増
粘やゲル化等のトラブルが発生することなく安定
に製造する方法を提供することにある。
即ち、本発明のオリゴ(メタ)アクリレートの
製造方法は、(メタ)アクリル酸(A)、多塩基カル
ボン酸無水物(B)およびアルキレンオキサイド(C)
を、触媒およびラジカル重合禁止剤の存在下に70
〜150℃の温度範囲で反応させてオリゴ(メタ)
アクリレートを製造する方法においてo―ニトロ
ソフエノール類、ニトロソナフトール類、カルボ
キシピリジン類、8―ヒドロキシキノリン類、カ
ルボキシキノリン類、ヒドロキシナフチリジン
類、アミノ酸類、アミノポリカルボン酸類、ポリ
アミノポリカルボン酸類および2,2′―ビピリジ
ンより選ばれた1種もしくは2種以上のキレート
形成能を有する化合物(D)を反応系内に共存させる
ことを特徴とするものである。
本発明で用いられる(メタ)アクリル酸は前記
の通りアクリル酸および/またはメタアクリル酸
である。アクリル酸およびメタアクリル酸として
は、市販のものを用いることができる。
多塩基カルボン酸無水物(B)は1分子中に少なく
とも1個のカルボン酸無水物基を含有する化合物
を指し、例えばフタル酸、コハク酸、マレイン
酸、テトラヒドロフタル酸、ヘキサヒドロフタル
酸、3,6エンドメチレンテトラヒドロフタル
酸、3,6エンドメチレンヘキサヒドロフタル
酸、3―メチルテトラヒドロフタル酸、4―メチ
ルテトラヒドロフタル酸、アルケニルコハク酸、
3,6エンドジクロルメチレンテトラクロルフタ
ル酸、テトラブロムフタル酸、テトラクロロフタ
ル酸等のジカルボン酸の無水物、あるいはトリメ
リツト酸、ピロメリツト酸、ブチルテトラカルボ
ン酸等の3価以上のカルボン酸の無水物を挙げる
ことができる。
アルキレンオキサイド(C)は1分子中に少なくと
も1個のエポキシ基を有する化合物を指し、例え
ばエチレンオキサイド、プロピレンオキサイド、
スチレンオキサイド、シクロヘキシレンオキサイ
ド、フエニルグリシジルエーテル、アリルグリシ
ジルエーテル、メタアクリル酸グリシジルエステ
ル、アクリル酸グリシジルエステル、酢酸グリシ
ジルエステル、エピクロルヒドリン、エピブロム
ヒドリン、トリブロモフエニルグリシジルエーテ
ル等を挙げることができる。また、これらの化合
物の一部にかえて、1分子中に2個以上のエポキ
シ基を有する化合物(例えばいわゆるエポキシ樹
脂と総称される化合物)を変性剤として用いるこ
とができる。
(メタ)アクリル酸(A)、多塩基カルボン酸無水
物(B)およびアルキレンオキサイド(C)の使用割合
は、それより導かれるオリゴ(メタ)アクリレー
トの使用目的によつて種々に変更される為に特に
限定されないが、ごく一般的な使用割合は(メ
タ)アクリル酸(A)1モルに対して多塩基カルボン
酸無水物(B)0.5〜15モル、アルキレンオキサイド
(C)1〜20モルである。
(メタ)アクリル酸(A)、多塩基カルボン酸無水
物(B)およびアルキレンオキサイド(C)を反応させる
に当たつて用いられる触媒は、当該技術分野で通
常用いられるものを使用することができる。その
ような触媒としては、例えば水酸化カリウム、水
酸化リチウム等の金属水酸化物類;塩化リチウ
ム、臭化カリウム、塩化スズ、塩化カリウム、臭
化リチウム、塩化亜鉛、塩化ジルコニウム等の金
属ハロゲン化物類;エタノールアミン、ラウリル
アミン、アニリン、ジブチルアミン、モルホリ
ン、ピペリジン、ジフエニルアミン、トリエチル
アミン、ジメチルアニリン、トリエチレンジアミ
ン、ピリジン、ジエチルアミン塩酸塩、ジメチル
アミン酢酸塩、トリメチルアミン塩酸塩、テトラ
メチルアンモニウムプロミド、トリメチルベンジ
ルアンモニウムクロライド等のアミン類及びそれ
らの無機酸塩類や有機酸塩類並びに第4級アンモ
ニウム塩類;N,N―ジメチルホルムアミド等の
アミド類;酢酸カリウム、フタル酸ナトリウム等
の有機酸アルカリ金属塩類;ベンゼンホスホン
酸、トリフエニルメチルホスホニウムヨーダイド
等のホスホン酸類およびホスホニウム塩類;パラ
トルエンスルホン酸、トリフエニルスルホニウム
クロライド等のスルホン酸およびスルホニウム塩
類;三弗化ほう素等のルイス酸型化合物類等を挙
げることができ、これらの化合物の1種又は2種
以上を用いることができる。中でも、アミン類及
びそれらの無機酸塩類や有機酸塩類並びに第4級
アンモニウム塩類からなる群から選ばれる化合物
は、副反応が少なく特に有利な触媒として利用で
きる。このような触媒の使用量は、(メタ)アク
リル酸(A)、多塩基カルボン酸無水物(B)およびアル
キレンオキサイド(C)の合計量を100重量部とし
て、通常0.0001〜5重量部の範囲の比率の量であ
る。
(メタ)アクリル酸(A)、多塩基カルボン酸無水
物(B)およびアルキレンオキサイド(C)の反応には上
記の如き触媒とともにラジカル重合禁止剤が用い
られるが、本発明で用いられる(メタ)アクリル
酸(A)には、通常、保存中に重合しないようにラジ
カル重合禁止剤が添加されているので、多塩基カ
ルボン酸無水物(B)およびアルキレンオキサイド(C)
との反応に際して改めてラジカル重合禁止剤を添
加することなく反応させることもできる。しか
し、必要に応じて更に添加して使用することもで
きる。このようなラジカル重合禁止剤としては、
例えばp―ベンゾキノン、ナフトキノン、パラト
ルキノン、2,5―ジフエニル―p―ベンゾキノ
ン、2,6―ジクロロキノン等のキノン類;ハイ
ドロキノン、p―t―ブチルハイドロキノン、ト
ルヒドロキノン、カテコール、p―t―ブチルカ
テコール、テトラクロロハイドロキノン、ピロガ
ロール、ハイドロキノンモノメチルエーテル等の
多価フエノール類およびそれらのアルキルエーテ
ル類;ジ―t―ブチルパラクレゾール、フエノー
ル等のフエノール類;ナフテン酸銅、塩化銅等の
銅塩類;ピクリル酸、ジニトロフエノール、トリ
ニトロトルエン等のニトロ化合物等を挙げること
ができ、これらの化合物の1種又は2種以上を用
いることができる。このようなラジカル重合禁止
剤の使用量は、(メタ)アクリル酸にラジカル重
合禁止剤が含まれている場合にはその量も含め
て、(メタ)アクリル酸(A)、多塩基カルボン酸無
水物(B)およびアルキレンオキサイド(C)の合計量を
100重量部として、通常0.0001〜0.5重量部の範囲
の比率の量である。
本発明では(メタ)アクリル酸(A)、多塩基カル
ボン酸無水物(B)およびアルキレンオキサイド(C)の
反応は70〜150℃の温度範囲内で行う。反応温度
がこの範囲より高くなると反応系がゲル化しやす
くなり、またこの範囲より低くなると反応に長時
間を要し、いずれも好ましくない。
(メタ)アクリル酸(A)、多塩基カルボン酸無水
物(B)およびアルキレンオキサイド(C)を反応させる
に当つては、これらの三成分を同時に反応させる
こともできるし、また、(メタ)アクリル酸(A)と
アルキレンオキサイド(C)の一部とを予じめ前段反
応として反応させた後、更に後段反応として多塩
基カルボン酸無水物(B)とアルキレンオキサイド(C)
の残りとを添加して反応させてもよく、更にはこ
の後段反応を更に数回に区分して逐次反応させて
もよい。
本発明で用いられるキレート形成能を有する化
合物(D)としては、以下に示す様な化合物で代表さ
れる各種化合物類や2,2′―ビピリジンの中から
選ばれた1種もしくは2種以上の化合物よりなる
ものである。すなわち各種化合物類とは、o―ニ
トロソフエノール、4―メチル―O―ニトロソフ
エノール、5―t―ブチル―O―ニトロソフエノ
ール等のO―ニトロソフエノール類;2―ニトロ
ソ―1―ナフトール、5―メチル―2―ニトロソ
―1―ナフトール、1―ニトロソ―2―ナフトー
ル、6―t―ブチル―1―ニトロソ―2―ナフト
ール、3,6―ジ(ナトリウムスルホ)―1―ニ
トロソ―2―ナフトール(ニトロソR塩)等のニ
トロソナフトール類;2―カルボキシピリジン、
2,6―ジカルボキシピリジン、4―メチル―2
―カルボキシピリジン、2,3―ジカルボキシピ
リジン、2,4―ジカルボキシピリジン等のカル
ボキシピリジン類;8―ヒドロキシキノリン、2
―メチル―8―ヒドロキシキノリン、4―メチル
―8―ヒドロキシキノリン、5―メチル―8―ヒ
ドロキシキノリン、7―メチル―8―ヒドロキシ
キノリン、8―ヒドロキシキノリン―5―スルホ
ン酸、7―ヨード―8―ヒドロキシキノリン―5
―スルホン酸等の8―ヒドロキシキノリン類;2
―カルボキシキノリン、8―カルボキシキノリ
ン、5―メチル―2―カルボキシキノリン等のカ
ルボキシキノリン類;4―ヒドロキシ―1,5―
ナフチリジン、8―ヒドロキシ―1,6―ナフチ
リジン、8―ヒドロキシ―1,7―ナフチリジ
ン、5―エチル―8―ヒドロキシ―1,7―ナフ
チリジン等のヒドロキシナフチリジン類;グリシ
ン、N―メチルグリシン、アラニン、β―アラニ
ン、α―アミノ酪酸、システイン、スレオニン、
ヒドロキシプロリン、グリシルグリシン、N,N
―ジメチルグリシン等のアミノ酸類;イミノジ酢
酸、イミノジプロピオン酸、N―メチルイミノジ
酢酸、N―(3,3―ジメチルブチル)イミノジ
酢酸、N―フエニルイミノジ酢酸、N―(2―ヒ
ドロキシエチル)イミノジ酢酸、N―(2―メル
カプトエチル)イミノジ酢酸、N―(2―ヒドロ
キシエチル)イミノジプロピオン酸、N―(3―
ヒドロキシプロピル)イミノジプロピオン酸、N
―(2―ヒドロキシシクロヘキシル)イミノジ酢
酸、N―(2―メトキシエチル)イミノジ酢酸、
N―(2―ヒドロキシベンジル)イミノジ酢酸、
N―(3―カルボキシフエニル)イミノジ酢酸、
N―(カルバモイルメチル)イミノジ酢酸、N―
(2―アミノエチル)イミノジ酢酸、N―(2―
アミノエチル)イミノジプロピオン酸、ニトリロ
トリ酢酸、N―カルボキシメチルイミノジプロピ
オン酸、ニトリロトリプロピオン酸、N―(2―
カルボキシエチル)イミノジ酢酸、N―(2―メ
チル―2―カルボキシエチル)イミノジ酢酸等の
アミノポリカルボン酸類;―エチレンジアミンジ
酢酸、N,N′―エチレンジアミンジプロピオン
酸、N,N′―ジ(2―ヒドロキシエチル)エチ
レンジアミンジ酢酸、N―n―ブチルエチレンジ
アミントリ酢酸、N―シクロヘキシルエチレンジ
アミントリプロピオン酸、N―(2―ヒドロキシ
シクロヘキシル)エチレンジアミントリ酢酸、N
―(2―ヒドロキシエチル)エチレンジアミント
リ酢酸、N―ベンジルエチレンジアミントリ酢
酸、エチレンジアミンテトラ酢酸、エチレンジア
ミンテトラプロピオン酸、N,N′―ジ(2―カ
ルボキシエチル)エチレンジアミンジ酢酸、N,
N′―ジ(1―カルボキシエチル)エチレンジア
ミンジ酢酸、1,2―プロピレンジアミンテトラ
酢酸、トリメチレンジアミンテトラ酢酸、テトラ
メチレンジアミンテトラ酢酸、ペンタメチレンジ
アミンテトラ酢酸、オクタメチレンジアミンテト
ラ酢酸、オクタメチレンジアミンテトラプロピオ
ン酸、N,N′―(2―カルボキシエチル)オク
タメチレンジアミンジ酢酸、1,2―シクロペン
タンジアミンテトラ酢酸、1,2―シクロヘキサ
ンジアミンテトラ酢酸、1,2―シクロヘキサン
ジアミンテトラプロピオン酸、1,3―シクロヘ
キサンジアミンテトラ酢酸、1,4―シクロヘキ
サンジアミンテトラプロピオン酸、1,3,5―
トリアミノシクロヘキサンヘキサ酢酸、2―ヒド
ロキシトリメチレンジアミンテトラ酢酸、2,
2′―エチルエーテルジアミンテトラ酢酸、2,
2′エチルチオエーテルジアミンテトラ酢酸、ビス
(イミノジ酢酸エチル)メチルアミン、ジエチレ
ントリアミンペンタ酢酸、ジエチレントリアミン
ペンタプロピオン酸、2―(2―イミノジ酢酸エ
トキシ)―2′―イミノジ酢酸―エチルエーテル、
トリメチレンテトラミンヘキサ酢酸、トリエチレ
ンテトラミンヘキサプロピオン酸、N,N′―ジ
メチルトリエチレンテトラミン―N″,N″,N
,N―テトラ酢酸、N,N′―ジメチルトリ
エチレンテトラミン―N″,N″,N,N―テ
トラプロピオン酸等のポリアミノポリカルボン酸
類やこれらの金属塩、金属錯体あるいはアンモニ
ウム塩である。また、これらの化合物の金属塩、
金属錯体あるいはアンモニウム塩も用いることが
できる。そして、このような金属塩や金属錯体を
形成する金属としては、リチウム、ナトリウム、
カリウム、マグネシウム、カルシウム、バリウ
ム、鉛、ガリウム、マンガン、コバルト、ニツケ
ル、銅、亜鉛、ジルコニウム、カドミウム、ラン
タン、セリウム、ガドリニウム等を挙げることが
できる。
本発明では、このような化合物の1種又は2種
以上をキレート形成能を有する化合物(D)として用
いるのであるが、このようなキレート形成能を有
する化合物(D)の使用量は、(メタ)アクリル酸
(A)、多塩基カルボン酸無水物(B)およびアルキレン
オキサイド(C)の合計量を100重量部として0.0001
重量部以上の比率の量であることが好ましい。使
用量がこれより少いと、本発明の優れた作用効果
が充分に発揮されないので好ましくない。キレー
ト形成能を有する化合物(D)の使用量の上限は特に
限定されるものではないが、通常は(メタ)アク
リル酸(A)、多塩基カルボン酸無水物(B)およびアル
キレンオキサイド(C)の合計量100部に対して2部
以下の比率の量で充分その効果を発揮する。
キレート形成能を有する化合物(D)を反応系内に
共存させるために添加する時期は、反応開始前で
もよく、あるいは該化合物(D)を共存させずに反応
させた場合に反応開始時点から反応系が異常に増
粘するかもしくはゲル化するまでの期間(以下、
増粘発生基間と称す。)でもよい。
増粘発生期間は、触媒やラジカル重合禁止剤の
種類や使用量、あるいは、反応温度等の反応条件
により変動するため、画一的に指し示すことは困
難である。しかし反応条件を特定した個々の反応
系の増粘発生期間は、簡単な実験の繰返しにより
容易に決定することができるものである。従つ
て、例えば、キレート形成能を有する化合物(D)の
共存しない状態で或る反応条件下に反応させた場
合、反応系が反応開始時点から5時間後に異常な
増粘もしくはゲル化したと仮定すれば、同一条件
下では反応開始前あるいは反応開始時点から5時
間以内に反応系にキレート形成能を有する化合物
(D)を添加することにより、安定にオリゴ(メタ)
アクリレートを製造することができる。
このようにして本発明に基づいて得られたオリ
ゴ(メタ)アクリレートは、従来公知のオリゴ
(メタ)アクリレートと同様の使用方法により各
種用途に用いることができる。たとえば、得られ
たオリゴ(メタ)アクリレートは必要に応じて重
合性単量体を添加し、あるいは添加せずして、塗
料用樹脂、FRP成形用樹脂、注型用樹脂等とし
て用いることができる。また、多官能イソシアナ
ート化合物と反応させて熱硬化性ポリウレタンと
して用いることもできる。
本発明に基けば、このように用途の広いオリゴ
(メタ)アクリレートを、製造反応中に異常な増
粘やゲル化等のトラブルを生ずることなく安定に
製造することができ、該技術分野に多大の貢献を
するものである。本発明の方法が何故このように
オリゴ(メタ)アクリレートの製造中のゲル化防
止に優れた作用効果を発揮するかは理論的に明ら
かでないが、反応系にキレート形成能を有する化
合物(D)を共存させない場合あるいは該化合物(D)以
外のキレート形成能を有する化合物を共存させた
場合に比較すると、そのゲル化防止の効果は驚く
べきものである。
以下、実施例および比較例により本発明を更に
詳細に説明するが、本発明がこれらの例により限
定されるものではないことは言うまでもない。
尚、例中特にことわりのない限り「部」は「重
量部」を表わし、「部」の後の( )内の数字は
モル比率を表わすものとする。
実施例 1
トータルコンデンサー、温度計、ガス導入管、
加熱装置、冷却装置、撹拌装置および原料投入口
を備えたステンレス鋼(SUS 304)製の10の反
応器にメタアクリル酸860部(1)、無水マレイン酸
1960部(2)、無水フタル酸1480部(1)、ハイドロキノ
ン0.72部、トリエチルアミン22部およびエチレン
ジアミンテトラ酢酸0.7部を投入し、空気を導入
しながら100℃まで昇温した。次に反応系内を100
〜115℃の温度に保ちながらプロピレンオキサイ
ド2900部(5)を5時間で導入した後、更に4時間反
応させて酸価8のオリゴメタアクリレートを得
た。このオリゴメタアクリレート70部およびスチ
レン30部を混合して得た樹脂液の粘度は、25℃で
3.7ポイズであつた。
比較例 1
実施例1において、エチレンジアミンテトラ酢
酸を用いない以外は実施例1と同様にしてオリゴ
メタアクリレートの製造を試みたところ、プロピ
レンオキサイド導入終了後約30分で反応系の粘度
が上昇しはじめ、約70分で撹拌が困難となつた為
反応を中止した。
実施例 2
実施例1において、エチレンジアミンテトラ酢
酸を反応開始時より反応系に添加せずに、その代
りに、プロピレンオキサイド導入終了15分後に反
応系に添加した以外は実施例1と同様にして、酸
価9のオリゴメタアクリレートを得た。このオリ
ゴメタアクリレート70部およびスチレン30部を混
合して得た樹脂液の粘度は、25℃で4.0ポイズで
あつた。
実施例 3
実施例1と同様の反応器にアクリル酸216部
(1)、無水フタル酸1776部(4)、ハイドロキノン0.8
部およびトリエチルアミン40部を投入し、空気を
導入しながら100℃まで昇温した後、プロピレン
オキサイド870部(5)を3時間で導入した。次に反
応系に無水マレイン酸1176部(4)、エチレンジアミ
ンテトラ酢酸0.8部およびスチレン3300部を追加
した後、更にプロピレンオキサイド870部(5)を3
時間で導入し、引続き5時間反応させて、酸価
11、25℃での粘度が2.4ポイズのオリゴアクリレ
ートのスチレン溶液を得た。
比較例 2
実施例3において、エチレンジアミンテトラ酢
酸を用いない以外は実施例3と同様にしてオリゴ
アクリレートの製造を試みたが、反応開始より
5.5時間経た時点で反応系の粘度が上昇しはじ
め、更に15分後に粘度が20ポイズ以上となつたの
で反応を中止した。
実施例 4
接液部が全てガラス製である他は実施例1で用
いたと同様の四つ口フラスコを用いて以下の実験
を行なつた。
ステンレス鋼(SUS 304)製ドラムに約6ケ月
間保存されていたメタアクリル酸(ハイドロキノ
ン200ppm含有)86部(1)、トリエチルベンジルア
ンモニウムクロライド2.0部およびシクロヘキサ
ンジアミンテトラ酢酸0.08部を投入し、空気を導
入しながら100℃に昇温した後プロピレンオキサ
イド58部(1)を2時間で導入した。次に無水フタル
酸222部(1.5)を追加した後、更にエチレンオキ
サイド44部(1)を2時間で導入した後、引続き2時
間反応させて酸価53のオリゴメタアクリレートを
得た。このオリゴメタアクリレート70部およびス
チレン30部を混合して得た樹脂液の粘度は、25℃
で、1.3ポイズであつた。
比較例 3
実施例4において、シクロヘキサンジアミンテ
トラ酢酸を用いない以外は実施例4と同様にし
て、酸価49のオリゴメタアクリレートを得て、こ
のオリゴメタアクリレート70部とスチレン30部を
混合して得た樹脂液の25℃での粘度は高く、60ポ
イズであつた。
実施例 5〜19
実施例1において、エチレンジアミンテトラ酢
酸0.7部に替えて第1表に記した各種のキレート
形成能を有する化合物(D)を用いた以外は実施例1
と同様にして、各オリゴ(メタ)アクリレートを
製造した。
キレート形成能を有する化合物(D)の種類と使用
量、得られた各オリゴ(メタ)アクリレートの酸
価ならびに各オリゴ(メタ)アクリレート70部と
スチレン30部とを混合して得た樹脂液のそれぞれ
の粘度を第1表に示した。
The present invention relates to a method for producing oligo(meth)acrylate. For more details, see (meta)
The present invention relates to a method for stably producing oligo(meth)acrylate from acrylic acid, polybasic carboxylic acid anhydride, and alkylene oxide.
In this specification, the term (meth)acrylic acid is used as a general term for acrylic acid and/or methacrylic acid, and also refers to acrylic acid and/or methacrylic acid, polybasic carboxylic acid anhydrides, and alkylene oxides. The term oligo(meth)acrylate will be used as a general term for ester oligomers having an acrylic ester group and/or a methacrylic ester group produced by the reaction. Oligo(meth)acrylate is usually 70-150℃
It is produced by a method in which (meth)acrylic acid, a polybasic carboxylic acid anhydride, and an alkylene oxide are reacted in the presence of a catalyst and a radical polymerization inhibitor at a temperature range of . However, since (meth)acrylic acid and oligo(meth)acrylates produced by reaction have high radical polymerizability, troubles such as abnormal thickening or gelation of the entire system during the manufacturing reaction are likely to occur. Such troubles are particularly likely to occur when using commonly used iron-based reaction equipment or raw materials stored in iron-based containers, and become a major problem in the production of oligo(meth)acrylates. ing. On the other hand, in order to prevent troubles during this type of production reaction, if the amount of a normal polymerization inhibitor such as hydroquinone is increased,
A new problem arises in that the obtained oligo(meth)acrylate has significantly poor curing reactivity when used. In view of the current situation, the present inventors have discovered that the entire system may become abnormally thick during the reaction when producing oligo(meth)acrylate from (meth)acrylic acid, polybasic carboxylic acid anhydride, and alkylene oxide. As a result of intensive research into ways to prevent troubles such as gelation, the inventors discovered that the above troubles could be prevented by coexisting a specific compound with chelate-forming ability in the reaction system, leading to the completion of the present invention. . Therefore, the object of the present invention is to provide (meth)acrylic acid,
It is an object of the present invention to provide a method for stably producing oligo(meth)acrylate from polybasic carboxylic acid anhydride and alkylene oxide without causing troubles such as abnormal thickening and gelation. That is, the method for producing oligo(meth)acrylate of the present invention comprises (meth)acrylic acid (A), polybasic carboxylic acid anhydride (B), and alkylene oxide (C).
70 in the presence of a catalyst and a radical polymerization inhibitor
Oligo(meth) reacted at a temperature range of ~150℃
In the method for producing acrylates, o-nitrosophenols, nitrosonaphthols, carboxypyridines, 8-hydroxyquinolines, carboxyquinolines, hydroxynaphthyridines, amino acids, aminopolycarboxylic acids, polyaminopolycarboxylic acids and 2,2 It is characterized in that one or more compounds (D) having chelate-forming ability selected from '-bipyridine are allowed to coexist in the reaction system. The (meth)acrylic acid used in the present invention is acrylic acid and/or methacrylic acid as described above. Commercially available acrylic acid and methacrylic acid can be used. Polybasic carboxylic anhydride (B) refers to a compound containing at least one carboxylic anhydride group in one molecule, such as phthalic acid, succinic acid, maleic acid, tetrahydrophthalic acid, hexahydrophthalic acid, , 6-endomethylenetetrahydrophthalic acid, 3,6-endomethylenehexahydrophthalic acid, 3-methyltetrahydrophthalic acid, 4-methyltetrahydrophthalic acid, alkenylsuccinic acid,
Anhydrides of dicarboxylic acids such as 3,6-endodichloromethylenetetrachlorophthalic acid, tetrabromophthalic acid, and tetrachlorophthalic acid, or anhydrides of trivalent or higher carboxylic acids such as trimellitic acid, pyromellitic acid, butyltetracarboxylic acid, etc. I can name things. Alkylene oxide (C) refers to a compound having at least one epoxy group in one molecule, such as ethylene oxide, propylene oxide,
Examples include styrene oxide, cyclohexylene oxide, phenyl glycidyl ether, allyl glycidyl ether, methacrylic acid glycidyl ester, acrylic acid glycidyl ester, acetic acid glycidyl ester, epichlorohydrin, epibromhydrin, tribromophenyl glycidyl ether, etc. . Moreover, instead of some of these compounds, compounds having two or more epoxy groups in one molecule (for example, compounds collectively referred to as so-called epoxy resins) can be used as a modifier. The usage ratios of (meth)acrylic acid (A), polybasic carboxylic anhydride (B), and alkylene oxide (C) vary depending on the intended use of the oligo(meth)acrylate. Although not particularly limited, the very general ratio of use is 0.5 to 15 moles of polybasic carboxylic acid anhydride (B) and alkylene oxide to 1 mole of (meth)acrylic acid (A).
(C) 1 to 20 moles. As the catalyst used for reacting (meth)acrylic acid (A), polybasic carboxylic acid anhydride (B), and alkylene oxide (C), those commonly used in the technical field can be used. . Such catalysts include, for example, metal hydroxides such as potassium hydroxide and lithium hydroxide; metal halides such as lithium chloride, potassium bromide, tin chloride, potassium chloride, lithium bromide, zinc chloride, and zirconium chloride. Class: ethanolamine, laurylamine, aniline, dibutylamine, morpholine, piperidine, diphenylamine, triethylamine, dimethylaniline, triethylenediamine, pyridine, diethylamine hydrochloride, dimethylamine acetate, trimethylamine hydrochloride, tetramethylammonium bromide, trimethylbenzyl Amines such as ammonium chloride, their inorganic and organic acid salts, and quaternary ammonium salts; amides such as N,N-dimethylformamide; alkali metal salts of organic acids such as potassium acetate and sodium phthalate; benzenephosphon Acids, phosphonic acids and phosphonium salts such as triphenylmethylphosphonium iodide; sulfonic acids and sulfonium salts such as para-toluenesulfonic acid and triphenylsulfonium chloride; Lewis acid type compounds such as boron trifluoride, etc. One type or two or more types of these compounds can be used. Among these, compounds selected from the group consisting of amines, their inorganic acid salts, organic acid salts, and quaternary ammonium salts can be used as particularly advantageous catalysts because they cause fewer side reactions. The amount of such a catalyst used is usually in the range of 0.0001 to 5 parts by weight, based on 100 parts by weight of the total amount of (meth)acrylic acid (A), polybasic carboxylic acid anhydride (B), and alkylene oxide (C). is the amount of the ratio of In the reaction of (meth)acrylic acid (A), polybasic carboxylic acid anhydride (B), and alkylene oxide (C), a radical polymerization inhibitor is used together with the above-mentioned catalyst. A radical polymerization inhibitor is usually added to acrylic acid (A) to prevent it from polymerizing during storage, so polybasic carboxylic acid anhydride (B) and alkylene oxide (C)
It is also possible to carry out the reaction without adding a radical polymerization inhibitor again during the reaction. However, it can be further added and used if necessary. Such radical polymerization inhibitors include:
For example, quinones such as p-benzoquinone, naphthoquinone, paratoluquinone, 2,5-diphenyl-p-benzoquinone, 2,6-dichloroquinone; hydroquinone, p-t-butylhydroquinone, toluhydroquinone, catechol, p-t-butylcatechol , polyhydric phenols such as tetrachlorohydroquinone, pyrogallol, and hydroquinone monomethyl ether, and their alkyl ethers; phenols such as di-t-butyl p-cresol and phenol; copper salts such as copper naphthenate and copper chloride; picrylic acid , dinitrophenol, trinitrotoluene, and the like, and one or more of these compounds can be used. The amount of such radical polymerization inhibitor to be used, including the amount of radical polymerization inhibitor used in (meth)acrylic acid (A), polybasic carboxylic acid anhydride, etc. The total amount of compound (B) and alkylene oxide (C) is
The amount is usually in the range of 0.0001 to 0.5 parts by weight per 100 parts by weight. In the present invention, the reaction of (meth)acrylic acid (A), polybasic carboxylic acid anhydride (B) and alkylene oxide (C) is carried out within a temperature range of 70 to 150°C. When the reaction temperature is higher than this range, the reaction system tends to gel, and when it is lower than this range, the reaction takes a long time, both of which are unfavorable. When reacting (meth)acrylic acid (A), polybasic carboxylic acid anhydride (B), and alkylene oxide (C), these three components can be reacted simultaneously, or (meth) After reacting acrylic acid (A) and a part of alkylene oxide (C) in advance as a first stage reaction, polybasic carboxylic acid anhydride (B) and alkylene oxide (C) are further reacted as a second stage reaction.
The reaction may be carried out by adding the remainder of the reaction mixture, or furthermore, this latter stage reaction may be further divided into several stages and the reactions may be carried out sequentially. The compound (D) having chelate-forming ability used in the present invention includes one or more compounds selected from various compounds represented by the compounds shown below and 2,2'-bipyridine. It consists of a compound. In other words, the various compounds include O-nitrosophenols such as o-nitrosophenol, 4-methyl-O-nitrosophenol, and 5-t-butyl-O-nitrosophenol; 2-nitroso-1-naphthol, 5-methyl -2-nitroso-1-naphthol, 1-nitroso-2-naphthol, 6-t-butyl-1-nitroso-2-naphthol, 3,6-di(sodium sulfo)-1-nitroso-2-naphthol (nitroso-2-naphthol) Nitrosonaphthols such as R salt); 2-carboxypyridine,
2,6-dicarboxypyridine, 4-methyl-2
- Carboxypyridines such as carboxypyridine, 2,3-dicarboxypyridine, 2,4-dicarboxypyridine; 8-hydroxyquinoline, 2
-Methyl-8-hydroxyquinoline, 4-methyl-8-hydroxyquinoline, 5-methyl-8-hydroxyquinoline, 7-methyl-8-hydroxyquinoline, 8-hydroxyquinoline-5-sulfonic acid, 7-iodo-8 -Hydroxyquinoline-5
-8-hydroxyquinolines such as sulfonic acid; 2
- Carboxyquinolines such as carboxyquinoline, 8-carboxyquinoline, 5-methyl-2-carboxyquinoline; 4-hydroxy-1,5-
Hydroxynaphthyridines such as naphthyridine, 8-hydroxy-1,6-naphthyridine, 8-hydroxy-1,7-naphthyridine, 5-ethyl-8-hydroxy-1,7-naphthyridine; glycine, N-methylglycine, alanine, β-alanine, α-aminobutyric acid, cysteine, threonine,
Hydroxyproline, glycylglycine, N,N
-Amino acids such as dimethylglycine; iminodiacetic acid, iminodipropionic acid, N-methyliminodiacetic acid, N-(3,3-dimethylbutyl)iminodiacetic acid, N-phenyliminodiacetic acid, N-(2-hydroxyethyl)iminodiacetic acid, N-(2-mercaptoethyl)iminodiacetic acid, N-(2-hydroxyethyl)iminodipropionic acid, N-(3-
hydroxypropyl)iminodipropionic acid, N
-(2-hydroxycyclohexyl)iminodiacetic acid, N-(2-methoxyethyl)iminodiacetic acid,
N-(2-hydroxybenzyl)iminodiacetic acid,
N-(3-carboxyphenyl)iminodiacetic acid,
N-(carbamoylmethyl)iminodiacetic acid, N-
(2-aminoethyl)iminodiacetic acid, N-(2-
aminoethyl)iminodipropionic acid, nitrilotriacetic acid, N-carboxymethyliminodipropionic acid, nitrilotripropionic acid, N-(2-
Aminopolycarboxylic acids such as carboxyethyl)iminodiacetic acid and N-(2-methyl-2-carboxyethyl)iminodiacetic acid; -ethylenediaminediacetic acid, N,N'-ethylenediaminedipropionic acid, N,N'-di(2 -Hydroxyethyl)ethylenediaminediacetic acid, N-n-butylethylenediaminetriacetic acid, N-cyclohexylethylenediaminetripropionic acid, N-(2-hydroxycyclohexyl)ethylenediaminetriacetic acid, N
-(2-hydroxyethyl)ethylenediaminetriacetic acid, N-benzylethylenediaminetriacetic acid, ethylenediaminetetraacetic acid, ethylenediaminetetrapropionic acid, N,N'-di(2-carboxyethyl)ethylenediaminediacetic acid, N,
N'-di(1-carboxyethyl)ethylenediaminediacetic acid, 1,2-propylenediaminetetraacetic acid, trimethylenediaminetetraacetic acid, tetramethylenediaminetetraacetic acid, pentamethylenediaminetetraacetic acid, octamethylenediaminetetraacetic acid, octamethylenediamine Tetrapropionic acid, N,N'-(2-carboxyethyl)octamethylenediamine diacetic acid, 1,2-cyclopentanediaminetetraacetic acid, 1,2-cyclohexanediaminetetraacetic acid, 1,2-cyclohexanediaminetetrapropionic acid, 1,3-cyclohexanediaminetetraacetic acid, 1,4-cyclohexanediaminetetrapropionic acid, 1,3,5-
triaminocyclohexanehexaacetic acid, 2-hydroxytrimethylenediaminetetraacetic acid, 2,
2'-ethyl ether diamine tetraacetic acid, 2,
2'ethylthioether diamine tetraacetic acid, bis(ethyl iminodiacetate) methylamine, diethylenetriaminepentaacetic acid, diethylenetriaminepentapropionic acid, 2-(2-iminodiacetic acid ethoxy)-2'-iminodiacetic acid-ethyl ether,
Trimethylenetetraminehexaacetic acid, triethylenetetraminehexapropionic acid, N,N′-dimethyltriethylenetetramine-N″,N″,N
, N-tetraacetic acid, N,N'-dimethyltriethylenetetramine-N'',N'', N,N-tetrapropionic acid, and metal salts, metal complexes, or ammonium salts thereof. Also, metal salts of these compounds,
Metal complexes or ammonium salts can also be used. The metals that form such metal salts and metal complexes include lithium, sodium,
Examples include potassium, magnesium, calcium, barium, lead, gallium, manganese, cobalt, nickel, copper, zinc, zirconium, cadmium, lanthanum, cerium, and gadolinium. In the present invention, one or more of these compounds are used as the compound (D) having chelate-forming ability, and the amount of the compound (D) having chelate-forming ability is ) acrylic acid
0.0001 based on the total amount of (A), polybasic carboxylic acid anhydride (B) and alkylene oxide (C) as 100 parts by weight
Preferably, the amount is in proportions of parts by weight or more. If the amount used is less than this, the excellent effects of the present invention will not be fully exhibited, which is not preferable. The upper limit of the amount of the compound (D) having chelate-forming ability to be used is not particularly limited, but usually (meth)acrylic acid (A), polybasic carboxylic acid anhydride (B), and alkylene oxide (C). A ratio of 2 parts or less per 100 parts of the total amount is enough to exhibit its effect. The compound (D) having chelate-forming ability may be added to the reaction system before the reaction starts, or when the reaction is carried out without the compound (D), the reaction starts from the start of the reaction. The period until the system becomes abnormally thickened or gels (hereinafter referred to as
This is called the viscosity-generating group. ) is also fine. The period during which viscosity increase occurs varies depending on the type and amount of catalyst and radical polymerization inhibitor used, and reaction conditions such as reaction temperature, so it is difficult to specify it uniformly. However, the period during which thickening occurs for each reaction system with specified reaction conditions can be easily determined by repeating simple experiments. Therefore, for example, suppose that when the reaction is carried out under certain reaction conditions in the absence of the compound (D) having chelate-forming ability, the reaction system becomes abnormally thickened or gelled 5 hours after the start of the reaction. Under the same conditions, a compound with chelate-forming ability is added to the reaction system before the reaction starts or within 5 hours from the start of the reaction.
By adding (D), oligo(meta) can be stabilized.
Acrylates can be produced. The oligo(meth)acrylate thus obtained according to the present invention can be used for various purposes in the same manner as conventionally known oligo(meth)acrylates. For example, the obtained oligo(meth)acrylate can be used as paint resin, FRP molding resin, casting resin, etc. with or without addition of a polymerizable monomer as necessary. . It can also be used as a thermosetting polyurethane by reacting with a polyfunctional isocyanate compound. Based on the present invention, it is possible to stably produce oligo(meth)acrylates with such a wide range of uses without causing problems such as abnormal thickening or gelation during the production reaction, and this invention is useful in this technical field. This will make a huge contribution. Although it is not theoretically clear why the method of the present invention exhibits such excellent effects in preventing gelation during the production of oligo(meth)acrylates, it is difficult to explain why the method of the present invention exhibits such excellent effects in preventing gelation during the production of oligo(meth)acrylates. The effect of preventing gelation is surprising when compared with the case where the compound (D) is not present or when a compound having a chelate-forming ability other than the compound (D) is present. EXAMPLES Hereinafter, the present invention will be explained in more detail with reference to Examples and Comparative Examples, but it goes without saying that the present invention is not limited to these Examples. In the examples, "parts" represent "parts by weight" unless otherwise specified, and the numbers in parentheses after "parts" represent molar ratios. Example 1 Total condenser, thermometer, gas introduction pipe,
860 parts (1) of methacrylic acid and maleic anhydride were placed in 10 reactors made of stainless steel (SUS 304) equipped with a heating device, a cooling device, a stirring device and a raw material inlet.
1,960 parts (2) of phthalic anhydride, 1,480 parts (1) of phthalic anhydride, 0.72 parts of hydroquinone, 22 parts of triethylamine, and 0.7 parts of ethylenediaminetetraacetic acid were added, and the temperature was raised to 100°C while introducing air. Next, the inside of the reaction system is 100
After introducing 2900 parts (5) of propylene oxide over 5 hours while maintaining the temperature at ~115°C, the reaction was continued for an additional 4 hours to obtain oligomethacrylate with an acid value of 8. The viscosity of the resin liquid obtained by mixing 70 parts of oligomethacrylate and 30 parts of styrene at 25°C is
It was 3.7 poise. Comparative Example 1 When an attempt was made to produce oligomethacrylate in the same manner as in Example 1 except that ethylenediaminetetraacetic acid was not used, the viscosity of the reaction system began to increase approximately 30 minutes after the end of the introduction of propylene oxide. After about 70 minutes, stirring became difficult, so the reaction was stopped. Example 2 In Example 1, ethylenediaminetetraacetic acid was not added to the reaction system from the start of the reaction, but instead, it was added to the reaction system 15 minutes after the end of propylene oxide introduction, but in the same manner as in Example 1. An oligomethacrylate having an acid value of 9 was obtained. The viscosity of the resin liquid obtained by mixing 70 parts of this oligomethacrylate and 30 parts of styrene was 4.0 poise at 25°C. Example 3 In a reactor similar to Example 1, 216 parts of acrylic acid was added.
(1), phthalic anhydride 1776 parts (4), hydroquinone 0.8
After adding 40 parts of triethylamine and 40 parts of triethylamine, the temperature was raised to 100°C while introducing air, and then 870 parts of propylene oxide (5) was introduced over 3 hours. Next, 1176 parts (4) of maleic anhydride, 0.8 parts of ethylenediaminetetraacetic acid and 3300 parts of styrene were added to the reaction system, and then 870 parts (5) of propylene oxide was added to the reaction system.
The acid value was
11. A styrene solution of oligoacrylate with a viscosity of 2.4 poise at 25°C was obtained. Comparative Example 2 In Example 3, an attempt was made to produce oligoacrylate in the same manner as in Example 3 except that ethylenediaminetetraacetic acid was not used, but from the start of the reaction
After 5.5 hours, the viscosity of the reaction system began to increase, and after another 15 minutes, the viscosity reached 20 poise or more, so the reaction was stopped. Example 4 The following experiment was conducted using a four-necked flask similar to that used in Example 1, except that all parts in contact with the liquid were made of glass. 86 parts (1) of methacrylic acid (containing 200 ppm of hydroquinone), 2.0 parts of triethylbenzylammonium chloride, and 0.08 parts of cyclohexanediaminetetraacetic acid, which had been stored in a stainless steel (SUS 304) drum for about 6 months, were added, and air was removed. The temperature was raised to 100°C while the mixture was being introduced, and then 58 parts (1) of propylene oxide was introduced over a period of 2 hours. Next, 222 parts (1.5) of phthalic anhydride was added, and then 44 parts (1) of ethylene oxide were introduced over a period of 2 hours, and the reaction was continued for 2 hours to obtain an oligomethacrylate having an acid value of 53. The viscosity of the resin liquid obtained by mixing 70 parts of oligomethacrylate and 30 parts of styrene is 25°C.
So, it was 1.3 poise. Comparative Example 3 Oligomethacrylate with an acid value of 49 was obtained in the same manner as in Example 4 except that cyclohexanediaminetetraacetic acid was not used, and 70 parts of this oligomethacrylate and 30 parts of styrene were mixed. The resulting resin liquid had a high viscosity of 60 poise at 25°C. Examples 5 to 19 Example 1 except that 0.7 part of ethylenediaminetetraacetic acid was replaced with a compound (D) having various chelate-forming abilities listed in Table 1.
Each oligo(meth)acrylate was produced in the same manner as above. The type and amount of compound (D) having chelate-forming ability, the acid value of each oligo(meth)acrylate obtained, and the resin liquid obtained by mixing 70 parts of each oligo(meth)acrylate and 30 parts of styrene. The respective viscosities are shown in Table 1.
【表】【table】
Claims (1)
水物(B)およびアルキレンオキサイド(C)を、触媒お
よびラジカル重合禁止剤の存在下に70〜150℃の
温度範囲で反応させてオリゴ(メタ)アクリレー
トを製造する方法において、o―ニトロソフエノ
ール類、ニトロソナフトール類、カルボキシピリ
ジン類、8―ヒドロキシキノリン類、カルボキシ
キノリン類、ヒドロキシナフチリジン類、アミノ
酸類、アミノポリカルボン酸類、ポリアミノポリ
カルボン酸類および2,2′―ビピリジンより選ば
れた1種もしくは2種以上のキレート形成能を有
する化合物(D)を反応系内に共存させることを特徴
とするオリゴ(メタ)アクリレートの製造方法。 2 キレート形成能を有する化合物(D)を、(メ
タ)アクリル酸(A)、多塩基カルボン酸無水物(B)お
よびアルキレンオキサイド(C)の合計量を100重量
部として、0.0001重量部以上の比率の量で用いる
特許請求の範囲第1項記載のオリゴ(メタ)アク
リレートの製造方法。[Claims] 1. (Meth)acrylic acid (A), polybasic carboxylic anhydride (B) and alkylene oxide (C) in the presence of a catalyst and a radical polymerization inhibitor at a temperature range of 70 to 150°C. o-nitrosophenols, nitrosonaphthols, carboxypyridines, 8-hydroxyquinolines, carboxyquinolines, hydroxynaphthyridines, amino acids, aminopolycarboxylic acids, , polyaminopolycarboxylic acids, and 2,2′-bipyridine, and one or more compounds having chelate-forming ability (D) are allowed to coexist in the reaction system. Production method. 2 The compound (D) having chelate-forming ability is added in an amount of 0.0001 parts by weight or more based on the total amount of (meth)acrylic acid (A), polybasic carboxylic acid anhydride (B) and alkylene oxide (C) being 100 parts by weight. A method for producing oligo(meth)acrylates according to claim 1, wherein the oligo(meth)acrylates are used in proportionate amounts.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55135176A JPS5759834A (en) | 1980-09-30 | 1980-09-30 | Preparation of novel oligo(meth)acrylate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55135176A JPS5759834A (en) | 1980-09-30 | 1980-09-30 | Preparation of novel oligo(meth)acrylate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5759834A JPS5759834A (en) | 1982-04-10 |
| JPS629579B2 true JPS629579B2 (en) | 1987-02-28 |
Family
ID=15145604
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP55135176A Granted JPS5759834A (en) | 1980-09-30 | 1980-09-30 | Preparation of novel oligo(meth)acrylate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5759834A (en) |
-
1980
- 1980-09-30 JP JP55135176A patent/JPS5759834A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5759834A (en) | 1982-04-10 |
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