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JPS6311940B2 - - Google Patents
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JPS6311940B2 - - Google Patents

Info

Publication number
JPS6311940B2
JPS6311940B2 JP55078961A JP7896180A JPS6311940B2 JP S6311940 B2 JPS6311940 B2 JP S6311940B2 JP 55078961 A JP55078961 A JP 55078961A JP 7896180 A JP7896180 A JP 7896180A JP S6311940 B2 JPS6311940 B2 JP S6311940B2
Authority
JP
Japan
Prior art keywords
cover
container
photoreceptor
substrate
drum base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55078961A
Other languages
Japanese (ja)
Other versions
JPS577280A (en
Inventor
Masatoshi Saito
Masao Yoshikawa
Tsutomu Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP7896180A priority Critical patent/JPS577280A/en
Publication of JPS577280A publication Critical patent/JPS577280A/en
Publication of JPS6311940B2 publication Critical patent/JPS6311940B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16Coating processes; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Coating Apparatus (AREA)

Description

【発明の詳細な説明】 電子写真複写機の感光体は、感光体用基体の周
面に感光性材料を塗布して製作するが、この塗布
方法には種々の方法がある。基体を塗布液中に浸
漬するのもそのうちの一つであるが、本発明は、
この浸漬塗布を行なうための装置に関するもので
ある。
DETAILED DESCRIPTION OF THE INVENTION A photoreceptor for an electrophotographic copying machine is manufactured by coating a photosensitive material on the circumferential surface of a photoreceptor substrate, and there are various methods for this application. One of these methods is to immerse the substrate in a coating solution, but the present invention
The present invention relates to an apparatus for performing this dip coating.

前記浸漬塗布は、感光体用基体をその軸線を鉛
直にして塗布液中に浸漬した後、これを引上げて
乾燥させるものであるが、この乾燥に際し、外気
に触れる表面が先に乾燥固化して皮膜状になり、
内部が後から固化する。この表面のみの固化の状
態においても、内部の未乾燥の塗布液が感光体用
基体の表面に沿つて流下する結果、完成品の表面
性が非常に悪くなる欠点がある。この欠点は速乾
性の溶媒を用いるほど著しい。また、吸湿性又は
蒸発速度が速いものや、蒸発潜熱が大きいものを
用いた場合、直接塗布部が乾燥過程で外気に触れ
ると、外気の湿気のためブラツシングが起きる欠
点がある。
In the dip coating method, the photoreceptor substrate is immersed in a coating solution with its axis vertical, and then pulled up and dried. During this drying, the surface exposed to the outside air dries and solidifies first. It becomes a film,
The inside will solidify later. Even in this state where only the surface is solidified, the internal undried coating liquid flows down along the surface of the photoreceptor substrate, resulting in a disadvantage that the surface quality of the finished product becomes extremely poor. This drawback becomes more pronounced as a faster drying solvent is used. Furthermore, when using a material that has high hygroscopicity or a high evaporation rate, or a material that has a large latent heat of vaporization, there is a drawback that brushing may occur due to the humidity of the outside air if the coated area is directly exposed to the outside air during the drying process.

本発明は、前記欠点の解消を目的とするもので
あつて、乾燥に際しカバーを用いて該カバー内に
溶媒蒸気圧を持たせ、もつて、乾燥速度を遅らせ
ると共に、外気からの吸湿を阻止することを特徴
とするものである。
The present invention aims to eliminate the above-mentioned drawbacks, and uses a cover during drying to maintain solvent vapor pressure within the cover, thereby slowing down the drying speed and preventing moisture absorption from the outside air. It is characterized by this.

次に本発明を図示の実施例によつて説明する。
1a,1bは支柱であつて、台座2上の底基板3
に鉛直になるよう植設されており、その上端には
上基板4が固定してある。底基板3と上基板4と
にそれぞれ取付けた軸受5a,5b,6a,6b
によつて、送りねじ7a,7bが互に平行になる
よう、かつ、鉛直に支持されている。送りねじ7
a,7bの下端にはホイール8a,8bが固定さ
れ、それらと図示しない駆動ホイールとの間にチ
エン9が掛けてある。両送りねじ7a,7bにそ
れぞれ螺合するねじ孔10a,10bを備えた昇
降台11が、それらの螺合により支持されてお
り、両送りねじ7a,7bを回転させることによ
り、水平状態を保ちつつ昇降する。昇降台11上
には円筒形の容器12が取付けてある。容器12
はその上縁付近の外側面にオーバーフロー液溜1
3を備えている。
Next, the present invention will be explained with reference to illustrated embodiments.
1a and 1b are support columns, and the bottom substrate 3 on the pedestal 2
The upper substrate 4 is fixed to the upper end thereof. Bearings 5a, 5b, 6a, 6b attached to the bottom board 3 and the top board 4, respectively
The feed screws 7a and 7b are supported vertically and parallel to each other. Feed screw 7
Wheels 8a and 8b are fixed to the lower ends of wheels a and 7b, and a chain 9 is hung between them and a drive wheel (not shown). A lifting platform 11 equipped with screw holes 10a and 10b that are screwed into both feed screws 7a and 7b, respectively, is supported by the screw holes 10a and 10b, and is maintained in a horizontal state by rotating both feed screws 7a and 7b. Go up and down. A cylindrical container 12 is mounted on the lifting platform 11. container 12
has an overflow reservoir 1 on the outer surface near its upper edge.
It has 3.

上基板4には円筒状カバー14が固定してあ
る。円筒状カバー14は第3図に示すように、縦
割りになつており、蝶番によつて矢印Aで示すよ
うに開閉できる。また、透明板で覆われた観察窓
23を備えており、開閉可能な多数の孔16を備
えている。カバー14は容器12と同心に配置さ
れ、かつ、その内径は容器12のオーバーフロー
液溜13の外径よりわずかに大きいので、両者は
嵌合可能である。
A cylindrical cover 14 is fixed to the upper substrate 4. The cylindrical cover 14 is vertically divided as shown in FIG. 3, and can be opened and closed using a hinge as shown by arrow A. It also includes an observation window 23 covered with a transparent plate, and a large number of holes 16 that can be opened and closed. Since the cover 14 is arranged concentrically with the container 12 and its inner diameter is slightly larger than the outer diameter of the overflow reservoir 13 of the container 12, the two can be fitted together.

浸漬塗布を受ける感光体用ドラム基体15は中
空体であるが、その両端を蓋16,17で閉塞す
る。すなわち、下端を閉塞する蓋17の中心に支
持軸18の下端を螺着し、支持軸18を感光体用
ドラム基体15の中を通した上で、上方に突出さ
せ、さらに蓋16の中心に設けた孔に支持軸18
を貫通させた状態で、蓋16を感光体用ドラム基
体15の上端面に被せ、次いで蓋16の上にスペ
ーサ19を載置する。そして、支持軸18の上端
を、上基板4に固定せる支持板20を貫通して上
方に突出させる。この突出部にナツト21を螺合
し、それを締付けることにより、感光体用ドラム
基体15を上基板4に垂下げ状態で固定する。以
上の取付作業は、カバー14を第3図に示すよう
に開いた状態にし、かつ、昇降台11を第1図に
示すように降下させることにより、カバー14及
び容器12に妨げられることなく行なえる。
The photoreceptor drum base 15 to be subjected to dip coating is a hollow body, but both ends thereof are closed with lids 16 and 17. That is, the lower end of the support shaft 18 is screwed into the center of the lid 17 that closes the lower end, the support shaft 18 is passed through the photoreceptor drum base 15, and then projected upward, and then the support shaft 18 is screwed into the center of the lid 16. Insert the support shaft 18 into the provided hole.
The lid 16 is placed over the upper end surface of the photoreceptor drum base 15 with the spacer 16 being penetrated, and then the spacer 19 is placed on the lid 16. Then, the upper end of the support shaft 18 penetrates the support plate 20 fixed to the upper substrate 4 and projects upward. By screwing a nut 21 into this protrusion and tightening it, the photosensitive drum base 15 is fixed to the upper substrate 4 in a hanging state. The above installation work can be performed without being obstructed by the cover 14 and container 12 by opening the cover 14 as shown in FIG. 3 and lowering the lifting platform 11 as shown in FIG. Ru.

なお、乾燥のための加熱を感光体用ドラム基体
15の内部から行なう場合には、前記取付作業の
際に感光体用ドラム基体15内にヒーターをセツ
トする。
In addition, when heating for drying is performed from inside the photoreceptor drum base 15, a heater is set inside the photoreceptor drum base 15 during the above-mentioned mounting operation.

塗布液22を第1図に示すように容器12内の
所定の液面位置まで注入した後、チエン9を駆動
すると、送りねじ7a,7bが回転して昇降台1
1を上昇させる。その結果容器12が上昇する。
感光体用ドラム基体15は容器12と同心上に垂
下げられており、容器12の内径は感光体用ドラ
ム基体15の外径よりやや大きい程度にしてある
ので、容器12は感光体用ドラム基体15に妨げ
られることなく、かつ、カバー14にも妨げられ
ることなく、それらの間を上昇し、第2図に示す
上昇限度位置に達し、そこで停止する。感光体用
ドラム基体15は蓋16,17によつて、その内
部に塗布液22が浸入しないようになつているた
め、容器12内の塗布液22は感光体用ドラム基
体15に押し退けられて、その液面が上昇しつい
には容器12の上縁から、わずかにオーバーフロ
ーして、オーバーフロー液溜13に流入する。感
光体用ドラム基体15はこれにより完全に塗布液
22内に浸漬される。
After injecting the coating liquid 22 to a predetermined level in the container 12 as shown in FIG.
Increase 1. As a result, the container 12 rises.
The photoreceptor drum base 15 is suspended concentrically with the container 12, and the inner diameter of the container 12 is slightly larger than the outer diameter of the photoreceptor drum base 15. 15 and the cover 14, it rises between them, reaches the upper limit position shown in FIG. 2, and stops there. Since the coating liquid 22 is prevented from entering the inside of the photoconductor drum base 15 by the lids 16 and 17, the coating liquid 22 in the container 12 is pushed away by the photoconductor drum base 15. As the liquid level rises, the liquid finally slightly overflows from the upper edge of the container 12 and flows into the overflow reservoir 13. The photoreceptor drum base 15 is thereby completely immersed in the coating liquid 22.

次に、チエン9を逆向きに駆動して送りねじ7
a,7bを前記と逆の方向に回転させると、昇降
台11が降下し容器12も降下する。その結果、
浸漬塗布の済んだ感光体用ドラム基体15が容器
12から引き出された状態になり、その状態で乾
燥が開始される。
Next, drive the chain 9 in the opposite direction to
When a and 7b are rotated in the opposite direction, the lifting platform 11 is lowered and the container 12 is also lowered. the result,
The photoreceptor drum base 15 that has been dip-coated is pulled out from the container 12, and drying is started in this state.

この乾燥工程は感光体用ドラム基体15の周囲
をカバー14が包んだ状態で行なわれる。カバー
14は孔16を閉鎖することにより、感光体用ド
ラム基体15の周面を外気から遮蔽することがで
きる。その結果、塗布液22から蒸発した溶媒は
カバー14内に充満し、その蒸気圧が高まるので
塗布液22の乾燥は徐々に行なわれる。また、外
気からの湿気が浸入することもない。乾燥の進行
状態は窓23から観察することができ、孔16の
開口度を調節することにより、乾燥速度を調節す
ることができる。
This drying process is performed with the cover 14 surrounding the photoreceptor drum base 15. By closing the hole 16, the cover 14 can shield the peripheral surface of the photoreceptor drum base 15 from the outside air. As a result, the solvent evaporated from the coating liquid 22 fills the cover 14, and its vapor pressure increases, so that the coating liquid 22 is gradually dried. Also, moisture from the outside air will not enter. The progress of drying can be observed through the window 23, and the drying speed can be adjusted by adjusting the opening degree of the holes 16.

本発明は以上のように、塗布液を満たした容器
と、感光体用基体とを相対的に移動させて、該基
体を塗布液に浸漬する装置において、塗布液から
引上げられた後の感光体用基体の周囲に、縦割り
で開閉可能なカバーを設けているので、乾燥工程
が外気から遮蔽された雰囲気内で行なわれ、外気
の湿気を遮断できると共に、溶媒の蒸気圧が高い
状態で乾燥が行なわれるため、乾燥速度を低下さ
せることができる。その結果、ブラツシングが減
少し、製品の表面性が向上し、又感光体の脱着が
カバーに妨げられることなく行うことができるも
のである。
As described above, the present invention provides an apparatus for relatively moving a container filled with a coating solution and a photoconductor substrate to immerse the substrate in the coating solution. A cover that can be opened and closed vertically is installed around the substrate, so the drying process is carried out in an atmosphere shielded from the outside air, which blocks moisture from the outside air and allows drying in a state where the vapor pressure of the solvent is high. is carried out, the drying rate can be reduced. As a result, brushing is reduced, the surface quality of the product is improved, and the photoreceptor can be attached and detached without being hindered by the cover.

【図面の簡単な説明】[Brief explanation of the drawing]

図は本発明の実施例を示すものであつて、第1
図は乾燥工程における正面図、第2図は浸漬工程
における正面図、第3図はカバーの斜視図であ
る。 7a,7b……送りねじ、12……容器、14
……カバー、15……感光体用ドラム基体、22
……塗布液。
The figure shows an embodiment of the present invention.
The figure is a front view in the drying process, FIG. 2 is a front view in the dipping process, and FIG. 3 is a perspective view of the cover. 7a, 7b...Feed screw, 12...Container, 14
...Cover, 15...Drum base for photoreceptor, 22
...Coating liquid.

Claims (1)

【特許請求の範囲】[Claims] 1 塗布液を満たした容器と、感光体用基体とを
相対的に移動させて、該基体を塗布液に浸漬する
装置において、塗布液から引上げられた後の感光
体用基体の周囲に、縦割りで開閉可能なカバーを
設けたことを特徴とする感光体の浸漬塗布装置。
1. In an apparatus that relatively moves a container filled with a coating liquid and a photoreceptor substrate to immerse the substrate in the coating liquid, a vertical column is placed around the photoreceptor substrate after it has been lifted from the coating liquid. A dip coating device for a photoreceptor, characterized by having a cover that can be opened and closed by splitting.
JP7896180A 1980-06-13 1980-06-13 Dip-coater Granted JPS577280A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7896180A JPS577280A (en) 1980-06-13 1980-06-13 Dip-coater

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7896180A JPS577280A (en) 1980-06-13 1980-06-13 Dip-coater

Publications (2)

Publication Number Publication Date
JPS577280A JPS577280A (en) 1982-01-14
JPS6311940B2 true JPS6311940B2 (en) 1988-03-16

Family

ID=13676481

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7896180A Granted JPS577280A (en) 1980-06-13 1980-06-13 Dip-coater

Country Status (1)

Country Link
JP (1) JPS577280A (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5942060A (en) * 1982-09-02 1984-03-08 Canon Inc Method and device for producing coated film
DE69124544T2 (en) * 1990-05-22 1997-09-11 Agfa Gevaert Nv Dip coating machine
JP2003257094A (en) 2002-02-28 2003-09-12 Fuji Photo Film Co Ltd Method for manufacturing optical information recording medium
CN102228879B (en) * 2009-10-21 2013-07-03 鸿富锦精密工业(深圳)有限公司 Immersion plating equipment

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5837864A (en) * 1981-08-31 1983-03-05 Matsushita Electric Ind Co Ltd Reel stand drive control device for magnetic recording and reproducing equipment

Also Published As

Publication number Publication date
JPS577280A (en) 1982-01-14

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