JPS6313334B2 - - Google Patents
Info
- Publication number
- JPS6313334B2 JPS6313334B2 JP57226154A JP22615482A JPS6313334B2 JP S6313334 B2 JPS6313334 B2 JP S6313334B2 JP 57226154 A JP57226154 A JP 57226154A JP 22615482 A JP22615482 A JP 22615482A JP S6313334 B2 JPS6313334 B2 JP S6313334B2
- Authority
- JP
- Japan
- Prior art keywords
- furnace
- jig
- lid
- heat treatment
- operating rod
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0431—Apparatus for thermal treatment
- H10P72/0436—Apparatus for thermal treatment mainly by radiation
Description
【発明の詳細な説明】
本発明は半導体基板等に不純物拡散、気相化学
成長、熱酸化等の処理を行う熱処理炉において用
いられる治具操作部に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a jig operation unit used in a heat treatment furnace that performs processes such as impurity diffusion, vapor phase chemical growth, and thermal oxidation on semiconductor substrates and the like.
IC(集積回路装置)、トランジスタなどの半導
体装置を製造するのに使用する拡散炉等の熱処理
炉は横長石英管からなる処理炉内部に処理すべき
半導体ウエハ(基板)を保持する処理治具を有
し、炉の一端開口部にはこれを閉塞するための蓋
部(キヤツプ)を有する構造のものが広く採用さ
れた。 Heat treatment furnaces such as diffusion furnaces used to manufacture semiconductor devices such as ICs (integrated circuit devices) and transistors have processing jigs that hold semiconductor wafers (substrates) to be processed inside the processing furnace made of oblong quartz tubes. Furnaces with a cap for closing the opening at one end of the furnace were widely adopted.
そして、拡散等の熱処理時の半導体ウエハの炉
内部への挿入及び引き出しは、その一端にある蓋
部を取り外した状態で、治具操作棒を外部から炉
内に挿入し半導体ウエハを支持する処理治具の出
し入れにより行つている。 During heat treatment such as diffusion, semiconductor wafers are inserted into and pulled out of the furnace by removing the lid at one end and inserting a jig operating rod into the furnace from the outside to support the semiconductor wafer. This is done by taking the jig in and out.
また、熱処理時の処理温度測定も蓋部(キヤツ
プ)を取り外し熱電対を炉内に挿入することによ
り行われる。 Furthermore, the treatment temperature during heat treatment is also measured by removing the cap and inserting a thermocouple into the furnace.
このように、上記熱処理炉は前記作業の必要の
あるたび毎に蓋を取り外さなければならず、半導
体ウエハの挿入及び引き出し、処理温度測定など
の炉内部操作が極めて複雑であつた。 As described above, the lid of the heat treatment furnace must be removed every time the above-mentioned work is required, and operations inside the furnace such as inserting and withdrawing semiconductor wafers and measuring the processing temperature are extremely complicated.
また、熱処理中は炉内の内部が1000℃以上の高
温になることもあり、その一端にある蓋部も約60
℃に加熱され、半導体ウエハの出し入れ、処理温
度の測定などの操作は蓋部を取り外して行われる
ことから、かなり危険を伴うものであつた。 Also, during heat treatment, the inside of the furnace can reach temperatures of over 1,000℃, and the lid at one end of the furnace can reach temperatures of approximately 60℃.
℃, and operations such as loading and unloading semiconductor wafers and measuring processing temperatures were performed with the lid removed, which was quite dangerous.
さらに、上記蓋部は一般に透明な石英材が使用
されるため、炉内部の熱が輻射の作用で透明石英
蓋部を通過し炉外部へ放射されるので、熱損失も
大きいという欠点があつた。 Furthermore, since the lid is generally made of transparent quartz, the heat inside the furnace passes through the transparent quartz lid and is radiated to the outside of the furnace due to radiation, resulting in a large heat loss. .
本発明は上記欠点を解消するためになされたも
のであり、その目的は熱処理炉への半導体ウエハ
等の処理物の挿入及び引き出し、炉内部の温度測
定などの炉内部の操作を簡単にすること、他の目
的は熱処理操作の危険性を少くすること及び炉の
熱損失を少くすること、適切な処理条件のもとで
熱処理が行えるようにすること等にある。 The present invention has been made to solve the above-mentioned drawbacks, and its purpose is to simplify operations inside the furnace, such as inserting and withdrawing objects to be processed such as semiconductor wafers into and out of the heat treatment furnace, and measuring the temperature inside the furnace. Other purposes include reducing the risks of heat treatment operations, reducing furnace heat loss, and enabling heat treatment to be performed under appropriate treatment conditions.
以下本発明の一実施例を図面を参照しながら具
体的に説明する。 An embodiment of the present invention will be specifically described below with reference to the drawings.
実施例
第1図は本発明の一実施例に従つた治具操作部
を適用した熱処理炉を示すものである。同図にお
いて、1は炉本体で横長の石英管から構成され
る。2は炉本体1の一端開口部に設けられた開口
部を閉塞するための蓋部(キヤツプ)での石英の
中空管体3と、その内部に充填された石英ウール
又はアルミナウール、SiC,Si等からなる断熱材
4とから構成される。5は炉内に載置する処理治
具6の出し入れ操作を行う治具操部となる治具操
作棒、7は炉内の温度を測定する熱電対である。
治具操作棒5はSiC又はSiO2を材料として形成し
た主軸8とこれを支持する足部9と処理治具6に
引き掛けるL字形(又はF字鍵形でもよい)の掛
具10とから構成されている。熱電対7は白金線
又はアルメルクロメルからなり、その導線11は
蓋内部を通つて外部に導かれている。なお、アル
メルクロメルからなる熱電対は比較的低い熱処理
の場合に用いる。Embodiment FIG. 1 shows a heat treatment furnace to which a jig operating section according to an embodiment of the present invention is applied. In the figure, reference numeral 1 denotes the furnace body, which is composed of a horizontally long quartz tube. 2 is a quartz hollow tube body 3 with a cap for closing an opening provided at one end of the furnace body 1, and quartz wool or alumina wool, SiC, It is composed of a heat insulating material 4 made of Si or the like. Reference numeral 5 designates a jig operating rod serving as a jig operating section for inserting and removing the processing jig 6 placed in the furnace, and 7 a thermocouple for measuring the temperature inside the furnace.
The jig operating rod 5 includes a main shaft 8 made of SiC or SiO 2 , a foot portion 9 that supports this, and an L-shaped (or F-shaped key-shaped) hook 10 that is hooked onto the processing jig 6. It is configured. The thermocouple 7 is made of platinum wire or alumel chromel, and its conducting wire 11 is led outside through the inside of the lid. Note that a thermocouple made of alumelchromel is used in the case of relatively low heat treatment.
上記蓋部(キヤツプ)2の外側にはその取り外
しを容易にするための把手12が取付けられると
ともに中空管体蓋部内部の気圧を低下させるため
の圧力ぬき管13が取付けられている。蓋部2の
内側には処理治具6の出し入れ操作を行う治具操
作部となる治具操作棒5及び温度を測定する熱電
対7が取付けられている。すなわち、把手8と圧
力ぬき管9を有する蓋部2に治具操作棒5及び熱
電対7が取付けられ、蓋部2と治具操作棒5と熱
電対7とからなる三者が一体になつている。した
がつて、蓋部2を炉の一端から取り外すことによ
つて同時に治具操作棒5及び熱電対7を炉内部か
ら引き出せ、一方蓋部2を炉の一端開口部に取り
付けることによつて同時に治具操作棒5及び熱電
対7を炉内部に挿入できるようになつている。 A handle 12 is attached to the outside of the cap 2 to facilitate its removal, and a pressure release tube 13 is attached to reduce the air pressure inside the cap. A jig operating rod 5 serving as a jig operating section for inserting and removing the processing jig 6 and a thermocouple 7 for measuring temperature are attached to the inside of the lid portion 2. That is, the jig operating rod 5 and the thermocouple 7 are attached to the lid part 2 having the handle 8 and the pressure relief tube 9, and the three parts consisting of the lid part 2, the jig operating rod 5, and the thermocouple 7 are integrated. ing. Therefore, by removing the lid part 2 from one end of the furnace, the jig operating rod 5 and the thermocouple 7 can be pulled out from inside the furnace at the same time, and by attaching the lid part 2 to the opening at one end of the furnace, the jig operating rod 5 and the thermocouple 7 can be pulled out at the same time. A jig operating rod 5 and a thermocouple 7 can be inserted into the furnace.
拡散等の熱処理時においては、多数の半導体ウ
エハ14を処理治具6に支持させた状態で、蓋部
2と一体になつている治具操作棒5により半導体
ウエハ14を支持した処理治具6を炉内部に挿入
する。この治具操作棒5が炉の奥に挿入されたと
き、処理治具6は炉内の所定位置に達し、同時に
蓋部2により炉の一端開口部が閉塞される。なお
蓋部2には一体となつている熱電対7が取付けら
れているので、炉閉鎖と同時に炉内部に熱電対7
が設置される。そして、炉外部に設けた加熱コイ
ル(図示せず)により炉内の処理温度を300℃〜
1200℃にして拡散等の熱処理が行われる。このと
き、処理温度を炉内部に設置した熱電対7により
外部から随時測定し適切な処理条件のもとで拡散
等の熱処理を行う。 During heat treatment such as diffusion, a large number of semiconductor wafers 14 are supported by the processing jig 6, and the processing jig 6 supports the semiconductor wafers 14 by the jig operating rod 5, which is integrated with the lid part 2. Insert into the furnace. When the jig operating rod 5 is inserted deep into the furnace, the processing jig 6 reaches a predetermined position within the furnace, and at the same time, one end opening of the furnace is closed by the lid 2. Since the thermocouple 7 is integrally attached to the lid part 2, the thermocouple 7 is installed inside the furnace at the same time as the furnace is shut down.
will be installed. Then, the processing temperature inside the furnace is adjusted to 300°C or more using a heating coil (not shown) installed outside the furnace.
Heat treatment such as diffusion is performed at 1200°C. At this time, the processing temperature is measured from the outside using a thermocouple 7 installed inside the furnace, and heat processing such as diffusion is performed under appropriate processing conditions.
上記熱処理において、半導体ウエハ14の炉内
部への挿入及び引き出しは炉を加熱した状態で行
われるので、炉の一端開口部に蓋部2を取付けた
ときに、中空管体蓋部2の内部の空気が熱膨張し
約5Kgの圧力が加わるが、圧力空気は蓋部2に設
けられた圧力ぬき管13を通つて大気に貫けるよ
うになつているから、熱膨張による危険を防止す
ることができる。 In the above heat treatment, the semiconductor wafer 14 is inserted into and pulled out of the furnace while the furnace is heated. The air expands thermally and a pressure of approximately 5 kg is applied to it, but since the pressurized air can pass through the pressure release pipe 13 provided in the lid 2 to the atmosphere, dangers due to thermal expansion can be prevented. can.
このような構造の熱処理炉であれば、炉の一端
開口部に蓋部2を取付けることによつて蓋部2と
一体になつている治具操作棒8及び熱電対7も同
時に炉内部へ挿入され、蓋部2の取付け、処理治
具6の炉内部への挿入及び処理温度測定が一回の
操作で同時に行うことができ、一方炉の一端から
蓋部2を取り外せば、同時に処理治具6の引き出
し及び熱電対7の引き出しができ、熱処理操作が
簡単になる。 In a heat treatment furnace with such a structure, by attaching the lid 2 to the opening at one end of the furnace, the jig operating rod 8 and thermocouple 7, which are integrated with the lid 2, can be inserted into the furnace at the same time. The installation of the lid 2, the insertion of the processing jig 6 into the furnace, and the measurement of the processing temperature can be performed simultaneously in one operation.On the other hand, if the lid 2 is removed from one end of the furnace, the processing jig 6 can be removed at the same time. 6 and thermocouple 7 can be drawn out, making heat treatment operations easier.
実施例
第2図は本発明の他の実施例に従つた治具操作
部を示し、治具操作部となる治具操作棒内部に熱
電対が内在するようにして、蓋部と治具操作棒と
熱電対と一体になつたものを示すものである。Embodiment FIG. 2 shows a jig operating section according to another embodiment of the present invention, in which a thermocouple is housed inside the jig operating rod which becomes the jig operating section, and the lid section and the jig operating section are connected to each other. This shows an integrated rod and thermocouple.
5は処理治具6の出し入れ操作を行うSiC又は
SiO2からなる治具操作棒で、この棒内部に炉内
の温度を測定する熱電対7が内蔵されている。 5 is a SiC or
This jig operating rod is made of SiO 2 and has a built-in thermocouple 7 that measures the temperature inside the furnace.
この場合、治具操作棒5は内在する熱電対7に
より機械的に補強されるので、熱による治具操作
棒8の変形が避けられる。 In this case, since the jig operating rod 5 is mechanically reinforced by the thermocouple 7 contained therein, deformation of the jig operating rod 8 due to heat can be avoided.
また、この実施例においては、治具操作棒5は
その先端L字形の掛具10がその軸に対してあら
ゆる角度に曲げることのできるユニバーサルジヨ
イント構造を有しており、処理治具6の出し入れ
操作を行うとき、炉の内壁が多少変形していても
それにL字形の掛具10が追従できるようになつ
ている。したがつて、処理治具6がL字形の掛具
10からはずれることがない。 In addition, in this embodiment, the jig operating rod 5 has a universal joint structure in which the L-shaped hanger 10 at its tip can be bent at any angle with respect to its axis. When loading and unloading operations are performed, even if the inner wall of the furnace is slightly deformed, the L-shaped hanger 10 can follow the deformation. Therefore, the processing jig 6 will not come off the L-shaped hanging fixture 10.
実施例
第3図及び第4図は本発明のさらに他の実施例
に従つた治具操作部を示し、炉の一端開口部を閉
塞する蓋部と治具操作部となる治具操作棒とが一
体になつたものを示すものである。Embodiment FIGS. 3 and 4 show a jig operation section according to still another embodiment of the present invention, which includes a lid section that closes an opening at one end of the furnace, a jig operation rod that becomes a jig operation section, and a jig operation rod that serves as a jig operation section. It shows that the two have become one.
治具操作棒5は炉の一端開口部を閉塞する蓋部
2に取付けられ、治具操作棒5と蓋部2とが一体
になつている。 The jig operating rod 5 is attached to a lid 2 that closes one end opening of the furnace, and the jig operating rod 5 and the lid 2 are integrated.
蓋部2と一体になつている治具操作棒5は蓋部
近傍においてユニバーサルジヨイント構造を有し
その先端にF字鍵形の掛具10が取付けられ、こ
の治具操作棒5は案内支持部15に支持されその
先端F字鍵形の掛具10が大きくこま運動できる
ようになつている。 A jig operating rod 5 integrated with the lid 2 has a universal joint structure near the lid, and an F-key shaped hook 10 is attached to the tip thereof, and this jig operating rod 5 is used as a guide support. The hook 10, which is supported by the section 15 and has an F-key shape at its tip, can move in large increments.
この場合、炉内壁下面が凹凸していても、治具
操作棒5の先端が大きくこま運動をするから、処
理治具6がF字鍵形の掛具10からはずれること
はなく、また、治具操作棒5と蓋部2とが一体に
なつていることから、処理治具6の出し入れ操作
と炉の開閉操作を同時に行うことができ、処理治
具6の出し入れ操作が極めて簡単になる。 In this case, even if the lower surface of the furnace inner wall is uneven, the tip of the jig operating rod 5 makes a large top-to-bottom movement, so the processing jig 6 will not come off the F-key shaped hanger 10, and the jig will not come off. Since the tool operating rod 5 and the lid part 2 are integrated, the processing jig 6 can be put in and taken out and the furnace can be opened and closed at the same time, making it extremely easy to put in and take out the processing jig 6.
なお、第3図はユニバーサルジヨイント構造の
治具操作棒5の下側にこれを補助的に支持する足
部9が設けられるものを示し、第4図は治具操作
棒5が蓋部2に直接ユニバーサルジヨイント構造
で取付けられているものを示している。 Note that FIG. 3 shows a device in which a foot portion 9 is provided on the lower side of the jig operating rod 5 with a universal joint structure to support it auxiliarily, and FIG. 4 shows that the jig operating rod 5 is attached to the lid portion 2 The figure shows the one that is attached directly to the universal joint structure.
本発明は上記実施例に限定されるものでなく、
その構造は必要に応じて変えられるものであり、
拡散炉に限らず、気相化学成長炉、熱酸化炉、そ
の他の熱処理炉等広範囲に利用できるものであ
る。 The present invention is not limited to the above embodiments,
Its structure can be changed as needed,
It can be used not only in a diffusion furnace but also in a wide range of other furnaces such as vapor phase chemical growth furnaces, thermal oxidation furnaces, and other heat treatment furnaces.
以上実施例で説明したような本発明によれば、
蓋部と治具操作棒と熱電対、蓋部と熱電対、蓋部
と治具操作棒のように蓋部と他の操作具とが一体
となつていることから、処理治具の出し入れ及び
処理温度測定が蓋部取付操作と同時に行うことが
でき、処理治具の出し入れ操作及び処理温度測定
などの炉内操作を極めて簡単にすることができる
ものである。実施例,,の場合、通常熱電
対は炉内に備えておくことから、処理温度を随時
測定することができ、適切な条件のもとで熱処理
が行えるものである。 According to the present invention as explained in the embodiments above,
Since the lid and other operating tools are integrated, such as the lid, jig operating rod and thermocouple, the lid and thermocouple, and the lid and jig operating rod, it is easy to insert and remove processing jigs. The processing temperature can be measured at the same time as the lid attachment operation, and operations in the furnace such as loading and unloading the processing jig and measuring the processing temperature can be made extremely simple. In the case of the embodiment, a thermocouple is usually provided in the furnace, so that the treatment temperature can be measured at any time, and the heat treatment can be performed under appropriate conditions.
本発明によれば、中空管体蓋部内部には石英ウ
ール、アルミナウール等の断熱材が充填されてい
ることから、炉外部へ熱が伝達されず蓋部開閉の
危険は極めて少なく、また断熱材による副射を遮
断することから、炉の熱損失も極めて少ない。 According to the present invention, since the inside of the lid of the hollow tube body is filled with a heat insulating material such as quartz wool or alumina wool, heat is not transmitted to the outside of the furnace and there is extremely little risk of opening or closing the lid. Heat loss from the furnace is also extremely low because the insulation blocks secondary radiation.
さらに本発明によれば、炉内部操作を炉開閉と
同時に行うことによる蓋開閉回数が減少し、これ
による熱損失も少なくなるなどの種々の顕著な効
果を奏するものである。 Further, according to the present invention, various remarkable effects such as a reduction in the number of times the lid is opened and closed due to the internal operation of the furnace being performed at the same time as opening and closing of the furnace, and a reduction in heat loss due to this, are achieved.
第1図は本発明の一実施例に従つた治具操作部
を用いた熱処理炉の断面図、第2図乃至第4図は
本発明の他の実施例に従つた治具操作部を示す断
面図である。
1……炉本体、2……蓋部、3……中空管体、
4……断熱材、5……治具操作棒、6……処理治
具、7……熱電対、8……主軸、9……足部、1
0……掛具、11……導線、12……把手、13
……圧力ぬき管、14……半導体ウエハ、15…
…案内支持部。
FIG. 1 is a sectional view of a heat treatment furnace using a jig operating section according to one embodiment of the present invention, and FIGS. 2 to 4 show jig operating sections according to other embodiments of the present invention. FIG. 1...Furnace body, 2...Lid, 3...Hollow tube body,
4...Insulating material, 5...Jig operating rod, 6...Processing jig, 7...Thermocouple, 8...Main shaft, 9...Foot part, 1
0... Hang, 11... Conductor, 12... Handle, 13
...Pressure relief tube, 14...Semiconductor wafer, 15...
...Guide support section.
Claims (1)
作部であつて、上記熱処理炉の一端開口部を閉塞
すると共にその内部に断熱材が充填されている蓋
部と上記蓋部から延びる治具操作棒及び熱電対と
を有することを特徴とする熱処理炉用操作部。 2 熱処理炉内に挿入する処理治具を操作する操
作部であつて、上記熱処理炉の一端開口部を閉塞
すると共にその内部に断熱材が充填されている蓋
部と上記蓋部とユニバーサルジヨイントによつて
接続される治具操作棒とを有することを特徴とす
る熱処理炉用操作部。[Scope of Claims] 1. An operation part for operating a processing jig inserted into a heat treatment furnace, which comprises a lid part that closes an opening at one end of the heat treatment furnace and is filled with a heat insulating material; An operating section for a heat treatment furnace, comprising a jig operating rod and a thermocouple extending from a lid section. 2. An operation part for operating a processing jig inserted into a heat treatment furnace, which includes a lid part that closes an opening at one end of the heat treatment furnace and is filled with a heat insulating material, and a universal joint between the lid part and the lid part. An operating section for a heat treatment furnace, characterized in that it has a jig operating rod connected by.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57226154A JPS58130520A (en) | 1982-12-24 | 1982-12-24 | Operating part for heat treating furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57226154A JPS58130520A (en) | 1982-12-24 | 1982-12-24 | Operating part for heat treating furnace |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP155476A Division JPS597913B2 (en) | 1976-01-09 | 1976-01-09 | heat treatment furnace |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58130520A JPS58130520A (en) | 1983-08-04 |
| JPS6313334B2 true JPS6313334B2 (en) | 1988-03-25 |
Family
ID=16840702
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57226154A Granted JPS58130520A (en) | 1982-12-24 | 1982-12-24 | Operating part for heat treating furnace |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58130520A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03222412A (en) * | 1990-01-29 | 1991-10-01 | Fujitsu Ltd | Heat treatment furnace |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3842794A (en) * | 1973-06-29 | 1974-10-22 | Ibm | Apparatus for high temperature semiconductor processing |
-
1982
- 1982-12-24 JP JP57226154A patent/JPS58130520A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58130520A (en) | 1983-08-04 |
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