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JPS6314068B2 - - Google Patents
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JPS6314068B2 - - Google Patents

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Publication number
JPS6314068B2
JPS6314068B2 JP14217381A JP14217381A JPS6314068B2 JP S6314068 B2 JPS6314068 B2 JP S6314068B2 JP 14217381 A JP14217381 A JP 14217381A JP 14217381 A JP14217381 A JP 14217381A JP S6314068 B2 JPS6314068 B2 JP S6314068B2
Authority
JP
Japan
Prior art keywords
electroforming
aluminum
conductive
foil
matrix
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP14217381A
Other languages
Japanese (ja)
Other versions
JPS5845393A (en
Inventor
Sotaro Toki
Fuminobu Noguchi
Toshiro Nagase
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Original Assignee
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd filed Critical Toppan Printing Co Ltd
Priority to JP14217381A priority Critical patent/JPS5845393A/en
Publication of JPS5845393A publication Critical patent/JPS5845393A/en
Publication of JPS6314068B2 publication Critical patent/JPS6314068B2/ja
Granted legal-status Critical Current

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Description

【発明の詳細な説明】 本発明は電鋳箔、特に多孔性を有する箔を製作
する際必要な母型の製造方法に関する。従来、多
孔性の電鋳箔を作る際、母型として様々な方法が
考え出されているが、およそ、次の2点が代表的
なものとされている。図を用いて説明する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing a matrix necessary for producing electroformed foil, particularly porous foil. Conventionally, when producing porous electroformed foil, various methods have been devised as a matrix, but the following two methods are considered to be representative. This will be explained using figures.

第1図は、ステンレス、鉄、銅などの導電性金
属1を所望のパターン2を残しエツチングあるい
は転像方法で凹部3を形成させたものである。凹
部にはエポキシ、ポリエステル等の非導電性の樹
脂を埋め込み、導電性のパターン部2と同一平面
になるよう研磨を施したものである。この母型の
製作は比較的簡便であるが、電鋳は横方向へ広が
り、開口率の大きい厚い電鋳箔は出来ないという
欠点と、エツチング面への樹脂の密着の良いもの
が得られにくく、電鋳の際、液が5の部分に浸透
し、終には樹脂が浮きあがり剥離してしまうとい
う欠点がある。樹脂が剥離するまでの耐用数は十
数回と小さく、比較的安く作製できるこの母型も
結局は、コストアツプとなる。
In FIG. 1, recesses 3 are formed in a conductive metal 1 such as stainless steel, iron, or copper by etching or image transfer, leaving a desired pattern 2. The concave portion is filled with a non-conductive resin such as epoxy or polyester, and polished to be flush with the conductive pattern portion 2. The production of this master mold is relatively simple, but the disadvantage is that electroforming spreads laterally, making it impossible to produce thick electroformed foil with a large aperture ratio, and it is difficult to obtain good adhesion of the resin to the etched surface. During electroforming, the liquid penetrates into the part 5, and the resin eventually lifts up and peels off. The durability of the mold before the resin peels off is only a dozen or so times, and even though this mold can be manufactured relatively cheaply, the cost will increase in the end.

第2図は、第1図の母型を若干改良した方法で
開口率の大きい厚い電鋳箔を得るため、導電パタ
ーンを凹部に設けたものである。この方法はアル
ミニウム基材を用い、エツチング等で凹凸をつ
け、凸部には陽極酸化法でアルミの酸化皮膜を形
成させ、非導電部とし、凹部はアルミ面のままで
導電パターン部としたものである。この母型は前
記のようにパターン形状に巾をもたせる事ができ
るが、耐性的には、第1図の母型と同じく十数回
しかもたないという欠点がある。すなわち、凸
部、凹部とも、アルミ酸化物、アルミニウムが露
出しているため、電鋳液により腐食されてしまう
という問題があつた。
FIG. 2 shows a method in which a conductive pattern is provided in a recessed portion in order to obtain a thick electroformed foil with a large aperture ratio using a method that is slightly improved from the master mold shown in FIG. This method uses an aluminum base material, makes it uneven by etching, etc., forms an aluminum oxide film on the protrusions using an anodizing method, making them non-conductive parts, and leaves the concave parts on the aluminum surface as a conductive pattern part. It is. Although this matrix allows the pattern shape to have a wide width as described above, it has the disadvantage that it can withstand only a dozen or so cycles, similar to the matrix shown in FIG. That is, since the aluminum oxide and aluminum are exposed in both the convex portions and the concave portions, there is a problem that they are corroded by the electroforming solution.

本発明は、こうした状況に鑑み、電鋳耐用回数
の大きい母型を供給する率を目的とし、その母型
の製造方法に関する。本発明の電鋳用母型10
は、第3図に示した様なもので、アルミニウムも
しくはその合金からなる平板あるいは円筒状の基
材11とする。すなわち、この基材11の表面の
陽極酸化した凸部12に樹脂13を形成し、凹部
にアルミ表面に耐食性のある金属14を付着させ
たもので、凹部の導電部に目的の電鋳物質を形成
することができるものである。
In view of these circumstances, the present invention aims at supplying a mother mold with a large number of electroforming lifetimes, and relates to a method for manufacturing such a mother mold. Electroforming master mold 10 of the present invention
The base material 11 shown in FIG. 3 is a flat plate or a cylindrical base material made of aluminum or an alloy thereof. That is, a resin 13 is formed on the anodized convex portions 12 on the surface of this base material 11, and a corrosion-resistant metal 14 is adhered to the aluminum surface in the concave portions, and the desired electroforming material is applied to the conductive portions of the concave portions. It is something that can be formed.

本発明の母型の製造方法について、第4図a〜
dを用いて述べる。基材11であるアルミニウム
あるいはその合金の表面に、ポリビニルアルコー
ルやポリケイ皮酸ビニルなどの感光剤16をコー
テイングし、ネガフイルムを密着させ、高圧水銀
灯、カーボンアーク灯などを用いて、例えば波長
3700Åの光で、1〜5分間焼付け、現像させる。
下地のアルミニウムもしくはその合金が露出した
面を、例えば硫酸浴で、0〜38℃、0.5〜3A/d
m2の条件で陽極酸化し、5〜20μの多孔質の陽極
酸化皮膜12を表面に形成させる(第4図a)。
この状態で次にアニオン系あるいはカチオン系の
電着塗装を行い、陽極酸化膜上にアクリル、アル
キツド、エポキシなどの樹脂13を10〜30μコー
テイングし、130〜170℃、10〜40分くらいの焼付
け条件で硬化させる(第4図b)。次にレジスト
皮膜16を剥離し、露出したアルミニウム面を例
えば硝酸系の酸あるいは5〜20%の苛性ソーダ等
のアルカリで所望の深さになるまでエツチングを
行い、導電部である凹部17を形成させる(第4
図C)。このままでは耐食性がないため、クロム、
ニツケル等の耐食性金属皮膜14を1〜10μ形成
させる事でアルミ面を全部覆つてしまう(第4図
d)。
Regarding the manufacturing method of the mother mold of the present invention, FIG.
This will be explained using d. The surface of aluminum or its alloy, which is the base material 11, is coated with a photosensitizer 16 such as polyvinyl alcohol or polyvinyl cinnamate, and a negative film is adhered to the surface, and a high-pressure mercury lamp, carbon arc lamp, etc.
Bake and develop with 3700 Å light for 1 to 5 minutes.
The surface where the underlying aluminum or its alloy is exposed is heated at 0 to 38°C and 0.5 to 3 A/d, for example in a sulfuric acid bath.
A porous anodic oxide film 12 of 5 to 20 microns is formed on the surface by anodic oxidation under conditions of 5 to 20 microns (FIG. 4a).
In this state, next perform anionic or cationic electrodeposition coating, coat the anodic oxide film with 10 to 30μ of resin 13 such as acrylic, alkyd, or epoxy, and bake at 130 to 170℃ for about 10 to 40 minutes. It is cured under the following conditions (Fig. 4b). Next, the resist film 16 is peeled off, and the exposed aluminum surface is etched with a nitric acid or an alkali such as 5 to 20% caustic soda to a desired depth to form a recess 17 which is a conductive part. (4th
Figure C). Since there is no corrosion resistance as it is, chromium,
By forming a corrosion-resistant metal film 14 such as nickel with a thickness of 1 to 10 μm, the entire aluminum surface is covered (FIG. 4d).

このようにして得られた電鋳用母型を用い電鋳
を行うが、電鋳材料は、銅、ニツケル、鉄、亜鉛
などである。多孔性の電鋳箔は、アルカリ電池に
使用されるバツテリーメツシユ、カラーテレビ用
のシヤドウマスク、フイルター類、その他装飾関
係の用途が望める。本発明の電鋳用母型は凸部に
非導電部、凹部に導電部を有しているため、電鋳
特有の横方向への広がり(サイドスプリージン
グ)が抑えられ、母型どおり(希望どおり)のパ
ターン箔が得られる事となる。したがつて母型の
作り方いかんによつては、開口率の大きい厚い多
孔性電鋳箔を製造する事ができる。また、凸部の
非導電部に陽極酸化膜の多孔質のベースを設けた
事で、その上にくる樹脂の密着性が投描効果によ
り増し、さらに凹部の導電部に耐食性の金属を被
覆した事で、電鋳液による母型の腐食、樹脂の剥
離が大巾に改善され、従来の使用回数が十数回で
あつたのに対し100〜1000回ぐらいの耐久性を有
する事ができるようになつた。
Electroforming is performed using the electroforming master mold thus obtained, and the electroforming material is copper, nickel, iron, zinc, etc. Porous electroformed foil can be used for battery mesh used in alkaline batteries, shadow masks for color televisions, filters, and other decorative applications. The electroforming matrix of the present invention has a non-conductive part in the convex part and a conductive part in the concave part, so it suppresses the lateral spreading (side sprunging) peculiar to electroforming, and it is possible to maintain the shape of the matrix as desired. As a result, a patterned foil with a pattern of Therefore, depending on how the matrix is made, it is possible to produce a thick porous electroformed foil with a large aperture ratio. In addition, by providing a porous base of anodized oxide film on the non-conductive part of the convex part, the adhesion of the resin on it is increased by the projection effect, and the conductive part of the concave part is coated with a corrosion-resistant metal. As a result, corrosion of the matrix caused by the electroforming solution and peeling of the resin have been greatly improved, and it is now possible to have a durability of about 100 to 1000 times, compared to the conventional number of uses of about 10 times. It became.

なお本発明による電鋳用母型の形状は、平板で
も円筒状でも良いのはいうまでもない。
It goes without saying that the shape of the electroforming matrix according to the present invention may be flat or cylindrical.

また、レジスト皮膜を形成させる方法は上記だ
けでなく、シルクスクリーン印刷、オフセツト印
刷などの手法を用いても良い。
Further, the method for forming the resist film is not limited to the above method, and methods such as silk screen printing and offset printing may also be used.

本発明による電鋳用母型は従来法より若干工程
数が多いが耐久性が従来の10〜100倍あるため、
トータルのコストは安くなるというメリツトがあ
る。
Although the electroforming master mold according to the present invention requires slightly more steps than the conventional method, it is 10 to 100 times more durable than the conventional method.
The advantage is that the total cost is lower.

実施例 1 円周1.1m、巾500mmのアルミニウムシリンダー
(材質1100H24)に水溶性感光液(PVA、重クロ
ム酸アンモニウム)をスプレー方式で塗布し60
℃、5分の乾燥を行つた。この後、予め用意した
水玉状(光をとおす部分が円形直径0.1mmピツチ
0.5mm)の模様を有するポジを密着させ高圧水銀
灯にて2mm焼付けた。(波長3700Å)アンモニア
温水にて未露光部を除去し現像を完了させる。
Example 1 An aluminum cylinder (material: 1100H24) with a circumference of 1.1 m and a width of 500 mm was coated with a water-soluble photosensitive liquid (PVA, ammonium dichromate) using a spray method.
Drying was performed at ℃ for 5 minutes. After this, prepare a polka dot shape (the part that passes the light is circular and 0.1 mm in diameter).
A positive with a pattern of 0.5 mm) was placed in close contact with the film and baked for 2 mm using a high-pressure mercury lamp. (Wavelength 3700 Å) Remove the unexposed area with ammonia hot water to complete development.

次に硫酸浴(H2SO4:15wt%、電流密度1A/
dm2、浴温20℃、時間45min)を用いアルミニウ
ム表面に10μの陽極酸化皮膜を形成させた。この
とき、皮膜は1000〜2000Åの大きさの多孔を有す
るAl2O3である。良く水洗した後、電着塗装を施
す。
Next, a sulfuric acid bath (H 2 SO 4 : 15wt%, current density 1A/
dm 2 , bath temperature of 20° C., and time of 45 min), an anodic oxide film of 10 μm was formed on the aluminum surface. At this time, the film is Al 2 O 3 with pores with a size of 1000 to 2000 Å. After washing thoroughly with water, apply electrodeposition coating.

電着塗装は被処理物を陽極にしたアニオン型
で、水溶性アクリルを主体とし、固形分13%、PH
8.8、電圧100Vで6分間行ない、20μの皮膜を多
孔質のAl2O3上へ形成させた。水洗後170℃、30
分の焼付け条件で硬化させた。
Electrodeposition coating is an anion type in which the object to be treated is used as an anode, and is mainly made of water-soluble acrylic, with a solid content of 13% and a pH
8.8, a voltage of 100V was applied for 6 minutes to form a 20μ film on the porous Al 2 O 3 . After washing with water, 170℃, 30
It was cured under baking conditions of 10 minutes.

この後、10%NaOH(60℃)を用いレジスト皮
膜を除去し、さらに10%NaOH(30℃)液を用い
スプレー方式(圧1.5Kg/cm2)でエツチングを行
い、50μの深さの凹部を形成させた。この後直ち
に耐食性金属皮膜を形成させるため前処理を行つ
た。これは、アルミニウムと耐食性金属皮膜の密
着性を向上させる目的で行う処理で、NaOH525
g/Zno298g/、温度25℃、浸漬時間1分
で置換法により亜鉛をアルミ全面に形成させた。
After this, the resist film was removed using 10% NaOH (60°C), and etching was performed using a spray method (pressure 1.5 kg/cm 2 ) using 10% NaOH (30°C) solution to create a recessed area of 50 μm depth. formed. Immediately thereafter, pretreatment was performed to form a corrosion-resistant metal film. This is a process performed to improve the adhesion between aluminum and corrosion-resistant metal coating, and NaOH525
Zinc was formed on the entire surface of the aluminum by the substitution method at a temperature of 25° C. and an immersion time of 1 minute.

さらに、サージエントクロム浴(H2SO4:2.5
g/、CrO3:250g/、30A/dm2)を使用
し、5μの硬質クロムを施し、母型として完了さ
せた。
Furthermore, a sergeant chromium bath (H 2 SO 4 : 2.5
g/, CrO 3 :250 g/, 30 A/dm 2 ), and 5μ hard chromium was applied to complete the mold.

次にこの母型を用い、ニツケル電鋳を行つた。
条件は浴組成としてスルフアミン酸ニツケル500
g/、塩化ニツケル15g/、ホウ酸30g/
:電流密度10A/dm2、浴温50℃時間25minで
40μ厚の多孔性の電鋳箔を得る事ができた。
Next, nickel electroforming was performed using this mother mold.
The conditions are nickel sulfamate 500 as the bath composition.
g/, nickel chloride 15g/, boric acid 30g/
: Current density 10A/dm 2 , bath temperature 50℃, time 25min
We were able to obtain porous electroformed foil with a thickness of 40μ.

本発明による母型は母型1ケ所当り500回の使
用に耐え、従来(第2図)の25倍の耐久性を有す
る事が分り、多孔性電鋳箔を得るのに大巾なコス
トダウンができた。
It was found that the matrix according to the present invention can withstand 500 uses per part of the matrix, 25 times more durable than the conventional method (Fig. 2), and can significantly reduce the cost of producing porous electroformed foil. was completed.

実施例 2 30cm角のアルミニウム合金(5005Al−Mg系)
を用い、シルクスクリーン印刷にてネガ状のパタ
ーン(耐薬品性レジスト)を形成させた。この後
実施例1と同様に陽極酸化処理、電着塗装を施
し、キシレンでレジストを溶解剥離後、10%
NaOH(60℃)液を用いスプレー方式(圧1.0Kg/
cm2)で、100μの深さのエツチングを行つた。こ
の後、実施例1と同様の処理法で耐食性のクロム
皮膜をアルミ面に形成させ、母型として完了させ
た。次にこの母型を用い銅電鋳を行つた。銅電鋳
の条件はCuSO4・5H2O:220g/、H2SO4
60g/、電流密度8A/dm2、浴温40℃、時間
55分であり80μの装飾有効箔を形成した。
Example 2 30cm square aluminum alloy (5005Al-Mg system)
A negative pattern (chemical-resistant resist) was formed using silk screen printing. After that, anodization treatment and electrodeposition coating were performed in the same manner as in Example 1, and after dissolving and peeling off the resist with xylene, 10%
Spray method using NaOH (60℃) liquid (pressure 1.0Kg/
cm 2 ) to a depth of 100 μm. Thereafter, a corrosion-resistant chromium film was formed on the aluminum surface using the same treatment method as in Example 1, and the mold was completed. Next, copper electroforming was performed using this mother mold. The conditions for copper electroforming are CuSO 4 5H 2 O: 220g/, H 2 SO 4 :
60g/, current density 8A/dm 2 , bath temperature 40℃, time
It took 55 minutes to form a decorative effective foil of 80μ.

本法の母型の耐久性は400回であり、従来の20
倍の使用に耐えた。
The durability of the matrix of this method is 400 times, compared to the conventional 20 times.
It withstood twice the use.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図、第2図は、従来の電鋳用母型および電
鋳箔の説明図。第3図は本発明の電鋳用母型と、
これによつて得られる電鋳箔の説明図。第4図は
本発明の電鋳用母型の製造方法を示した説明図で
ある。 1……従来法の電鋳用母型(1)、2……金属基
板、3……樹脂、4……電鋳箔、5……金属と樹
脂の界面、6……従来法の電鋳用母型(2)、7……
アルミニウムおよびその合金、8……陽極酸化皮
膜(封孔処理有)、9……電鋳箔、10……本発
明の電鋳用母型、11……アルミニウムおよびそ
の合金基板、12……陽極酸化皮膜(封孔処理な
し)、13……電着塗装、14……耐食性金属皮
膜、15……電鋳箔、16……レジスト皮膜、1
7……導電性凹部。
FIGS. 1 and 2 are explanatory diagrams of a conventional electroforming mother mold and electroforming foil. FIG. 3 shows the electroforming master mold of the present invention,
An explanatory diagram of electroformed foil obtained by this. FIG. 4 is an explanatory diagram showing a method for manufacturing a master mold for electroforming according to the present invention. 1... Conventional electroforming matrix (1), 2... Metal substrate, 3... Resin, 4... Electroforming foil, 5... Interface between metal and resin, 6... Conventional electroforming Mother mold (2), 7...
Aluminum and alloy thereof, 8... Anodized film (with sealing treatment), 9... Electroforming foil, 10... Mother mold for electroforming of the present invention, 11... Aluminum and alloy substrate thereof, 12... Anode Oxide film (no sealing treatment), 13...electrodeposition coating, 14...corrosion-resistant metal film, 15...electroformed foil, 16...resist film, 1
7... Conductive recess.

Claims (1)

【特許請求の範囲】[Claims] 1 アルミニウムもしくはその合金からなる平板
あるいは円筒状の基材の表面に、エツチングによ
る凹部と非エツチング部である凸部を形成し、凸
部表面を陽極酸化して形成された酸化皮膜上に電
着塗装による樹脂層を設けてこの凸部を非導電性
凸部とし、凹部を耐食性金属で被覆して導電性凹
部とすることを特徴とする電鋳用母型の製造方
法。
1. On the surface of a flat plate or cylindrical base material made of aluminum or its alloy, a concave part and a convex part that is not etched are formed by etching, and the surface of the convex part is anodized, and then an oxide film is formed. Electrodeposition is performed on the oxide film. A method for producing a mother mold for electroforming, characterized in that a resin layer is provided by painting to make the convex portions non-conductive convex portions, and the concave portions are coated with a corrosion-resistant metal to make the concave portions conductive.
JP14217381A 1981-09-09 1981-09-09 Matrix for electroforming Granted JPS5845393A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14217381A JPS5845393A (en) 1981-09-09 1981-09-09 Matrix for electroforming

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14217381A JPS5845393A (en) 1981-09-09 1981-09-09 Matrix for electroforming

Publications (2)

Publication Number Publication Date
JPS5845393A JPS5845393A (en) 1983-03-16
JPS6314068B2 true JPS6314068B2 (en) 1988-03-29

Family

ID=15309050

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14217381A Granted JPS5845393A (en) 1981-09-09 1981-09-09 Matrix for electroforming

Country Status (1)

Country Link
JP (1) JPS5845393A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2772873B2 (en) * 1991-01-14 1998-07-09 株式会社 三井三池製作所 Bulk carrier unloading system

Also Published As

Publication number Publication date
JPS5845393A (en) 1983-03-16

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