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JPS6314814B2 - - Google Patents
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JPS6314814B2 - - Google Patents

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Publication number
JPS6314814B2
JPS6314814B2 JP56104085A JP10408581A JPS6314814B2 JP S6314814 B2 JPS6314814 B2 JP S6314814B2 JP 56104085 A JP56104085 A JP 56104085A JP 10408581 A JP10408581 A JP 10408581A JP S6314814 B2 JPS6314814 B2 JP S6314814B2
Authority
JP
Japan
Prior art keywords
magnetic field
magnetic pole
sample
angle
objective lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56104085A
Other languages
Japanese (ja)
Other versions
JPS5825054A (en
Inventor
Yoshinori Aoki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nihon Denshi KK filed Critical Nihon Denshi KK
Priority to JP56104085A priority Critical patent/JPS5825054A/en
Publication of JPS5825054A publication Critical patent/JPS5825054A/en
Publication of JPS6314814B2 publication Critical patent/JPS6314814B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)

Description

【発明の詳細な説明】 本発明は試料の表面に沿つて磁場を印加して試
料を電子顕微鏡観察するための装置に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an apparatus for observing a sample with an electron microscope by applying a magnetic field along the surface of the sample.

磁区構造等を究明するため、試料面に沿つて磁
場を印加した状態で試料を電子顕微鏡観察するこ
とが行なわれているが、そのための磁場印加装置
は従来第1図の如き構成をとつていた。
In order to investigate the magnetic domain structure, etc., samples are observed with an electron microscope while a magnetic field is applied along the sample surface. Conventionally, the magnetic field application device for this purpose has the configuration shown in Figure 1. Ta.

第1図において、1は紙面に垂直な方向の磁場
を発生し試料2にその表面に沿つて磁場を印加す
るための第1の磁極である。第1の磁極1から一
定距離l離れて磁極3が配置されており、又更に
距離l離れて磁極4が配置されている。5は対物
レンズである。
In FIG. 1, reference numeral 1 designates a first magnetic pole for generating a magnetic field in a direction perpendicular to the plane of the paper and applying the magnetic field to the sample 2 along its surface. A magnetic pole 3 is arranged at a certain distance l from the first magnetic pole 1, and a magnetic pole 4 is arranged at a further distance l. 5 is an objective lens.

さて、もし試料に磁場を印加するための第1の
磁極の磁場が無ければ、矢印で示された試料2の
先端を通る電子線は同図において点線で示すよう
な軌跡をとるため、6及び7で示される位置に
各々透過像及び回折像が形成される。しかしなが
ら試料2に磁場を印加するための磁場があると、
この磁場によつて試料2を透過した電子線は或る
角αだけ偏向されてしまうため、このままでは透
過像及び回折像は6,7で示された位置には形成
されずに光軸8と直角な方向に大きくずれてしま
い、これら像を観察することができなくなる。第
2,第3の磁極3,4はこのような事態を避ける
為に配置されているものである。即ち、第1図に
おける細線で示された光線図から明らかなよう
に、例えば第1の磁極1の磁場が仮りに存在しな
い場合に光軸8に対して角−α(但し反時計方向
にとる角を+の符号をつけて表現する)をなす向
きに進行するはずの電子線について注目すると、
この電子線な細線イで示すように第1の磁極1の
磁場によつて角αだけ偏向を受けるため光軸8方
向に進行し、第2の磁極3によつて角−2α偏向
され第3の磁極4によつて角αだけ偏向されて点
線に沿つて第1の磁極1の磁場が無い場合と同様
の方向進行する。従つて透過像は6で示された位
置に形成されることが判る。次に回折像の位置を
調べるため、第1の磁極1の磁場が存在しなけれ
ば試料2を透過する際に全く進行方向を変えない
所謂直進ビームについて注目してみると、この電
子線は第1図において細線ロで示すように第1の
磁極1の磁場によつて角αだけ偏向され、第2の
磁極3によつて角−2αだけ偏向され、第3の磁
極4によつて角αだけ偏向される結果光軸8と平
行に対物レンズ5に入射し、点線で示された第1
の磁極1の磁場が無い場合と同様の軌跡を通つて
進行する。従つて回折像も7の位置に形成される
ことが判る。
Now, if there is no magnetic field of the first magnetic pole for applying a magnetic field to the sample, the electron beam passing through the tip of sample 2 indicated by the arrow will take a trajectory as indicated by the dotted line in the same figure. A transmission image and a diffraction image are formed at the positions indicated by 7, respectively. However, if there is a magnetic field to apply a magnetic field to sample 2,
Because the electron beam transmitted through the sample 2 is deflected by a certain angle α due to this magnetic field, the transmitted image and the diffraction image will not be formed at the positions indicated by 6 and 7, but at the optical axis 8. The images will be greatly shifted in the right angle direction, making it impossible to observe these images. The second and third magnetic poles 3 and 4 are arranged to avoid such a situation. That is, as is clear from the ray diagram indicated by the thin line in FIG. If we pay attention to the electron beam that is supposed to travel in the direction forming the angle (expressed by adding a + sign), we find that
As shown by the thin line A, this electron beam is deflected by an angle α by the magnetic field of the first magnetic pole 1, so it travels in the direction of the optical axis 8, and is deflected by an angle −2α by the second magnetic pole 3 to the third is deflected by an angle α by the magnetic pole 4 of the first magnetic pole 4, and travels along the dotted line in the same direction as when there is no magnetic field of the first magnetic pole 1. Therefore, it can be seen that the transmitted image is formed at the position indicated by 6. Next, in order to investigate the position of the diffraction image, we pay attention to the so-called straight beam that does not change its traveling direction at all when passing through the sample 2 unless the magnetic field of the first magnetic pole 1 exists. 1, the magnetic field of the first magnetic pole 1 deflects an angle α, the second magnetic pole 3 deflects an angle −2α, and the third magnetic pole 4 deflects an angle α. As a result, it is incident on the objective lens 5 parallel to the optical axis 8, and the first beam shown by the dotted line
It progresses through the same trajectory as in the absence of the magnetic field of magnetic pole 1. Therefore, it can be seen that a diffraction image is also formed at position 7.

しかしながらこのような従来装置においては、
第1の磁極1のほかに試料2と対物レンズ5との
間には第2,第3の磁極3,4を配置しなければ
ならないため、試料2と対物レンズ5との距離が
大きくなり、磁場を印加しないで試料を観察する
場合に比して、倍率が低下すると共に球面収差係
数及び色収差係数が大きくなる。
However, in such conventional devices,
In addition to the first magnetic pole 1, second and third magnetic poles 3 and 4 must be placed between the sample 2 and the objective lens 5, so the distance between the sample 2 and the objective lens 5 becomes large. Compared to the case of observing a sample without applying a magnetic field, the magnification decreases and the spherical aberration coefficient and chromatic aberration coefficient increase.

本発明はこのような従来装置の欠点を解決し、
倍率及び収差の点で改善された電子顕微鏡におけ
る磁場印加装置を提供することを目的とするもの
で、試料へ磁場を印加するための磁場印加手段と
対物レンズとの間に磁場印加手段によつて角αだ
け偏向された電子線を角αだけ振り戻すための第
1の偏向手段を配置すると共に、対物レンズの後
段の回折像の結像位置と透過像の結像位置との間
に対物レンズによつて結像される透過像の結像位
置を磁場印加手段と第1の偏向手段が動作しない
場合の結像位置に一致させるべく光軸と垂直な方
向に移動させるための第2の偏向手段とを備えた
ことを特徴としている。
The present invention solves the drawbacks of such conventional devices,
The purpose of this device is to provide a magnetic field application device for an electron microscope that is improved in terms of magnification and aberrations, and uses a magnetic field application device between a magnetic field application device for applying a magnetic field to a sample and an objective lens. A first deflection means for deflecting the electron beam deflected by angle α by angle α is arranged, and an objective lens is disposed between the imaging position of the diffraction image and the imaging position of the transmission image after the objective lens. a second deflection for moving the image formation position of the transmission image formed by the optical axis in a direction perpendicular to the optical axis so as to match the image formation position when the magnetic field application means and the first deflection means do not operate; It is characterized by having the means.

以下、第2図に基づいて本発明の一実施例を詳
述するが、第2図にいて第1図の場合と同一部に
対しては同一番号を付す。
Hereinafter, one embodiment of the present invention will be described in detail based on FIG. 2, and the same parts in FIG. 2 as in FIG. 1 are given the same numbers.

第2図において、従来と異なるところは第1の
磁極1と対物レンズ5との間に第2の磁極9のみ
が配置され、この第2の磁極9は第1の磁極によ
り試料1を通過した電子線が受ける偏向角が角α
である場合に、この電子線を角αだけ振り戻す
(−α偏向する)磁場を発生するようになつてい
る点と、第3の磁極10が対物レンズ5の後段で
回折像が形成される位置と透過像が形成される位
置の間に配置されており、この第3の磁極10に
よつて形成される磁場は、対物レンズを通過して
結像される透過像の結像位置を第1の磁極1と第
2磁極9が動作しない場合の結像位置に一致させ
るため光軸8と垂直な方向に移動させるための磁
場を発生するようになつている点である。
In Fig. 2, the difference from the conventional one is that only a second magnetic pole 9 is arranged between the first magnetic pole 1 and the objective lens 5, and this second magnetic pole 9 is passed through the sample 1 by the first magnetic pole. The deflection angle that the electron beam receives is the angle α
, a diffraction image is formed at the point where the third magnetic pole 10 generates a magnetic field that deflects the electron beam by an angle α (deflects −α), and the third magnetic pole 10 forms a diffraction image after the objective lens 5. The magnetic field formed by the third magnetic pole 10 changes the imaging position of the transmitted image formed by passing through the objective lens. The point is that a magnetic field is generated to move the optical axis 8 in a direction perpendicular to the optical axis 8 so that the first magnetic pole 1 and the second magnetic pole 9 coincide with the imaging position when they are not operated.

このような構成の装置において、まず、試料に
磁場を印加しない場合に透過像及び回折像が形成
される位置を求める。そのため、試料2の先端か
ら光軸8に平行な向きに進行する電子線の光路を
考えると、点線ニで示すようになる。同じく試料
2の先端から対物レンズ5の中心を通る向きに進
行する電子線の光路を考えると点線ハで示すよう
になる。従つて、点線ニとハの交点の位置から、
試料に磁場を印加しない場合、透過像は第2図に
おいて11で示すように形成されることが明らか
である。又、回折像は対物レンズの後焦点面に形
成されるため、試料2の先端から光軸8に平行な
向きに進行する電子線の光路を示す前記点線ニで
示す光線の光路が、光軸8と交わる位置を見い出
すことによつて求めることができる。このことよ
り、回折像は同図において12で示す位置に形成
されることが明らかである。尚、第2図において
点線ホは、後述する説明に必要なために示したも
ので、試料2に磁場を印加しない場合に、試料2
の先端から光軸8に対して角−αを成す向きに進
行する電子線の光路を示している。次に、第2の
磁極9と第3の磁極10の作用により、第1の磁
極1の磁場が存在するにもかかわらず、透過像及
び回折像の位置が11,12で示される位置にな
ることを説明する。
In an apparatus having such a configuration, first, positions where a transmission image and a diffraction image are formed when no magnetic field is applied to the sample are determined. Therefore, when considering the optical path of the electron beam traveling in a direction parallel to the optical axis 8 from the tip of the sample 2, it becomes as shown by the dotted line D. Similarly, if we consider the optical path of the electron beam traveling from the tip of the sample 2 in a direction passing through the center of the objective lens 5, it becomes as shown by the dotted line C. Therefore, from the position of the intersection of dotted lines D and C,
It is clear that when no magnetic field is applied to the sample, a transmission image is formed as shown at 11 in FIG. In addition, since the diffraction image is formed on the back focal plane of the objective lens, the optical path of the beam indicated by the dotted line D, which indicates the optical path of the electron beam traveling from the tip of the sample 2 in a direction parallel to the optical axis 8, is aligned with the optical axis. It can be determined by finding the position where it intersects with 8. From this, it is clear that the diffraction image is formed at the position indicated by 12 in the figure. Note that the dotted line H in FIG. 2 is shown because it is necessary for the explanation that will be given later.
It shows the optical path of an electron beam traveling from the tip in a direction forming an angle -α with respect to the optical axis 8. Next, due to the action of the second magnetic pole 9 and the third magnetic pole 10, the positions of the transmission image and the diffraction image become the positions indicated by 11 and 12 despite the presence of the magnetic field of the first magnetic pole 1. Explain that.

試料2を透過する電子線のうち、試料2の先端
(矢印の先端)を通過し且つ磁場を印加しないで
試料を観察する場合には点線ホで示されるように
光軸8に対して角−αをなす方向に進行する電子
線に注目すると、この電子線は第1の磁極1の磁
場により角αだけ偏向されるため実際には第2図
において細線ヘで示すように光軸8と平行に進
み、第2の磁極9によつて角−αだけ偏向され、
対物レンズ5を通過した後、第3の磁極10によ
つて角βだけ偏向されて進行する。又試料2に磁
場を印加しないで観察する場合に試料2を通過す
る際に全く偏向を受けずに点線ニの如き軌跡をと
る電子線に注目すると、この電子線は試料に磁場
を印加する場合には第1の磁極1の磁場によつて
角αだけ偏向され、第2の磁極9によつて角αだ
け振り戻され、対物レンズ5を通過した後、第3
の磁極10によつて角βだけ偏向され細線トで示
す如き軌跡をとりながら進行する。一点鎖線で示
された軌跡部分チ,リは第3の磁極10の磁場が
無い場合に各々軌跡ヘ、トがとる軌跡を示してお
り、又11′はその場合に形成されるる試料像を
示しており、この図から第3の磁極10の磁場に
より対物レンズ5によつて形成される試料像の位
置は光軸と垂直な方向に移動させられて試料像1
1に一致する。従つて試料2に磁場を印加する場
合にも、回折像と透過像の位置は磁場を印加しな
い場合の像11,12に一致することは明らかで
あり、試料に磁場を印加した状態で良好に観察で
きる。
When the electron beam passing through the sample 2 passes through the tip of the sample 2 (the tip of the arrow) and the sample is observed without applying a magnetic field, the electron beam should be at an angle of - to the optical axis 8 as shown by the dotted line H. Focusing on the electron beam traveling in the direction α, this electron beam is deflected by the angle α by the magnetic field of the first magnetic pole 1, so it is actually parallel to the optical axis 8 as shown by the thin line in FIG. and is deflected by an angle −α by the second magnetic pole 9,
After passing through the objective lens 5, the beam is deflected by an angle β by the third magnetic pole 10 and proceeds. Also, when observing sample 2 without applying a magnetic field, we note that the electron beam does not receive any deflection when passing through sample 2 and takes a trajectory like the dotted line D. When a magnetic field is applied to sample 2, this electron beam is deflected by the angle α by the magnetic field of the first magnetic pole 1, deflected back by the angle α by the second magnetic pole 9, and after passing through the objective lens 5, the third magnetic pole is deflected by the angle α.
It is deflected by an angle β by the magnetic pole 10, and travels while taking a trajectory as shown by the thin line D. Trajectory portions A and D indicated by dashed-dotted lines indicate the trajectories H and G would take, respectively, in the absence of the magnetic field of the third magnetic pole 10, and 11' indicates the sample image formed in that case. As can be seen from this figure, the position of the sample image formed by the objective lens 5 is moved in the direction perpendicular to the optical axis by the magnetic field of the third magnetic pole 10.
Matches 1. Therefore, even when a magnetic field is applied to sample 2, it is clear that the positions of the diffraction image and transmission image coincide with images 11 and 12 when no magnetic field is applied, and it is clear that the positions of the diffraction image and transmission image match those of images 11 and 12 when a magnetic field is applied to the sample. It can be observed.

上述した本発明に基づく装置においては、試料
に磁場を印加するための磁極と対物レンズとの間
にはこの磁場による電子線の偏向の効果を除くた
めの磁極を1個しか配置していないため、試料と
対物レンズとの距離a′を従来装置における距離a
より小さなものにすることができる。従つて通常
対物レンズ5と透過像の距離bは装置固有な大き
さとして固定されているため、本発明における装
置の観察倍率M′=b/a′は従来装置における観
察倍率M=b/aより大きなものにすることがで
きる。
In the apparatus based on the present invention described above, only one magnetic pole is disposed between the magnetic pole for applying a magnetic field to the sample and the objective lens to eliminate the effect of deflection of the electron beam due to this magnetic field. , the distance a′ between the sample and the objective lens is the distance a in the conventional device.
It can be made smaller. Therefore, since the distance b between the objective lens 5 and the transmitted image is usually fixed as a size specific to the device, the observation magnification M'=b/a' of the device in the present invention is the same as the observation magnification M=b/a in the conventional device. You can make it bigger.

又、これに伴い対物レンズの焦点距離は従来装
置の場合に比して小さくなるため、対物レンズの
起磁力を従来に比して増加させて使用することに
なり、球面使差係数及び色収差係数をより小さな
ものにすることができる。
Additionally, as the focal length of the objective lens becomes smaller than in the case of conventional devices, the magnetomotive force of the objective lens must be increased compared to the conventional device, which reduces the spherical aberration coefficient and chromatic aberration coefficient. can be made smaller.

尚、上述した実施例は本発明の一実施例に過ぎ
ず、実施にあたつては他の態様をとり得る。例え
ば上述した実施例における第2,第3の磁極に代
えて静電偏向型の偏向手段を2段用いても良い。
Note that the above-described embodiment is only one embodiment of the present invention, and other embodiments may be adopted when implementing the present invention. For example, two stages of electrostatic deflection type deflection means may be used in place of the second and third magnetic poles in the above embodiment.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来装置を説明するための図であり、
第2図は本発明の一実施例を説明するための図で
ある。 1…第1の磁極、2…試料、3…第2の磁極、
4…第3の磁極、5…対物レンズ、6…透過像、
7…回折像、8…光軸、9…第2の磁極、10…
第3の磁極、11…透過像、11′…透過像、1
2…回折像。
FIG. 1 is a diagram for explaining a conventional device,
FIG. 2 is a diagram for explaining one embodiment of the present invention. 1... First magnetic pole, 2... Sample, 3... Second magnetic pole,
4... Third magnetic pole, 5... Objective lens, 6... Transmitted image,
7... Diffraction image, 8... Optical axis, 9... Second magnetic pole, 10...
Third magnetic pole, 11...Transmission image, 11'...Transmission image, 1
2...Diffraction image.

Claims (1)

【特許請求の範囲】[Claims] 1 試料面に沿つて磁場を印加するための磁場印
加手段1と、該磁場印加手段1と対物レンズ5と
の間に配置され試料2を透過し磁場印加手段1に
よつて角αだけ偏向された電子線を角αだけ振り
戻すための第1の偏向手段9と、回折像12の結
像位置と透過像の結像位置との間に配置され対物
レンズ5によつて結像される透過像の結像位置を
前記磁場印加手段1と第1の偏向手段9を動作さ
せない場合の結像位置11に一致させるべく光軸
8とは直角な方向に移動させるための第2の偏向
手段10とを具備することを特徴とする電子顕微
鏡における磁場印加装置。
1 A magnetic field applying means 1 for applying a magnetic field along the sample surface, and a magnetic field applying means 1 arranged between the magnetic field applying means 1 and the objective lens 5, transmitting through the sample 2 and being deflected by the angle α by the magnetic field applying means 1. a first deflecting means 9 for deflecting the electron beam by an angle α; and a first deflection means 9 for deflecting the electron beam by an angle α; a second deflection means 10 for moving the image in a direction perpendicular to the optical axis 8 so that the image formation position coincides with the image formation position 11 when the magnetic field application means 1 and the first deflection means 9 are not operated; A magnetic field application device for an electron microscope, comprising:
JP56104085A 1981-07-03 1981-07-03 Magnetic-field applying device installed in electron microscope Granted JPS5825054A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56104085A JPS5825054A (en) 1981-07-03 1981-07-03 Magnetic-field applying device installed in electron microscope

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56104085A JPS5825054A (en) 1981-07-03 1981-07-03 Magnetic-field applying device installed in electron microscope

Publications (2)

Publication Number Publication Date
JPS5825054A JPS5825054A (en) 1983-02-15
JPS6314814B2 true JPS6314814B2 (en) 1988-04-01

Family

ID=14371291

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56104085A Granted JPS5825054A (en) 1981-07-03 1981-07-03 Magnetic-field applying device installed in electron microscope

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JP (1) JPS5825054A (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002333361A (en) * 2001-05-07 2002-11-22 Sefa Technology Kk Method and apparatus for measuring quantity of sample in container

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JPS5825054A (en) 1983-02-15

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