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JPS6320258B2 - - Google Patents
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JPS6320258B2 - - Google Patents

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Publication number
JPS6320258B2
JPS6320258B2 JP55131052A JP13105280A JPS6320258B2 JP S6320258 B2 JPS6320258 B2 JP S6320258B2 JP 55131052 A JP55131052 A JP 55131052A JP 13105280 A JP13105280 A JP 13105280A JP S6320258 B2 JPS6320258 B2 JP S6320258B2
Authority
JP
Japan
Prior art keywords
plasma
organosilazane
group
manufacturing
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55131052A
Other languages
Japanese (ja)
Other versions
JPS5755928A (en
Inventor
Osamu Shibuta
Masayoshi Suzue
Minoru Takenaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Otsuka Chemical Co Ltd
Original Assignee
Otsuka Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Otsuka Chemical Co Ltd filed Critical Otsuka Chemical Co Ltd
Priority to JP13105280A priority Critical patent/JPS5755928A/en
Publication of JPS5755928A publication Critical patent/JPS5755928A/en
Publication of JPS6320258B2 publication Critical patent/JPS6320258B2/ja
Granted legal-status Critical Current

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  • Silicon Polymers (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

本発明はポリ(オルガノシラザン)の新規な製
法に関する。さらに詳しくはオルガノシラザンに
プラズマ照射を行なうことによつてポリ(オルガ
ノシラザン)をうる製法に関する。 近年、超耐熱性、超耐寒性、耐放射線性などの
特性を有するいわゆる無機系極限材料の開発が活
発になつてきている。 一方超集積回路や太陽電池など半導体および電
子材料における新しいタイプのケイ素系高分子材
料の開発が長い間待望されていた。 これらの分野においては、すでに金属酸化物な
どの金属焼結体およびアモルフアス金属などが知
られている。また耐熱性、耐寒性を有する無機系
高分子としては、シロキサン結合を主鎖とするシ
リコーンポリマーが応用されているが、未だ極限
材料といえる域には達していない。 前記特性を有する新しい高分子材料として、ケ
イ素とチツ素を主鎖とする、いわゆるシラザンポ
リマーが従来より大いに期待されてきているが、
この種の化合物の重合は一般にはきわめて困難で
あり、化学的方法による高分子量を有する重合体
の合成方法は未だ開発されていない。 しかるに本発明者らは前記特性を有する極限材
料をうるべく鋭意研究を重ねた結果、オルガノシ
ラザンにプラズマエネルギーを利用して重合せし
めることによりポリ(オルガノシラザン)がえら
れることを見出し、本発明を完成するにいたつ
た。 すなわち本発明は一般式(): (式中、R1、R2、R3、R4、R5、R6およびR7
水素原子有機置換基または無機置換基である)で
示される線状オルガノシラザンおよび(または) 一般式(): (式中、R1、R2およびR3は前記と同じ、nは
2〜4の整数である)で示される環状オルガノシ
ラザンをプラズマと接触させることによるポリ
(オルガノシラザン)の製法に関するものである。 一般式(): で示される線状オルガノシラザンまたは一般式
(): で示される環状オルガノシラザンのR1、R2、R3
R4、R5、R6およびR7としては水素原子、炭素数
1〜12個を有するアルキル基、アルコキシ基、ア
ルキルイミノ基、ビニル基、アリル基;炭素数1
〜12個のアルキル基またはアルコキシ基を有する
アリールアルキル基、アリールアルコキシ基また
はアリール基;またはこれらのハロゲン誘導体
基;ハロゲン原子または水酸基があげられる。 一般式()または()で示されるオルガノ
シラザン化合物としては、たとえばヘキサメチル
シクロトリシラザン、ヘキサメチルジシラザン、
オクタメチルシクロテトラシラザンなどがあげら
れる。 プラズマ重合については、近年注目を集め、基
礎、応用の両面における研究の進展がいちじるし
い。しかしながらこれら従来のプラズマ重合の一
般的方法は主として有機化合物を気体状態ならそ
のまま、液体状態ならばいつたん気化させ、減圧
下で反応物を気相状態のまま直接プラズマ化させ
て担体上に重合体薄膜をえようとするものであ
る。こうしてえられる重合体薄膜は通常2〜3分
子ごとに架橋し、その構造は激しいプラズマ化学
反応のため、出発物質とはいちじるしく異なつた
化学構造を有しており、出発原料から所望される
本来発現されるべき物理的、化学的諸性質が失な
われてしまつている。 本発明の製法は従来からのこうした気相プラズ
マ重合法とは本質的に異なり、主たる重合反応の
場は液相あるいは固相のいわゆる凝縮相である。 すなわち従来法はプラズマ状態にある気相その
ものが重合体薄膜生成の開始、生長、停止、分
岐、再開始などあらゆる反応プロセスの反応場で
あり、したがつて重合速度はもちろんのこと生成
重合体の構造や分岐度を調節することが不可能で
あつた。 これに対し本発明におけるプラズマ開始重合法
はプラズマを重合反応のためのひとつのエネルギ
ー源してとらえられている。したがつて重合開始
反応はプラズマ状態にある気相であるが、つづく
重合生長反応以降はオルガノシラザンの液相また
は固相で進行し、プラズマの場そのものではな
い。それゆえ本発明においては、プラズマ照射条
件によつて重合体構造や生成物の反応比率、とく
に高重合体網目構造や分岐状重合体反応比率、オ
リゴマーの反応収率などを変化、調節することが
可能である。 さらに本発明においては重合反応の主要な過程
が液相ないし固相の凝縮相で進行するので、生成
重合体は固体粉末または固体塊状物質として多量
にかつ容易に取り出すことができ、これを必要に
応じ加工ないし担体とともに成型充填加工できる
ことも大きな特徴である。 また本発明においてえられるポリ(オルガノシ
ラザン)は化学的にきわめて安定であり、耐酸
性、耐アルカリ性を有し、さらにすぐれた耐熱
性、耐候性、耐薬品性、絶縁性などを有してお
り、その用途はきわめて広い。 本発明の製法を詳細に述べると、オルガノシラ
ザンと接触させるプラズマでは安定なもの、とく
にグロー放電による低温プラズマであることが好
ましい。このような低温プラズマは通常、0.0001
〜100トールの減圧下、20〜1000ワツトの印加電
力で発生させることができる。あるいはプラズマ
を直流または交流で50ヘルツ〜30メガヘルツの周
波数領域にわたつて発生させるようにしてもよ
い。 たとえば市販のラジオ周波数領域、たとえば90
キロヘルツ〜13.56メガヘルツの同調回路つきプ
ラズマ発生装置を用い、電極を通じて電圧を印加
してもよい。電極としては、たとえばコイル状電
極や平行板電極が用いられる。また電極は減圧気
体内部に設置(内部電極方式)しても反応器の外
部に設置(外部電極方式)してもよい。 ここでプラズマ発生に際して圧力が0.0001トー
ルより小であり、また100トールより大であると
プラズマが発生状態とならず、いずれも好ましく
ない。また印加電力が20ワツトより小であり、
1000ワツトより大であるとプラズマ発生状態とな
らず、いずれも好ましくない。また交流で50ヘル
ツより小であり、100メガヘルツより大であると
プラズマ発生状態とならず、いずれも好ましくな
い。 またプラズマ発生についてはオルガノシラザン
化合物の蒸気圧を温度制御によつてプラズマ発生
状態とし、該蒸気を用いてプラズマを発生させる
こともできる。すなわちプラズマ発生源としての
気体はオルガノシラザン自体の気体分子を利用し
たものであつてもよいし、または水素、メタン、
チツ素、アルゴン、エチレンなど任意の気体でも
よい。 いずれのばあいであつても重合反応器の形状、
電極の形状およびその間隔、印加電圧などに応じ
て最適の気体圧力を選択することが安定なプラズ
マをうるうえで肝要である。 本発明において、プラズマ発生に用いる印加電
圧は通常50〜1000ボルトの範囲で、電流は10ミリ
アンペア〜10アンペアの範囲で適宜選ぶことがで
きる。 オルガノシラザンは気体、液体または固体など
の凝縮相状態でプラズマと接触させることがで
き、反応はそれぞれに応じて気相反応、液相反応
または固相反応となる。 オルガノシラザンの重合開始反応はプラズマ状
態である気相であるが、固体状原料または液体状
原料を減圧下で必要に応じて冷却または加熱しな
がらプラズマ照射することによつて重合反応が進
行する。 気相反応においては生成重合体は反応器内部、
通常反応器内壁に付着した状態で生成する。えら
れる重合体は溶剤に不溶性薄膜状の高重合体が多
く、好ましくない。 液相状態のオルガノシラザンはそれ自体が液体
のばあいはそのまま、固体のばあいには加熱熔融
することによつてポリ(オルガノシラザン)がえ
られる。またオルガノシラザンが液体、固体いず
れのばあいでもベンゼン、トルエン、アルコール
などの溶媒に溶解することによつてポリ(オルガ
ノシラザン)がえられる。またはオルガノシラザ
ンを他の化学試薬や重合体の共存下に浸漬、懸濁
させてもよい。ただしいずれのばあいにおいても
安定なプラズマを継続的に発生させるべく、反応
系中の蒸気圧を冷却などによつて適宜コントロー
ルすることが必要である。 固相状態でオルガノシラザンに対しプラズマ照
射するばあいには、反応物質が固体状態のばあい
にはそのまま、液体のばあいには冷却し固化せし
めてからプラズマ照射する。反応物質が常温で固
体状態であつても蒸気圧を制御するために、必要
に応じて冷却するばあいも多い。 具体的にはオルガノシラザンが液体または固体
のばあいには、これをガラス製の反応器に仕込
み、この反応器を適当な減圧手段によつて減圧
し、オルガノシラザンをそれ自体一部気化させる
か、またはアルゴンなどの他の気体によつて反応
器内部の気体圧力を調節したのち電極間に電圧を
印加することによつてプラズマを発生させ、これ
と接触せしめる。その際高周波テスラー管などを
用いて反応器に対し刺激を加えることによつて放
電開始を容易にしてもよい。 液相または固相重合のばあいにはプラズマとの
接触面積がポリ(オルガノシラザン)を収率よく
うるうえで重要な要因であり、プラズマと接触し
ている液面または固体表面を新しくするのもひと
つの方法である。生成するポリ(オルガノシラザ
ン)の構造はこうした操作によつても変化する。 プラズマとの接触時間は任意であるが、数十秒
程度のプラズマ照射によつてさえ、ポリ(オルガ
ノシラザン)がただちに生成するばあいもある。 こうしてえられるポリ(オルガノシラザン)は
有機置換基の数や種類によつても異なるが、一般
に印加電圧が大きく、またプラズマとの接触時間
が長いほど、収率は向上する。生成するポリ(オ
ルガノシラザン)は大別して、網目状高重合体、
線状高重合体、オイル状オリゴマーであり、これ
らの生成物の反応比率はプラズマ印加電圧、プラ
ズマ照射時間、反応物の形状などに密接に関連し
ている。またプラズマと接触後、常温または加温
下で反応系をそのまま、または媒体中で数日間以
上放置し、いわゆる後重合させることによつてポ
リ(オルガノシラザン)の生成量および分子量を
増大させることもできる。すなわち後重合はプラ
ズマ照射後、そのまま継続して行なうこともでき
るし、適当な溶媒、非溶媒に浸漬してから行なう
こともできる。 つぎに実施例をあげて本発明の方法を詳細に説
明する。 実施例 1 ヘキサメチルシクロトリシラザン5gをストツ
プコツクつきの容量50mlの丸底フラスコに入れ、
このフラスコを0.1トールに減圧したガラス製真
空装置に連結した。ついで同調回路つき13.56メ
ガヘルツの市販のプラズマ発生器に連結した縦
120mm、巾90mm、厚さ約3mmの銅製平行電極板
(間隔50mm)間に丸底フラスコを挿入し、フラス
コを適宜冷却しながら100ワツトの出力で加電す
ることにより、グロー放電を開始しプラズマを発
生させた。蒸気圧の上昇に伴ないプラズマが消滅
するときは適宜−50℃程度に冷却し、再びプラズ
マを発生させた。。全プラズマ照射時間が30分間
に達したところで反応物を取に出し、大量のメタ
ノール中に浸漬し、撹拌した。ついでこれを過
して不溶分をえた。該不溶分を真空乾燥して白色
塊状物としてポリ(オルガノシラザン)の高重合
体1.25gをえた(収率25%)。 さらにメタノール液を減圧乾燥したところ無
色透明の高粘稠性油状物としてポリ(オルガノシ
ラザン)の高重合体1.25gをえた(収率25%)。 さらにメタノール液を減圧乾燥したところ無
色透明の高粘稠性油状物としてポリ(オルガノシ
ラザン)オリゴマー0.5gをえた(収率10%)。 IRスペクトルチヤートを第1図に示す。第1
図中、(a)は出発物質、(b)は生成したポリ(オルガ
ノシラザン)高重合体のものである。(b)において
―Si―N―Siの振動に基づく吸収が900〜950cm-1
および1050cm-1近辺に認められ、また(a),(b)とも
にSi―CH3の吸収が800cm-1において認められる。
また高重合体のX線回折写真を第2図に示す。第
2図から該高重合体が非晶質であることがわか
る。 実施例 2 全プラズマ照射時間を60分間としたほかは実施
例1と同様にして実験を行なつた。結果を第1表
に示す。 実施例 3 出力を45ワツト、全プラズマ照射時間を45分間
としたほかは実施例1と同様にして実験を行なつ
た。結果を第1表に示す。 実施例 4 ヘキサメチルシクロトリシラザンに代えてヘキ
サメチルジシラザンを用いたほかは実施例1と同
様にして実験を行なつた。結果を第1表に示す。
IRスペクトルチヤートを第3図に示す。第3図
中(a)は出発物質、(b)はポリ(オルガノシラザン)
高重合体のものである。また高重合体のX線回折
図を第5図に示す。第5図から該重合体が非晶質
であることがわかる。 実施例 5 全プラズマ照射時間を30分間としたほかは実施
例4と同様にして実験を行なつた。結果を第1表
に示す。 実施例 6 出力を45ワツト、全プラズマ照射時間を45分間
としたほかは実施例4と同様にして実験を行なつ
た。結果を第1表に示す。
The present invention relates to a new method for producing poly(organosilazanes). More specifically, the present invention relates to a method for producing poly(organosilazane) by irradiating organosilazane with plasma. In recent years, the development of so-called inorganic extreme materials having properties such as super heat resistance, super cold resistance, and radiation resistance has become active. On the other hand, the development of new types of silicon-based polymer materials for semiconductor and electronic materials such as ultra-integrated circuits and solar cells has long been desired. In these fields, metal sintered bodies such as metal oxides and amorphous metals are already known. In addition, silicone polymers having siloxane bonds as the main chain have been applied as inorganic polymers having heat resistance and cold resistance, but they have not yet reached the level where they can be called ultimate materials. So-called silazane polymers, which have silicon and nitrogen as their main chains, have been highly anticipated as new polymeric materials with the above-mentioned properties.
Polymerization of this type of compound is generally extremely difficult, and a method for synthesizing a polymer having a high molecular weight by a chemical method has not yet been developed. However, as a result of extensive research in an attempt to find an ultimate material with the above-mentioned characteristics, the present inventors discovered that poly(organosilazane) could be obtained by polymerizing organosilazane using plasma energy. It was about to be completed. That is, the present invention is based on the general formula (): (wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 and R 7 are hydrogen atom organic substituents or inorganic substituents) and/or a linear organosilazane represented by the general formula (): (In the formula, R 1 , R 2 and R 3 are the same as above, and n is an integer of 2 to 4.) This relates to a method for producing poly(organosilazane) by bringing the cyclic organosilazane represented by the formula into contact with plasma. be. General formula (): Linear organosilazane or general formula (): R 1 , R 2 , R 3 of the cyclic organosilazane represented by
R 4 , R 5 , R 6 and R 7 are a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, an alkoxy group, an alkylimino group, a vinyl group, an allyl group; a carbon number 1
Examples include an arylalkyl group, an arylalkoxy group, or an aryl group having ~12 alkyl or alkoxy groups; or a halogen derivative group thereof; a halogen atom or a hydroxyl group. Examples of the organosilazane compound represented by the general formula () or () include hexamethylcyclotrisilazane, hexamethyldisilazane,
Examples include octamethylcyclotetrasilazane. Plasma polymerization has attracted attention in recent years, and research in both basic and applied fields has made remarkable progress. However, these conventional plasma polymerization methods mainly involve directly vaporizing the organic compound if it is in a gaseous state, or once vaporizing it if it is in a liquid state, and directly converting the reactants in the gaseous state into plasma under reduced pressure to form a polymer onto a carrier. The aim is to create a thin film. The polymer thin film obtained in this way is usually cross-linked every 2 to 3 molecules, and its structure is significantly different from that of the starting material due to the intense plasma chemical reaction. The physical and chemical properties that should be maintained have been lost. The production method of the present invention is essentially different from such conventional gas-phase plasma polymerization methods, and the main polymerization reaction takes place in a so-called condensed phase, which is either a liquid phase or a solid phase. In other words, in the conventional method, the gas phase itself in the plasma state is the reaction site for all reaction processes such as initiation, growth, termination, branching, and restart of polymer thin film formation, and therefore, not only the polymerization rate but also the produced polymer. It was impossible to adjust the structure and degree of branching. In contrast, the plasma-initiated polymerization method of the present invention considers plasma as one energy source for the polymerization reaction. Therefore, although the polymerization initiation reaction occurs in the gas phase in the plasma state, the subsequent polymerization growth reactions proceed in the liquid or solid phase of the organosilazane and are not in the plasma field itself. Therefore, in the present invention, it is possible to change and adjust the polymer structure and the reaction ratio of products, especially the high polymer network structure, the reaction ratio of branched polymers, and the reaction yield of oligomers, by changing the plasma irradiation conditions. It is possible. Furthermore, in the present invention, since the main process of the polymerization reaction proceeds in a condensed phase of liquid or solid phase, the produced polymer can be easily taken out in large quantities as a solid powder or solid lump substance, and it can be used as needed. Another major feature is that it can be processed or molded and filled together with a carrier. In addition, the poly(organosilazane) obtained in the present invention is chemically extremely stable and has acid resistance and alkali resistance, as well as excellent heat resistance, weather resistance, chemical resistance, and insulation properties. , its uses are extremely wide. Describing the manufacturing method of the present invention in detail, the plasma brought into contact with the organosilazane is preferably a stable one, particularly a low-temperature plasma generated by glow discharge. Such low-temperature plasmas are typically 0.0001
It can be generated with an applied power of 20 to 1000 Watts under reduced pressure of ~100 Torr. Alternatively, plasma may be generated using direct current or alternating current over a frequency range of 50 hertz to 30 megahertz. Commercially available radio frequency range, e.g. 90
A plasma generator with a kilohertz to 13.56 megahertz tuned circuit may be used to apply voltage through the electrodes. As the electrode, for example, a coiled electrode or a parallel plate electrode is used. Further, the electrode may be installed inside the reduced pressure gas (internal electrode method) or outside the reactor (external electrode method). When generating plasma, if the pressure is less than 0.0001 Torr, and if it is greater than 100 Torr, plasma will not be generated, and both are unfavorable. and the applied power is less than 20 watts,
If it is higher than 1000 watts, plasma generation will not occur, and both are unfavorable. Furthermore, if the AC current is less than 50 Hz and greater than 100 MHz, plasma will not be generated, and both are unfavorable. Regarding plasma generation, the vapor pressure of the organosilazane compound can be brought into a plasma generation state by temperature control, and the vapor can be used to generate plasma. In other words, the gas as a plasma generation source may be one using the gas molecules of organosilazane itself, or may be hydrogen, methane,
Any gas such as nitrogen, argon, or ethylene may be used. In any case, the shape of the polymerization reactor,
In order to obtain stable plasma, it is important to select the optimal gas pressure depending on the shape and spacing of the electrodes, the applied voltage, etc. In the present invention, the applied voltage used for plasma generation is usually in the range of 50 to 1000 volts, and the current can be appropriately selected in the range of 10 milliamps to 10 amperes. The organosilazane can be brought into contact with the plasma in a condensed phase state such as gas, liquid or solid, and the reaction will be a gas phase reaction, a liquid phase reaction or a solid phase reaction, respectively. The polymerization initiation reaction of organosilazane occurs in the gas phase, which is a plasma state, and the polymerization reaction proceeds by irradiating the solid or liquid raw material with plasma under reduced pressure while cooling or heating as necessary. In gas phase reactions, the produced polymer is inside the reactor,
It is usually produced attached to the inner wall of the reactor. Many of the resulting polymers are thin film-like high polymers that are insoluble in solvents, which is not preferable. Poly(organosilazane) can be obtained by heating and melting organosilazane in a liquid phase, if it is a liquid itself, or by heating and melting it if it is a solid. Poly(organosilazane) can also be obtained by dissolving organosilazane in a solvent such as benzene, toluene, or alcohol, whether it is a liquid or a solid. Alternatively, organosilazane may be immersed or suspended in the coexistence of other chemical reagents or polymers. However, in any case, it is necessary to appropriately control the vapor pressure in the reaction system by cooling or the like in order to continuously generate stable plasma. When organosilazane is irradiated with plasma in a solid state, if the reactant is in a solid state, it is left as is, or if it is a liquid, it is cooled and solidified before being irradiated with plasma. Even if the reactant is in a solid state at room temperature, it is often cooled as necessary to control its vapor pressure. Specifically, if the organosilazane is liquid or solid, it may be charged into a glass reactor, the pressure of this reactor may be reduced using a suitable pressure reducing means, and the organosilazane itself may be partially vaporized. After adjusting the gas pressure inside the reactor using other gases such as argon or argon, plasma is generated by applying a voltage between the electrodes and brought into contact with the plasma. At this time, the initiation of discharge may be facilitated by applying stimulation to the reactor using a high-frequency Tesler tube or the like. In the case of liquid phase or solid phase polymerization, the contact area with the plasma is an important factor in obtaining poly(organosilazane) in good yield, and it is important to renew the liquid or solid surface in contact with the plasma. is also one method. The structure of the poly(organosilazane) produced is also changed by these operations. Although the contact time with plasma is arbitrary, poly(organosilazane) may be generated immediately even after plasma irradiation for several tens of seconds. The yield of the poly(organosilazane) thus obtained varies depending on the number and type of organic substituents, but in general, the higher the applied voltage and the longer the contact time with plasma, the higher the yield. The poly(organosilazane) produced can be broadly classified into network high polymers,
These products are linear high polymers and oily oligomers, and the reaction ratio of these products is closely related to the plasma applied voltage, plasma irradiation time, and the shape of the reactants. In addition, after contact with plasma, the reaction system may be left as it is or in a medium for several days or more at room temperature or under heating to carry out so-called post-polymerization, thereby increasing the amount and molecular weight of poly(organosilazane) produced. can. That is, post-polymerization can be carried out directly after plasma irradiation, or can be carried out after being immersed in a suitable solvent or non-solvent. Next, the method of the present invention will be explained in detail with reference to Examples. Example 1 5 g of hexamethylcyclotrisilazane was placed in a 50 ml round bottom flask with a stopper.
The flask was connected to a glass vacuum apparatus with a reduced pressure of 0.1 Torr. It was then connected vertically to a 13.56 MHz commercially available plasma generator with a tuned circuit.
A round-bottomed flask is inserted between copper parallel electrode plates (50mm apart) that are 120mm wide, 90mm wide, and about 3mm thick. By applying electricity at an output of 100 watts while cooling the flask appropriately, glow discharge is started and plasma is generated. occurred. When the plasma disappeared as the vapor pressure increased, the temperature was appropriately cooled to about -50°C and plasma was generated again. . When the total plasma irradiation time reached 30 minutes, the reactant was taken out, immersed in a large amount of methanol, and stirred. This was then carried out to obtain the insoluble matter. The insoluble matter was dried under vacuum to obtain 1.25 g of a poly(organosilazane) high polymer as a white lump (yield: 25%). When the methanol solution was further dried under reduced pressure, 1.25 g of poly(organosilazane) high polymer was obtained as a colorless and transparent highly viscous oil (yield: 25%). Furthermore, when the methanol solution was dried under reduced pressure, 0.5 g of poly(organosilazane) oligomer was obtained as a colorless and transparent highly viscous oil (yield: 10%). The IR spectrum chart is shown in Figure 1. 1st
In the figure, (a) is the starting material, and (b) is the produced poly(organosilazane) high polymer. In (b), the absorption based on the vibration of Si—N—Si is 900 to 950 cm -1
In both (a) and (b ) , absorption of Si—CH 3 is observed at 800 cm -1 .
Furthermore, an X-ray diffraction photograph of the high polymer is shown in FIG. It can be seen from FIG. 2 that the high polymer is amorphous. Example 2 An experiment was conducted in the same manner as in Example 1, except that the total plasma irradiation time was 60 minutes. The results are shown in Table 1. Example 3 An experiment was conducted in the same manner as in Example 1, except that the output was 45 W and the total plasma irradiation time was 45 minutes. The results are shown in Table 1. Example 4 An experiment was conducted in the same manner as in Example 1 except that hexamethyldisilazane was used instead of hexamethylcyclotrisilazane. The results are shown in Table 1.
The IR spectrum chart is shown in Figure 3. In Figure 3, (a) is the starting material, (b) is poly(organosilazane)
It is made of high polymer. Moreover, the X-ray diffraction pattern of the high polymer is shown in FIG. It can be seen from FIG. 5 that the polymer is amorphous. Example 5 An experiment was conducted in the same manner as in Example 4 except that the total plasma irradiation time was 30 minutes. The results are shown in Table 1. Example 6 An experiment was conducted in the same manner as in Example 4, except that the output was 45 W and the total plasma irradiation time was 45 minutes. The results are shown in Table 1.

【表】 実施例 7 オクタメチルシクロテトラシラザン10gをスト
ツプコツクつき容量100mlの丸底フラスコに入れ、
該フラスコを、0.05トールに減圧したガラス製真
空装置に連結した。実施例1と同様のプラズマ発
生器およびプラズマ反応器を用い、フラスコを適
宜冷却しながら80ワツトの出力でグロー放電を開
始し、プラズマを発生させて照射し、重合を行な
つた。 全プラズマ照射時間が100分間に達したところ
で反応物を取り出し、実施例1と同様の処理を行
なつたところ、メタノール不溶性の乳白色ポリ
(オルガノシラザン)高重合体2.5g(収率25%)、
および高粘稠性油状のポリ(オルガノシラザン)
オリゴマー1.2gをえた(収率12%)。 実施例 8 ヘキサメチルトリシラザン10gを用い、出力
120ワツト、全プラズマ照射時間を40分間とした
ほかは実施例1と同様の条件で実験を行なつたの
ち、そのまま恒温槽中80℃で40時間放置し、後重
合を行なつた。その後実施例1と同様に処理しメ
タノール不溶性の乳白色ポリ(オルガノシラザ
ン)高重合体4.5g(収率45%)および高粘稠性
油状のポリ(オルガノシラザン)オリゴマー1g
をえた(収率10%)。 実施例 9 実施例1でえた白色ポリ(オルガノシラザン)
5gを白金ルツボに入れ、チツ素雰囲気下、1000
℃にて24時間熱処理したところ黒色粉末状物をえ
た。この化合物のIRスペクトルチヤートを第1
図中Cで示す。第1図のCからえられた化合物は
完全に無機化した重合体であることがわかる。こ
の無機化した重合体は1200℃においてもまつたく
安定であり、きわめて耐熱性のすぐれた無機重合
体であることがわかつた。該無機重合体のX線回
折写真を第4図に示す。第4図から該無機重合体
が非晶質であることがわかる。 実施例 10 実施例4でえられた白色ポリ(オルガノシラザ
ン)5gを白金ルツボに入れ、実施例9と同様の
条件で実験を行なつた結果、黒色粉末をえた。こ
の化合物のIRスペクトルチヤートを第3図中(c)
で示す。第3図の(c)から、えられた化合物は完全
に無機化した重合物であることがわかる。この無
機化した重合体は1200℃においてもまつたく安定
であり、きわめて耐熱性のすぐれた無機重合体で
あることがわかつた。該無機重合体のX線回折チ
ヤートを第5図に示す。第5図から該無機重合体
が非晶質であることがわかる。
[Table] Example 7 Put 10 g of octamethylcyclotetrasilazane into a 100 ml round bottom flask with a stopper.
The flask was connected to a glass vacuum apparatus with a reduced pressure of 0.05 torr. Using the same plasma generator and plasma reactor as in Example 1, glow discharge was started at an output of 80 W while the flask was appropriately cooled, and plasma was generated and irradiated to effect polymerization. When the total plasma irradiation time reached 100 minutes, the reactants were taken out and treated in the same manner as in Example 1. As a result, 2.5 g (yield 25%) of methanol-insoluble milky white poly(organosilazane) high polymer,
and highly viscous oily poly(organosilazane)
1.2 g of oligomer was obtained (yield 12%). Example 8 Using 10g of hexamethyltrisilazane, output
The experiment was carried out under the same conditions as in Example 1 except that the plasma irradiation time was 120 Watts and the total plasma irradiation time was 40 minutes, and then the sample was left in a constant temperature bath at 80° C. for 40 hours to carry out post-polymerization. Thereafter, the same treatment as in Example 1 was carried out to obtain 4.5 g (yield 45%) of a methanol-insoluble milky white poly(organosilazane) high polymer and 1 g of a highly viscous oily poly(organosilazane) oligomer.
(yield 10%). Example 9 White poly(organosilazane) obtained in Example 1
5g was placed in a platinum crucible and heated to 1000 ml under a nitrogen atmosphere.
When heat treated at ℃ for 24 hours, a black powdery substance was obtained. The first IR spectrum chart of this compound
It is indicated by C in the figure. It can be seen that the compound obtained from C in FIG. 1 is a completely mineralized polymer. This mineralized polymer was found to be extremely stable even at 1200°C, and was found to be an extremely heat-resistant inorganic polymer. An X-ray diffraction photograph of the inorganic polymer is shown in FIG. It can be seen from FIG. 4 that the inorganic polymer is amorphous. Example 10 5 g of the white poly(organosilazane) obtained in Example 4 was placed in a platinum crucible and an experiment was conducted under the same conditions as in Example 9, resulting in a black powder. The IR spectrum chart of this compound is shown in Figure 3 (c).
Indicated by From FIG. 3(c), it can be seen that the obtained compound is a completely mineralized polymer. This mineralized polymer was found to be extremely stable even at 1200°C, and was found to be an extremely heat-resistant inorganic polymer. An X-ray diffraction chart of the inorganic polymer is shown in FIG. It can be seen from FIG. 5 that the inorganic polymer is amorphous.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明における実施例1の出発物質と
生成高重合体および実施例9の生成無機高重合体
のIRスペクトルチヤート、第2図は実施例1の
生成高重合体X線回折写真、第3図は実施例3の
出発物質と生成高重合体および実施例10の生成無
機重合体のIRスペクトルチヤート、第4図は実
施例9の生成無機重合体のX線回折写真、第5図
は実施例10の生成無機重合体のX線回折チヤート
である。
FIG. 1 is an IR spectrum chart of the starting material and the produced high polymer of Example 1 and the produced inorganic high polymer of Example 9 in the present invention, FIG. 2 is an X-ray diffraction photograph of the produced high polymer of Example 1, Figure 3 is an IR spectrum chart of the starting material and high polymer produced in Example 3 and the inorganic polymer produced in Example 10, Figure 4 is an X-ray diffraction photograph of the inorganic polymer produced in Example 9, and Figure 5. is an X-ray diffraction chart of the inorganic polymer produced in Example 10.

Claims (1)

【特許請求の範囲】 1 一般式(): (式中、R1、R2、R3、R4、R5、R6およびR7
それぞれ水素原子、有機置換基または無機置換基
である)で示される線状オルガノシラザンおよび
(または)一般式(): (式中、R1、R2、R3は前記と同じ、nは2〜
4の整数である)で示される環状オルガノシラザ
ンをプラズマと接触させることを特徴とするポリ
(オルガノシラザン)の製法。 2 R1、R2、R3、R4、R5、R2およびR7がそれぞ
れ水素原子、炭素数1〜12個を有するアルキル
基、アルコキシ基、アルキルイミノ基、ビニル
基、アリル基;炭素数1〜12個のアルキル基また
はアルコキシ基を有するアリールアルキル基、ア
リールアルコキシ基またはアリール基;またはこ
れらのハロゲン誘導体基である特許請求の範囲第
1項記載の製法。 3 R1、R2、R3、R4、R5、R6およびR7の少なく
とも1種がそれぞれハロゲン原子または水酸基で
ある特許請求の範囲第1項記載の製法。 4 オルガノシラザンが気相、液相または固相状
態である特許請求の範囲第1項記載の製法。 5 オルガノシラザンを液体、固体などの凝縮相
状態でプラズマと接触させることを特徴とする特
許請求の範囲第1項記載の製法。 6 オルガノシラザンの蒸気圧を温度制御によつ
てプラズマ発生状態とし、該蒸気を用いてプラズ
マを発生させることを特徴とする特許請求の範囲
第1項記載の方法。 7 プラズマと接触後、常温または加温下で反応
系をそのまま、または媒体中に放置することを特
徴とする特許請求の範囲第1項記載の製法。 8 0.0001〜100トールの減圧下、20〜1000ワツ
トの低印加電力でプラズマを発生させることを特
徴とする特許請求の範囲第1項記載の製法。 9 プラズマを直流、または交流で50ヘルツ〜
100メガヘルツの周波数領域にわたつて発生させ
ることを特徴とする特許請求の範囲第1項記載の
製法。
[Claims] 1 General formula (): (wherein R 1 , R 2 , R 3 , R 4 , R 5 , R 6 and R 7 are each a hydrogen atom, an organic substituent or an inorganic substituent) and/or General formula (): (In the formula, R 1 , R 2 , R 3 are the same as above, n is 2 to
1. A method for producing poly(organosilazane), which comprises contacting a cyclic organosilazane (which is an integer of 4) with plasma. 2 R 1 , R 2 , R 3 , R 4 , R 5 , R 2 and R 7 are each a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, an alkoxy group, an alkylimino group, a vinyl group, an allyl group; 2. The method according to claim 1, which is an arylalkyl group, an arylalkoxy group, or an aryl group having an alkyl group or an alkoxy group having 1 to 12 carbon atoms; or a halogen derivative group thereof. 3. The manufacturing method according to claim 1, wherein at least one of R 1 , R 2 , R 3 , R 4 , R 5 , R 6 and R 7 is each a halogen atom or a hydroxyl group. 4. The manufacturing method according to claim 1, wherein the organosilazane is in a gas phase, liquid phase, or solid phase. 5. The manufacturing method according to claim 1, characterized in that the organosilazane is brought into contact with plasma in a condensed phase state such as liquid or solid. 6. The method according to claim 1, wherein the vapor pressure of the organosilazane is brought into a plasma generation state by temperature control, and the vapor is used to generate plasma. 7. The production method according to claim 1, wherein the reaction system is left as it is or in a medium at room temperature or under heating after contacting with the plasma. 8. The manufacturing method according to claim 1, characterized in that plasma is generated under reduced pressure of 0.0001 to 100 torr and with a low applied power of 20 to 1000 watts. 9 Plasma at 50 Hz or higher with DC or AC
2. The manufacturing method according to claim 1, wherein the generation is performed over a frequency range of 100 MHz.
JP13105280A 1980-09-20 1980-09-20 Production of poly(organosilazane) Granted JPS5755928A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13105280A JPS5755928A (en) 1980-09-20 1980-09-20 Production of poly(organosilazane)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13105280A JPS5755928A (en) 1980-09-20 1980-09-20 Production of poly(organosilazane)

Publications (2)

Publication Number Publication Date
JPS5755928A JPS5755928A (en) 1982-04-03
JPS6320258B2 true JPS6320258B2 (en) 1988-04-27

Family

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Country Status (1)

Country Link
JP (1) JPS5755928A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3741059A1 (en) * 1987-12-04 1989-06-15 Hoechst Ag POLYSILAZANES, METHOD FOR THE PRODUCTION THEREOF, CERAMIC MATERIALS CONTAINING THEIR PRODUCTABLE SILICON NITRIDE, AND THEIR PRODUCTION

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
JOURNAL OF APPLIED POLYMER SCIENCE=1977 *

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