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JPS6320570B2 - - Google Patents
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JPS6320570B2 - - Google Patents

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Publication number
JPS6320570B2
JPS6320570B2 JP53164346A JP16434678A JPS6320570B2 JP S6320570 B2 JPS6320570 B2 JP S6320570B2 JP 53164346 A JP53164346 A JP 53164346A JP 16434678 A JP16434678 A JP 16434678A JP S6320570 B2 JPS6320570 B2 JP S6320570B2
Authority
JP
Japan
Prior art keywords
substrate
amorphous
producing
amorphous material
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53164346A
Other languages
Japanese (ja)
Other versions
JPS5588843A (en
Inventor
Koichi Kugimya
Koji Nitsuta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP16434678A priority Critical patent/JPS5588843A/en
Publication of JPS5588843A publication Critical patent/JPS5588843A/en
Publication of JPS6320570B2 publication Critical patent/JPS6320570B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Thin Magnetic Films (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Description

【発明の詳細な説明】 本発明は、非晶質体の製造方法に関し、その目
的とするところは従来にない新しい型式の非晶質
材料の製造方法を提供することにある。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for producing an amorphous material, and an object thereof is to provide a method for producing a new type of amorphous material that has not been seen before.

従来より、急冷により非晶質化する方法は種種
に提案されている。たとえば蒸着法やスパツター
法では、厚みは数μmに限られ、膜厚の大きなも
のを提供することは困難である。またガン法やピ
ストン・アンビル法では不定形の小さな薄片しか
得られない。ロール法はこれらに比べて、はるか
に量産性に富んでいるが、テープ状のものしか得
られず、一瞬のうちに数十mのテープ状非晶質物
ができるため制御が非常に困難であると共に、多
層化したものや複合体を製造し得ない。ごく最近
のレーザー法では、バルク体の極く表面層しか非
晶質化できない。これらの方法にみられるよう
に、従来の方法では、形状、大きさなどに制限が
あり、このため応用にも種々の制約がついてい
る。
Conventionally, various methods have been proposed for making amorphous material by rapid cooling. For example, with the vapor deposition method or the sputtering method, the thickness is limited to several μm, and it is difficult to provide a film with a large thickness. Furthermore, the gun method and piston-anvil method yield only small, irregularly shaped flakes. The roll method is much more suitable for mass production than these methods, but only tape-shaped products can be obtained, and it is extremely difficult to control as tens of meters of tape-shaped amorphous material can be produced in an instant. In addition, it is not possible to manufacture multi-layered products or composites. With the most recent laser methods, only the very surface layer of a bulk body can be amorphized. As seen in these methods, the conventional methods have restrictions on shape, size, etc., and therefore have various restrictions on application.

そこで本発明はこのような従来の欠点を解消
し、非常に制御のし易すい方法を提供すると共
に、従来作りえなかつた非晶質の複合厚膜の製造
方法を提供するものである。
Therefore, the present invention eliminates these conventional drawbacks, provides a method that is extremely easy to control, and provides a method for manufacturing an amorphous composite thick film that has not been possible in the past.

以下、本発明の一実施例を図に基づいて説明す
る。第1図において、1は溶射口2を有する憤射
ノズル、3は該ノズル1に形成された溶射口2に
連通する微小粒子の供給口、4はノズル1の上記
溶射口2の後部に形成された高圧ガス導入口、5
は上記溶射口2の前方に配設された基体であつ
て、ガスの吹き出し方向イとは直交する方向に高
速移動するものである。
Hereinafter, one embodiment of the present invention will be described based on the drawings. In FIG. 1, 1 is a spray nozzle having a thermal spraying port 2, 3 is a supply port for microparticles that communicates with the thermal spraying port 2 formed in the nozzle 1, and 4 is formed at the rear of the thermal spraying port 2 of the nozzle 1. high pressure gas inlet, 5
is a base body disposed in front of the thermal spraying port 2, which moves at high speed in a direction perpendicular to the gas blowing direction A.

かかる構成において、溶射口2に発生する例え
ば酸素−プロパン炎、アーク炎、プラズマ炎など
の高温炎中に供給口3を介して微小粒子を供給し
て溶融させ、これと同時に導入口4を介して高圧
ガスを矢印イ方向へ導入し、このガスにより上記
溶解された微小粒子を飛翔させて、矢印イ方向と
は直交する方向に高速移動している基体5に衝突
させ、かつ急冷凝固させて皮膜6を形成するもの
である。
In this configuration, microparticles are supplied through the supply port 3 into a high-temperature flame such as an oxygen-propane flame, an arc flame, or a plasma flame generated at the thermal spraying port 2 to melt them, and at the same time, the particles are supplied through the introduction port 4 to melt them. A high-pressure gas is introduced in the direction of arrow A, and this gas causes the dissolved microparticles to fly and collide with the substrate 5, which is moving at high speed in a direction perpendicular to the direction of arrow A, and rapidly solidify them. This forms a film 6.

なお、上記実施例では、噴射ノズル1の溶射口
2内に供給口3を介して微小粒子を供給したが、
第2図実線で示すごとく棒状体7を溶射口2内に
挿入するようにしてもよいし、第2図仮想線で示
すごとく溶射口2の前方に棒状体7を供給するよ
うにしてもよい。
In the above embodiment, the fine particles were supplied into the spray nozzle 2 of the injection nozzle 1 through the supply port 3.
The rod-shaped body 7 may be inserted into the thermal spraying port 2 as shown by the solid line in FIG. 2, or the rod-shaped body 7 may be supplied in front of the thermal spraying port 2 as shown by the phantom line in FIG. .

ここで用いる基体5は熱放散のよいものなら、
平板状、ベルト状、円筒状のいずれの形状であつ
てもよく、円筒の場合、回転させればなおよい。
このような高速の運動のためと、一点に推積する
量が少ないため、単位面積あたりに生ずる凝固熱
はわずかであり、従つて基体5の温度上昇はわず
かである。又、放熱によつて、熱を失うために凝
固の終つた点に次の高温融液が重なつて凝固して
も、そのために温度が上昇してゆくことは少な
い。通常、基体5の温度は、100〜200℃にとどま
る。又、基体5前面や裏面に冷却ガスなどのよう
な冷却媒体を吹きかけ冷却することは有用な方法
であり、基体5の温度を100℃以下に維持するの
は容易である。このような方法では、溶融した球
形ないしは涙滴形の微小粒子は基体5に衝突した
瞬間、第3図に示すように扁平につぶれ、基体5
に密着すると同時に急冷され凝固する。微小粒子
は、例えばプラズマ溶射では音速に近い速度で飛
行していると推定される。このため、冷却速度
は、容易に106℃/secに達すると推定される。こ
の冷却速度はAu−Si系の非晶質化し易すい合金
には勿論、メタグラスと呼ばれる一連の非晶質合
金を非晶質化するのにも十分な速度である。しか
も基体5の温度は、皮膜6すなわち非晶質体が再
結晶化する温度より低く保ちうる。
If the base 5 used here has good heat dissipation,
It may be in any shape such as a flat plate, a belt, or a cylinder, and if it is a cylinder, it is better if it is rotated.
Due to such high-speed movement and because the amount of heat accumulated at one point is small, the solidification heat generated per unit area is small, and therefore the temperature rise of the base body 5 is small. Further, even if the next high-temperature melt overlaps and solidifies at the point where solidification has finished due to heat loss due to heat radiation, the temperature is unlikely to rise due to this. Usually, the temperature of the substrate 5 remains at 100 to 200°C. Further, it is a useful method to cool the substrate 5 by spraying a cooling medium such as a cooling gas on the front and back surfaces thereof, and it is easy to maintain the temperature of the substrate 5 at 100° C. or less. In this method, the moment the molten spherical or teardrop-shaped microparticles collide with the substrate 5, they are flattened as shown in FIG.
It is rapidly cooled and solidified as soon as it comes into close contact with the surface. For example, in plasma spraying, microparticles are estimated to fly at a speed close to the speed of sound. Therefore, the cooling rate is estimated to easily reach 10 6 °C/sec. This cooling rate is sufficient not only for Au-Si alloys that easily become amorphous, but also for a series of amorphous alloys called Metaglass. Moreover, the temperature of the substrate 5 can be kept lower than the temperature at which the film 6, that is, the amorphous body recrystallizes.

上述の方法を用うる時に、基体5として、長尺
のベルト状のものを使用して、長手方向に移動さ
せると共に溶射口2を基体5の横断方向に高速で
動かすとか、多数の溶射口2を段違いに並べて、
基体5全体に一様に皮膜6をつけることによつ
て、例えばテープ状の非晶質体を形成することが
できる。この時、ベルトをその長手方向ばかりで
なく、巾方向にも移動させれば、多層の非晶質皮
膜6ができる。ベルトを回転させることによつて
も同様の効果が得られる。なお基体5にサンドブ
ラストなどの前処理をしなければ、皮膜6を基体
5より容易にはぎとれるため、連続操作も可能で
ある。鏡面に仕上げた表面に対しては、特に剥離
は容易であつた。基体5一様に皮膜6をつけるた
めには、第4図に示す単一の溶射皮膜6の断面形
状からも判るように、半値巾L(最高位置Hの1/2
点の巾)毎に重ねることが必要であつて、このL
の値は、条件によつて異なるが、概略5〜20mmで
ある。溶射口2を動かす場合も、相対的に基体5
に対するピツチは、同様の5〜20mmになつている
ことが望ましい。基体5の溶射口2に対する相対
的な移動速度は一方向に約30cm/sec以上、他の
方向に0.5cm/sec以上の速度であれば十分であ
る。1回の操作でつく皮膜6の厚さは、基体5の
放冷などから制限されており、5〜50μm位が適
当であり、且つ、扱い易すい範囲であつた。さら
に溶射口2と基体5間の距離は、通常50〜300mm
が適当であつた。この範囲を越えてもよいが、操
作が困難となるため適当と云えない。
When using the above-mentioned method, a long belt-like object is used as the base 5, and the spray nozzle 2 is moved in the longitudinal direction at high speed in the transverse direction of the base 5, or a large number of spray nozzles 2 are used. Arrange them in different rows,
By uniformly applying the coating 6 to the entire substrate 5, it is possible to form, for example, a tape-shaped amorphous body. At this time, by moving the belt not only in its longitudinal direction but also in its width direction, a multilayered amorphous film 6 is formed. A similar effect can be obtained by rotating the belt. Note that if the substrate 5 is not subjected to pretreatment such as sandblasting, the coating 6 can be easily peeled off from the substrate 5, so that continuous operation is also possible. Peeling was particularly easy for mirror-finished surfaces. In order to uniformly apply the coating 6 to the substrate 5, as can be seen from the cross-sectional shape of a single sprayed coating 6 shown in FIG.
It is necessary to overlap each point (width of the point), and this L
The value varies depending on the conditions, but is approximately 5 to 20 mm. When moving the thermal spraying port 2, the base 5
It is desirable that the pitch be the same 5 to 20 mm. It is sufficient that the relative moving speed of the substrate 5 with respect to the thermal spraying port 2 is approximately 30 cm/sec or more in one direction and 0.5 cm/sec or more in the other direction. The thickness of the film 6 formed in one operation is limited by the cooling of the substrate 5, etc., and approximately 5 to 50 μm is appropriate and within a range that is easy to handle. Furthermore, the distance between the thermal spray nozzle 2 and the base 5 is usually 50 to 300 mm.
was appropriate. Although it is possible to exceed this range, it is not appropriate because the operation becomes difficult.

以上のような方法で作成した皮膜6は新たな基
体5の表面であるから、その上に次の皮膜6を重
ね、次々に多層化してゆくことは容易にできる。
この時、同一材質を多層化すれば、厚みのあるバ
ルク状の非晶質体が得られ、異質の材質を重ねれ
ば非晶質の複合材ができる。この時、一つを非晶
質合金磁性体とし、他を絶縁体とし、交互に重ね
た複合体は、渦電流を防ぎ高周波で高い透磁率を
示すことから特に有用である。勿論、非晶質体そ
のものが軟磁性材でなければならないが、絶縁材
を介した薄層であるため、渦電流などによる捐失
が少なく、理想的な磁心材料を提供することがで
きるものである。しかも、このような方法で作成
した多層間の接着力は非常に強いといつた特徴も
備えている。なお絶縁体は非晶質体でなくともア
ルミナやシリカなどの溶射酸化膜であつても何等
支障はない。このような多層体は、又、磁気ヘツ
ドにも適している。
Since the film 6 created by the method described above is the surface of a new substrate 5, it is easy to stack the next film 6 on top of it to form a multilayer structure one after another.
At this time, if the same material is multilayered, a thick bulk amorphous material can be obtained, and if different materials are layered together, an amorphous composite material can be obtained. At this time, a composite body in which one layer is made of an amorphous alloy magnetic material and the other layer is made of an insulating material is particularly useful because it prevents eddy currents and exhibits high magnetic permeability at high frequencies. Of course, the amorphous material itself must be a soft magnetic material, but since it is a thin layer interposed with an insulating material, it is less susceptible to erosion due to eddy currents and can provide an ideal magnetic core material. be. Moreover, it has the characteristic that the adhesive force between the multiple layers created by this method is extremely strong. Note that the insulator does not have to be an amorphous material, and there is no problem even if it is a thermally sprayed oxide film of alumina, silica, or the like. Such multilayer bodies are also suitable for magnetic heads.

本発明者らが検討した所、非晶質体の摩耗量は
少なく、耐摩耗性に優れたフエライト材に近いも
のであり、しかも、積層で5〜50μm厚の薄層で
あることから高周波特性が通常のパーマロイより
優れており(通常のパーマロイでは、厚さを
100μm以下にするのは難しい。このため表皮効果
で高周波特性が劣化する)、且つ、飽和磁束密度
はフエライトより高くパーマロイに近いといつた
優れた特徴を有しており、優れた磁気ヘツドが完
成されるものである。
The inventors have investigated that the amorphous material has a small amount of wear and is similar to ferrite material, which has excellent wear resistance.Moreover, since the laminated layer is a thin layer with a thickness of 5 to 50 μm, it has good high frequency characteristics. is better than normal permalloy (normal permalloy has a thickness
It is difficult to reduce the thickness to 100 μm or less. As a result, high frequency characteristics deteriorate due to the skin effect), and the saturation magnetic flux density is higher than that of ferrite and close to that of permalloy, making it an excellent magnetic head.

上述の説明や以下の実施例でも明らかなように
本発明によれば、従来、約50μm厚が限度であつ
たものが、その6倍以上の厚さのバルク状の非晶
質体ができ、現在量産化に向け開発されているロ
ーラー法のように一瞬に数十mの細長いテープ状
のものを製造する場合のように殆んど制御できな
い方法に比べて、厚さや長さ、製造速度を十分に
制御できるなどの大きな特徴を有しているのみな
らず、従来のような薄膜ばかりでなく、0.3mm以
上の厚みの厚膜や、それ以上のバルク状の非晶質
体を製造でき、従来よりその応用分野を大きく拡
げることは明白である。
As is clear from the above description and the examples below, according to the present invention, a bulk amorphous material with a thickness more than 6 times that conventionally limited to a thickness of about 50 μm can be produced. Compared to the roller method currently being developed for mass production, which can produce long, thin tapes of several tens of meters in an instant, with almost no control, it is possible to control thickness, length, and production speed. Not only does it have great features such as sufficient control, but it can also produce not only thin films like conventional ones, but also thick films with a thickness of 0.3 mm or more and bulk amorphous materials with a thickness larger than that. It is clear that the field of application will be greatly expanded compared to the past.

また厚さが増すと、高温炎と基体5間距離が近
くなり、基体5が過熱されたり、急冷条件が異な
つたりして、非晶質体の特性が異なる場合が観察
されたが、高温炎と基体5間距離が一定となるよ
うに、皮膜6の厚みが増加するに従つて基体5を
溶射口2から後退させることによつて解決でき
る。
Furthermore, as the thickness increases, the distance between the high-temperature flame and the substrate 5 becomes shorter, and the characteristics of the amorphous material may differ due to overheating of the substrate 5 or different quenching conditions. This problem can be solved by moving the base 5 back from the thermal spraying port 2 as the thickness of the coating 6 increases so that the distance between the flame and the base 5 becomes constant.

次に具体的実施例について述べる。 Next, specific examples will be described.

実施例 1 第1図において、原料粉として(Fe 0.8 Ni
0.1 Co 0.1)0.75 B 0.15 Si 0.1の溶湯をアトマ
イズして、平均粒径55μmの合金粉末を得た。プ
ラズマ出力35V,700Aで、ガスとしてArを用い、
約5Kg/hrでプラズマ溶射を行つた。この時の溶
融粒子の飛行速度は音速以上であると推定され
た。基体5は、溶射口2から110mm離れた、3mm
厚のAl板であり、2本の冷却ガス流で表面を強
制冷却した。基体5は上下に50cm/sec、左右に
1cm/secの速度で移動させてあり、溶射面は250
×150mmである。得られた皮膜6の厚みは、1.7mm
であり、X−線回析の結果、明白な回析ピークの
認めらない非晶質体であつた。
Example 1 In Fig. 1, (Fe 0.8 Ni
A molten metal of 0.1 Co 0.1) 0.75 B 0.15 Si 0.1 was atomized to obtain an alloy powder with an average particle size of 55 μm. Plasma output 35V, 700A, using Ar as gas,
Plasma spraying was performed at approximately 5Kg/hr. The flight speed of the molten particles at this time was estimated to be greater than the speed of sound. The base body 5 is 110 mm away from the spray nozzle 2, 3 mm
It is a thick Al plate, and the surface was forcibly cooled with two cooling gas streams. The base 5 is moved vertically at a speed of 50 cm/sec and horizontally at a speed of 1 cm/sec, and the sprayed surface is moved at a speed of 250 cm/sec.
×150mm. The thickness of the obtained film 6 was 1.7 mm.
As a result of X-ray diffraction, it was found to be an amorphous substance with no obvious diffraction peaks.

実施例 2 実施例1と同様の条件を設定したが、溶射口2
を基体5に平行に、かつ該基体5の移動方向に対
して直角に30cm/secで移動させ、巾30cm長さ30
mで1.2cm/secで移動する鉄板からなる基体5上
に溶射を行つた。1回の溶射した皮膜6は容易に
基体5から離れ、巾30cm、長さ30m、平均厚さ
40μmの非晶質のテープが得られた。
Example 2 The same conditions as Example 1 were set, but the thermal spray port 2
is moved parallel to the base 5 and perpendicular to the moving direction of the base 5 at a rate of 30 cm/sec, and the width is 30 cm and the length is 30 cm.
Thermal spraying was carried out on a substrate 5 made of an iron plate moving at a speed of 1.2 cm/sec. The coating 6 sprayed once is easily separated from the base 5, has a width of 30 cm, a length of 30 m, and an average thickness.
A 40 μm amorphous tape was obtained.

さらに、基体5から皮膜6を離さず、続けて同
一条件で2回溶射を行つた所、平均厚さが約
115μmの厚いテープが得られた。このテープは基
体5より容易に離すことができた。なお溶射した
3層はくり返しのおり曲げ試験でも互いに離れる
ことなく密着しており、テープが破壊しても離れ
なかつた。X−線回析の結果、すべて非晶質体と
なつていた。
Furthermore, when thermal spraying was performed twice under the same conditions without separating the coating 6 from the base 5, the average thickness was approximately
A thick tape of 115 μm was obtained. This tape could be easily separated from the substrate 5. The three thermally sprayed layers remained in close contact with each other even in repeated bending tests, and did not separate even when the tape was broken. As a result of X-ray diffraction, all of them were found to be amorphous.

実施例 3 溶射口2を3ケ、横方向に70mmずつ離し、縦方
向に14mmずつずらして設置した。基体5は、巾35
mm長さ20mのステンレス薄板である。基体5を50
cm/secで移動させたところ、厚さ平均24μmの巾
35mm長さ20mのテープ状の非晶質体をはがしとる
ことができた。
Example 3 Three thermal spray ports 2 were installed, spaced apart by 70 mm in the horizontal direction, and shifted by 14 mm in the vertical direction. The base body 5 has a width of 35
It is a thin stainless steel plate with a length of 20 m. Base 5 to 50
When moved at cm/sec, the width was 24μm on average.
I was able to peel off a tape-shaped amorphous material that was 35mm long and 20m long.

実施例 4 実施例1で得られた皮膜6上に、すぐに続けて
Ni0.8 Cr0.2の合金粉末を溶射した。第2皮膜の
厚さは0.2mmで、合計厚み1.9mmであつた。多層膜
を基体5からはがし(基体表面をサンドブラスト
していないため容易にはがすことができた)曲げ
テストをしても層間の剥離もなく、金のこで切断
しても剥離はみられなかつた。X−線回析の結
果、第1の皮膜は非晶質体であつた。
Example 4 On the coating 6 obtained in Example 1, immediately following
An alloy powder of Ni0.8 Cr0.2 was sprayed. The thickness of the second film was 0.2 mm, giving a total thickness of 1.9 mm. When the multilayer film was peeled off from the substrate 5 (it could be easily peeled off because the surface of the substrate was not sandblasted), there was no peeling between the layers when a bending test was performed, and no peeling was observed when cutting with a hacksaw. . As a result of X-ray diffraction, the first film was found to be amorphous.

実施例 5 実施例3において、溶射を終つた後、すぐに
Al2O3−2.5%TiO2微粉を5μm厚に溶射し、さら
にその上に非晶質層を溶射する操作を繰り返し、
合計20層(非晶質層、絶縁層各々10層)の厚さ約
0.6mmの巾35mm長さ20mの、非晶質、絶縁物複合
体が得られた。直角に折り曲げた所、破断したが
層間剥離は目立たなかつた。層間の接着強度は、
シリンドカルボンドテストでは約300Kg/cm2以上
と推定された。
Example 5 In Example 3, immediately after finishing thermal spraying,
Al 2 O 3 −2.5% TiO 2 fine powder was sprayed to a thickness of 5 μm, and an amorphous layer was then sprayed on top of it.
Total thickness of 20 layers (10 layers each of amorphous layer and insulating layer)
An amorphous insulator composite of 0.6 mm in width, 35 mm in length and 20 m in length was obtained. When it was bent at a right angle, it broke, but the delamination was not noticeable. The adhesive strength between layers is
Cylindrical carbon test estimated it to be about 300Kg/cm 2 or more.

実施例 6 (Co0.95 Fe0.05)0.75 B0.15 Si0.1の溶湯をア
トマイズして平均粒径60μmの合金粉末を得た。
実施例3と同様に約30μm厚に溶射した後、すぐ
にSiO2微粉を重ねて約3μmを溶射する操作を繰
り返し、各々5層、合計10層全厚約300μmに仕上
げた。この時、特に冷却効果を向上させるため
に、基体5の裏面に液体窒素を噴射し、冷却し
た。パーマロイやセンダストといつた磁性合金を
30μmの薄板にするのは容易でないが、このよう
な薄板を積層して同一形状にした磁気ヘツドを比
べた所、電磁気特性は、これら三者の間に大差は
なかつた。しかし1%NaClによる耐蝕テストで
は、本発明による非晶ヘツドでは殆んど腐蝕は見
られなかつたのに対し、パーマロイやセンダスト
は著しく腐蝕された。耐摩耗性は、パーマロイや
センダストの75μm,35μm(100時間あたりの摩耗
量)に対して、13μmであり、MnZnフエライト
の10μmに近い。即ち、本発明実施例の磁気ヘツ
ドは、金属ヘツドの優れた電磁気特性を有すると
共に、フエライトなみの耐蝕、耐摩耗性を示す優
れたものであつた。
Example 6 A molten metal of (Co0.95 Fe0.05)0.75 B0.15 Si0.1 was atomized to obtain an alloy powder with an average particle size of 60 μm.
After thermal spraying to a thickness of about 30 μm in the same manner as in Example 3, SiO 2 fine powder was immediately layered and thermal sprayed to a thickness of about 3 μm, which was repeated to obtain a total thickness of about 300 μm, 5 layers each, 10 layers in total. At this time, in order to particularly improve the cooling effect, liquid nitrogen was injected onto the back surface of the substrate 5 to cool it. Magnetic alloys such as permalloy and sendust
Although it is not easy to make a 30 μm thin plate, when we compared magnetic heads made by laminating such thin plates into the same shape, there was no significant difference in electromagnetic properties between the three. However, in a corrosion resistance test using 1% NaCl, almost no corrosion was observed in the amorphous head according to the present invention, whereas Permalloy and Sendust were significantly corroded. The wear resistance is 13 μm, which is close to 10 μm for MnZn ferrite, compared to 75 μm and 35 μm (wear amount per 100 hours) for Permalloy and Sendust. That is, the magnetic head of the present invention had excellent electromagnetic properties as a metal head, and also exhibited excellent corrosion resistance and abrasion resistance comparable to ferrite.

実施例 7 アトマイズするかわりに、溶湯を細いパイプ中
に吸い上げ約3mmの直径の線状に仕上げた。これ
を定量的にプラズマ炎中に挿入し、実施例1と同
様に溶射を行なつたところ(第2図参照):実施
例1と同様の結果を得た。即ち、粉体供給であつ
ても、棒状体供給であつても大きな変化はないこ
とが判明した。又、以上の実施例ではプラズマ炎
についてのみ説明したが、溶融微小粒子を形成す
るには、アーク炎や酸素−プロパン炎などの高温
炎にも適用し得ることはいうまでもない。
Example 7 Instead of atomizing, the molten metal was drawn up into a thin pipe and formed into a linear shape with a diameter of about 3 mm. When this was quantitatively inserted into a plasma flame and thermal sprayed in the same manner as in Example 1 (see FIG. 2), the same results as in Example 1 were obtained. In other words, it was found that there was no significant change whether powder was supplied or rod-shaped bodies were supplied. Furthermore, although only plasma flames have been described in the above embodiments, it goes without saying that high-temperature flames such as arc flames and oxygen-propane flames can also be applied to form molten microparticles.

以上述べたごとく本発明の非晶質体の製造方法
によれば制御の非常に容易な非晶質体の製造方法
を提供することができると共に従来できなかつた
広巾のものや厚板状の非晶質体や、多層複合層を
容易に形成できる方法を提供できるものであつ
て、これによつてトランス磁芯や磁気ヘツドなど
の優れた材料を提供することができるものであ
り、非晶質体の応用を著しく拡大する優れたもの
である。
As described above, according to the method for manufacturing an amorphous body of the present invention, it is possible to provide a method for manufacturing an amorphous body that is extremely easy to control, and it is also possible to provide a method for manufacturing an amorphous body that is extremely easy to control. It is possible to provide a method for easily forming crystalline bodies and multilayer composite layers, and thereby to provide excellent materials such as transformer magnetic cores and magnetic heads. It is an excellent product that significantly expands the applications of the body.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例を示す概略縦断面
図、第2図は本発明の他の実施例を示す要部の概
略縦断面図、第3図は微小粒子が基体に衝突して
急冷冷された状態の断面図、第4図は溶射を一直
線状に行つた状態の断面図である。 2……溶射口、3……微小粒子の供給口、5…
…基体、6……皮膜(非晶質体)、7……棒状体。
FIG. 1 is a schematic vertical cross-sectional view showing one embodiment of the present invention, FIG. 2 is a schematic vertical cross-sectional view of the main part showing another embodiment of the present invention, and FIG. FIG. 4 is a cross-sectional view of the quenched state, and FIG. 4 is a cross-sectional view of the state where thermal spraying is performed in a straight line. 2... thermal spraying port, 3... fine particle supply port, 5...
...Substrate, 6... Film (amorphous body), 7... Rod-shaped body.

Claims (1)

【特許請求の範囲】 1 高温炎で原料粉体を溶融した状態で不活性な
高圧ガス流により飛翔させるか、あるいは棒状原
料を溶融した状態で不活性な高圧ガス流により噴
霧微細化し溶融した微小粒子となし飛翔させて、
その飛翔方向とは直交する方向に高速移動する基
体に一回または複数回衝突させ、かつ急冷して基
体上に非晶質体を形成することを特徴とする非晶
質体の製造方法。 2 同一原料からなる微小粒子を基体に複数回衝
突させたことを特徴とする特許請求の範囲第1項
記載の非晶質体の製造方法。 3 2種類以上の原料からなる微小粒子をそれぞ
れ基体に衝突させ、かつ急冷して基体上に2種類
以上の異質層からなる非晶質体を形成したことを
特徴とする特許請求の範囲第1項記載の非晶質体
の製造方法。 4 長尺の基体を一方向へ高速移動させ、高温炎
を基体の移動方向とは直交する方向に移動させて
上記高温炎により基体表面全体を覆うことを特徴
とする特許請求の範囲第1項記載の非晶質体の製
造方法。 5 複数の高温炎を適当間隔ごとに並べ、長尺の
基体を一方向へ高速移動させて上記各高温炎によ
り基体表面全体を覆うことを特徴とする特許請求
の範囲第1項記載の非晶質体の製造方法。 6 基体に冷却媒体を噴射し、基体の温度上昇を
抑制することを特徴とする特許請求の範囲第1項
記載の非晶質体の製造方法。 7 基体の非晶質体が付着する面を鏡面に仕上げ
たことを特徴とする特許請求の範囲第1項〜第5
項のいずれかに記載の非晶質体の製造方法。 8 基体の非晶質体が付着する面を粗面化したこ
とを特徴とする特許請求の範囲第1項〜第5項の
いずれかに記載の非晶質体の製造方法。 9 基板上の非晶質体の厚みが増加するに従つて
高温炎と基体とを相対的に離間させて高温炎と非
晶質表面との間の間隙を一定に保つことを特徴と
する特許請求の範囲第1項〜第5項のいずれかに
記載の非晶質体の製造方法。
[Scope of Claims] 1. A raw material powder is melted in a high-temperature flame and then blown away by an inert high-pressure gas flow, or a rod-shaped raw material is melted and atomized by an inert high-pressure gas flow to create molten microscopic particles. Let particles fly,
A method for producing an amorphous material, which comprises colliding once or multiple times with a substrate moving at high speed in a direction perpendicular to the flight direction, and rapidly cooling the substrate to form an amorphous material on the substrate. 2. A method for producing an amorphous material according to claim 1, characterized in that microparticles made of the same raw material are made to collide with a substrate multiple times. 3. Claim 1, characterized in that microparticles made of two or more types of raw materials are collided with a substrate and rapidly cooled to form an amorphous body consisting of two or more types of heterogeneous layers on the substrate. 2. Method for producing an amorphous material as described in Section 1. 4. Claim 1, characterized in that the elongated substrate is moved at high speed in one direction, and the high-temperature flame is moved in a direction perpendicular to the moving direction of the substrate, so that the entire surface of the substrate is covered with the high-temperature flame. A method for producing the described amorphous body. 5. The amorphous material according to claim 1, wherein a plurality of high-temperature flames are arranged at appropriate intervals, and a long substrate is moved at high speed in one direction to cover the entire surface of the substrate with each of the high-temperature flames. How to make a solid body. 6. The method for producing an amorphous material according to claim 1, characterized in that a cooling medium is injected onto the substrate to suppress a rise in temperature of the substrate. 7. Claims 1 to 5, characterized in that the surface of the substrate to which the amorphous material adheres is mirror-finished.
A method for producing an amorphous body according to any one of paragraphs. 8. The method for producing an amorphous material according to any one of claims 1 to 5, wherein the surface of the substrate to which the amorphous material adheres is roughened. 9. A patent characterized in that as the thickness of the amorphous material on the substrate increases, the gap between the high temperature flame and the amorphous surface is maintained constant by relatively separating the high temperature flame and the substrate. A method for producing an amorphous body according to any one of claims 1 to 5.
JP16434678A 1978-12-27 1978-12-27 Production of amorphous body Granted JPS5588843A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16434678A JPS5588843A (en) 1978-12-27 1978-12-27 Production of amorphous body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16434678A JPS5588843A (en) 1978-12-27 1978-12-27 Production of amorphous body

Publications (2)

Publication Number Publication Date
JPS5588843A JPS5588843A (en) 1980-07-04
JPS6320570B2 true JPS6320570B2 (en) 1988-04-28

Family

ID=15791413

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16434678A Granted JPS5588843A (en) 1978-12-27 1978-12-27 Production of amorphous body

Country Status (1)

Country Link
JP (1) JPS5588843A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10773267B2 (en) 2012-01-13 2020-09-15 Usui Co., Ltd. Device for forming amorphous film and method for forming same

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02240252A (en) * 1989-03-13 1990-09-25 Natl Res Inst For Metals Method and device for plasma vapor deposition
JP2669308B2 (en) * 1993-10-01 1997-10-27 株式会社デンソー Amorphous coating and method for forming the same
AT1984U1 (en) * 1997-04-22 1998-02-25 Plansee Ag METHOD FOR PRODUCING AN ANODE FOR X-RAY TUBES
WO2008020585A1 (en) 2006-08-14 2008-02-21 Nakayama Steel Works, Ltd. Method and apparatus for forming amorphous coating film
JP5905265B2 (en) * 2012-01-13 2016-04-20 株式会社中山アモルファス High production efficiency amorphous sheet manufacturing method and manufacturing equipment

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50103431A (en) * 1974-01-23 1975-08-15

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10773267B2 (en) 2012-01-13 2020-09-15 Usui Co., Ltd. Device for forming amorphous film and method for forming same

Also Published As

Publication number Publication date
JPS5588843A (en) 1980-07-04

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