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JPS633007B2 - - Google Patents
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JPS633007B2 - - Google Patents

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Publication number
JPS633007B2
JPS633007B2 JP5381984A JP5381984A JPS633007B2 JP S633007 B2 JPS633007 B2 JP S633007B2 JP 5381984 A JP5381984 A JP 5381984A JP 5381984 A JP5381984 A JP 5381984A JP S633007 B2 JPS633007 B2 JP S633007B2
Authority
JP
Japan
Prior art keywords
forsterite
annealing
film
silicon steel
rolled
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP5381984A
Other languages
Japanese (ja)
Other versions
JPS60197883A (en
Inventor
Toyohiko Konno
Yozo Suga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Steel Corp
Original Assignee
Nippon Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Steel Corp filed Critical Nippon Steel Corp
Priority to JP5381984A priority Critical patent/JPS60197883A/en
Publication of JPS60197883A publication Critical patent/JPS60197883A/en
Publication of JPS633007B2 publication Critical patent/JPS633007B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C26/00Coating not provided for in groups C23C2/00 - C23C24/00
    • CCHEMISTRY; METALLURGY
    • C21METALLURGY OF IRON
    • C21DMODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
    • C21D8/00Modifying the physical properties of ferrous metals or ferrous alloys by deformation combined with, or followed by, heat treatment
    • C21D8/12Modifying the physical properties of ferrous metals or ferrous alloys by deformation combined with, or followed by, heat treatment during manufacturing of articles with special electromagnetic properties

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Electromagnetism (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Chemical Treatment Of Metals (AREA)
  • Manufacturing Of Steel Electrode Plates (AREA)
  • Heat Treatment Of Sheet Steel (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

(産業上の利用分野) 本発明は高磁束密度一方向性珪素鋼板の表面に
MgO−SiO2系絶縁皮膜を形成する方法に関する
ものである。 (従来技術) 一方向性珪素鋼板表面のフオルステライトを主
体としたMgO−SiO2系絶縁皮膜は製品外観を整
えるばかりでなく、鋼板間に必要な層間抵抗を与
え、また、鋼板とフオルステライト皮膜間に働く
引つ張り応力により製品鉄損を低下させるという
磁気特性的にも重要な役割りを持つている。 このフオルステライト皮膜は通常、次のような
方法で生成される。まず、約3〜4重量%の珪素
を含む一方向性珪素鋼用素材を1回ないし、中間
焼鈍をはさむ2回以上の冷延により最終板厚にし
た後、湿水素中で700〜900℃の範囲で脱炭焼鈍を
施し、同時にSiO2を含む酸化皮膜を鋼板表面に
形成する。ついでMgOを主成分とするスラリー
状の焼鈍分離材を鋼板表面に塗布した後、コイル
状に巻きとり、最終仕上焼鈍を行ない、この間に
起こるMgO−SiO2系固相反応を利用してフオル
ステライト(Mg2SiO4)を形成させる。 しかしながら、この時生成されるフオルステラ
イト皮膜の性質は脱炭酸化皮膜の性状、マグネシ
アの種類、マグネシアパウダーへの微量添加物の
量と性質、あるいは仕上焼鈍時の雰囲気などに左
右され、機械的・磁気的に優れた特性を備えたフ
オルステライト皮膜の形成法に関してこれまで多
くの研究がなされてきた。 例えば特公昭51−12451号公報によればマグネ
シアパウダー中にTiO2を添加することにより密
着性、均一性に優れたフオルステライト皮膜が得
られることが報告されている。また特開昭54−
66935号公報では、平均粒径が細かいフオルステ
ライト粒子からなる密着性の良好なフオルステラ
イト皮膜を得るため、マグネシアパウダー中の
CaOと水分量を適正管理することが開示されてい
る。さらに特開昭55−58331号公報では使用する
マグネシアの活性度を限定することにより、良好
なフオルステライト皮膜を得る方法が開示されて
いる。 これらの方法に共通することは、いずれもがマ
グネシアを主成分とする焼鈍分離材の改良に関す
る提案であり、それらはそれぞれ効果の認められ
るものも多いが、工業的な面からはコスト高に結
びついたり、工程管理が困難である場合が多い。
さらに、より本質的な問題点は、鋼板表面の
MgO−SiO2系固相反応によりフオルステライト
皮膜を形成する際、このように焼鈍分離材、つま
りMgOの側だけ一方的に規定しても、得られる
フオルステライト皮膜の特性向上には限界がある
ということである。例えば、このような方法で得
られるフオルステライト皮膜の鋼板張力は高々
400g/mm2程度であり、実際の工程では特公昭53
−28375号公報に開示されてるように、フオルス
テライト皮膜の上にさらにコロイダルシリカ等を
主成分とする二次コーテイングを行ない鋼板張力
を向上させる必要がある。 一方、仕上焼鈍中の雰囲気を規定するものとし
ては、特開昭50−116998号公報、同55−110726号
公報に示された鉄及び鉄酸化物に対する不活性の
中性ガス通入法、あるいは特開昭53−5800号公報
に見られる露点の制御法などがある。 これらの方法は主に特開昭49−61019号公報に
示される磁束密度の高い一方向性珪素鋼板の製造
方法におけるフオルステライト皮膜形成方法の問
題点を解決するために提案されたものである。す
なわち、特開昭49−61019号公報に開示された方
法では最終仕上焼鈍中800〜920℃の間を一定温度
で10〜100時間加熱することが必要であるが、そ
の間、酸化スケール中の酸化鉄に対し、還元性の
雰囲気を与えるとフオルステライト皮膜の著しい
不良が発生することが判明し、そのため雰囲気を
中性もしくは不活性とすることが必要とされた
(特開昭50−116998号公報、同55−110726号公
報)。また、800〜920℃間の恒温保持後、1150〜
1250℃までの昇温時の雰囲気を水素ガスとし、そ
の時の露点を−20〜+20℃の範囲にし、さらにそ
の後の平均露点を+10℃以下にすることにより、
フオルステライト平均粒径を0.7μm以下にする方
法が特開昭53−5800号公報により開示された。前
者の提案はMgO−SiO2反応時の鋼板側の適正
SiO2量を確保するものであり、後者の提案は反
応開始時のフオルステライト粒の発生とその後の
粒成長を雰囲気の酸素分圧により制御しようとす
るものである。 これらの方法はいずれも特開昭49−61019号公
報に示された800〜920℃間の一定温度で恒温保持
することを特徴とする最終仕上焼鈍を前提として
提案されたフオルステライト絶縁皮膜の形成方法
であり、その他の仕上焼鈍サイクルに対して必ず
しも一般性があるとは言えない。また得られるフ
オルステライト皮膜の平均結晶粒径が0.7μm以下
であつても、皮膜の曲げ密着性は最小はく離半径
で10mm程度であり、必ずしも充分な密着性が確保
されたとは言えない。さらにこのような方法では
皮膜が鋼板に与える張力も不充分で、コロイダル
シリカを主成分とした二次コーテイングが必要と
される場合が多く、製造コストの上昇に結びつい
ている。 (発明の目的) 本発明の目的は従来のフオルステライト皮膜製
造方法におけるこれらの諸欠点を除去改善し、密
着性と鋼板に与える張力が大きく、さらに磁気特
性の著しく優れたフオルステライト皮膜の製造法
を提供することにある。 本発明によればフオルステライトの発生する核
が鋼板表面酸化スケール中にMnOとして形成さ
れるために、フオルステライト組織が鋼板内部に
喰い込んで極めて密着性が良好となり、この結果
高い張力を鋼板に与えることが出来、之により磁
性特性を向上せしめうるのである。 (発明の構成) 以下本発明を詳細に説明する。 本発明により得られるフオルステライト皮膜の
特徴は張力が500g/mm2以上、フオルステライト
平均粒径0.5μm以下、そして最小はく離半径3mm
に相当する密着性を持つことである。第2図にこ
のようなフオルステライト皮膜による鉄損の向上
代を従来材との比較において示した。図中に示し
たように本発明で得られるフオルステライト皮膜
による鉄損の向上代はB8=1.910(T)の成品で約
0.2W/Kgであり、これは従来技術と比較して
0.1W/Kg以上も大きい。本発明者等はこのよう
なフオルステライト皮膜を得るためには、鋼中の
Mn活量を充分に高め、かつ、仕上焼鈍中、Mn
活量に応じて一定の酸素分圧を与えることが重要
であることを新規に見い出し、そのためにS+
0.405Se≦0.010かつ0.8≧Mn≧0.05+7(S+
0.405Se)とし、さらに仕上焼鈍中850〜1100℃の
温度範囲における適正酸素分圧はMn−1.719(S
+0.405Se)に依存し、具体的には第1図の斜線
の領域(図中ABCDEで囲まれた領域)に確保す
ることが必要であるとの結論に達したものであ
る。 更に本発明を詳細に説明する。 方向性珪素鋼の表面のフオルステライト皮膜は
脱炭焼鈍時に形成されたSiO2を主体とする酸化
スケールと、その後に塗布されたMgOを主成分
とする焼鈍分離材が仕上焼鈍中、固相反応を起こ
すことにより生成する。 本発明者等はこのフオルステライト皮膜の形状
と結晶粒度を走査型電子顕微鏡(以下走査型電顕
と略す)による直接観察及び2段レプリカ法によ
る透過電子顕微鏡を用いた間接観察により調査
し、フオルステライト平均結晶粒径は鋼中のフリ
ーMn量(MnS或いはMnSeとして固定されてい
ないMn量)及び仕上焼鈍中850℃〜1100℃の雰
囲気、特にその酸素分圧に依存することを新規に
知見した。さらにフリーMn量とフオルステライ
ト皮膜の有する面張力との間にも明瞭な関係があ
ることを見出し、磁気特性向上効果の極めて優れ
たフオルステライト皮膜を形成するためには後述
するような鋼中のMn、S、Se量と仕上焼鈍雰囲
気を限定することが必要であることを確認した。 第3図には3.3%Si鋼中の異なつたMn及びS量
を持つ脱炭焼鈍表面に5%TiO2を含むマグネシ
アを塗布した後、PH2O/PH2=4×10-3の雰囲気
下で仕上焼鈍した時のフオルステライト皮膜の面
張力と鋼中Mn量(トータルMn量)との関係を
示したものである。このように鋼中Mn量の増加
により550g/mm2以上の面張力が得られることを
実験的に確認した。さらに同図中にも示された通
り、鋼中S量の低下によりMnによる張力増大効
果は一層顕著となることが明らかとなつた。この
ことは鋼中のMn量、特にMnSやMnSeの形でト
ラツプされている以外のフリーMn量、より正確
にはMn活量がフオルステライトの性質を決める
上で重要であることを示すものである。この実験
でMn量が重要であることは判明したが、Mn量
とSあるいはSe等のトラツプ元素との関係につ
いては一応の傾向は認められたものの、定量的な
判定には至らず、次に走査型電顕及び2段レプリ
カによるフオルステライト皮膜の観察を行なつた
結果、フオルステライト粒径が条件によつて変わ
ることを見出した。 一般にフオルステライト粒径はグラス張力に極
めて大きな影響を持つが、この鋼板に及ぼすグラ
ス張力が生じる機構は次のように考えられる。 仕上焼鈍の冷却過程で鋼板は収縮しようとする
のに対し、収縮量の小さいフオルステライト結晶
は鋼板の収縮に対して抵抗となり、結果として鋼
板に張力を与えることになる。この抵抗はフオル
ステライト組織の高温強度の高いもの、即ち、フ
オルステライト結晶粒径の小さい場合に大きくな
り、鋼板に強い張力を与えることになる。実験の
結果、フオルステライト結晶粒径が0.5μm以下で
あれば500g/mm2以上の鋼板張力を与えることが
できることが判明した。 但し、かかる条件下でグラスが剥離しないこと
が必須条件であるが、本発明では前述のように密
着性が極めて良いのでこの条件を満足できる。 第4図にはMn及びS量の異なつた鋼板のフオ
ルステライト皮膜の走査型電顕像及び2段レプリ
カ写真を示した(Mn及びS量は第5図a〜dに
対応する。)。この時用いたマグネシアパウダーは
5%TiO2を含有し、また、仕上焼鈍時の酸素分
圧はPH2O/PH2=4×10-3である。このようにフ
オルステライト皮膜の外観及び結晶粒度は鋼中の
Mn及びS量に強く依存することが明らかとなつ
た。 第5図はこのような解析を他のMn及びS量の
ものについて広く行なつた結果を、一括して示し
たものである。図中に示したようにフオルステラ
イト結晶粒度を0.5μm以下とするためにはMn≧
0.05+7S(Mn、s:重量%)であることが必要で
ある。 次に仕上焼鈍中の雰囲気の効果を調べるため、
鋼中のフリーMn量に対し、雰囲気の酸素分圧を
種種の値に変えて仕上焼鈍を行ない、得られたフ
オルステライト皮膜の特性を調べた。一例として
第6図にMn=0.2wt%、S=0.005wt%の素材を
850〜1100℃の間、(a)PH2O/PH2=2.5×10-4、(b)
PH2O/PH2=1.5×10-2で焼鈍した時のフオルステ
ライト皮膜の2段レプリカ写真を示した。また、
表1にはこの例で得られたフオルステライト皮膜
の特性を示した。
(Industrial Application Field) The present invention applies to the surface of a high magnetic flux density unidirectional silicon steel plate.
The present invention relates to a method of forming an MgO-SiO 2 -based insulating film. (Prior art) The MgO-SiO 2 insulating film mainly composed of forsterite on the surface of the unidirectional silicon steel sheet not only improves the appearance of the product, but also provides the necessary interlayer resistance between the steel sheets. It also plays an important role in terms of magnetic properties, reducing product iron loss due to the tensile stress that acts between them. This forsterite film is usually produced by the following method. First, a material for unidirectional silicon steel containing about 3 to 4% by weight of silicon is cold rolled once or twice or more with intermediate annealing to the final thickness, and then heated at 700 to 900°C in wet hydrogen. Decarburization annealing is performed within the range of 100 to 100 ml, and at the same time an oxide film containing SiO 2 is formed on the surface of the steel sheet. Next, a slurry-like annealing separation material containing MgO as the main component is applied to the surface of the steel sheet, then wound into a coil and subjected to final annealing. The MgO-SiO 2 solid phase reaction that occurs during this process is used to form forsterite. (Mg 2 SiO 4 ) is formed. However, the properties of the forsterite film produced at this time depend on the properties of the decarboxylated film, the type of magnesia, the amount and properties of trace additives to the magnesia powder, or the atmosphere during final annealing, and are affected by mechanical and Many studies have been conducted on methods for forming forsterite films with excellent magnetic properties. For example, Japanese Patent Publication No. 51-12451 reports that a forsterite film with excellent adhesion and uniformity can be obtained by adding TiO 2 to magnesia powder. Also, JP-A-54-
In Publication No. 66935, in order to obtain a forsterite film with good adhesion consisting of forsterite particles with a small average particle size, magnesia powder is
Appropriate management of CaO and water content is disclosed. Further, JP-A-55-58331 discloses a method for obtaining a good forsterite film by limiting the activity of magnesia used. What these methods have in common is that they all propose improvements to annealed separators whose main component is magnesia, and although many of them are recognized to be effective, from an industrial perspective, they lead to high costs. In many cases, process control is difficult.
Furthermore, the more fundamental problem is that the steel plate surface
When forming a forsterite film by MgO-SiO 2 solid-phase reaction, there is a limit to the improvement in the properties of the resulting forsterite film even if only the annealing separation material, that is, the MgO side is unilaterally specified. That's what it means. For example, the steel plate tension of the forsterite film obtained by this method is very high.
It is about 400g/mm2, and in the actual process
As disclosed in Japanese Patent No. 28375, it is necessary to further improve the tension of the steel plate by applying a secondary coating mainly composed of colloidal silica or the like on the forsterite film. On the other hand, methods for regulating the atmosphere during finish annealing include the inert neutral gas introduction method for iron and iron oxides disclosed in JP-A-50-116998 and JP-A-55-110726; There is a dew point control method as found in Japanese Unexamined Patent Publication No. 53-5800. These methods were mainly proposed to solve the problems of the forsterite film forming method in the method of manufacturing unidirectional silicon steel sheets with high magnetic flux density, as disclosed in Japanese Patent Application Laid-Open No. 49-61019. That is, in the method disclosed in JP-A No. 49-61019, it is necessary to heat at a constant temperature of 800 to 920°C for 10 to 100 hours during final annealing, but during the final annealing, the oxidation in the oxide scale It was discovered that applying a reducing atmosphere to iron causes significant defects in the forsterite film, and therefore it was necessary to make the atmosphere neutral or inert (Japanese Patent Application Laid-Open No. 116998/1983). , No. 55-110726). In addition, after constant temperature maintenance between 800 and 920℃, 1150~
By using hydrogen gas as the atmosphere when the temperature is raised to 1250℃, keeping the dew point at that time in the range of -20 to +20℃, and then keeping the average dew point below +10℃,
A method for reducing the average grain size of forsterite to 0.7 μm or less was disclosed in JP-A-53-5800. The former proposal is based on the suitability of the steel plate during the MgO− SiO2 reaction.
The latter proposal attempts to control the generation of forsterite grains at the start of the reaction and subsequent grain growth by controlling the oxygen partial pressure of the atmosphere. All of these methods are based on the premise of final annealing, which is characterized by constant temperature maintenance at a constant temperature between 800 and 920°C, as shown in Japanese Patent Application Laid-Open No. 49-61019. This method cannot necessarily be said to be general to other finish annealing cycles. Further, even if the average crystal grain size of the forsterite film obtained is 0.7 μm or less, the bending adhesion of the film is about 10 mm at the minimum peeling radius, and it cannot be said that sufficient adhesion is necessarily ensured. Furthermore, in such a method, the tension applied to the steel sheet by the coating is insufficient, and a secondary coating mainly composed of colloidal silica is often required, leading to an increase in manufacturing costs. (Objective of the Invention) The purpose of the present invention is to eliminate and improve the various drawbacks of the conventional forsterite film production method, and to provide a method for producing a forsterite film that has high adhesion and tension on steel sheets, and has extremely excellent magnetic properties. Our goal is to provide the following. According to the present invention, since the nucleus of forsterite is formed as MnO in the oxidized scale on the surface of the steel sheet, the forsterite structure digs into the inside of the steel sheet, resulting in extremely good adhesion, and as a result, high tension is applied to the steel sheet. Therefore, the magnetic properties can be improved. (Structure of the Invention) The present invention will be described in detail below. The characteristics of the forsterite film obtained by the present invention are that the tension is 500 g/mm 2 or more, the average forsterite particle size is 0.5 μm or less, and the minimum peeling radius is 3 mm.
It is to have adhesion equivalent to . Figure 2 shows the improvement in iron loss due to such a forsterite film in comparison with conventional materials. As shown in the figure , the improvement in iron loss due to the forsterite film obtained in the present invention is approximately
0.2W/Kg, which is compared to conventional technology.
It is also larger than 0.1W/Kg. The present inventors believe that in order to obtain such a forsterite film,
The Mn activity is sufficiently increased, and during final annealing, Mn
We have newly discovered that it is important to provide a constant oxygen partial pressure depending on the activity, and for this purpose, S +
0.405Se≦0.010 and 0.8≧Mn≧0.05+7 (S+
0.405Se), and the appropriate oxygen partial pressure in the temperature range of 850 to 1100℃ during final annealing is Mn-1.719 (S
+0.405Se), and specifically, it was concluded that it is necessary to secure it in the diagonally shaded area in Figure 1 (the area surrounded by ABCDE in the figure). Further, the present invention will be explained in detail. The forsterite film on the surface of grain-oriented silicon steel is composed of an oxide scale mainly composed of SiO 2 formed during decarburization annealing, and an annealing separation material mainly composed of MgO applied afterward, which undergoes a solid phase reaction during finish annealing. It is generated by causing . The present inventors investigated the shape and crystal grain size of this forstellite film by direct observation using a scanning electron microscope (hereinafter referred to as scanning electron microscope) and indirect observation using a transmission electron microscope using a two-stage replica method. It was newly discovered that the average grain size of tellite depends on the amount of free Mn in the steel (the amount of Mn that is not fixed as MnS or MnSe) and the atmosphere at 850℃ to 1100℃ during final annealing, especially the oxygen partial pressure. . Furthermore, they found that there is a clear relationship between the amount of free Mn and the surface tension of the forsterite film, and found that in order to form a forsterite film that has an extremely excellent effect of improving magnetic properties, it is necessary to It was confirmed that it was necessary to limit the amounts of Mn, S, and Se and the final annealing atmosphere. Figure 3 shows that magnesia containing 5% TiO 2 was applied to the decarburized annealed surface of 3.3% Si steel with different amounts of Mn and S in an atmosphere of P H2O /P H2 = 4 × 10 -3 . This figure shows the relationship between the surface tension of the forsterite film and the amount of Mn in the steel (total amount of Mn) when finish annealing is performed. It has been experimentally confirmed that a surface tension of 550 g/mm 2 or more can be obtained by increasing the amount of Mn in the steel. Furthermore, as shown in the figure, it has become clear that the tension increasing effect of Mn becomes even more pronounced as the amount of S in the steel decreases. This indicates that the amount of Mn in the steel, especially the amount of free Mn other than those trapped in the form of MnS and MnSe, and more precisely the Mn activity, are important in determining the properties of forsterite. be. This experiment revealed that the amount of Mn is important, but although a certain tendency was observed regarding the relationship between the amount of Mn and trap elements such as S or Se, a quantitative determination could not be made. As a result of observing the forsterite film using a scanning electron microscope and a two-stage replica, it was found that the forsterite particle size changes depending on the conditions. Generally, the forsterite grain size has a very large effect on glass tension, but the mechanism by which glass tension is produced on the steel plate is thought to be as follows. While the steel plate tends to shrink during the cooling process of final annealing, the forsterite crystals, which have a small amount of shrinkage, act as resistance to the shrinkage of the steel plate, and as a result, give tension to the steel plate. This resistance increases when the forsterite structure has high high-temperature strength, that is, when the forsterite crystal grain size is small, and a strong tension is applied to the steel sheet. As a result of experiments, it was found that if the forsterite crystal grain size is 0.5 μm or less, a steel plate tension of 500 g/mm 2 or more can be applied. However, it is an essential condition that the glass does not peel off under such conditions, and this condition can be satisfied in the present invention because the adhesiveness is extremely good as described above. FIG. 4 shows scanning electron microscope images and two-stage replica photographs of forsterite coatings on steel sheets with different amounts of Mn and S (the amounts of Mn and S correspond to FIGS. 5 a to d). The magnesia powder used at this time contained 5% TiO 2 , and the oxygen partial pressure during final annealing was P H2O /P H2 =4×10 −3 . In this way, the appearance and grain size of the forsterite film are
It became clear that it strongly depends on the amount of Mn and S. FIG. 5 collectively shows the results of a wide range of such analyzes conducted for other Mn and S contents. As shown in the figure, in order to make the forsterite crystal grain size 0.5μm or less, Mn≧
It is necessary that it is 0.05+7S (Mn, s: weight %). Next, to investigate the effect of the atmosphere during finish annealing,
Finish annealing was performed by changing the atmospheric oxygen partial pressure to various values based on the amount of free Mn in the steel, and the properties of the resulting forsterite films were investigated. As an example, Fig. 6 shows a material with Mn = 0.2wt% and S = 0.005wt%.
Between 850 and 1100℃, (a) P H2O /P H2 = 2.5×10 -4 , (b)
A two-stage replica photograph of the forsterite film annealed at P H2O /P H2 =1.5×10 -2 is shown. Also,
Table 1 shows the characteristics of the forsterite film obtained in this example.

【表】【table】

【表】 このように仕上焼鈍雰囲気をPH2O/PH21.5×
10-2の弱酸化性にすることにより、フオルステラ
イト結晶粒径は小さくなり皮膜張力も向上するこ
とが判明した。 以上の実験結果から、結晶粒径が0.5μm以下で
張力、密着性に富んだフオルステライト皮膜を形
成するためには鋼中のMn活量と仕上焼鈍雰囲気
の組み合わせが重要であることが明らかとなつ
た。本発明者等はこれらの結果を次のように考
察、検討し、良好なフオルステライト皮膜を得る
ために必要なMn、S及びSe等の元素の限定範囲
とそれに対応する仕上焼鈍雰囲気(特に酸素分
圧)を求めるに至つた。 MgO−SiO2系固相反応を促進させるためには
マグネシアパウダー中にTiO2やMnO等の微量添
加物を加えることが有用であることは特公昭51−
12450号公報等で公知である。これらTiO2
MnO等が固相反応の進行に際して触媒的作用を
有する理由は必ずしも明らかではないが、その一
因としてはTiO2やMnOの近傍ではMgO−SiO2
応に寄与する物質の融点が低下し、Mg++等の拡
散速度が速まり、結果としてTiO2やMnOの近傍
はフオルステライトが生成されやすい状況、すな
わち一種の不均一核生成の条件が満たされている
ことが考えられる。そしてこの融点の低下が大き
い場合、仕上焼鈍温度域(900℃〜1200℃)で
MgO−SiO2−TiO2−MnO系等の液相が生成し、
フオルステライトの焼結に著しい効果を及ぼすも
のと推測される。 これまでMgOパウダー中に種々の微量添加物
を加える公知の技術はMgO−SiO2固相反応界面
のうち鋼板の外側、すなわちMgOサイドにフオ
ルステライト核を生成するもので、その皮膜特性
の向上に対する寄与の度合には自ずと限界があつ
た。しかるに本発明により、鋼中Mn活量と仕上
焼鈍雰囲気の選択によりSiO2スケール中に高温
酸化によるMnOを形成することによつてフオル
ステライ核を鋼板サイドに生成することが可能と
なり、最終成品のフオルステライト皮膜の張力、
密着性等の特性を大幅に向上させることが可能に
なつたものと理解できる。 このようなMnO生成の条件は鋼中Mn活量と仕
上焼鈍中の酸素分圧によつて整理できる。すなわ
ち、 Mn+H2O=MnO+H2、ΔG ……(1) ΔG=ΔG゜+RTlnξ-1 ……(2) (ここでξ=aMo・PH2O/PH2(aMoはMn活量)また ΔG゜は反応(1)の標準生成自由エネルギー変化であ
る。(Rはガス定数、Tは絶対温度))において反
応(1)が左に進行するためには、ΔG<0となるこ
とが必要であり、そのためには(2)式から明らかな
ようにMn活量に対して酸素分圧PH2O/PH2を一定
値以上に保つ必要がある。第1図にはフオルステ
ライト形成が開始されると考えうる最も低い温度
850℃におけるこのような領域をフリーMn量、
Mn−1.719(S+0.405Se)、に対し図示した。図
中には第6図a,bで示したレプリカ写真に対応
する皮膜形成時の雰囲気に相当する点も示した。
このように第6図や表1に示されたフオルステラ
イト皮膜の性状の差はMnO生成の有無により合
理的に説明されることが判明した。 以上のような実験結果と考察により本発明者等
は仕上焼鈍中の必要酸素分圧の最低値を第1図に
示したように求めるに至つたのである。 ところで、このように鋼中のMn活量を充分確
保するためにはS、Se等のMnをMnS、MnSe等
析出物の形でトラツプする元素を低減する必要が
ある。このことは二次再結晶の安定性という面で
は従来の知見と相反するものである。例えば特公
昭30−3651号公報、同47−25250号公報ではMnS
の利用が二次再結晶の安定のためには必須とされ
ている。またAlNを用いた一回冷延法による高
磁束密度一方向性珪素鋼板の製造法においてもS
の必要性は特公昭40−15644号公報に示されるよ
うに適用されていた。しかるに本発明者等はS+
0.405Se≦0.010の範囲であつても二次再結晶を充
分安定して行なわせることが可能であることを別
途見い出したのである。即ち、主要インヒビター
成分としては酸可溶性AlとNが望ましいが、そ
の他のインヒビター機能のある例えばTiN、
NbC、NbN等で二次再結晶させることができれ
ばこれらを使用してもよい。このAlNを主体と
するインヒビターと仕上焼鈍の組み合わせによ
り、本発明の実施例に示すようにB8=1.9(T)以
上の磁束密度の確保は可能である。 次に本発明の構成要件の限定理由を述べる。 S+Se量がS量に換算して0.010wt%を超える
と必要なMn活量を得るのに無意味に多量のMn
を出鋼時に加える必要が生じ、経済的ではない。
(ここで、SeはMnをトラツプするという意味で
はSと同様の効果を持つ。従つて、必要なMn活
量を確保するためにはSe量も規制しなければな
らない。SeのS当量はその原子量から0.405Se
(Se:重量%)であるからS+0.405Seに対して
Mn量を規制した。)さらに純化焼鈍中S及びSe
は成品のフオルステライト皮膜中にMgS、MnS、
MnSeの形で混在し、皮膜の密着性、均一性を損
うのでS及びSe量はS量に換算して0.010wt%以
下、すなわちS+0.405Se≦0.010(wt%)にする
必要がある。さらに望ましくはS+0.405Se≦
0.007(wt%)にすることにより第3図に示す通
り、皮膜張力は安定し、密着性、均一性は向上す
る。 Mnは第5図の結果からも明らかな通り、必要
なMn活量を得るために鋼中のS及びSe量に対
し、 Mn≧0.05+7(S+0.405Se) でなければならない。Mn量の上限は皮膜の性質
からではなく、方向性珪素鋼の二次再結晶の安定
度から決められる。すなわち、第7図に示したよ
うにMn量を増加していくと二次再結晶粒の方向
性の集積度が劣化し、磁束密度の確保が困難とな
る。この原因は明らかではないが、現時点でMn
を必要量以上、入れることは有害であり、Mnの
上限値は0.8wt%とした。 フオルステライト結晶の核発生からその成長が
起こる温度は仕上焼鈍昇温中のほぼ850〜1100℃
である。従つて、この温度範囲の雰囲気がフオル
ステライト性状を決定することになる。 以下に、この温度範囲の雰囲気について詳細に
述べる。 必要な以上仕上焼鈍雰囲気中の酸素分圧は(2)式
をaMoについて解くことにより得られ、その限値
はPH2O/PH2=1/aMoexp(−34200+7.25T/RT)で与
えら れる。(2)式中の熱力学的諸数値は文献(O.
Kubaschewski & C.A.Alcook、
Metallurgical Thermochemistry5th.ed.(1979)
Pergamon Press、294頁)より引用した。ここ
で困難なのはMn活量、aMoの評価である。今、問
題としてるのはMgO−SiO2系固相反応に寄与す
る最低限必要な量のMnOの生成条件であり、珪
素鋼中の一般的なMn活量とは異なると考えられ
る。このような理由から本発明者等はこれを次の
ように実験的に求めた。 まず、Henryの法則を仮定し、 aMo=γMo・bMo ……(3) とおいた。ここでbMo=〔Mn−1.719(S+
0.405Se)〕×0.01である(Mn、S、Se:重量%)。
次にbMoの異なつた脱炭焼鈍板にマグネシアを塗
布し、10-1〜10-4の範囲の種々のPH2O/PH2の雰
囲気下で仕上焼鈍をし、生成したフオルステライ
ト結晶粒の平均結晶粒径を調べた。そして、得ら
れたフオルステライト平均粒径の変化からγMo
5を得、この値をもつて(3)式を(2)式に代入した。
(2)式を適用する温度は、フオルステライト形成初
期段階、850℃からであり、この温度における
PH2O/PH2の値を下限値とした。この値が第1図
において直線BCで示された値である。仕上焼鈍
雰囲気のPH2O/PH2の値をこれ以上に保持するこ
とにより、フオルステライト生成時点において必
要量のMnOがSiO2スケール中に存在可能となり、
微細な結晶粒でかつ緻密なフオルステライト皮膜
が得られる。なお、鋼中成分を考える上でMnの
S及びSeに対する規制としてMn≧0.05+7(S+
0.405Se)としたのに対し、必要臨界酸素分圧を
考える上でのMn活量はaMo=γMo・(Mn−1.719
(S+0.405Se))×0.01とした。ここでS+
0.405Seについての係数が異なるが、本発明にお
けるその意味はMn≧0.05+7(S+0.405Se)を
満たすMn、S及びSe量に対して、フオルステラ
イト性状に影響を及ぼすMn活量を酸素分圧との
効果において考える時、aMo=γMo・(Mn−1.179
(S+0.405Se))×0.01と表わされるというもので
あり、矛盾を内包するものではない。 PH2O/PH2の上限値DEは、これ以上Mn活量を
高くしたり、雰囲気を酸化性にすると過剰に生成
した液相に起因すると思われる皮膜不良部が発生
し、成品の層間抵抗を劣化させるので、図中に示
したように設定した。また、上限値AEは現場操
業における問題から限定される。すなわちPH2O
PH2を5×10-2以上で仕上焼鈍を行なうためには
大容量の加湿器が必要であり、さらにコイル幅方
向、長手方向に均等に酸素分圧を与えることが難
しくなり、不均一な皮膜の生成が避けられなくな
り、成品歩留りも低下するので上限値はAEとす
る必要がある。 以上、PH2O/PH2とaMoに対する制約により仕上
焼鈍中850〜1100℃間の酸素分圧は第1図
ABCDEに示される範囲内に保持する必要があ
る。この範囲に鋼中Mn、S及びSe量と雰囲気と
を限定することにより、仕上焼鈍中SiO2スケー
ル中にMnOを適正量生成することが可能となり、
その結果、結晶粒径0.5μm以下で張力500g/mm2
以上の密着性の良いフオルステライト皮膜が得ら
れるのである。 実施例 実施例 1 C:0.060%、Si:3.30%、P:0.036%、S:
0.004%、酸可溶性Al:0.030%、N:0.0082%を
含有する溶鋼に対しMnを(a)0.005%、(b)0.02%、
(c)0.10%、(d)0.20%添加しインゴツトを作成し
た。1200℃で加熱後、熱延により厚さ2.3mmの熱
延板を作つた。これらの熱延板を1120℃×2min、
焼鈍後最終板厚0.30mmまで冷延し、焼鈍後、湿潤
水素中850℃×1.5minの脱炭焼鈍を行なつた。ひ
き続き5%TiO2を含有するマグネシアを塗布し
た後、N225%、H275%、露点−10℃(PH2O/PH2
=3.78×10-3)の雰囲気中で600℃〜1100℃まで
の昇温速度を8℃/hrで1200℃まで仕上焼鈍し、
その後同温度で水素雰囲気中20時間保定した。得
られた成品の磁束密度、鉄損及びフオルステライ
ト皮膜の性状等は表2に示す通りであつた。なお
この実施例で示した例のフオルステライト皮膜の
外観の2段レプリカ写真は第4図a〜dに、走査
型電顕像は第4図a′〜d′に示してある。
[Table] The final annealing atmosphere is P H2O /P H2 1.5×
It was found that by making the material weakly oxidizing at 10 -2 , the forsterite crystal grain size became smaller and the film tension improved. From the above experimental results, it is clear that the combination of the Mn activity in the steel and the final annealing atmosphere is important in order to form a forsterite film with a grain size of 0.5 μm or less and high tension and adhesion. Summer. The present inventors considered and examined these results as follows, and determined the limited range of elements such as Mn, S, and Se necessary to obtain a good forsterite film and the corresponding finish annealing atmosphere (especially oxygen (partial pressure). In order to promote the MgO-SiO 2 system solid-phase reaction, it was reported in Japanese Patent Publication No. 1973-1 that it is useful to add trace amounts of additives such as TiO 2 and MnO to magnesia powder.
It is publicly known from Publication No. 12450 and the like. These TiO 2 ,
The reason why MnO etc. have a catalytic effect in the progress of solid-state reactions is not necessarily clear, but one reason is that the melting point of substances that contribute to the MgO-SiO 2 reaction decreases in the vicinity of TiO 2 and MnO. It is conceivable that the diffusion rate of molecules such as ++ increases, and as a result, forstellite is likely to be generated in the vicinity of TiO 2 and MnO, that is, a condition for a type of heterogeneous nucleation is satisfied. If the melting point decreases significantly, the final annealing temperature range (900℃~1200℃)
A liquid phase such as MgO−SiO 2 −TiO 2 −MnO system is generated,
It is presumed that this has a significant effect on the sintering of forsterite. Until now, the known technology of adding various small amounts of additives to MgO powder has been to generate forsterite nuclei on the outside of the steel sheet, that is, on the MgO side of the MgO-SiO 2 solid phase reaction interface, and to improve the film properties. There was naturally a limit to the degree of contribution. However, according to the present invention, by selecting the Mn activity in the steel and the final annealing atmosphere, it is possible to form MnO in the SiO 2 scale through high-temperature oxidation, thereby producing forsterite nuclei on the side of the steel sheet, and thereby making it possible to generate forsterite nuclei on the side of the steel sheet. Tension of tellite film,
It can be understood that it has become possible to significantly improve properties such as adhesion. The conditions for such MnO formation can be determined by the Mn activity in the steel and the oxygen partial pressure during final annealing. That is, Mn + H 2 O = MnO + H 2 , ΔG ... (1) ΔG = ΔG゜ + RTlnξ -1 ... (2) (Here, ξ = a Mo・P H2O /P H2 (a Mo is Mn activity) and ΔG゜ is the standard formation free energy change of reaction (1). (R is the gas constant, T is the absolute temperature)) In order for reaction (1) to proceed to the left, it is necessary that ΔG < 0. Therefore, as is clear from equation (2), it is necessary to maintain the oxygen partial pressure P H2O /P H2 at a certain value or higher relative to the Mn activity. Figure 1 shows the lowest temperature at which forsterite formation can begin.
The amount of free Mn in such a region at 850℃ is
Illustrated for Mn-1.719 (S+0.405Se). In the figure, points corresponding to the atmosphere at the time of film formation corresponding to the replica photographs shown in FIGS. 6a and 6b are also shown.
It has thus been found that the differences in the properties of the forsterite films shown in FIG. 6 and Table 1 can be rationally explained by the presence or absence of MnO formation. Based on the above experimental results and considerations, the present inventors have arrived at the minimum value of the required oxygen partial pressure during finish annealing as shown in FIG. By the way, in order to ensure sufficient Mn activity in steel, it is necessary to reduce elements such as S and Se that trap Mn in the form of precipitates such as MnS and MnSe. This is contrary to conventional knowledge in terms of the stability of secondary recrystallization. For example, in Japanese Patent Publications No. 30-3651 and No. 47-25250, MnS
The use of is essential for stabilizing secondary recrystallization. In addition, S
The necessity of this was applied as shown in Japanese Patent Publication No. 15644/1973. However, the inventors have S+
It was separately discovered that it is possible to perform secondary recrystallization with sufficient stability even in the range of 0.405Se≦0.010. That is, acid-soluble Al and N are desirable as the main inhibitor components, but other inhibitor components such as TiN,
If secondary recrystallization can be performed using NbC, NbN, etc., these may be used. By combining this AlN-based inhibitor and finish annealing, it is possible to secure a magnetic flux density of B 8 =1.9 (T) or higher, as shown in the examples of the present invention. Next, the reasons for limiting the constituent elements of the present invention will be described. If the S+Se content exceeds 0.010wt% in terms of S content, it takes a meaninglessly large amount of Mn to obtain the necessary Mn activity.
It becomes necessary to add it at the time of tapping, which is not economical.
(Here, Se has the same effect as S in the sense that it traps Mn. Therefore, in order to secure the necessary Mn activity, the amount of Se must also be regulated. The S equivalent of Se is its Atomic weight from 0.405Se
(Se: weight%), so for S+0.405Se
The amount of Mn was regulated. ) Furthermore, S and Se during purification annealing
MgS, MnS,
Since S and Se are mixed in the form of MnSe and impair the adhesion and uniformity of the film, the amount of S and Se needs to be 0.010wt% or less in terms of S amount, that is, S+0.405Se≦0.010 (wt%). More preferably S+0.405Se≦
By setting the amount to 0.007 (wt%), the film tension is stabilized and the adhesion and uniformity are improved, as shown in Figure 3. As is clear from the results in Figure 5, in order to obtain the necessary Mn activity, Mn must be ≥0.05+7 (S+0.405Se) relative to the amount of S and Se in the steel. The upper limit of the Mn content is determined not from the properties of the film but from the stability of secondary recrystallization of grain-oriented silicon steel. That is, as shown in FIG. 7, as the amount of Mn increases, the degree of directional integration of secondary recrystallized grains deteriorates, making it difficult to ensure magnetic flux density. The cause of this is not clear, but at present Mn
Adding more than the required amount of Mn is harmful, so the upper limit for Mn was set at 0.8wt%. The temperature at which forsterite crystal nucleation and growth occurs is approximately 850-1100℃ during finishing annealing.
It is. Therefore, the atmosphere within this temperature range determines the properties of forsterite. The atmosphere in this temperature range will be described in detail below. The required oxygen partial pressure in the finish annealing atmosphere can be obtained by solving equation (2) for a Mo , and its limit value is P H2O /P H2 = 1/a Mo exp (-34200 + 7.25T/RT). Given. The thermodynamic values in equation (2) are given in the literature (O.
Kubaschewski & CAAlcook,
Metallurgical Thermochemistry5th.ed.(1979)
Pergamon Press, p. 294). What is difficult here is the evaluation of Mn activity, a Mo. The current issue is the conditions for generating the minimum amount of MnO that contributes to the MgO-SiO 2 solid phase reaction, which is considered to be different from the general Mn activity in silicon steel. For this reason, the present inventors experimentally determined this as follows. First, we assumed Henry's law and set a Mo = γ Mo・b Mo ...(3). Here, b Mo = [Mn−1.719(S+
0.405Se)]×0.01 (Mn, S, Se: weight %).
Next, magnesia was applied to the decarburized annealed plates with different b Mo values, and finish annealing was performed in various P H2O / P H2 atmospheres in the range of 10 -1 to 10 -4 to investigate the formation of forsterite crystal grains. The average grain size was investigated. Then, from the change in the obtained forsterite average particle size, γ Mo =
5 was obtained, and this value was substituted into equation (3) into equation (2).
The temperature to which equation (2) is applied is from 850℃, the initial stage of forsterite formation, and at this temperature
The value of P H2O /P H2 was taken as the lower limit. This value is the value indicated by the straight line BC in FIG. By maintaining the value of P H2O /P H2 in the final annealing atmosphere above this value, the necessary amount of MnO can exist in the SiO 2 scale at the time of forsterite formation.
A dense forsterite film with fine crystal grains can be obtained. In addition, when considering the components in steel, the regulation for Mn against S and Se is Mn≧0.05+7 (S+
0.405Se), whereas the Mn activity when considering the required critical oxygen partial pressure is a Mo = γ Mo・(Mn−1.719
(S+0.405Se))×0.01. Here S+
The coefficient for 0.405Se is different, but its meaning in the present invention is that for the amount of Mn, S, and Se that satisfy Mn≧0.05+7 (S+0.405Se), the Mn activity that affects forsterite properties is expressed as the oxygen partial pressure. When considering the effect of a Mo = γ Mo・(Mn−1.179
(S+0.405Se))×0.01, which does not imply any contradiction. The upper limit value DE of P H2O /P H2 is such that if the Mn activity is increased further or the atmosphere is made oxidizing, film defects will occur that are thought to be caused by the excessively generated liquid phase, and the interlayer resistance of the product will decrease. Since this causes deterioration, the settings were made as shown in the figure. Further, the upper limit value AE is limited due to problems in on-site operations. That is, P H2O /
In order to perform finish annealing with P H2 of 5 x 10 -2 or more, a large-capacity humidifier is required, and it is also difficult to apply oxygen partial pressure evenly in the width and length directions of the coil, resulting in non-uniform Since the formation of a film becomes unavoidable and the product yield decreases, the upper limit must be set to AE. As mentioned above, due to the constraints on P H2O /P H2 and a Mo , the oxygen partial pressure between 850 and 1100℃ during finish annealing is shown in Figure 1.
Must be kept within the range shown in ABCDE. By limiting the amount of Mn, S, and Se in the steel and the atmosphere within this range, it is possible to generate an appropriate amount of MnO in the SiO 2 scale during final annealing.
As a result, the tension was 500 g/mm 2 with a crystal grain size of 0.5 μm or less.
A forsterite film with good adhesion as described above can be obtained. Examples Example 1 C: 0.060%, Si: 3.30%, P: 0.036%, S:
For molten steel containing 0.004%, acid-soluble Al: 0.030%, N: 0.0082%, Mn (a) 0.005%, (b) 0.02%,
Ingots were prepared by adding (c) 0.10% and (d) 0.20%. After heating at 1200°C, a hot rolled sheet with a thickness of 2.3 mm was produced by hot rolling. These hot-rolled plates were heated at 1120℃×2min,
After annealing, it was cold rolled to a final plate thickness of 0.30 mm, and after annealing, decarburization annealing was performed in wet hydrogen at 850°C for 1.5 min. After subsequent application of magnesia containing 5% TiO2 , N2 25%, H2 75%, dew point -10 °C (P H2O /P H2
= 3.78×10 -3 ) in an atmosphere of 600°C to 1100°C at a heating rate of 8°C/hr to 1200°C,
Thereafter, it was maintained at the same temperature in a hydrogen atmosphere for 20 hours. The magnetic flux density, iron loss, properties of the forsterite film, etc. of the obtained product were as shown in Table 2. Two-stage replica photographs of the appearance of the forsterite film shown in this example are shown in FIGS. 4a to 4d, and scanning electron microscope images are shown in FIGS. 4a' to d'.

【表】
←本発明範囲→
実施例 2 C:0.052%、Si:3.35%、Mn:0.20%、P:
0.040%、S:0.004%、酸可溶性Al:0.027%、
N:0.0090%、Cr:0.10%を含有する連続鋳造ス
ラブを1150℃の温度に加熱した後、熱延して2.3
mmの熱延板を作つた。この熱延板を1080℃×
2min焼鈍後、一回法により0.30mmの最終板厚ま
で冷延し、湿水素雰囲気中で850℃×2minの脱炭
焼鈍を行なつた。その後2%TiO2を含有するマ
グネシアを塗布した後、N225%、H275%の雰囲
気中で700〜1200℃間の昇温速度6℃/hrで1200
℃まで加熱し、その後同温度で水素雰囲気中20時
間保定した。この時800℃〜1100℃までの露点を
−40℃(PH2O/PH2=2.49×10-4)、+10℃
(PH2O/PH2=0.0163)とした。得られた磁気特性
及びフオルステライト皮膜の性状は表3に示す通
りであつた。
【table】
←Scope of the present invention→
Example 2 C: 0.052%, Si: 3.35%, Mn: 0.20%, P:
0.040%, S: 0.004%, acid-soluble Al: 0.027%,
After heating a continuous cast slab containing N: 0.0090% and Cr: 0.10% to a temperature of 1150°C, it was hot rolled to 2.3
mm hot-rolled sheets were made. This hot-rolled plate is heated to 1080℃×
After annealing for 2 minutes, it was cold rolled to a final thickness of 0.30 mm using a one-step method, and decarburized annealed at 850°C for 2 minutes in a wet hydrogen atmosphere. After that, magnesia containing 2% TiO 2 was applied, and then the temperature was increased to 1200°C at a heating rate of 6°C/hr between 700 and 1200°C in an atmosphere of 25% N 2 and 75% H 2 .
It was heated to ℃ and then kept at the same temperature in a hydrogen atmosphere for 20 hours. At this time, the dew point from 800℃ to 1100℃ is -40℃ (P H2O /P H2 = 2.49 × 10 -4 ), +10℃
(P H2O /P H2 =0.0163). The magnetic properties and properties of the forsterite film obtained were as shown in Table 3.

【表】【table】

【表】 実施例 3 C:0.053%、S:3.45%、Mn:0.28%、P:
0.035%、酸可溶性Al:0.030%、N:0.0085%を
含有する溶鋼に対しSを(a)0.003%、(b)0.009%、
(c)0.015%、(d)0.020%添加し、インゴツトを作成
した。1350℃で加熱後、熱延により2.5mmの熱延
板を作つた。これらの熱延板を1.8mm厚まで冷延
後、1120℃×2min焼鈍し、0.18mmの最終板厚ま
で冷間圧延した。その後、湿潤水素中850℃×
2minの脱炭焼鈍を行ないさらに3%TiO2を含有
するマグネシアを塗布し、仕上焼鈍を施した。こ
の時の雰囲気はN275%、H225%、露点−40℃
(PH2O/PH2=7.5×10-4)で、また600〜1200℃ま
での昇温速度は10℃/hfであつた。得られた成品
の磁束密度、鉄損及びフオルステライト皮膜の性
状は表4に示す通りであつた。
[Table] Example 3 C: 0.053%, S: 3.45%, Mn: 0.28%, P:
For molten steel containing 0.035%, acid-soluble Al: 0.030%, N: 0.0085%, S was (a) 0.003%, (b) 0.009%,
(c) 0.015% and (d) 0.020% were added to prepare ingots. After heating at 1350°C, a 2.5 mm hot-rolled plate was produced by hot rolling. These hot-rolled plates were cold-rolled to a thickness of 1.8 mm, annealed at 1120°C for 2 minutes, and cold-rolled to a final plate thickness of 0.18 mm. Then, in wet hydrogen at 850℃
Decarburization annealing was performed for 2 minutes, magnesia containing 3% TiO 2 was applied, and final annealing was performed. Atmosphere at this time was 75% N2 , 25% H2 , dew point -40℃
(P H2O /P H2 =7.5×10 -4 ), and the temperature increase rate from 600 to 1200°C was 10°C/hf. The magnetic flux density, iron loss, and properties of the forsterite film of the obtained product were as shown in Table 4.

【表】 ← 本 発 明 範
囲 →
実施例 4 C:0.059%、Si:3.33%、Mn:0.35%、P:
0.038%、S:0.008%、酸可溶性Al:0.024%、
N:0.0095%、Cr:0.20%を含有する連続鋳造ス
ラブを1200℃の温度に加熱した後、熱延して2.3
mmの熱延板とした。この熱延板を1120℃×2min
焼鈍後、1回冷延法で板厚(a)0.30mm、(b)0.23mm、
(c)0.17mmまで冷延した後、湿潤雰気中850℃×
2minの脱炭焼鈍を行なつた。そして5%TiO2
含むマグネシアを塗布し、N275%、H225%、露
点−20℃(PH2O/PH2=4.96×10-3)の雰囲気下で
仕上焼鈍を施した。この時600〜1200℃の昇温速
度は15℃/hrであつた。得られた成品のフオルス
テライト皮膜の性状は成品板厚に関係なく良好で
平均粒径0.2μm、最小はく離半径4mmで、外観も
黒灰色で緻密な感じであつた。なお磁性(磁束速
度B8及び鉄損W17/50で示す)はそれぞれ(a)1.91
(T)、0.98(W/Kg)、(b)1.92(T)、0.87(W/K
g)、
(c)1.92(T)、0.84(W/Kg)であつた。 (発明の効果) 以上、詳述したように本発明はこれまで困難で
あつた平均結晶粒径0.5μm以下で密着性及び鋼板
張力の極めて優れたフオルステライト皮膜の製造
を3%珪素鋼中のMn活量と仕上焼鈍時の酸素分
圧との組み合わせにより可能にする方法を提供す
るもので、この方法により、皮膜の張力効果によ
る鉄損低減量は0.2W/Kgに及び、また、皮膜の
密着性も最小はく離半径で3mm程度のものが実現
されたのである。従つて、本発明はこのように磁
気特性の優れた磁性材料を提供しうるので、産業
上稗益するところが極めて大である。
[Table] ← Scope of this invention
Enclosure →
Example 4 C: 0.059%, Si: 3.33%, Mn: 0.35%, P:
0.038%, S: 0.008%, acid-soluble Al: 0.024%,
A continuous cast slab containing N: 0.0095% and Cr: 0.20% was heated to a temperature of 1200°C and then hot-rolled to 2.3
It was made into a hot rolled sheet of mm. This hot-rolled plate was heated to 1120℃×2min.
After annealing, plate thickness (a) 0.30mm, (b) 0.23mm,
(c) After cold rolling to 0.17mm, 850℃× in a humid atmosphere
Decarburization annealing was performed for 2 min. Then, magnesia containing 5% TiO 2 was applied, and final annealing was performed in an atmosphere of 75% N 2 , 25% H 2 , and a dew point of −20° C. (P H2O /P H2 =4.96×10 −3 ). At this time, the temperature increase rate from 600 to 1200°C was 15°C/hr. The properties of the forsterite film of the obtained product were good regardless of the thickness of the product, with an average grain size of 0.2 μm and a minimum peeling radius of 4 mm, and the appearance was blackish gray and dense. Magnetism (indicated by magnetic flux velocity B 8 and iron loss W 17/50 ) is (a) 1.91, respectively.
(T), 0.98 (W/Kg), (b)1.92 (T), 0.87 (W/K
g),
(c) 1.92 (T), 0.84 (W/Kg). (Effects of the Invention) As detailed above, the present invention has been able to produce a forsterite film with an average grain size of 0.5 μm or less and excellent adhesion and steel sheet tension, which has been difficult until now, using 3% silicon steel. This method provides a method that enables this by combining Mn activity and oxygen partial pressure during final annealing.With this method, the amount of iron loss reduction due to the tension effect of the film reaches 0.2W/Kg. Adhesion was also achieved with a minimum peeling radius of approximately 3 mm. Therefore, since the present invention can provide a magnetic material with excellent magnetic properties, it is of great industrial benefit.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、結晶粒径0.5μm以下、張力500g/
mm2以上のフオルステライト皮膜を得るために必要
な鋼中Mn、S、Se量と仕上焼鈍中850℃〜1100
℃間における雰囲気のPH2O/PH2との関係を示す
図(なお図中a,bの符号は第6図a,bに対応
する)、第2図は、フオルステライト皮膜の異な
る試料についての磁束密度B8と鉄損W17/50の関係
を示す図、第3図は鋼中Mn量とフオルステライ
ト皮膜による張力との関係を示す図、第4図は実
施例1によつて得られた成品のフオルステライト
皮膜の粒子構造を示す2段レプリカ写真及び走査
型電顕写真、第5図は3.3%Si鋼中のMn及びS量
とフオルステライト結晶粒径との関係を示す図
(図中の数字はフオルステライト粒の平均結晶粒
径(μm)である)、第6図a,bは表1に示す
フオルステライト皮膜の粒子構造を示す二段レプ
リカ写真、第7図は鋼中Mn量と磁束密度、B8
(T)、との関係を示す図、第8図a〜dは実施例
3によつて得られた成品のフオルステライト皮膜
の粒子構造を示す走査型電顕写真である。
Figure 1 shows a crystal grain size of 0.5 μm or less and a tension of 500 g/
Amounts of Mn, S, and Se in steel necessary to obtain a forsterite film of mm 2 or more and 850℃ to 1100℃ during final annealing.
Figure 2 shows the relationship between P H2O /P H2 in the atmosphere at temperatures between Figure 3 is a diagram showing the relationship between magnetic flux density B 8 and iron loss W 17/50 , Figure 3 is a diagram showing the relationship between Mn content in steel and tension due to forsterite film, and Figure 4 is a diagram showing the relationship between magnetic flux density B 8 and iron loss W 17/50. Figure 5 is a two-stage replica photograph and scanning electron micrograph showing the grain structure of the forsterite film of the 3.3% Si steel. Figures 6a and b are two-stage replica photographs showing the particle structure of the forsterite film shown in Table 1. Figure 7 is the average crystal grain size (μm) of the forsterite grains. Figure 7 is the average crystal grain size (μm) of the forsterite grains. Quantity and magnetic flux density, B 8
(T), and FIGS. 8a to 8d are scanning electron micrographs showing the particle structure of the forsterite film of the product obtained in Example 3.

Claims (1)

【特許請求の範囲】 1 重量%で、C:0.025〜0.075%、Si:3.0〜4.5
%、酸可溶性Al:0.010〜0.060%、N:0.0030〜
0.0130%、S≦0.010%、P:0.015〜0.045%、お
よびMnを0.8≧Mn≧0.05+7×Sの関係を満足
する如く含有し、残部Feおよび不可避的不純物
からなる珪素鋼スラブを、熱間圧延して熱延板と
なしこれを連続焼鈍した後、圧下率が80%を超え
る強圧下冷間圧延により最終板厚となし、次いで
脱炭焼鈍を施してその表面にSiO2を含むサブス
ケールを生成させ、次にMgOを主成分とする焼
鈍分離剤を塗布した後、最終仕上焼鈍を行なう一
方向性珪素鋼板のフオルステライト皮膜の形成方
法において、仕上焼鈍中の850〜1100℃の温度域
における酸素分圧(PH2O/PH2で表す)を、Mn−
1.719×Sに対して第1図のABCDEに囲まれた領
域に保持することを特徴とする一方向性珪素鋼板
のフオルステライト絶縁皮膜の形成方法。 2 重量%で、C:0.025〜0.075%、Si:3.0〜4.5
%、酸可溶性Al:0.010〜0.060%、N:0.0030〜
0.0130%、S≦0.010%、P:0.015〜0.045%、
Cr:0.07〜0.25%、およびMnを0.8≧Mn≧0.05+
7×Sの関係を満足する如く含有し、残部Feお
よび不可避的不純物からなる珪素鋼スラブを熱間
圧延して熱延板となしこれを連続焼鈍した後、圧
下率が80%を超える強圧下冷間圧延により最終板
厚となし、次いで脱炭焼鈍を施してその表面に
SiO2を含むサブスケールを生成させ、次にMgO
を主成分とする焼鈍分離剤を塗布した後、最終仕
上焼鈍を行なう一方向性珪素鋼板のフオルステラ
イト皮膜の形成方法において、仕上焼鈍中の850
〜1100℃の温度域における酸素分圧(PH2O/PH2
で表す)を、Mn−1.719×Sに対して第1図の
ABCDEに囲まれた領域に保持することを特徴と
する一方向性珪素鋼板のフオルステライト絶縁皮
膜の形成方法。
[Claims] 1% by weight, C: 0.025-0.075%, Si: 3.0-4.5
%, acid-soluble Al: 0.010~0.060%, N: 0.0030~
A silicon steel slab containing 0.0130%, S≦0.010%, P: 0.015 to 0.045%, and Mn satisfying the relationship of 0.8≧Mn≧0.05+7×S, with the remainder being Fe and unavoidable impurities, is heated. This is rolled into a hot-rolled plate. After continuous annealing, the final plate thickness is obtained by cold rolling with a reduction ratio of over 80%, followed by decarburization annealing to form a subscale containing SiO 2 on the surface. In the method for forming a forsterite film on a grain-oriented silicon steel sheet, the temperature range of 850 to 1100°C during the final annealing is as follows: The oxygen partial pressure (expressed as P H2O /P H2 ) at Mn−
A method for forming a forsterite insulating film on a unidirectional silicon steel sheet, which is characterized by maintaining the forsterite insulating film in the area surrounded by ABCDE in FIG. 1 for 1.719×S. 2 Weight%: C: 0.025-0.075%, Si: 3.0-4.5
%, acid-soluble Al: 0.010~0.060%, N: 0.0030~
0.0130%, S≦0.010%, P: 0.015-0.045%,
Cr: 0.07~0.25%, and Mn 0.8≧Mn≧0.05+
A silicon steel slab containing so as to satisfy the relationship of 7×S and the remainder Fe and unavoidable impurities is hot-rolled into a hot-rolled plate, which is continuously annealed and then subjected to strong rolling with a rolling reduction of more than 80%. The final plate thickness is obtained by cold rolling, and then decarburization annealing is performed to improve the surface of the plate.
Generate subscales containing SiO 2 and then MgO
In a method for forming a forsterite film on a unidirectional silicon steel sheet, in which final annealing is performed after applying an annealing separator mainly composed of
Oxygen partial pressure (P H2O /P H2
) in Fig. 1 for Mn−1.719×S.
A method for forming a forsterite insulating film on a unidirectional silicon steel sheet, which is characterized by maintaining the forsterite insulating film in a region surrounded by ABCDE.
JP5381984A 1984-03-21 1984-03-21 Formation of insulating forsterite film on grain-oriented silicon steel sheet Granted JPS60197883A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5381984A JPS60197883A (en) 1984-03-21 1984-03-21 Formation of insulating forsterite film on grain-oriented silicon steel sheet

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5381984A JPS60197883A (en) 1984-03-21 1984-03-21 Formation of insulating forsterite film on grain-oriented silicon steel sheet

Publications (2)

Publication Number Publication Date
JPS60197883A JPS60197883A (en) 1985-10-07
JPS633007B2 true JPS633007B2 (en) 1988-01-21

Family

ID=12953395

Family Applications (1)

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Country Link
JP (1) JPS60197883A (en)

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JPH0717960B2 (en) * 1989-03-31 1995-03-01 新日本製鐵株式会社 Method for producing unidirectional electrical steel sheet with excellent magnetic properties
JP2564994B2 (en) * 1991-10-14 1996-12-18 日本鋼管株式会社 Soft magnetic steel material excellent in direct current magnetization characteristics and corrosion resistance and method for producing the same
US5288736A (en) * 1992-11-12 1994-02-22 Armco Inc. Method for producing regular grain oriented electrical steel using a single stage cold reduction
JP3475258B2 (en) * 1994-05-23 2003-12-08 株式会社海水化学研究所 Ceramic film forming agent and method for producing the same
JP3415379B2 (en) * 1996-11-21 2003-06-09 Jfeスチール株式会社 Insulating coating on grain-oriented silicon steel sheet and method of forming the same
JP4203238B2 (en) * 2001-12-03 2008-12-24 新日本製鐵株式会社 Manufacturing method of unidirectional electrical steel sheet
JP4810820B2 (en) * 2004-11-10 2011-11-09 Jfeスチール株式会社 Directional electrical steel sheet with chromeless coating and method for producing the same
JP2010140968A (en) * 2008-12-09 2010-06-24 Toyota Motor Corp Soft magnetic material and method of manufacturing the same
KR102079771B1 (en) * 2017-12-26 2020-02-20 주식회사 포스코 Grain oriented electrical steel sheet and method for manufacturing the same

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