JPS6331756B2 - - Google Patents
Info
- Publication number
- JPS6331756B2 JPS6331756B2 JP57035543A JP3554382A JPS6331756B2 JP S6331756 B2 JPS6331756 B2 JP S6331756B2 JP 57035543 A JP57035543 A JP 57035543A JP 3554382 A JP3554382 A JP 3554382A JP S6331756 B2 JPS6331756 B2 JP S6331756B2
- Authority
- JP
- Japan
- Prior art keywords
- header
- processing
- gas
- tube
- iodine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000012545 processing Methods 0.000 claims description 41
- 238000001179 sorption measurement Methods 0.000 claims description 24
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims description 20
- 229910052740 iodine Inorganic materials 0.000 claims description 20
- 239000011630 iodine Substances 0.000 claims description 20
- 238000007667 floating Methods 0.000 claims description 6
- 239000000356 contaminant Substances 0.000 claims description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 claims description 2
- 239000011888 foil Substances 0.000 claims description 2
- 239000011491 glass wool Substances 0.000 claims description 2
- 239000000463 material Substances 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 48
- 238000005202 decontamination Methods 0.000 description 8
- 230000003588 decontaminative effect Effects 0.000 description 8
- 230000002285 radioactive effect Effects 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 4
- 238000004891 communication Methods 0.000 description 3
- 238000013461 design Methods 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 239000003463 adsorbent Substances 0.000 description 2
- 239000003758 nuclear fuel Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 241000283690 Bos taurus Species 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910021536 Zeolite Inorganic materials 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000003139 buffering effect Effects 0.000 description 1
- 230000005465 channeling Effects 0.000 description 1
- 230000001010 compromised effect Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 235000013365 dairy product Nutrition 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 239000003517 fume Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000008267 milk Substances 0.000 description 1
- 235000013336 milk Nutrition 0.000 description 1
- 210000004080 milk Anatomy 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000012857 radioactive material Substances 0.000 description 1
- 239000000941 radioactive substance Substances 0.000 description 1
- 238000012958 reprocessing Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 210000001685 thyroid gland Anatomy 0.000 description 1
- 239000005436 troposphere Substances 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
Landscapes
- Treating Waste Gases (AREA)
- Separation Of Gases By Adsorption (AREA)
Description
【発明の詳細な説明】
本発明は沃素含有排ガスの処理装置に関し、特
に放射性沃素を含有する排ガスを浄化処理する為
の装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an apparatus for treating iodine-containing exhaust gas, and more particularly to an apparatus for purifying exhaust gas containing radioactive iodine.
放射性沃素は昇華性を有しており、空気冷却方
式の原子炉、核燃料再処理工場、核燃料の成形工
場、放射性物質を扱う実験室のドラフト等から排
ガスと共に排出される。この放射性沃素(I131)
の寿命は比較的短いが、対流圏から降下して牧草
等を汚染し、この牧草を食べた乳牛から牛乳を媒
介して人体の甲状腺に濃縮されることが確認され
ており、前述の様な放射性物質取扱い施設におい
ては、放射性沃素を除去する為の排ガス処理が義
務付けられている。 Radioactive iodine has sublimation properties and is emitted along with exhaust gas from air-cooled nuclear reactors, nuclear fuel reprocessing plants, nuclear fuel molding plants, and fume hoods in laboratories that handle radioactive materials. This radioactive iodine (I 131 )
Although it has a relatively short lifespan, it has been confirmed that it descends from the troposphere and contaminates pastures, etc., and is concentrated in the human thyroid gland through milk from dairy cows that eat this pasture. Facilities that handle materials are required to treat exhaust gas to remove radioactive iodine.
かかる目的で使用される排ガス処理装置として
最も広く用いられているのは第1図(概略側面
図)に示す構造のものであり、沃素吸着剤Aを充
填した吸着塔1の側壁に排ガス導入管2及び排ガ
ス排出管3が設けられており、排ガスを吸着塔1
内に通過させることによつて放射性沃素の除去
(以下除染という)を行なう。図において排ガス
発生設備に連通される排ガス管路4及び煙突等に
連通される除染ガス管路5は、排ガス導入管2及
び排ガス排出管3に夫々フランジ6及び7を介し
て連結される。この場合フランジ部6及び7は例
えば第2図(要部断面図)に示す如く嵌合構造と
し、汚染ガスが漏出するのを防止している。この
様な接続構造である為、吸着塔1を交換移動する
ときには吸着塔1を水平方向と垂直方向の2方向
に移動させなければならず、交換操作が煩雑であ
つた。しかも管接続部が2箇所である為、例えば
第3図に接続部をやや誇張して示す如両フランジ
部6,7の取付位置が高さ方向或いは横方向にず
れたり、或いは相対的に傾くことがあると接続部
の気密性が損なわれ、汚染ガス漏出の問題が発生
する。 The most widely used exhaust gas treatment equipment for this purpose has the structure shown in Figure 1 (schematic side view), in which an exhaust gas inlet pipe is installed on the side wall of an adsorption tower 1 filled with iodine adsorbent A. 2 and an exhaust gas discharge pipe 3 are provided, and the exhaust gas is sent to the adsorption tower 1.
Radioactive iodine is removed (hereinafter referred to as decontamination) by passing it through the air. In the figure, an exhaust gas pipe 4 communicating with exhaust gas generation equipment and a decontamination gas pipe 5 communicating with a chimney or the like are connected to an exhaust gas introduction pipe 2 and an exhaust gas discharge pipe 3 via flanges 6 and 7, respectively. In this case, the flanges 6 and 7 have a fitted structure, for example, as shown in FIG. 2 (a sectional view of the main part), to prevent leakage of contaminated gas. Because of this connection structure, when replacing and moving the adsorption tower 1, it was necessary to move the adsorption tower 1 in two directions, horizontally and vertically, making the replacement operation complicated. Moreover, since there are two pipe connections, for example, the mounting positions of the flanges 6 and 7, which are slightly exaggerated in Fig. 3, may be shifted in the height or lateral direction, or may be tilted relative to each other. If this occurs, the airtightness of the connection may be compromised, resulting in the problem of leakage of contaminated gas.
本発明は上記の様な事情に着目し、吸着塔の着
脱を容易にすると共に接続部からの汚染ガスの漏
出を確実に防止することができ、更には排ガスの
除染効率を高め得る様な装置の開発を期して鋭意
研究を進めてきた。本発明はかかる研究の結果完
成されたものであつて、その構成は、固定型2重
管状ヘツダーと該ヘツダーの上方部に配置され、
スカート部を有する2重管状処理容器からなる沃
素含有排ガスの処理装置であつて、上記ヘツダー
と処理容器とは内管同士および外管同士が連通す
るように着脱自在に取り付けられており、上記ヘ
ツダーは、外管又は内管の一方を処理ガス導入
管、他方を処理済みガス排出管で構成するととも
に、ヘツダー外管を取り巻く様にスカート取付け
座を一体的に設け、他方、上記処理容器はヘツダ
ーに対応して外管又は内管の一方を処理ガス往路
とし、該往路内に沃素吸着層を配置するととも
に、他方を処理済みガスの復路とし、往路と復路
とを浮遊夾雑物除去フイルタを介して連通させ、
上記スカートの下端部は上記取り付け座に対して
着脱自在、かつ気密性に取り付ける構造としてな
るところに要旨が存在する。 The present invention has focused on the above-mentioned circumstances, and has developed a system that facilitates attachment and detachment of the adsorption tower, reliably prevents leakage of contaminated gas from the connection, and further improves the decontamination efficiency of exhaust gas. We have been conducting intensive research in hopes of developing a device. The present invention was completed as a result of such research, and consists of a fixed double tubular header and an upper part of the header,
This is an iodine-containing exhaust gas treatment device consisting of a double tubular processing container having a skirt portion, and the header and the processing container are detachably attached so that the inner tubes communicate with each other and the outer tubes communicate with each other. consists of one of the outer tube and the inner tube being a process gas inlet tube and the other being a treated gas discharge tube, and a skirt mounting seat is integrally provided so as to surround the header outer tube. Correspondingly, one of the outer pipe and the inner pipe is used as an outgoing path for the treated gas, and an iodine adsorption layer is arranged in the outgoing path, and the other is used as a return path for the treated gas, and the outgoing and returning paths are passed through a filter for removing suspended contaminants. to communicate,
The gist is that the lower end of the skirt is configured to be detachably attached to the mounting seat and to be attached airtightly.
以下実施例を示す図面に基づいて本発明の構成
及び作用効果を説明するが、下記は代表例であつ
て本発明を限定する性質のものではなく、前・後
記の趣旨に適合し得る範囲で設計を変更すること
は全て本発明技術の範囲に含まれる。 The structure and effects of the present invention will be explained below based on the drawings showing the embodiments. However, the following are representative examples and do not limit the present invention, and only within the scope that can comply with the spirit of the above and below. All changes to the design are within the scope of the present technology.
第4図は本発明の排ガス処理装置を例示する概
略縦断面図、第5,6図は第4図における―
線及び―線断面相当図で、この装置は台座8
に固定されたヘツダー9と、該ヘツダー9に対し
て着脱自在に取り付けられる可搬性の吸収容器1
0とで構成される。ヘツダー9は2重管状に形成
されており、図例では外管9aを処理ガス導入管
として、又内管9bを処理済みガス排出管として
の機能を果す様に構成し、また外管9aのまわり
にはフランジ状に構成したスカート取付け座(以
下単に取付け座という)11を一体的に設け、該
取付け座11に溶接固定される架台12によつて
ヘツダー9全体を台座8に固定する。 FIG. 4 is a schematic longitudinal cross-sectional view illustrating the exhaust gas treatment device of the present invention, and FIGS. 5 and 6 are -
In the line and -line cross-sectional equivalent views, this device is shown on the pedestal 8.
A header 9 fixed to the header 9, and a portable absorption container 1 detachably attached to the header 9.
0. The header 9 is formed into a double tube shape, and in the illustrated example, the outer tube 9a functions as a processing gas introduction tube, the inner tube 9b functions as a treated gas discharge tube, and the outer tube 9a functions as a treated gas discharge tube. A skirt mounting seat (hereinafter simply referred to as mounting seat) 11 configured in the form of a flange is integrally provided around the periphery, and the entire header 9 is fixed to the base 8 by a frame 12 that is welded and fixed to the mounting seat 11.
一方処理容器10もヘツダー9に対応して2重
管状に構成されており、外管10aの上端は蓋1
3によつて封鎖すると共に、下方部は円板状封鎖
板14によつてその内周壁と内管10bの下端外
周壁とを一体的に連結形成し、外管10aの下端
は下方に延長してスカート部15を形成すると共
に、その最下端部には、ヘツダー9に設けた取付
け座11に対面する様にフランジ部16を形成す
る。しかも円板状封鎖板14における内管接合部
の外周側には多数の処理ガス導入孔17を設けて
ヘツダー9の外管9a上端に設けた開口18に対
面させると共に、内管10bの下端はヘツダー9
の内管9bの上端開口部と対面させる。従つて処
理容器10内においては、第4図に矢印で示した
如く外管10aと内管10bの間が処理ガス往路
を構成し、内管10bが処理ガス復路となり内管
10bの上端開口部は処理ガス折り返し部を構成
する。そして上記往路には復層(図では2層)の
沃素吸着層(シルバーゼオライト等)19a,1
9bを適当な間隔を設けて配置すると共に、処理
ガス折り返し部には浮遊夾雑物除去フイルタ(グ
ラスウールやアルミ箔等)20を配置する。図中
の21は沃素吸着剤充填口を示し、また22は必
要に応じて設けられる処理ガス拡散用の邪魔板を
示す。尚処理容器10におけるスカート部15の
下方突出長さと、ヘツダー9における内・外管の
上方突出長さとは等しく形成し、取付け座11と
フランジ部16をボルトナツト等で締結すること
によつて、ヘツダー9の上端開口部と処理容器1
0の下端開口部も密着連通させる様に構成する。
23a,23b,23cはシール用パツキンを示
す。 On the other hand, the processing container 10 is also configured in a double tube shape corresponding to the header 9, and the upper end of the outer tube 10a is connected to the lid 1.
3, and the lower part integrally connects its inner circumferential wall and the lower end outer circumferential wall of the inner tube 10b with a disk-shaped sealing plate 14, and the lower end of the outer tube 10a extends downward. A skirt portion 15 is formed, and a flange portion 16 is formed at the lowermost end of the skirt portion 15 so as to face a mounting seat 11 provided on the header 9. Furthermore, a large number of processing gas introduction holes 17 are provided on the outer circumferential side of the inner tube joint portion of the disk-shaped sealing plate 14 so as to face the opening 18 provided at the upper end of the outer tube 9a of the header 9, and the lower end of the inner tube 10b is Header 9
facing the upper end opening of the inner tube 9b. Therefore, in the processing container 10, as shown by the arrow in FIG. 4, the space between the outer tube 10a and the inner tube 10b constitutes the processing gas outward path, and the inner tube 10b serves as the processing gas return path, and the upper end opening of the inner tube 10b constitutes the processing gas return path. constitutes a processing gas turning section. On the above-mentioned outward journey, the return layer (two layers in the figure) of iodine adsorption layers (silver zeolite, etc.) 19a, 1
9b are arranged at appropriate intervals, and a floating contaminant removal filter 20 (glass wool, aluminum foil, etc.) is arranged at the processing gas turning section. In the figure, 21 indicates an iodine adsorbent filling port, and 22 indicates a baffle plate for processing gas diffusion provided as necessary. The downward protruding length of the skirt portion 15 in the processing container 10 and the upward protruding length of the inner and outer tubes in the header 9 are made equal, and by fastening the mounting seat 11 and the flange portion 16 with bolts and nuts, the header 9 upper end opening and processing container 1
The lower end opening of 0 is also configured to closely communicate with each other.
23a, 23b, and 23c indicate sealing gaskets.
この様な装置を用いて沃素含有排ガスを処理す
るに当つては、上述の如くヘツダー9上に処理容
器10を組付け固定し、ヘツダー9の外管9aか
ら導入口17を通して容器10の外管10a内に
排ガスを供給する。そして排ガスは吸着層19
a,19b内を上昇する過程で、沃素が吸着され
て除染が行なわれる。また排ガス中には沃素のほ
か微粉状の放射性物質が混入しており、これらは
吸着層19a,19bの部分でも一部除去される
が、折り返し部に配置した浮遊夾雑物除去フイル
タで完全に除去され、完全に浄化された後内管1
0b,9bを経て排出される。 When treating iodine-containing exhaust gas using such a device, the processing container 10 is assembled and fixed on the header 9 as described above, and the outer pipe of the container 10 is inserted through the inlet 17 from the outer pipe 9a of the header 9. Exhaust gas is supplied into 10a. And the exhaust gas is absorbed by the adsorption layer 19
In the process of rising through a and 19b, iodine is adsorbed and decontamination is performed. In addition to iodine, fine powder radioactive substances are mixed in the exhaust gas, and although some of these are removed by the adsorption layers 19a and 19b, they are completely removed by the floating impurity removal filter placed in the folded part. After being completely purified, the inner tube 1
It is discharged via 0b and 9b.
この様な装置であれば、吸着容器10に対する
排ガスの導入・排出口が1箇所に、好ましくは同
心円的に設けられているから、ヘツダー9との連
通部において導入・排出口が相対的に位置ずれを
起こす恐れがなく、該連通部の気密性を高めるこ
とができる。しかも該連通部で万一ガス漏れが起
こつたとしても、本発明では取付け座11とフラ
ンジ部16との間の気密的締結によつて2重にシ
ールされているから、処理装置外への汚染ガスの
漏出事故は完全に防止される。また吸着容器10
の除染効果が飽和し交換を行なうときは、取付け
座11とフランジ部16との締結を解いて容器1
0を上方に持ち上げ、新たな吸着容器10と交換
すればよく、着脱作業も容易である。尚スカート
部15は搬送工程における損傷防止部としての作
用も発揮する。即ち搬送工程で不慮の事故が発生
し容器10が下方に落下すると、容器が破損して
放射性沃素を吸収した吸着層が作業雰囲気に飛散
し、重大な事故を起こす恐れがあるが、スカート
部15は落下時における緩衝部材としての機能を
果しスカート部15のみが破損するだけですみ、
汚染物質の飛散事故を未然に防止することができ
る。 In such a device, since the exhaust gas introduction/exhaust ports for the adsorption container 10 are provided at one location, preferably concentrically, the relative positions of the introduction/exhaust ports in the communication portion with the header 9 can be adjusted. There is no risk of misalignment, and the airtightness of the communication portion can be improved. Moreover, even if a gas leak were to occur in the communication section, in the present invention, the mounting seat 11 and the flange section 16 are sealed in a double manner by airtight fastening, so that no contamination would be caused outside the processing equipment. Gas leak accidents are completely prevented. Also, the adsorption container 10
When the decontamination effect of the container 1 is saturated and it is time to replace the container 1, the mounting seat 11 and the flange portion 16 are unfastened and the container 1 is replaced.
0 upward and replace it with a new adsorption container 10, and the attachment/detachment work is also easy. The skirt portion 15 also functions as a damage prevention portion during the conveyance process. That is, if an unexpected accident occurs during the conveyance process and the container 10 falls downward, the container will be damaged and the adsorption layer that has absorbed radioactive iodine will be scattered into the working atmosphere, potentially causing a serious accident. serves as a buffering member in the event of a fall, and only the skirt portion 15 is damaged.
Accidents of scattering of pollutants can be prevented.
尚先に説明した如く沃素吸着層19a,19b
を2層に配置し、積層部に適当な隙間を設けてお
けば、この隙間部が処理ガスの滞留部となつてこ
の部分で再分散され、吸着層19a通過時のチヤ
ネリングを解消するから、処理ガスとの接触効率
が高まり除染効果を高めることができる。同様の
趣旨で吸着層を3段以上に配置すれば除染効果を
更に高めることができる。 Furthermore, as explained earlier, the iodine adsorption layers 19a and 19b
If they are arranged in two layers and an appropriate gap is provided in the laminated part, this gap becomes a retention area for the processing gas, where it is redispersed, eliminating channeling when passing through the adsorption layer 19a. The contact efficiency with the processing gas increases and the decontamination effect can be enhanced. For the same purpose, if the adsorption layers are arranged in three or more stages, the decontamination effect can be further enhanced.
本発明は例えば上記の様に構成されるが、具体
的な設計に当つては前記図示例の他種々の設計変
更が可能である。例えば吸着容器としては2重円
筒状のものを示したが、矩形筒状のものであつて
もよい。またヘツダーの外管9aと処理容器の外
管10aとは多数の導入孔17によつて連通させ
た例を示したが円環状の導入口によつて連通させ
ることもでき、この場合処理容器の内管10bは
適当な位置に設けたスペーサー等によつて固定す
ればよい。更に吸着層19a,19bやフイルタ
20をカセツトタイプとして着脱を容易にするこ
とも有効であり、それらの程度の変更はすべて本
発明技術の範囲に含まれる。 Although the present invention is configured as described above, for example, various design changes other than the illustrated example are possible in terms of specific design. For example, although a double cylindrical adsorption container is shown, it may be a rectangular cylindrical one. Furthermore, although an example is shown in which the outer tube 9a of the header and the outer tube 10a of the processing container are communicated with each other through a large number of introduction holes 17, they can also be communicated with each other through an annular introduction port. The inner tube 10b may be fixed with a spacer or the like provided at an appropriate position. Furthermore, it is also effective to make the adsorption layers 19a, 19b and the filter 20 of a cassette type so that they can be easily attached and detached, and all such changes are within the scope of the present invention.
本発明は概略以上の様に構成されており、その
効果を要約すれば下記の通りである。 The present invention is roughly constructed as described above, and its effects can be summarized as follows.
処理容器の処理ガス導入・排出口は一箇所に
同心円的に設けられているから、両者の間で位
置ずれを起こす恐れがなく高い気密性が得られ
る。 Since the processing gas inlet and outlet ports of the processing container are provided concentrically at one location, there is no risk of misalignment between the two, and high airtightness can be achieved.
しかも処理容器とヘツダーとは、上記気密接
続部の他スカート部と取付け座の部分でも気密
的に締結されており2重シール構造となつてい
るから、汚染した排ガスの漏出が完全に防止さ
れる。 In addition, the processing container and header are airtightly connected not only at the above-mentioned airtight connection but also at the skirt section and mounting seat, creating a double seal structure, completely preventing leakage of contaminated exhaust gas. .
沃素吸着層は2層以上の復層に構成されてお
り層間に隙間が設けられているから、処理ガス
を吸着層全体に行き渡らせることができ、吸着
効率が高められる。しかも微粉状の放射性夾雑
物は浮遊物除去フイルタにより除去されるか
ら、高い除染効果を得ることができる。 Since the iodine adsorption layer is composed of two or more double layers and gaps are provided between the layers, the processing gas can be spread throughout the adsorption layer, increasing the adsorption efficiency. Moreover, since fine powder radioactive contaminants are removed by the floating matter removal filter, a high decontamination effect can be obtained.
処理容器の下方に形成されたスカート部は落
下時の緩衝部材としての機能も果し、搬送時に
不慮の事故で処理容器が落下したときでも容器
本体の損傷が防止される。 The skirt portion formed below the processing container also functions as a shock absorbing member when the processing container falls, and even if the processing container falls due to an unexpected accident during transportation, damage to the container body is prevented.
第1図は公知の処理装置を示す概略側面図、第
2図は処理ガス導入・排出部の接続構造を示す一
部破断側面図、第3図は処理ガス導入・排出部の
接続状況を示す説明図、第4〜6図は本発明の処
理装置を例示するもので、第4図は概略縦断面
図、第5,6図は第4図における―線及び
―線断面図である。
9……ヘツダー、10……処理容器、9a,1
0a……外管、9b,10b……内管、11……
取付け座、15……スカート部、16……フラン
ジ部、17……処理ガス導入孔、19a,19b
……吸着層、20……浮遊物除去フイルタ。
Fig. 1 is a schematic side view showing a known processing device, Fig. 2 is a partially cutaway side view showing the connection structure of the processing gas introduction/discharge section, and Fig. 3 shows the connection status of the processing gas introduction/discharge section. The explanatory drawings, FIGS. 4 to 6, illustrate the processing apparatus of the present invention, in which FIG. 4 is a schematic vertical cross-sectional view, and FIGS. 5 and 6 are cross-sectional views taken along lines - and - in FIG. 4. 9... Header, 10... Processing container, 9a, 1
0a...outer pipe, 9b, 10b...inner pipe, 11...
Mounting seat, 15...skirt part, 16...flange part, 17...processing gas introduction hole, 19a, 19b
...Adsorption layer, 20...Floating matter removal filter.
Claims (1)
部に配置され、スカート部を有する2重管状処理
容器からなる沃素含有排ガスの処理装置であつ
て、上記ヘツダーと処理容器とは内管同士および
外管同士が連通するように着脱自在に取り付けら
れており、上記ヘツダーは、外管又は内管の一方
を処理ガス導入管、他方を処理済みガス排出管で
構成するとともに、ヘツダー外管を取り巻く様に
スカート取付け座を一体的に設け、他方、上記処
理容器はヘツダーに対応して外管又は内管の一方
を処理ガス往路とし、該往路内に沃素吸着層を配
置するとともに、他方を処理済みガスの復路と
し、往路と復路とを浮遊夾雑物除去フイルタを介
して連通させ、上記スカートの下端部は上記取り
付け座に対して着脱自在、かつ気密的に取り付け
る構造としてなることを特徴とする沃素含有排ガ
スの処理装置。 2 沃素吸着層が少なくとも2段に形成されてい
る特許請求の範囲第1項記載の処理装置。 3 フイルタの材がグラスウール又はアルミ箔
である特許請求の範囲第1項又は第2項記載の処
理装置。 4 ヘツダー外管が処理ガス往路、内管が処理済
みガス復路である特許請求の範囲第1〜3項のい
ずれかに記載の装置。 5 2重管状処理容器が可搬性である特許請求の
範囲第1〜4項のいずれかに記載の装置。 6 浮遊夾雑物除去フイルタを、処理容器内のガ
スの往路と復路との折り返えし部分に設けた特許
請求の範囲第1〜5項のいずれかに記載の装置。[Scope of Claims] 1. An iodine-containing exhaust gas treatment device comprising a fixed double-tubular header and a double-tubular processing vessel disposed above the header and having a skirt portion, wherein the header and the processing vessel are is removably attached so that the inner tubes and the outer tubes communicate with each other, and the header has one of the outer tube and the inner tube as a treated gas introduction tube, and the other as a treated gas discharge tube, A skirt mounting seat is integrally provided so as to surround the header outer tube, and on the other hand, in the processing container, one of the outer tube or the inner tube corresponding to the header is used as a processing gas outgoing path, and an iodine adsorption layer is arranged in the outgoing path. At the same time, the other side is used as a return route for the treated gas, the outward route and the return route are communicated via a floating contaminant removal filter, and the lower end of the skirt is configured to be detachably attached to the mounting seat in an airtight manner. A treatment device for iodine-containing exhaust gas characterized by: 2. The processing apparatus according to claim 1, wherein the iodine adsorption layer is formed in at least two stages. 3. The processing apparatus according to claim 1 or 2, wherein the filter material is glass wool or aluminum foil. 4. The apparatus according to any one of claims 1 to 3, wherein the outer header pipe is a processing gas outward path, and the inner pipe is a processed gas return path. 5. The apparatus according to any one of claims 1 to 4, wherein the double tubular processing container is portable. 6. The device according to any one of claims 1 to 5, wherein the floating contaminant removal filter is provided at the folded portion between the outgoing and returning gas paths in the processing container.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57035543A JPS58151597A (en) | 1982-03-05 | 1982-03-05 | Processing device for waste gas containing iodine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57035543A JPS58151597A (en) | 1982-03-05 | 1982-03-05 | Processing device for waste gas containing iodine |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58151597A JPS58151597A (en) | 1983-09-08 |
| JPS6331756B2 true JPS6331756B2 (en) | 1988-06-27 |
Family
ID=12444637
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57035543A Granted JPS58151597A (en) | 1982-03-05 | 1982-03-05 | Processing device for waste gas containing iodine |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58151597A (en) |
-
1982
- 1982-03-05 JP JP57035543A patent/JPS58151597A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58151597A (en) | 1983-09-08 |
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