JPS6332591B2 - - Google Patents
Info
- Publication number
- JPS6332591B2 JPS6332591B2 JP58169439A JP16943983A JPS6332591B2 JP S6332591 B2 JPS6332591 B2 JP S6332591B2 JP 58169439 A JP58169439 A JP 58169439A JP 16943983 A JP16943983 A JP 16943983A JP S6332591 B2 JPS6332591 B2 JP S6332591B2
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- glass
- polished
- viscosity
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Description
【発明の詳細な説明】
〔発明の技術分野〕
本発明はガラス研磨方法に関するものであり、
特にIC用マスクや光学部品等に用いるガラス板
の研磨方法に関するものである。[Detailed Description of the Invention] [Technical Field of the Invention] The present invention relates to a glass polishing method,
In particular, it relates to a method of polishing glass plates used for IC masks, optical components, etc.
半導体デバイス製造において使用されるガラス
板はソーダライム系が主流である。該ガラス板は
例えば半年以上の長期保存がなされるとそのガラ
ス板表面が汚染されることは勿論、曇つた状態を
呈する。このような曇りはガラスを構成するナト
リウム成分が表面に析出するためであり、保存期
間がより長期にわたるとナトリウムが析出してい
る層がポーラス状になつてしまうことがある。こ
のようなガラス表面を浄化するために洗浄又は研
磨技術が必要となつている。
Glass plates used in semiconductor device manufacturing are mainly made of soda lime. If the glass plate is stored for a long period of time, for example, for more than half a year, the surface of the glass plate will not only become contaminated but also become cloudy. Such cloudiness is due to the sodium components that make up the glass precipitating on the surface, and if the storage period is longer, the layer in which sodium is precipitated may become porous. Cleaning or polishing techniques are required to clean such glass surfaces.
従来上記のような欠点を有するガラス板は酸化
セリウム又は酸化ジルコニウムを砥粒（研磨剤）
として、また、水又はグリース（油）を研磨液と
して研磨が行なわれていた。研磨液を水として場
合水は粘性がないため発熱が少ない粘度制御がで
きない等の欠点を有し、一方グリースを研磨液と
した場合は研磨後の残存した研磨液の処理に例え
ばトリクレン，パークレン等の有害な有機溶剤を
用いる必要があり、後処理に大きな問題があつ
た。
Conventionally, glass plates with the above-mentioned drawbacks have been treated with abrasive grains (abrasives) of cerium oxide or zirconium oxide.
Polishing has also been carried out using water or grease (oil) as the polishing liquid. When water is used as the polishing liquid, water has the disadvantages of generating less heat and not being able to control the viscosity because it has no viscosity.On the other hand, when using grease as the polishing liquid, the remaining polishing liquid after polishing can be treated with the following methods: It was necessary to use harmful organic solvents, which caused major problems in post-processing.
上記欠点を鑑み本発明は最適な粘性を得ること
が出来るガラス板研磨方法を提供することを目的
とする。
In view of the above drawbacks, it is an object of the present invention to provide a method for polishing a glass plate that can obtain optimum viscosity.
本発明の他の目的は研磨後の後処理が容易な研
磨方法を提供することである。 Another object of the present invention is to provide a polishing method that facilitates post-polishing treatment.
本発明の目的は研磨砥粒を含有させたポリビニ
ルアルコール水溶液を用いて被研磨物を研磨する
ことを特徴とするガラス板研磨方法によつて達成
される。
The object of the present invention is achieved by a method for polishing a glass plate, which comprises polishing an object to be polished using an aqueous polyvinyl alcohol solution containing abrasive grains.
また本方法に係る被研磨物としてはガラス、レ
ンズあるいはシリコンウエハ等の半導体基板等に
有効に用いられる。 Further, the object to be polished according to this method can be effectively used for glass, lenses, semiconductor substrates such as silicon wafers, and the like.
以下本発明の１実施例を説明する。 One embodiment of the present invention will be described below.
SiO2、Na、Feからなるガラス基板の表面が約
10μmポーラス状態になつているガラス基板を研
磨する研磨剤として50gの酸化セリウム（CeO2）
にPVA（ポリビニルアルコール）水溶液を加え約
100cp（センチポアズ）の粘度を有する研磨剤含
有液を作り該液を用いて約５分間研磨した。この
ポーラス状態を有するガラス板はポーラス部が研
磨され、表面粗さが約100Åになつた。PVA溶液
は乾燥すると固型化することが知られており、分
散している研磨砥粒が飛散するのを防止する効果
があり、そのため部屋内の高クリーン度維持に役
立つ。なお研磨後の洗浄（研磨剤除去）は研磨液
がグリースの場合と異なり容易であつた、更に又
該PVAはぬれ性が良好なために研磨、洗浄後の
ガラス板の乾燥も良好で均一に行なわれガラス表
面への研磨剤固着は生じなかつた。 The surface of the glass substrate made of SiO 2 , Na, and Fe is approximately
50g of cerium oxide (CeO 2 ) as a polishing agent to polish a glass substrate that is 10μm porous.
Add PVA (polyvinyl alcohol) aqueous solution to approx.
An abrasive-containing liquid having a viscosity of 100 cp (centipoise) was prepared, and polishing was performed using this liquid for about 5 minutes. The porous portion of this porous glass plate was polished to have a surface roughness of approximately 100 Å. PVA solution is known to solidify when dried, and has the effect of preventing dispersed abrasive grains from scattering, thereby helping to maintain a high level of cleanliness in the room. Cleaning after polishing (removal of abrasive) was easy, unlike when the polishing liquid was grease.Furthermore, because PVA has good wettability, the glass plate dried well and evenly after polishing and cleaning. The abrasive did not stick to the glass surface.
本実施例では研磨剤含有液は約100cpの粘性を
持たせるようにしたが、cpは50〜100程度で有効
である。また本実施例では研磨剤として酸化セリ
ウムの他に酸化ジルコニウム等も用いられる。 In this example, the abrasive-containing liquid was made to have a viscosity of about 100 cp, but a cp of about 50 to 100 is effective. In addition to cerium oxide, zirconium oxide or the like is also used as the polishing agent in this embodiment.
以上説明したように本発明によれば、適当な粘
性を有した研磨が可能で且つ研磨後の後処理を容
易に行なうことが出来る。
As explained above, according to the present invention, it is possible to perform polishing with appropriate viscosity, and post-treatment after polishing can be easily performed.
Claims (1)
水溶液を用いて被研磨物を研磨することを特徴と
する研磨方法。 ２ 前記被研磨物がガラス、レンズ、半導体基板
及び機械部品からなる群から選択されることを特
徴とする特許請求の範囲第１項記載の研磨方法。[Scope of Claims] 1. A polishing method characterized by polishing an object to be polished using an aqueous polyvinyl alcohol solution containing abrasive grains. 2. The polishing method according to claim 1, wherein the object to be polished is selected from the group consisting of glass, lenses, semiconductor substrates, and mechanical parts.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58169439A JPS6062458A (en) | 1983-09-16 | 1983-09-16 | Polishing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58169439A JPS6062458A (en) | 1983-09-16 | 1983-09-16 | Polishing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6062458A JPS6062458A (en) | 1985-04-10 |
| JPS6332591B2 true JPS6332591B2 (en) | 1988-06-30 |
Family
ID=15886619
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58169439A Granted JPS6062458A (en) | 1983-09-16 | 1983-09-16 | Polishing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6062458A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4784258B2 (en) * | 2005-10-26 | 2011-10-05 | マルホ発條工業株式会社 | Manufacturing method and inspection method of PTP package |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5815666A (en) * | 1981-07-22 | 1983-01-29 | Hoya Corp | Processing method |
-
1983
- 1983-09-16 JP JP58169439A patent/JPS6062458A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6062458A (en) | 1985-04-10 |
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