JPS633301B2 - - Google Patents
Info
- Publication number
- JPS633301B2 JPS633301B2 JP7282783A JP7282783A JPS633301B2 JP S633301 B2 JPS633301 B2 JP S633301B2 JP 7282783 A JP7282783 A JP 7282783A JP 7282783 A JP7282783 A JP 7282783A JP S633301 B2 JPS633301 B2 JP S633301B2
- Authority
- JP
- Japan
- Prior art keywords
- glass
- ink
- layer
- penetrating
- glass plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011521 glass Substances 0.000 claims description 40
- 230000000149 penetrating effect Effects 0.000 claims description 17
- 239000000126 substance Substances 0.000 claims description 12
- 229910052709 silver Inorganic materials 0.000 claims description 9
- 239000004332 silver Substances 0.000 claims description 9
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 8
- 229920002120 photoresistant polymer Polymers 0.000 claims description 8
- 238000005530 etching Methods 0.000 claims description 6
- 238000005406 washing Methods 0.000 claims description 5
- 230000000873 masking effect Effects 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 238000007650 screen-printing Methods 0.000 claims description 4
- 238000007796 conventional method Methods 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims description 2
- 238000000034 method Methods 0.000 claims description 2
- 238000007740 vapor deposition Methods 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 14
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 8
- 239000011247 coating layer Substances 0.000 description 8
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 7
- 230000005611 electricity Effects 0.000 description 4
- 230000003068 static effect Effects 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 229910001415 sodium ion Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Surface Treatment Of Glass (AREA)
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明はプリント基板、ICフオトマスク、液
晶板、ネームプレート等に応用する浸透性硝子イ
ンクを使用する高精度の硝子原板に関するもので
ある。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a high-precision glass original plate using penetrating glass ink, which is applied to printed circuit boards, IC photomasks, liquid crystal panels, name plates, etc.
従来この種原板として古くからフイルム原板が
使用されてきたがフイルムは材質上彎曲したり歪
みや傷損し易いのと静電気発生に因る汚塵の附着
更には膨脹係数が大である等精度的に満足し得な
いものである。
Conventionally, film base plates have been used as this type of base plate for a long time, but due to the material of the film, film is easily bent, distorted, and damaged, attracts dirt due to static electricity, and has a large coefficient of expansion. This is something I cannot be satisfied with.
然して以上のほかクロームを蒸着したクローム
硝子原板が利用されているが該クローム硝子原板
はフイルムに比して寸法精度が高く且つ湿度や温
度に因る影響も少なく又縦横荷重に対て物理的強
度に優れているのとクローム蒸着膜は硝子と膨脹
係数が略等しいので安定性に富み従つてフイルム
に比して遥かに耐用性と光学的にも元原板よりの
再現性に優れ又静電発生がないので汚塵の付着も
少なく且つ除去も容易である等の諸利点を具有す
るがクローム蒸着膜の厚さが500Å〜1000Åに及
ぶので扱い中欠損したり傷損を生じ易く然もピン
ホールを存する等の欠点を具有し又高価な不利も
ある。 However, in addition to the above, chrome glass original plates with chromium vapor-deposited are used, but these chrome glass original plates have higher dimensional accuracy than films, are less affected by humidity and temperature, and have physical strength against vertical and horizontal loads. The chromium-deposited film has almost the same coefficient of expansion as glass, so it is very stable, and is therefore far more durable than film. It also has excellent optical reproducibility compared to the original plate, and it also reduces the generation of static electricity. It has various advantages such as less dust adhesion and easy removal, but since the thickness of the chromium evaporated film ranges from 500 Å to 1000 Å, it is easy to chip or damage during handling. It has drawbacks such as the presence of holes, and also has the disadvantage of being expensive.
本発明は清浄とした硝子板面に対し浸透性硝子
インクを塗布し且つ洗滌して該インクを硝子板と
面一な浸透層に形成し次で該浸透層を含む硝子板
面に金属蒸着又は化学銀引き層、該層の上面に感
光性フオトレジストを塗布した後この上面にネガ
フイルムを載置し紫外線露光して現像する等の手
段より上記従来の諸不利を解消するものである。
In the present invention, a penetrating glass ink is applied to a clean glass plate surface and washed to form a penetrating layer flush with the glass plate, and then metal vapor deposition or The above-mentioned disadvantages of the conventional method are overcome by means of applying a chemical silvering layer, applying a photosensitive photoresist on the upper surface of the layer, placing a negative film on the upper surface, and developing the film by exposing it to ultraviolet light.
即ち清浄ならしめた硝子板の表面に、スクリー
ン印刷によりアンバー色の浸透性硝子インクを一
様に塗布し次でこれを200℃で乾燥してインク中
のガス抜きをなし次で今度は450℃〜600℃の温度
で焼付けした後洗滌して上面のインクを除去する
と上記塗布インクの一部は硝子板の表面より深い
浸透層を形成する即ち硝子板と面一な浸透性イン
ク付き硝子板となり該インク浸透部面は紫外線不
透過部面となる。
That is, amber-colored penetrating glass ink is uniformly applied to the surface of a cleaned glass plate by screen printing, and then it is dried at 200°C to remove gas from the ink, and then the ink is heated to 450°C. After baking at a temperature of ~600°C, the ink on the top surface is removed by washing, and a portion of the applied ink forms a penetrating layer deeper than the surface of the glass plate.In other words, the glass plate becomes flush with the glass plate with penetrating ink. The ink permeable surface becomes a UV opaque surface.
そこで今度は上記インク浸透部面を含む硝子板
の上面一杯に化学銀引き層を形成した後更に該層
上面に耐蝕性剤の塗層を設け然る後上記塗層の上
面にネガフイルムを載置し且つ光遮断下において
紫外線照射するとレジスト現像されてフイルム面
の模様が硝子板に判然たる蝕刻模様となる。 Therefore, after forming a chemical silvering layer on the entire upper surface of the glass plate, including the surface where the ink penetrated, a coating layer of a corrosion-resistant agent was further applied on the upper surface of the layer, and then a negative film was placed on the upper surface of the coating layer. When the film is placed and irradiated with ultraviolet light while shielded from light, the resist is developed and the pattern on the film surface becomes a clearly etched pattern on the glass plate.
斯くして常法によりマスキング、レジスト、化
学銀等を除去し且つ洗滌仕上げすることにより本
フオト硝子原板が得られる。 The photo glass original plate is thus obtained by removing masking, resist, chemical silver, etc., and washing and finishing it by a conventional method.
近時この種原板には高い精度が要求されてきた
が古からのフイルムは前記の如く静電気発生によ
る汚塵付着のほか物理的にも満足されず又クロー
ム硝子板においても亦前記の如くピンホールがあ
つたり扱い中傷損し易いのとコスト的に不利で且
つ量産にも不適であるが本発明の原板は静電気発
生のおそれがないことは勿論表面が面一で浸透層
をなしているので多少の傷にも支障がなく又組成
上ピンホールがなく従つて完全に紫外線を遮断し
温度、湿度にも影響されないのと量産に適する等
前記在来の各原板にみない諸多の優れた利点を具
有するものである。
Recently, high precision has been required for this type of original plate, but the old film is not physically satisfied with the problem of dust adhesion due to static electricity generation as mentioned above, and even chrome glass plates have pinholes as mentioned above. However, the original plate of the present invention has no risk of generating static electricity, and since the surface is flush and has a permeation layer, it is disadvantageous in terms of cost and is not suitable for mass production. It has many excellent advantages not found in the conventional original plates mentioned above, such as being resistant to scratches, having no pinholes due to its composition, completely blocking ultraviolet rays, being unaffected by temperature and humidity, and being suitable for mass production. It is something to do.
第1図Aに示したように予め拭取し清浄ならし
めた硝子板1の表面に、スクリーン印刷によりア
ンバー色の浸透性硝子インク(奥野製薬工業製の
シルバーステイン中)の一様な塗布層2を設け次
でこれを200℃の温度にて乾燥してインク中のガ
ス抜きをなし次で今度は高温電気炉中において
450℃〜600℃の温度で焼付けした後洗滌して上面
のインクを除去することにより上記塗布層中のイ
ンクの一部が硝子板1の表面より7μ〜15μの深さ
の浸透層2′を形成する即ち金属イオン←→ナトリ
ウムイオンにより固着して硝子板1と面一な浸透
性インク付き硝子板1′(同図B参照)となり該
インク浸透部2′面は紫外線不透過部面となる。
そこで今度は第1図Cに示す如く上記インク浸透
部2′面を含む硝子板1′の上面一杯に化学銀引き
層3を形成した後更に該層上面に耐蝕性剤として
感光性フオトレジストの塗層4を設け(第1図D
参照)然る後上記塗層の上面に第2図Eに示す如
くネガフイルム5を載置し且つ光遮断下において
紫外線照射するとレジスト現像せられてフイルム
5面の模様6が硝子板1′に対し化学銀を介しエ
ツチングにより判然たる蝕刻模様6′となる。(第
2図F参照)更に上記浸透部2′を弗化水素酸に
て7μ〜15μ程エツチングをすると6″となる。(第
2図G参照)
斯くしてマスキング、レジスト、化学銀等を除
去し且つ洗滌仕上げすることにより本フオト硝子
原板が得られる。(第2図G参照)
なお本法の応用として上記浸透硝子板の表面に
クロームメツキを施し且つ耐蝕性膜としてレジス
トを塗布して焼付け現像なし次でクローム膜をエ
ツチング、更に浸透部を弗化水素酸にてエツチン
グすることによりクローム硝子原板と浸透性イン
クフオト原板の利点をもつ高精度の写刻がなされ
る。
As shown in FIG. 1A, a uniform layer of amber-colored penetrating glass ink (Silver Stain, manufactured by Okuno Pharmaceutical Co., Ltd.) is coated on the surface of the glass plate 1, which has been wiped clean in advance, by screen printing. 2 was prepared and then dried at a temperature of 200°C to remove gas from the ink, and then placed in a high-temperature electric furnace.
By baking at a temperature of 450°C to 600°C and then washing to remove the ink on the upper surface, a portion of the ink in the coating layer penetrates into the permeation layer 2' at a depth of 7μ to 15μ from the surface of the glass plate 1. That is, the metal ions←→ are fixed by the sodium ions, and become flush with the glass plate 1, the glass plate 1' with penetrating ink (see figure B), and the surface of the ink-penetrated area 2' becomes an ultraviolet opaque surface. .
Therefore, as shown in FIG. 1C, after forming a chemical silvering layer 3 on the entire upper surface of the glass plate 1' including the surface of the ink penetrating portion 2', a photosensitive photoresist was further applied as a corrosion resistant agent on the upper surface of the layer. Coating layer 4 is provided (Fig. 1D
After that, a negative film 5 is placed on the upper surface of the coating layer as shown in FIG. On the other hand, etching with chemical silver produces a clear etched pattern 6'. (See Figure 2F) Furthermore, etching the penetration area 2' by 7μ to 15μ with hydrofluoric acid results in a thickness of 6''. (See Figure 2G) In this way, masking, resist, chemical silver, etc. This photo glass original plate is obtained by removing and washing the glass plate. (See Figure 2 G) As an application of this method, the surface of the above-mentioned permeable glass plate is plated with chrome and a resist is applied as a corrosion-resistant film. By etching the chrome film without baking and developing, and then etching the permeated areas with hydrofluoric acid, high-precision engravings can be made that have the advantages of a chrome glass original plate and a permeable ink photo original plate.
図は本発明の実施例を示したものであつて、第
1図Aは本発明における硝子表面にスクリーン印
刷により浸透性硝子インクを塗布し予備乾燥後高
温焼付けをした状態の斜面図、同図Bは同上の状
態より洗滌後上面のインクを洗い流し硝子板の上
面にこれと面一なインクの浸透層が形成された状
態の斜面図、同図Cは同上のインク浸透部上面に
化学銀の塗層又は金属蒸着層を形成した状態の斜
面図、同図Dは同上の化学銀面上に感光性フオト
レジストを塗布した状態の斜面図、第2図Eは同
上のフオトレジスト上にネガ又はポジフイルムを
載置し紫外線露光の状態を示す斜面図、同図Fは
同上のレジスト現像化学エツチング状態の一部欠
截斜面図、同図Gは硝子浸透部を弗化水素酸にて
エツチングをしマスキング、レジスト、化学銀を
除去し洗滌仕上げした本発明原板の一部欠截斜面
図である。
1は硝子板、2は浸透性硝子インクの塗布層、
2′は浸透層、3は化学銀塗層、4は感光性フオ
トレジスト、5はネガフイルム、6は模様、6′
は蝕刻模様、6″は浸透部硝子をエツチングした
蝕刻模様。
The figures show an embodiment of the present invention, and Figure 1A is a perspective view of a state in which penetrating glass ink has been applied to the glass surface by screen printing according to the present invention, pre-drying and high-temperature baking. Figure B is a perspective view of the state in which the ink on the upper surface has been washed away and an ink permeation layer flush with this is formed on the upper surface of the glass plate. Figure 2D is a perspective view of a state in which a coating layer or a metal vapor deposited layer has been formed, Figure 2D is a perspective view of a state in which a photosensitive photoresist is applied on the same chemical silver surface, and Figure 2E is a perspective view of a state in which a photoresist is coated on the same photoresist. A perspective view showing the condition of a positive film placed and exposed to ultraviolet rays; Figure F is a partially cutaway perspective view of the same resist developed and chemically etched; Figure G is a perspective view of the glass-penetrated area etched with hydrofluoric acid. FIG. 2 is a partially cutaway perspective view of the original plate of the present invention after masking, resist, and chemical silver have been removed and cleaned. 1 is a glass plate, 2 is a coating layer of penetrating glass ink,
2' is a permeation layer, 3 is a chemical silver coating layer, 4 is a photosensitive photoresist, 5 is a negative film, 6 is a pattern, 6'
6" is an etched pattern, and 6" is an etched pattern etched into the penetrating glass.
Claims (1)
浸透性硝子インクを塗布し且つ予備乾燥後高温で
焼付け次で洗滌して硝子表面と面一なインクの浸
透層を形成し次で該インク浸透層を含む硝子板の
表面に金属蒸着又は化学銀引き層を設けて該層の
上面に、感光性フオトレジストを塗布し次で該フ
オトレジストの上面にネガフイルムを載置して紫
外線露光しレジスト現像及び化学銀のエツチング
をし更に硝子浸透層を弗化水素酸にてエツチング
し然る後常法のマスキング、レジスト、化学銀等
を除去して洗滌仕上げして得ることを特徴とする
浸透性硝子インクによる着色フオト硝子原板の製
造法。1 Apply penetrating glass ink to the surface of a clean glass plate by screen printing, and after pre-drying, bake at high temperature and wash to form an ink penetrating layer flush with the glass surface, and then remove the ink penetrating layer. A metal vapor deposition or chemical silvering layer is provided on the surface of the glass plate containing the metal, a photosensitive photoresist is applied on the upper surface of the layer, a negative film is placed on the upper surface of the photoresist, and the resist is developed and exposed to ultraviolet light. A penetrating glass ink characterized in that it is obtained by etching chemical silver, etching the glass penetrating layer with hydrofluoric acid, and then washing and finishing by removing masking, resist, chemical silver, etc. using a conventional method. A method for manufacturing a colored photo glass original plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58072827A JPS59198459A (en) | 1983-04-27 | 1983-04-27 | Manufacture of colored photoengraved glass plate by using penetrating glass ink |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58072827A JPS59198459A (en) | 1983-04-27 | 1983-04-27 | Manufacture of colored photoengraved glass plate by using penetrating glass ink |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59198459A JPS59198459A (en) | 1984-11-10 |
| JPS633301B2 true JPS633301B2 (en) | 1988-01-22 |
Family
ID=13500633
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58072827A Granted JPS59198459A (en) | 1983-04-27 | 1983-04-27 | Manufacture of colored photoengraved glass plate by using penetrating glass ink |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59198459A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20220086304A1 (en) * | 2020-09-17 | 2022-03-17 | Fujifilm Business Innovation Corp. | Information processing apparatus and non-transitory computer readable medium storing program |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3313663B2 (en) | 1999-05-14 | 2002-08-12 | 国際技術開発株式会社 | Flame detector |
| CN102964065B (en) * | 2012-10-29 | 2015-12-09 | 晟光科技股份有限公司 | The method of ink layer is covered on the glass substrate in a kind of production process of OGS product |
| CN116072013B (en) * | 2022-12-30 | 2025-10-24 | 常州亚玛顿股份有限公司 | Method for manufacturing a lens-free, five-sided luminous direct-lit glass backlight panel |
-
1983
- 1983-04-27 JP JP58072827A patent/JPS59198459A/en active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20220086304A1 (en) * | 2020-09-17 | 2022-03-17 | Fujifilm Business Innovation Corp. | Information processing apparatus and non-transitory computer readable medium storing program |
| US12081716B2 (en) * | 2020-09-17 | 2024-09-03 | Fujifilm Business Innovation Corp. | Information processing apparatus and non-transitory computer readable medium storing program |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59198459A (en) | 1984-11-10 |
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