JPS6334420B2 - - Google Patents
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- Publication number
- JPS6334420B2 JPS6334420B2 JP56503612A JP50361281A JPS6334420B2 JP S6334420 B2 JPS6334420 B2 JP S6334420B2 JP 56503612 A JP56503612 A JP 56503612A JP 50361281 A JP50361281 A JP 50361281A JP S6334420 B2 JPS6334420 B2 JP S6334420B2
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- Japan
- Prior art keywords
- light beam
- mirror
- objective
- condenser
- optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Investigating Or Analysing Materials By Optical Means (AREA)
Description
請求の範囲
1 光束発生装置から放射された光束がケースの
入口孔を通つて対物反射鏡に入射し、この対物反
射鏡はこの放射光束の経路を遮断するように配置
され、次いでこの光束は光束発生装置の光源の中
間像結像装置に入射し、反射した後再び対物反射
鏡に戻り、最終経路をたどり、ケースの入口孔に
隣接する出口孔を通つてこの装置の外に出る構造
の光学的多重経路装置において、光束発生装置2
の光源の中間像結像装置は、その上に光源の中間
像を結像する曲率の異なる2個の鏡16,17;
29,30を有する集光体からなり、集光体の2
個の鏡は対物鏡から反射した光束が集光体の2個
の鏡で順に反射され、そこから再び対物反射鏡に
戻るように配置され、この鏡の中の曲率の大きい
方の鏡17,29に対する光束1の入射角は曲率
の小さい方の鏡16,30に対する光束1の入射
角よりも小さいことを特徴とする光学的多重経路
装置。Claim 1: The luminous flux emitted from the luminous flux generating device enters the objective reflector through the entrance hole of the case, the objective reflector is arranged to block the path of this emitted luminous flux, and then this luminous flux An optical structure in which the light source of the generator enters the intermediate image forming device, is reflected, returns to the objective reflector again, follows its final path and exits the device through an exit hole adjacent to the entrance hole of the case. In the target multi-path device, the light beam generating device 2
The intermediate image forming device for the light source includes two mirrors 16, 17 with different curvatures on which an intermediate image of the light source is formed;
29, 30, and 2 of the condenser
The mirrors are arranged so that the light beam reflected from the objective mirror is sequentially reflected by the two mirrors of the condenser, and then returns to the objective mirror again. An optical multipath device, characterized in that the angle of incidence of the beam 1 on the mirror 29 is smaller than the angle of incidence of the beam 1 on the mirrors 16, 30 with smaller curvature.
2 前記集光体において、鏡16が平面鏡であ
り、これに対して他方の鏡17が凹面鏡であるこ
とを特徴とする請求の範囲第1項記載の光学的多
重経路装置。2. Optical multipath device according to claim 1, characterized in that in the condenser, the mirror 16 is a plane mirror, whereas the other mirror 17 is a concave mirror.
3 前記集光体15の鏡29,30が共に凹面鏡
であることを特徴とする請求の範囲第1項記載の
光学的多重経路装置。3. The optical multi-path device according to claim 1, wherein the mirrors 29 and 30 of the condenser 15 are both concave mirrors.
4 光束発生装置から放射された光束がダイヤフ
ラムの入口孔を通つて対物反射鏡に入射し、この
対物反射鏡はこの放射光束の経路を遮断するよう
に配置され、次いでこの光束は光束発生装置の光
源の中間像結像装置に入射し、反射した後再び対
物反射鏡に戻り、最終経路をたどり、ダイヤフラ
ムの入口孔に隣接するの出口孔を通つてこの装置
の外に出る構造の光学的多重経路装置において、
光束発生装置2の光源の中間像結像装置は、その
上に光源の中間像を結像する曲率の異なる2個の
鏡16,17;29,30を有する集光体からな
り、集光体の2個の鏡は対物鏡から反射した光束
が集光体の2個の鏡で順に反射され、そこから再
び対物反射鏡に戻るように配置され、この鏡の中
の曲率の大きい方の鏡17,29に対する光束1
の入射角は曲率の小さい方の鏡16,30に対す
る光束1の入射角よりも小さくし、さらに試料3
9の平面の反射率測定のために、前記試料39を
支持具38に装着して放射光束1の経路を遮断す
るように配設し、これに対して測定を行う時点で
対物反射鏡31を試料位置に位置する旋転軸33
を中心として回転させ、放射光束1を試料平面で
の反射を介して対物反射鏡31と集光体15に交
互に入射させ、その最終経路で放射光束1を出口
孔43に直接向かわせることを特徴とする光学的
多重経路装置。4. The luminous flux emitted from the luminous flux generator enters the objective mirror through the entrance hole of the diaphragm, the objective mirror is arranged to block the path of this radiated luminous flux, and then this luminous flux enters the optical flux of the luminous flux generator. Optical multiplexing of the structure in which the intermediate image of the light source enters the imaging device, reflects and returns again to the objective reflector, following its final path and exiting the device through the exit hole adjacent to the entrance hole of the diaphragm. In the route device,
The intermediate image forming device of the light source of the light flux generating device 2 consists of a light condenser having two mirrors 16, 17; 29, 30 with different curvatures on which an intermediate image of the light source is formed. The two mirrors are arranged so that the light beam reflected from the objective mirror is sequentially reflected by the two mirrors of the condenser, and then returns to the objective reflector again. Luminous flux 1 for 17,29
The incident angle of the light beam 1 is made smaller than the incident angle of the light beam 1 on the mirrors 16 and 30 with smaller curvature, and
In order to measure the reflectance of the plane 9, the sample 39 is mounted on a support 38 and arranged so as to block the path of the emitted light beam 1, and when measuring this, the objective reflector 31 is Rotating shaft 33 located at the sample position
is rotated around , the emitted light beam 1 is made to alternately enter the objective reflector 31 and the condenser 15 through reflection on the sample plane, and the emitted light beam 1 is directed directly to the exit hole 43 on its final path. Optical multipath device featuring features.
5 前記対物反射鏡31は旋転軸33を中心とし
てアーム32の円弧に沿つて回転可能であり、前
記アーム32は試料39の支持具38に対して旋
回可能かつ同軸に装着されるとともに、その端部
に対物反射鏡31を支持することを特徴とする請
求の範囲第4項記載の光学的多重経路装置。5 The objective reflector 31 is rotatable around a rotation axis 33 along the arc of an arm 32, and the arm 32 is rotatably and coaxially attached to the support 38 of the sample 39, and its end 5. The optical multipath device according to claim 4, further comprising an objective reflector 31 supported in the optical multipath device.
技術分野
本発明は光学装置製造工業に係わり、より具体
的には光学的多重経路装置に関するものである。TECHNICAL FIELD This invention relates to the optical device manufacturing industry, and more particularly to optical multipath devices.
背景技術
今日では、光が通る経路を光学的に非常に長く
したことを特徴とする光学的多重経路装置は低濃
度の気体又は極く微弱な吸収帯を有する気体を試
験するためのあらゆる赤外線分光計に不可欠のも
のとなつている。このような装置は定性分析及び
定量分析の何れにも使用することができる。BACKGROUND ART Nowadays, optical multipath devices, which are characterized by a very long optical path for light, are used in infrared spectroscopy for testing gases with low concentrations or gases with extremely weak absorption bands. It has become an indispensable part of the meter. Such a device can be used for both qualitative and quantitative analysis.
現在、光学的多重経路装置については1つの先
行技術が公知になつており、それは光束発生装置
の光源から放射させた光束をケースの入口孔を通
して対物反射鏡に入射させ、この対物反射鏡を放
射光束の経路を横断すると共に回転可能に装着
し、この光束を更に、光束発生装置光源の中間像
結像装置に入射させた後再び対物反射鏡に戻し、
一連の多重経路を通過し終えてからこの装置のケ
ースの出口孔を通してこの装置の外に出す構造の
光学的多重経路装置である。この装置では、光束
発生装置の光源の中間像結像装置は2個の平面鏡
を有し、この平面鏡は相互に角度をなすように配
設されている。 Currently, one prior art for optical multipath devices is known, which involves directing the light beam emitted from a light source of a beam generator into an objective reflector through an inlet hole in a case, which The light beam is rotatably mounted to cross the path of the light beam, and the light beam is further incident on the intermediate image forming device of the light source of the light beam generator and then returned to the objective reflector.
This is an optical multi-path device configured to pass through a series of multi-paths before exiting the device through an exit hole in the case of the device. In this device, the intermediate imaging device of the light source of the beam generator has two plane mirrors, which are arranged at an angle to each other.
然し乍ら、上述の装置の中で光束発生装置の光
源の中間像の結像時に光束の周辺の光が平面鏡に
捕捉されず、そのために放射光束の中の相当量の
光が対物反射鏡を越えて散乱する(これは光束が
ぼける原因となる)。 However, in the above-mentioned device, when the intermediate image of the light source of the beam generator is formed, the peripheral light of the beam is not captured by the plane mirror, and therefore a considerable amount of the light in the emitted beam passes beyond the objective reflector. Scatter (this causes the light flux to become blurred).
発明の開示
本発明は光束発生装置の光源の中間像結像装置
の光束透過率を向上させると共に光束の経路の数
の調整を簡単にできる装置を提供することを目的
とするものである。DISCLOSURE OF THE INVENTION An object of the present invention is to provide a device that can improve the luminous flux transmittance of an intermediate image forming device of a light source of a luminous flux generating device and can easily adjust the number of luminous flux paths.
この目的は光束発生装置から放射した光束を装
置のケースの入口孔を通して対物反射鏡に入射さ
せ、この対物反射鏡を放射光束の軸回りに回転可
能に装着し、前記放射光束を更に光束発生装置の
光源の中間像結像装置に向かわせ、そこから対物
反射鏡に戻し、これを繰り返して多重経路を通過
させた後にケースの出口孔から出すように構成し
た光学的多重経路装置において本発明に基づき、
光束発生装置の光源の中間像結像装置に複合型の
集光体を設け、この集光体を曲率の異る2個の鏡
で構成し、これを適当に配置して、曲率の大きい
鏡に対する放射光束の入射角を、曲率の小さい鏡
に対する放射光束の入射角より小さくすることに
よつて具現化することができる。 The purpose of this is to make the luminous flux emitted from the luminous flux generator enter the objective reflector through the entrance hole of the case of the device, and this objective reflector is mounted so as to be rotatable around the axis of the radiated luminous flux, and the luminous flux is further transmitted to the luminous flux generator. The present invention is directed to an optical multipath device in which a light source is directed to an intermediate image forming device, from there back to an objective reflector, and repeatedly through multiple paths before exiting through an exit hole in a case. Based on
A composite light condenser is provided in the intermediate image forming device of the light source of the light flux generating device, and this condenser is composed of two mirrors with different curvatures, and these are appropriately arranged to form a mirror with a large curvature. This can be realized by making the angle of incidence of the emitted light beam on the mirror smaller than the angle of incidence of the emitted light beam on a mirror with a small curvature.
この集光体の一方の鏡を平面、他方の鏡を凹面
とすることに注意する必要がある。この集光体の
鏡の両方とも凹面にすることを要求される場合も
ある。 It is necessary to take care that one mirror of this condenser is flat and the other mirror is concave. It may be required that both mirrors of this concentrator be concave.
本発明の光学的多重経路装置の作動態様を改良
するために、保持具に保持された試料を、放射光
束の経路を横断するように置いてこの試料の平面
の反射率を測定し、対物反射鏡を測定の時点でそ
の軸回りに円弧に沿つて回転させて放射光束を対
物反射鏡と集光体とに交互に入射させ、これを所
定回数繰返した後、最後にこの光束をこの装置の
ケースの出口孔に直接向わせるようにすることが
できる。 In order to improve the operating mode of the optical multipath device of the present invention, a sample held in a holder is placed across the path of the emitted light beam and the reflectance of the plane of this sample is measured, and the objective reflection At the time of measurement, the mirror is rotated along an arc around its axis to make the emitted light beam alternately incident on the objective reflector and the condenser, and after repeating this a predetermined number of times, this light beam is finally transferred to the device. It can be directed directly to the exit hole of the case.
また、試料保持具と同軸かつ旋転可能に装着し
たアームの一方の端部に対物反射鏡を支持させ、
このアームを用いてこの対物反射鏡を、この対物
反射鏡自体の軸回りに回転させると共に円弧に沿
つて回転させることも、同様に合理的である。 In addition, an objective reflector is supported at one end of an arm coaxially and rotatably attached to the sample holder.
It is equally reasonable to use this arm to rotate the objective mirror around its own axis and along an arc.
本発明は、この装置の中における光束経路がど
れだけあろうとも、放射光束の一連の光束がぼや
けるのを防ぐことができる。これは見方を変えれ
ば、この装置の明るさの透過度を向上させると共
にこの装置が放射光束の経路の数の影響を受けな
いようにすることである。 The invention makes it possible to prevent the series of emitted light beams from becoming blurred, no matter how many light beam paths there are within the device. Another way to look at this is to improve the brightness transmission of the device and to make the device insensitive to the number of paths of the emitted light beam.
更に本発明は、放射光束経路の数の調整を簡単
にし、それによつてこの装置に光束経路数をより
適確にプリセツトできるようにするものである。 Furthermore, the invention simplifies the adjustment of the number of radiation beam paths, thereby allowing the device to be preset more precisely in the number of beam paths.
加えて、本発明は寸法の小さい平らな試料の反
射率の測定をより適確に行なう手段たり得ること
にも注意する必要がある。 In addition, it should be noted that the present invention can be used as a means to more accurately measure the reflectance of flat samples with small dimensions.
第1図は本発明に基づく光学的多重経路装置の
全体縦断面図、第2図は第1図の線−に沿う
断面図、第3図は第1図の線−に沿う断面
図、第4図は本発明に基づく光学的多重経路装置
の集光体の正面図、第5図は本発明に基づく光学
的多重経路装置の縦断面構造図、第6図は本発明
に基づく光学的多重経路装置を反射計として作動
させる場合の調整段階の全体斜視図、第7図は本
発明に基づく光学的多重経路装置を反射計として
作動させる場合の試料の平らな表面の反射率を測
定する時の全体斜視図である。
1 is an overall vertical cross-sectional view of an optical multipath device according to the present invention, FIG. 2 is a cross-sectional view taken along the line - of FIG. 1, FIG. 4 is a front view of a condenser of an optical multipath device according to the present invention, FIG. 5 is a longitudinal cross-sectional structural view of an optical multipath device according to the present invention, and FIG. 6 is a front view of a condenser of an optical multipath device according to the present invention. FIG. 7 is a general perspective view of the adjustment stage when the path device is operated as a reflectometer; FIG. FIG.
発明を実施するための最良の形態
本発明の好ましい実施例として、放射光束経路
が6経路である場合について、以下、図によつて
詳細に説明する。BEST MODE FOR CARRYING OUT THE INVENTION As a preferred embodiment of the present invention, a case in which there are six emitted light flux paths will be described in detail below with reference to the drawings.
第1図は光学的多重経路装置を示すものである
が、この装置において、光束発生装置2から放射
された光束1は、この装置のケース5の蓋4に設
けられた入口孔3(第1図及び第2図)を通る。
この入口は対物反射鏡6(第1図及び第3図)に
入射させるためのものである。 FIG. 1 shows an optical multi-path device. In this device, a light beam 1 emitted from a light beam generator 2 passes through an inlet hole 3 (a first and Fig. 2).
This entrance is for entering the objective reflector 6 (FIGS. 1 and 3).
対物反射鏡6は放射光束の経路を横断するよう
な位置にあつて保持具7の中に固定され、これを
ねじ11が押すことによつて放射光束の経路の数
が調整され、このねじ11はこの装置のケースの
カバー12を貫いている。これの調整はねじ11
と連接するノブ13を回転させることにより行な
う。細長い部材10はカバー12に固定された平
ばね14によつて固定される。 The objective reflector 6 is fixed in a holder 7 at a position where it crosses the path of the radiant beam, and the number of paths of the radiant beam is adjusted by pushing this with a screw 11. passes through the cover 12 of the case of this device. To adjust this, screw 11
This is done by rotating the knob 13 connected to. The elongated member 10 is secured by a flat spring 14 secured to the cover 12.
集光体15(第1図、第2図)は対物反射鏡で
反射した光束の経路を横断するように配設され、
この集光体15は曲率の異る2個の鏡を有し、そ
の1つは平面鏡16であり、他方は凹面鏡17で
ある。この鏡16,17が適正に位置づけられる
ので、放射光束の凹面鏡17に対する入射角は平
面鏡16に対する入射角よりも小さい。複合集光
体の鏡16,17に対する光束1の入射角は、互
いに異なるように選択される。その理由は、本発
明の光学的多重経路装置は、スペクトルの赤外線
の範囲内で操作され、その際、相対的に大きい曲
率をもつ複合集光体の鏡17に対する光束1の入
射角は、鏡16のそれよりも小さくなるよう設定
される。かりに、この条件に適合していないと、
ゆがみが出口孔からの像に現われる。 The condenser 15 (FIGS. 1 and 2) is arranged so as to cross the path of the light beam reflected by the objective reflector.
This condenser 15 has two mirrors with different curvatures, one of which is a plane mirror 16 and the other is a concave mirror 17. Since the mirrors 16, 17 are properly positioned, the angle of incidence of the emitted light beam on the concave mirror 17 is smaller than the angle of incidence on the plane mirror 16. The angles of incidence of the light beam 1 on the mirrors 16, 17 of the composite condenser are chosen to be different from each other. The reason is that the optical multipath device of the invention is operated in the infrared range of the spectrum, where the angle of incidence of the light beam 1 on the mirror 17 of the complex concentrator with a relatively large curvature is It is set to be smaller than that of 16. However, if this condition is not met,
Distortion appears in the image from the exit hole.
とくに、この像は、当該装置からの出力点で焦
点がづれ、かつ、ゆがんだものとなる。平らな面
あるいは小さな曲率をもつ複合集光体の鏡16に
関するかぎり、入射角はそれほど重要でなく、鏡
17のそれに比して相対的に大きな入射角をも
つ。この鏡16,17は共に保持具18によつて
蓋4に固定される。出口孔19は蓋4の入口孔3
より上の位置に設けられ、この装置の中の最終経
路を通つた放射光束がこの出口孔19を通つてこ
の装置の外に出る。窓20は所与の放射光束に対
して透明な穴3,19の中に整合する。 In particular, the image will be defocused and distorted at the output point from the device. The angle of incidence is less important as far as the composite concentrator mirror 16 with a flat surface or small curvature is concerned, having a relatively large angle of incidence compared to that of the mirror 17. Both mirrors 16 and 17 are fixed to the lid 4 by a holder 18. The outlet hole 19 is the inlet hole 3 of the lid 4.
The emitted light beam, which is provided in a higher position and has passed the final path in the device, exits the device through this exit hole 19. The window 20 fits into the hole 3, 19, which is transparent for a given radiation beam.
対物反射鏡6は凹面鏡17の表面に光束発生装
置2の光源(図示省略)の中間像21,22を結
像し、この中間像21,22は対物反射鏡6の曲
率の中心23に対して対称の位置を占める。 The objective reflecting mirror 6 forms intermediate images 21 and 22 of the light source (not shown) of the light flux generating device 2 on the surface of the concave mirror 17, and these intermediate images 21 and 22 are relative to the center of curvature 23 of the objective reflecting mirror 6. Occupy a symmetrical position.
放射光束の経路の数が10(長さが10倍)の場合、
対物反射鏡6は光束発生装置の光源の4個の中間
像24,25,26,27を集光体15(第1
図、第4図)の上に結像する。対物反射鏡6の曲
率の中心28はこの中間像25,26の間にあ
る。 If the number of paths of the emitted light flux is 10 (10 times the length), then
The objective reflector 6 converts four intermediate images 24, 25, 26, 27 of the light source of the light beam generating device into a condenser 15 (first
(Fig. 4). The center of curvature 28 of the objective reflector 6 lies between these intermediate images 25,26.
本発明の光学的多重経路装置のもうひとつの実
施例では、集光体15(第5図)は曲率の異る2
個の凹面鏡29,30を有し、この凹面鏡29,
30は保持具31に装着され、この保持具31は
蓋4に固定される。この鏡29,30は放射光束
1に対して適当に位置づけられるので放射光束の
曲率の大きい凹面鏡29に対する入射角は曲率の
小さい凹面鏡30に対する入射角より小さい。 In another embodiment of the optical multipath device of the invention, the light concentrator 15 (FIG. 5) has two different curvatures.
It has concave mirrors 29 and 30, and these concave mirrors 29,
30 is attached to a holder 31, and this holder 31 is fixed to the lid 4. Since the mirrors 29 and 30 are appropriately positioned with respect to the emitted light beam 1, the angle of incidence of the emitted light beam on the concave mirror 29, which has a large curvature, is smaller than the angle of incidence of the emitted light beam on the concave mirror 30, which has a small curvature.
更にもうひとつの実施例は、放射光束の経路を
6経路として反射計として作動させる光学的多重
経路装置(第6図、第7図)であるが、この装置
では対物反射鏡31がアーム32の一方の端部に
可動に装着され、それに対してその他方の端部は
旋転中心軸33に装着され、この旋転中心軸33
は基盤34に動かないように固定される。集光体
15の保持具18はベツド35に固定され、この
ベツド35はアーム32の旋転軸33に動かない
ように固定される。回転支持具38はダイヤフラ
ム37(この場合図示省略)のオリフイスを通る
放射光束を横断するように設置され、前記支持具
は旋転軸33に装着されると共に標本39を支持
し(第7図)、この標本の平らな面(図示省略)
の反射率が測定される。ダイヤフラム37(第6
図、第7図)はベツド35に設けられる。 Yet another embodiment is an optical multipath device (FIGS. 6 and 7) that operates as a reflectometer with six paths for the emitted light beam. In this device, the objective reflector 31 is connected to the arm 32 is movably mounted on one end, while the other end is mounted on a pivot shaft 33;
is fixed to the base 34 so as not to move. The holder 18 of the condenser 15 is fixed to a bed 35, and this bed 35 is fixed to the rotation axis 33 of the arm 32 so as not to move. A rotating support 38 is installed so as to cross the radiation beam passing through the orifice of a diaphragm 37 (not shown in this case), and the support is attached to the rotation shaft 33 and supports the specimen 39 (FIG. 7). The flat side of this specimen (not shown)
The reflectance of is measured. Diaphragm 37 (6th
7) is provided on the bed 35.
ベツド35の対物反射鏡31側の端部には角度
目盛40が刻まれ、それに対して支持具38はア
ーム32と一体となつて回転し、この角度目盛4
0を読取るための指針41が固定されている。試
料39(第7図)が支持具38に設定され、アー
ム装置32によつて対物反射鏡31が円弧に沿つ
て回転されると、放射光束1は標本39で反射し
た後、対物反射鏡31と集光体15に交互に入射
し、最終経路でダイヤフラム37の出口オリフイ
ス43(第6図、第7図)に直接到達する。凹面
鏡17は光束発生装置2(第1図)の光源の中間
像44,45を示す。 An angle scale 40 is engraved on the end of the bed 35 on the objective reflector 31 side.
A pointer 41 for reading 0 is fixed. When the sample 39 (FIG. 7) is set on the support 38 and the objective reflector 31 is rotated along an arc by the arm device 32, the emitted light beam 1 is reflected by the sample 39 and then passes through the objective reflector 31. and the light condenser 15 alternately, and directly reach the exit orifice 43 (FIGS. 6 and 7) of the diaphragm 37 in the final path. The concave mirror 17 shows an intermediate image 44, 45 of the light source of the beam generator 2 (FIG. 1).
この光学的多重経路装置は、放射光束の経路が
6経路になるように調整されて気体のスペクトル
分析に使用される場合は次のように作用する。 When this optical multipath device is adjusted so that the paths of the emitted light beam are six paths and is used for spectrum analysis of gas, it operates as follows.
この装置のケース5(第1図)は供試気体で満
たされる。光束発生装置2から放射された光束1
は入口孔3の窓20を通つて対物反射鏡6に入射
し、この光束は光束発生装置2の光源の中間像2
1(第2図)を集光体15の凹面鏡17の上部に
結像し、次いで平面鏡16で反射する。鏡16,
17で反射して太くなつた放射光束1は再度対物
反射鏡16に向けられてそこで反射し、次いで光
束発生装置2(第1図)の光源の中間像22(第
2図)と同様に凹面鏡17の下部に像を結ぶ。放
射光束は更に平面鏡16で反射して対物反射鏡6
に向かい、ここで反射して最後に出口孔19を通
つてこの装置の外に出る。 The case 5 (FIG. 1) of this device is filled with the gas under test. Luminous flux 1 emitted from the luminous flux generator 2
enters the objective reflector 6 through the window 20 of the entrance hole 3, and this luminous flux forms an intermediate image 2 of the light source of the luminous flux generating device 2.
1 (FIG. 2) is imaged on the upper part of the concave mirror 17 of the condenser 15, and then reflected by the plane mirror 16. Mirror 16,
The emitted light beam 1 reflected at 17 and thickened is again directed to the objective reflector 16 and reflected there, and is then reflected by the concave mirror similarly to the intermediate image 22 (FIG. 2) of the light source of the light beam generator 2 (FIG. 1). The image is tied to the bottom of 17. The emitted light beam is further reflected by a plane mirror 16 and sent to an objective reflector 6.
, where it is reflected and finally exits the device through the exit hole 19.
集光体に2枚の凹面鏡29,30を使用すれ
ば、光束発生装置2の光源の像の収差によるゆが
みを補償することができる。この光学装置は以上
で説明したところと同様である。 If two concave mirrors 29 and 30 are used as the condenser, it is possible to compensate for the distortion of the image of the light source of the light beam generating device 2 due to aberration. This optical device is similar to that described above.
本発明によれば、集光体15は、それ自体が光
学的多重経路を備えており、それによつてこの装
置で像がぼけるのを防止する。 According to the invention, the condenser 15 is itself provided with optical multiple paths, thereby preventing image blurring in this device.
対物反射鏡6をその回転軸8(第1図及び第5
図)の回りを回転させると、その曲率の中心23
(第2図)及び28(第4図)は、集光体15
(第1図及び第5図)の凹面鏡17,29の表面
に沿つて移動する。集光体15の鏡16,17及
び30,29の接合部の方向に対する対物反射鏡
6(第1図及び第5図)の曲率の中心が移動した
時、この装置における経路の数が増加する。第2
図に示す対物反射鏡6の曲率の中心23がこの位
置にある時、光束の経路の数は6個であり、第4
図に示す対物反射鏡6の曲率の中心28がこの位
置にある時、多重経路装置における光束の経路の
数は10個であり、光束発生装置2の光源の中間像
24,25,26,27は連続して形成される。 The objective reflector 6 is connected to its rotation axis 8 (Figs. 1 and 5).
When rotated around the center of curvature 23
(Fig. 2) and 28 (Fig. 4) are the condenser 15
It moves along the surfaces of concave mirrors 17 and 29 (FIGS. 1 and 5). When the center of curvature of the objective reflector 6 (FIGS. 1 and 5) relative to the direction of the junction of the mirrors 16, 17 and 30, 29 of the condenser 15 moves, the number of paths in this device increases. . Second
When the center of curvature 23 of the objective reflector 6 shown in the figure is at this position, the number of paths of the light beam is six, and the fourth
When the center of curvature 28 of the objective reflector 6 shown in the figure is at this position, the number of paths of the light beam in the multipath device is 10, and the intermediate images 24, 25, 26, 27 of the light source of the light beam generator 2 are formed continuously.
この光学的多重経路装置を6経路とし、反射計
として使用する場合には、測定時に試料37(第
7図)を置くか置かないかによつて対物反射鏡3
1(第6図、第7図)の集光体15に対する作動
位置が異る。 When this optical multi-path device has six paths and is used as a reflectometer, the objective reflector 3
1 (FIGS. 6 and 7) is different in its operating position with respect to the condenser 15.
この反射計の対物反射鏡31(第6図)を第1
の位置にし、試料を置かずに、上述したのと同様
の方法で測定操作を行なつて、放射光束1の信号
をこの光学装置の出口孔43で取り出す。 The objective reflector 31 (Fig. 6) of this reflectometer is
The measuring operation is carried out in the same manner as described above without placing the sample, and the signal of the emitted light beam 1 is taken out at the exit hole 43 of this optical device.
次いで、試料39(第7図)の平面の反射率を
測定するためにその試料39を支持具38に整合
させ、他方、アーム32を用いて対物反射鏡31
を旋転軸33の中心を取り囲む円弧に沿つて移動
させて、試料39で反射した放射光束を対物反射
鏡31に入射させる。この対物反射鏡31と試料
39の位置はこの装置の基盤35の角度目盛40
と指針41によつて示される。対物反射鏡で反射
した放射光束は再び試料39に向かつて進み、こ
の試料39で反射して集光体15に向かい、この
集光体15の上に光束発生装置の光源の中間像4
4,45を結像する。このように経路を構成した
多重経路光学装置の各構成部分の作動は、放射光
束1を試料39で反射させることを除いて、上述
の試料なしの場合と全く同一である。信号Iの強
さI1は、この装置の出口での透過量を測定して求
める場合には、試料の反射率に比例し、光束の通
る経路の数Kに応じて減少する。試料39の反射
率Rは次式
によつて求める。 The sample 39 (FIG. 7) is then aligned with the support 38 in order to measure its plane reflectance, while the arm 32 is used to move the objective reflector 31
is moved along an arc surrounding the center of the rotation axis 33, and the emitted light flux reflected by the sample 39 is made to enter the objective reflector 31. The positions of this objective reflector 31 and sample 39 are determined by the angle scale 40 on the base 35 of this device.
This is indicated by the guideline 41. The emitted light beam reflected by the objective reflector advances toward the sample 39 again, is reflected by this sample 39, and heads toward the condenser 15, whereupon an intermediate image 4 of the light source of the beam generator is placed on the condenser 15.
4,45 is imaged. The operation of each component of the multipath optical device with the paths configured in this manner is exactly the same as in the case without a sample described above, except that the emitted light beam 1 is reflected by the sample 39. When the intensity I 1 of the signal I is determined by measuring the amount of transmission at the exit of this device, it is proportional to the reflectance of the sample and decreases according to the number K of paths taken by the light beam. The reflectance R of sample 39 is given by the following formula: Find it by.
産業上の利用可能性
本発明は、赤外線吸収スペクトルの分光学的測
定装置の感度の増大を図る場合に最も有用であ
る。Industrial Applicability The present invention is most useful in increasing the sensitivity of a spectroscopic measuring device for infrared absorption spectra.
また、本発明は分光装置を用いることなく、特
に大気汚染の定量測定用の迅速作動方式の高精度
光学音響式ガス分析装置にも応用できるものであ
り、このことは環境保全との関連で重要である。 Furthermore, the present invention can be applied to a fast-acting, high-precision optical-acoustic gas analyzer, especially for quantitative measurement of air pollution, without using a spectrometer, which is important in the context of environmental conservation. It is.
更に本発明は反射角度を小さくして、平らな試
料の反射率を高精度で測定するためにも応用する
ことができ、このことはレーザー技術及び高エネ
ルギー設備に大きな利益をもたらす。 Furthermore, the invention can be applied to measure the reflectance of flat samples with high precision by reducing the reflection angle, which has great benefits for laser technology and high-energy equipment.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| PCT/GB1981/000070 WO1981002994A1 (en) | 1980-04-18 | 1981-04-15 | Moulding process for plastics |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58501439A JPS58501439A (en) | 1983-08-25 |
| JPS6334420B2 true JPS6334420B2 (en) | 1988-07-11 |
Family
ID=10518772
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56503612A Granted JPS58501439A (en) | 1981-04-15 | 1981-09-10 | optical multipath device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58501439A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20210139401A (en) | 2019-03-26 | 2021-11-22 | 미쓰이 가가쿠 가부시키가이샤 | Lubricating oil composition and method for preparing same |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SU411356A1 (en) * | 1971-12-27 | 1974-01-15 | ||
| DE2906536C2 (en) * | 1979-02-20 | 1985-09-26 | Institut chimičeskoj fiziki Akademii Nauk SSSR, Moskau/Moskva | Multiple reflection optical system |
-
1981
- 1981-09-10 JP JP56503612A patent/JPS58501439A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20210139401A (en) | 2019-03-26 | 2021-11-22 | 미쓰이 가가쿠 가부시키가이샤 | Lubricating oil composition and method for preparing same |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58501439A (en) | 1983-08-25 |
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