Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JPS6337065B2 - - Google Patents
[go: Go Back, main page]

JPS6337065B2 - - Google Patents

Info

Publication number
JPS6337065B2
JPS6337065B2 JP56126771A JP12677181A JPS6337065B2 JP S6337065 B2 JPS6337065 B2 JP S6337065B2 JP 56126771 A JP56126771 A JP 56126771A JP 12677181 A JP12677181 A JP 12677181A JP S6337065 B2 JPS6337065 B2 JP S6337065B2
Authority
JP
Japan
Prior art keywords
aluminum nitride
sintered body
lithium
nitride sintered
room temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56126771A
Other languages
Japanese (ja)
Other versions
JPS5832072A (en
Inventor
Yukio Takeda
Satoru Ogiwara
Yasutaka Suzuki
Mitsuru Ura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP56126771A priority Critical patent/JPS5832072A/en
Publication of JPS5832072A publication Critical patent/JPS5832072A/en
Publication of JPS6337065B2 publication Critical patent/JPS6337065B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Ceramic Products (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

本発明は集積回路等の基板用として好適な窒化
アルミニウム焼結体に係り、高い熱伝導率と電気
抵抗率および低い熱膨張係数を併せ有する窒化ア
ルミニウム焼結体とその製法及び焼結体製造用粉
末組成物とに関する。 大規模集積回路においては、半導体チツプ等の
回路構成要素がますます高密度に搭載され、さら
に大容量化や小型化される状況にある。それに伴
つて、使用される絶縁基板として熱放散性の良い
材料への要求が強まつている。従来、絶縁基板に
アルミナ焼結体が多用されてきたが、熱放散性に
関してはさほど良好と言えず、より高い熱放散性
を有する絶縁基板用材料の開発が希求されるゆえ
んともなつている。 さて、こうした絶縁基板用材料に必要な特性と
しては、熱伝導性のほかに、電気絶縁性が高いこ
と、熱膨張係数がシリコンのそれに近いこと、機
械的強度が大きいこと、誘電率が小さいことなど
が挙げられる。これらの条件を考慮して、本発明
者らは窒化アルミニウム焼結体に着目した。すな
わち、窒化アルミニウム焼結体は、熱膨張係数と
して、アルミナ焼結体のそれ(約7×10-6/℃)
より小さくシリコン単結晶の値(約3.3×10-6
℃)に近い約5×10-6/℃という値を有する。ま
た、機械的強度については、曲げ強さ約50Kg/mm2
以上であつて、アルミナ焼結体のそれ(約20Kg/
mm2)に比べて強く、電気絶縁性の点でも優れてい
る。そして、このような性質を示す緻密な焼結体
は、常圧焼結法もしくはホツトプレス法に従つて
製造できる。 従来、窒化アルミニウム焼結体の製造方法とし
ては、(1)反応焼結法、(2)常圧焼結法および(3)ホツ
トプレス焼結法が知られている。これらのうち反
応焼結法は金属アルミニウムの成形体を窒素ガス
雰囲気中で窒化反応させながら焼結する方法であ
る。この方法では窒化反応が窒素ガスの拡散律速
であることから、その製品は、肉厚になると中心
部に未反応金属が残ること及び多孔質であるた
め、電気絶縁材としては実用化されていない。常
圧焼結法では窒化アルミニウム粉末に酸化イツト
リウムと希土類酸化物、酸化イツトリウムと二酸
化ケイ素、ニツケル、酸化カルシウムなどの粉末
を添加して混合したのち成形体として焼成する。
さらに、ホツトプレス法では窒化アルミニウム粉
末に酸化アルミニウム、酸化イツトリウムと二酸
化ケイ素などの粉末を添加して混合したのち成形
体とし、加圧下で加熱して焼結する。 さて、常圧焼結法もしくはホツトプレス法によ
れば、前記のような物性をそなえた緻密な焼結体
が得られる。しかし、該焼結体も、その熱伝導率
については、通常0.07cal/cm・s・℃(室温)、
高くても0.1cal/cm・s・℃程度の値を示すにす
ぎず、集積回路用絶縁基板の材料としては一段の
改善を必要とする。 本発明は上記のような観点から出発し、大規模
集積回路等の絶縁基板として好適な特性をそなえ
た材料を提供することを目的としている。 その特徴は、窒化アルミニウムの理論密度の少
なくとも90%の密度(相対密度)値を有する窒化
アルミニウムを主成分とする焼結体であつて、こ
れにリチウム又はリチウム含有物質を含むことで
ある。特に0.05〜5重量%のリチウムを含有する
ことによつてその熱伝導性が顕著に高められてい
ることである。 このような焼結体は、熱伝導率0.2cal/cm・
s・℃以上でしかも体積抵抗率1012Ω・cm以上、
室温から300℃に至る範囲での平均熱膨張係数5
×10-6/℃以下という均衡のとれた特性を示す。 本発明の焼結体は窒化アルミニウムを主成分と
し、これにリチウム又はリチウム化合物を添加し
た混合物を成形体となし、該成形体を非酸化性雰
囲気中、温度1600〜2000℃において密度が窒化ア
ルミニウムの理論密度の90%を越えるに十分な時
間焼結させることによつて製造できる。リチウム
又はリチウム含有物質のリチウム量を0.05〜5重
量%とするのが好ましい。 本発明において、窒化アルミニウムは平均粒径
20μm以下、一層好ましくは10μm以下の粉末とし
て使用される。 リチウムの含有率として、緻密化した焼結体を
得るには0.05重量%以上が好ましく、焼結時にリ
チウム化合物の揮散を防止し、緻密な焼結体を得
るには5重量%以下が好ましい。 リチウム化合物としては例えば酸化リチウム、
ハロゲン化リチウム、硝酸リチウム、炭酸リチウ
ム、硫酸リチウムなどが使用され、それらは粉末
もしくは溶液の形で、窒化アルミニウム粉末に混
和することができる。 混和にはボールミルなど公知の装置、方法を適
用することができ、得られた均質な混合物は室温
において所望の形状に加圧成形される。 リチウム含有化合物を添加した窒化アルミニウ
ム粉末成形体を焼成する条件も重要である。焼成
は非酸化性(常圧もしくは減圧)の雰囲気中で行
わねばならない。酸化性雰囲気では窒化アルミニ
ウムが酸化してしまうために所望の焼結体を得る
ことができない。 焼成時の温度としては1600〜2000℃が好まし
く、特に1700〜1900℃が有効である。温度が1600
℃より低い場合には緻密な焼結体が得られず、
2000℃より高い場合は過焼成になつてしまう。ま
た、焼成方法は常圧焼結法によつても良いし、ホ
ツトプレス法によつても良い。もし、一軸加圧式
のホツトプレス法で焼結体を製造する場合には、
収縮は加圧軸方向にのみ起り、寸法精度が高く、
常圧焼結法による焼結体よりも高強度を有する焼
結体を得ることができる。ホツトプレス法で焼結
する場合、100Kg/cm2以上の荷重を加えることに
より、所望の焼結体を得ることができる。焼成時
間に関しては原料粉末の粒径、リチウム含有化合
物の添加量、温度、焼成時に加える荷重の有無及
び大きさにより最適値が決る。一般的には原料粉
末の粒径が小さく、温度が高く、また焼成時に荷
重を加えた場合にあつては特に加える荷重が大き
いほど短時間で緻密な焼結体を得ることができ
る。 本発明は前述の焼結体を製造するための粉末組
成物にあり、窒化アルミニウムを主成分とし、リ
チウム又はリチウム含有物質を含む粉末からなる
ことを特徴とする焼結体製造用窒化アルミニウム
粉末組成物にある。本発明の粉末組成物を用いる
ことにより緻密で、熱伝導率の高い焼結体が得ら
れる。 次に実施例を示し具体的に説明する。 実施例 1 平均粒径2μmの窒化アルミニウム粉末に平均粒
径5μmの炭酸リチウムを、リチウムに換算して
0.03〜10重量%となるように、添加して混合し
た。次いで該混合粉末を室温で1000Kg/cm2の圧力
を加えて成形体とした。該成形体は次に焼成炉
中、減圧度1×10-3〜1×10-5torrで焼結した。
炉は室温から1800℃まで約1時間で昇温し、1800
℃で0.5時間保持したのち放冷した。第1表は上
記によつて製造した焼結体の特性を示し、窒化ア
ルミニウム粉末に添加する炭酸リチウムがリチウ
ムとして0.05〜5重量%のとき、0.2cal/cm・
s・℃以上の熱伝導率、1012Ωcm以上の体積抵抗
率と5×10-6/℃以下の熱膨張係数とを有し、窒
化アルミニウムの理論密度に対する密度(相対密
度)が90%以上になるまでに緻密化した焼結体が
得られている。 実施例 2 実施例1に記載したものと同様にして窒化アル
ミニウム粉末に対して炭酸リチウムをリチウムと
して1重量%添加して混合粉末から成形体を得、
焼成条件を変えて真空中で焼結体を製造した。第
2表は焼結体の製造条件と得られた焼結体の相対
密度との関係を示す表である。相対密度90%以上
に緻密化された焼結体はいずれも0.2cal/cm・
s・℃以上の熱伝導率(室温)と1012Ωcm以上の
体積抵抗率(室温)と4.2〜4.3×10-6/℃の熱膨
張係数(室温〜300℃)とを有していた。
The present invention relates to an aluminum nitride sintered body suitable for use as a substrate for integrated circuits, etc. The present invention relates to an aluminum nitride sintered body having high thermal conductivity, electrical resistivity, and a low coefficient of thermal expansion, a method for producing the same, and a method for producing the sintered body. Powder composition. In large-scale integrated circuits, circuit components such as semiconductor chips are being mounted in an increasingly dense manner, and the capacity is becoming larger and smaller. Along with this, there is an increasing demand for materials with good heat dissipation properties for the insulating substrates used. Conventionally, alumina sintered bodies have been frequently used for insulating substrates, but their heat dissipation properties are not very good, which is why there is a desire to develop materials for insulating substrates that have higher heat dissipation properties. In addition to thermal conductivity, the properties required for materials for insulating substrates include high electrical insulation, a coefficient of thermal expansion close to that of silicon, high mechanical strength, and low dielectric constant. Examples include. Taking these conditions into consideration, the present inventors focused on aluminum nitride sintered bodies. In other words, the thermal expansion coefficient of the aluminum nitride sintered body is that of the alumina sintered body (approximately 7×10 -6 /°C).
The value of silicon single crystal is smaller (approximately 3.3×10 -6 /
It has a value of approximately 5×10 -6 /°C, close to In addition, regarding mechanical strength, bending strength is approximately 50Kg/mm 2
The above is that of the alumina sintered body (approximately 20 kg/
mm 2 ) and has superior electrical insulation properties. A dense sintered body exhibiting such properties can be produced by pressureless sintering or hot pressing. Conventionally, as methods for manufacturing aluminum nitride sintered bodies, (1) reaction sintering method, (2) pressureless sintering method, and (3) hot press sintering method are known. Among these methods, the reactive sintering method is a method in which a metal aluminum compact is sintered while undergoing a nitriding reaction in a nitrogen gas atmosphere. In this method, the nitriding reaction is rate-determined by the diffusion of nitrogen gas, so when the product becomes thick, unreacted metal remains in the center, and the product is porous, so it has not been put to practical use as an electrical insulating material. . In the pressureless sintering method, yttrium oxide and rare earth oxide, yttrium oxide and powders such as silicon dioxide, nickel, and calcium oxide are added to aluminum nitride powder, mixed, and then fired as a compact.
Furthermore, in the hot press method, powders such as aluminum oxide, yttrium oxide, and silicon dioxide are added to aluminum nitride powder, mixed, and then formed into a compact, which is then heated and sintered under pressure. Now, according to the pressureless sintering method or the hot pressing method, a dense sintered body having the above-mentioned physical properties can be obtained. However, the thermal conductivity of the sintered body is usually 0.07 cal/cm・s・℃ (room temperature),
The value is only about 0.1 cal/cm·s·°C at most, and further improvement is required as a material for insulating substrates for integrated circuits. The present invention is based on the above-mentioned viewpoint, and an object of the present invention is to provide a material having characteristics suitable for use as an insulating substrate for large-scale integrated circuits and the like. Its characteristics are that it is a sintered body mainly composed of aluminum nitride, which has a density (relative density) value of at least 90% of the theoretical density of aluminum nitride, and that it contains lithium or a lithium-containing substance. In particular, by containing 0.05 to 5% by weight of lithium, its thermal conductivity is significantly enhanced. Such a sintered body has a thermal conductivity of 0.2 cal/cm・
s・℃ or more, and volume resistivity of 10 12 Ω・cm or more,
Average coefficient of thermal expansion in the range from room temperature to 300℃ 5
It exhibits well-balanced characteristics of less than ×10 -6 /°C. The sintered body of the present invention is made of a mixture of aluminum nitride as a main component and lithium or a lithium compound added thereto, and the molded body is molded in a non-oxidizing atmosphere at a temperature of 1,600 to 2,000°C to reduce the density of aluminum nitride. can be produced by sintering for a sufficient time to exceed 90% of its theoretical density. It is preferable that the amount of lithium in the lithium or lithium-containing material is 0.05 to 5% by weight. In the present invention, aluminum nitride has an average particle size of
It is used as a powder of 20 μm or less, more preferably 10 μm or less. The lithium content is preferably 0.05% by weight or more to obtain a dense sintered body, and preferably 5% by weight or less to prevent volatilization of the lithium compound during sintering and obtain a dense sintered body. Examples of lithium compounds include lithium oxide,
Lithium halides, lithium nitrate, lithium carbonate, lithium sulfate, etc. are used and can be mixed with the aluminum nitride powder in powder or solution form. Known equipment and methods such as a ball mill can be used for mixing, and the resulting homogeneous mixture is pressure-molded into a desired shape at room temperature. The conditions for firing the aluminum nitride powder compact to which the lithium-containing compound has been added are also important. Firing must be performed in a non-oxidizing (atmospheric or reduced pressure) atmosphere. In an oxidizing atmosphere, aluminum nitride is oxidized, making it impossible to obtain the desired sintered body. The temperature during firing is preferably 1,600 to 2,000°C, and particularly effective is 1,700 to 1,900°C. temperature is 1600
If the temperature is lower than ℃, a dense sintered body cannot be obtained;
If the temperature is higher than 2000℃, over-firing will occur. Further, the firing method may be an atmospheric pressure sintering method or a hot pressing method. If a sintered body is manufactured using the uniaxial hot press method,
Shrinkage occurs only in the axial direction of pressure, resulting in high dimensional accuracy.
A sintered body having higher strength than a sintered body produced by pressureless sintering can be obtained. When sintering by hot pressing, a desired sintered body can be obtained by applying a load of 100 kg/cm 2 or more. Regarding the firing time, the optimum value is determined by the particle size of the raw material powder, the amount of lithium-containing compound added, the temperature, and the presence or absence and size of a load applied during firing. In general, the particle size of the raw material powder is small, the temperature is high, and when a load is applied during firing, the greater the load, the more dense the sintered body can be obtained in a shorter time. The present invention resides in a powder composition for producing the above-mentioned sintered body, the aluminum nitride powder composition for producing the sintered body comprising a powder containing aluminum nitride as a main component and containing lithium or a lithium-containing substance. It's in things. By using the powder composition of the present invention, a dense sintered body with high thermal conductivity can be obtained. Next, examples will be shown and specifically explained. Example 1 Lithium carbonate with an average particle size of 5 μm was added to aluminum nitride powder with an average particle size of 2 μm in terms of lithium.
It was added and mixed at a concentration of 0.03 to 10% by weight. Next, a pressure of 1000 Kg/cm 2 was applied to the mixed powder at room temperature to form a compact. The compact was then sintered in a firing furnace at a reduced pressure of 1×10 −3 to 1×10 −5 torr.
The furnace heats up from room temperature to 1800℃ in about 1 hour.
After holding at ℃ for 0.5 hour, it was allowed to cool. Table 1 shows the characteristics of the sintered body produced as described above. When the lithium carbonate added to the aluminum nitride powder is 0.05 to 5% by weight as lithium, 0.2 cal/cm・
It has a thermal conductivity of s・℃ or more, a volume resistivity of 10 12 Ωcm or more, and a thermal expansion coefficient of 5×10 -6 /℃ or less, and a density (relative density) of 90% or more of the theoretical density of aluminum nitride. A sintered body has been obtained that is densified by the time it becomes . Example 2 In the same manner as described in Example 1, 1% by weight of lithium carbonate was added as lithium to aluminum nitride powder to obtain a molded body from the mixed powder,
Sintered bodies were manufactured in vacuum by changing the firing conditions. Table 2 is a table showing the relationship between the manufacturing conditions of the sintered body and the relative density of the obtained sintered body. All sintered bodies densified to a relative density of 90% or more have a density of 0.2 cal/cm・
It had a thermal conductivity (room temperature) of s·°C or higher, a volume resistivity (room temperature) of 10 12 Ωcm or higher, and a thermal expansion coefficient (room temperature to 300°C) of 4.2 to 4.3×10 −6 /°C.

【表】【table】

【表】【table】

【表】 実施例 3 実施例1の記載と同様にして、窒化アルミニウ
ム粉末に対し、炭酸リチウムをリチウムとして1
重量%添加した混合粉末から成形体を得た後、該
成形体を焼成して焼結体とした。たゞし、本例に
おいては焼結体製造時の雰囲気をアルゴンガス、
ヘリウムガス、窒素ガス、もしくは水素ガスとし
た。得られた焼結体はいずれの場合にも実施例1
に記載した焼結体のリチウム量が1重量%のもの
と同様の特性を有していた。 実施例 4 窒化アルミニウムに対して酸化リチウム、窒化
リチウム、水素化リチウム、水酸化リチウム、ハ
ロゲン化リチウム、硝酸リチウム、もしくは硫酸
リチウムをリチウムとして0.03〜10重量%添加
し、実施例1と同様にして焼結体を得た。得られ
た焼結体は、上記したいずれのリチウム化合物を
使用した場合にも、実施例1に記載したリチウム
添加量の等しい焼結体とほぼ同様の特性を有して
いた。 実施例 5 平均粒径の異なる窒化アルミニウム粉末に炭酸
リチウムをリチウムとして1重量%添加して混合
し、実施例1と同様にして焼結体を得た。第3表
は得られた焼結体の相対密度を示し、窒化アルミ
ニウムの平均粒径が20μm以下であれば相対密度
90%以上に緻密化した焼結体が得られている。相
対密度が90%以上に緻密化した焼結体は、
0.2cal/cm・s・℃以上の熱伝導率(室温)、1012
Ωcm以上の体積抵抗率(室温)、4.2〜4.3×10-6
℃の熱膨張係数(室温〜300℃)を有していた。
[Table] Example 3 In the same manner as described in Example 1, lithium carbonate was added to aluminum nitride powder as lithium.
After obtaining a molded body from the mixed powder added in a weight percent, the molded body was fired to obtain a sintered body. However, in this example, the atmosphere during the production of the sintered body was argon gas,
Helium gas, nitrogen gas, or hydrogen gas was used. In each case, the obtained sintered body was the same as that of Example 1.
It had the same characteristics as the sintered body described in 2.1 with a lithium content of 1% by weight. Example 4 In the same manner as in Example 1, lithium oxide, lithium nitride, lithium hydride, lithium hydroxide, lithium halide, lithium nitrate, or lithium sulfate was added in an amount of 0.03 to 10% by weight as lithium to aluminum nitride. A sintered body was obtained. The obtained sintered body had almost the same characteristics as the sintered body described in Example 1 with the same amount of lithium added, even when any of the above-mentioned lithium compounds was used. Example 5 A sintered body was obtained in the same manner as in Example 1 by adding and mixing 1% by weight of lithium carbonate as lithium to aluminum nitride powders having different average particle sizes. Table 3 shows the relative density of the obtained sintered body, and if the average grain size of aluminum nitride is 20 μm or less, the relative density is
A sintered body with 90% or more densification was obtained. A sintered body with a relative density of 90% or more is
Thermal conductivity of 0.2 cal/cm・s・℃ or higher (room temperature), 10 12
Volume resistivity of Ωcm or more (room temperature), 4.2 to 4.3×10 -6 /
It had a coefficient of thermal expansion of 300°C (room temperature to 300°C).

【表】 実施例 6 本発明になる電気絶縁基板の具体的な適用例と
して、実施例1で得たリチウムを1重量%含む窒
化アルミニウム焼結体を絶縁基板として用いた半
導体パワーモジユールにより説明する。 第1図は従来構造の組立断面図である。導体4
とヒートシンク6の間及びヒートシンク6と金属
支持板8の間をそれぞれ有機絶縁物5及びアルミ
ナ基板7で絶縁し、また、シリコン素子1とヒー
トシンク6との熱膨張係数の差によるひずみを緩
和するためにモリブデンスペーサー3を介在させ
てある。第2図は本発明になる絶縁基板を用いた
モジユールの組立断面図である。絶縁基板10は
シリコン素子1と直接ろう付されており、極めて
簡単な構造になつている。 上記半導体装置に、−60℃で30分保持したのち
室温で5分保持し、次に125℃に昇温して30分保
持するヒートサイクルを加えた。従来法になる半
導体装置(第1図)では、20回のヒートサイクル
で半田付箇所にはがれが生じた。本発明になる半
導体装置(第2図)には、150回のヒートサイク
ルの後でも異常が認められなかつた。 比較例 平均粒径2μmの窒化アルミニウム粉末に酸化イ
ツトリウムを10重量%添加して混合したのち成形
体とした。該成形体を、1×10-4torrの真空中で
温度1800℃、荷重300Kg/cm2、時間0.5hホツトプ
レスして焼結体とした。該焼結体は相対密度99%
に緻密化した。該焼結体のその他の特性としては
熱伝導率が0.07cal/cm・s・℃(室温)、電気抵
抗率が1011Ω・cm(室温))、熱膨張係数が5×
10-6/℃(室温〜300℃)であつた。 前記実施例から明らかなように、本発明になる
窒化アルミニウム焼結体は緻密化しており、高熱
伝導率、高電気抵抗率、低熱膨張係数を併せ有す
るという特徴を有する。従つて、前述した通り電
気絶縁用基板材料として有用であるばかりでな
く、更に耐熱、耐酸化性、耐薬品性が要求される
部材、耐熱衝撃性が要求される部材、高温におい
て高強度が要求される部材としても好適な材料で
ある。
[Table] Example 6 As a specific application example of the electrically insulating substrate of the present invention, a semiconductor power module using the aluminum nitride sintered body containing 1% by weight of lithium obtained in Example 1 as an insulating substrate will be explained. do. FIG. 1 is an assembled sectional view of a conventional structure. conductor 4
and the heat sink 6 and between the heat sink 6 and the metal support plate 8 with the organic insulator 5 and the alumina substrate 7, respectively, and in order to alleviate the strain caused by the difference in thermal expansion coefficient between the silicon element 1 and the heat sink 6. A molybdenum spacer 3 is interposed therebetween. FIG. 2 is an assembled sectional view of a module using an insulating substrate according to the present invention. The insulating substrate 10 is directly brazed to the silicon element 1, and has an extremely simple structure. The above semiconductor device was subjected to a heat cycle in which the temperature was held at -60°C for 30 minutes, then at room temperature for 5 minutes, and then the temperature was raised to 125°C and held for 30 minutes. In the semiconductor device using the conventional method (Figure 1), peeling occurred at the soldered points after 20 heat cycles. No abnormality was observed in the semiconductor device of the present invention (FIG. 2) even after 150 heat cycles. Comparative Example Yttrium oxide was added in an amount of 10% by weight to aluminum nitride powder having an average particle size of 2 μm, and the mixture was mixed to form a compact. The molded body was hot pressed in a vacuum of 1×10 −4 torr at a temperature of 1800° C. and a load of 300 kg/cm 2 for 0.5 h to obtain a sintered body. The sintered body has a relative density of 99%
It was elaborated to. Other properties of the sintered body include thermal conductivity of 0.07 cal/cm・s・℃ (room temperature), electrical resistivity of 10 11 Ω・cm (room temperature)), and thermal expansion coefficient of 5×.
10 -6 /°C (room temperature to 300°C). As is clear from the above examples, the aluminum nitride sintered body of the present invention is dense and has the characteristics of high thermal conductivity, high electrical resistivity, and low coefficient of thermal expansion. Therefore, as mentioned above, it is not only useful as a substrate material for electrical insulation, but also for materials that require heat resistance, oxidation resistance, chemical resistance, thermal shock resistance, and high strength at high temperatures. This material is also suitable for use as a member.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来法によるシリコン半導体装置の組
立断面図、第2図は本発明になる基板を用いたシ
リコン半導体装置の組立断面図である。 1…シリコン素子、2…リード線、3…モリブ
デンスペーサー、4…導体、5…有機絶縁物、6
…ヒートシンク、7…アルミナ基板、8…支持
板、9…半田、10…窒化アルミニウム焼結体基
板。
FIG. 1 is an assembled sectional view of a silicon semiconductor device according to a conventional method, and FIG. 2 is an assembled sectional view of a silicon semiconductor device using a substrate according to the present invention. DESCRIPTION OF SYMBOLS 1... Silicon element, 2... Lead wire, 3... Molybdenum spacer, 4... Conductor, 5... Organic insulator, 6
...Heat sink, 7. Alumina substrate, 8. Support plate, 9. Solder, 10. Aluminum nitride sintered body substrate.

Claims (1)

【特許請求の範囲】 1 窒化アルミニウムを主成分とし、これにリチ
ウム又はリチウム含有物質を含み、理論密度の90
%以上の密度を有することを特徴とする窒化アル
ミニウム焼結体。 2 前記リチウム又はリチウム含有物質のリチウ
ム量が0.05〜5重量%である特許請求の範囲第1
項記載の窒化アルミニウム焼結体。 3 室温における熱伝導率が0.2cal/cm・s・℃
以上である特許請求の範囲第1項記載の窒化アル
ミニウム焼結体。 4 室温における体積抵抗率が1012Ωcm以上であ
る特許請求の範囲第1項記載の窒化アルミニウム
焼結体。 5 室温から300℃の範囲において平均熱膨張係
数が5×10-6/℃以下である特許請求の範囲第1
項記載の窒化アルミニウム焼結体。 6 半導体素子を搭載した特許請求の範囲第1項
記載の窒化アルミニウム焼結体。 7 窒化アルミニウムを主成分とし、これにリチ
ウム又はリチウム含有物質を含む粉末を成形体と
なし、該成形体を非酸化性雰囲気中、密度が理論
密度の90%の値を越えるに十分な温度で焼結させ
ることを特徴とする窒化アルミニウム焼結体の製
法。 8 温度1600〜2000℃、圧力100Kg/cm2以上でホ
ツトプレスすることによつて焼結する特許請求の
範囲第7項記載の窒化アルミニウム焼結体の製
法。 9 平均粒径が20μm以下である窒化アルミニウ
ム粉末を使用する特許請求の範囲第7項または第
8項記載の窒化アルミニウム焼結体の製法。 10 窒化アルミニウムを主成分とし、これにリ
チウム又はリチウム含有物質を含む粉末からなる
ことを特徴とする焼結体製造用窒化アルミニウム
粉末組成物。
[Claims] 1 The main component is aluminum nitride, which contains lithium or a lithium-containing substance, and has a theoretical density of 90%.
An aluminum nitride sintered body characterized by having a density of % or more. 2. Claim 1, wherein the amount of lithium in the lithium or lithium-containing material is 0.05 to 5% by weight.
The aluminum nitride sintered body described in . 3 Thermal conductivity at room temperature is 0.2 cal/cm・s・℃
The aluminum nitride sintered body according to claim 1, which is the above. 4. The aluminum nitride sintered body according to claim 1, which has a volume resistivity of 10 12 Ωcm or more at room temperature. 5 Claim 1 in which the average coefficient of thermal expansion is 5×10 -6 /°C or less in the range from room temperature to 300°C
The aluminum nitride sintered body described in . 6. The aluminum nitride sintered body according to claim 1, on which a semiconductor element is mounted. 7 A powder containing aluminum nitride as a main component and lithium or a lithium-containing substance is formed into a compact, and the compact is heated in a non-oxidizing atmosphere at a temperature sufficient to cause the density to exceed 90% of the theoretical density. A method for producing an aluminum nitride sintered body, which is characterized by sintering. 8. The method for producing an aluminum nitride sintered body according to claim 7, wherein the aluminum nitride sintered body is sintered by hot pressing at a temperature of 1600 to 2000°C and a pressure of 100 kg/cm 2 or more. 9. A method for producing an aluminum nitride sintered body according to claim 7 or 8, which uses aluminum nitride powder having an average particle size of 20 μm or less. 10. An aluminum nitride powder composition for producing a sintered body, comprising a powder containing aluminum nitride as a main component and lithium or a lithium-containing substance therein.
JP56126771A 1981-08-14 1981-08-14 Aluminum nitride sintered body and manufacture Granted JPS5832072A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56126771A JPS5832072A (en) 1981-08-14 1981-08-14 Aluminum nitride sintered body and manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56126771A JPS5832072A (en) 1981-08-14 1981-08-14 Aluminum nitride sintered body and manufacture

Publications (2)

Publication Number Publication Date
JPS5832072A JPS5832072A (en) 1983-02-24
JPS6337065B2 true JPS6337065B2 (en) 1988-07-22

Family

ID=14943514

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56126771A Granted JPS5832072A (en) 1981-08-14 1981-08-14 Aluminum nitride sintered body and manufacture

Country Status (1)

Country Link
JP (1) JPS5832072A (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3247985C2 (en) * 1982-12-24 1992-04-16 W.C. Heraeus Gmbh, 6450 Hanau Ceramic carrier
US4533645A (en) * 1983-08-01 1985-08-06 General Electric Company High thermal conductivity aluminum nitride ceramic body
US4478785A (en) * 1983-08-01 1984-10-23 General Electric Company Process of pressureless sintering to produce dense, high thermal conductivity aluminum nitride ceramic body
US4537863A (en) * 1983-08-10 1985-08-27 Nippon Electric Glass Company, Ltd. Low temperature sealing composition
DE3337630A1 (en) * 1983-10-15 1985-04-25 W.C. Heraeus Gmbh, 6450 Hanau TEMPERATURE COMPENSATING BODY
US4547471A (en) * 1983-11-18 1985-10-15 General Electric Company High thermal conductivity aluminum nitride ceramic body
US4843042A (en) * 1986-06-30 1989-06-27 General Electric Company Alkaline earth fluoride additive for sintering aluminum nitride
JPH0352435U (en) * 1989-09-27 1991-05-21
JPH04101789U (en) * 1991-02-12 1992-09-02 川崎重工業株式会社 Motorcycle front brake structure
JP2901135B2 (en) * 1994-10-24 1999-06-07 株式会社東芝 Semiconductor device
JP2002198555A (en) 2000-12-26 2002-07-12 Canon Inc Semiconductor element mounting substrate and semiconductor device using the substrate

Also Published As

Publication number Publication date
JPS5832072A (en) 1983-02-24

Similar Documents

Publication Publication Date Title
US4585706A (en) Sintered aluminum nitride semi-conductor device
US4370421A (en) Electrically insulating substrate and a method of making such a substrate
US4672046A (en) Sintered aluminum nitride body
JPS6346032B2 (en)
JPH054950B2 (en)
JPS6337065B2 (en)
JPS5832073A (en) sintered body
JP7611816B2 (en) Method for producing sintered silicon nitride
JPS5831755B2 (en) Base for electrical insulation
JPH1067560A (en) High thermal conductivity ceramics and method for producing the same
JPS6331434B2 (en)
JP2811454B2 (en) Copper-tungsten mixed sintered body and method for producing the same
JPS5969473A (en) Sintering silicon carbide powder composition
JPS6221764A (en) Manufacture of aluminum nitride
JPH0470776B2 (en)
JPS61146764A (en) Aluminum nitride sintered body and manufacture
JPS63295479A (en) Sintered aluminum nitride body and its production
JPS5815953B2 (en) Board for electrical equipment
JPS6236988B2 (en)
JPS61232274A (en) Manufacture of aluminum nitride sintered body
JPH0247856B2 (en)
JPS62235262A (en) Manufacturing method of aluminum nitride sintered body
JP2851712B2 (en) Aluminum nitride circuit board
JPS593436B2 (en) Charcoal-fired silicon powder composition for sintering
JPS6330372A (en) Manufacture of aluminum nitride sintered body