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JPS634464B2 - - Google Patents
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JPS634464B2 - - Google Patents

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Publication number
JPS634464B2
JPS634464B2 JP15154182A JP15154182A JPS634464B2 JP S634464 B2 JPS634464 B2 JP S634464B2 JP 15154182 A JP15154182 A JP 15154182A JP 15154182 A JP15154182 A JP 15154182A JP S634464 B2 JPS634464 B2 JP S634464B2
Authority
JP
Japan
Prior art keywords
washing
water
booth
tank
sent
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP15154182A
Other languages
Japanese (ja)
Other versions
JPS5939366A (en
Inventor
Tsuneo Sasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daihatsu Motor Co Ltd
Original Assignee
Daihatsu Motor Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daihatsu Motor Co Ltd filed Critical Daihatsu Motor Co Ltd
Priority to JP15154182A priority Critical patent/JPS5939366A/en
Publication of JPS5939366A publication Critical patent/JPS5939366A/en
Publication of JPS634464B2 publication Critical patent/JPS634464B2/ja
Granted legal-status Critical Current

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  • Cleaning By Liquid Or Steam (AREA)
  • Coating Apparatus (AREA)

Description

【発明の詳細な説明】 本発明は塗装前処理装置に関し、とくにその給
水系統の改良に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a painting pretreatment device, and particularly to improvements in its water supply system.

自動車のホワイトボデ、フレームなどの被塗装
物を塗装するばあいは、通常塗装に先立つて被塗
装物の表面を清浄にし、さらに塗装面の耐蝕性と
塗膜の密着性を高めるためリン酸塩などにより化
成処理を行なつており、かかる塗装前処理はたと
えばつぎの工程順に行なわれる。
When painting objects to be painted, such as automobile white bodies and frames, the surface of the object is usually cleaned before painting, and phosphates are used to improve the corrosion resistance of the painted surface and the adhesion of the paint film. A chemical conversion treatment is performed by, for example, the following steps.

予備脱脂→本脱脂→第1水洗→第2水洗→第3
水洗→表面調整→化成処理→第4水洗→第5水洗
→第6水洗 前記塗装前処理はたとえば第1図に示されるご
とき装置によつて行なわれている。
Preliminary degreasing → Main degreasing → 1st washing → 2nd washing → 3rd
Washing→Surface conditioning→Chemical treatment→Fourth washing→Fifth washing→Sixth washing The pre-painting treatment is carried out by, for example, an apparatus as shown in FIG.

第1図において、10は予備脱脂ブース、20
は本脱脂デイツプ槽、30は第1水洗デイツプ
槽、40は第2水洗ブース、50は第3水洗ブー
ス、60は表面調整ブース、70は化洗成処理デ
イツプ槽、80は第4水洗デイツプ槽、90は第
5水洗ブース、100は第6水洗ブースである。
1は前記ブースおよびデイツプ槽のうえを走行す
るコンベアであり、コンベア1からはハンガー2
が垂下され、ハンガー2には被処理物、たとえば
自動車ボデ3が乗せられ、予備脱脂ブース10か
ら第6水洗ブース100の方向に移動される。4
は各ブースを仕切る隔壁である。予備脱脂ブース
10は脱脂液貯槽11を備え、貯槽11中の脱脂
液はポンプ12によりスプレーライザ13に送ら
れ、被処理物3にスプレーされたのち貯槽11に
回収され、循環使用される。本脱脂および化成処
理は防錆対策上各処理を充分に行なうためそれぞ
れフルデイツプ槽20および70で行なう。また
本脱脂直後の第1水洗および化成処理直後の第4
水洗も水洗を充分に行なうためそれぞれフルデイ
ツプ槽30および80で行なう。第2水洗ブース
40、第3水洗ブース50、第5水洗ブース90
および第6水洗ブース100はそれぞれ洗浄水貯
槽41,51,91および101を備えている。
In Fig. 1, 10 is a preliminary degreasing booth, 20
30 is the first washing dip tank, 40 is the second washing booth, 50 is the third washing booth, 60 is the surface conditioning booth, 70 is the chemical cleaning treatment dip tank, and 80 is the fourth washing dip tank. , 90 is a fifth washing booth, and 100 is a sixth washing booth.
1 is a conveyor that runs above the booth and the dip tank, and from the conveyor 1 there is a hanger 2.
An object to be treated, for example, an automobile body 3 is placed on the hanger 2 and is moved from the preliminary degreasing booth 10 to the sixth washing booth 100. 4
is a partition wall that separates each booth. The preliminary degreasing booth 10 is equipped with a degreasing liquid storage tank 11, and the degreasing liquid in the storage tank 11 is sent to a spray riser 13 by a pump 12, and after being sprayed onto the object to be treated 3, is collected in the storage tank 11 and used for circulation. The main degreasing and chemical conversion treatments are carried out in full-deep tanks 20 and 70, respectively, in order to perform each treatment sufficiently for rust prevention. Also, the first water washing immediately after main degreasing and the fourth washing immediately after chemical conversion treatment.
Washing with water is also carried out in full-deep tanks 30 and 80, respectively, to ensure sufficient washing. Second washing booth 40, third washing booth 50, fifth washing booth 90
And the sixth washing booth 100 is equipped with washing water storage tanks 41, 51, 91 and 101, respectively.

前記装置において、各水洗ブース、水洗デイツ
プ槽への給水は第1水洗デイツプ槽30、第2水
洗ブース40および第3水洗ブース50への給水
系統Aと第4水洗デイツプ槽80、第5水洗ブー
ス90および第6水洗ブース100への給水系統
Bとに分けて行なわれ、各系統においては後段か
ら前段へ洗浄水が送られる。
In the above device, water is supplied to each washing booth and washing dip tank through a water supply system A to the first washing dip tank 30, the second washing booth 40, and the third washing booth 50, the fourth washing dip tank 80, and the fifth washing booth. 90 and the water supply system B to the sixth washing booth 100, and in each system, washing water is sent from the rear stage to the front stage.

すなわち、給水系統Aのばあい、給水口52か
ら新鮮水が第3水洗ブース50のスプレーライザ
53に送られ、被処理物3にスプレーされたのち
貯槽51に回収される。貯槽51中の洗浄水は連
通管54を通して貯槽41に送られ、貯槽41中
の洗浄水はポンプ42により第2水洗ブース40
のスプレーライザ43に送られ、被処理物3にス
プレーされたのち貯槽41に回収され、循環使用
される。また貯槽41中の洗浄水はポンプ44に
より第1水洗デイツプ槽30上方のスプレーライ
ザ31に送られ、スプレーされたのち第1水洗デ
イツプ槽30に回収される。第1水洗デイツプ槽
30中の洗浄水はオーバーフロー管32により排
水系統に送られる。
That is, in the case of water supply system A, fresh water is sent from the water supply port 52 to the spray riser 53 of the third washing booth 50, is sprayed onto the object 3, and then is collected in the storage tank 51. The washing water in the storage tank 51 is sent to the storage tank 41 through the communication pipe 54, and the washing water in the storage tank 41 is sent to the second washing booth 40 by the pump 42.
After being sent to the spray riser 43 and sprayed onto the object 3 to be treated, it is collected in the storage tank 41 and used for circulation. Further, the washing water in the storage tank 41 is sent to the spray riser 31 above the first washing dip tank 30 by a pump 44, and after being sprayed, it is collected in the first washing dip tank 30. The wash water in the first wash dip tank 30 is sent to the drainage system through an overflow pipe 32.

給水系統Bにおいても、給水系統Aのばあいと
同様に給水口102から新鮮水がまず第6水洗ブ
ース100に送られ、順次前段の第5水洗ブース
90および第4水洗デイツプ槽80に送られる。
In water supply system B, as in the case of water supply system A, fresh water is first sent from the water supply port 102 to the sixth washing booth 100, and then sequentially sent to the preceding fifth washing booth 90 and the fourth washing dip tank 80. .

なお第6水洗ブース100の後段に第7水洗ブ
ース106を設けるばあいもあり、そのばあい給
水口107からの新鮮水がスプレーライザ108
に送られ、スプレーされたのち配管109により
貯槽101に送られる。
Note that there is a case where the seventh flush booth 106 is provided after the sixth flush booth 100, and in that case, fresh water from the water supply port 107 is supplied to the spray riser 108.
After being sprayed, it is sent to the storage tank 101 via piping 109.

しかしながら、前記(A)系統および(B)系統の給水
においては、それぞれ第2水洗ブース40から第
1水洗デイツプ槽30への送水量および第5水洗
ブース90から第4水洗デイツプ槽80への送水
量が少ない。それは主に洗浄水中の夾雑物により
スプレーライザが目詰りを起すためである。そこ
で第1水洗デイツプ槽30および第4水洗デイツ
プ槽80に給水口5からそれぞれ配管33および
83を通して常時注水している。そのため水の消
費量が非常に多くなつているとともに、第1水洗
デイツプ槽30および第4水洗デイツプ槽80へ
の常時給水量が元管の水圧不安定、スプレーライ
ザの目詰りなどの理由により一定せず、必要なと
きにデイツプ槽30および80中に洗浄水が満さ
れていないなどの問題が生じる。
However, in the water supply of the (A) system and (B) system, the amount of water sent from the second washing booth 40 to the first washing dip tank 30 and the amount of water sent from the fifth washing booth 90 to the fourth washing dip tank 80, respectively. The amount of water is low. This is mainly because the spray riser becomes clogged due to contaminants in the wash water. Therefore, water is constantly injected into the first washing dip tank 30 and the fourth washing dip tank 80 from the water supply port 5 through the pipes 33 and 83, respectively. As a result, water consumption has become extremely high, and the amount of water constantly supplied to the first washing dip tank 30 and the fourth washing dip tank 80 remains constant due to reasons such as unstable water pressure in the main pipe and clogging of the spray riser. Otherwise, problems arise such as the dip tanks 30 and 80 not being filled with wash water when necessary.

本発明は、前記の点に鑑みて、水の供給量を必
要充分にしかつ洗浄水を安定供給しうる塗装前処
理装置を提供するにある。
SUMMARY OF THE INVENTION In view of the above-mentioned points, the present invention provides a coating pretreatment device that can supply a sufficient amount of water and stably supply washing water.

すなわち本発明は、脱脂装置、第1水洗装置、
化成処理装置、第2水洗装置がこの順に連設され
てなる塗装前処理装置において、第1水洗装置お
よび第2水洗装置がそれぞれ複数の水洗装置から
なり、少なくともそれらの最前段はデイツプ槽で
あり、第1バツフアタンクに溜められた洗浄水が
それぞれ第1水洗装置の最後段および第2水洗装
置の最後段に定量供給され、第1および第2水洗
装置の最後段に供給された洗浄水は順次前段に送
られ、最前段のデイツプ槽には後段からそれぞれ
第2バツフアタンクおよび第3バツフアタンクを
介して定量供給されるように構成されてなる塗装
前処理装置に関する。
That is, the present invention includes a degreasing device, a first water washing device,
In a painting pretreatment device in which a chemical conversion treatment device and a second water washing device are connected in this order, each of the first water washing device and the second water washing device is composed of a plurality of water washing devices, and at least the first stage thereof is a dip tank. , the washing water stored in the first buffer tank is supplied in a constant quantity to the last stage of the first washing device and the last stage of the second washing device, respectively, and the washing water supplied to the last stage of the first and second washing devices is sequentially The present invention relates to a coating pretreatment device which is configured to be sent to the first stage and supplied in a fixed amount to the first stage dip tank from the second stage via a second buffer tank and a third buffer tank, respectively.

つぎに本発明の装置を図面に基づいて説明す
る。
Next, the apparatus of the present invention will be explained based on the drawings.

第2図は本発明の装置の一実施例を示す概略説
明図である。なお第2図において、第1図と同一
の図面符号は第1図と同一の部材を示す。
FIG. 2 is a schematic explanatory diagram showing an embodiment of the apparatus of the present invention. Note that in FIG. 2, the same reference numerals as in FIG. 1 indicate the same members as in FIG.

第2図の装置においては、第1図と同様に予備
脱脂ブース10、本脱脂デイツプ槽20、第1水
洗デイツプ槽30、第2水洗ブース40、第3水
洗ブース50、表面調整ブース60、化成処理デ
イツプ槽70、第4水洗デイツプ槽80、第5水
洗ブース90および第6水洗ブース100がこの
順に連設されており、予備脱脂ブース10は脱脂
液貯槽11を備え、第2水洗ブース40、第3水
洗ブース50、第5水洗ブース90および第6水
洗ブース100はそれぞれ洗浄水貯槽41,5
1,91および101を備えている。被処理物3
はタクト方式によりコンベア1から垂下されたハ
ンガー2に乗せられ、予備脱脂ブース10から第
6水洗ブース100の方向に移動せられ、その途
中で各処理を受ける。
In the apparatus shown in FIG. 2, as in FIG. A processing dip tank 70, a fourth washing dip tank 80, a fifth washing booth 90, and a sixth washing booth 100 are connected in this order, the preliminary degreasing booth 10 is equipped with a degreasing liquid storage tank 11, the second washing booth 40, The third washing booth 50, the fifth washing booth 90 and the sixth washing booth 100 each have washing water storage tanks 41 and 5.
1, 91 and 101. Processed object 3
is placed on a hanger 2 hanging down from the conveyor 1 using a tact method, and is moved from the preliminary degreasing booth 10 to the sixth washing booth 100, undergoing various treatments along the way.

各水洗デイツプ槽および水洗ブースへの給水は
つぎのごとく行なわれる。
Water is supplied to each washing dip tank and washing booth as follows.

給水口110からの新鮮水はまず第1バツフア
タンク111に溜められる。そして、該バツフア
タンクには微生物などの発生を防止する減菌装置
が配設してある。該バツフアタンク111に溜め
られた水をそれぞれポンプ112およびポンプ1
13で貯槽51および貯槽101に送水する。な
お、この送水管は貯槽51,101のポンプの吸
込口付近にくるよう配慮してある。
Fresh water from the water supply port 110 is first stored in a first buffer tank 111. The buffer tank is equipped with a sterilization device to prevent the generation of microorganisms. The water stored in the buffer tank 111 is pumped through pumps 112 and 1, respectively.
At step 13, water is supplied to the storage tank 51 and the storage tank 101. Note that this water pipe is arranged near the suction ports of the pumps of the storage tanks 51 and 101.

貯槽51に送水された新鮮水はポンプ55によ
り第3水洗ブースのスプレーライザ53に送られ
被処理物3にスプレーされたのち貯槽51に回収
される。貯槽51中の洗浄水は連通管54を通し
て第2水洗ブース40の貯槽41に送られ、貯槽
41中の洗浄水はポンプ42により第2水洗ブー
ス40のスプレーライザ43に送られ、被処理物
3にスプレーされたのち貯槽41に回収され、循
環使用される。また貯槽41中の洗浄水はオーバ
ーフロー管114により第2バツフアタンク11
5に溜められる。バツフアタンク115に溜めら
れた洗浄水はポンプ116により配管117を通
して第1水洗デイツプ槽30に供給される。第1
水洗デイツプ槽30中の洗浄水はオーバーフロー
管32により排水系統に送られる。
The fresh water sent to the storage tank 51 is sent to the spray riser 53 of the third washing booth by the pump 55, and is sprayed onto the object 3 to be treated, and then collected into the storage tank 51. The cleaning water in the storage tank 51 is sent to the storage tank 41 of the second washing booth 40 through the communication pipe 54, and the washing water in the storage tank 41 is sent to the spray riser 43 of the second washing booth 40 by the pump 42, and the object to be treated 3 is sent to the spray riser 43 of the second washing booth 40. After being sprayed on water, it is collected in a storage tank 41 and used for circulation. Also, the cleaning water in the storage tank 41 is transferred to the second buffer tank 11 through an overflow pipe 114.
It can be accumulated to 5. The washing water stored in the buffer tank 115 is supplied to the first washing dip tank 30 through a pipe 117 by a pump 116. 1st
The wash water in the wash dip tank 30 is sent to the drainage system through an overflow pipe 32.

一方貯槽101に送られた新鮮水はポンプ10
5により第6水洗ブース100のスプレーライザ
103に送られ、被処理物3にスプレーされたの
ち貯槽101に回収される。貯槽101中の洗浄
水は連通管104を通して第5水洗ブース90の
貯槽91に送られ、貯槽91中の洗浄水はポンプ
92により第5水洗ブース90のスプレーライザ
93に送られ、被処理物3にスプレーされたのち
貯槽91に回収され循環使用される。また貯槽9
1中の洗浄水はオーバーフロー管118により第
3バツフアタンク119に溜められる。第3バツ
フアタンク119に溜められた洗浄水はポンプ1
20により配管121を通して第4水洗デイツプ
槽80に供給される。第4水洗デイツプ槽80中
の洗浄水はオーバーフロー管82により排水系統
に送られる。
On the other hand, fresh water sent to the storage tank 101 is supplied to the pump 10.
5, it is sent to the spray riser 103 of the sixth flush booth 100, and after being sprayed onto the object 3 to be treated, it is collected in the storage tank 101. The cleaning water in the storage tank 101 is sent to the storage tank 91 of the fifth washing booth 90 through the communication pipe 104, and the washing water in the storage tank 91 is sent to the spray riser 93 of the fifth washing booth 90 by the pump 92, and the object to be treated 3 is sent to the spray riser 93 of the fifth washing booth 90. After being sprayed on water, it is collected in a storage tank 91 and used for circulation. Also storage tank 9
1 is stored in a third buffer tank 119 through an overflow pipe 118. The cleaning water stored in the third buffer tank 119 is pumped to the pump 1.
20 and is supplied to the fourth washing dip tank 80 through piping 121. The washing water in the fourth washing dip tank 80 is sent to the drainage system through an overflow pipe 82.

なお第6水洗ブース100の後段に第7水洗ブ
ース106を設けるばあいは、給水口107から
の新鮮水がスプレーライザ108に送られ、スプ
レーされたのち配管109により貯槽101に送
られる。
In addition, when the seventh flush booth 106 is provided after the sixth flush booth 100, fresh water from the water supply port 107 is sent to the spray riser 108, and after being sprayed, it is sent to the storage tank 101 through the piping 109.

第1バツフアタンク111から貯槽51および
貯槽101への給水はそれぞれポンプ112およ
び113により被処理物3の移動に連動させて、
たとえば被処理物が各ブースに来たときにのみ一
定量ずつ供給するように構成されている。また第
2バツフアタンク115から第1水洗デイツプ槽
30への給水および第3バツフアタンク119か
ら第4水洗デイツプ槽80への給水もそれぞれポ
ンプ116および120により、被処理物の移動
に連動させて一定量ずつ供給するように構成され
ている。該給水量は被処理物による液持込み、液
持出し量、被処理物が入槽したとき溢れ出る量お
よび水質などから決定できる。前記各ブースおよ
びデイツプ槽への定量供給は被処理物の進行をリ
ミツトスイツチなどにより検知し、それにより給
水ポンプを作動させるようにすればよい。
Water is supplied from the first buffer tank 111 to the storage tank 51 and the storage tank 101 by pumps 112 and 113, respectively, in conjunction with the movement of the object 3.
For example, the system is configured to supply a fixed amount of workpieces only when they arrive at each booth. Also, water is supplied from the second buffer tank 115 to the first washing dip tank 30 and from the third buffer tank 119 to the fourth washing dip tank 80 by pumps 116 and 120, respectively, in fixed amounts in conjunction with the movement of the objects to be treated. configured to supply. The amount of water to be supplied can be determined from the amount of liquid carried in and taken out by the object to be treated, the amount that overflows when the object to be treated enters the tank, and the quality of water. The quantitative supply to each of the booths and the dip tank can be carried out by detecting the progress of the material to be treated using a limit switch or the like, and operating the water supply pump accordingly.

しかして、本発明の装置においては、新鮮水を
一旦第1バツフアタンク111に溜め、それをそ
れぞれ貯槽51および貯槽101に定量供給し、
これらブース50および100から前段に供給
し、第1水洗デイツプ槽30および第4水洗デイ
ツプ槽80への給水はそれぞれ後段の水洗ブース
の洗浄水を一旦第2バツフアタンク115および
第3バツフアタンク119に溜め、それを定量供
給しているから、第1図に示される装置と異な
り、水洗デイツプ槽へ所定量の給水が必要充分に
確保されて常時給水する必要がなく、そのため水
の消費量が大巾に節約され、しかも元管の水圧の
変動などに起因する貯水量の変動がなく、常に一
定の水洗処理ができるので、きわめて有利であ
る。
Therefore, in the device of the present invention, fresh water is temporarily stored in the first buffer tank 111, and a fixed amount is supplied to the storage tank 51 and the storage tank 101, respectively.
The water is supplied from these booths 50 and 100 to the front stage, and the water is supplied to the first washing dip tank 30 and the fourth washing dip tank 80 by temporarily storing the washing water from the washing booth in the latter stage in the second buffer tank 115 and the third buffer tank 119, respectively. Because it supplies a fixed amount of water, unlike the device shown in Figure 1, a sufficient amount of water is ensured to be supplied to the washing dip tank, and there is no need to constantly supply water, which greatly reduces water consumption. This method is very advantageous because it saves money, and there is no fluctuation in the amount of water stored due to fluctuations in water pressure in the main pipe, and constant water washing can be performed at all times.

前記においては本発明の装置をタクト方式を例
にとつて説明したが、連続方式にも適用できるこ
とは勿論である。
Although the apparatus of the present invention has been described above using a tact method as an example, it is of course applicable to a continuous method as well.

脱脂工程、表面調整工程、化成処理工程などは
従来と同様に行なえばよく、とくに制限されると
ころはない。
The degreasing process, surface conditioning process, chemical conversion treatment process, etc. may be performed in the same manner as conventional methods, and are not particularly limited.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の塗装前処理装置の概略説明図、
第2図は本発明の塗装前処理装置の一実施例を示
す概略説明図である。 (図面の主要符号)、10:予備脱脂ブース、
20:本脱脂デイツプ槽、30:第1水洗デイツ
プ槽、40:第2水洗ブース、50:第3水洗ブ
ース、70:化成処理デイツプ槽、80:第4水
洗デイツプ槽、90:第5水洗ブース、100:
第6水洗ブース、110:給水口、111:第1
バツフアタンク、115:第2バツフアタンク、
119:第3バツフアタンク。
Figure 1 is a schematic explanatory diagram of a conventional painting pretreatment device.
FIG. 2 is a schematic explanatory diagram showing an embodiment of the coating pretreatment apparatus of the present invention. (Main symbols in the drawing), 10: Preliminary degreasing booth,
20: Main degreasing dip tank, 30: First washing dip tank, 40: Second washing booth, 50: Third washing booth, 70: Chemical treatment dip tank, 80: Fourth washing dip tank, 90: Fifth washing booth , 100:
6th flush booth, 110: Water inlet, 111: 1st
Batsuhua tank, 115: 2nd Batsufua tank,
119: Third battle tank.

Claims (1)

【特許請求の範囲】[Claims] 1 脱脂装置、第1水洗装置、化成処理装置、第
2水洗装置がこの順に連設されてなる塗装前処理
装置において、第1水洗装置および第2水洗装置
がそれぞれ複数の水洗装置からなり、少なくとも
それらの最前段はデイツプ槽であり、第1バツフ
アタンクに溜められた洗浄水がそれぞれ第1水洗
装置の最後段および第2水洗装置の最後段に定量
供給され、第1および第2水洗装置の最後段に供
給された洗浄水は順次前段に送られ、最前段のデ
イツプ槽には後段からそれぞれ第2バツフアタン
クおよび第3バツフアタンクを介して定量供給さ
れるように構成されてなる塗装前処理装置。
1. In a painting pretreatment device in which a degreasing device, a first water washing device, a chemical conversion treatment device, and a second water washing device are connected in this order, each of the first water washing device and the second water washing device is composed of a plurality of water washing devices, and at least The first stage of these is a dip tank, and the washing water stored in the first buffer tank is supplied in a constant quantity to the last stage of the first water washing device and the last stage of the second water washing device, respectively. The painting pretreatment device is configured such that the cleaning water supplied to the stages is sequentially sent to the front stage, and a fixed amount is supplied to the dip tank at the front stage from the rear stage via a second buffer tank and a third buffer tank, respectively.
JP15154182A 1982-08-30 1982-08-30 Apparatus for pretreatment of coating Granted JPS5939366A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15154182A JPS5939366A (en) 1982-08-30 1982-08-30 Apparatus for pretreatment of coating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15154182A JPS5939366A (en) 1982-08-30 1982-08-30 Apparatus for pretreatment of coating

Publications (2)

Publication Number Publication Date
JPS5939366A JPS5939366A (en) 1984-03-03
JPS634464B2 true JPS634464B2 (en) 1988-01-29

Family

ID=15520761

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15154182A Granted JPS5939366A (en) 1982-08-30 1982-08-30 Apparatus for pretreatment of coating

Country Status (1)

Country Link
JP (1) JPS5939366A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61286222A (en) * 1985-06-13 1986-12-16 Nippon Shokubai Kagaku Kogyo Co Ltd Superfine particle containing zirconia
JPS61215218A (en) * 1985-03-19 1986-09-25 Agency Of Ind Science & Technol Manufacturing method of functional oxide powder
JPH08698B2 (en) * 1986-04-21 1996-01-10 第一稀元素化学工業株式会社 Partially stabilized zirconia powder

Also Published As

Publication number Publication date
JPS5939366A (en) 1984-03-03

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