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JPS6349336B2 - - Google Patents
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JPS6349336B2 - - Google Patents

Info

Publication number
JPS6349336B2
JPS6349336B2 JP15207176A JP15207176A JPS6349336B2 JP S6349336 B2 JPS6349336 B2 JP S6349336B2 JP 15207176 A JP15207176 A JP 15207176A JP 15207176 A JP15207176 A JP 15207176A JP S6349336 B2 JPS6349336 B2 JP S6349336B2
Authority
JP
Japan
Prior art keywords
hole
small
electron beam
shadow mask
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP15207176A
Other languages
Japanese (ja)
Other versions
JPS5376741A (en
Inventor
Takeshi Suzuki
Makoto Kudo
Yasushi Sengoku
Junichi Maeno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP15207176A priority Critical patent/JPS5376741A/en
Publication of JPS5376741A publication Critical patent/JPS5376741A/en
Publication of JPS6349336B2 publication Critical patent/JPS6349336B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01PWAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P5/00Coupling devices of the waveguide type
    • H01P5/12Coupling devices having more than two ports
    • H01P5/16Conjugate devices, i.e. devices having at least one port decoupled from one other port
    • H01P5/18Conjugate devices, i.e. devices having at least one port decoupled from one other port consisting of two coupled guides, e.g. directional couplers
    • H01P5/184Conjugate devices, i.e. devices having at least one port decoupled from one other port consisting of two coupled guides, e.g. directional couplers the guides being strip lines or microstrips

Landscapes

  • Electrodes For Cathode-Ray Tubes (AREA)

Description

【発明の詳細な説明】 本発明は明るくかつホワイトユニホミテイの良
好なカラー受像管が得られるシヤドウマスクに関
する。カラー受像管においては、明るく、かつ、
ホワイトユニホミテイの良好な映像が得られるこ
とが必要とされている。このために第1図に示す
ように、けい光面1上に生じる電子ビームの像2
aが所定幅の正しい長方形をなすことが要求され
る。さらに、この第1図のようにブリツジ像3a
がいずれも平行な縁を有することが最も望ましい
とされている。ところが、実際のシヤドウマスク
は、第2図に一例を示すように、金属板4に形成
された長形透孔5の小径部5aが両端が丸くなつ
た長孔をなし、その開口部5bも角がやや丸味を
もつた長方形になつている。これは従来技術にお
いて、止むを得ないものとされている。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a shadow mask that provides a bright color picture tube with good white uniformity. Color picture tubes are bright and
It is necessary to obtain good images of white uniforms. For this purpose, as shown in FIG.
It is required that a forms a correct rectangle of a predetermined width. Furthermore, as shown in FIG. 1, the bridge image 3a
Most preferably, both have parallel edges. However, in an actual shadow mask, as shown in FIG. 2, the small diameter portion 5a of the long through hole 5 formed in the metal plate 4 is a long hole with rounded ends, and the opening 5b is also square. It has a slightly rounded rectangular shape. This is considered unavoidable in the prior art.

このような透孔5に電子ビームが斜めに入射す
ると、第3図に示すように、透孔5の中央部に入
射した電子ビームB1はそのまま通過する。とこ
ろが、透孔5の端部の角に入射した電子ビームB
2は小径部5aの内面近傍を通過するが、開口部
5bの内面に阻止されてしまう。しかも、その一
部は、この内面で散乱されてけい光面の不所望部
に入射する。さらに、透孔5の小径部5aの外側
に入射した電子ビームB3は、ここで阻止され
る。従つて、このような透孔5に斜めに入射した
電子ビームの像は、第4図に示すように、けい光
面1上の一個の角部6aが特に大きく凹み、他の
角部6b,6bが少し凹んだ長形像6として形成
される。この場合、ブリツジ像7は一端部7aが
極端に幅広になる。
When an electron beam is obliquely incident on such a through hole 5, the electron beam B1 that has entered the center of the through hole 5 passes through as is, as shown in FIG. However, the electron beam B incident on the corner of the end of the through hole 5
2 passes near the inner surface of the small diameter portion 5a, but is blocked by the inner surface of the opening 5b. Moreover, a part of it is scattered by this inner surface and enters an undesired part of the phosphor surface. Further, the electron beam B3 incident on the outside of the small diameter portion 5a of the through hole 5 is blocked here. Therefore, as shown in FIG. 4, in the image of the electron beam obliquely incident on such a through hole 5, one corner 6a on the fluorescent surface 1 is particularly greatly recessed, and the other corners 6b, 6b is formed as a slightly concave rectangular image 6. In this case, the bridge image 7 becomes extremely wide at one end 7a.

このような電子ビーム像6を形成すれば、ブリ
ツジ像7の面積が非常に大きくなるため、映像が
暗くなることが避けられないばかりか、ブリツジ
像7形状のためホワイトユニホミテイが悪くな
る。しかも、もつと悪いことには、電子ビームの
透孔5への入射角度はシヤドウマスクの中心部と
周辺部とでは著しく異なり、このため、局部輝度
や局部的ホワイトユニホミテイが映像面の各部で
異なつてくることである。
If such an electron beam image 6 is formed, the area of the bridge image 7 will become very large, so not only will the image inevitably become dark, but also the white uniformity will be poor due to the shape of the bridge image 7. Moreover, to make matters worse, the angle of incidence of the electron beam on the through hole 5 is significantly different between the center and the periphery of the shadow mask, and as a result, local brightness and local white uniformity differ in each part of the image plane. It's something that comes with it.

本発明は、このような従来技術の欠点を除くた
めになされたもので、開口部の4隅が外方に突出
するような糸巻状とするものである。この場合、
小孔部側のみ突出させると、電子ビームが阻止さ
れるビーム欠けは改善されず、周辺部に行く程ビ
ームの入射角が大きくなるのに伴ない、大孔部隅
に射突する電子ビームの量が多くなり、これが散
乱電子となつて不必要な部分の蛍光体を射つため
色純度及びコントラストの低下を引起こす。一
方、大孔部側のみ突出させても、一般のフオトエ
ツチング技術では孔のまるみをおびることは避け
られないから、大孔部と小孔部の合致する小径部
もまるみをおび、そのまるみの分輝度が低下して
しまう。そこで、本発明では、シヤドウマスクの
透孔の最小径部が角が直角に近い長方形をなし、
かつ上記透孔の大孔部、小孔部の両開口部ともそ
の長方形の角部が外方に突出するような糸巻状に
することにより、映像面全面にわたつて電子ビー
ム像を長方形に形成させて、輝度分布ならびにホ
ワイトユニホミテイが良好な受像管が得られ、し
かも、製造が容易なシヤドウマスクを提供するも
のである。
The present invention has been made to eliminate such drawbacks of the prior art, and the opening has a pincushion shape with four corners projecting outward. in this case,
If only the small hole side is made to protrude, the problem of beam chipping, where the electron beam is blocked, will not be improved, and as the incident angle of the beam increases toward the periphery, the electron beam striking the corner of the large hole will not be improved. The amount increases, and these become scattered electrons that hit unnecessary portions of the phosphor, resulting in a decrease in color purity and contrast. On the other hand, even if only the large hole side is protruded, it is unavoidable that the hole will be rounded using general photoetching techniques. The brightness will decrease accordingly. Therefore, in the present invention, the minimum diameter part of the through hole of the shadow mask has a rectangular shape with corners close to right angles,
By forming both the large and small openings of the above-mentioned through-hole into a pincushion shape with their rectangular corners protruding outward, an electron beam image is formed in a rectangular shape over the entire image plane. Thus, it is possible to obtain a picture tube with good brightness distribution and white uniformity, and to provide a shadow mask that is easy to manufacture.

以下、本発明の詳細を図によつて説明する。 Hereinafter, details of the present invention will be explained with reference to the drawings.

第5図乃至第7図は、本発明のシヤドウマスク
の実施例を示す。これは、金属板4に多数の透孔
8,8をブリツジ9を介して連接したもので、透
孔8の小径部8aは、角部が直角に近いほぼ長方
形をなし、開口部の大孔側8c(以下、単に大孔
部という)はその長方形の角が大きく外方に突出
した糸巻状をなす。一方、シヤドウマスクの開口
部の小孔側8b(以下、単に小孔部という)も、
第6図に示すように、その長方形の角部が外方に
突出した糸巻状をなしている。
5 to 7 show embodiments of the shadow mask of the present invention. This has a large number of through holes 8, 8 connected to a metal plate 4 via a bridge 9. The small diameter part 8a of the through hole 8 has a nearly rectangular shape with corners close to right angles, and the large opening The side 8c (hereinafter simply referred to as the large hole portion) has a rectangular shape with large corners projecting outward. On the other hand, the small hole side 8b of the opening of the shadow mask (hereinafter simply referred to as the small hole)
As shown in FIG. 6, the rectangular corner has a pincushion shape with outwardly projecting corners.

このような透孔8に電子ビームが斜めに入射す
れば、第7図に示すように、透孔8の中央部に入
射した電子ビームB1はそのまま通過し、透孔8
の小径部8aの角部に接近して入射した電子ビー
ムB2は、大孔部8c内面が大きく後退している
ので、ここでも阻止されることなく通過する。従
つて、このような透孔8を通過した電子ビームの
像は、第8図に示すように、けい光面1上にほぼ
長方形の像10となり、その角部10aもほぼ直
角に近い形となり、ブリツジの影11の縁はほぼ
平行となる。
If an electron beam is obliquely incident on such a hole 8, the electron beam B1 incident on the center of the hole 8 will pass through the hole 8 as shown in FIG.
Since the inner surface of the large hole 8c is largely recessed, the electron beam B2 that is incident close to the corner of the small diameter portion 8a passes therethrough without being blocked. Therefore, as shown in FIG. 8, the image of the electron beam that has passed through such a through hole 8 becomes a substantially rectangular image 10 on the fluorescent surface 1, and the corner 10a thereof also has a shape close to a right angle. , the edges of the bridge shadow 11 are almost parallel.

そして、実験によれば、第5図に示すように、
大孔部8c側のブリツジ9において、その中央部
の幅をD1、端部の幅をD2とし、D2/D1が
0.48乃至0.77のとき最も好ましい結果が得られ
た。また、小孔部8b間のブリツジ9においては
第6図に示すように、その中央部の幅をD3とし
端部の幅をD4としたときD4/D3が0.77以上
1.00未満のとき好結果を得た。
According to the experiment, as shown in Figure 5,
In the bridge 9 on the large hole 8c side, the width at the center is D1, the width at the end is D2, and D2/D1 is
The most favorable results were obtained when the ratio was between 0.48 and 0.77. Furthermore, in the bridge 9 between the small holes 8b, as shown in FIG. 6, when the width at the center is D3 and the width at the end is D4, D4/D3 is 0.77 or more.
Good results were obtained when it was less than 1.00.

つぎに、上記のシヤドウマスクの製造方法を説
明する。まず、第9図およびその一部を拡大した
第10図に示すように、透明板12に多数の細長
い糸巻き形の非透光性大ドツト13,13を間隙
14,14を介して連接してなる大ドツトネガフ
イルム15と、第11図に示すように透明板12
に前記大ドツト13,13に対応した多数の細長
い糸巻き形の非透光性小ドツト16,16を間隙
17,17を介して連接してなる小ドツトネガフ
イルム18とを用意する。前記大ドツトネガフイ
ルム15において、第10図に示すように、間隙
14の中央部の幅をd1とし、かつ端部の幅をd
2としたとき、d2/d1が0.48〜0.77の範囲に
あることが望ましい。また、小ドツトネガフイル
ム18においては、第11図のように、間隙17
の中央部の幅をd3、端部の幅をd4とした場
合、d4/d3が0.77以上1.00未満の範囲にある
のが望ましい。
Next, a method for manufacturing the above shadow mask will be explained. First, as shown in FIG. 9 and a partially enlarged FIG. A large dot negative film 15 and a transparent plate 12 as shown in FIG.
A small dot negative film 18 is prepared in which a large number of elongated pincushion-shaped non-transparent small dots 16, 16 corresponding to the large dots 13, 13 are connected through gaps 17, 17. In the large dot negative film 15, as shown in FIG. 10, the width at the center of the gap 14 is d1, and the width at the end is d
2, it is desirable that d2/d1 be in the range of 0.48 to 0.77. Further, in the small dot negative film 18, as shown in FIG.
When the width at the center is d3 and the width at the end is d4, it is desirable that d4/d3 be in the range of 0.77 or more and less than 1.00.

そして、第12図に示すように、感光性樹脂を
塗布し、乾燥した金属板19を上記大ドツトネガ
フイルム15と小ドツトネガフイルム18とで挟
み、金属板の両面から図示しない露光装置によつ
て金属板19上の感光性樹脂膜を露光してネガフ
イルムのパターンを焼付け、上記大ドツト13お
よび小ドツト16の所定パターンに対応する部分
以外の樹脂を非水溶性にする。そして、この露出
した金属板19を現像してから通常の方法で蝕刻
を施すことにより、角部が大きく蝕刻されて前述
したシヤドウマスクを得ることができる。
Then, as shown in FIG. 12, the metal plate 19 coated with a photosensitive resin and dried is sandwiched between the large dot negative film 15 and the small dot negative film 18, and an exposure device (not shown) is applied from both sides of the metal plate. Then, the photosensitive resin film on the metal plate 19 is exposed to light to print a negative film pattern, and the resin other than the portions corresponding to the predetermined patterns of the large dots 13 and small dots 16 is rendered water-insoluble. Then, by developing the exposed metal plate 19 and then etching it in a conventional manner, the corners are largely etched and the aforementioned shadow mask can be obtained.

このように、本発明はシヤドウマスクの透孔の
小径部の角部が直角に近い長方形をなし、開口の
大小孔部ともにその長方形の角を外方に突出させ
たので、この角部や孔部の内壁面で電子ビームを
阻止されることがない。従つて、小径部形状に対
応し、角が直角に近い長方形の電子ビーム像が得
られ、このマスクを使用すれば輝度分布均一でホ
ワイトユニホミテイの良いカラー受像管が得られ
る利点がある。
In this way, in the present invention, the corner of the small diameter part of the through hole of the shadow mask has a rectangular shape close to a right angle, and the corners of the rectangle protrude outward for both the large and small openings. The electron beam is not blocked by the inner wall surface. Therefore, it is possible to obtain a rectangular electron beam image corresponding to the shape of the small diameter portion, and the corners are close to right angles, and the use of this mask has the advantage that a color picture tube with uniform brightness distribution and good white uniformity can be obtained.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はカラー受像管のパネル面における電子
ビーム像の好ましい形の一例を示す説明図、第2
図は従来のシヤドウマスクの一例の要部を示す拡
大正面図、第3図は第2図の―線に沿つた断
面についてその作用を示す説明図、第4図は第2
図のシヤドウマスクによつて得られた電子ビーム
像を説明するための図、第5図および第6図は本
発明のシヤドウマスクの実施例の要部を拡大して
示す正面図で、第5図は大孔側、第6図は小孔
側、第7図は第5図、第6図のシヤドウマスクの
断面図、第8図は本実施例のシヤドウマスクによ
つて得られる電子ビーム像の説明図、第9図は本
発明による実施例のシヤドウマスクを得るための
大ドツトネガフイルムの部分正面図、第10図は
同じく要部拡大正面図、第11図はこの大ドツト
ネガフイルムと組合せて用いる小ドツトネガフイ
ルムの一実施例の部分背面図、第12図は第10
図および第11図に示す両ネガフイルムを用いて
第5図示のシヤドウマスクを製造する一工程を示
す説明図である。 4…金属板、5,8…透孔、5a,8a…透孔
の小径部、9…ブリツジ、8b…小孔部、8c…
大孔部、12…透明板、13,16…ドツト、1
9…感光性樹脂を被覆した金属板。
Figure 1 is an explanatory diagram showing an example of a preferred shape of an electron beam image on the panel surface of a color picture tube;
The figure is an enlarged front view showing the main parts of an example of a conventional shadow mask, FIG.
5 and 6 are enlarged front views showing main parts of the embodiment of the shadow mask of the present invention, and FIG. The large hole side, FIG. 6 is the small hole side, FIG. 7 is a sectional view of the shadow mask shown in FIGS. 5 and 6, and FIG. 8 is an explanatory diagram of an electron beam image obtained by the shadow mask of this embodiment. FIG. 9 is a partial front view of a large dot negative film for obtaining a shadow mask according to an embodiment of the present invention, FIG. 10 is an enlarged front view of the main part, and FIG. 11 is a small dot used in combination with this large dot negative film. A partial rear view of one embodiment of the negative film, FIG.
FIG. 12 is an explanatory view showing one step of manufacturing the shadow mask shown in FIG. 5 using both the negative films shown in FIGS. 4... Metal plate, 5, 8... Through hole, 5a, 8a... Small diameter part of the through hole, 9... Bridge, 8b... Small hole part, 8c...
Large hole, 12...transparent plate, 13, 16...dot, 1
9...Metal plate coated with photosensitive resin.

Claims (1)

【特許請求の範囲】[Claims] 1 金属板に大孔部及び小孔部の開口部と小径部
よりなる多数の長形状の透孔がブリツジを介して
連接されてなり、上記透孔の小径部は長方形をな
し、上記大孔部及び小孔部の両開口部の4隅が外
方に突出するような糸巻状であることを特徴とす
るシヤドウマスク。
1 A large number of elongated through holes consisting of openings of large holes and small holes and small diameter portions are connected through bridges in a metal plate, the small diameter portion of the through holes is rectangular, and the large hole A shadow mask characterized in that the four corners of both the openings of the small hole and the small hole are shaped like a pincushion and protrude outward.
JP15207176A 1976-12-20 1976-12-20 Shadow mask its fabrication Granted JPS5376741A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15207176A JPS5376741A (en) 1976-12-20 1976-12-20 Shadow mask its fabrication

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15207176A JPS5376741A (en) 1976-12-20 1976-12-20 Shadow mask its fabrication

Publications (2)

Publication Number Publication Date
JPS5376741A JPS5376741A (en) 1978-07-07
JPS6349336B2 true JPS6349336B2 (en) 1988-10-04

Family

ID=15532408

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15207176A Granted JPS5376741A (en) 1976-12-20 1976-12-20 Shadow mask its fabrication

Country Status (1)

Country Link
JP (1) JPS5376741A (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1131155B (en) * 1979-05-24 1986-06-18 Rca Corp TUBE FOR THE REPRODUCTION OF COLOR TELEVISION IMAGES PRESENTING A O'OMBRA SLIT MASK AND MANUFACTURING METHOD OF THE SAME
US4300069A (en) * 1979-12-18 1981-11-10 Rca Corporation Color picture tube having improved slit type shadow mask and method of making same
JPS577041A (en) * 1980-05-12 1982-01-14 Buckbee Mears Co Structure with visual sense opening line and method of manufacturing same
JPH01175148A (en) * 1987-12-28 1989-07-11 Toppan Printing Co Ltd Shadow mask
JP2741036B2 (en) * 1988-07-30 1998-04-15 大日本スクリーン製造株式会社 Shadow mask for color picture tube

Also Published As

Publication number Publication date
JPS5376741A (en) 1978-07-07

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