JPS6349902B2 - - Google Patents
Info
- Publication number
- JPS6349902B2 JPS6349902B2 JP56097072A JP9707281A JPS6349902B2 JP S6349902 B2 JPS6349902 B2 JP S6349902B2 JP 56097072 A JP56097072 A JP 56097072A JP 9707281 A JP9707281 A JP 9707281A JP S6349902 B2 JPS6349902 B2 JP S6349902B2
- Authority
- JP
- Japan
- Prior art keywords
- metal outer
- outer ring
- lead wire
- glass
- plating layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W76/00—Containers; Fillings or auxiliary members therefor; Seals
- H10W76/60—Seals
Landscapes
- Lead Frames For Integrated Circuits (AREA)
Description
【発明の詳細な説明】
この発明は金メツキ層を有する気密端子の製造
方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing a hermetic terminal having a gold plating layer.
気密端子は各種の分野に広く応用されており、
その形状、構造も用途に応じて各種のものがある
が、基本的には第1図に示すように、金属外環1
内にガラス2を介してリード線3を気密絶縁的に
封着したものである。この種気密端子において
は、圧縮封止型と称されるものと、整合封止型と
称されるものとがある。前者は、金属外環1を鉄
または低炭素鋼で構成し、ガラス2としてソーダ
バリウムガラスまたはソーダライムガラス等のソ
ーダガラスを用い、リード線3として鉄・ニツケ
ル合金(Fe50%、Ni50%)を用いたもので、金
属外環1の線膨脹係数α1とガラス2の線膨脹係数
α2とをα1>α2の関係にして、金属外環1によつて
ガラス2に強い圧縮応力が加えられるようにした
ものである。一方、後者は、金属外環1とリード
線3とを鉄・ニツケル・コバルト合金(Fe53%、
Ni28%、Co18%)で構成し、ガラス2としてホ
ウケイ酸ガラスを使用したもので、金属外環1お
よびリード線3の線膨脹係数α1,α3とガラス2の
線膨脹係数α2とをα1=α3≒α2の関係に設定したも
のである。そして、前者は安価で機械的強度が大
きいという長所がある反面、ガラス2に同心円状
の圧縮歪が入る、封着部分に設計上の制約があ
る、ガラス2の表面の絶縁性が温度によつて変化
しやすいといつた短所がある。一方、後者は、広
い温度範囲で無歪のため安定である、形状が任意
に設計できる、気密性の信頼性が大きい、ガラス
2の表面の絶縁性の安定性が良い等の長所を有す
る反面、鉄・ニツケル・コバルト合金が非常に高
価なので原価高となる、比較的機械的強度が劣る
といつた短所を有する。 Hermetic terminals are widely applied in various fields,
There are various shapes and structures depending on the application, but basically, as shown in Figure 1, the metal outer ring 1
A lead wire 3 is sealed in an airtight and insulating manner through a glass 2. There are two types of airtight terminals of this type: one is called a compression sealing type, and the other is a matching sealing type. In the former case, the metal outer ring 1 is made of iron or low carbon steel, the glass 2 is made of soda glass such as soda barium glass or soda lime glass, and the lead wire 3 is made of an iron-nickel alloy (50% Fe, 50% Ni). The linear expansion coefficient α 1 of the metal outer ring 1 and the linear expansion coefficient α 2 of the glass 2 are set in the relationship α 1 >α 2 , and strong compressive stress is applied to the glass 2 by the metal outer ring 1. This is something that can be added. On the other hand, in the latter case, the metal outer ring 1 and the lead wire 3 are made of an iron-nickel-cobalt alloy (53% Fe,
28% Ni, 18% Co), and uses borosilicate glass as the glass 2. The linear expansion coefficient α 1 , α 3 of the metal outer ring 1 and the lead wire 3 and the linear expansion coefficient α 2 of the glass 2 are The relationship is set to α 1 = α 3 ≒ α 2 . The former has the advantage of being inexpensive and having high mechanical strength, but on the other hand, concentric compressive strain occurs in the glass 2, there are design restrictions on the sealing part, and the insulation of the surface of the glass 2 deteriorates depending on the temperature. The disadvantage is that it is easy to change. On the other hand, the latter has advantages such as being stable over a wide temperature range with no distortion, being able to design an arbitrary shape, having high reliability in airtightness, and having good insulation stability on the surface of the glass 2. However, since the iron-nickel-cobalt alloy is very expensive, the cost is high, and the mechanical strength is relatively poor.
そこで、本件出願人は先に、第2図に示すよう
に、42合金と称される鉄・ニツケル合金(Fe58
%、Ni42%)よりなる金属外環4内にホウケイ
酸ガラス5を介して鉄・ニツケル・コバルト合金
よりなるリード線6を気密絶縁的に封着してなる
気密端子を提案した。この気密端子は、鉄・ニツ
ケル合金が鉄・ニツケル・コバルト合金に比較し
て格段に安価であるため、整合封止型の気密端子
よりも原価低減が可能で、しかも金属外環4の線
膨脹係数α4(52×10-7/℃)とガラス5の線膨脹
係数α5(47×10-7/℃)とがα4>α5の関係になる
ので、ガラス4に圧縮応力が加わり、機械的強度
も向上するという利点がある。 Therefore, the applicant first proposed an iron-nickel alloy (Fe58) called 42 alloy as shown in Figure 2.
We have proposed an airtight terminal in which a lead wire 6 made of an iron-nickel-cobalt alloy is hermetically and insulatively sealed within a metal outer ring 4 made of borosilicate glass 5. Since the iron-nickel alloy is much cheaper than the iron-nickel-cobalt alloy, this hermetic terminal can be manufactured at a lower cost than the matched sealing type hermetic terminal, and the metal outer ring 4 has a linear expansion. Since the coefficient α 4 (52×10 -7 /℃) and the linear expansion coefficient α 5 (47×10 -7 /℃) of glass 5 have a relationship of α 4 >α 5 , compressive stress is applied to glass 4. , there is an advantage that mechanical strength is also improved.
さて、このような気密端子においては、金属外
環4とリード線6との素地を露出したまゝにして
おくと、発錆を生じ各種問題発生の原因となる。
そこで、金属外環4とリード線6の表面に防錆メ
ツキが施されている。この防錆メツキとしては電
気ニツケルメツキ、化学ニツケルメツキまたは金
メツキが一般的である。 Now, in such an airtight terminal, if the base material of the metal outer ring 4 and the lead wire 6 is left exposed, it will cause rusting and cause various problems.
Therefore, the surfaces of the metal outer ring 4 and the lead wires 6 are plated to prevent rust. This anti-rust plating is generally electrical nickel plating, chemical nickel plating or gold plating.
しかしながら、金メツキの場合、金属外環4お
よびリード線6に直接金メツキを施すと、特にリ
ード線6においては曲げ応力が加わりやすく応力
腐蝕割れを生じるので、下地にニツケルメツキ等
を施すのが普通である。 However, in the case of gold plating, if gold plating is applied directly to the metal outer ring 4 and the lead wire 6, bending stress is likely to be applied particularly to the lead wire 6, causing stress corrosion cracking, so it is common to apply nickel plating etc. to the base. It is.
従来は、第3図および第4図に示すように、金
属外環4内にガラス5を介してリード線6を気密
絶縁的に封着したのち、金属外環4およびリード
線6の表面にニツケルメツキ層7,8および金メ
ツキ層9,10を形成しているので、次の問題点
があつた。すなわち、ニツケルメツキ層7,8を
電気メツキ法で形成する場合は、金属外環4とリ
ード線6とがガラス5を介して絶縁されているの
で、両者にメツキするためにはこれら両者を線縛
等により同電位にしておく必要があり、線縛、取
り外し等の作業が極めて煩雑である。またバレル
メツキを実施すると、リード線6が折れ曲つた
り、ガラス5にクラツクが生じるという問題点が
ある。一方、ニツケルメツキ層7,8を化学メツ
キ法で形成すると、金属外環4とリード線6とを
同電位にするための線縛作業が不要になるので、
メツキ作業は著しく容易であるが、金属外環4と
リード線6上に直接化学ニツケルメツキを施す
と、この気密端子をロウ付けしたり、気密端子上
に他の物品をロウ付けする熱の加熱工程で化学ニ
ツケルメツキ層が硬化しかつその線膨脹係数が
130×10-7/℃程度もあり、金属外環4およびリ
ード線6を構成する鉄・ニツケル・コバルト合金
の線膨脹係数(47×10-7/℃)との極端な差によ
る歪により化学ニツケルメツキ層が割れて、半田
のなじみ不良や変色、シミ等の不良が発生すると
いう問題点がある。 Conventionally, as shown in FIGS. 3 and 4, after the lead wires 6 are hermetically and insulatively sealed inside the metal outer ring 4 through the glass 5, the surfaces of the metal outer ring 4 and the lead wires 6 are sealed. Since the nickel plating layers 7 and 8 and the gold plating layers 9 and 10 were formed, the following problem occurred. That is, when forming the nickel plating layers 7 and 8 by electroplating, the metal outer ring 4 and the lead wire 6 are insulated via the glass 5, so in order to plate both, they must be wire-bound. It is necessary to keep the wires at the same potential due to various methods, and the work of tying and removing wires is extremely complicated. Further, when barrel plating is carried out, there are problems in that the lead wire 6 is bent and the glass 5 is cracked. On the other hand, if the nickel plating layers 7 and 8 are formed by a chemical plating method, there is no need to perform wire binding work to bring the metal outer ring 4 and the lead wire 6 to the same potential.
The plating work is extremely easy, but if chemical nickel plating is applied directly onto the metal outer ring 4 and the lead wire 6, it is possible to braze this airtight terminal or to braze other items onto the airtight terminal during the heating process. The chemical nickel plating layer is hardened and its linear expansion coefficient is
130×10 -7 /℃, which is chemically distorted due to the extreme difference in linear expansion coefficient (47×10 -7 /℃) of the iron-nickel-cobalt alloy that makes up the metal outer ring 4 and the lead wire 6. There is a problem in that the nickel plating layer cracks, causing defects such as poor solder adhesion, discoloration, and stains.
そのため、この発明の主な目的は、下地ニツケ
ルメツキ層の形成が容易でしかも割れを生じな
い、金メツキ層を有する気密端子の製造方法を提
供することである。 Therefore, the main object of the present invention is to provide a method for manufacturing an airtight terminal having a gold plating layer, in which the underlying nickel plating layer can be easily formed and does not cause cracks.
この発明の上記の目的およびその他の目的と特
徴は、図面を参照して行なう以下の詳細な説明か
ら一層明らかとなろう。 The above objects and other objects and features of the present invention will become more apparent from the following detailed description with reference to the drawings.
第5図はこの発明の一実施例方法を説明するた
めの工程ブロツク図を示し、第6図は上記方法に
よつて製造した気密端子の要部拡大断面図を示
す。第6図において、第4図と同一部分には同一
参照符号を付している。まず、42合金(Fe58%、
Ni42%)よりなる金属外環4および鉄・ニツケ
ル・コバルト合金(Fe53%、Ni28%、Co18%)
よりなるリード線6の全面に1.5〜8μm程度の電
気ニツケルメツキ層9,10を形成し、前記金属
外環4内にホウケイ酸ガラス5を介してリード線
6を気密絶縁的に封着したのち、金属外環4およ
びリード線6の表面に厚さが0.2〜2.0μm程度の
金メツキ層11,12を形成する。 FIG. 5 shows a process block diagram for explaining a method according to an embodiment of the present invention, and FIG. 6 shows an enlarged cross-sectional view of a main part of a hermetic terminal manufactured by the above method. In FIG. 6, the same parts as in FIG. 4 are given the same reference numerals. First, 42 alloy (Fe58%,
Metal outer ring 4 consisting of Ni42%) and iron-nickel-cobalt alloy (Fe53%, Ni28%, Co18%)
Electric nickel plating layers 9 and 10 of about 1.5 to 8 μm are formed on the entire surface of the lead wire 6, and the lead wire 6 is hermetically and insulatively sealed inside the metal outer ring 4 via the borosilicate glass 5. Gold plating layers 11 and 12 having a thickness of about 0.2 to 2.0 μm are formed on the surfaces of the metal outer ring 4 and the lead wires 6.
上記の製造方法によれば、封着前に金属外環4
とリード線6を単体で電気ニツケルメツキ層9,
10を形成するので、バレルメツキ法を利用して
簡単にメツキでき、封着後に電気ニツケルメツキ
層7,8を形成する場合に比較して、金属外環4
とリード線6とを同電位にするための線縛が不要
であるのみならず、リード線6の折れ曲りやガラ
スクラツクも発生しない。また化学ニツケルメツ
キ層を形成する場合に比較して、後の加熱によつ
て硬度が増し金属外環4およびリード線6とニツ
ケルメツキ層との線膨脹係数差による応力でニツ
ケルメツキ層に割れが発生することもない。 According to the above manufacturing method, the metal outer ring 4 is
and the lead wire 6 as a single electric nickel plating layer 9,
10, it can be easily plated using the barrel plating method, and compared to the case where the electric nickel plating layers 7 and 8 are formed after sealing, the metal outer ring 4
Not only is there no need for wire binding to bring the lead wire 6 and the lead wire 6 to the same potential, but there is also no bending of the lead wire 6 or glass cracking. In addition, compared to the case where a chemical nickel plating layer is formed, the hardness increases due to subsequent heating, and cracks may occur in the nickel plating layer due to stress due to the difference in linear expansion coefficient between the metal outer ring 4 and lead wire 6 and the nickel plating layer. Nor.
なお、上記実施例は説明の便宜上単純なフラン
ジ付き円筒状の金属外環4内に単一のリード線6
を封着する場合について説明したが、円筒状の金
属外環4内に複数のリード線6を封着するように
してもよいし、あるいは半導体装置用ステムにお
けるステム基板のように、平板状の金属外環に複
数の透孔を穿設して、これら各透孔にそれぞれ1
本または複数本のリード線を封着するようにして
もよい。 In the above embodiment, for convenience of explanation, a single lead wire 6 is placed inside a simple flanged cylindrical metal outer ring 4.
Although we have described the case where a plurality of lead wires 6 are sealed within the cylindrical metal outer ring 4, it is also possible to seal a plurality of lead wires 6 in a cylindrical metal outer ring 4, or to seal a flat plate like a stem substrate in a stem for a semiconductor device. A plurality of through holes are drilled in the metal outer ring, and one hole is inserted into each of these through holes.
A book or a plurality of lead wires may be sealed.
また、上記実施例では金属外環4を特定の組成
の鉄・ニツケル合金で構成する場合について説明
したが、450℃以下の温度範囲における線膨脹係
数が75×10-7/℃以下の材料よりなる金属外環お
よびリード線においては同様の問題が生じるの
で、この発明を適用することができる。 Furthermore, in the above embodiment, the case where the metal outer ring 4 is made of an iron-nickel alloy with a specific composition has been explained, but it may be made of a material with a linear expansion coefficient of 75×10 -7 /°C or less in a temperature range of 450°C or less. Similar problems occur in metal outer rings and lead wires, so this invention can be applied.
この発明は以上のように、450℃以下の温度範
囲における線膨脹係数が75×10-7/℃以下の材料
よりなる金属外環およびリード線に電気ニツケル
メツキ層を形成する工程と、前記金属外環内にホ
ウケイ酸ガラスを介して前記リード線を気密絶縁
的に封着する工程と、前記金属外環およびリード
線の表面に金メツキ層を形成する工程とを含むも
のであるから、下地ニツケルメツキ層を線縛作業
を必要としないで容易に形成でき、リード線の折
れ曲りやガラスのクラツクも発生せず、しかも後
工程で加熱しても化学ニツケルメツキ層のように
硬度が増大して割れることもない、金メツキ層を
有する気密端子が得られるという効果を奏する。 As described above, the present invention includes a step of forming an electric nickel plating layer on a metal outer ring and a lead wire made of a material having a linear expansion coefficient of 75×10 -7 /°C or less in a temperature range of 450°C or less, and Since the method includes the steps of hermetically and insulatively sealing the lead wire inside the ring via borosilicate glass, and the step of forming a gold plating layer on the surface of the metal outer ring and the lead wire, the base nickel plating layer is It can be easily formed without the need for wire binding work, does not cause bending of lead wires or cracking of the glass, and does not increase in hardness and break like chemical nickel plating layers even when heated in the post-process. , it is possible to obtain an airtight terminal having a gold plating layer.
第1図は典型的な気密端子の断面図、第2図は
この発明の背景となる気密端子の断面図、第3図
はこの発明に先行する気密端子の製造方法を説明
するための工程ブロツク図、第4図はその方法に
よつて製造された気密端子の要部拡大断面図、第
5図はこの発明の一実施例方法を説明するための
工程ブロツク図、第6図はその方法によつて製造
された気密端子の要部拡大断面図である。
4……金属外環、5……ガラス、6……リード
線、9,10……電気ニツケルメツキ層、11,
12……金メツキ層。
Fig. 1 is a sectional view of a typical airtight terminal, Fig. 2 is a sectional view of an airtight terminal which is the background of this invention, and Fig. 3 is a process block diagram for explaining a method of manufacturing an airtight terminal prior to this invention. 4 is an enlarged sectional view of the main part of an airtight terminal manufactured by the method, FIG. 5 is a process block diagram for explaining one embodiment of the method of the present invention, and FIG. 6 is a diagram illustrating the method. FIG. 3 is an enlarged cross-sectional view of the main part of the airtight terminal thus manufactured. 4...Metal outer ring, 5...Glass, 6...Lead wire, 9, 10...Electric nickel plating layer, 11,
12...Gold plating layer.
Claims (1)
75×10-7/℃以下の材料よりなる金属外環および
鉄・ニツケル・コバルト合金よりなるリード線に
電気ニツケルメツキ層を形成する工程と、これら
金属外環とリード線とをホウケイ酸ガラスを介し
て気密絶縁的に封着する工程と、前記金属外環お
よびリード線に金メツキ層を形成する工程とを含
むことを特徴とする気密端子の製造方法。1 The coefficient of linear expansion in the temperature range below 450℃ is
A process of forming an electric nickel plating layer on a metal outer ring made of a material with a temperature of 75×10 -7 /℃ or less and a lead wire made of an iron-nickel-cobalt alloy, and bonding these metal outer rings and the lead wire through borosilicate glass. A method for manufacturing an airtight terminal, comprising the steps of: hermetically and insulatively sealing the metal outer ring and the lead wire; and forming a gold plating layer on the metal outer ring and the lead wire.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56097072A JPS57211255A (en) | 1981-06-22 | 1981-06-22 | Manufacture of airtight terminal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56097072A JPS57211255A (en) | 1981-06-22 | 1981-06-22 | Manufacture of airtight terminal |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57211255A JPS57211255A (en) | 1982-12-25 |
| JPS6349902B2 true JPS6349902B2 (en) | 1988-10-06 |
Family
ID=14182432
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56097072A Granted JPS57211255A (en) | 1981-06-22 | 1981-06-22 | Manufacture of airtight terminal |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57211255A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102006036100B3 (en) | 2006-08-02 | 2008-01-24 | Zitzmann, Heinrich, Dr. | Temperature measuring sensor manufacturing method, involves immersing section of connecting wire made of non noble metal in multiple baths and immersing air measuring probe partially or completely into boiling gold plating bath |
| JP6217226B2 (en) * | 2013-08-09 | 2017-10-25 | 日立金属株式会社 | Thermal mass flow meter, mass flow controller, and thermal mass flow meter manufacturing method |
| US12349300B2 (en) | 2019-09-30 | 2025-07-01 | Kuwana Metals, Ltd. | Airtight connection unit, airtight connection assembly, airtight container and vaporizer, as well as production method of airtight connection assembly |
-
1981
- 1981-06-22 JP JP56097072A patent/JPS57211255A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57211255A (en) | 1982-12-25 |
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