JPS6349920B2 - - Google Patents
Info
- Publication number
- JPS6349920B2 JPS6349920B2 JP56113030A JP11303081A JPS6349920B2 JP S6349920 B2 JPS6349920 B2 JP S6349920B2 JP 56113030 A JP56113030 A JP 56113030A JP 11303081 A JP11303081 A JP 11303081A JP S6349920 B2 JPS6349920 B2 JP S6349920B2
- Authority
- JP
- Japan
- Prior art keywords
- adhesive
- powder
- circuit board
- adhesive layer
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Adhesives Or Adhesive Processes (AREA)
- Insulated Metal Substrates For Printed Circuits (AREA)
- Laminated Bodies (AREA)
Description
(産業上の利用分野)
本発明は混成集積回路用基板、特に熱放散性に
すぐれた混成集積回路用基板に関する。
(従来の技術)
従来からアルミニウム、鉄、鉄−ニツケル合金
等の金属基板上に厚さ数十μのエポキシ樹脂等の
有機系高分子化合物からなる接着剤層を設け、そ
の上に銅箔等の導電性金属箔を貼着させた混成集
積回路用基板が知られており、また実公昭46−
25756号公報および特開昭56−62388号公報には絶
縁性で良熱伝導性の粉末をそれぞれ60重量%以下
および60〜80重量%含有する接着剤層に導電性金
属薄層を設けた混成集積回路用基板が提案されて
いる。しかしながらこのような回路用基板では末
だ充分な熱放散性が得られず、高電力集積回路の
高密度化を妨げる原因となつている。
(発明が解決しようとする課題)
本発明はこれらの欠点を解決することを目的と
するもので、混成集積回路用基板において、絶縁
性でかつ良熱伝導性の粉末を60〜65容積%含有
し、さらにこれにカツプリング剤を含有した接着
剤を金属基板と導電性金属薄層の間に介在させる
ことにより、十分な接着強度を有し、かつ熱伝導
性も従来の金属基板よりもすぐれた混成集積回路
用基板を提供しようとするものである。
(課題を解決するための手段)
すなわち、本発明は、金属基板と、該金属基板
の少なくとも一主面上に設けられた接着剤層と該
接着剤層上に設けられた導電性金属薄層より成る
混成集積回路用基板において、その接着剤層が酸
化アルミニウム(以下Al2O3という)60〜65容積
%とシラン系カツプリング剤および/またはチタ
ネート系カツプリング剤とを含有してなる接着剤
であることを特徴とする。
以下図面に従つて本発明の実施例を説明する。
まず図面に示すように本発明の混成集積回路用基
板は、アルミニウム、鉄、鉄−ニツケル合金等か
ら成る金属基板1とこの基板上に設けられた絶縁
性を有し、しかも熱伝導性にすぐれたAl2O3粉末
2を60〜65容積%とカツプリング剤とを含有した
接着剤層3とこの接着剤層上に設けられた例えば
銅箔から成る導電性金属薄層4より構成したもの
である。
本発明の混成集積回路用基板(以下回路用基板
という)の接着剤層に使用するAl2O3粉末2は平
均粒径0.2〜50μ、比抵抗1010Ω・cm以上、熱伝導
率0.05cal/cmsec℃以上である。
Al2O3粉末の平均粒径が0.2μ未満の粉末では接
着剤がチクソトロピツクな性質を示すものとな
り、これを用いた接着剤樹脂層はボイドが発生し
易くなり、絶縁層の耐電圧が取れなくなること、
また、接着剤の粘性が著しく高くなるため、これ
を金属板上にコートする場合には溶剤を多量に使
用しなければならず、その残溶剤が耐電圧の問題
を発生させることから好ましくない。また、一方
50μをこえる粉末では絶縁層の厚さが大となり熱
抵抗が増大する。また比抵抗を上記のようにした
のは、比抵抗が1010Ωcm未満であると絶縁性に乏
しくなるからである。
また、本発明の回路用基板に係る接着剤は、耐
熱性耐薬品性、耐湿性かつ可撓性などの良いもの
で、具体例としてはフエノール樹脂、エポキシ樹
脂、フエノール・ブチラール樹脂、シリコン樹
脂、ポリイミド樹脂などがあげられ、これらを1
種以上併用することができる。
本発明の回路用基板の接着剤層として用いる接
着剤は、60容積%以上のAl2O3粉末の充填を容易
ならしめ、かつ接着面を活性化させるための添加
剤として、カツプリング剤、具体例としては、シ
ラン系カツプリング剤および/またはチタネート
系カツプリング剤及び各種プライマー具体例とし
ては、カルボン酸アルコールプライマー、リン酸
系プライマー等を使用する。これらの添加剤の内
で、特にカツプリング剤がない場合には、本発明
に示す粉末の高充填は、実際上不可能に近いばか
りでなく、接着剤としての接着強度が十分に出な
い。これらの添加剤は、Al2O3粉末の表面に付着
させて用いるか、もしくは接着剤の製造時に、
Al2O3粉末を添加して分散させる際に同時に投入
して用いることが出来る。本発明者の実験によれ
ば0.5容量%のシランカツプリング剤を含有する
Al2O3粉末高充填接着剤は、無添加の場合に比較
して約1.5〜2倍アルミニウムへの接着力が向上
し、その引張剪断時の接着強度は150〜200Kg/cm2
であつた。なおこれらの添加剤は、接着剤に
Al2O3粉末を高充填する程、無添加の場合との
(物理的及び物性的)差が著しくなり、Al2O3粉
末表面に薄く均一に表面処理する必要が生じてく
る。
本発明の回路用基板に用いるAl2O3粉末高充填
接着剤は、前記の各種添加剤を加えて製造するが
高充填するAl2O3粉末の接着剤中での粒度及び分
布が高充填するためには重要である。すなわちこ
れらAl2O3粉末は粒度が小さい程、2次的に凝集
し易く、本発明に用いることが出来る粒度の範囲
でも2次的凝集しているので、適当な条件でこの
2次的凝集を解いてAl2O3粉末を接着剤中に均一
分散させねばならない。このことが達成できない
限り本発明に示した60〜65容積%という量の
Al2O3粉末を高充填し、かつ本発明に言う金属基
板上へのAl2O3粉末高充填接着剤の均一な薄層状
態での塗布が出来ない。例えば本発明者の高シエ
ア機械分散機を用いる場合、分散の条件が悪い時
には、たとえ50μ以下の粒径のAl2O3粉末を用い
たとしても、つぶゲージでは100μ以上の粒子の
存在が認められるが、最適シエアで分散した場合
では100μ以上の粒子の存在は認められず、アル
ミニウム基板上に厚さ60μの均一な塗布面を有す
る接着剤樹脂層の形成が可能であつた。さらに
Al2O3粉末を高充填する場合にはAl2O3粉末の粒
度分布が広いことが必要であり、これにより粘度
上昇を低く抑えられる。
本発明の回路用基板の接着剤層に用いる接着剤
中の硬化剤としては、芳香族アミン系が好まし
く、脂肪族アミン系硬化剤では得られない高い熱
変形温度と良好な接着性を有する硬化接着剤層が
得られ、その熱伝導性も高い。従つて高耐熱と高
熱伝導基板には最適である。この硬化剤と熱伝導
性の関係は一見関係のない事項の様に考えられる
が本発明の様にAl2O3粉末を高充填した場合には
硬化剤によつて硬化物の架橋密度が異なるため、
熱伝導性に影響を与えるものと考えられる。
(実施例)
実施例及び比較例
ビスフエノールA型液状エポキシ樹脂に前記の
添加剤で表面処理した平均粒径1.6μと平均粒径
30μのAl2O3粉末の重量比1:1の混合物と芳香
族アミン系硬化剤とを高シエアー機械的分散機に
より混錬し、その硬化物の熱伝導率を測定し表1
に示した。次にその高熱伝導性接着剤を研摩した
厚さ2mmのアルミニウム基板に、50μの膜厚にな
る様に塗布した。この基板を加熱してBステージ
にした後熱ロールにて35μの裏面処理した銅箔を
張り合せて、そのピール強度と貫層耐電圧とをそ
れぞれJISC−6481およびJISC−2110に準じて測
定した。その結果を表2に示す。
(Industrial Application Field) The present invention relates to a hybrid integrated circuit board, and particularly to a hybrid integrated circuit board having excellent heat dissipation properties. (Prior art) Conventionally, an adhesive layer made of an organic polymer compound such as an epoxy resin with a thickness of several tens of micrometers is provided on a metal substrate such as aluminum, iron, or iron-nickel alloy, and then copper foil, etc. A hybrid integrated circuit board to which conductive metal foil is attached is known;
No. 25756 and JP-A No. 56-62388 disclose composite materials in which a conductive metal thin layer is provided on an adhesive layer containing 60% by weight or less and 60 to 80% by weight of insulating and thermally conductive powder, respectively. Substrates for integrated circuits have been proposed. However, such circuit boards still do not provide sufficient heat dissipation, which is a hindrance to increasing the density of high-power integrated circuits. (Problems to be Solved by the Invention) The purpose of the present invention is to solve these drawbacks, and is to provide a hybrid integrated circuit board containing 60 to 65 volume % of insulating and thermally conductive powder. Furthermore, by interposing an adhesive containing a coupling agent between the metal substrate and the conductive metal thin layer, it has sufficient adhesive strength and has better thermal conductivity than conventional metal substrates. The present invention aims to provide a substrate for hybrid integrated circuits. (Means for Solving the Problems) That is, the present invention provides a metal substrate, an adhesive layer provided on at least one main surface of the metal substrate, and a conductive metal thin layer provided on the adhesive layer. A hybrid integrated circuit board comprising an adhesive layer containing 60 to 65% by volume of aluminum oxide (hereinafter referred to as Al 2 O 3 ) and a silane coupling agent and/or a titanate coupling agent. characterized by something. Embodiments of the present invention will be described below with reference to the drawings.
First, as shown in the drawings, the hybrid integrated circuit board of the present invention has a metal substrate 1 made of aluminum, iron, iron-nickel alloy, etc., and has an insulating property and excellent thermal conductivity provided on this substrate. It is composed of an adhesive layer 3 containing 60 to 65% by volume of Al 2 O 3 powder 2 and a coupling agent, and a conductive metal thin layer 4 made of, for example, copper foil provided on this adhesive layer. be. The Al 2 O 3 powder 2 used for the adhesive layer of the hybrid integrated circuit board (hereinafter referred to as circuit board) of the present invention has an average particle size of 0.2 to 50 μ, a specific resistance of 10 to 10 Ω·cm or more, and a thermal conductivity of 0.05 cal. /cmsec℃ or higher. If the average particle size of the Al 2 O 3 powder is less than 0.2μ, the adhesive will exhibit thixotropic properties, and the adhesive resin layer using this powder will be prone to voids, and the withstand voltage of the insulating layer will be reduced. to disappear,
Furthermore, since the viscosity of the adhesive becomes extremely high, a large amount of solvent must be used when coating a metal plate with the adhesive, which is not preferable because the residual solvent causes problems with withstand voltage. Also, on the other hand
If the powder exceeds 50μ, the thickness of the insulating layer becomes large and the thermal resistance increases. The reason why the specific resistance is set as above is because if the specific resistance is less than 10 10 Ωcm, the insulation property will be poor. Further, the adhesive for the circuit board of the present invention has good heat resistance, chemical resistance, moisture resistance, and flexibility, and specific examples include phenol resin, epoxy resin, phenol-butyral resin, silicone resin, Examples include polyimide resin, and these
More than one species can be used together. The adhesive used as the adhesive layer of the circuit board of the present invention facilitates the filling of 60% by volume or more of Al 2 O 3 powder, and also contains a coupling agent, concrete, etc. as an additive for activating the adhesive surface. For example, a silane coupling agent and/or a titanate coupling agent and various primers include a carboxylic acid alcohol primer, a phosphoric acid primer, and the like. Among these additives, especially in the absence of a coupling agent, it is practically impossible to achieve the high powder filling according to the present invention, and the adhesive strength as an adhesive is not sufficient. These additives can be used by attaching them to the surface of Al 2 O 3 powder, or they can be used during the production of adhesives.
It can be added and used at the same time when adding and dispersing Al 2 O 3 powder. According to the inventor's experiments, it contains 0.5% by volume of silane coupling agent.
The adhesive with high Al 2 O 3 powder filling has improved adhesion to aluminum by approximately 1.5 to 2 times compared to the case without additives, and its adhesive strength in tensile shear is 150 to 200 Kg/cm 2
It was hot. Please note that these additives are used in adhesives.
The higher the filling of Al 2 O 3 powder, the more significant the difference (physical and physical properties) from the case without additives becomes, and it becomes necessary to perform a thin and uniform surface treatment on the surface of the Al 2 O 3 powder. The highly filled Al 2 O 3 powder adhesive used in the circuit board of the present invention is manufactured by adding the various additives described above, but the particle size and distribution of the highly filled Al 2 O 3 powder in the adhesive are It is important to do so. In other words, the smaller the particle size of these Al 2 O 3 powders, the more likely they are to cause secondary agglomeration, and even within the particle size range that can be used in the present invention, secondary agglomeration occurs. must be solved to uniformly disperse the Al 2 O 3 powder into the adhesive. Unless this can be achieved, the amount of 60-65% by volume indicated in the present invention
It is not possible to coat the adhesive with high Al 2 O 3 powder filling on the metal substrate referred to in the present invention in a uniform thin layer state. For example, when using the inventor's high shear mechanical dispersion machine, if the dispersion conditions are poor, even if Al 2 O 3 powder with a particle size of 50μ or less is used, the presence of particles larger than 100μ can be detected by the crush gauge. However, when dispersed at the optimum shear, no particles larger than 100μ were observed, and it was possible to form an adhesive resin layer with a uniform coating surface of 60μ in thickness on the aluminum substrate. moreover
When highly loaded with Al 2 O 3 powder, it is necessary that the particle size distribution of the Al 2 O 3 powder is wide, thereby suppressing the increase in viscosity. The curing agent in the adhesive used in the adhesive layer of the circuit board of the present invention is preferably an aromatic amine type curing agent, which has a high heat distortion temperature and good adhesion that cannot be obtained with an aliphatic amine type curing agent. An adhesive layer is obtained whose thermal conductivity is also high. Therefore, it is ideal for high heat resistance and high heat conduction substrates. At first glance, the relationship between the curing agent and thermal conductivity may seem unrelated, but when the Al 2 O 3 powder is highly loaded as in the present invention, the crosslinking density of the cured product differs depending on the curing agent. For,
This is thought to affect thermal conductivity. (Example) Example and Comparative Example Average particle size of 1.6μ and average particle size of bisphenol A type liquid epoxy resin surface treated with the above additive
A mixture of 30μ Al 2 O 3 powder at a weight ratio of 1:1 and an aromatic amine curing agent were kneaded using a high shear mechanical disperser, and the thermal conductivity of the cured product was measured.
It was shown to. Next, the highly thermally conductive adhesive was applied to a polished 2 mm thick aluminum substrate to a film thickness of 50 μm. After heating this substrate to the B stage, a 35μ back-treated copper foil was laminated using a hot roll, and its peel strength and through-layer withstand voltage were measured according to JISC-6481 and JISC-2110, respectively. . The results are shown in Table 2.
【表】【table】
【表】
この様に容積で60%以下であると熱放散性が充
分でなく、65%を越えるとボイド発生のため耐電
圧が低下し、また接着強度も低下している。
(発明の効果)
以上、本発明によれば熱放散性が良好でかつ耐
電圧の高い混成集積回路用基板が得られ、高密度
実装が行なうことができる。[Table] As shown above, when the volume is less than 60%, heat dissipation is insufficient, and when it exceeds 65%, the withstand voltage decreases due to the generation of voids, and the adhesive strength also decreases. (Effects of the Invention) As described above, according to the present invention, a hybrid integrated circuit board having good heat dissipation properties and high withstand voltage can be obtained, and high-density packaging can be performed.
図面は本発明の実施例の断面図である。
符号、1……金属基板、2……Al2O3粉末、3
……接着剤層、4……金属薄層。
The drawings are cross-sectional views of embodiments of the invention. Code, 1... Metal substrate, 2... Al 2 O 3 powder, 3
...adhesive layer, 4...metal thin layer.
Claims (1)
に設けられた接着剤層と該接着剤層上に設けた導
電性金属薄層より成る混成集積回路用基板におい
て、前記接着剤層が酸化アルミニウム60〜65容積
%とシラン系カツプリング剤および/またはチタ
ネート系カツプリング剤とを含有してなる接着剤
であることを特徴とする混成集積回路用基板。1. In a hybrid integrated circuit board comprising a metal substrate, an adhesive layer provided on at least one main surface of the metal substrate, and a conductive metal thin layer provided on the adhesive layer, the adhesive layer is oxidized. 1. A board for a hybrid integrated circuit, characterized in that it is an adhesive comprising 60 to 65% by volume of aluminum and a silane coupling agent and/or a titanate coupling agent.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11303081A JPS5815290A (en) | 1981-07-21 | 1981-07-21 | Board for hybrid integrated circuit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11303081A JPS5815290A (en) | 1981-07-21 | 1981-07-21 | Board for hybrid integrated circuit |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5815290A JPS5815290A (en) | 1983-01-28 |
| JPS6349920B2 true JPS6349920B2 (en) | 1988-10-06 |
Family
ID=14601685
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11303081A Granted JPS5815290A (en) | 1981-07-21 | 1981-07-21 | Board for hybrid integrated circuit |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5815290A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6450592A (en) * | 1987-08-21 | 1989-02-27 | Shinko Chem | Super-heat dissipation type composite circuit board |
| TW201211123A (en) | 2010-03-24 | 2012-03-16 | Sumitomo Chemical Co | Liquid composition and metal base circuit substrate |
| JP5487010B2 (en) * | 2010-05-27 | 2014-05-07 | 日本発條株式会社 | Circuit board laminate and metal base circuit board |
-
1981
- 1981-07-21 JP JP11303081A patent/JPS5815290A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5815290A (en) | 1983-01-28 |
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