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JPS6351062B2 - - Google Patents
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JPS6351062B2 - - Google Patents

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Publication number
JPS6351062B2
JPS6351062B2 JP23654583A JP23654583A JPS6351062B2 JP S6351062 B2 JPS6351062 B2 JP S6351062B2 JP 23654583 A JP23654583 A JP 23654583A JP 23654583 A JP23654583 A JP 23654583A JP S6351062 B2 JPS6351062 B2 JP S6351062B2
Authority
JP
Japan
Prior art keywords
plasma
injection
port
introduction
processing apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP23654583A
Other languages
Japanese (ja)
Other versions
JPS60129157A (en
Inventor
Yasuhiko Ogisu
Katsuhide Manabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyoda Gosei Co Ltd
Original Assignee
Toyoda Gosei Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyoda Gosei Co Ltd filed Critical Toyoda Gosei Co Ltd
Priority to JP23654583A priority Critical patent/JPS60129157A/en
Publication of JPS60129157A publication Critical patent/JPS60129157A/en
Publication of JPS6351062B2 publication Critical patent/JPS6351062B2/ja
Granted legal-status Critical Current

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  • Nozzles (AREA)

Description

【発明の詳細な説明】 技術分野 この発明は合成樹脂製のバンパー等の被塗装品
の被処理表面にプラズマ処理を施すためのプラズ
マ処理装置に関するものである。
DETAILED DESCRIPTION OF THE INVENTION TECHNICAL FIELD The present invention relates to a plasma treatment apparatus for applying plasma treatment to the surface of an object to be painted, such as a synthetic resin bumper.

従来技術 従来、この種のプラズマ処理装置としては、密
閉された収容室内にポリプロピレン等からなる自
動車部品の合成樹脂製バンパーを層状に並列配置
するとともに、プラズマ噴射管を収容し、バンパ
ーの被処理表面に塗料を付着し易くするために、
その噴射管から酸素等のプラズマガスをバンパー
の被処理表面に噴射してバンパーの被処理表面を
活性化していた。
Conventional technology Conventionally, this type of plasma processing apparatus has arranged synthetic resin bumpers of automobile parts made of polypropylene etc. in a layered parallel arrangement in a sealed storage chamber, housed a plasma injection tube, To make it easier for paint to adhere to
Plasma gas such as oxygen was injected from the injection tube onto the surface of the bumper to be treated, thereby activating the surface of the bumper to be treated.

ところが、この従来装置においては、噴射管の
中央にプラズマ導入口が設けられるとともに、噴
射管の両側外周に一定の内径を有する噴射口が等
間隔をおいて配設されているため、プラズマ導入
口から離れるにつれて、各噴射口から噴射される
プラズマガスの量が減少し、多数のバンパーに対
してプラズマガスを均一に噴射することができな
いという欠陥があつた。さらに、プラズマ排出口
が収容室の一側壁に設けられた従来装置において
は、その排出口に向かうプラズマガス流の偏りが
生じ、バンパー表面が均一に活性化されないとい
う問題があつた。
However, in this conventional device, the plasma introduction port is provided in the center of the injection tube, and injection ports with a constant inner diameter are arranged at equal intervals on both sides of the injection tube, so the plasma introduction port There was a problem in that the amount of plasma gas injected from each injection port decreased as the distance from the bumper increased, making it impossible to uniformly inject plasma gas to a large number of bumpers. Further, in the conventional device in which the plasma exhaust port is provided on one side wall of the storage chamber, there is a problem that the plasma gas flow toward the exhaust port is biased, and the bumper surface is not uniformly activated.

発明の目的 この発明は上記の欠陥を解消するためになされ
たものであつて、その目的は、バンパー等の被塗
装品の被処理表面を均一にプラズマ処理すること
ができる新規なプラズマ処理を提供することにあ
る。
Purpose of the Invention The present invention was made to eliminate the above-mentioned defects, and its purpose is to provide a new plasma treatment that can uniformly plasma-treat the surface of an article to be painted such as a bumper. It's about doing.

発明の構成 上記の目的を達成するためにこの発明において
は、プラズマ噴射管のほぼ中央に合成樹脂製の被
塗装品を収容する収容室と、その収容室内にプラ
ズマを導入する導入管と、収容室内における前記
導入管に接続される導入口と、前記導入管から導
入されたプラズマを前記被塗装品の被処理表面に
噴射するための噴射口を有するプラズマ噴射管
と、前記収容室内のプラズマを排出するために同
収容室に設けた排出口とを備えたプラズマ処理装
置において、前記プラズマ噴射管を被塗装品の被
処理表面とほぼ並列させて収容室内に設け、プラ
ズマ噴射管の外周面に前記噴射口を前記被処理表
面に向けて多数個設けるとともに、プラズマ噴射
管単位長さ当りの噴射口の開口面積を前記導入口
から端部に向かつて漸増させている。そして、こ
のプラズマ噴射管単位長さ当りの噴射口の開口面
積を前記導入口から端部に向かつて漸増させるた
めには、噴射口を前記導入口から端部に向かつて
その配置間隔が漸減するように設ける構成や、噴
射口を前記導入口から端部に向かつてその内径が
漸増するように設ける構成や、さらにはこれらを
組み合わせた構成を採用することができる。
Structure of the Invention In order to achieve the above object, the present invention includes a storage chamber for accommodating a synthetic resin article to be coated approximately in the center of the plasma injection tube, an introduction pipe for introducing plasma into the storage chamber, a plasma injection tube having an introduction port connected to the introduction pipe in the chamber, and a injection port for injecting the plasma introduced from the introduction pipe onto the surface to be treated of the article to be coated; In a plasma processing apparatus equipped with an exhaust port provided in the storage chamber for discharging the plasma, the plasma injection tube is provided in the storage chamber almost parallel to the surface to be treated of the article to be coated, and the plasma injection tube is provided on the outer circumferential surface of the plasma injection tube. A large number of the injection ports are provided toward the surface to be treated, and the opening area of the injection ports per unit length of the plasma injection tube is gradually increased from the introduction port toward the end. In order to gradually increase the opening area of the injection ports per unit length of the plasma injection tube from the introduction port toward the end, the arrangement interval between the injection ports gradually decreases as you move from the introduction port toward the end. It is possible to adopt a configuration in which the injection port is provided as shown in FIG.

実施例 以下、この発明を具体化した一実施例を第1図
〜第6図に従つて説明する。プラズマ処理装置の
気密状の収容室を構成する本体1は中空円筒状に
形成され、その左側壁には収容室を開閉し得る扉
(図示しない)が設けられるとともに、右側壁上
部にはプラズマ排出口2が形成されている。本体
1内には四角枠状のフレーム3が収容され、その
左右両辺部には互いに対向する支柱4が立設され
ている。
Embodiment An embodiment embodying the present invention will be described below with reference to FIGS. 1 to 6. The main body 1 constituting the airtight storage chamber of the plasma processing apparatus is formed into a hollow cylindrical shape, and the left side wall thereof is provided with a door (not shown) that can open and close the storage chamber, and the upper right side wall is provided with a plasma exhaust door. An outlet 2 is formed. A rectangular frame 3 is accommodated within the main body 1, and pillars 4 facing each other are erected on both left and right sides of the frame 3.

両支柱4の上端部間には回転軸5が回転可能に
支持され、その回転軸5の両端には一対の支持円
盤6a,6bが一体回転可能に装着されている。
前記両支持円盤6a,6bの内面間には被塗装
品、たとえばポリプロピレン等の合成樹脂からな
るバンパーBを載置するための6個の支持台7が
所定の角度間隔をおいて配設されている。
A rotary shaft 5 is rotatably supported between the upper ends of both supports 4, and a pair of support disks 6a, 6b are mounted at both ends of the rotary shaft 5 so as to be integrally rotatable.
Between the inner surfaces of both support disks 6a and 6b, six support stands 7 are arranged at predetermined angular intervals on which objects to be painted, for example bumpers B made of synthetic resin such as polypropylene, are placed. There is.

第2図に示すように、各支持台7は金属板にて
折曲形成された一対の支持片8と、両支持片8間
に架設された架設棒9aと、各架設棒9aの各端
部間を連結するように各支持片8の下面に配設さ
れた連結棒9bとから構成され、各支持片8はそ
の上端部において金具10等により各支持円盤6
a,6bに回転可能に支持されている。従つて、
前記回転軸5及び支持円盤6a,6bの回転時及
び静止時において各支持台7は水平位置に保持さ
れる。また、各支持片8の中央切欠部にはプラズ
マガスの通過を許容するためのネツト11が張設
されている。
As shown in FIG. 2, each support stand 7 includes a pair of support pieces 8 formed by bending a metal plate, an erection rod 9a installed between both support pieces 8, and each end of each installation rod 9a. A connecting rod 9b is arranged on the lower surface of each support piece 8 to connect the parts, and each support piece 8 is connected to each support disk 6 by a metal fitting 10 or the like at its upper end.
It is rotatably supported by a and 6b. Therefore,
Each support stand 7 is held in a horizontal position when the rotating shaft 5 and support disks 6a, 6b are rotating and when they are stationary. Further, a net 11 is provided in the central notch of each support piece 8 to allow passage of plasma gas.

第3図に示すように、前記回転軸5の左端部に
は鎖車12が挿嵌されるとともに、前記フレーム
3上には一軸線の回りで回転する鎖車13及び伝
達ギア14が設けられ、両鎖車12,13間には
チエーン15が掛装されるとともに、前記伝達ギ
ア14には図示しない駆動モータにて回転駆動さ
れる駆動ギア16が噛合されている。
As shown in FIG. 3, a chain wheel 12 is inserted into the left end of the rotating shaft 5, and a chain wheel 13 and a transmission gear 14, which rotate around one axis, are provided on the frame 3. A chain 15 is hung between the chain wheels 12 and 13, and a drive gear 16 that is rotationally driven by a drive motor (not shown) is meshed with the transmission gear 14.

そして、駆動ギア16の回転に伴い、伝達ギア
14、鎖車13、チエーン15及び鎖車12を介
して回転軸5とともに支持円盤6a,6bが回転
される。
As the drive gear 16 rotates, the support disks 6a and 6b are rotated together with the rotating shaft 5 via the transmission gear 14, chain wheel 13, chain 15, and chain wheel 12.

第1図に示すように、前記フレーム3の下方に
おいて本体1内には酸素等のプラズマガスを噴射
するためのステンレス製噴射管17がバンパーB
の被処理表面とほぼ並列するように収容されてい
る。第4図に示すように、噴射管17のほぼ中央
に形成されたプラズマ導入口(図示しない)には
導入管18が接続され、その端部が本体1外のプ
ラズマ供給装置(図示しない)に接続される。
As shown in FIG. 1, below the frame 3, a stainless steel injection pipe 17 for injecting plasma gas such as oxygen is installed in the main body 1 at the bumper B.
is housed so as to be almost parallel to the surface to be treated. As shown in FIG. 4, an introduction tube 18 is connected to a plasma introduction port (not shown) formed approximately in the center of the injection tube 17, and its end is connected to a plasma supply device (not shown) outside the main body 1. Connected.

導入口の両側にて噴射管17の外周面には噴射
管17の端部に向かつて配置間隔が漸減し、かつ
内径が漸増する多数の噴射口19がバンパーBの
被処理表面に向けて設けられている。そして、各
噴射口19は垂直面Sに対して前側へ所定角度θ
1(この実施例では30度)傾斜する方向に開口す
るもの19aと、後側へ所定角度θ2(この実施
例では30度)傾斜する方向へ開口するもの19b
とから構成されている。そして、前側へ傾斜する
噴射口19aと後側へ傾斜する噴射口19bとが
交互に配設されている。また、導入管18より排
出口2側、すなわち右側の噴射口19の数は排出
口2より左側の噴射口19の数より15%だけ少な
く設定されている。
On both sides of the inlet, a large number of injection ports 19 are provided on the outer circumferential surface of the injection pipe 17 toward the surface to be treated of the bumper B, with the arrangement interval gradually decreasing toward the end of the injection pipe 17 and the inner diameter gradually increasing. It is being Each injection port 19 is directed forward at a predetermined angle θ with respect to the vertical plane S.
1 (in this example, 30 degrees) opens in the direction of inclination 19a, and opens in the rear side at a predetermined angle θ2 (in this example, 30 degrees) opens in the direction of inclination 19b
It is composed of. Further, the injection ports 19a that are inclined toward the front side and the injection ports 19b that are inclined toward the rear side are arranged alternately. Further, the number of injection ports 19 on the side of the discharge port 2, that is, on the right side of the introduction pipe 18, is set to be 15% smaller than the number of injection ports 19 on the left side of the discharge port 2.

従つて、本体1内において各支持台7にバンパ
ーBを載置した状態で、駆動モータを作動すれ
ば、駆動ギア16、伝達ギア14、鎖車13、チ
エーン15及び鎖車12を介して回転軸5及び支
持円盤6a,6bが回転されかつバンパーBとと
もに各支持台7がその上端部を中心として各支持
円盤6a,6bに対して相対回動され、各支持円
盤6a,6bの回転中においても各バンパーBが
水平状態に保持される。
Therefore, when the drive motor is operated with the bumper B placed on each support stand 7 in the main body 1, the bumper B rotates through the drive gear 16, transmission gear 14, chain wheel 13, chain 15, and chain wheel 12. The shaft 5 and the support disks 6a, 6b are rotated, and each support stand 7 together with the bumper B is rotated relative to each support disk 6a, 6b around its upper end, and during the rotation of each support disk 6a, 6b. Also, each bumper B is held horizontally.

また、導入管18を介して噴射管17に酵素等
のプラズマガスを導入すれば、各噴射口19から
プラズマガスが噴射される。ところが、この噴射
管17は前記バンパーBの被処理表面と並列して
設けられるとともに、その噴射口19を端部に向
かつて配置間隔が漸減し、かつ内径が漸増するよ
うにしたため、導入管18が接続された中央部に
おいても、前記端部においても、ほぼ一定量のプ
ラズマガスを噴射口19から前記被処理表面に向
かつて噴射することができる。従つて、前記バン
パーBはその被処理表面が均一に活性化され、塗
料の付着性を著しく向上させることができる。
Furthermore, if plasma gas such as enzyme is introduced into the injection tube 17 through the introduction tube 18, the plasma gas is injected from each injection port 19. However, since the injection pipe 17 is provided in parallel with the surface to be treated of the bumper B, and the injection port 19 is directed toward the end, the arrangement interval gradually decreases and the inner diameter gradually increases. A substantially constant amount of plasma gas can be injected toward the surface to be treated from the injection port 19 both at the central portion where the two are connected and at the end portions. Therefore, the treated surface of the bumper B is uniformly activated, and the adhesion of paint can be significantly improved.

さらに、この実施例においては、導入管18よ
り排出口2側、すなわち右側の噴射口19の数が
左側の噴射口19の数より少なく設定されている
ため、前記排出口2に向かうプラズマガス流に偏
りが形成されることはなく、均一な流れにするこ
とができ、バンパーBに対してより一層均一なプ
ラズマ処理を施すことができる。
Furthermore, in this embodiment, the number of injection ports 19 on the discharge port 2 side, that is, on the right side of the inlet pipe 18, is set to be smaller than the number of injection ports 19 on the left side, so that the plasma gas flow toward the discharge port 2 is set to be smaller than the number of injection ports 19 on the left side. There is no deviation in the flow, and a uniform flow can be achieved, making it possible to perform even more uniform plasma treatment on the bumper B.

加えて、従来の噴射管は石英製のものであつた
が、この実施例においては、ステンレス製である
ので、例えば、4フツ化メタン等の腐蝕性ガスを
含む窒素、酸素混合ガスのプラズマを使用するこ
とができるばかりでなく、充分な強度を確保で
き、取付けが容易で安価に製造することができ
る。
In addition, conventional injection tubes are made of quartz, but in this example they are made of stainless steel, so they can be used to generate plasma of nitrogen and oxygen mixed gases containing corrosive gases such as methane tetrafluoride. Not only can it be used, but it can also ensure sufficient strength, be easy to install, and be manufactured at low cost.

発明の効果 以上、詳述したようにこの発明は、合成樹脂製
の被塗装品を収容する収容室と、その収容室内に
プラズマを導入する導入管と、収容室内における
前記導入管に接続される導入口と、前記導入管か
ら導入されたプラズマを前記被塗装品の被処理表
面に噴射するための噴射口を有するプラズマ噴射
管と、前記収容室内のプラズマを排出するために
同収容室に設けた排出口とを備えたプラズマ処理
装置において、プラズマ噴射管を被塗装品の被処
理表面とほぼ並列させて収容室内に設け、プラズ
マ噴射管の外周面に前記噴射口を前記被処理表面
に向けて多数設けるとともに、プラズマ噴射管単
位長さ当りの噴射口の開口面積を前記導入口から
端部に向かつて漸増させたことにより、前記プラ
ズマ噴射管から被塗装品の被処理面に向かつて噴
射されるプラズマをその導入口においても、端部
においても常に一定量とすることができるため、
前記被処理表面を均一にプラズマ処理することが
できるという優れた効果を奏する。
Effects of the Invention As detailed above, the present invention provides a storage chamber for accommodating a synthetic resin article to be coated, an introduction pipe for introducing plasma into the storage chamber, and an inlet pipe connected to the introduction pipe in the storage chamber. a plasma injection tube having an inlet and an injection port for injecting the plasma introduced from the introduction tube onto the surface to be treated of the article to be coated; and a plasma injection tube provided in the accommodation chamber for discharging the plasma in the accommodation chamber. In the plasma processing apparatus, a plasma injection tube is provided in the storage chamber in parallel with the surface to be treated of the article to be coated, and the injection port is directed toward the surface to be treated on the outer peripheral surface of the plasma injection tube. By providing a large number of plasma injection tubes and gradually increasing the opening area of the injection port per unit length of the plasma injection tube from the introduction port toward the end, it is possible to spray the plasma from the plasma injection tube toward the surface of the workpiece to be coated. Since the amount of plasma generated can always be kept constant both at the inlet and at the end,
This provides an excellent effect in that the surface to be treated can be uniformly plasma-treated.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図はこの発明を具体化したプラズマ処理装
置の斜視図、第2図は支持台の一部を示す拡大斜
視図、第3図は部分左側面図、第4図は噴射管の
正面図、第5図は第4図におけるA−A線断面
図、第6図は第4図におけるB−B線断面図であ
る。 噴射管……17、導入管……18、噴射口……
19、バンパー……B。
Fig. 1 is a perspective view of a plasma processing apparatus embodying the present invention, Fig. 2 is an enlarged perspective view showing a part of the support base, Fig. 3 is a partial left side view, and Fig. 4 is a front view of the injection tube. , FIG. 5 is a cross-sectional view taken along the line A--A in FIG. 4, and FIG. 6 is a cross-sectional view taken along the line B--B in FIG. 4. Injection pipe...17, Introduction pipe...18, Injection port...
19. Bumper...B.

Claims (1)

【特許請求の範囲】 1 合成樹脂製の被塗装品を収容する収容室と、
その収容室内にプラズマを導入する導入管と、収
容室内における前記導入管に接続される導入口
と、前記導入管から導入されたプラズマを前記被
塗装品の被処理表面に噴射するための噴射口を有
するプラズマ噴射管と、前記収容室内のプラズマ
を排出するために同収容室に設けた排出口とを備
えたプラズマ処理装置において、 前記プラズマ噴射管17を被塗装品の被処理表
面とほぼ並列させて収容室内に設け、プラズマ噴
射管17の外周面に前記噴射口19を前記被処理
表面に向けて多数個設けるとともに、プラズマ噴
射管17単位長さ当りの噴射口19の開口面積を
前記導入口から端部に向かつて漸増させたことを
特徴とするプラズマ処理装置。 2 前記噴射口19を前記導入口から端部に向か
つてその配置間隔が漸減するように設け、そのこ
とによつてプラプラズマ噴射管17単位長さ当り
の噴射口19の開口面積を前記導入口から端部に
向かつて漸増させたことを特徴とする特許請求の
範囲第1項に記載のプラズマ処理装置。 3 前記噴射口19を前記導入口から端部に向か
つてその内径が漸増するように設け、そのことに
よつてプラプラズマ噴射管17単位長さ当りの噴
射口19の開口面積を前記導入口から端部に向か
つて漸増させたことを特徴とする特許請求の範囲
第1項に記載のプラズマ処理装置。
[Claims] 1. A storage chamber for accommodating a synthetic resin article to be painted;
An introduction pipe for introducing plasma into the storage chamber, an introduction port connected to the introduction pipe in the storage chamber, and an injection port for spraying the plasma introduced from the introduction pipe onto the surface to be treated of the article to be coated. In the plasma processing apparatus, the plasma injection tube 17 is arranged substantially parallel to the surface to be treated of the article to be coated. A large number of injection ports 19 are provided on the outer circumferential surface of the plasma injection tube 17 toward the surface to be treated, and the opening area of the injection ports 19 per unit length of the plasma injection tube 17 is set as described above. A plasma processing device characterized in that the plasma gradually increases from the mouth to the end. 2. The injection ports 19 are arranged so that their arrangement intervals gradually decrease from the introduction port toward the end, thereby reducing the opening area of the injection ports 19 per unit length of the plastic plasma injection pipe 17 to the same amount as the introduction port. 2. The plasma processing apparatus according to claim 1, wherein the plasma processing apparatus gradually increases from the beginning to the end. 3 The injection port 19 is provided so that its inner diameter gradually increases from the introduction port toward the end, thereby increasing the opening area of the injection port 19 per unit length of the plasma injection pipe 17 from the introduction port. 2. The plasma processing apparatus according to claim 1, wherein the plasma processing apparatus increases gradually toward the end.
JP23654583A 1983-12-15 1983-12-15 Plasma treating device Granted JPS60129157A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23654583A JPS60129157A (en) 1983-12-15 1983-12-15 Plasma treating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23654583A JPS60129157A (en) 1983-12-15 1983-12-15 Plasma treating device

Publications (2)

Publication Number Publication Date
JPS60129157A JPS60129157A (en) 1985-07-10
JPS6351062B2 true JPS6351062B2 (en) 1988-10-12

Family

ID=17002251

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23654583A Granted JPS60129157A (en) 1983-12-15 1983-12-15 Plasma treating device

Country Status (1)

Country Link
JP (1) JPS60129157A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0571375U (en) * 1992-02-28 1993-09-28 株式会社栃木屋 Latch with lock mechanism

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010274423A (en) * 2009-05-26 2010-12-09 Hitachi Appliances Inc Home appliance parts, coating methods thereof, and home appliances

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0571375U (en) * 1992-02-28 1993-09-28 株式会社栃木屋 Latch with lock mechanism

Also Published As

Publication number Publication date
JPS60129157A (en) 1985-07-10

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