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JPS635339B2 - - Google Patents
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JPS635339B2 - - Google Patents

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Publication number
JPS635339B2
JPS635339B2 JP7421082A JP7421082A JPS635339B2 JP S635339 B2 JPS635339 B2 JP S635339B2 JP 7421082 A JP7421082 A JP 7421082A JP 7421082 A JP7421082 A JP 7421082A JP S635339 B2 JPS635339 B2 JP S635339B2
Authority
JP
Japan
Prior art keywords
parts
far
enamel
sio
infrared
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP7421082A
Other languages
Japanese (ja)
Other versions
JPS58190838A (en
Inventor
Nobutaka Yugawa
Yasuhiro Hotsuta
Takashi Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Takara Standard Co Ltd
Original Assignee
Takara Standard Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Takara Standard Co Ltd filed Critical Takara Standard Co Ltd
Priority to JP7421082A priority Critical patent/JPS58190838A/en
Publication of JPS58190838A publication Critical patent/JPS58190838A/en
Publication of JPS635339B2 publication Critical patent/JPS635339B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/14Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/14Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions
    • C03C8/20Glass frit mixtures having non-frit additions, e.g. opacifiers, colorants, mill-additions containing titanium compounds; containing zirconium compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Resistance Heating (AREA)
  • Drying Of Solid Materials (AREA)
  • Glass Compositions (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

本発明は、遠赤外線放射のための琺瑯発熱体の
製造方法に関するものである。 従来、塗料の乾燥、木材の水分除去及び電子部
品製造のための予熱、乾燥等に利用されている遠
赤外線放射発熱体の製造方法として、例えば次の
ものがあつた。 ジルコニア系セラミツクを溶融し、それを金
属基体に噴出被着して被膜を作る溶射方法及び
金属基体に先ず、密着力の強い下釉を塗着し、琺
瑯焼付けし、次に遠赤外線の放射率の大きい
ZrO2・SiO2及び他の酸化物を含む上釉を更にそ
の上に塗着し、琺瑯を焼付ける2度焼付け方法等
があつた。 しかしながら、前記のセラミツクの溶射法
は、セラミツク被膜が金属基体から剥離し、クラ
ツクを生じ易い点及び製造コストが高くなる欠点
があつた。又、の琺瑯2度焼付け方法は、2度
の琺瑯焼付けを行なうので、製造工程が煩雑で、
コストも高くなる欠点があつた。 また、前述のようなコスト高のセラミツクや2
度焼成の手間を解消するため、簡便に1度焼成で
目的物を得られる方法として、琺瑯釉薬のベース
となるフリツトの成分比を重量比で、SiO235〜
36%、B2O326〜27%、Na2O18〜19%、Al2O36
〜7%、CaO4〜6%、K2O3〜4%、CaF21〜3
%、MnO21〜2%、NiO0.3〜0.6%、CoO0.3〜
0.6%とし、このフリツト100部に更に添加するミ
ル添加物をZrO2・SiO240部以上、粘土4〜7部、
止め薬0.2〜0.5部、MnO2、Cu2O、FeO3
Al2O3、CoO、NiO、Cr2O3、Fe3O4の一種以上を
2〜5部、水45〜55部とし、泥漿状としたこれら
の配合物を、直接金属基体に塗着し、800℃〜850
℃の所定温度にて一度だけ琺瑯焼付けを行なうこ
とにより遠赤外線放射発熱体を得る方法があつた
(特開昭57−56348号参照)。 本発明は、ミル添加物中のZrO2・SiO240部以
上に代えてカリ長石(K2O・Al2O3・6SiO2)、ペ
タライト(Li2O・Al2O3・8SiO2)、コレマナイト
(2CaO・3B2O3・5H2O)の一種以上又はこれら
とZrO・SiO2とを50部以上加えることとしたもの
であり、以下、実施例に基づいて説明する。 第1表にフリツトの成分比、第2表に琺瑯釉薬
の成分比を夫々示す。 第 1 表 成分名 配合(重量比) SiO2 35〜36% B2O3 26〜27 Na2O 18〜19 Al2O3 6〜7 CaO 4〜6 K2O 3〜4 CaF2 1〜3 MnO2 1〜2 NiO 0.3〜0.6 CoO 0.3〜0.6
The present invention relates to a method of manufacturing an enamel heating element for far-infrared radiation. Conventionally, there have been the following methods for producing far-infrared radiant heating elements, which have been used for drying paint, removing water from wood, preheating and drying for manufacturing electronic parts, and the like. Thermal spraying method of melting zirconia ceramic and spraying it onto a metal base to form a coating.First, a strong adhesive underglaze is applied to the metal base, enamel baking is performed, and then far-infrared emissivity is applied. big
There was a double-baking method in which a top glaze containing ZrO 2 , SiO 2 and other oxides was further applied on top of the glaze, and the enamel was fired. However, the ceramic thermal spraying method described above has the disadvantage that the ceramic coating is likely to peel off from the metal substrate, resulting in cracks, and that the manufacturing cost is high. In addition, the double enamel firing method requires two enamel firings, so the manufacturing process is complicated.
The drawback was that it also increased costs. In addition, as mentioned above, high-cost ceramics and
In order to eliminate the trouble of multiple firings, as a method to easily obtain the desired object with one firing, the component ratio of the frit, which is the base of the enamel glaze, is determined by weight ratio from SiO 2 35 to 35.
36%, B2O3 26-27 % , Na2O18-19 % , Al2O36
~7%, CaO4~6%, K2O3 ~4%, CaF2 1 ~3
%, MnO2 1~2%, NiO0.3~0.6%, CoO0.3~
0.6%, and the mill additives to be added to 100 parts of this frit are 40 parts or more of ZrO 2 /SiO 2 , 4 to 7 parts of clay,
Stopper 0.2-0.5 parts, MnO2 , Cu2O , FeO3 ,
A slurry-like mixture of 2 to 5 parts of one or more of Al 2 O 3 , CoO, NiO, Cr 2 O 3 , and Fe 3 O 4 and 45 to 55 parts of water was applied directly to a metal substrate. and 800℃~850
There is a method of obtaining a far-infrared radiating heating element by performing enamel firing only once at a predetermined temperature of .degree. C. (see Japanese Patent Laid-Open No. 57-56348). The present invention replaces 40 parts or more of ZrO 2 ·SiO 2 in the mill additive with potassium feldspar (K 2 O · Al 2 O 3 · 6SiO 2 ) and petalite (Li 2 O · Al 2 O 3 · 8SiO 2 ). , one or more types of colemanite (2CaO.3B 2 O 3 .5H 2 O) or 50 parts or more of these and ZrO.SiO 2 are added, and will be described below based on Examples. Table 1 shows the component ratio of the frit, and Table 2 shows the component ratio of the enamel glaze. Table 1 Component name Mixture (weight ratio) SiO 2 35-36% B 2 O 3 26-27 Na 2 O 18-19 Al 2 O 3 6-7 CaO 4-6 K 2 O 3-4 CaF 2 1- 3 MnO 2 1~2 NiO 0.3~0.6 CoO 0.3~0.6

【表】 第1表に示すフリツト及び第2表に示すミル添
加物とを泥漿状にして金属基体に塗着し、800〜
850℃で琺瑯焼成を行なえば、琺瑯層中にカリ長
石、ペタライト、コレマナイト或はこれらと
ZrO2・SiO2とが不均質に分散するので、ZrO2
SiO2のみを不均質に分散させた特開昭57−56348
号と同様に遠赤外線の放射に有利である。 次に、本発明の琺瑯発熱体の製造方法の1実施
例を図面を用いて説明する。1は、鉄やステンレ
ス等のパイプから成る金属基体である。該金属基
体1は、密着性向上を期すため脱脂、酸洗い、中
和等の前処理が施される。次に、下記第3表の成
分のフリツト100に対して、カリ長石175、粘土
5、止め薬0.5、金属酸化物としてMnO2
Fe2O32、水55の重量部にてそれらを泥漿状にミ
ル配合し、該泥漿状配合物を、前記前処理を施し
た金属基体1の表面に塗着し、830℃にて琺瑯焼
付けを行ない、梨地状の表面を有する80〜200μ
の膜厚の黒色を帯びた遠赤外線放射層2を形成し
た。 第 3 表 成分名 配合(重量比) SiO2 36% B2O3 27 Na2O 18 Al2O3 7 CaO 4 K2O 4 CaF2 2 MnO2 1 NiO 0.5 CoO 0.5 上記のようにして遠赤外線放射層2を形成した
金属基体1は、その中空部分に、左右の電極端子
3と両端にて接続するニクロム線等の発熱体4を
収納する。図中の5は、金属基体1の中空部分に
充填されるMgO等の耐熱絶縁性充填材を示し、
6は前記充填材5を、中空部分内に封入しておく
ための気密材を示す。 尚、金属基体1をパイプから平板に変えて、平
板の表面に遠赤外線放射層2を形成すれば、パネ
ル状の遠赤外線放射琺瑯発熱体として利用でき
る。 この様にして製造された遠赤外線放射発熱体
は、カリ長石粒子を分散して有する不均質なガラ
ス層である黒色で梨地状の遠赤外線放射層をその
表面に形成し、該放射層は、発熱体4に対する適
宜の加熱により強力な遠赤外線を放射する。 また、前記第3表の成分のフリツト100に対し
て、ペタライト又はコレマナイト175、粘土5、
止め剤0.5、金属酸化物としてMnO2とFe2O32、
水55重量部にてそれらを泥漿状にミル配合し、該
泥漿状配合物を、前処理を施した金属基体1の表
面に塗着し、830℃にて琺瑯焼付けを行ない、梨
地状の表面を有する80〜200μの膜厚の黒色を帯
びた遠赤外線放射層2を形成した。 以下、前記実施例と同様に製造された遠赤外線
放射発熱体は、ペタライト粒子又はコレマナイト
粒子を分散して有する不均質なガラス層である黒
色で梨地状の遠赤外線放射層をその表面に形成
し、該放射層は、発熱体4に対する適宜の加熱に
より強力な遠赤外線を放射する。 更に、前記第3表の成分のフリツト100に対し
て、カリ長石、ペタライト、コレマナイト及び
ZrO2・SiO2175、粘土5、止め剤0.5、金属酸化
物としてMnO2とFe2O32、水55の重量部にてそれ
らを泥漿状にミル配合し、該泥漿状配合物を、前
処理を施した金属基体1の表面に塗着し、830℃
にて琺瑯焼付けを行ない、梨地状の表面を有する
80〜200μの膜厚の黒色を帯びた遠赤外線放射層
2を形成した。 以下、前記実施例と同様に製造された遠赤外線
放射発熱体は、カリ長石粒子、ペタライト粒子、
コレマナイト粒子及びZrO2・SiO2粒子を分散し
て有する不均質なガラス層である黒色で梨地状の
遠赤外線放射層をその表面に形成し、該放射層
は、発熱体4に対する適宜の加熱により強力な遠
赤外線を放射する。 本発明の方法は、上述した通りであり、本発明
方法の第1の効果は、琺瑯層の金属基体への密着
性が向上し、下釉及び上釉の使い分けの区別をな
くし、ただ一度の琺瑯焼付けのみで遠赤外線放射
発熱体を製造できることである。 第2の効果は、琺瑯層の金属基体への密着性が
向上することにより、機械的衝撃に対して強く、
又冷熱サイクルに対して剥離やクラツクを生じな
い遠赤外線放射発熱体を製造できることである。 第3の効果は、フリツトの成分配合を工夫した
ことによつてカリ長石、ペタライト、コレマナイ
トの1種以上又はこれらとZrO2・SiO2とを50部
以上(実施例では175部)を添加可能にし、強力
な遠赤外線放射層を形成できる点である。 第4の効果は、カリ長石、ペタライト、コレマ
ナイトの1種以上又はこれらとZrO2・SiO2とを
多量に混入するため、カリ長石粒子、ペタライト
粒子、コレマナイト粒子の1種以上又はこれらと
ZrO2・SiO2粒子とをガラス層に分散して存在さ
せ、不均質なガラス層を形成し、従来の諸欠点
(つまとび、チツピング等)を減少させている。 第5の効果は、放射率(完全黒体を1としそれ
との比によつて表わされる)が1に近い値になつ
ているので、効率的な遠赤外線放射を為し得る。 第6の効果は、一般の琺瑯焼付と同様に行なえ
る為、量産性があり安価である。 第7の効果は、耐火性及び電気絶縁性が大き
く、物理的に安定な遠赤外線放射層を形成し得
る。
[Table] The frit shown in Table 1 and the mill additive shown in Table 2 are made into a slurry and applied to a metal substrate.
If enamel firing is carried out at 850℃, potassium feldspar, petalite, colemanite, or any of these will be present in the enamel layer.
Since ZrO 2 and SiO 2 are dispersed heterogeneously, ZrO 2 and
JP-A-57-56348 in which only SiO 2 is dispersed heterogeneously
Like No. 2, it is advantageous in far-infrared radiation. Next, one embodiment of the method for manufacturing an enamel heating element of the present invention will be described with reference to the drawings. 1 is a metal base made of a pipe made of iron, stainless steel, or the like. The metal substrate 1 is subjected to pretreatment such as degreasing, pickling, and neutralization in order to improve adhesion. Next, for 100 frits of the ingredients listed in Table 3 below, 175 potassium feldspar, 5 clay, 0.5 molten salt, and MnO 2 as metal oxide.
Fe 2 O 3 2 and 55 parts by weight of water were mill-blended into a slurry, and the slurry-like mixture was applied to the surface of the metal substrate 1 that had been subjected to the above-mentioned pretreatment, and enameled at 830°C. 80-200μ with a satin-like surface after baking
A blackish far-infrared emitting layer 2 with a film thickness of Table 3 Component name Mixture (weight ratio) SiO 2 36% B 2 O 3 27 Na 2 O 18 Al 2 O 3 7 CaO 4 K 2 O 4 CaF 2 2 MnO 2 1 NiO 0.5 CoO 0.5 The metal base 1 on which the infrared radiation layer 2 is formed accommodates a heating element 4 such as a nichrome wire connected at both ends to the left and right electrode terminals 3 in its hollow portion. 5 in the figure indicates a heat-resistant insulating filler such as MgO filled in the hollow part of the metal base 1,
Reference numeral 6 indicates an airtight material for enclosing the filler 5 in the hollow portion. If the metal substrate 1 is changed from a pipe to a flat plate and the far-infrared ray emitting layer 2 is formed on the surface of the flat plate, it can be used as a panel-shaped far-infrared radiating enamel heating element. The far-infrared radiating heating element manufactured in this manner has a black, satin-like far-infrared radiating layer, which is a heterogeneous glass layer having potassium feldspar particles dispersed therein, formed on its surface. By appropriately heating the heating element 4, strong far-infrared rays are emitted. In addition, for 100 frits of the ingredients in Table 3 above, 175 petalite or colemanite, 5 clay,
Stopper 0.5, MnO2 and Fe2O32 as metal oxides ,
They were mill-blended into a slurry with 55 parts by weight of water, the slurry-like mixture was applied to the surface of the pretreated metal substrate 1, and enamel baking was performed at 830°C to create a satin-like surface. A blackish far-infrared emitting layer 2 having a film thickness of 80 to 200 μm was formed. Hereinafter, a far-infrared radiating heating element manufactured in the same manner as in the above example has a black satin-like far-infrared radiating layer formed on its surface, which is a heterogeneous glass layer having petalite particles or colemanite particles dispersed therein. , the radiation layer emits strong far-infrared rays when the heating element 4 is appropriately heated. Furthermore, for 100 frits of the components listed in Table 3 above, potassium feldspar, petalite, colemanite and
175 parts by weight of ZrO 2・SiO 2 , 5 parts of clay, 0.5 parts of inhibitor, MnO 2 and Fe 2 O 3 2 as metal oxides, and 55 parts by weight of water are mill-blended into a slurry, and the slurry-like mixture is Apply it on the surface of the pretreated metal substrate 1 and heat it to 830℃.
It is enamel fired and has a satin-like surface.
A blackish far-infrared emitting layer 2 with a film thickness of 80 to 200 μm was formed. Hereinafter, the far-infrared radiating heating element manufactured in the same manner as in the above example includes potassium feldspar particles, petalite particles,
A black, satin-like far-infrared radiation layer, which is a heterogeneous glass layer containing dispersed colemanite particles and ZrO 2 /SiO 2 particles, is formed on its surface, and the radiation layer is heated by heating the heating element 4 as appropriate. Emits powerful far-infrared rays. The method of the present invention is as described above, and the first effect of the method of the present invention is that the adhesion of the enamel layer to the metal substrate is improved, there is no need to differentiate between the use of the lower glaze and the upper glaze, and only one glaze is applied. It is possible to manufacture a far-infrared radiating heating element only by enamel firing. The second effect is that the adhesion of the enamel layer to the metal substrate improves, making it resistant to mechanical shock.
Furthermore, it is possible to produce a far-infrared radiating heating element that does not peel or crack during cooling and heating cycles. The third effect is that by devising the composition of the frit, it is possible to add at least 50 parts (175 parts in the example) of one or more of potassium feldspar, petalite, and colemanite, or these and ZrO 2 / SiO 2 . The advantage is that it can form a powerful far-infrared radiation layer. The fourth effect is that one or more of potassium feldspar particles, petalite particles, and colemanite particles, or one or more of these particles and ZrO 2 / SiO 2 are mixed in a large amount, so one or more types of potassium feldspar particles, petalite particles, and colemanite particles or these particles are mixed.
ZrO 2 and SiO 2 particles are dispersed and present in the glass layer, forming a non-uniform glass layer and reducing the various drawbacks of conventional glass (splatter, chipping, etc.). The fifth effect is that the emissivity (represented by the ratio of a perfect black body to 1) is close to 1, so that far-infrared rays can be efficiently radiated. The sixth effect is that it can be mass-produced and is inexpensive because it can be performed in the same way as general enamel firing. The seventh effect is that a physically stable far-infrared emitting layer with high fire resistance and electrical insulation properties can be formed.

【図面の簡単な説明】[Brief explanation of the drawing]

図面は本発明の製造方法によつて製造される遠
赤外線放射のための琺瑯発熱体の一実施例を示す
一部切欠平面図。
The drawing is a partially cutaway plan view showing an embodiment of an enamel heating element for far-infrared radiation manufactured by the manufacturing method of the present invention.

Claims (1)

【特許請求の範囲】[Claims] 1 重量比SiO235〜36%、B2O326〜27%、
Na2O18〜19%、Al2O36〜7%、CaO4〜6%、
K2O3〜4%、CaF21〜3%、MnO21〜2%、
NiO0.3〜0.6%、CoO0.3〜0.6%の成分としたフリ
ツト100部に対して、カリ長石、ペタライト、コ
レマナイトの一種以上又はこれらとZrO2・SiO2
とを50部以上加え、更に粘土4〜7部、止め薬
0.2〜0.5部、MnO2、Cu2O、Fe2O3、Al2O3
CoO、NiO、Cr2O3、Fe3O4の金属酸化物のうち
1種以上を2〜5部、水45〜55部を泥漿状に配合
し、これら泥漿状配合物を金属基体に塗着して琺
瑯焼付け1回のみにより遠赤外線放射層を形成す
ることを特徴とする遠赤外線放射のための琺瑯発
熱体の製造方法。
1 Weight ratio SiO 2 35-36%, B 2 O 3 26-27%,
Na2O18 ~19%, Al2O3 6~7%, CaO4 ~ 6%,
K2O3 ~4%, CaF2 1~3%, MnO2 1~2%,
For 100 parts of frit containing 0.3 to 0.6% NiO and 0.3 to 0.6% CoO, one or more of potassium feldspar, petalite, colemanite, or these together with ZrO 2 and SiO 2
Add at least 50 parts of
0.2-0.5 parts, MnO2 , Cu2O , Fe2O3 , Al2O3 ,
2 to 5 parts of one or more of the metal oxides CoO, NiO, Cr 2 O 3 , and Fe 3 O 4 and 45 to 55 parts of water are mixed into a slurry, and this slurry-like mixture is applied to a metal substrate. 1. A method for producing an enamel heating element for far-infrared radiation, characterized in that a far-infrared radiation layer is formed by only one time of enameling and enameling.
JP7421082A 1982-04-30 1982-04-30 Production of enamelled heatng element for irradiation of far ultraviolet light Granted JPS58190838A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7421082A JPS58190838A (en) 1982-04-30 1982-04-30 Production of enamelled heatng element for irradiation of far ultraviolet light

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7421082A JPS58190838A (en) 1982-04-30 1982-04-30 Production of enamelled heatng element for irradiation of far ultraviolet light

Publications (2)

Publication Number Publication Date
JPS58190838A JPS58190838A (en) 1983-11-07
JPS635339B2 true JPS635339B2 (en) 1988-02-03

Family

ID=13540596

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7421082A Granted JPS58190838A (en) 1982-04-30 1982-04-30 Production of enamelled heatng element for irradiation of far ultraviolet light

Country Status (1)

Country Link
JP (1) JPS58190838A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07167586A (en) * 1993-12-13 1995-07-04 Rinnai Corp Heat exchanger
JPH08166196A (en) * 1994-12-14 1996-06-25 Sakae Sangyo Kk Plate heat exchanger

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61179881A (en) * 1985-02-04 1986-08-12 Ibiden Co Ltd Infrared radiator with metallic base material and its production
JPS61179882A (en) * 1985-02-04 1986-08-12 Ibiden Co Ltd Far infrared radiator with metallic base material and its production
JPS61190080A (en) * 1985-02-19 1986-08-23 Ibiden Co Ltd Far infrared radiator of metallic base material and its production
JPS63158355U (en) * 1987-04-06 1988-10-17
JPH01164736U (en) * 1988-05-10 1989-11-17
CN105036556A (en) * 2015-07-06 2015-11-11 昆山美邦环境科技有限公司 Acid resistant enamel slip, and method using slip to make enamel product

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07167586A (en) * 1993-12-13 1995-07-04 Rinnai Corp Heat exchanger
JPH08166196A (en) * 1994-12-14 1996-06-25 Sakae Sangyo Kk Plate heat exchanger

Also Published As

Publication number Publication date
JPS58190838A (en) 1983-11-07

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