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JPS6354211B2 - - Google Patents
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JPS6354211B2 - - Google Patents

Info

Publication number
JPS6354211B2
JPS6354211B2 JP58090529A JP9052983A JPS6354211B2 JP S6354211 B2 JPS6354211 B2 JP S6354211B2 JP 58090529 A JP58090529 A JP 58090529A JP 9052983 A JP9052983 A JP 9052983A JP S6354211 B2 JPS6354211 B2 JP S6354211B2
Authority
JP
Japan
Prior art keywords
cap
arm
exhaust
exhaust duct
tube
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58090529A
Other languages
Japanese (ja)
Other versions
JPS59215722A (en
Inventor
Shigeaki Asakura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP58090529A priority Critical patent/JPS59215722A/en
Publication of JPS59215722A publication Critical patent/JPS59215722A/en
Publication of JPS6354211B2 publication Critical patent/JPS6354211B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04Apparatus for manufacture or treatment
    • H10P72/0431Apparatus for thermal treatment
    • H10P72/0436Apparatus for thermal treatment mainly by radiation

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は、半導体製造装置に関し、特に半導体
拡散に用いられる拡散チユーブのキヤツプおよび
排気ダクトの改良に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to semiconductor manufacturing equipment, and particularly to improvements in the cap and exhaust duct of a diffusion tube used for semiconductor diffusion.

〔発明の技術的背景および背景技術の問題点〕[Technical background of the invention and problems in the background art]

従来のキヤツプおよび排気ダクトの例を第1
図、第2図および第3図に示す。第1図の例は、
キヤツプ1の周壁部1aに排気ダクト部1bが設
けられ、この排気ダクト部1bに排気チユーブ3
が接続されている。キヤツプ1は石英で形成さ
れ、同じく石英で形成された拡散用チユーブ2と
すり合わせによつて密閉を図るもので、手作業で
開閉されるよりほかはなく、開閉の自動化が困難
であつた。
The first example is a conventional cap and exhaust duct.
2 and 3. The example in Figure 1 is
An exhaust duct portion 1b is provided on the peripheral wall portion 1a of the cap 1, and an exhaust tube 3 is provided in the exhaust duct portion 1b.
is connected. The cap 1 is made of quartz and is sealed by rubbing together with the diffusion tube 2, which is also made of quartz, and has no choice but to be opened and closed manually, making it difficult to automate opening and closing.

第2図の例では、キヤツプ6は石英によつて形
成された円板6から成り、Oリング8によつて円
筒状中間部材9との間の密閉を図つている。中間
部材9は拡散用チユーブ2と連結される一方、一
部に排気ダクト部9aが設けられ、これに排気チ
ユーブ3が接続されている。一方、キヤツプ6は
支持部5によつて支持され、支持部5とともに回
転軸4を中心として回動可能であり、また、回転
軸4とともに前後に移動可能であつて、これによ
りキヤツプの自動開閉が可能となつている。しか
るにこの構成では、部品点数が多く、高価格とな
ることに加えて、取付け調整、取外し(例えば洗
浄のため必要となる)が不便であるという欠点が
あつた。
In the example shown in FIG. 2, the cap 6 consists of a disk 6 made of quartz, and is sealed with a cylindrical intermediate member 9 by an O-ring 8. The intermediate member 9 is connected to the diffusion tube 2, and is partially provided with an exhaust duct portion 9a, to which the exhaust tube 3 is connected. On the other hand, the cap 6 is supported by the support part 5, is rotatable together with the support part 5 about the rotating shaft 4, and is movable back and forth together with the rotating shaft 4, thereby automatically opening and closing the cap. is now possible. However, this configuration has disadvantages in that it requires a large number of parts, is expensive, and is inconvenient to install, adjust, and remove (necessary for cleaning, for example).

第3図の例は、石英製の拡散用チユーブ10に
排気ダクト部10aが一体形成されたものであ
る。キヤツプ6の構造、その自動開閉機構等は同
様である。第3図の構成とするには、石英製のチ
ユーブ10に突出した排気ダクト部10aを一体
に形成しているため、製造価格が高くなると洗浄
の際等に破損し易いこと等の欠点がある。
In the example shown in FIG. 3, an exhaust duct portion 10a is integrally formed with a diffusion tube 10 made of quartz. The structure of the cap 6, its automatic opening/closing mechanism, etc. are the same. In the configuration shown in FIG. 3, since the protruding exhaust duct portion 10a is integrally formed with the quartz tube 10, there are disadvantages such as high manufacturing cost and easy damage during cleaning etc. .

〔発明の目的〕[Purpose of the invention]

本発明の目的は、キヤツプの自動開閉が可能で
部品点数が少く、また破損しにくい半導体製造装
置を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a semiconductor manufacturing apparatus that is capable of automatically opening and closing a cap, has a small number of parts, and is less likely to be damaged.

〔発明の概要〕[Summary of the invention]

本発明の半導体製造装置は、キヤツプを自動開
閉するための支持アームが中空に形成されて排気
ダクトを兼ねるものである。
In the semiconductor manufacturing apparatus of the present invention, the support arm for automatically opening and closing the cap is formed hollow and also serves as an exhaust duct.

〔発明の実施例〕[Embodiments of the invention]

第4図は本発明の一実施例を示すものである。
図示のように拡散用チユーブ7の一端にOリング
8が取付けられ、これにキヤツプ13が押しつけ
られて、これにより密封がなされている。キヤツ
プ13は石英で形成された円板から成り、中央部
に開口13aが設けられている。キヤツプ13の
外側面には、アーム12が設けられている。アー
ム12は、図示のように管状で、内部を貫通する
気路12aを有する。この気路12aの一端は開
口13aにつながつている。アーム12も石英で
形成され、本実施例では、アーム12とキヤツプ
13とが一体に形成されている。アーム12の一
端には排気チユーブ13が接続されている。即
ち、このようにしてアーム12内の気路12aは
排気ダクトとして働くようになつている。
FIG. 4 shows an embodiment of the present invention.
As shown, an O-ring 8 is attached to one end of the diffusion tube 7, and a cap 13 is pressed against the O-ring 8 for sealing. The cap 13 is made of a disc made of quartz, and has an opening 13a in the center. An arm 12 is provided on the outer surface of the cap 13. The arm 12 is tubular as shown and has an air passage 12a passing through it. One end of this air passage 12a is connected to an opening 13a. The arm 12 is also made of quartz, and in this embodiment, the arm 12 and the cap 13 are integrally formed. An exhaust tube 13 is connected to one end of the arm 12. That is, in this way, the air passage 12a within the arm 12 functions as an exhaust duct.

アーム12の途中の部分は、ステンレス製のア
ーム押え11によつて支持され、このアーム押え
は回転軸4に固定されている。そして、アーム1
2およびキヤツプ13は回転軸4を中心として回
動(矢印A)可能、また回転軸4とともに前後動
(矢印B)可能となつている。
An intermediate portion of the arm 12 is supported by an arm holder 11 made of stainless steel, and this arm holder is fixed to the rotating shaft 4. And arm 1
2 and the cap 13 can be rotated around the rotating shaft 4 (arrow A), and can also be moved back and forth together with the rotating shaft 4 (arrow B).

キヤツプ13を閉じるには、まずアーム12と
ともに回動させて拡散用チユーブ7と整列させた
後、チユーブ7に向けて前進させOリングに押し
付けて密閉する。キヤツプ13を開くには、後退
させてOリング8から離し、次に回動させる。こ
のような開閉のための運動は自動的に行なわれ
る。
To close the cap 13, first rotate it together with the arm 12 to align it with the diffusion tube 7, then advance it toward the tube 7 and press it against the O-ring to seal it. To open the cap 13, move it backwards away from the O-ring 8 and then rotate it. Such opening/closing movements are performed automatically.

なお、キヤツプやアームの材料は石英に限らず
他のもの例えば炭化ケイ素(SiC)を用いてもよ
い。
Note that the material of the cap and arm is not limited to quartz, but other materials such as silicon carbide (SiC) may be used.

〔発明の効果〕〔Effect of the invention〕

以上のように、本発明によれば、キヤツプを自
動開閉するためのアームが排気ダクトを兼ねてい
るので部品点数が少い。また、拡散用チユーブに
突出した排気ダクト部を設ける必要がないので、
洗浄等においての破損といつた問題もなくなる。
また、キヤツプ自体に排気口があるため、周壁に
排気口がある場合に比べて排気流が円滑となり排
気効果が向上するのみならず、排気口周辺への物
質の付着(例えば燐拡散炉における燐の付着)も
少くなる。
As described above, according to the present invention, the arm for automatically opening and closing the cap also serves as an exhaust duct, so the number of parts is small. In addition, there is no need to provide a protruding exhaust duct on the diffusion tube, so
Problems such as damage during cleaning etc. are also eliminated.
In addition, since the cap itself has an exhaust port, the exhaust flow is smoother than when the exhaust port is on the peripheral wall, which not only improves the exhaust effect but also prevents substances from adhering to the area around the exhaust port (for example, phosphorus in a phosphorus diffusion furnace). adhesion) will also be reduced.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図aおよびbは一従来例のキヤツプまわり
を示す斜視図および断面図、第2図aおよびbは
他の従来例を示す正面図および断面図、第3図は
さらに他の従来例を示す断面図、第4図aおよび
bは本発明一実施例の装置のキヤツプおよびアー
ムを示す正面図および断面図である。 3…排気チユーブ、4…回転軸、7…拡散用チ
ユーブ、8…Oリング、12…アーム、12a…
気路、13…キヤツプ、13a…開口。
Figures 1a and b are perspective views and sectional views showing the cap and surroundings of one conventional example, Figures 2 a and b are front views and sectional views showing another conventional example, and Figure 3 shows still another conventional example. Figures 4a and 4b are front and cross-sectional views of the cap and arm of an apparatus according to one embodiment of the invention. 3... Exhaust tube, 4... Rotating shaft, 7... Diffusion tube, 8... O ring, 12... Arm, 12a...
Airway, 13...cap, 13a...opening.

Claims (1)

【特許請求の範囲】 1 半導体拡散用チユーブの一端を封鎖するキヤ
ツプを支持して該キヤツプとともに回動し該キヤ
ツプの開閉を行なうアームに、内部を貫通し、か
つ前記キヤツプを貫通する開口と連結する気路が
設けられていることを特徴とする半導体製造装
置。 2 特許請求の範囲第1項記載の装置において、
前記キヤツプと前記アームとが一体に形成されて
いることを特徴とする装置。
[Scope of Claims] 1. An arm that supports a cap that closes one end of a semiconductor diffusion tube and rotates with the cap to open and close the cap is connected to an opening that penetrates the inside and passes through the cap. 1. A semiconductor manufacturing device characterized by being provided with an air passage. 2. In the device according to claim 1,
A device characterized in that the cap and the arm are integrally formed.
JP58090529A 1983-05-23 1983-05-23 Semiconductor manufacturing apparatus Granted JPS59215722A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58090529A JPS59215722A (en) 1983-05-23 1983-05-23 Semiconductor manufacturing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58090529A JPS59215722A (en) 1983-05-23 1983-05-23 Semiconductor manufacturing apparatus

Publications (2)

Publication Number Publication Date
JPS59215722A JPS59215722A (en) 1984-12-05
JPS6354211B2 true JPS6354211B2 (en) 1988-10-27

Family

ID=14000940

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58090529A Granted JPS59215722A (en) 1983-05-23 1983-05-23 Semiconductor manufacturing apparatus

Country Status (1)

Country Link
JP (1) JPS59215722A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH071790Y2 (en) * 1987-06-17 1995-01-18 国際電気株式会社 Automatic cap for diffuser
JPH01170017A (en) * 1987-12-25 1989-07-05 Toshiba Corp Semiconductor processing device

Also Published As

Publication number Publication date
JPS59215722A (en) 1984-12-05

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