JPS6355745B2 - - Google Patents
Info
- Publication number
- JPS6355745B2 JPS6355745B2 JP57156397A JP15639782A JPS6355745B2 JP S6355745 B2 JPS6355745 B2 JP S6355745B2 JP 57156397 A JP57156397 A JP 57156397A JP 15639782 A JP15639782 A JP 15639782A JP S6355745 B2 JPS6355745 B2 JP S6355745B2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- pieces
- axis
- electrode pieces
- outer peripheral
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/10—Lenses
- H01J37/12—Lenses electrostatic
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Description
【発明の詳細な説明】
本発明は荷電粒子ビームの静電偏向装置に使用
する多重極電極構造体に関する。多重極電極は電
子ビーム露光装置、電子顕微鏡、ブラウン管、撮
像管等においてビームを精確に偏向したり、又は
ビームの断面形成を整形するため用いられてい
る。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a multipole electrode structure for use in a device for electrostatic deflection of charged particle beams. Multipole electrodes are used in electron beam exposure devices, electron microscopes, cathode ray tubes, image pickup tubes, etc. to accurately deflect beams or to shape the cross-section of beams.
多重極電極には多数の電極片を電極の中心軸に
対して対称に環状に配置し、それらの電極片を絶
縁材料の支持体で包囲してこの支持体に電極片を
固定した構造のものがある。しかしこのような構
造では作動時に絶縁材料の支持体は帯電し、この
帯電による望ましくない電界が偏向電界中にしみ
出して偏向電界を乱し、荷電粒子ビームの偏向精
度を低下させ、結局このような多重極電極を装備
した電子ビーム露光装置、電子顕微鏡等の作動上
の精度を低化させてしまうことゝなる。 A multipolar electrode has a structure in which a large number of electrode pieces are arranged in a ring shape symmetrically with respect to the central axis of the electrode, the electrode pieces are surrounded by a support made of an insulating material, and the electrode pieces are fixed to this support. There is. However, in such a structure, during operation, the support of the insulating material becomes electrically charged, and the undesirable electric field due to this charging permeates into the deflection electric field, disturbs the deflection electric field, and reduces the deflection accuracy of the charged particle beam. This will reduce the operational accuracy of electron beam exposure devices, electron microscopes, etc. equipped with multipole electrodes.
本発明の目的は、電極支持体の帯電による電界
の偏向電界内へのしみ出しを防止して偏向電界の
正常分布を保証するよう構成した多重極電構造体
を提供することにある。 SUMMARY OF THE INVENTION An object of the present invention is to provide a multielectrode structure configured to prevent the electric field from seeping into the deflection electric field due to charging of the electrode support, thereby ensuring a normal distribution of the deflection electric field.
この目的は本発明に従つて、一つの軸に対称に
配置した電極片のうち同一電位を印加する電極片
を前記の軸の異なるレベルで複数の金属の外周接
続片で一体に結合し、そして電極体の背後におい
て偏向空間に露出しないよう外周接続片上に配置
した絶縁支持体により前記の外周接続片を結合し
て成る多重極電極構造体により達成される。 This object is achieved according to the invention by connecting together electrode pieces to which the same potential is applied among electrode pieces arranged symmetrically about one axis by a plurality of metal peripheral connection pieces at different levels of said axis, and This is achieved by a multipole electrode structure in which the outer circumferential connecting pieces are connected by an insulating support placed on the outer circumferential connecting pieces so as not to be exposed to the deflection space behind the electrode body.
添付図を参照して以下に本発明の実施例を説明
する。 Embodiments of the present invention will be described below with reference to the accompanying drawings.
第1図を参照する。1つの軸に対称に配置され
た電極片のうち同一電位が印加される電極片例え
ば15,17,19を金属の外周接続片2A2で一体
に結合し、そして別の同一電位が印加される電極
片13,11,111、を外周接続片2A1で一体に結
合し、前記の軸に沿つて低くなつているレベルで
同一電位が印加される電極片16,14,12を外
周接続片2B1で一体に結合し、そして別の同一
電位が印加される電極片18,110,112を外周接
続片2B2で一体に結合している。高い方のレベ
ルにおいて外周接続片2A1と2A2の両端は電極
片14と110の背後で間隔をおいて対向しており、
同様に低い方のレベルにおいて外周接続片2B1
と2B2の両端は電極片17と11の背後で間隔をお
いて対向している。絶縁支持体3はこれらの外周
接続片上に配置され電極片を全体として一体に固
定している。絶縁支持体3は電極片が包囲してい
る偏向空間に露出している部分はなく、そのため
帯電しにくく、又帯電してもその電界が偏向空間
内にしみ出していくということはきわめて少な
い。 Please refer to FIG. Among the electrode pieces arranged symmetrically about one axis, the electrode pieces to which the same potential is applied, for example, 1 5 , 1 7 , 1 9 are connected together by a metal outer peripheral connecting piece 2A 2 , and another electrode piece with the same potential is applied. The electrode pieces 1 3 , 1 1 , 1 11 to be applied are integrally connected by the outer peripheral connecting piece 2A 1 , and the same potential is applied to the electrode pieces 1 6 , 1 at a lower level along the axis. 4 and 1 2 are integrally connected by an outer peripheral connecting piece 2B 1 , and other electrode pieces 1 8 , 1 10 and 1 12 to which the same potential is applied are integrally connected by an outer peripheral connecting piece 2B 2 . At the higher level, both ends of the outer peripheral connecting pieces 2A 1 and 2A 2 face each other at a distance behind the electrode pieces 1 4 and 1 10 ,
Similarly, at the lower level, the outer peripheral connection piece 2B 1
and 2B 2 are opposed to each other at a distance behind the electrode pieces 1 7 and 1 1 . The insulating support 3 is arranged on these outer peripheral connection pieces and fixes the electrode pieces together as a whole. There is no part of the insulating support 3 that is exposed to the deflection space surrounded by the electrode pieces, so it is difficult to be charged, and even if it is charged, it is extremely unlikely that the electric field will seep into the deflection space.
底部に近いレベルにおける外周接続片2A′1,
2A′2;2B′1,2B′2と電極片との関係も既に述
べた頂部に近いレベルにおける外周接続片2A1,
2A2;2B1,2B2と電極片との関係と同じであ
る。外周接続片2A′1,2A′2;2B′1,2B′2に固
定すべき絶縁支持体は図面の簡略のため示してい
ない。なお、4は外側ハウジングを示す。 outer peripheral connecting piece 2A′ 1 at a level near the bottom,
2A′ 2 ; The relationship between 2B′ 1 , 2B ′ 2 and the electrode pieces has already been described.
2A 2 ; The relationship is the same as that between 2B 1 , 2B 2 and the electrode piece. The insulating supports to be fixed to the outer peripheral connecting pieces 2A' 1 , 2A'2;2B' 1 , 2B' 2 are not shown for the sake of simplicity. Note that 4 indicates an outer housing.
第2図を参照する。第1図の第1の実施例との
相違は絶縁支持体3の形状のみである。平板状の
絶縁支持体3は電極の背後で、外周接続片の間隔
をおいて離した対向端を橋絡するようにして異な
るレベルの外周接続片に固定され、電極片組立体
を一体に構成している。 See Figure 2. The only difference from the first embodiment shown in FIG. 1 is the shape of the insulating support 3. A flat insulating support 3 is fixed behind the electrode to the outer circumferential connecting pieces at different levels in such a way as to bridge the spaced apart opposing ends of the outer circumferential connecting pieces, thereby integrally forming an electrode piece assembly. are doing.
第3図を参照する。この実施例と第2図の実施
例との相違は絶縁支持体3の形状のみである。ブ
ロツク状の絶縁支持体3は電極の背後で、外周接
続片の間隔をおいて離した対向端を橋絡するよう
にして異なるレベルの外周接続片間に配置され、
外周接続片に固定されて電極片組立体を一体に構
成している。 See Figure 3. The only difference between this embodiment and the embodiment shown in FIG. 2 is the shape of the insulating support 3. A block-shaped insulating support 3 is arranged behind the electrode between the peripheral connecting pieces at different levels in such a way as to bridge the spaced apart opposite ends of the peripheral connecting pieces;
It is fixed to the outer peripheral connecting piece to integrally constitute an electrode piece assembly.
第4図を参照する。第1図の第1の実施例との
相違は荷電粒子の運動にスピンを与えるよう電極
片が偏向空間の中心軸に対して同一レベルにおい
ては同じ角度となるように傾斜している以外は第
1の実施例の構成と同じである。 Please refer to FIG. The difference from the first embodiment shown in FIG. 1 is that the electrode pieces are tilted at the same angle at the same level with respect to the central axis of the deflection space so as to give spin to the motion of charged particles. The configuration is the same as that of the first embodiment.
いずれの実施例も同電位が印加される電極片は
金属の外周接続片で接続されており、異なる電位
が印加されるこれらの外周接続片を相互に結合し
て電極片を一体に構成する絶縁支持体は隣接電極
片間の間隙を外して電極片の背後に配置され、絶
縁材が偏向空間に露出することを回避して絶縁材
の帯電による電界が偏向空間にしみ出してくるこ
とを防止している。 In either embodiment, the electrode pieces to which the same potential is applied are connected by a metal outer connection piece, and these outer connection pieces to which different potentials are applied are connected to each other to form an integral electrode piece. The support body is placed behind the electrode pieces by removing the gap between adjacent electrode pieces to avoid exposing the insulating material to the deflection space and preventing the electric field caused by the charging of the insulating material from seeping into the deflection space. are doing.
第1図は本発明の第1の実施例を部分的に破壊
して示す斜視図である。第2図は本発明の第2の
実施例を示す第1図と同様の斜視図である。第3
図はハウジングを取除いた多重電極組立体の第3
の実施例を示す斜視図である。第4図は本発明の
第4の実施例の多重電極組立体の一部を示す斜視
図である。
図中:1……電極片、2……金属外周接続片、
3……絶縁支持体、4……ハウジング。
FIG. 1 is a partially exploded perspective view of a first embodiment of the present invention. FIG. 2 is a perspective view similar to FIG. 1 showing a second embodiment of the invention. Third
The figure shows the third part of the multi-electrode assembly with the housing removed.
It is a perspective view showing an example of this. FIG. 4 is a perspective view showing a portion of a multi-electrode assembly according to a fourth embodiment of the present invention. In the figure: 1... Electrode piece, 2... Metal peripheral connection piece,
3...Insulating support body, 4...Housing.
Claims (1)
の選択された電極片と一体に接続された金属の外
周接続片および 隣り合う電極片の間隙に露出することなく前記
の外周接続片を相互に固定している絶縁支持体を
備えることを特徴とする多重極電極構造体。 2 前記の電極片の各々は前記の軸と平行に又は
前記の軸に対して同一レベルにおいて同じ角度と
なるよう傾斜している特許請求の範囲第1項に記
載の多重極電極構造体。[Scope of Claims] 1. Electrode pieces arranged symmetrically about one axis; a metal peripheral connecting piece integrally connected to selected ones of said electrode pieces at different levels of said axis; and A multipole electrode structure characterized by comprising an insulating support that fixes the outer peripheral connection pieces to each other without being exposed in the gap between adjacent electrode pieces. 2. A multipole electrode structure according to claim 1, wherein each of said electrode pieces is inclined parallel to said axis or at the same level and at the same angle to said axis.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57156397A JPS5946744A (en) | 1982-09-08 | 1982-09-08 | Multi-pole electrode structural body |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57156397A JPS5946744A (en) | 1982-09-08 | 1982-09-08 | Multi-pole electrode structural body |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5946744A JPS5946744A (en) | 1984-03-16 |
| JPS6355745B2 true JPS6355745B2 (en) | 1988-11-04 |
Family
ID=15626840
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57156397A Granted JPS5946744A (en) | 1982-09-08 | 1982-09-08 | Multi-pole electrode structural body |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5946744A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AT393333B (en) * | 1986-11-27 | 1991-09-25 | Ims Ionen Mikrofab Syst | ION PROJECTION DEVICE FOR SHADOW PROJECTION |
-
1982
- 1982-09-08 JP JP57156397A patent/JPS5946744A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5946744A (en) | 1984-03-16 |
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