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JPS6355939B2 - - Google Patents
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JPS6355939B2 - - Google Patents

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Publication number
JPS6355939B2
JPS6355939B2 JP58068429A JP6842983A JPS6355939B2 JP S6355939 B2 JPS6355939 B2 JP S6355939B2 JP 58068429 A JP58068429 A JP 58068429A JP 6842983 A JP6842983 A JP 6842983A JP S6355939 B2 JPS6355939 B2 JP S6355939B2
Authority
JP
Japan
Prior art keywords
semiconductor laser
laser
anastomosis
light
carbon dioxide
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58068429A
Other languages
Japanese (ja)
Other versions
JPS59194733A (en
Inventor
Katsufumi Kumano
Yasuhiro Tsuji
Fumio Inaba
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chugai Pharmaceutical Co Ltd
Tohoku Ricoh Co Ltd
Original Assignee
Chugai Pharmaceutical Co Ltd
Tohoku Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chugai Pharmaceutical Co Ltd, Tohoku Ricoh Co Ltd filed Critical Chugai Pharmaceutical Co Ltd
Priority to JP58068429A priority Critical patent/JPS59194733A/en
Publication of JPS59194733A publication Critical patent/JPS59194733A/en
Publication of JPS6355939B2 publication Critical patent/JPS6355939B2/ja
Granted legal-status Critical Current

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  • Laser Surgery Devices (AREA)
  • Surgical Instruments (AREA)

Description

【発明の詳細な説明】 (技術分野) 本発明は、半導体レーザを用いた血管吻合装置
に関するものである。
DETAILED DESCRIPTION OF THE INVENTION (Technical Field) The present invention relates to a blood vessel anastomosis device using a semiconductor laser.

(従来技術) 針と糸を用いて行なう血管吻合は、脳外科や心
臓外科、整形外科等で広く採用されているが、一
本の血管の周囲を十数針縫う必要があることか
ら、術者及び患者に大きな負担や苦痛を強いるこ
とが多かつた。殊に、1mmφ以下の細管の吻合に
おいては、満足のいく結果の得られる成功率が極
めて低くなることもやむを得ないことであつた。
針と糸を用いた動脈血管の吻合の場合、吻合後に
血流を再開させると接合部においてすき間から血
液が漏出し、この漏出が収まるまでしばらくガー
ゼ等を押し当てておくというような余分な時間が
必要であつた。また、脳外科等においては、吻合
時間が長くかかると血流を止めておく時間も長く
なり、このための二次的障害が起こるという危険
性もあつた。
(Prior art) Vascular anastomosis performed using a needle and thread is widely used in neurosurgery, cardiac surgery, orthopedics, etc., but it is difficult for the surgeon to sew around a single blood vessel. This often resulted in a large burden and pain for the patient. Particularly in the anastomosis of thin tubes with a diameter of 1 mm or less, it is unavoidable that the success rate of obtaining a satisfactory result is extremely low.
In the case of arterial blood vessel anastomosis using a needle and thread, when blood flow is resumed after the anastomosis, blood leaks from the gap at the junction, and it takes an extra period of time to press gauze etc. until the leakage subsides. was necessary. Furthermore, in neurosurgery and the like, the longer the anastomosis time, the longer the time to stop blood flow, and there is a risk that secondary disorders may occur.

これに対し、最近、YAGレーザ又は炭酸ガス
レーザを用いた血管吻合術が開発されている。こ
のような光エネルギーを用いた血管吻合術は光エ
ネルギーを熱に変換して利用するものである。
YAGレーザの場合、かなり大きな出力、例えば
最大10W程度まで用いた例が報告されているが、
光エネルギーを熱エネルギーに変換して用いる場
合、全エネルギー量よりもむしろ照射部位におけ
るエネルギー密度が問題となる。炭酸ガスレーザ
の場合、わずか数十mWの程度で血管吻合が行な
われ、エネルギー密度としては3〜5J/mm2という
のが実用的な値である。第1図は、炭酸ガスレー
ザを用いたときの血管吻合条件を示したものであ
る。スポツト径0.1mmφにおける吻合可能域で、
15〜35mWの光出力に相当する。
In contrast, recently, vascular anastomosis using YAG laser or carbon dioxide laser has been developed. Such vascular anastomosis using light energy utilizes light energy by converting it into heat.
In the case of YAG lasers, there have been reports of using quite high outputs, for example up to 10W.
When converting light energy into thermal energy, the problem is the energy density at the irradiated site rather than the total amount of energy. In the case of a carbon dioxide gas laser, blood vessel anastomosis is performed using only several tens of mW, and a practical value for the energy density is 3 to 5 J/mm 2 . FIG. 1 shows the conditions for blood vessel anastomosis when using a carbon dioxide laser. In the anastomosis possible area with a spot diameter of 0.1 mmφ,
Corresponds to a light output of 15-35mW.

ところで、YAGレーザ光の場合、光の波長
(1.06μm)が炭酸ガスレーザ光のそれに比べて1/
10であるので、本質的に光の収束性はよく、この
ため炭酸ガスレーザと同一エネルギー密度を得る
のにより小さな光出力で吻合条件を満たすことが
できる。つまり数百mJ程度の光エネルギーを出
力できれば血管吻合に供することができる。しか
し、このような微小なレーザを安定して出力する
には現時点で困難である。
By the way, in the case of YAG laser light, the wavelength of light (1.06 μm) is 1/1 compared to that of carbon dioxide laser light.
10, the convergence of light is essentially good, and therefore the anastomosis conditions can be met with a smaller optical output while obtaining the same energy density as a carbon dioxide laser. In other words, if a light energy of about several hundred mJ can be output, it can be used for blood vessel anastomosis. However, it is currently difficult to stably output such a small laser.

一方、生体組織における孔の吸収率では、炭酸
ガスレーザ光はYAGレーザ光に比較して1000倍
も大きく、このことから光の浸透距離が浅いので
血管の表面のみを接合するには都合が良い。又、
このことは3〜5J/mm2のエネルギー密度で十分血
管吻合ができるゆえんである。
On the other hand, the absorption rate of pores in living tissues is 1000 times higher for carbon dioxide laser light than for YAG laser light, which means that the light penetration distance is shallow, making it convenient for joining only the surfaces of blood vessels. or,
This is because an energy density of 3 to 5 J/mm 2 is sufficient for vascular anastomosis.

以上のように、YAGレーザ、炭酸ガスレーザ
共にそれぞれ長所、欠点を有するが、YAGレー
ザの場合、比較的大きい光出力を用いて行なわれ
るため装置が大がかりになり、任意の場所で用い
られるというわけにはいかず、また、炭酸ガスレ
ーザの場合もさらに複雑な制御系を必要とし、装
置自体も大形になる等の欠点があつた。
As mentioned above, both YAG laser and carbon dioxide laser have their own advantages and disadvantages, but in the case of YAG laser, the device is large-scale because it uses a relatively large optical output, and it cannot be used in any place. Moreover, in the case of a carbon dioxide gas laser, a more complicated control system was required, and the device itself had disadvantages such as being large.

(発明の目的) そこで本発明は、近年の半導体レーザ素子の高
出力化に伴い、この高出力半導体レーザ素子を用
いた、小形、簡便で、低価格の半導体レーザ血管
吻合装置を提供するものである。以下、図面によ
り実施例を詳細に説明する。
(Purpose of the Invention) Accordingly, with the recent increase in the output of semiconductor laser devices, the present invention provides a small, simple, and low-cost semiconductor laser vascular anastomosis device using this high-output semiconductor laser device. be. Hereinafter, embodiments will be described in detail with reference to the drawings.

(実施例) 第2図は、本発明の一実施例を示したもので、
1は電源及び調整器であり、通常、バツテリーと
電流調整器より構成される。2は半導体レーザ素
子で、電源及び調整器1により直接駆動され、レ
ーザ光を出射する。この場合、半導体レーザ素子
2は、所要出力に応じて単一又は複数個の素子と
なる。3は集光レンズであり、半導体レーザ素子
2から出射されたレーザ光を照射部位Pに集光さ
せる。4はこれらの部品を収納する容器であつ
て、手に持つて操作できる大きさである。このよ
うに、半導体レーザを用いた血管吻合装置は、極
めて簡単な構成で、しかも小形に構成することが
できる。
(Example) FIG. 2 shows an example of the present invention.
Reference numeral 1 denotes a power supply and regulator, which usually consists of a battery and a current regulator. Reference numeral 2 denotes a semiconductor laser element, which is directly driven by the power supply and adjuster 1 and emits laser light. In this case, the semiconductor laser device 2 may be a single device or a plurality of devices depending on the required output. 3 is a condensing lens, which condenses the laser beam emitted from the semiconductor laser element 2 onto the irradiation site P. 4 is a container for storing these parts, and is large enough to be held and operated in the hand. In this way, a blood vessel anastomosis device using a semiconductor laser has an extremely simple structure and can be made small.

第3図は、本発明の他の実施例を示したもの
で、第2図の実施例のものに、さらに、長時間照
射のための補助電源5を外部に有し、また、患部
に対しレーザ照射条件を一定にする目的でガイド
6を設けている。ガイド6は棒状又は筒状であつ
て、長さを調節できるように調節器7を備えてい
る。
FIG. 3 shows another embodiment of the present invention, which has an external auxiliary power source 5 for long-time irradiation in addition to the embodiment shown in FIG. A guide 6 is provided for the purpose of keeping laser irradiation conditions constant. The guide 6 is rod-shaped or cylindrical, and is equipped with an adjuster 7 so that its length can be adjusted.

(発明の効果) 半導体レーザは、現在、0.5μm〜32μm程度ま
での広い範囲の波長のものが得られており、従つ
て、発振波長を任意に選ぶことができる。また、
光出力では、大出力のもので500mW程度のもの
が試作されており、殊に、波長が1μm帯の半導
体レーザではピーク出力がWオーダのものも実用
化されている。これらを用いると、極めてコンパ
クトな血管吻合装置を安価に製作することがで
き、就中冷却水が不要なため、簡便なポータブル
装置としての構成も可能である。
(Effects of the Invention) Semiconductor lasers are currently available with a wide range of wavelengths from about 0.5 μm to 32 μm, and therefore, the oscillation wavelength can be arbitrarily selected. Also,
In terms of optical output, high-output devices of around 500 mW have been prototyped, and in particular, semiconductor lasers with a wavelength of 1 μm band with peak outputs on the order of W have been put into practical use. By using these, an extremely compact vascular anastomosis device can be manufactured at low cost, and since no cooling water is required, it is also possible to configure it as a simple portable device.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、炭酸ガスレーザにおける血管吻合条
件を示す図、第2図は、本発明の一実施例の構成
を示す略図、第3図は、本発明の他の実施例の構
成を示す略図である。 1……電源及び調整器、2……半導体レーザ素
子、3……集光レンズ、4……容器、5……補助
電源、6……ガイド。
FIG. 1 is a diagram showing the conditions for vascular anastomosis using a carbon dioxide laser, FIG. 2 is a schematic diagram showing the configuration of one embodiment of the present invention, and FIG. 3 is a schematic diagram showing the configuration of another embodiment of the present invention. be. DESCRIPTION OF SYMBOLS 1... Power supply and adjuster, 2... Semiconductor laser element, 3... Condensing lens, 4... Container, 5... Auxiliary power supply, 6... Guide.

Claims (1)

【特許請求の範囲】[Claims] 1 コヒーレントな光を出射する単一若しくは複
数の半導体レーザ素子を具備し、平均出力が1m
W〜300mWの半導体レーザ出射手段と、出射さ
れた光を血管、神経等の径に応じて0.3mmφ以下
の単一スポツトに収束させる光学手段とからなる
ことを特徴とする半導体レーザ血管吻合装置。
1 Equipped with a single or multiple semiconductor laser elements that emit coherent light, with an average output of 1 m
A semiconductor laser blood vessel anastomosis device comprising a semiconductor laser emitting means of W to 300 mW and an optical means for converging the emitted light into a single spot of 0.3 mmφ or less depending on the diameter of blood vessels, nerves, etc.
JP58068429A 1983-04-20 1983-04-20 Semiconductive laser blood vessel inosculating apparatus Granted JPS59194733A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58068429A JPS59194733A (en) 1983-04-20 1983-04-20 Semiconductive laser blood vessel inosculating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58068429A JPS59194733A (en) 1983-04-20 1983-04-20 Semiconductive laser blood vessel inosculating apparatus

Publications (2)

Publication Number Publication Date
JPS59194733A JPS59194733A (en) 1984-11-05
JPS6355939B2 true JPS6355939B2 (en) 1988-11-04

Family

ID=13373438

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58068429A Granted JPS59194733A (en) 1983-04-20 1983-04-20 Semiconductive laser blood vessel inosculating apparatus

Country Status (1)

Country Link
JP (1) JPS59194733A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11580988B2 (en) 2019-01-07 2023-02-14 Samsung Electronics Co., Ltd. Electronic apparatus and control method thereof

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62139642A (en) * 1985-12-13 1987-06-23 浜松ホトニクス株式会社 Blood vessel anastomotic apparatus
JPH0636809Y2 (en) * 1988-10-11 1994-09-28 株式会社モリタ製作所 Dental laser switching device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11580988B2 (en) 2019-01-07 2023-02-14 Samsung Electronics Co., Ltd. Electronic apparatus and control method thereof

Also Published As

Publication number Publication date
JPS59194733A (en) 1984-11-05

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