JPS6362080B2 - - Google Patents
Info
- Publication number
- JPS6362080B2 JPS6362080B2 JP55161095A JP16109580A JPS6362080B2 JP S6362080 B2 JPS6362080 B2 JP S6362080B2 JP 55161095 A JP55161095 A JP 55161095A JP 16109580 A JP16109580 A JP 16109580A JP S6362080 B2 JPS6362080 B2 JP S6362080B2
- Authority
- JP
- Japan
- Prior art keywords
- heating
- plasma
- coupling line
- distributed coupling
- active distributed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010438 heat treatment Methods 0.000 claims description 42
- 230000008878 coupling Effects 0.000 claims description 13
- 238000010168 coupling process Methods 0.000 claims description 13
- 238000005859 coupling reaction Methods 0.000 claims description 13
- 239000004020 conductor Substances 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 7
- 230000010355 oscillation Effects 0.000 claims description 5
- 230000005540 biological transmission Effects 0.000 claims description 2
- 230000005672 electromagnetic field Effects 0.000 claims description 2
- 230000000644 propagated effect Effects 0.000 claims description 2
- 230000001902 propagating effect Effects 0.000 claims description 2
- 230000003068 static effect Effects 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 3
- 230000005686 electrostatic field Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 241001364096 Pachycephalidae Species 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
Landscapes
- Plasma Technology (AREA)
- Discharge Heating (AREA)
Description
【発明の詳細な説明】
一般に高温度高密度のプラズマを得るためには
外部磁界によるプラズマの閉ぢ込めと同時に断熱
圧縮、高周波加熱、ジユール加熱等によるプラズ
マの加熱が必要である。DETAILED DESCRIPTION OF THE INVENTION Generally, in order to obtain high-temperature, high-density plasma, it is necessary to confine the plasma by an external magnetic field and simultaneously heat the plasma by adiabatic compression, high-frequency heating, Joule heating, or the like.
本発明の加熱方式は上記の高周波加熱に属する
ものであるが、その原理は従来の方式と全く異な
るものである。 Although the heating method of the present invention belongs to the above-mentioned high frequency heating, its principle is completely different from conventional methods.
従来の加熱方式では、加熱電磁界がプラズマの
加熱域に到達するために、加熱電磁波の周波数を
プラズマの温度、密度で決まる通過周波数帯域に
選ばねばならない。また波から粒子えのエネルギ
ー吸収過程を有効にするために、通常いわゆる共
鳴加熱が行われている。このため加熱電磁波の電
源として数〜数+GHzの極めて高周波且つ高出力
の発振源が必要である。 In conventional heating methods, in order for the heating electromagnetic field to reach the heating region of the plasma, the frequency of the heating electromagnetic wave must be selected within a pass frequency band determined by the temperature and density of the plasma. Also, so-called resonant heating is usually used to activate the energy absorption process from waves to particles. Therefore, as a power source for heating electromagnetic waves, an extremely high frequency and high output oscillation source of several to several + GHz is required.
第1図〜第3図は本発明の加熱原理を説明する
ための概念図で、1,2,3は3極真空管形能動
的分布結合線路を構成している3導体で、それぞ
れ例えば3極真空管の陰極、格子、陽極に相当
し、密閉容器4の中に保持され、4の内部には電
離気体が封入され、5は3極真空形能動的分布結
合線路にバイアス電圧を供給するための直流電源
で、7は磁界発生装置6によつて生ずる外部磁界
の方向を示す。 Figures 1 to 3 are conceptual diagrams for explaining the heating principle of the present invention. Reference numerals 1, 2, and 3 represent three conductors constituting a triode vacuum tube type active distributed coupling line, each of which is a triode, for example. They correspond to the cathode, grid, and anode of a vacuum tube, and are held in a closed container 4, with ionized gas sealed inside 4, and 5 for supplying a bias voltage to a triode vacuum type active distributed coupling line. In the DC power supply, 7 indicates the direction of the external magnetic field generated by the magnetic field generator 6.
先づ4内の電離気体の電離度が充分低い場合を
考えるに、電極導体1,2,3は3極真空管の機
能を有しているから、その単位長当りの真空管定
数(或いはY―パラメータ)と1,2,3間の静
電容量およびインダクタンスとの間に或る条件
(利得伝搬条件)が満足される時は、電磁波は1,
2,3に沿つて利得的に伝搬する。若し1,2,
3が後に示す第4図のようにループ状に構成され
ておれば、特に高周波発振器より高周波信号を入
力しなくても発振することは明かであり、また第
1図〜第3図の様に直線状であつても1,2,3
の両端末を適当なインピーダンスで終端して発振
させることは可能である。この時の発振周波数は
主として加熱管の長さ或いはループ長に依存す
る。この電磁波は電離気体中を伝搬するから、伝
搬につれてその電磁エネルギの一部は電離気体中
の電子および正イオン間のクーロン衝突等を介し
て電離気体に吸収され、プラズマ温度およびプラ
ズマ密度が上昇する。その結果プラズマによる減
衰が増加し、これが3極真空管形能動的分布結合
線路の利得を越える様になれば、加熱管に沿う加
熱電磁波の伝搬は損失伝搬となり、プラズマ温度
およびプラズマ密度は低下する。結局プラズマに
よる減衰と3極真空管形能動的分布結合線路によ
る利得とが平衡するようなプラズマ温度およびプ
ラズマ密度の状態で加熱電磁波は無利得、無損失
伝搬を持続する。従つて3極真空管形能動的分布
結合線路の利得特性即ち単位長当りの真空管定
数、3電極導体間の単位長当りの静電容量ならび
にインダクタンスおよび加熱管の長さ或いはルー
プ長を適当に設定すれば、任意の周波数の加熱電
磁波によりプラズマを所要の温度および密度に加
熱することが出来る。また加熱電磁波のエネルギ
はバイアス直流電源5により直接供給されるか
ら、容易に高出力の加熱電磁波を得ることが可能
である。 First, considering the case where the ionization degree of the ionized gas in 4 is sufficiently low, since electrode conductors 1, 2, and 3 have the function of a triode vacuum tube, the vacuum tube constant (or Y-parameter per unit length) ) and the capacitance and inductance between 1, 2, and 3. When a certain condition (gain propagation condition) is satisfied, the electromagnetic wave is 1,
2 and 3 in a gain manner. If 1, 2,
If 3 is configured in a loop as shown in Fig. 4 shown later, it is clear that it will oscillate even without inputting a high frequency signal from a high frequency oscillator, and also as shown in Figs. 1 to 3. 1, 2, 3 even in a straight line
It is possible to cause oscillation by terminating both terminals with appropriate impedance. The oscillation frequency at this time mainly depends on the length of the heating tube or loop length. This electromagnetic wave propagates through the ionized gas, so as it propagates, part of the electromagnetic energy is absorbed by the ionized gas through Coulomb collisions between electrons and positive ions in the ionized gas, increasing the plasma temperature and plasma density. . As a result, the attenuation due to the plasma increases, and if this exceeds the gain of the triode vacuum tube active distributed coupling line, the propagation of the heating electromagnetic wave along the heating tube becomes loss propagation, and the plasma temperature and plasma density decrease. In the end, the heating electromagnetic wave continues to propagate without gain and loss at a plasma temperature and plasma density where the attenuation by the plasma and the gain by the triode vacuum tube active distributed coupling line are in balance. Therefore, the gain characteristics of the triode vacuum tube active distributed coupling line, that is, the vacuum tube constant per unit length, the capacitance per unit length between the three electrode conductors, the inductance, and the length of the heating tube or loop length must be set appropriately. For example, plasma can be heated to a desired temperature and density using heating electromagnetic waves of any frequency. Furthermore, since the energy of the heating electromagnetic waves is directly supplied by the bias DC power supply 5, it is possible to easily obtain high-output heating electromagnetic waves.
さらに高温度高密度のプラズマを密閉容器4の
壁面より隔離するため、第1図〜第3図に示すよ
うに外部磁界を加えてプラズマを閉ぢ込める必要
がある。第1図は外部磁界の方向7が加熱電磁波
の伝搬方向と一致している場合を示し第2図およ
び第3図は両者の方向が直角な場合を示す。この
ように外部磁界が存在する場合は、加熱電磁波の
周波数の高低により、第1図の場合は右回り円偏
波、左回り円偏波、ホイスラー波、アルペン波等
の、また第2図および第3図の場合は異常波、正
常波、高域混成波、低域混成波等の各種の姿態が
伝搬可能である。しかるに本発明の場合は3極真
空管形能動的分布結合線路の電極導体の構造を適
当に設計することにより、上記各種伝送姿態のう
ち任意の1姿態のみを利得伝搬とし、他の姿態を
損失伝搬とすることが出来るのでプラズマの安定
性が向上すると云う利点がある。 Furthermore, in order to isolate the high-temperature, high-density plasma from the wall surface of the closed container 4, it is necessary to confine the plasma by applying an external magnetic field as shown in FIGS. 1 to 3. FIG. 1 shows the case where the direction 7 of the external magnetic field coincides with the propagation direction of the heating electromagnetic wave, and FIGS. 2 and 3 show the case where both directions are perpendicular to each other. When an external magnetic field exists in this way, depending on the frequency of the heating electromagnetic wave, it can produce clockwise circularly polarized waves, counterclockwise circularly polarized waves, Whistler waves, Alpine waves, etc. in the case of Fig. 1, as well as Fig. 2 and In the case of FIG. 3, various forms such as abnormal waves, normal waves, high-frequency hybrid waves, and low-frequency hybrid waves can be propagated. However, in the case of the present invention, by appropriately designing the structure of the electrode conductor of the triode vacuum tube type active distributed coupling line, only one of the above various transmission modes is set as gain propagation, and the other modes are set as loss propagation. This has the advantage of improving plasma stability.
第4図および第5図は本発明に係るプラズマ加
熱装置の実施例で、第4図はループ状構成の、第
5図は直線状構成の例であるが、ループ状である
か直線状であるかは本発明の本質的問題ではな
い。第4図の切断面は一点鎖線A―Bでループ状
加熱管を切断しループの軸方向に見た時の切断面
で、切断面に示す1′,1″,2,3,がループ状
に配置されている。また第4図の5および8の配
線は説明を明瞭にするため切断面図に直接に接続
して示した。図中の数字はすべて第1図〜第3図
に対応しているが、3極真空管の陰極に対応する
電極導体1は加熱管の断面図で示しているように
主陰極1′と補助陰極1″に分かれ、両陰極間の補
助放電によりプラズマ形成が容易となるように配
慮されている。従つて補助放電用直流電源8が必
要となる。 4 and 5 show embodiments of the plasma heating device according to the present invention. FIG. 4 shows an example of a loop configuration, and FIG. 5 shows an example of a linear configuration. Whether or not there is one is not an essential problem of the present invention. The cut plane in Figure 4 is the cut plane when the loop-shaped heating tube is cut along the dashed line A-B and viewed in the axial direction of the loop. Wirings 5 and 8 in Figure 4 are shown connected directly to the cross-sectional view for clarity. All numbers in the figure correspond to Figures 1 to 3. However, the electrode conductor 1 corresponding to the cathode of the triode vacuum tube is divided into a main cathode 1' and an auxiliary cathode 1'', as shown in the cross-sectional view of the heating tube, and plasma formation is caused by the auxiliary discharge between the two cathodes. It is designed to be easy. Therefore, an auxiliary discharge DC power source 8 is required.
特に第1図のように外部磁界の方向7と3極真
空管形能動的分布結合線路の電極導体間に加える
バイアス電圧によつて生ずる静電界の方向9とが
直角な場合は、荷電粒子は7と9とに直角な方向
10にドリフトを生ずるので、第4図に示すよう
に加熱管をループ状に構成することが望ましい。 In particular, when the direction 7 of the external magnetic field and the direction 9 of the electrostatic field generated by the bias voltage applied between the electrode conductors of the triode vacuum tube type active distributed coupling line are perpendicular to each other as shown in FIG. Since drift occurs in a direction 10 perpendicular to and 9, it is desirable to construct the heating tube in a loop shape as shown in FIG.
また電極導体の構造が同軸状の場合には、上記
ドリフトのため荷電粒子は外部磁界の方向を軸と
して螺線運動を行うので、前述の加熱電磁波の円
偏波伝搬姿態も考慮して、第5図に示すように電
極構造を螺線状に構成することが望ましい。 Furthermore, when the structure of the electrode conductor is coaxial, the charged particles perform a spiral motion with the direction of the external magnetic field as the axis due to the above-mentioned drift. It is desirable that the electrode structure be configured in a spiral shape as shown in FIG.
以上説明したように、本発明の加熱方式はプラ
ズマ加熱管自体が加熱電磁波を利得的に伝搬する
機能を有し、プラズマによる加熱電磁波エネルギ
の吸収を上記利得作用によつて補償し、上記利得
特性と外部磁界により生ずる各種伝搬姿態とを適
当に組合せることにより、任意の周波数の加熱電
磁波により安定な高温度高密度プラズマを得るこ
とが出来るばかりでなく、加熱管自体が高周波発
振源であるから、特別に高周波発振器を用いるこ
となく、容易に高出力の加熱電磁波を得ることが
出来るので加熱装置の構成が簡単で且つ経済性も
高いと言う利点がある。 As explained above, in the heating method of the present invention, the plasma heating tube itself has a function of propagating the heating electromagnetic wave in a gain manner, and the absorption of the heating electromagnetic wave energy by the plasma is compensated for by the gain effect, and the gain characteristic described above is By appropriately combining various propagation modes caused by external magnetic fields, it is possible not only to obtain stable high-temperature, high-density plasma using heating electromagnetic waves of any frequency, but also because the heating tube itself is a source of high-frequency oscillation. Since high-output heating electromagnetic waves can be easily obtained without using a special high-frequency oscillator, the heating device has the advantage of being simple in construction and highly economical.
第1図〜第3図は本発明に係るプラズマ加熱方
式の原理説明図、第4図、第5図は本発明に係る
プラズマ加熱方式の実施例の構成図である。
1,2,3……3極真空管形能動的分布結合線
路を構成する電極導体で、それぞれ3極真空管の
陰極、格子、陽極に該当する、1′,1″……プラ
ズマ形成を容易にするために設けられた補助放電
用主陰極と補助陰極で、両者を合せて1に相当す
る、4……プラズマを外気より遮断するための密
閉容器、5……3極真空管形能動的分布結合線路
にバイアス電圧を供給するための直流電源、6…
…外部磁界発生装置、7……外部磁界の方向、8
……補助放電を起こさせるための直流電源、9…
…バイアス電圧により電極導体間に生ずる静電界
の方向、10……上記静電界と外部静磁界のため
に生ずる荷電粒子のドリフトの方向。
1 to 3 are diagrams explaining the principle of the plasma heating method according to the present invention, and FIGS. 4 and 5 are configuration diagrams of an embodiment of the plasma heating method according to the present invention. 1, 2, 3... Electrode conductors that constitute a triode vacuum tube type active distributed coupling line, corresponding to the cathode, lattice, and anode of the triode vacuum tube, respectively. 1', 1''... facilitate plasma formation. A main cathode and an auxiliary cathode for auxiliary discharge, both of which together correspond to 1, 4... an airtight container for shielding the plasma from the outside air, 5... a triode vacuum tube type active distributed coupling line DC power supply for supplying bias voltage to 6...
... External magnetic field generator, 7 ... Direction of external magnetic field, 8
...DC power supply for causing auxiliary discharge, 9...
...The direction of the electrostatic field generated between the electrode conductors by the bias voltage, 10...The direction of the drift of charged particles caused by the above-mentioned electrostatic field and external static magnetic field.
Claims (1)
布結合線路を利得伝搬状態とし、これを低圧気体
または電離気体中に封入したプラズマ加熱管にお
いて、上記能動的分布結合線路の伝搬方向に平行
または直角方向の静磁界を外部より加え、上記能
動的分布結合線路に沿つてプラズマ中を伝搬する
加熱電磁波の減衰を上記能動的分布結合線路の有
する利得伝搬特性により補償し、且つ外部磁界の
強さならびに方向を適当に設定して望ましい伝送
姿態のみを伝搬せしめ、任意の周波数の加熱電磁
界により安定なプラズマ加熱を行ない、プラズマ
加熱管自体を加熱電磁波の発振源とすることを特
徴とするプラズマ加熱方式。1. In a plasma heating tube in which a vacuum tube type active distributed coupling line consisting of three or more conductor systems is set in a gain propagation state and is enclosed in a low pressure gas or ionized gas, parallel to the propagation direction of the active distributed coupling line or A static magnetic field in a perpendicular direction is externally applied, the attenuation of the heating electromagnetic wave propagating in the plasma along the active distributed coupling line is compensated for by the gain propagation characteristic of the active distributed coupling line, and the strength of the external magnetic field is Plasma heating is characterized in that only a desired transmission mode is propagated by appropriately setting the direction and direction, stable plasma heating is performed by a heating electromagnetic field of an arbitrary frequency, and the plasma heating tube itself is used as an oscillation source of heating electromagnetic waves. method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55161095A JPS5784587A (en) | 1980-11-13 | 1980-11-13 | Plasma heating system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP55161095A JPS5784587A (en) | 1980-11-13 | 1980-11-13 | Plasma heating system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5784587A JPS5784587A (en) | 1982-05-26 |
| JPS6362080B2 true JPS6362080B2 (en) | 1988-12-01 |
Family
ID=15728506
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP55161095A Granted JPS5784587A (en) | 1980-11-13 | 1980-11-13 | Plasma heating system |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5784587A (en) |
-
1980
- 1980-11-13 JP JP55161095A patent/JPS5784587A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5784587A (en) | 1982-05-26 |
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