JPS6364889B2 - - Google Patents
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- Publication number
- JPS6364889B2 JPS6364889B2 JP16914282A JP16914282A JPS6364889B2 JP S6364889 B2 JPS6364889 B2 JP S6364889B2 JP 16914282 A JP16914282 A JP 16914282A JP 16914282 A JP16914282 A JP 16914282A JP S6364889 B2 JPS6364889 B2 JP S6364889B2
- Authority
- JP
- Japan
- Prior art keywords
- weight
- capacitance
- breakdown voltage
- semiconductor ceramic
- bdv
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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- 239000004065 semiconductor Substances 0.000 claims description 20
- 239000000203 mixture Substances 0.000 claims description 15
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 claims description 12
- 238000010405 reoxidation reaction Methods 0.000 claims description 12
- 239000003985 ceramic capacitor Substances 0.000 claims description 11
- 230000015556 catabolic process Effects 0.000 description 14
- 239000003990 capacitor Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 229910052573 porcelain Inorganic materials 0.000 description 5
- 239000000919 ceramic Substances 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 3
- 230000001603 reducing effect Effects 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229910052761 rare earth metal Inorganic materials 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Landscapes
- Ceramic Capacitors (AREA)
- Inorganic Insulating Materials (AREA)
- Insulating Bodies (AREA)
Description
本発明は還元再酸化型半導体磁器コンデンサ用
組成物に関する。
従来、還元再酸化型半導体磁器コンデンサは、
BaTiO3系磁器に希土類元素あるいはNbやTa等
を加え、酸化性あるいは中性若しくは還元性雰囲
気中で還元熱処理して半導体化し、これを再酸化
処理して半導体磁器表面を絶縁体化し、その表面
に銀電極を形成したものが実用に供されている。
しかしながら、この種のコンデンサは静電容量を
大きくすれば破壊電圧が小さくなると共に誘電体
損失が大きくなり、逆に破壊電圧を向上させると
静電容量が小さくなるという欠点があつた。この
欠点を改善することを目的として、特公昭56−
40965号公報にて、BaTiO3を基体とし、これに
Bi2O31〜4重量%、ZrO21.6〜5重量%、Mn0.01
〜0.10重量%添加して成り、かつZrO2の添加量
(y)とBi2O3の添加量(x)との間に、x−1
(重量%)≦y≦+3(重量%)の関係があり、
Mnの添加量(z)とBi2O3の添加量(x)との
間に重量比でz/x≦20%の関係があることを特
徴とする還元再酸化型半導体磁器組成物を使用す
ることが提案された。この組成物を用いた還元再
酸化型半導体磁器コンデンサは、小型大容量で誘
電体損失が小さく、破壊電圧が大きいなど優れた
特性を示すものの、破壊電圧のバラツキが大き
く、高周波(1MHz付近)での誘電体損失が大き
いことから、用途が限られるという問題があつ
た。
本発明は、このような問題に鑑みてなされたも
のであつて、破壊電圧が高くてバラツキも少な
く、また高周波での誘電体損失が少ない小型大容
量の還元再酸化型半導体磁器コンデンサを得るこ
とができる組成物を提供することを目的とするも
のである。
すなわち、本発明は、Ba(TilNbn)O3(但し、
1.02≦l≦1.07、0.002≦m≦0.008)85〜95モル
%、および(Ba1-oSro)ZrO3(但し、0.1≦n≦
0.3)5〜15モル%を基体とし、これにBi2O31〜
4重量%、Mn0.03〜0.1重量%を添加してなる還
元再酸化型半導体磁器コンデンサ用組成物、をそ
の要旨とするものである。
本発明において、前記の如く組成範囲を限定し
たのは次の理由による。
すなわち、lを1.02〜1.07の範囲内に限定した
のは、この範囲外では静電容量および/または破
壊電圧が低下するからであり、mを0.002〜0.008
の範囲にしたのは、mが0.002未満では高周波域
での誘電体損失が増大し、0.008を超えるとバラ
ツキが大きくなつて同一ロツトでの最小破壊電圧
が低下するからである。また、nを0.1〜0.3の範
囲としたのは、nが0.1未満ではBDVnioが充分に
向上せず、0.3を超えると静電容量が低下するか
らである。
また、Bi2O3の添加量を1〜4重量%としたの
は、Bi2O3が1重量%未満では磁器が還元されに
くく、再酸化温度で磁器全体が容易に再酸化され
るため静電容量が小さくなり、4重量%を超える
と、静電容量が小さくなるからである。さらに、
Mnの添加量を0.03〜0.1重量%としたのは、Mn
が0.03%未満では静電容量と絶縁抵抗が共に小さ
くなり、破壊電圧も小さくなり、0.1重量%を超
えると静電容量が小さくなるからである。
以下、本発明を実施例に従つて説明する。
実施例 1
BaCO3、Nb2O5およびTiO2を原料とし、これ
らをBa(Ti1.03Nb0.003)O3の組成比になるように
秤量、混合する一方、BaCO3、SrCO3および
ZrO2を(Ba0.90Sr0.10)ZrO3の組成比になるよう
に秤量、混合し、両混合物をそれぞれ1150℃で仮
焼する。生成したBa(Ti1.03Nb0.003)O3、(Ba0.90
Sr0.10)ZrO3、Bi2O3およびMnO2を第1表に示す
割合で混合し、バインダと共に粉砕して整粒し、
プレスにて1000Kg/cm2の加圧下、直径10mm、厚さ
0.5mmの円板に成形する。これを空気中1320℃で
焼成した後、水素15%、窒素85%の容量比からな
る還元性雰囲気中1200℃で2時間還元処理して半
導体化し、そのまま還元雰囲気で冷却する。次い
で、空気中1050℃で30分間加熱して再酸化処理
し、このようにして得た半導体磁器素子の両表面
に銀ペーストを塗布後、乾燥させ、空気中800℃
で5分間焼付け処理して、内部が半導体で表面に
再酸化による絶縁層からなる還元再酸化型半導体
磁器からなるコンデンサを得た。
このようにして得た各還元再酸化型半導体磁器
コンデンサについて、静電容量、破壊電圧
(BDV)および1MHzでの誘電正接(tanδ)を測
定した。それらの結果を第1表に組成と共に示
す。なお、BDV()は試料数100個について破
壊電圧の平均値で、BDV(min)はそれらの中の
最低破壊電圧である。
実施例 2
実施例1と同様にしてBa(Ti1.05Nb0.006)O3
(Ba0.80Sr0.20)ZrO3を生成させ、これらをBi2O3、
およびMn(MnO2換算)と共に第2表に示す割合
で混合し、実施例1と同様にして還元再酸化型半
導体磁器コンデンサを得た。それらの静電容量、
破壊電圧、誘電正接を第2表に合わせて示す。
The present invention relates to a composition for a reduction and reoxidation type semiconductor ceramic capacitor. Conventionally, reduction and reoxidation type semiconductor ceramic capacitors are
Rare earth elements or Nb, Ta, etc. are added to BaTiO 3 -based porcelain, and it is made into a semiconductor through reduction heat treatment in an oxidizing, neutral, or reducing atmosphere, and then re-oxidized to make the surface of the semiconductor porcelain an insulator. One in which a silver electrode is formed is in practical use.
However, this type of capacitor has the disadvantage that increasing the capacitance reduces the breakdown voltage and increases dielectric loss, and conversely, increasing the breakdown voltage decreases the capacitance. In order to improve this drawback, the special public
In Publication No. 40965, BaTiO 3 is used as a substrate, and this
Bi 2 O 3 1-4% by weight, ZrO 2 1.6-5% by weight, Mn0.01
~0.10% by weight, and between the amount of ZrO 2 added (y) and the amount of Bi 2 O 3 added (x), x-1
There is a relationship of (weight%)≦y≦+3 (weight%),
A reduction and reoxidation type semiconductor ceramic composition is used, which is characterized in that there is a relationship between the amount of Mn added (z) and the amount of Bi 2 O 3 added (x) in a weight ratio of z/x≦20%. It was proposed to do so. Although reduction-reoxidation type semiconductor ceramic capacitors using this composition exhibit excellent characteristics such as small size, large capacity, low dielectric loss, and high breakdown voltage, they have large variations in breakdown voltage and are difficult to use at high frequencies (around 1MHz). Due to the large dielectric loss of the material, there was a problem that its applications were limited. The present invention has been made in view of these problems, and it is an object of the present invention to obtain a small, large-capacity reduction-reoxidation type semiconductor ceramic capacitor with high breakdown voltage, little variation, and low dielectric loss at high frequencies. The purpose of this invention is to provide a composition that allows for That is, the present invention provides Ba(Ti l Nb n )O 3 (however,
1.02≦l≦1.07, 0.002≦m≦0.008) 85 to 95 mol%, and (Ba 1-o Sro ) ZrO 3 (however, 0.1≦n≦
0.3) 5 to 15 mol% as a base material, and 1 to 15% of Bi 2 O 3
The gist thereof is a composition for a reduction and reoxidation type semiconductor ceramic capacitor, which contains 4% by weight of Mn and 0.03 to 0.1% by weight of Mn. In the present invention, the composition range is limited as described above for the following reason. In other words, l is limited to a range of 1.02 to 1.07 because capacitance and/or breakdown voltage decreases outside this range, and m is limited to a range of 0.002 to 0.008.
The reason for choosing this range is that when m is less than 0.002, the dielectric loss in the high frequency range increases, and when it exceeds 0.008, the variation increases and the minimum breakdown voltage in the same lot decreases. Further, the reason why n is set in the range of 0.1 to 0.3 is that if n is less than 0.1, the BDV nio will not be sufficiently improved, and if n exceeds 0.3, the capacitance will decrease. Furthermore, the reason why the amount of Bi 2 O 3 added was set at 1 to 4% by weight is because if Bi 2 O 3 is less than 1% by weight, porcelain is difficult to be reduced, and the entire porcelain is easily reoxidized at the reoxidation temperature. This is because the capacitance becomes small, and if it exceeds 4% by weight, the capacitance becomes small. moreover,
The reason why the amount of Mn added was set to 0.03 to 0.1% by weight was because Mn
If it is less than 0.03% by weight, both the capacitance and insulation resistance will be small, and the breakdown voltage will also be small, and if it exceeds 0.1% by weight, the capacitance will be small. Hereinafter, the present invention will be explained according to examples. Example 1 BaCO 3 , Nb 2 O 5 and TiO 2 were used as raw materials, and these were weighed and mixed to have a composition ratio of Ba(Ti 1.03 Nb 0.003 ) O 3 , while BaCO 3 , SrCO 3 and
ZrO 2 is weighed and mixed to have a composition ratio of (Ba 0.90 Sr 0.10 )ZrO 3 , and both mixtures are calcined at 1150°C. The generated Ba(Ti 1.03 Nb 0.003 )O 3 , (Ba 0.90
Sr 0.10 ) ZrO 3 , Bi 2 O 3 and MnO 2 are mixed in the proportions shown in Table 1, crushed together with a binder and sized,
Under pressure of 1000Kg/cm 2 in a press, diameter 10mm, thickness
Form into a 0.5mm disc. After firing this in air at 1320°C, it is reduced to a semiconductor at 1200°C for 2 hours in a reducing atmosphere consisting of 15% hydrogen and 85% nitrogen by volume, and then cooled in the reducing atmosphere. Next, the semiconductor ceramic element thus obtained was heated for 30 minutes at 1050°C for reoxidation treatment, and silver paste was applied to both surfaces of the thus obtained semiconductor ceramic element, dried, and heated at 800°C for 30 minutes in the air.
The capacitor was baked for 5 minutes to obtain a capacitor made of reduced and reoxidized semiconductor porcelain with a semiconductor inside and an insulating layer formed by reoxidation on the surface. The capacitance, breakdown voltage (BDV), and dielectric loss tangent (tan δ) at 1 MHz were measured for each reduction and reoxidation type semiconductor ceramic capacitor thus obtained. The results are shown in Table 1 along with the composition. Note that BDV () is the average value of breakdown voltage for 100 samples, and BDV (min) is the lowest breakdown voltage among them. Example 2 Ba(Ti 1.05 Nb 0.006 )O 3 in the same manner as Example 1
(Ba 0.80 Sr 0.20 )ZrO 3 is generated, and these are converted into Bi 2 O 3 ,
and Mn (in terms of MnO 2 ) in the proportions shown in Table 2 to obtain a reduced and reoxidized semiconductor ceramic capacitor in the same manner as in Example 1. their capacitance,
The breakdown voltage and dielectric loss tangent are also shown in Table 2.
【表】【table】
【表】
比較例 1
BaCO3、TiO2を秤量、混合し、1150℃で2時
間仮焼してBaTiO3を作る一方、BaCO3、ZrO2を
秤量、混合し、1150℃で2時間仮焼しBaZrO3を
作り、BaTiO390モル%、BaZrO310モル%との
混合物に、Bi2O3 3重量%、TiO210重量%、
Mn0.05重量%添加後、バインダ(ビニル樹脂)
3.5重量%を加えて整粒し、直径10mm、厚さ0.5mm
の円板に成形した。この円板を実施例1を同条件
下で焼成、還元および再酸化処理した後、銀ペー
ストを塗布し、800℃で焼付けて電極とし、還元
再酸化型半導体磁器コンデンサを得た。その静電
容量は150nF/cm2、BDV()は、1.1KV、BDV
(min)は0.4KV、tanδ(1MHz)は18%であつた。
比較例 2
実施例1で用意したBa(Ti1.03Nb0.003)O390モ
ル%と、比較例1で用意したBaZrO310モル%と
の混合物に、Bi2O32重量%、Mn(MnO2換算)
0.05重量%を添加し、実施例1と同様にして還元
再酸化型半導体磁器コンデンサを得た。その静電
容量は155nF/cm2、BDV()は1.1KV、BDV
(min)は0.5KV、tanδ(1MHz)は13%であつた。
比較例 3
BaTi1.05O390モル%と、(Ba0.80Sr0.20)ZrO310
モル%の混合物に、Bi2O32重量%、Mn0.05重量
%を添加し、実施例1と同様にして還元再酸化型
半導体磁器コンデンサを得た。その静電容量は
150nF/cm2、BDV()は1.2KV、BDV(min)
は0.6KV、tanδ(1MHz)は19%であつた。
第1表および第2表の結果から明らかなよう
に、本発明に係る還元再酸化型半導体磁器組成物
からなるコンデンサは、比較例1の従来のものに
比べ、同じ程度の面積容量であつても、最小破壊
電圧が高くて破壊電圧のバラツキが少なく、高周
波での誘電正接も低く良好な特性を示す。[Table] Comparative Example 1 BaCO 3 and TiO 2 were weighed, mixed, and calcined at 1150°C for 2 hours to produce BaTiO 3. On the other hand, BaCO 3 and ZrO 2 were weighed, mixed, and calcined at 1150°C for 2 hours. Make BaZrO 3 and add 3% by weight of Bi 2 O 3 , 10% by weight of TiO 2 to a mixture of 90% by mole of BaTiO 3 and 10% by mole of BaZrO 3 .
Binder (vinyl resin) after adding 0.05% Mn by weight
Add 3.5% by weight and size the particles to a diameter of 10mm and a thickness of 0.5mm.
It was formed into a disc. This disk was fired, reduced and reoxidized under the same conditions as in Example 1, then coated with silver paste and baked at 800°C to form an electrode, thereby obtaining a reduction and reoxidation type semiconductor ceramic capacitor. Its capacitance is 150nF/ cm2 , BDV() is 1.1KV, BDV
(min) was 0.4KV, and tanδ (1MHz) was 18%. Comparative Example 2 A mixture of 90 mol% of Ba(Ti 1.03 Nb 0.003 )O 3 prepared in Example 1 and 10 mol% of BaZrO 3 prepared in Comparative Example 1 was added with 2% by weight of Bi 2 O 3 and Mn(MnO 2 conversion)
A reduced and reoxidized semiconductor ceramic capacitor was obtained in the same manner as in Example 1 by adding 0.05% by weight. Its capacitance is 155nF/ cm2 , BDV() is 1.1KV, BDV
(min) was 0.5KV, and tanδ (1MHz) was 13%. Comparative example 3 BaTi 1.05 O 3 90 mol% and (Ba 0.80 Sr 0.20 ) ZrO 3 10
2% by weight of Bi 2 O 3 and 0.05% by weight of Mn were added to the mol% mixture, and a reduced and reoxidized semiconductor ceramic capacitor was obtained in the same manner as in Example 1. Its capacitance is
150nF/ cm2 , BDV() is 1.2KV, BDV(min)
was 0.6KV, and tanδ (1MHz) was 19%. As is clear from the results in Tables 1 and 2, the capacitor made of the reduced and reoxidized semiconductor ceramic composition according to the present invention has the same areal capacitance as the conventional capacitor of Comparative Example 1. Also, the minimum breakdown voltage is high, there is little variation in breakdown voltage, and the dielectric loss tangent at high frequencies is low, showing good characteristics.
Claims (1)
0.002≦m≦0.008)85〜95モル%、および
(Ba1-oSro)ZrO3(但し、0.1≦n≦0.3)5〜15モ
ル%を基体とし、これにBi2O31〜4重量%、
Mn0.03〜0.1重量%を添加してなる還元再酸化型
半導体磁器コンデンサ用組成物。1 Ba(Ti l Nb n )O 3 (1.02≦l≦1.07,
0.002≦m≦0.008) 85 to 95 mol%, and (Ba 1-o Sr o )ZrO 3 (however, 0.1≦n≦0.3) 5 to 15 mol% as a base, and Bi 2 O 3 1 to 4 weight%,
A composition for a reduction and reoxidation type semiconductor ceramic capacitor, which contains 0.03 to 0.1% by weight of Mn.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16914282A JPS5957415A (en) | 1982-09-27 | 1982-09-27 | Composition for reduced reoxidized semiconductor porcelain condenser |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16914282A JPS5957415A (en) | 1982-09-27 | 1982-09-27 | Composition for reduced reoxidized semiconductor porcelain condenser |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5957415A JPS5957415A (en) | 1984-04-03 |
| JPS6364889B2 true JPS6364889B2 (en) | 1988-12-14 |
Family
ID=15881060
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16914282A Granted JPS5957415A (en) | 1982-09-27 | 1982-09-27 | Composition for reduced reoxidized semiconductor porcelain condenser |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5957415A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02101998U (en) * | 1989-01-27 | 1990-08-14 |
-
1982
- 1982-09-27 JP JP16914282A patent/JPS5957415A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02101998U (en) * | 1989-01-27 | 1990-08-14 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5957415A (en) | 1984-04-03 |
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