JPS6366900B2 - - Google Patents
Info
- Publication number
- JPS6366900B2 JPS6366900B2 JP59094988A JP9498884A JPS6366900B2 JP S6366900 B2 JPS6366900 B2 JP S6366900B2 JP 59094988 A JP59094988 A JP 59094988A JP 9498884 A JP9498884 A JP 9498884A JP S6366900 B2 JPS6366900 B2 JP S6366900B2
- Authority
- JP
- Japan
- Prior art keywords
- laser beam
- sample
- substrate
- thermal spraying
- melting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000002844 melting Methods 0.000 claims description 16
- 230000008018 melting Effects 0.000 claims description 16
- 239000000758 substrate Substances 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 13
- 238000007751 thermal spraying Methods 0.000 claims description 13
- 239000007921 spray Substances 0.000 description 10
- 230000001133 acceleration Effects 0.000 description 8
- 239000006096 absorbing agent Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000012535 impurity Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000007750 plasma spraying Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000567 combustion gas Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000007784 solid electrolyte Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/137—Spraying in vacuum or in an inert atmosphere
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Coating By Spraying Or Casting (AREA)
Description
【発明の詳細な説明】
本発明は、レーザ溶射法に関し、更に詳しくは
レーザビームを用い溶射する基板にレーザビーム
を直接照射しないで溶射する方法に関するもので
ある。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a laser thermal spraying method, and more particularly to a method of thermal spraying without directly irradiating a substrate with a laser beam using a laser beam.
従来のプラズマ溶射法は、アーク放電で高温な
手段を作り試料を溶融させ、溶射するために電極
の材料が溶射試料中に混入する。また、基板から
遠い距離にあるガンから溶射し吹きつけるために
溶射試料の密着する割合が非常に少なく不経済で
あつた。 In the conventional plasma spraying method, a high-temperature means is created using an arc discharge to melt the sample, and in order to spray the sample, electrode material is mixed into the sprayed sample. Furthermore, because the spraying is carried out from a gun located far from the substrate, the proportion of the sprayed sample that comes into close contact with the substrate is very low, making it uneconomical.
一方、ガス溶射法は、高温度が得られず、高融
点の溶射試料が使用できず、さらに、燃焼ガスの
混入があり、プラズマ溶射法と同様に溶射試料の
密着の割合が非常に少ない。これらは構成上避け
ることのできない大きな欠点である。 On the other hand, in the gas spraying method, a high temperature cannot be obtained, a sprayed sample with a high melting point cannot be used, and furthermore, combustion gas is mixed in, and the rate of adhesion of the sprayed sample is very low, similar to the plasma spraying method. These are major drawbacks that cannot be avoided due to the structure.
本発明は、上記の実情に鑑みなされたもので、
従来の技術上の欠点を解決し、品質上、経済上、
非常に有効なレーザビームを用いる溶射法を提供
することを目的とする。以下、本発明について説
明する。 The present invention was made in view of the above circumstances, and
Solve the conventional technical drawbacks and improve quality and economy.
The purpose is to provide a highly effective thermal spraying method using a laser beam. The present invention will be explained below.
第１図は、本発明のレーザ溶射法の一実施例の
概略構成図である。基板１の表面近くに溶融用レ
ーザビーム２を通し、基板１に直接照射しないよ
うにする。基板１は必要に応じて移動、回転させ
る。この溶融用レーザビーム２の中へ溶射試料５
を通して溶融させる溶射試料加速装置３を置く。
この加速装置３は、どのような加速方法を用いて
も良く、例えば、機械的方法による加速、電界、
磁界による加速、ガスによる加速、超音波による
加速、爆発による加速、もしくは、これらの加速
法の複合加速方法を用いても良い。そして、この
加速装置により任意の角度で基板上に溶射でき
る。 FIG. 1 is a schematic diagram of an embodiment of the laser thermal spraying method of the present invention. A laser beam 2 for melting is passed near the surface of the substrate 1 so as not to directly irradiate the substrate 1. The substrate 1 is moved and rotated as necessary. Thermal spraying sample 5 into this melting laser beam 2
Place the thermal spray sample accelerator 3 through which the sample is melted.
This accelerator 3 may use any acceleration method, for example, mechanical acceleration, electric field,
Acceleration by a magnetic field, acceleration by gas, acceleration by ultrasonic waves, acceleration by explosion, or a composite acceleration method of these acceleration methods may be used. This accelerator allows thermal spraying onto a substrate at any angle.
また、溶融用レーザビーム２を安全に吸収する
レーザ吸収体４を具えている。第１図に示した構
成図は、溶融用レーザビーム２、基板１、溶射試
料加速装置３、必要に応じて基板加熱用ヒータ
８、（他のレーザビームで加熱してもよい）そし
て、レーザビーム吸収体４の位置的関係を示した
もので、夫々の装置の支持体は省いた。 It also includes a laser absorber 4 that safely absorbs the melting laser beam 2. The configuration diagram shown in FIG. 1 includes a melting laser beam 2, a substrate 1, a thermal spray sample accelerator 3, a heater 8 for heating the substrate if necessary (heating may be performed with another laser beam), and a laser beam This figure shows the positional relationship of the beam absorbers 4, and the supports of each device are omitted.
このような構成を用いることにより、従来の溶
射法では行うことができなかつた真空中から高圧
ガス中において溶射を行うことが可能になつた。
経済的には、溶射試料加速装置の窓を調節するこ
とにより微小部の融射が可能である。密着した溶
射層（コーテング面）には不純物の混入がなく、
高品質のものが得られ応用範囲が著しく広がる。
例えば、固体電解質の製造において、安定化した
立方晶のZrO2のコーテング面ができる。この
ZrO2のコーテング面は、高融点で溶射試料が密
着するために安定化した結晶相ができるので熱的
にひずみにも強く、機械的強度もあり、イオン伝
導度も非常に良好である。低融点から超高融点の
溶射試料のコーテングが可能である。 By using such a configuration, it has become possible to perform thermal spraying in a vacuum or in a high-pressure gas, which has not been possible with conventional thermal spraying methods.
Economically, it is possible to thermally spray small areas by adjusting the window of the thermal spray sample accelerator. There are no impurities in the tightly adhered sprayed layer (coating surface),
High quality products can be obtained and the range of applications is significantly expanded.
For example, in the production of solid electrolytes, a coated surface of stabilized cubic ZrO 2 is created. this
The coated surface of ZrO 2 has a high melting point and a stabilized crystalline phase is formed to which the sprayed sample adheres, so it is thermally resistant to strain, has mechanical strength, and has very good ionic conductivity. It is possible to coat thermal sprayed samples with low to very high melting points.
以上説明したように、本発明のレーザ溶射法
は、レーザビームを用いるので溶射試料が低融点
から高融点のものまで、簡単に溶射することがで
き、かつ、レーザビーム中で試料が溶融するので
試料の純度がそのまま保たれれ不用な不純物の混
入がない。 As explained above, since the laser thermal spraying method of the present invention uses a laser beam, it is possible to easily spray samples ranging from low melting points to those with high melting points, and since the samples are melted in the laser beam, The purity of the sample is maintained and no unnecessary impurities are mixed in.
また、ZrO2のように安定化した結晶相もでき、
ガラスのようにアモルフアスもできるという非常
に大きな効果を有するもので、各種分野に大きな
生産手段の改革がもたらされる。 In addition, stabilized crystal phases such as ZrO 2 can also be formed.
It has the great effect of producing amorphous materials like glass, and will bring major reforms to production methods in various fields.
第１図は本発明の方法による一実施例を説明す
るための図である。
図中、１は基板、２は溶融用レーザビーム、３
は溶射試料加速装置、４は溶融用レーザビーム吸
収体、５は溶射試料、６は溶融用レーザビームの
中へ溶射試料が加速され溶融する位置、７は溶射
試料が溶射された面、８は基板加熱用ヒータ（他
のレーザビームによつて直接加熱してもよい）で
ある。
FIG. 1 is a diagram for explaining an embodiment of the method of the present invention. In the figure, 1 is a substrate, 2 is a laser beam for melting, and 3 is a laser beam for melting.
is a thermal spray sample accelerator, 4 is a melting laser beam absorber, 5 is a thermal spray sample, 6 is a position where the thermal spray sample is accelerated into the melting laser beam and melted, 7 is the surface on which the thermal spray sample is sprayed, 8 is a This is a heater for heating the substrate (it may be directly heated by another laser beam).
Claims (1)
当てることなく照射し、前記溶融用レーザビーム
の中に前記基板に対して垂直または必要な角度に
て溶射試料を加速することにより前記溶融用レー
ザビーム中で前記溶射試料を溶融し、この溶射試
料を前記基板上に密着させることを特徴とするレ
ーザ溶射法。1. The melting laser beam is irradiated without directly hitting the substrate to be thermally sprayed, and the melting laser beam is accelerated by accelerating the thermal spraying sample perpendicularly to the substrate or at a necessary angle within the melting laser beam. A laser thermal spraying method characterized in that the thermal spraying sample is melted within the chamber and the thermal spraying sample is brought into close contact with the substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59094988A JPS60238472A (en) | 1984-05-12 | 1984-05-12 | Laser thermal spraying method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59094988A JPS60238472A (en) | 1984-05-12 | 1984-05-12 | Laser thermal spraying method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60238472A JPS60238472A (en) | 1985-11-27 |
| JPS6366900B2 true JPS6366900B2 (en) | 1988-12-22 |
Family
ID=14125264
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59094988A Granted JPS60238472A (en) | 1984-05-12 | 1984-05-12 | Laser thermal spraying method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60238472A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6808755B2 (en) | 1999-10-20 | 2004-10-26 | Toyota Jidosha Kabushiki Kaisha | Thermal spraying method and apparatus for improved adhesion strength |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0621335B2 (en) * | 1988-02-24 | 1994-03-23 | 工業技術院長 | Laser spraying method |
| US4958058A (en) * | 1989-02-08 | 1990-09-18 | General Electric Company | Transverse flow laser spray nozzle |
| US5449536A (en) * | 1992-12-18 | 1995-09-12 | United Technologies Corporation | Method for the application of coatings of oxide dispersion strengthened metals by laser powder injection |
| JP2008031529A (en) * | 2006-07-28 | 2008-02-14 | Fujitsu Ltd | Nanoparticle deposition method and nanoparticle deposition apparatus |
| EP2190621B1 (en) * | 2007-09-11 | 2014-01-22 | TRUMPF Werkzeugmaschinen GmbH + Co. KG | Stream trapping device for a machine tool |
-
1984
- 1984-05-12 JP JP59094988A patent/JPS60238472A/en active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6808755B2 (en) | 1999-10-20 | 2004-10-26 | Toyota Jidosha Kabushiki Kaisha | Thermal spraying method and apparatus for improved adhesion strength |
| US6913207B2 (en) | 1999-10-20 | 2005-07-05 | Toyota Jidosha Kabushiki Kaisha | Thermal spraying method and apparatus for improved adhesion strength |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60238472A (en) | 1985-11-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |