JPS637017B2 - - Google Patents
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- Publication number
- JPS637017B2 JPS637017B2 JP55046878A JP4687880A JPS637017B2 JP S637017 B2 JPS637017 B2 JP S637017B2 JP 55046878 A JP55046878 A JP 55046878A JP 4687880 A JP4687880 A JP 4687880A JP S637017 B2 JPS637017 B2 JP S637017B2
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- Japan
- Prior art keywords
- conductor
- laminated
- film
- composite
- laminate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- Filters And Equalizers (AREA)
Description
【発明の詳細な説明】
本発明は積層複合電子部品、特にインダクタン
スLとコンデンサCとが複合して形成されたLC
複合電子部品に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a laminated composite electronic component, particularly an LC formed by combining an inductance L and a capacitor C.
Regarding composite electronic components.
従来の複合部品はインダクタの寸法が大きくな
り、またインダクタの製法がコンデンサの製法と
全く異なることから複合化及び小型化が困難であ
つた。コンデンサに関しては積層チツプコンデン
サ等が知られているように薄形・小型化が進んで
いるが、インダクタは導線を磁心に巻くことが必
要であるので、積層化、小型化が困難であつた。 In conventional composite parts, the dimensions of the inductor are large, and the manufacturing method for inductors is completely different from the manufacturing method for capacitors, so it has been difficult to make them more complex and smaller. Concerning capacitors, multilayer chip capacitors are known and are becoming thinner and smaller, but inductors require a conductor wire to be wound around a magnetic core, so it has been difficult to make them laminated and smaller.
本発明者はこの問題を解決するため特願昭53−
161221号(特開昭55−91103号公報)等で印刷方
式によるチツプ形積層複合部品を提案した。その
要点を述べると、薄い絶縁基板上にインダクタ用
導体パターン、コンデンサ用導体パターン、誘電
体薄膜、磁性体薄膜等を適当な順序で印刷して積
層して行き、チツプ状の積層体を形成し、焼成
し、積層体の縁辺に露出する導体パターンの末端
に接続するように外部端子を積層体の縁辺部に焼
付けたものであつた。この方式には複合部品の小
型化、大量生産化、コストダウン等の利益を提供
した。しかし、この方式によつても、印刷積層体
は焼成炉において高温で焼成されるから、導電粉
末としては、Pd、Ag−Pd等の高価な耐熱材料が
必要であるし、また高温処理が必要となる。さら
に積層された層はあまり薄く出来ないので、寸法
の減少はまだ不十分であり、大きなL、Cや、均
一特性を得難い等の問題がある。 In order to solve this problem, the inventor filed a patent application in 1973-
No. 161221 (Japanese Unexamined Patent Publication No. 55-91103) and other publications proposed chip-shaped laminated composite parts using a printing method. To explain the main point, conductor patterns for inductors, conductor patterns for capacitors, dielectric thin films, magnetic thin films, etc. are printed and laminated in an appropriate order on a thin insulating substrate to form a chip-shaped laminate. The external terminal was baked on the edge of the laminate so as to be connected to the end of the conductor pattern exposed on the edge of the laminate. This method offered benefits such as miniaturization of composite parts, mass production, and cost reduction. However, even with this method, the printed laminate is fired at a high temperature in a firing furnace, so an expensive heat-resistant material such as Pd or Ag-Pd is required as the conductive powder, and high-temperature treatment is required. becomes. Furthermore, since the laminated layers cannot be made very thin, the reduction in dimensions is still insufficient, and there are problems such as large L and C, and difficulty in obtaining uniform characteristics.
本発明は印刷法によらないで真空薄膜形成技術
を利用して積層LC複合部品を提供することを目
的とする。本発明の方法は焼成工程を必要とせ
ず、またそのために必要な耐熱性金属も用いなく
て済むから、Cu、Al、Ag等の任意の導電材料を
使用できる。また各層の厚みが一様で、しかも薄
くできるとともに寸法精度の良さから、特性が一
様なLC複合部品を得ることができる。 An object of the present invention is to provide a laminated LC composite component using vacuum thin film formation technology without relying on a printing method. Since the method of the present invention does not require a firing step and does not require the use of heat-resistant metals, any conductive material such as Cu, Al, Ag, etc. can be used. In addition, each layer has a uniform thickness, can be made thinner, and has good dimensional accuracy, making it possible to obtain an LC composite component with uniform characteristics.
本発明はスパツタリング法、イオンプレーテイ
ング法、溶射法、イオンビーム法、気相成長法、
真空蒸着法等の真空技術を応用した薄膜形成法を
用いて実施される。インダクタ部分及びコンデン
サ部分の形成にはコイル状の導電パターン及びコ
ンデンサ用電極のための金属と、導電パターン及
び電極を絶縁するための絶縁体とが必要である。 The present invention includes sputtering method, ion plating method, thermal spraying method, ion beam method, vapor growth method,
It is carried out using a thin film forming method that applies vacuum technology such as vacuum evaporation. Formation of the inductor portion and the capacitor portion requires metal for the coil-shaped conductive pattern and capacitor electrode, and an insulator for insulating the conductive pattern and the electrode.
絶縁体としては、コンデンサ部にはTiO2、
Al2O3、BaTiO3、SiO2等の誘電体を使用するこ
とが好ましく、またインダクタ部にはMFe2O4
(M:金属)なるフエライト磁性体を用いること
が好ましい。或いは、特性に応じてすべてを磁性
体或いは誘電体としてもかまわない。上記の薄膜
形成技術は金属膜の形成にすべて利用できる。絶
縁体膜の形成にはスパツタリング法、溶射法、イ
オンプレーテイング法等を用いることができる。
これらの方法の1種以上を用いれば、所要の積層
構造を得ることができる。従つて、本発明の方法
によれば、焼成工程が不要になり、安価な金属の
使用で十分に本発明の目的を達成することができ
る。 As an insulator, TiO 2 is used in the capacitor part,
It is preferable to use dielectric materials such as Al 2 O 3 , BaTiO 3 , SiO 2 , etc., and MFe 2 O 4 in the inductor part.
It is preferable to use a ferrite magnetic material (M: metal). Alternatively, all may be made of magnetic material or dielectric material depending on the characteristics. All of the above thin film formation techniques can be used to form metal films. A sputtering method, a thermal spraying method, an ion plating method, etc. can be used to form the insulating film.
By using one or more of these methods, the desired laminated structure can be obtained. Therefore, according to the method of the present invention, there is no need for a firing step, and the object of the present invention can be sufficiently achieved using inexpensive metals.
本発明の方法で得られる積層LC複合部品の特
徴は、各層の厚みがオングストローム単位
(10-10m)に近いものまで可能になるため、比較
的薄い積層体でも大きな容量或いはインダクタン
スを得ることができること、従つてまた非常に広
範囲の特性値を有する小型積層品が一貫工程で自
由に製造しうることである。 A feature of the laminated LC composite component obtained by the method of the present invention is that the thickness of each layer can be close to the angstrom unit (10 -10 m), so it is possible to obtain large capacitance or inductance even with a relatively thin laminate. This also means that compact laminates with a very wide range of property values can be produced freely in an integrated process.
種々の薄膜形成法のうち、本発明で推賞される
ものはスパツタリング法である。この方法は他の
方法に比してやや遅い膜形成速度を有するが、最
近では高速スパツタリング法も開発されている。
スパツタリング法は絶縁体源または金属源の組成
をほぼそのまま生成膜の組成に移行させることが
できる特徴を持ち、また付着強度が大きく、生成
膜が一様であるので、特に好ましい方法である。
なおスパツタリング法における原子または分子流
の回り込み現象を避けるために、マスクは基板の
面に出来るだけ接近させる。 Among various thin film forming methods, the one recommended in the present invention is the sputtering method. Although this method has a slightly slower film formation rate than other methods, high-speed sputtering methods have recently been developed.
The sputtering method is a particularly preferred method because the composition of the insulator source or metal source can be transferred almost directly to the composition of the produced film, and the adhesion strength is high and the produced film is uniform.
Note that the mask is placed as close to the surface of the substrate as possible in order to avoid a wraparound phenomenon of atomic or molecular flow in the sputtering method.
以下、図面に関連して本発明の実施例を詳しく
説明する。 Embodiments of the invention will now be described in detail with reference to the drawings.
第1図はスパツタリング法の原理を示す図であ
り、10-3〜10-2トール程度のアルゴンガスを封じ
た真空室に、マイナス電極1と接地電極5とを対
向させ、この間に高周波電圧(〜10MHz等)を印
加する。マイナス電極1の面には蒸着しようとす
る金属または酸化物の板2を保持させ、接地電極
5の面には蒸着用の基板4を位置づけ、そして基
板4の面にはマスク3を配置する。高周波電圧
RFを電極1,5の間に印加すると、金属または
酸化物の板2は正イオン化されたガスの衝撃を受
けて金属または酸化物の原子または分子が板2の
表面から放出され、大きな速度で基板4へ向けて
スパツターし薄膜状に付着する。なお、スパツタ
リング法は公知であるから、これ以上詳しい説明
は必要がないと思う。 FIG. 1 is a diagram showing the principle of the sputtering method. A negative electrode 1 and a ground electrode 5 are placed facing each other in a vacuum chamber filled with argon gas of about 10 -3 to 10 -2 Torr, and a high-frequency voltage ( ~10MHz, etc.). A plate 2 of a metal or oxide to be vapor-deposited is held on the surface of the negative electrode 1, a substrate 4 for vapor deposition is placed on the surface of the ground electrode 5, and a mask 3 is placed on the surface of the substrate 4. high frequency voltage
When RF is applied between the electrodes 1 and 5, the metal or oxide plate 2 is bombarded with positively ionized gas, causing metal or oxide atoms or molecules to be ejected from the surface of the plate 2 at a high rate. It is sputtered toward the substrate 4 to form a thin film. Incidentally, since the sputtering method is well known, there is no need for further detailed explanation.
第2図ないし第12図は本発明の第1実施例に
よる積層LC複合部品の製造工程を示す。基板D
に形成される薄膜の形状はマスク3に設けた開口
の形状により規定されるもので、被着すべきパタ
ーンに応じたマスクを複数用意しておき、これら
を適正な順序で用いるものとし、またマイナス電
極に配置する金属源及び磁性または誘電体酸化物
源も適当な順序で交互使用されるものとする。ま
た各マスクには多数の同一形状の開口を形成し
て、多数の積層LC複合部品を同時に製造するこ
とができる。なお基板としては剥離性のある表面
を有する金属板、或いは積層体の1部となる絶縁
体を用いることも可能である。 2 to 12 show the manufacturing process of a laminated LC composite component according to a first embodiment of the present invention. Substrate D
The shape of the thin film formed on the mask 3 is determined by the shape of the opening provided in the mask 3, and multiple masks corresponding to the pattern to be deposited are prepared and used in an appropriate order. The metal source and the magnetic or dielectric oxide source located at the negative electrode shall also be used alternately in an appropriate order. In addition, each mask can be formed with a large number of identically shaped openings to simultaneously manufacture a large number of laminated LC composite parts. Note that as the substrate, it is also possible to use a metal plate having a removable surface or an insulator that becomes part of a laminate.
先ず第2図を参照する。Al2O3、SiO2等の酸化
物絶縁体、より好ましくは絶縁性の磁性フエライ
トより成る酸化物源を用いて、先ず酸化物膜10
を基板4の面に被着させる。次にAl、Ag、Niま
たはCu等の金属源を酸化物源と置き換え、また
マスクを交換した上、第3図のように酸化物膜1
0の右寄りの位置に末端が酸化物膜10の下辺に
露出するようにして導体11を形成する。次に第
4図のように、導体11の上端のみを残して酸化
物膜10の下方を覆うように膜10と同じ素材の
酸化物膜12を形成する。次に導体11と同じ素
材の導体13を導体11の端部に接続し積層体の
左辺側に延びるようにして形成する。次に第6図
のように導体13の一端のみを残して積層体の上
方を覆うように形成する。次で第7図のように導
体13の端部から積層体の右辺側に延びる導体1
5を形成する。導体15の末端は積層体の上辺に
露出させる。次に第8図のように第2図と同様な
絶縁体16を積層体の全面に被着させる。次にコ
ンデンサ部の形成工程に移り、第9図のように積
層体の上辺に露出する部分を有するようにAl、
Ni、Cu、Ag等の電極膜17を形成し、その上に
第10図のようにTiO2、BaTiO3等の誘電体膜1
8を形成し、さらに第11図のように下側の電極
17に重畳すると共に積層体の下辺に露出する電
極膜19を形成する。積層が終つたら、真空室か
ら積層体を取出し、第12−13図のように上下
側辺に導電ペースト(半田適性を有する任意の金
属粉末を含有するペースト)を焼付けて外部端子
21,22を形成する、これにより第14図の等
価回路を有する積層LC複合部品が得られる。 First, refer to FIG. First, an oxide film 10 is formed using an oxide source made of an oxide insulator such as Al 2 O 3 or SiO 2 , more preferably an insulating magnetic ferrite.
is deposited on the surface of the substrate 4. Next, the metal source such as Al, Ag, Ni or Cu was replaced with an oxide source, the mask was replaced, and the oxide film 1 was removed as shown in Figure 3.
A conductor 11 is formed at a position to the right of 0 so that its end is exposed on the lower side of the oxide film 10. Next, as shown in FIG. 4, an oxide film 12 made of the same material as the film 10 is formed to cover the lower part of the oxide film 10, leaving only the upper end of the conductor 11. Next, a conductor 13 made of the same material as the conductor 11 is connected to the end of the conductor 11 so as to extend toward the left side of the laminate. Next, as shown in FIG. 6, the conductor 13 is formed so as to cover the upper part of the laminate, leaving only one end of the conductor 13. Next, as shown in FIG. 7, a conductor 1 extends from the end of the conductor 13 to the right side of the laminate.
form 5. The ends of the conductors 15 are exposed on the upper side of the laminate. Next, as shown in FIG. 8, an insulator 16 similar to that shown in FIG. 2 is applied over the entire surface of the laminate. Next, we move on to the process of forming the capacitor part, and as shown in FIG.
An electrode film 17 of Ni, Cu, Ag, etc. is formed, and a dielectric film 1 of TiO 2 , BaTiO 3 , etc. is formed thereon as shown in FIG.
8 is formed, and further an electrode film 19 is formed which overlaps the lower electrode 17 and exposes the lower side of the stacked body as shown in FIG. After the lamination is completed, take out the laminate from the vacuum chamber and bake conductive paste (paste containing any metal powder suitable for soldering) on the upper and lower sides as shown in Figures 12-13 to attach external terminals 21 and 22. A laminated LC composite component having the equivalent circuit shown in FIG. 14 is thereby obtained.
第15−22図は本発明の第2実施例を示す。
第15図のように先ず基板上に絶縁性のある磁性
体膜31をスパツタリング法で形成し、次で第1
6図のようにコイル兼コンデンサ用導体32及び
コンデンサ用導体33をスパツタリング法で被着
する。この際に、導体35の一端34は磁性体膜
31の右辺に露出し、他側は鉤形に彎曲して36
に終端する。一方、導体33は導体32の直線部
35との間に容量を形成するように導体35に沿
つて延びる部分37と磁性体膜31の上辺に露出
する引出端38を有する。次に第17図に示すよ
うに、導体35の一端36を残して磁性膜31の
全面に誘導体または磁性体膜39を被着し、次に
導体35の一端36に連続する導体40を被着す
る。このときその端部41は磁性又は誘電体膜3
9の上まで延びる。次に第19図のように導体4
0の端部41を残して図の下半分に磁性体膜42
を形成し、さらに第20図のように第16図に似
た導体43,45を形成する。このとき導体43
は46に引出され、また導体43の左端は積層体
の左辺に引出される。第21図のように、全面に
磁性体膜50を被着して積層を終る。次に、積層
体を真空室から取出して第22図のようにコイル
用導体の両端引出部及びコンデンサ用導体の引出
部にそれぞれ接続する導電ペーストを焼付けて外
部端子46,47,48とする。こうして得られ
る積層LC複合部品の等価回路は第23図に示さ
れている。この部品はフイルター等として使用で
きる。 Figures 15-22 show a second embodiment of the invention.
As shown in FIG. 15, an insulating magnetic film 31 is first formed on the substrate by sputtering, and then a first
As shown in FIG. 6, a coil/capacitor conductor 32 and a capacitor conductor 33 are deposited by sputtering. At this time, one end 34 of the conductor 35 is exposed on the right side of the magnetic film 31, and the other end is curved into a hook shape.
terminates in On the other hand, the conductor 33 has a portion 37 extending along the conductor 35 so as to form a capacitance with the linear portion 35 of the conductor 32, and a lead-out end 38 exposed on the upper side of the magnetic film 31. Next, as shown in FIG. 17, a dielectric or magnetic film 39 is deposited on the entire surface of the magnetic film 31, leaving one end 36 of the conductor 35, and then a conductor 40 continuous to one end 36 of the conductor 35 is deposited. do. At this time, the end portion 41 of the magnetic or dielectric film 3
Extends to above 9. Next, as shown in Figure 19, conductor 4
A magnetic film 42 is placed in the lower half of the figure, leaving the edge 41 of 0.
Further, conductors 43 and 45 similar to that shown in FIG. 16 are formed as shown in FIG. 20. At this time, the conductor 43
is led out to 46, and the left end of the conductor 43 is led out to the left side of the laminate. As shown in FIG. 21, a magnetic film 50 is deposited on the entire surface to complete the lamination. Next, the laminate is taken out of the vacuum chamber, and as shown in FIG. 22, external terminals 46, 47, and 48 are formed by baking conductive paste to be connected to both ends of the coil conductor and the capacitor conductor, respectively. The equivalent circuit of the laminated LC composite component thus obtained is shown in FIG. This part can be used as a filter, etc.
以上のように、本発明はLC複合機能を有する
複合部品を薄膜形成技術により一貫した工程で製
造することができる利益を提供する。積層体の各
層は極く薄いものであるから製品の寸法は小型化
され、また積層数の増減で自由に所望の特性を得
ることができる。本積層LC複合部品はプリント
基板への直づけや、自動半田づけに適する。 As described above, the present invention provides the advantage that a composite part having LC composite functions can be manufactured in a consistent process using thin film forming technology. Since each layer of the laminate is extremely thin, the dimensions of the product can be reduced, and desired characteristics can be freely obtained by increasing or decreasing the number of laminated layers. This laminated LC composite component is suitable for direct attachment to printed circuit boards and automatic soldering.
第1図は本発明の方法を実施するための装置の
1例を示す正面図、第2図ないし第12図は本発
明の第1実施例の順次工程を示す平面図、第13
図は第12図の縦断面図、第14図は第12−1
3図の積層LC複合部品の等価回路図、第15図
ないし第21図は本発明の第2実施例の順次工程
を示す平面図、第22図は完成した積層LC複合
部品の斜視図、及び第23図は第22図の部品の
等価回路図である。図中主な部分は次の通りであ
る。
10,12,14,16,18,20:絶縁体
膜、11,13,15:導体、17,19:電極
膜、31,39,42,50:絶縁体膜、46,
47,48:外部端子。
FIG. 1 is a front view showing an example of an apparatus for carrying out the method of the present invention, FIGS. 2 to 12 are plan views showing sequential steps of the first embodiment of the present invention, and FIG.
The figure is a vertical cross-sectional view of Figure 12, and Figure 14 is a vertical cross-sectional view of Figure 12-1.
3 is an equivalent circuit diagram of the laminated LC composite component, FIGS. 15 to 21 are plan views showing the sequential steps of the second embodiment of the present invention, FIG. 22 is a perspective view of the completed laminated LC composite component, and FIG. 23 is an equivalent circuit diagram of the components shown in FIG. 22. The main parts in the figure are as follows. 10, 12, 14, 16, 18, 20: Insulator film, 11, 13, 15: Conductor, 17, 19: Electrode film, 31, 39, 42, 50: Insulator film, 46,
47, 48: External terminals.
Claims (1)
互積層する工程A、及び絶縁体層とコンデンサ形
成用電極パターンとを交互積層する工程Bとを任
意の順序で含む真空技術を用いた薄膜形成手段に
よる積層複合部品の製造方法において、前記工程
Aにおけるコイル形成パターンは約半ターン分の
導体であつて、絶縁体層間での前記半ターン分の
導体は端部を重畳して接続されるものであり、さ
らに工程A、Bで積層後に、前記A、Bにおける
導体パターン及び電極パターンに接続する外部接
続手段を積層体の一部に形成したことを特徴とす
る積層LC複合部品の製造方法。 2 薄膜形成手段がスパツタリング法であること
を特徴とする特許請求の範囲第1項記載の積層
LC複合部品の製造方法。[Scope of Claims] 1. A vacuum technique comprising a step A of alternately laminating insulator layers and a conductor pattern for forming a coil, and a step B of alternately laminating an insulator layer and an electrode pattern for forming a capacitor in any order. In the method for manufacturing a laminated composite component by a thin film forming means using the method, the coil forming pattern in the step A is a conductor for about half a turn, and the half turn of the conductor between the insulating layers overlaps the ends. A laminated LC composite characterized in that, after lamination in steps A and B, external connection means for connecting to the conductor patterns and electrode patterns in A and B are formed in a part of the laminated body. How the parts are manufactured. 2. The lamination according to claim 1, wherein the thin film forming means is a sputtering method.
Method of manufacturing LC composite parts.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4687880A JPS56144524A (en) | 1980-04-11 | 1980-04-11 | Method of manufacturing laminated composite part |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4687880A JPS56144524A (en) | 1980-04-11 | 1980-04-11 | Method of manufacturing laminated composite part |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56144524A JPS56144524A (en) | 1981-11-10 |
| JPS637017B2 true JPS637017B2 (en) | 1988-02-15 |
Family
ID=12759606
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4687880A Granted JPS56144524A (en) | 1980-04-11 | 1980-04-11 | Method of manufacturing laminated composite part |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56144524A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH04140909A (en) * | 1990-10-01 | 1992-05-14 | Taiyo Yuden Co Ltd | Composite type lc filter |
| JP3073035B2 (en) * | 1991-02-21 | 2000-08-07 | 毅 池田 | LC noise filter |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5242608B2 (en) * | 1973-07-11 | 1977-10-25 | ||
| JPS6029214B2 (en) * | 1977-07-11 | 1985-07-09 | 株式会社村田製作所 | Manufacturing method of multilayer capacitor |
| JPS5543869A (en) * | 1978-09-22 | 1980-03-27 | Matsushita Electric Industrial Co Ltd | Through type condenser |
-
1980
- 1980-04-11 JP JP4687880A patent/JPS56144524A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS56144524A (en) | 1981-11-10 |
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