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JPS63736B2 - - Google Patents
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JPS63736B2 - - Google Patents

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Publication number
JPS63736B2
JPS63736B2 JP56207632A JP20763281A JPS63736B2 JP S63736 B2 JPS63736 B2 JP S63736B2 JP 56207632 A JP56207632 A JP 56207632A JP 20763281 A JP20763281 A JP 20763281A JP S63736 B2 JPS63736 B2 JP S63736B2
Authority
JP
Japan
Prior art keywords
gas
tin oxide
detector
grain size
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56207632A
Other languages
Japanese (ja)
Other versions
JPS58106450A (en
Inventor
Tadashi Tonomura
Satoshi Sekido
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP56207632A priority Critical patent/JPS58106450A/en
Publication of JPS58106450A publication Critical patent/JPS58106450A/en
Publication of JPS63736B2 publication Critical patent/JPS63736B2/ja
Granted legal-status Critical Current

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Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/02Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance
    • G01N27/04Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance
    • G01N27/12Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating impedance by investigating resistance of a solid body in dependence upon absorption of a fluid; of a solid body in dependence upon reaction with a fluid, for detecting components in the fluid
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N10/00Thermoelectric devices comprising a junction of dissimilar materials, i.e. devices exhibiting Seebeck or Peltier effects

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analyzing Materials By The Use Of Fluid Adsorption Or Reactions (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

本発明は膜状酸化錫をNO2ガス感応体とする
NO2ガス検知器を用いたNO2ガス検知方法に関
し感度および応答速度共に優れたNO2ガス検知
方法を提供することを目的とする。 従来、NO2ガスの正確、簡便かつ連続的な測
定法として、例えば米国特許明細書第4169369号
において提案されているように酸化錫薄膜をガス
感応体とするNOXガス(NO2およびNOガス)の
検知器がある。このガス検知器は、いわゆる半導
体式ガス検知器の範疇に属し、電子吸引性の酸化
性ガスである例えばNO2,NO,O2が、n型半導
体である酸化錫感応体に吸着することで、その酸
化スズ感応体の電気抵抗を、それらのガス濃度に
比例して増加させる現象を利用したものである。
なお、この現象は金属酸化物半導体の性質として
理化学分野において以前から広く知られている現
象である。この半導体式ガス検知器は、ガス濃度
に比例して電気抵抗が増減する感応体と、この電
気抵抗変化を外部信号として取り出すための一対
の電極と、感応体を適切な温度下で働かすための
加熱源とで構成される、きわめて簡単な構造を有
している。このように構造がきわめて簡単である
半導体式ガス検知器の性能(選択性、感度、応答
速度)を決定するのは、ひとつは、感応体を構成
する物質の材料物性であり、もうひとつは、感応
体と被検ガスとが作用し合う温度である。 すなわち、今仮に同一の物質を感応体として用
いたとしても、その形状あるいは内部構造により
規定される表面構造の違いによりもたらされる材
料物性の違いは、ガス検知器の特性の違いとなつ
て顕著に現われる。また、同一の物質、同一の材
料物性の感応体を用いたとしても動作温度によ
り、ガス検知器としての特性は大きく異なつてく
る。これを理解するのは、一般に言われているよ
うにガス検知の機構が、感応体と被検ガスとの化
学的な相互作用を伴つていることを考えれば難し
いことではない。 前記米国特許明細書第4169369号では、感応体
を構成する材料として従来から良く知られている
物質である酸化錫のうち、その酸化状態を規定し
た材料を用いることで、NOXガスに特に選択性
の優れたNOXガス検知器を提案している。また、
動作温度については、150〜300℃が好適であると
述べられている。しかしながら、ガス検知器とし
ての主要な特性である感度と応答速度について
は、酸化錫の材料物性としての好適値は知り難い
し、また、動作温度の好適値を述べている、300
℃以上では応答速度は速くなるが、“オーバシユ
ート”を生じ、また150℃以下では、低濃度のガ
スでは応答速度が遅くなると述べられているのみ
で、“オーバシユート”とは何を意味するのか、
前記検知器の性能について“オーバシユート”が
どのような影響を与えるのか全く記述されておら
ず、動作温度の上限が何故300℃であるのか、ガ
ス検知器の技術分野に精通した技術者であつても
これを知ることは至難である。 以上のように、従来、酸化錫をガス感応物質と
したNOXガス検知器において、ガス感度および
応答速度に対して好適な物性を備えた酸化錫ガス
感応材料は知られていないばかりか、検知器の動
作温度についてその好適値は知り難く、酸化錫を
感応体とするNOXガス検知器を実用に供するの
に大きな難点があつた。また、従来のように動作
温度を300℃以下にすることは排気ガスの温度の
実態から見て検知器を冷却する必要が生ずること
があり、加熱だけをすればよい場合と較べて検知
器が複雑(高価)となることは避けられない。 本発明は、以上のような点に鑑みてなされたも
ので酸化錫を感応体とするNO2ガス検知器につ
いて酸化錫感応体として好適な材料を提供するこ
とにより、感度、応答速度共に優れたNO2ガス
検知方法を提供しようとするものである。すなわ
ち本発明では、好適な酸化錫感応体材料として
SnO2結晶のX線回折図において2θ=26.6゜(θは回
折角)付近に現われる(110)面に相当する回折
ピークの半値巾より、デバイ・シエーラー式(結
晶粒子径D=Kλ/βcosθ,Kは1に近い係数、λ
は回折測定に用いたX線波長、β=B−b、Bは
被検体の半値巾、bは回折装置に固有の値であり
十分結晶粒の発達した例えば粒径が10〜50μの
SiO2単結晶粉末の回折ピークの半値巾)で与え
られる結晶粒子径が100〜140Åである膜状に形成
された酸化錫が選ばれる。そして、酸化錫感応体
材料を用いたNO2ガス検知器の動作温度として
300〜400℃で好適に選ばれる。 以下に本発明の実施例を説明する。 第1図は、本発明の実施例の1つである、結晶
粒子径が100〜140Åである酸化錫感応体を備えた
NO2ガス検知器を示す。図において3は表面粗
さが約2.5μの厚さ0.5mm、縦5mm、横5mmの大き
さの純度96%のアルミナ基板である。4はこのア
ルミナ基板3の片方の面に白金を主体とする導電
ペーストを塗布して焼き付けることで得られる約
60Ωの抵抗体より成る面状ヒーターであり、これ
により検知器は定められた一定の動作温度に保持
される。5は面状ヒーター4に電力を供給するた
めの線径0.5mmの白金線より成るリード線、2は
白金を主体とする導電性ペーストを、アルミナ基
板3のもう一方の面に、アルミナ基板3の中央部
が0.5mm巾の溝で露出する形状に印刷焼き付けら
れたガス感応体の電気信号を外部に取り出すたの
電極である。8は電極2とともに焼き付け固定さ
れたCA(クロメル―アルメル)線よりなるガス感
応体の温度測定用の熱電対である。7は電極2用
の線径0.5mmの白金線よりなるリード線である。
1が本発明に従う結晶粒子径が100〜140Åである
酸化錫膜より成るNO2ガス感応体である。 前記酸化錫膜は、例えば純度99.99%、100メツ
シユパス100%の金属錫粉末より成る直径150mmの
ターゲツト材料を用いて、電極間距離40mm、アル
ゴンガス圧1.25pa(パスカル)、酸素ガス圧
1.25pa、アルミナ基板温度〜120℃、電力400W、
電圧2.55KVで、30分間スパツタリングを行うこ
とで得た酸化スズ薄膜を、空気中605℃で2時間
加熱焼成することで与えられる。第2図は、この
ようにして得られた酸化錫膜を、管電流200mA、
管電圧50KVで銅を対陰極としてX線回折により
得られる2θ=20〜35゜の回折図である。SnO2特有
の(110)結晶面に相当する回折ピークが2θ=
26.6゜に得られる。あお、2θ=25.6゜付近の鋭い回
折ピークは基板のアルミナに帰属されるピークで
ある。前記酸化錫膜の結晶粒径Dは、次のように
先述したデバイ・シエーラー式を用いて求められ
る。 D=Kλ/(B−b)cosθ……デバイ・シエー
ラー式 この式において、K1.0、λ=1.5405Å、θ
=26.6/2、B=0.80(第2図に示した2θ=26.6゜
の回折ピークの半値巾)、b=0.13(第3図に示し
た、第2図を得た同一のX線回折装置で得られた
粒径〜43μのSiO2結晶粉末の2θ=31゜の回折ピーク
の半値巾)を代入すると となる。前記酸化錫膜の結晶粒子径が135Åであ
ることがわかる。 以上の方法により酸化錫膜の結晶粒子径が決定
されるが、結晶粒子径の異なる酸化錫膜を感応体
とした検知器について、本発明の効果を見るため
に、第4図に示すガス応答特性測定装置を用いて
NO2ガス応答特性を評価した。 なお第4図において11はサンプルガス供給タ
ンク、12はサンプルガス用流量計、13はサン
プルガス溜め、14はキヤリアガス(N2あるい
は乾燥空気)供給タンク、15は第1キヤリアガ
ス溜め、16はキヤリアガス用ポンプ、17はキ
ヤリアガス用流量計、18は第2キヤリアガス溜
め、19はガス分折計、20はガス切り換え電磁
弁、21はガス検知室、22はガス検知器、23
はヒータ用電源、24はヒータ温度コントロー
ラ、25はガス検知器抵抗測定装置、26は測定
ガス用流量計、27は測定ガス吸引用ポンプであ
る。 さて第4図に示した装置を用いるのに際しては
NO2サンプルガスの濃度は、株式会社柳本製作
所製の化学発光法を用いたガス分折計、MODEL
SAE―5149により測定の都度較正された。キヤ
リアーガス(希釈ガス)として窒素、あるいは気
温約20℃、相対湿度50〜70%の大気を用いた。ポ
ンプ16により毎分2の割合でキヤリアーガス
をガス流路に招き入れながら、第1図に示したガ
ス検知器の熱電対8が結線されたヒーター温度コ
ントローラー24によりあらかじめ設定された動
作温度に保持された後、ガス切り換え電磁弁20
の操作によりサンプルガス溜め13から、あらか
じめ所定の濃度に希釈しておいたNO2サンプル
ガスをポンプ27で吸引することで2/分の流
量でガス流路に入れられる。この際のガス検知器
22の電気抵抗の変化が立ち上り特性としてガス
検知器の電気抵抗測定装置25を介して記録され
る。 ここでガス検知器の電気抵抗測定装置の回路構
成を第5図に示す。なお第5図において、28は
ガス検知器22に抵抗(1MΩ)29を介し直流
電圧1Vを印加するための電源、30はインピー
ダンス変換器、31は記録計である。 さて次に電気抵抗値が一定値RGに達した後、
再びガス切換電磁弁20を操作することで、キヤ
リアーガスを同じくポンプ26で、2/分の流
量で招き入れ、キヤリアーガスとの置換を行う。
この際のガス検知器22の電気抵抗の変化が立ち
下り特性として記録される。 ガス置換の際のガス検知器の温度変化は、キヤ
リアガス、サンプルガス共、流量ガ2/分の同
一値に規制されているため。±1℃以下に保持さ
れる。次に、電気抵抗が一定値、RO、に達した
後、先程とは異なつた濃度に変化させておいたサ
ンプルガスを用いて同様のことが行われる。なお
ガス検知器22が配置されているガス検知室22
の容積は約200c.c.であり、サンプルガスとキヤリ
アガスとの置換は遅くとも約6秒間で完結する。 第6図はこのような測定装置を用いてキヤリア
ーガスとして、気温20℃、相対湿度62%の大気を
用い、NO2ガス濃度20ppm、動作温度190〜500
℃としたときの、結晶粒径が73,81,85,104,
120,135,142,146,159Åである酸化錫膜を感
応体とする、第1図1に示した構造を有したガス
検知器のRG/ROで与えられるガス感度Sと、サ
ンプルガス導入30秒後のガス感応膜の抵抗値RG
30を用いて RG(30)/RO−1/(RG/RO−1)×100で与えられる
立ち上り率 SA30の積S×SA(30)の動作温度依存性を示す。 また第7図は、第6図と同様のキヤリアーガス
を用い動作温度390℃においてNO2ガス濃度を0.6
〜40ppmの間で変化させたときのRG/ROで与え
られる感度Sの対数logSを縦軸に、NO2ガス濃
度CNO2の対数logCNO2を横軸にプロツトした際得
られる直線の傾きΔlogS/ΔlogCNO2と結晶粒径の
大きさの関係を示す図である。なお第7図におい
て、粒径100Å以下の酸化錫膜を用いたものにつ
いては、動作温度390℃では、S1であり
ΔlogS/ΔlogCNO2を求めることは出来なかつた。 第6図および第7図から明らかなように、本ガ
ス検知器においては、感度および応答速度は、感
応体として用いる酸化錫膜の結晶粒径と、感応膜
を被検ガスであるNO2ガスと作用させる温度と
に大きく依存している。 本発明は、以上述べてきた本ガス検知器の感度
および応答速度の酸化錫膜の結晶粒径に対する依
存性および動作温度に対する依存性を示す事実に
基づきなされており、本発明に従い、結晶粒径が
10〜140Åである酸化錫膜を感応体とするガス検
知器を300〜400℃の温度で動作することで、感
度・応答速度共に優れた。NO2ガス検知方式を
提供できる。 すなわち、第7図7に示されるΔlogS/
ΔlogCNO2値は、結晶粒径が140Å以下では〜0.4の
ほぼ一定値を示し、NO2ガス感度は、140Å以上
のものと較べると極端に優れているし、また結晶
粒径が100Å以上では、第6図で明らかなように、
動作温度300〜400℃ではS×SA(30)値は、最大
値を与え、ガス検知器として最大性能を発揮する
ことができる。 本発明に従い、結晶粒径が100〜140Åである酸
化錫膜を感応体するNO2ガス検知器を動作温度
300〜400℃で動作させることで、最大感度、最大
応答速度を有したNO2ガス検知が可能となる。 なお、本発明の効果を見るための結晶粒径が
73,81,85,104,120,135,142,146,159Åで
ある酸化錫膜は先述した金属錫粉をターゲツトと
したスパツタハング法により酸化錫膜を形成し、
これを大気中で加熱焼成する工程において、スパ
ツタリング時のアルミナ基板温度と加熱焼成時の
温度を下の表の通りに選ぶことで得たものであ
る。 なおいづれも膜厚みは300〜3300Åである。
The present invention uses filmy tin oxide as a NO 2 gas sensitizer.
The purpose of this invention is to provide a NO 2 gas detection method using an NO 2 gas detector that has excellent sensitivity and response speed. Conventionally, as an accurate, simple and continuous measurement method for NO 2 gas, NO X gas (NO 2 and NO ) is available. This gas detector belongs to the category of so-called semiconductor-type gas detectors, and is produced by adsorbing electron-attracting oxidizing gases such as NO 2 , NO, and O 2 onto a tin oxide sensitizer, which is an n-type semiconductor. , which utilizes a phenomenon in which the electrical resistance of the tin oxide sensitive material increases in proportion to the concentration of those gases.
Note that this phenomenon has long been widely known in the physical and chemical fields as a property of metal oxide semiconductors. This semiconductor type gas detector consists of a sensitive body whose electrical resistance increases or decreases in proportion to the gas concentration, a pair of electrodes for extracting this electrical resistance change as an external signal, and a sensor for operating the sensitive body at an appropriate temperature. It has an extremely simple structure consisting of a heating source. The performance (selectivity, sensitivity, response speed) of a semiconductor gas detector, which has an extremely simple structure, is determined by, on the one hand, the physical properties of the materials that make up the sensitive body, and on the other hand, This is the temperature at which the sensitive body and the gas to be detected interact with each other. In other words, even if the same material were used as a sensitive material, differences in material properties caused by differences in surface structure defined by its shape or internal structure would lead to noticeable differences in the characteristics of gas detectors. appear. Furthermore, even if the same substance and the same material properties are used, the characteristics of the gas detector will vary greatly depending on the operating temperature. This is not difficult to understand if one considers that the gas detection mechanism involves chemical interaction between the sensitive body and the gas to be detected, as is generally said. In the above-mentioned US Patent No. 4,169,369, a material specifically selected for NO We are proposing a NOx gas detector with excellent performance. Also,
Regarding the operating temperature, it is stated that 150 to 300°C is suitable. However, it is difficult to know the appropriate values for the material properties of tin oxide in terms of sensitivity and response speed, which are the main characteristics of a gas detector.
It only states that above 150°C, the response speed becomes faster, but "overshoot" occurs, and below 150°C, the response speed becomes slower with low concentration gas. What does "overshoot" mean?
There is no description of how "overshoot" affects the performance of the detector, and even an engineer familiar with the technical field of gas detectors does not know why the upper limit of operating temperature is 300℃. However, it is extremely difficult to know this. As mentioned above, in conventional NO It is difficult to know the optimum operating temperature for the device, and this poses a major difficulty in putting into practical use NOx gas detectors that use tin oxide as a sensor. In addition, if the operating temperature is kept below 300℃ as in the past, it may be necessary to cool the detector due to the actual temperature of the exhaust gas, which makes the detector It is inevitable that it will be complicated (and expensive). The present invention has been made in view of the above points, and by providing a suitable material as a tin oxide sensitive material for an NO 2 gas detector using tin oxide as a sensitive material, it is possible to achieve excellent sensitivity and response speed. The present invention attempts to provide a NO 2 gas detection method. That is, in the present invention, as a suitable tin oxide sensitizer material,
From the half-width of the diffraction peak corresponding to the (110) plane that appears around 2θ = 26.6° (θ is the diffraction angle) in the X-ray diffraction diagram of SnO 2 crystal, the Debye-Schierer formula (crystal particle diameter D = Kλ / β cos θ, K is a coefficient close to 1, λ
is the X-ray wavelength used for diffraction measurement, β = B - b, B is the half-width of the specimen, and b is a value specific to the diffraction device.
Tin oxide formed in a film shape with a crystal particle diameter of 100 to 140 Å given by the half width of the diffraction peak of SiO 2 single crystal powder is selected. And, as the operating temperature of NO2 gas detector using tin oxide sensitizer material,
Suitably selected at 300-400°C. Examples of the present invention will be described below. Figure 1 shows one of the embodiments of the present invention, which is equipped with a tin oxide sensitizer having a crystal particle size of 100 to 140 Å.
Showing NO 2 gas detector. In the figure, 3 is a 96% pure alumina substrate with a surface roughness of about 2.5μ, a thickness of 0.5 mm, a length of 5 mm, and a width of 5 mm. 4 is obtained by applying a conductive paste mainly composed of platinum to one side of this alumina substrate 3 and baking it.
A sheet heater consisting of a 60Ω resistor maintains the detector at a fixed operating temperature. 5 is a lead wire made of platinum wire with a wire diameter of 0.5 mm for supplying power to the sheet heater 4; 2 is a conductive paste mainly composed of platinum; The central part of the electrode is printed with a shape exposed through a 0.5 mm wide groove, and the electrical signals from the gas sensitive body are taken out to the outside. Reference numeral 8 denotes a thermocouple for measuring the temperature of the gas sensitive body, which is made of a CA (chromel-alumel) wire and is baked and fixed together with the electrode 2. 7 is a lead wire for the electrode 2 made of platinum wire with a wire diameter of 0.5 mm.
1 is a NO 2 gas sensitive material made of a tin oxide film having a crystal grain size of 100 to 140 Å according to the present invention. The tin oxide film is formed using, for example, a target material with a diameter of 150 mm made of metallic tin powder with a purity of 99.99% and a 100 mesh pass, with a distance between electrodes of 40 mm, an argon gas pressure of 1.25 pa (pascal), and an oxygen gas pressure of 1.25 pa (pascal).
1.25pa, alumina substrate temperature ~120℃, power 400W,
It is produced by heating and baking a tin oxide thin film obtained by sputtering for 30 minutes at a voltage of 2.55 KV at 605°C in air for 2 hours. Figure 2 shows that the tin oxide film obtained in this way was exposed to a tube current of 200 mA.
It is a diffraction pattern of 2θ=20 to 35° obtained by X-ray diffraction using copper as an anticathode at a tube voltage of 50 KV. The diffraction peak corresponding to the (110) crystal plane peculiar to SnO 2 is 2θ=
Obtained at 26.6°. A sharp diffraction peak near 2θ=25.6° is a peak attributed to alumina of the substrate. The crystal grain size D of the tin oxide film is determined using the Debye-Scherer equation described above as follows. D=Kλ/(B-b)cosθ……Debye-Scherer equation In this equation, K1.0, λ=1.5405Å, θ
= 26.6/2, B = 0.80 (half-width of the diffraction peak at 2θ = 26.6° shown in Figure 2), b = 0.13 (same X-ray diffraction device as shown in Figure 3 that obtained Figure 2) Substituting the half-width of the diffraction peak at 2θ = 31° of the SiO 2 crystal powder with a particle size of ~43μ obtained in becomes. It can be seen that the crystal grain size of the tin oxide film is 135 Å. Although the crystal grain size of the tin oxide film is determined by the above method, the gas response shown in Fig. using a characteristic measuring device
The NO 2 gas response characteristics were evaluated. In Fig. 4, 11 is a sample gas supply tank, 12 is a flow meter for sample gas, 13 is a sample gas reservoir, 14 is a carrier gas (N 2 or dry air) supply tank, 15 is a first carrier gas reservoir, and 16 is for carrier gas. pump, 17 is a carrier gas flow meter, 18 is a second carrier gas reservoir, 19 is a gas spectrometer, 20 is a gas switching solenoid valve, 21 is a gas detection chamber, 22 is a gas detector, 23
24 is a heater temperature controller, 25 is a gas detector resistance measuring device, 26 is a flow meter for measuring gas, and 27 is a pump for suctioning gas to be measured. Now, when using the device shown in Figure 4,
The concentration of NO 2 sample gas was measured using a gas spectrometer using chemiluminescence method, MODEL manufactured by Yanagimoto Seisakusho Co., Ltd.
Each measurement was calibrated according to SAE-5149. Nitrogen or the atmosphere with a temperature of about 20°C and relative humidity of 50 to 70% was used as a carrier gas (diluent gas). While the carrier gas is introduced into the gas flow path at a rate of 2 per minute by the pump 16, the operating temperature is maintained at a preset operating temperature by the heater temperature controller 24 to which the thermocouple 8 of the gas detector shown in FIG. 1 is connected. After that, open the gas switching solenoid valve 20.
By this operation, the NO 2 sample gas, which has been diluted in advance to a predetermined concentration, is sucked from the sample gas reservoir 13 by the pump 27 and introduced into the gas flow path at a flow rate of 2/min. The change in electrical resistance of the gas detector 22 at this time is recorded as a rise characteristic via the electrical resistance measuring device 25 of the gas detector. Here, the circuit configuration of the electrical resistance measuring device of the gas detector is shown in FIG. In FIG. 5, 28 is a power source for applying a DC voltage of 1 V to the gas detector 22 through a resistor (1 MΩ) 29, 30 is an impedance converter, and 31 is a recorder. Now, after the electrical resistance value reaches a certain value R G ,
By operating the gas switching solenoid valve 20 again, carrier gas is introduced at a flow rate of 2/min using the same pump 26 to replace the carrier gas.
The change in electrical resistance of the gas detector 22 at this time is recorded as a falling characteristic. The temperature change in the gas detector during gas replacement is regulated to the same flow rate of ga2/min for both carrier gas and sample gas. Maintained below ±1℃. Next, after the electrical resistance reaches a certain value, R O , the same thing is done using the sample gas, which has been changed to a different concentration. Note that the gas detection chamber 22 in which the gas detector 22 is arranged
The volume of the sample gas is about 200 c.c., and the replacement of the sample gas with the carrier gas is completed in about 6 seconds at the latest. Figure 6 shows that using such a measuring device, air temperature is 20℃ and relative humidity is 62% as the carrier gas, NO 2 gas concentration is 20ppm, and operating temperature is 190 to 500.
When the crystal grain size is 73, 81, 85, 104,
The gas sensitivity S given by R G /R O of a gas detector with the structure shown in Figure 1, which uses a tin oxide film of 120, 135, 142, 146, and 159 Å as a sensitive material, and the sample gas Resistance value of gas sensitive membrane R G after 30 seconds of introduction
30 is used to show the operating temperature dependence of the product S×S A (30) of the rise rate S A 30 given by R G (30)/R O −1/(R G /R O −1)×100. . In addition, Fig. 7 shows that using the same carrier gas as in Fig. 6, the NO 2 gas concentration was reduced to 0.6 at an operating temperature of 390°C.
The slope of the straight line obtained when the vertical axis is the logarithm logS of the sensitivity S given by R G /R O when changing between ~40 ppm, and the logarithm logC NO2 of NO 2 gas concentration C NO2 is plotted on the horizontal axis. FIG. 3 is a diagram showing the relationship between ΔlogS/ΔlogC NO2 and crystal grain size. In FIG. 7, for the case using a tin oxide film with a grain size of 100 Å or less, at an operating temperature of 390° C., S1 was obtained, and ΔlogS/ΔlogC NO2 could not be determined. As is clear from FIGS. 6 and 7, in this gas detector, the sensitivity and response speed are determined by the crystal grain size of the tin oxide film used as the sensitive body and the sensitivity of the sensitive film to NO 2 gas, which is the gas to be detected. It is highly dependent on the temperature at which it is applied. The present invention has been made based on the fact that the sensitivity and response speed of the gas detector of the present invention depend on the crystal grain size of the tin oxide film and on the operating temperature. but
By operating a gas detector using a 10-140 Å tin oxide film as a sensitive material at a temperature of 300-400°C, it achieved excellent sensitivity and response speed. Can provide NO 2 gas detection method. That is, ΔlogS/ shown in FIG.
The ΔlogC NO2 value shows a nearly constant value of ~0.4 when the grain size is 140 Å or less, and the NO 2 gas sensitivity is extremely superior when compared to those over 140 Å, and when the grain size is 100 Å or more, As is clear from Figure 6,
At an operating temperature of 300 to 400° C., the S×S A (30) value has a maximum value, and the gas detector can exhibit maximum performance. According to the present invention, a NO 2 gas detector using a tin oxide film as a sensitizer with a grain size of 100-140 Å is operated at an operating temperature of
By operating at 300-400℃, NO 2 gas detection with maximum sensitivity and maximum response speed is possible. In addition, the crystal grain size to see the effect of the present invention is
The tin oxide film with a thickness of 73, 81, 85, 104, 120, 135, 142, 146, and 159 Å was formed by the above-mentioned sputter hanging method using the metal tin powder as a target.
In the process of heating and firing this in the atmosphere, the alumina substrate temperature during sputtering and the temperature during heating and firing were selected as shown in the table below. In each case, the film thickness is 300 to 3300 Å.

【表】 さらに、本発明に従う結晶粒径が100〜140Åで
ある酸化錫膜として、先述したいわゆるスパツタ
リング法による膜厚みが数1000Åの膜でも良く、
また金属錫を酸素ガスふん囲気中で加熱蒸発させ
るいわゆるガス中蒸着法で得られる膜厚みが数μ
に及ぶ酸化錫膜、さらには、SnO4をアンモニア
水で加水分解して得られるα―スズ酸あるいは金
属スズ微粉末を濃硝酸中で酸化することで得られ
るβ―スズ酸の白色沈澱物を、低アルカリガラス
粉末と混合して得られたペーストを印刷・焼付し
て得られる膜厚み数μの酸化錫膜であつても良
く、いづれの膜であつても本発明に従うNO2
ス検知方法において第6図および第7図に示した
のと同様の効果を与える。 なお先述したガス中蒸着法においては、結晶粒
径が100〜140Åを与える酸素ガス圧として0.1〜
0.5Torrが好適に選ばれる。 また、α―スズ酸を印刷・焼成する方法におい
ては、焼成温度450〜620℃で本発明に従う結晶粒
径が100〜140Åの酸化錫膜を得ることができる。 さらにβ―スズ酸を印刷・焼成する方法では焼
成温度400〜450℃で本発明に従う酸化錫膜が得ら
れる。 次に第8図は、スパツタリング法により得られ
た結晶粒径が120Åである酸化錫膜を感応体とす
るNO2ガスセンサーの動作温度390℃における窒
素ガス中における各種ガス特性を示す。 第8図から明らかなように、本発明に従う
NO2ガス検知方法は、通常の化石燃料を大気中
で燃焼する際に発生する燃焼ガスの雰囲気下
(NO2;30〜40ppm、NO;〜500ppm、CO;〜
100ppm、O2;〜10000ppm、残N2)においては、
NO2ガス濃度の変化に選択的に応答する。 以上のように本発明のNO2ガス検知方法は、
選択性の高い、高感度かつ高応答性を示すNO2
ガス測定を可能とする。また、本発明により従来
提案されている。150〜300℃という動作温度を
300〜400℃と動作温度を高くできることは実用上
ガス検知器と作用する前の排気ガスの冷却を不必
要とする利点をも有している。
[Table] Furthermore, as the tin oxide film having a crystal grain size of 100 to 140 Å according to the present invention, a film having a thickness of several thousand Å formed by the so-called sputtering method described above may be used.
In addition, the film thickness obtained by the so-called vapor deposition method in which metal tin is heated and evaporated in an oxygen gas atmosphere is several micrometers thick.
In addition, a white precipitate of α-stannic acid obtained by hydrolyzing SnO 4 with aqueous ammonia or β-stannic acid obtained by oxidizing fine metallic tin powder in concentrated nitric acid. The NO 2 gas detection method according to the present invention may be a tin oxide film with a thickness of several μm obtained by printing and baking a paste obtained by mixing with a low-alkali glass powder. In this case, the same effect as shown in FIGS. 6 and 7 is obtained. In addition, in the above-mentioned in-gas vapor deposition method, the oxygen gas pressure that gives the crystal grain size of 100 to 140 Å is 0.1 to 1.
0.5Torr is preferably chosen. Furthermore, in the method of printing and firing α-stannic acid, a tin oxide film having a crystal grain size of 100 to 140 Å according to the present invention can be obtained at a firing temperature of 450 to 620°C. Further, in the method of printing and firing β-stannic acid, the tin oxide film according to the present invention can be obtained at a firing temperature of 400 to 450°C. Next, FIG. 8 shows various gas characteristics in nitrogen gas at an operating temperature of 390° C. of an NO 2 gas sensor using a tin oxide film with a crystal grain size of 120 Å obtained by sputtering as a sensitive material. As is clear from FIG. 8, according to the present invention
The NO 2 gas detection method is performed under the atmosphere of combustion gases generated when normal fossil fuels are burned in the atmosphere (NO 2 : 30-40 ppm, NO: ~500 ppm, CO: ~
100ppm, O 2 ; ~10000ppm, remaining N 2 ),
Selectively responds to changes in NO2 gas concentration. As described above, the NO 2 gas detection method of the present invention is
NO 2 with high selectivity, high sensitivity, and high responsiveness
Enables gas measurement. The present invention has also been proposed in the past. Operating temperature of 150~300℃
Being able to raise the operating temperature to 300 to 400°C also has the advantage that in practice it is not necessary to cool the exhaust gas before it interacts with the gas detector.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例において用いられる
NO2ガス検知器の断面図、第2図は酸化錫膜の
X線回折図、第3図は酸化シリコン結晶粉末のX
線回折図、第4図はガス応答特性測定装置の構成
を示すブロツク図、第5図はガス検知器の電気抵
抗測定装置の回路構成を示す図、第6図〜第8図
は本発明の効果を説明するための図で、このうち
第6図は各種粒径の酸化錫膜の動作温度とガス感
度との関係を示し、第7図は結晶粒径とガス感度
との関係を示し第8図は各種ガスに対するガス検
知特性を示す。 1…ガス感応体、2…電極、3…基板、4…面
状ヒータ。
FIG. 1 is used in one embodiment of the present invention.
A cross-sectional view of the NO 2 gas detector, Figure 2 is an X-ray diffraction diagram of a tin oxide film, and Figure 3 is an X-ray diffraction diagram of a silicon oxide crystal powder.
4 is a block diagram showing the configuration of the gas response characteristic measuring device, FIG. 5 is a diagram showing the circuit configuration of the electrical resistance measuring device of the gas detector, and FIGS. 6 to 8 are the diagrams of the present invention. These figures are for explaining the effect. Of these, Figure 6 shows the relationship between the operating temperature and gas sensitivity of tin oxide films of various grain sizes, and Figure 7 shows the relationship between the crystal grain size and gas sensitivity. Figure 8 shows gas detection characteristics for various gases. DESCRIPTION OF SYMBOLS 1... Gas sensitive body, 2... Electrode, 3... Substrate, 4... Planar heater.

Claims (1)

【特許請求の範囲】[Claims] 1 X線回折測定において現われるSnO2結晶の
(110)面に帰 される回折ピークの半値巾からデ
バイ・シエーラー式を用いて算出される結晶粒子
の大きさが100〜140Åである膜状酸化錫を感応体
として用い、かつ前記感応体を300〜400℃で動作
させることを特徴とするNO2ガス検知方法。
1 Film-like tin oxide whose crystal grain size is calculated from the half-width of the diffraction peak attributed to the (110) plane of the SnO 2 crystal that appears in X-ray diffraction measurements using the Debye-Scherer equation from 100 to 140 Å. 1. A method for detecting NO 2 gas, characterized in that a sensor is used as a sensor, and the sensor is operated at a temperature of 300 to 400°C.
JP56207632A 1981-12-21 1981-12-21 Detection for gaseous no2 Granted JPS58106450A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56207632A JPS58106450A (en) 1981-12-21 1981-12-21 Detection for gaseous no2

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56207632A JPS58106450A (en) 1981-12-21 1981-12-21 Detection for gaseous no2

Publications (2)

Publication Number Publication Date
JPS58106450A JPS58106450A (en) 1983-06-24
JPS63736B2 true JPS63736B2 (en) 1988-01-08

Family

ID=16543005

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56207632A Granted JPS58106450A (en) 1981-12-21 1981-12-21 Detection for gaseous no2

Country Status (1)

Country Link
JP (1) JPS58106450A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58158549A (en) * 1982-03-16 1983-09-20 Matsushita Electric Ind Co Ltd No2 gas detector

Also Published As

Publication number Publication date
JPS58106450A (en) 1983-06-24

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