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JPS638186B2 - - Google Patents
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JPS638186B2 - - Google Patents

Info

Publication number
JPS638186B2
JPS638186B2 JP54102994A JP10299479A JPS638186B2 JP S638186 B2 JPS638186 B2 JP S638186B2 JP 54102994 A JP54102994 A JP 54102994A JP 10299479 A JP10299479 A JP 10299479A JP S638186 B2 JPS638186 B2 JP S638186B2
Authority
JP
Japan
Prior art keywords
chloride
alcohol
silicon oxide
oxide film
glass
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54102994A
Other languages
Japanese (ja)
Other versions
JPS5626750A (en
Inventor
Muneo Nakayama
Hisashi Nakane
Akira Yokota
Shingo Asaumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP10299479A priority Critical patent/JPS5626750A/en
Priority to GB7941939A priority patent/GB2043040B/en
Priority to US06/100,930 priority patent/US4385086A/en
Priority to DE2949141A priority patent/DE2949141C2/en
Priority to FR7929976A priority patent/FR2443484A1/en
Publication of JPS5626750A publication Critical patent/JPS5626750A/en
Publication of JPS638186B2 publication Critical patent/JPS638186B2/ja
Granted legal-status Critical Current

Links

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  • Surface Treatment Of Glass (AREA)
  • Chemically Coating (AREA)
  • Chemical Treatment Of Metals (AREA)

Description

【発明の詳細な説明】 本発明は、ガラス、金属、セラミツクスなどの
固体材料中に含有される成分が、その表面から滲
出し、それに接触する物質を汚染するのを防止す
るための表面処理方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention provides a surface treatment method for preventing components contained in solid materials such as glass, metals, and ceramics from oozing out from the surface and contaminating substances that come into contact with the materials. It is related to.

半導体製造、医薬品の製造及び貯蔵、分析操作
などにおいて使用される容器類や器具類、例えば
フオトレジスト材料用容器、試薬用ガラスびん、
医薬用ガラスびん、アンプル、ビーカー、フラス
コなどでは、その材料中から滲出する不純物、特
にアルカリ金属類により、取り扱う薬品が汚染さ
れることをできるだけ避ける必要がある。特に半
導体の製造に際しては、極く微量のアルカリイオ
ンの混入が、生成する半導体の特性に大きな影響
を及ぼすので重要な問題となる。
Containers and instruments used in semiconductor manufacturing, pharmaceutical manufacturing and storage, analytical operations, etc., such as containers for photoresist materials, glass bottles for reagents,
When using pharmaceutical glass bottles, ampoules, beakers, flasks, etc., it is necessary to avoid contamination of the chemicals handled by impurities, particularly alkali metals, leaching from the materials. Particularly in the production of semiconductors, the inclusion of even a very small amount of alkali ions poses an important problem as it greatly affects the characteristics of the produced semiconductor.

これまで、薬品を取り扱う容器には、ソーダ系
のガラス材料で作つたものが多く用いられている
が、このものは、クロム酸―硫酸混液や強アルカ
リに数日間浸し、表面の不純物を十分に溶出させ
るなどの方法でていねいに洗浄して用いても、少
量の不純物の滲出を免れることができなかつた。
Until now, containers for handling chemicals have often been made of soda-based glass materials, but these containers are soaked in a chromic acid-sulfuric acid mixture or strong alkali for several days to thoroughly remove impurities from the surface. Even after careful cleaning using methods such as elution, a small amount of impurities could not be avoided.

このため、特に不純物の混入をきらう場合に
は、パイレツクスガラスや石英など不純物の溶出
が少ない材料、あるいは表面にテフロンなどの保
護被覆を設けたものが用いられるが、これらのも
のは高価であるため、工業的に実施する場合には
不適当である。したがつて、安価な原料を用い、
簡単かつ効果的に容器や器具の表面からの不純物
の滲出を防止しうる方法の出現が大いに要望され
ていた。
For this reason, when contaminating impurities is particularly important, materials such as Pyrex glass and quartz that elute impurities with little elution, or materials with a protective coating such as Teflon on the surface are used, but these materials are expensive. Therefore, it is unsuitable for industrial implementation. Therefore, using cheap raw materials,
There has been a great need for a method that can simply and effectively prevent impurities from oozing out from the surfaces of containers and utensils.

本発明者らは、このような要望にこたえるべく
鋭意研究を重ねた結果、従来普通に使用されてい
る容器や器具の表面に特殊な塗布液を用いてシリ
コン酸化膜を形成させることにより、容易にその
目的を達成しうることを見出し、この知見に基づ
いて本発明をなすに至つた。
The inventors of the present invention have conducted extensive research in order to meet these demands, and have found that by using a special coating liquid to form a silicon oxide film on the surfaces of conventionally commonly used containers and utensils, it is possible to easily The inventors have discovered that the object can be achieved, and based on this knowledge, the present invention has been completed.

すなわち、本発明に従えば、滲出性成分を含有
する固体の表面に、アルコキシシラン1モル、水
2〜5モル及びアルコール3〜30モルの混合物を
反応させて得た塗布液を塗布し、次いで150℃以
上の温度に加熱しシリコン酸化膜を形成させるこ
とにより、固体中に含まれている滲出性成分が表
面から滲出するのを効果的に防止することができ
る。
That is, according to the present invention, a coating solution obtained by reacting a mixture of 1 mole of alkoxysilane, 2 to 5 moles of water, and 3 to 30 moles of alcohol is applied to the surface of a solid containing an exudable component, and then By heating to a temperature of 150° C. or higher to form a silicon oxide film, exudable components contained in the solid can be effectively prevented from exuding from the surface.

本発明において、塗布液はアルコキシシラン、
水及びアルコールを混合し、その中に反応促進剤
を添加して反応せしめて反応混合物であつて、ア
ルコキシシランとしては、テトラメトキシシラ
ン、モノメチルトリエトキシシラン、テトラエト
キシシラン、モノエチルトリエトキシシラン、テ
トラプロポキシシラン、テトラブトキシシラン、
テトラフエノキシシラン、ビニルトリメトキシシ
ラン、ビニルトリエトキシシランなどをあげるこ
とができ、アルコールとしては、メチルアルコー
ル、エチルアルコール、プロピルアルコール、ブ
チルアルコール、アミルアルコールなどの一価の
アルコールをあげることができ、また、反応促進
剤としては、塩酸、硫酸、硝酸、炭酸、臭化水
素、過塩素酸、リン酸、ホウ酸、塩化金、塩化亜
鉛、塩化アルミニウム、塩化鉄、塩化銅、塩化ニ
ツケル、塩化クロム、塩化ヒ素、塩化アンチモ
ン、塩化スズ、塩化ケイ素、塩化ガリウム、塩化
インジウム、塩化白金、塩化チタン、硫酸銅、硫
酸亜鉛、硝酸鉛、硝酸亜鉛、硝酸アルミニウム、
硝酸鉄、硝酸銅、硝酸ニツケル、硝酸インジウ
ム、酸化ホウ素、五酸化リン、三酸化ヒ素などを
あげることができる。
In the present invention, the coating liquid includes alkoxysilane,
A reaction mixture is obtained by mixing water and alcohol and adding a reaction accelerator therein to cause a reaction. Examples of the alkoxysilane include tetramethoxysilane, monomethyltriethoxysilane, tetraethoxysilane, monoethyltriethoxysilane, Tetrapropoxysilane, tetrabutoxysilane,
Examples include tetraphenoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, etc., and examples of alcohol include monohydric alcohols such as methyl alcohol, ethyl alcohol, propyl alcohol, butyl alcohol, and amyl alcohol. In addition, reaction accelerators include hydrochloric acid, sulfuric acid, nitric acid, carbonic acid, hydrogen bromide, perchloric acid, phosphoric acid, boric acid, gold chloride, zinc chloride, aluminum chloride, iron chloride, copper chloride, nickel chloride, Chromium chloride, arsenic chloride, antimony chloride, tin chloride, silicon chloride, gallium chloride, indium chloride, platinum chloride, titanium chloride, copper sulfate, zinc sulfate, lead nitrate, zinc nitrate, aluminum nitrate,
Examples include iron nitrate, copper nitrate, nickel nitrate, indium nitrate, boron oxide, phosphorus pentoxide, and arsenic trioxide.

この際用いられる各成分の使用割合は、アルコ
キシシラン1モル当り、水2〜5モル、アルコー
ル3〜30モルの範囲にする必要がある。また、反
応促進剤の添加量は、アルコキシシランに対して
0.001〜20重量%の範囲が好ましい。
The ratio of each component used at this time needs to be in the range of 2 to 5 moles of water and 3 to 30 moles of alcohol per mole of alkoxysilane. In addition, the amount of reaction accelerator added is based on the alkoxysilane.
A range of 0.001 to 20% by weight is preferred.

この反応は発熱反応であつて、アルコキシシラ
ンが加水分解してヒドロキシシランが生成する。
This reaction is exothermic and alkoxysilane is hydrolyzed to produce hydroxysilane.

このようにして得られた反応混合物にさらに必
要に応じて有機溶剤を加えて、シリカに換算濃度
で1〜20重量%に濃度調整し、0.2〜1.0μのフイ
ルターを通して過したのち、塗布液として使用
する。
The reaction mixture thus obtained is further added with an organic solvent as necessary to adjust the concentration to 1 to 20% by weight in terms of silica, and after passing through a 0.2 to 1.0μ filter, it is used as a coating liquid. use.

この際用いられる有機溶剤としては、各成分を
溶解することができ、かつ塗布時に基体表面に均
一に塗布しうるものであればどのようなものでも
よいが、アルコール類、エステル類、ケトン類、
多価アルコール類及びそのエーテル、β―ジケト
ンあるいはこれらの混合物が好適であり、アルコ
ール類としては、例えばメチルアルコール、エチ
ルアルコール、プロピルアルコール、ブチルアル
コール、アミルアルコールなどが、エステル類と
しては、例えば酢酸メチル、酢酸エチル、酢酸プ
ロピル、酢酸ブチルなどが、ケトン類としては、
例えばアセトン、メチルエチルケトン、メチルブ
チルケトン、シクロヘキサノンなどが、多価アル
コール類及びそのエーテルとしては、例えばエチ
レングリコール、エチレングリコールモノメチル
エーテル、エチレングリコールモノエチルエーテ
ル、エチレングリコールジエチルエーテル、エチ
レングリコールモノイソプロピルエーテル、エチ
レングリコールモノブチルエーテル、エチレング
リコールジブチルエーテル、プロピレングリコー
ル、グリセリンなどがあげられる。
Any organic solvent may be used as long as it can dissolve each component and can be applied uniformly to the surface of the substrate during coating, including alcohols, esters, ketones, etc.
Polyhydric alcohols and their ethers, β-diketones, or mixtures thereof are suitable; examples of alcohols include methyl alcohol, ethyl alcohol, propyl alcohol, butyl alcohol, and amyl alcohol; examples of esters include acetic acid, etc. Ketones include methyl, ethyl acetate, propyl acetate, butyl acetate, etc.
Examples of polyhydric alcohols and their ethers include ethylene glycol, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol diethyl ether, ethylene glycol monoisopropyl ether, and ethylene glycol monomethyl ether. Examples include glycol monobutyl ether, ethylene glycol dibutyl ether, propylene glycol, and glycerin.

本発明の塗布液を施すのに適した容器の材質と
しては、ガラス、セラミツクス、マイカ、ステン
レスなどの無機質類及びプラスチツク類などがあ
げられ、形状もびん型、フラスコ型、筒型、球形
など特に制限はない。
Suitable containers for applying the coating solution of the present invention include glass, ceramics, mica, inorganic materials such as stainless steel, and plastics, and shapes such as bottle, flask, cylindrical, and spherical. There are no restrictions.

本発明において、塗布液を容器に塗布するに
は、浸せき引上げ法、スプレー法、かけ流し法、
刷毛塗り法など慣用の方法を用いて行うことがで
きる。
In the present invention, in order to apply the coating liquid to the container, the dipping method, the spraying method, the pouring method,
This can be done using a conventional method such as brush painting.

このようにして塗布したのち、通常は空気中に
おいて乾燥すると、溶媒が蒸発し、ヒドロキシシ
ランの被膜が形成され、さらに放置するとヒドロ
キシシランが分解して大部分はシリコン酸化膜と
なる。
After the coating is applied in this manner, the solvent is usually dried in the air to evaporate and a hydroxysilane film is formed, and when left to stand, the hydroxysilane decomposes and becomes mostly a silicon oxide film.

次に、これをさらに150℃以上の温度で熱処理
する。加熱温度が高い方が硬い被膜が得られるの
で、使用する容器の耐熱性を考慮してできるだけ
高い温度で熱処理することが望ましい。加熱時間
も長い方が望ましいが、作業性の観点から、10〜
60分が好適である。また、塗布液にガラス形成
剤、例えば五酸化リン、酸化ホウ素などを最終的
に生ずるSiO2に対して10重量%以下の量で添加
すると、ガラス化軟化点がさがり加熱温度を低く
することができる。
Next, this is further heat treated at a temperature of 150°C or higher. Since a higher heating temperature yields a harder film, it is desirable to conduct the heat treatment at as high a temperature as possible, taking into consideration the heat resistance of the container used. The longer the heating time, the better, but from the viewpoint of workability, the heating time should be 10~
60 minutes is preferred. Additionally, if a glass forming agent such as phosphorus pentoxide or boron oxide is added to the coating solution in an amount of 10% by weight or less based on the final SiO 2 produced, the vitrification softening point will be lowered, making it possible to lower the heating temperature. can.

本発明を実施することにより、容器の内壁に
0.1〜1.0μの膜厚で、ピンホールのない連続膜で、
しかも高純度な被膜を、簡単にかつ経済的に形成
することができ、薬品中への不純物の溶出を防止
することができるので、工業的にきわめて有利で
ある。
By carrying out the present invention, the inner wall of the container
A continuous film with a film thickness of 0.1 to 1.0 μ and no pinholes.
In addition, a highly pure coating can be formed easily and economically, and the elution of impurities into chemicals can be prevented, which is extremely advantageous industrially.

次に実施例により本発明をさらに詳細に説明す
る。
Next, the present invention will be explained in more detail with reference to Examples.

実施例 オルソケイ酸エチル209gと水5.4gとエチルア
ルコール572gを混合し、これに35%塩酸0.5gを
添加しよくかきまぜながら反応させると発熱して
反応は進行した。室温で3日間放置すると多量の
ヒドロキシシランの存在が確められた。
Example 209 g of ethyl orthosilicate, 5.4 g of water, and 572 g of ethyl alcohol were mixed, and 0.5 g of 35% hydrochloric acid was added thereto. When the mixture was stirred well and reacted, heat was generated and the reaction proceeded. After being left at room temperature for 3 days, the presence of a large amount of hydroxysilane was confirmed.

この反応液の固形分濃度(140℃、3時間加熱)
は9.0重量%であつた。反応液にアセトンを加え
て固形分濃度を8.0重量%に調整し、0.45μmのフ
イルターを用いて過し、塗布液を製造した。こ
の塗布液を良く洗浄したガラス基板(サイズ80×
120mm、厚さ0.7mm)に浸せき引上げ法によつて引
上げスピード30cm/minで塗布し100℃で15分間
乾燥後500℃で60分間焼成し膜厚0.15μmのシリコ
ン酸化膜を形成した。このようにして得られたシ
リコン酸化膜を形成したガラス基板と、比較する
ためのシリコン酸化膜を形成していないガラス基
板とを5%塩酸で5分間洗浄した後、別々に10%
塩酸水溶液の入つた容器に入れ60℃で10分間浸せ
きし滲出試験を行つた。滲出されたNa分を原子
吸光分析によつて測定すると、本発明のシリコン
酸化膜を形成したガラスは0.01ppmであり、シリ
コン酸化膜を形成していない比較ガラスは
0.34ppmであつた。
Solid concentration of this reaction solution (heated at 140℃ for 3 hours)
was 9.0% by weight. Acetone was added to the reaction solution to adjust the solid content concentration to 8.0% by weight, and the mixture was filtered through a 0.45 μm filter to produce a coating solution. A glass substrate (size 80×
120 mm, thickness 0.7 mm) by dipping and pulling up at a pulling speed of 30 cm/min, dried at 100°C for 15 minutes, and then baked at 500°C for 60 minutes to form a silicon oxide film with a thickness of 0.15 μm. The glass substrate on which the silicon oxide film obtained in this way was formed and the glass substrate on which no silicon oxide film was formed for comparison were washed with 5% hydrochloric acid for 5 minutes, and then separately washed with 10% hydrochloric acid.
A leaching test was performed by placing the sample in a container containing an aqueous hydrochloric acid solution and immersing it at 60°C for 10 minutes. When the leached Na content was measured by atomic absorption spectrometry, it was 0.01 ppm for the glass with the silicon oxide film of the present invention, and was 0.01 ppm for the comparative glass without the silicon oxide film.
It was 0.34ppm.

Claims (1)

【特許請求の範囲】[Claims] 1 滲出性成分を含有する固体の表面に、アルコ
キシシラン1モル、水2〜5モル及びアルコール
3〜30モルの混合物を反応させて得た塗布液を塗
布し、次いで150℃以上の温度に加熱しシリコン
酸化膜を形成させることを特徴とする固体表面か
らの含有成分の滲出防止方法。
1. A coating solution obtained by reacting a mixture of 1 mole of alkoxysilane, 2 to 5 moles of water, and 3 to 30 moles of alcohol is applied to the surface of a solid containing an exudable component, and then heated to a temperature of 150°C or higher. A method for preventing leaching of contained components from a solid surface, characterized by forming a silicon oxide film.
JP10299479A 1978-12-07 1979-08-13 Bleeding preventing method for contained component from solid surface Granted JPS5626750A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP10299479A JPS5626750A (en) 1979-08-13 1979-08-13 Bleeding preventing method for contained component from solid surface
GB7941939A GB2043040B (en) 1978-12-07 1979-12-05 Method for preventing leaching of contaminants from solid surfaces
US06/100,930 US4385086A (en) 1978-12-07 1979-12-06 Method for preventing leaching of contaminants from solid surfaces
DE2949141A DE2949141C2 (en) 1978-12-07 1979-12-06 Process to avoid the leaching of impurities from solid surfaces
FR7929976A FR2443484A1 (en) 1978-12-07 1979-12-06 PROCESS FOR PREVENTING FILTRATION OF CONTAMINANTS FROM SOLID SURFACES

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10299479A JPS5626750A (en) 1979-08-13 1979-08-13 Bleeding preventing method for contained component from solid surface

Publications (2)

Publication Number Publication Date
JPS5626750A JPS5626750A (en) 1981-03-14
JPS638186B2 true JPS638186B2 (en) 1988-02-22

Family

ID=14342241

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10299479A Granted JPS5626750A (en) 1978-12-07 1979-08-13 Bleeding preventing method for contained component from solid surface

Country Status (1)

Country Link
JP (1) JPS5626750A (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5638472A (en) * 1979-09-06 1981-04-13 Tokyo Denshi Kagaku Kabushiki Formation of silica coating
JPS5917505A (en) * 1982-07-22 1984-01-28 Canon Inc aluminum plate
JPS59145787A (en) * 1983-02-09 1984-08-21 Nissan Motor Co Ltd Corrosion resistant metallic material with superior corrosion resistance at high temperature
US4535026A (en) * 1983-06-29 1985-08-13 The United States Of America As Represented By The United States Department Of Energy Antireflective graded index silica coating, method for making
JPH03105098A (en) * 1989-09-18 1991-05-01 Sanyo Electric Co Ltd Motor-driven fan
FR2944007B1 (en) * 2009-04-03 2012-06-08 Sgd Sa PROCESS FOR MANUFACTURING A GLASS CONTAINER AND CORRESPONDING CONTAINER.
MY183225A (en) * 2014-09-30 2021-02-18 Nippon Sheet Glass Co Ltd Low-reflection coating, glass sheet, glass substrate, and photoelectric conversion device

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5392818A (en) * 1977-01-26 1978-08-15 Seiko Instr & Electronics Formation of silicon dioxide film on panel glass

Also Published As

Publication number Publication date
JPS5626750A (en) 1981-03-14

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