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JPS639038B2 - - Google Patents
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JPS639038B2 - - Google Patents

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Publication number
JPS639038B2
JPS639038B2 JP6154882A JP6154882A JPS639038B2 JP S639038 B2 JPS639038 B2 JP S639038B2 JP 6154882 A JP6154882 A JP 6154882A JP 6154882 A JP6154882 A JP 6154882A JP S639038 B2 JPS639038 B2 JP S639038B2
Authority
JP
Japan
Prior art keywords
chromic acid
chromium
film
treatment
bath
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP6154882A
Other languages
Japanese (ja)
Other versions
JPS58177491A (en
Inventor
Hideo Kobayashi
Hajime Ogata
Shunichi Tsugawa
Toshiro Ichida
Shunichi Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JFE Steel Corp
Original Assignee
Kawasaki Steel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kawasaki Steel Corp filed Critical Kawasaki Steel Corp
Priority to JP6154882A priority Critical patent/JPS58177491A/en
Publication of JPS58177491A publication Critical patent/JPS58177491A/en
Publication of JPS639038B2 publication Critical patent/JPS639038B2/ja
Granted legal-status Critical Current

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  • Electrochemical Coating By Surface Reaction (AREA)
  • Electroplating Methods And Accessories (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

本発明は金属クロム被膜とクロム水和酸化物被
膜との密着性およびクロム水和酸化物被膜と塗料
との密着性に優れたレトレト処理用テインフリー
鋼板の製造方法に関するものである。 従来の二液方式は、金属クロムとクロム水和酸
化物被膜とを別々に析出させるので、それぞれの
析出量を容易にコントロールすることができる利
点があるが、二液方式においては両液の液組成が
異なるため、クロムめつき後の鋼板をそのまま電
解クロム酸処理浴に移すと、クロムめつき時に生
成したクロム水和酸化物中に共析しためつき助剤
アニオンが最終製品の被膜中に残存したり、鋼表
面に付着したクロムめつき液が電解クロム酸処理
浴中に持ち込まれ、クロム水和酸化物被膜の析出
量が変動したり、部分的に溶出した助剤アニオン
が再析出したりするなどの不都合が生ずる。従つ
て、クロムめつき後電解クロム酸処理浴に至るま
での間に水洗を十分に行なつてこれを防止する必
要があるが、クロムめつき後の水洗だけではクロ
ムめつき時に生成するクロム水和酸化物中のクロ
ムめつき助剤アニオンの除去が困難である。特
に、硫酸やその化合物を助剤とするクロムめつき
においては、その後のクロム酸溶液による電解ク
ロム酸処理を行なつても、最終的に生成したクロ
ム水和酸化物中に硫酸根が共析して塗膜との密着
性に不都合を生じている。 この欠点を解消する方法として、クロムめつき
後に該液中で逆電解を施すことによつてクロムめ
つき時に生成したクロム水和酸化物やこの中の助
剤アニオンを少なくすることができ、その後に電
解クロム酸処理浴に至るまでの間に水洗を十分に
行なつて引続くクロム酸水溶液中で電解クロム酸
を施すことが耐レトルト処理性の改善に極めて有
効であることを見い出し、既に特願昭56−62766
号(以後、原発明と称する)として提案してい
る。 ところが、その後研究を重ねたところ、原発明
は耐レトルト処理性の改善に極めて有効である
が、クロム水和酸化物被膜が不均一になる場合の
あることが判明し、この欠点を解決すべく研究を
重ねた結果均一なクロム水和酸化物被膜を得るこ
とができ、レトルト処理性がさらに改善されて本
発明に至つた。 本発明は冷延鋼板に片面20〜200mg/m2の金属
クロムめつきを施し、この金属クロム層表面に5
〜50mg/m2のクロム水和酸化物被膜を形成したテ
インフリー鋼板に関するものである。金属クロム
層は20mg/m2以下であるとマイクロクラツク、ピ
ンホールなどが多くなつて耐食性が劣り、また
200mg/m2より多くても耐食性の向上が望めない
ので、通常のクロムめつき鋼板は20〜200mg/m2
の金属クロム層を有している。 一方、水和クロム酸化物皮膜(以下、CrOX皮膜
という)が5mg/m2以下であると所望の塗料密着
性が望めず、また50mg/m2より多いと外観が悪く
なつたり、加工時にCrOX皮膜にクラツクが入つた
りして実用的でない。さらにいえば、CrOX皮膜量
は10〜30mg/m2が実用範囲であり、最も望まし
い。 テインフリー鋼板は塗装してはじめて食缶材料
となるものであり、食缶として用いる場合には塗
膜との密着性が特に重要である。この塗膜との密
着性および内容物充填後の耐レトルト処理性に優
れたテインフリー鋼板を得るために、硫酸または
その化合物などのアニオンを含む助剤を用いる汎
用クロムめつき浴によるクロムめつき後、この浴
中で0.1〜15クーロン/dm2の逆電解を施し、次
いて水洗槽を介してクロム酸水溶液中で電解クロ
ム酸処理を行う方法を原発明において提案してい
る。この方法により得られるテインフリー鋼板は
耐レトルト処理性の改善に極めて有効であるが、
この処理だけではCrOX皮膜が不均一になる場合が
あるのは前述の通りである。 そこで、本発明においては、従来の如く脱脂酸
洗した鋼板に、硫酸やその化合物を助剤として含
むクロムめつき浴にてクロムめつきした後、この
浴中で逆電解を施し、クロムめつき時に生成した
CrOX皮膜中に共析したSO4 2-などの助剤アニオン
を低減させた後に、電解クロム酸処理を行うので
あるが、この処理を以下に述べるような条件下で
行うことを特長とする。 すなわち、電解クロム酸処理を施すに際して、
電解析出する皮膜構造が均一でかつ耐レトルト処
理性が良好なCrOX皮膜を得るために、逆電解で荒
れたCrOX皮膜を均一に改質するために施す電解ク
ロム酸第1処理と、CrOX皮膜量を確保するために
施す電解クロム酸第2処理との2段階に分けて、
以下に述べるような各々の浴組成で別個の処理浴
中にて電解クロム酸処理を施す。 本発明で用いるクロム酸処理水溶液の主剤は、
無水クロム酸クロム酸塩および重クロム酸塩から
選択された少なくとも1種の化合物で構成され、
クロム酸塩としてはクロム酸のアルカリ金属塩、
アルカリ土類金属塩、アンモニウム塩などが、重
クロム酸塩としては重クロム酸のアルカリ金属
塩、アルカリ土類金属塩、アンモニウム塩などが
適当であるが、特に化合物の種類は限定されるこ
とはない。電解クロム酸水溶液浴の組成は第1処
理と第2処理において同一でも良いし、弗化物助
剤の浴組成、濃度また電解条件などに応じて異な
つても良い。 不可避的に不純物アニオンを含むクロム酸水溶
液の濃度は特に限定する必要はないがCrO3換算
で10〜200g/の範囲が適当である。濃度が10
g/未満では浴の電気抵抗が増大し、整流器の
電圧がオーバーしたり鋼板が熱をもつなどの不都
合を生じるので好ましくない。また、200g/
を超えても所期の効果の向上をさほど期待でき
ず、浴の持出しによる経済的損失が大きいので望
ましくない。このようなクロム酸処理浴の浴温は
35〜60℃が適当である。35℃より低いと夏場の冷
却水温の上昇により温度管理が難かしくなり、60
℃より高いとクロム酸水溶液に耐える電解槽の材
質が限定される。 クロムめつき後同液中で逆電解を施すと、クロ
ムめつき時に形成されたCrOX皮膜が溶解され、こ
の時同時にあるいは終了後に従前の陰極CrOX皮膜
と異質な陽極CrOX皮膜が金属クロム層上に形成さ
れる。この皮膜形成により金属クロムの露出が従
来の陰極皮膜に比べて少ないことが明らかになつ
ているが、クロムめつきに用いる助剤の種類とそ
の浴濃度ならびに電解条件によつては陽極的に形
成された皮膜の一部に異常析出がみられる場合が
ある。この皮膜の上に従来より行われている二液
方式における電解クロム酸処理を施すと、耐レト
ルト処理性は良好だがCrOX皮膜の異常析出が認め
られることがあつた。 これを回避する方法について弗素化合物を用い
て種々の検討を行つたところ、まず最初に単純塩
系の弗化物を助剤に用いて電解クロム酸第1処理
を施すことが効果的であることがわかつた。 電解クロム酸処理時には、陰極において水の電
気分解によりH2ガスが発生し、陰極近傍のPHは
上昇する。これに伴つて低原子価のクロムイオン
に水酸基や水分子などが配位した重合度の高いオ
ール化合物が形成される。一方陰極近傍に存在す
る弗素イオンは陰極近傍のPHの上昇により遊離の
F-イオンとなつており、低原子価クロムに配位
している水酸基や水分子などを置換して金属クロ
ムへの還元反応を促進したり、オール化合物のオ
ール結合を切断し、その重合度を低下せしめ、
CrOX皮膜を溶解させたりする。従つて、CrOX皮膜
の生成と溶解が繰り返されてCrOX皮膜は薄く均一
に形成される。 本発明による電解クロム酸第1処理はこのよう
に逆電解で金属クロム上に形成された陽極CrOX
膜が荒れた場合にCrOX皮膜を改質して均一にする
ために施すものであり、金属クロムの析出やCrOX
皮膜量の増大を目的とするものではない。 電解クロム酸第1処理に用いる単純塩系弗素化
合物とは水に溶けて100%近く電離するものをい
い、クロム酸水溶液中ではイオン解離し、H+
…F-の水素結合を生じているといわれ、HF、
NaHF2、NaF、NH4F、KHF2、KF、MgF2
LiF2などを代表的に挙げることができるが、特
に限定される必要はない。助剤として添加する単
純塩系弗素化合物の量はF換算で0.1〜10g/
の範囲が適当である。濃度範囲は特に限定する必
要はないが、0.1g/未満、10g/超えでは
本発明の効果がさほど期待できない。 電解クロム酸第1処理の電解条件も特に限定さ
れないが、一般的に電流密度は5〜100A/dm2
の範囲が良い。これが5A/dm2未満であると
CrOX皮膜に析出異常をもたらす場合があり、
100A/dm2を超えると整流器容量から実用的で
ないことによる。また、電気量は0.1〜50クーロ
ン/dm2が良い。電気量が0.1クーロン/dm2
満では所期の目的が達せられず、50クーロン/d
m2以上としても金属クロムの析出が増大するだけ
で本発明の効果がさほど期待できない。 以上述べたように電解クロム酸第1処理を施す
ことにより逆電解で形成されたCrOX皮膜は改質さ
れるが、CrOX皮膜量の確保がその目的ではないの
で十分に確保されているとはいえない。そこで、
電解クロム酸第1処理後CrOX皮膜量を確保する方
法について、弗化物を用いて種々検討を重ねたと
ころ、錯塩系の弗化物を助剤として用いて電解ク
ロム酸第2処理を施すのが効果的であることがわ
かつた。 電解クロム酸処理時には陰極近傍のPHが上昇す
る。PHによつて錯イオンの弗素の電離状態は異な
り、単純塩の弗化物のように100%近く電離して
陰極近傍のF-がCrOXのオール化合物の生成溶解
に関与するのとは違つて極く一部の遊離した弗素
イオンだけが関与する。従つてCrOXの溶解生成は
生成の方が多くなり、最終的には所望のCrOX量が
確保される。本発明による電解クロム酸第1処理
に続く電解クロム酸第2処理は、このように電解
クロム酸第1処理でCrOX皮膜を改質して均一にな
らしめた後に、CrOX皮膜量を確保するために施す
ものである。 電解クロム酸第2処理に用いる錯塩系弗素化合
物とは水に溶けて加水分解を受けて錯イオンとし
て存在しているものをいい、クロム酸水溶液中で
も錯イオンとして存在し、Na2SiF6、NaBF4
NH4BF4、K2SiF6、KBF4、Na2TiF6、K3AlF6
などを代表的に挙げることができるが、特に限定
される必要はない。助剤として添加する錯塩系弗
素化合物の量はF換算で0.1〜10g/の範囲が
適当である。濃度範囲は特に限定する必要はない
が、0.1g/未満では本発明の効果がさほど期
待できず、10g/を超えると化合物の種類にも
よるが溶解度の上限となる。 電解クロム酸第2処理の電解条件は、CrOX皮膜
量を確保するために必要な量の電気量を与えれば
よいので特に限定されないが、一般的に電流密度
は5〜50A/dm2が良く、5A/dm2未満では電
解時間が長過ぎて実用的でなく、50A/dm2を超
えるとCrOX皮膜の異常析出が生じる場合がある。 次に本発明による処理につき具体的に説明す
る。 板厚0.22mmの冷延鋼板に常法による脱脂、酸洗
の前処理を施した後に、CrO3250g/、
H2SO42.5g/を含有するクロムめつき浴で、
浴温55℃、電流密度60A/dm2で1.0秒の電解を
行つた。この時のCrOX皮膜のEPMAによるライ
ンアナリシスを第1図に示す。クロムめつき後直
ちに同液中で15A/dm2の電流密度で0.2秒間の
逆電解を施した。この時のCrOX皮膜のEPMAに
よるラインアナリシスを第2図に示す。 このクロムめつき鋼板を十分に水洗した後、
CrO380g/、NaF4g/(CrO3の重量比で
5%)を含み、浴温50℃のクロム酸水溶液中で
50A/dm2の電流密度で0.2秒の電解クロム酸第
1処理を施した。この時のCrOX皮膜のEPMAに
よるラインアナリシスを第3図に示す。次いで、
CrO360g/、Na2SiF64g/を含み、浴温40
℃のクロム酸水溶液で15A/dm2の電流密度で
1.0秒の電解クロム酸第2処理を施した。この時
のCrOX皮膜のEPMAによるラインアナリシスを
第4図に示す。また400倍光学顕微鏡写真を第6
図に示す。比較として、クロムめつき後同液中で
5秒浸漬後CrO360g/、Na2SiF64g/を含
み、浴温40℃のクロム酸浴中で15A/dm2の電流
密度で1.0秒の電解クロム酸処理を施した。この
時のCrOX皮膜のEPMAによるラインアナリシス
を第5図に、400倍の光学顕微鏡写真を第7図に
示す。 ラインアナリシスの結果をみると、本発明の処
理を施した第3図および第4図に示すものは、ク
ロムめつき後のもの(第1図、)、逆電解後のもの
(第2図)、従来のクロム酸処理後のもの(第5
図)に比べて、CrOXの異常析出が少なく、皮膜が
均一であることがわかる。また、顕微鏡写真をみ
ると、本発明によるもの(第6図)にはCrOX皮膜
が均質でむらがないのが明瞭であるが、従来の電
解クロム酸処理によるもの(第7図)にはCrOX
膜の不均一なむら(黒い斑点状に見える)が多数
生成しているのがわかる。 上記の本発明例および比較例につき、CrOX皮膜
のむらの判定および後述するようなT型剥離試験
の結果を下表1に示す。
The present invention relates to a method for producing a stain-free steel sheet for retort treatment, which has excellent adhesion between a metallic chromium coating and a chromium hydrated oxide coating, and excellent adhesion between a chromium hydrated oxide coating and a paint. The conventional two-part method deposits metallic chromium and the hydrated chromium oxide film separately, so it has the advantage of being able to easily control the amount of each deposited. Because the compositions are different, if a steel plate after chromium plating is directly transferred to an electrolytic chromic acid treatment bath, the tanning aid anions eutectoid in the chromium hydrated oxide generated during chromium plating will be deposited in the coating of the final product. The chromium plating solution that remains or adheres to the steel surface may be brought into the electrolytic chromic acid treatment bath, causing fluctuations in the amount of chromium hydrated oxide film deposited, or re-precipitation of partially eluted auxiliary anions. This may cause inconveniences such as Therefore, it is necessary to thoroughly wash with water after chromium plating and before entering the electrolytic chromic acid treatment bath to prevent this, but washing with water after chrome plating alone will not remove the chromium water generated during chrome plating. It is difficult to remove the chromium plating aid anion in the oxide. In particular, in chromium plating using sulfuric acid or its compounds as an aid, even if electrolytic chromic acid treatment is performed using a chromic acid solution, sulfuric acid groups are eutectoid in the final chromium hydrated oxide. This causes problems in adhesion with the paint film. As a method to overcome this drawback, by performing reverse electrolysis in the solution after chromium plating, it is possible to reduce the chromium hydrated oxide produced during chromium plating and the auxiliary anions therein. We have found that thoroughly washing with water before entering the electrolytic chromic acid treatment bath and then applying electrolytic chromic acid in an aqueous chromic acid solution is extremely effective in improving retort resistance. Gansho 56-62766
(hereinafter referred to as the original invention). However, after repeated research, it was discovered that although the original invention is extremely effective in improving retort treatment resistance, the chromium hydrated oxide film may become non-uniform. As a result of repeated research, it was possible to obtain a uniform chromium hydrated oxide film, and the retort processability was further improved, leading to the present invention. In the present invention, a cold-rolled steel sheet is plated with metallic chromium of 20 to 200 mg/ m2 on one side, and the surface of this metallic chromium layer is
This relates to a stain-free steel sheet with a chromium hydrated oxide coating of ~50 mg/m 2 . If the metallic chromium layer is less than 20mg/ m2 , there will be many microcracks and pinholes, resulting in poor corrosion resistance.
If the amount is more than 200 mg/m2, no improvement in corrosion resistance can be expected, so normal chrome-plated steel sheets are used at 20 to 200 mg/ m2.
It has a metallic chromium layer. On the other hand, if the amount of hydrated chromium oxide film (hereinafter referred to as Cr OX film) is less than 5 mg/m 2 , the desired paint adhesion cannot be expected, and if it is more than 50 mg/m 2 , the appearance may deteriorate or Cracks may appear in the Cr OX film, making it impractical. Furthermore, the amount of Cr OX film is within the practical range of 10 to 30 mg/m 2 and is most desirable. A stain-free steel plate can only be used as a food can material after being painted, and when used as a food can, adhesion with the coating film is particularly important. In order to obtain a stain-free steel sheet with excellent adhesion to the coating film and resistance to retort treatment after filling, chrome plating is performed using a general-purpose chromium plating bath using an auxiliary agent containing anions such as sulfuric acid or its compounds. The original invention proposes a method in which reverse electrolysis is then carried out at 0.1 to 15 coulombs/dm 2 in this bath, and then electrolytic chromic acid treatment is carried out in an aqueous chromic acid solution via a water washing tank. The stain-free steel sheet obtained by this method is extremely effective in improving retort treatment resistance, but
As mentioned above, this treatment alone may cause the Cr OX film to become non-uniform. Therefore, in the present invention, a conventionally degreased and pickled steel sheet is chromium plated in a chromium plating bath containing sulfuric acid or its compounds as an auxiliary agent, and then reverse electrolysis is performed in this bath to form a chrome plating layer. generated at the time
After reducing the auxiliary anions such as SO 4 2- that have eutectoided in the Cr OX film, electrolytic chromic acid treatment is performed, and the feature is that this treatment is performed under the conditions described below. . In other words, when performing electrolytic chromic acid treatment,
In order to obtain a Cr OX film with a uniform electrolytically deposited film structure and good retort treatment resistance, a first electrolytic chromic acid treatment is performed to uniformly modify the Cr OX film roughened by reverse electrolysis; The treatment is divided into two stages, including a second electrolytic chromic acid treatment to ensure the amount of Cr OX film.
Electrolytic chromic acid treatment is performed in separate treatment baths with each bath composition as described below. The main ingredient of the chromic acid treatment aqueous solution used in the present invention is:
Comprised of at least one compound selected from chromate anhydride and dichromate,
Chromates include alkali metal salts of chromic acid,
Alkaline earth metal salts, ammonium salts, etc. are suitable, and as dichromates, alkali metal salts, alkaline earth metal salts, ammonium salts, etc. of dichromic acid are suitable, but there are no particular restrictions on the type of compound. do not have. The composition of the electrolytic chromic acid aqueous solution bath may be the same in the first treatment and the second treatment, or may be different depending on the bath composition, concentration, electrolytic conditions, etc. of the fluoride auxiliary agent. The concentration of the chromic acid aqueous solution that inevitably contains impurity anions is not particularly limited, but is suitably in the range of 10 to 200 g/CrO 3 . concentration is 10
If it is less than 1 g/g, the electrical resistance of the bath increases, causing problems such as overvoltage of the rectifier and heating of the steel plate, which is not preferable. Also, 200g/
Exceeding this is not desirable because the desired effect cannot be expected to improve much and economic loss due to taking out the bath is large. The bath temperature of such a chromic acid treatment bath is
A temperature of 35 to 60°C is appropriate. If it is lower than 35℃, temperature control becomes difficult due to the rise in cooling water temperature in summer,
If the temperature is higher than ℃, the materials of the electrolytic cell that can withstand the chromic acid aqueous solution are limited. When reverse electrolysis is performed in the same solution after chromium plating, the Cr OX film formed during chrome plating is dissolved, and at the same time or after completion of the chromium plating, the anode Cr OX film, which is different from the previous cathode Cr OX film, becomes metallic chromium. formed on the layer. It has been revealed that the exposure of metallic chromium is less when compared to conventional cathodic coatings due to the formation of this film, but depending on the type of auxiliary agent used for chromium plating, its bath concentration, and electrolytic conditions, it is possible to form the metal chromium anodically. Abnormal precipitation may be observed in some parts of the coated film. When the conventional two-component electrolytic chromic acid treatment was applied to this film, the retort treatment resistance was good, but abnormal precipitation of the Cr OX film was sometimes observed. We conducted various studies using fluorine compounds to find ways to avoid this problem, and found that it is effective to first perform the first electrolytic chromic acid treatment using a simple salt fluoride as an auxiliary agent. I understand. During electrolytic chromic acid treatment, H 2 gas is generated by electrolysis of water at the cathode, and the pH near the cathode increases. Along with this, an all compound with a high degree of polymerization is formed in which a hydroxyl group, a water molecule, etc. are coordinated with a low-valent chromium ion. On the other hand, fluorine ions existing near the cathode become free due to the increase in pH near the cathode.
F - ion, which replaces hydroxyl groups and water molecules coordinating low-valent chromium, promotes the reduction reaction to metallic chromium, and cleaves the all bonds of all compounds, reducing its polymerization degree. decreases the
Dissolves Cr OX film. Therefore, the formation and dissolution of the Cr OX film are repeated, and the Cr OX film is formed thin and uniformly. The first electrolytic chromic acid treatment according to the present invention is performed to modify and make the Cr OX film uniform when the anode Cr OX film formed on metal chromium by reverse electrolysis becomes rough. Precipitation of metallic chromium or Cr OX
It is not intended to increase the amount of film. The simple salt-based fluorine compound used in the first electrolytic chromic acid treatment is one that dissolves in water and ionizes nearly 100%, and in an aqueous chromic acid solution, it dissociates into ions and H + ...
...It is said that F - hydrogen bonds are formed, and HF,
NaHF2 , NaF, NH4F , KHF2 , KF, MgF2 ,
A typical example is LiF 2 , but there is no need to be particularly limited. The amount of simple salt fluorine compound added as an auxiliary agent is 0.1 to 10 g/F equivalent.
A range of is appropriate. Although the concentration range does not need to be particularly limited, the effects of the present invention cannot be expected to be so great if it is less than 0.1 g/ and more than 10 g/. The electrolytic conditions for the first electrolytic chromic acid treatment are not particularly limited, but generally the current density is 5 to 100 A/dm 2
Good range. If this is less than 5A/ dm2
This may cause precipitation abnormalities in the Cr OX film.
If it exceeds 100A/ dm2 , it is not practical due to the rectifier capacity. Further, the amount of electricity is preferably 0.1 to 50 coulombs/ dm2 . If the amount of electricity is less than 0.1 coulombs/ dm2 , the intended purpose cannot be achieved, and if the amount of electricity is less than 50 coulombs/dm
If m 2 or more, the precipitation of metallic chromium only increases, and the effects of the present invention cannot be expected to be so great. As mentioned above, the Cr OX film formed by reverse electrolysis is modified by the first electrolytic chromic acid treatment, but since the purpose is not to secure the amount of Cr OX film, it is important to ensure that it is sufficient. No, no. Therefore,
After conducting various studies using fluoride to ensure the amount of Cr OX film after the first electrolytic chromic acid treatment, we found that the second electrolytic chromic acid treatment using a complex fluoride as an auxiliary agent is It turned out to be effective. During electrolytic chromic acid treatment, the pH near the cathode increases. The ionization state of the complex ion fluorine differs depending on the pH, and unlike simple salt fluoride, which is nearly 100% ionized and F - near the cathode participates in the formation and dissolution of the Cr OX all compound. Only a small portion of free fluoride ions are involved. Therefore, more Cr OX is produced by dissolution, and the desired amount of Cr OX is ultimately secured. In the second electrolytic chromic acid treatment following the first electrolytic chromic acid treatment according to the present invention, after the first electrolytic chromic acid treatment modifies the Cr OX film and makes it uniform, the amount of Cr OX film is secured. It is given in order to do something. The complex salt-based fluorine compound used in the second electrolytic chromic acid treatment refers to a compound that dissolves in water and undergoes hydrolysis to exist as a complex ion.It also exists as a complex ion in an aqueous chromic acid solution, and contains Na 2 SiF 6 , NaBF Four ,
NH 4 BF 4 , K 2 SiF 6 , KBF 4 , Na 2 TiF 6 , K 3 AlF 6
These are representative examples, but there is no need to be particularly limited. The amount of the complex salt type fluorine compound added as an auxiliary agent is suitably in the range of 0.1 to 10 g/F (F). The concentration range does not need to be particularly limited, but if it is less than 0.1 g/, the effect of the present invention cannot be expected much, and if it exceeds 10 g/, it will be the upper limit of solubility, although it depends on the type of compound. The electrolytic conditions for the second electrolytic chromic acid treatment are not particularly limited as it is sufficient to apply the amount of electricity necessary to ensure the amount of Cr OX film, but generally the current density is preferably 5 to 50 A/ dm2 . If it is less than 5 A/dm 2 , the electrolysis time is too long to be practical, and if it exceeds 50 A/dm 2 , abnormal precipitation of the Cr OX film may occur. Next, the processing according to the present invention will be specifically explained. After pre-treating a cold-rolled steel plate with a thickness of 0.22 mm by conventional methods such as degreasing and pickling, 250 g of CrO 3 /,
In a chromium plating bath containing 2.5g/H 2 SO 4 ,
Electrolysis was carried out for 1.0 seconds at a bath temperature of 55° C. and a current density of 60 A/dm 2 . Figure 1 shows the EPMA line analysis of the Cr OX film at this time. Immediately after chromium plating, reverse electrolysis was performed in the same solution at a current density of 15 A/dm 2 for 0.2 seconds. Figure 2 shows the EPMA line analysis of the Cr OX film at this time. After washing this chrome-plated steel plate thoroughly with water,
In a chromic acid aqueous solution containing 80g of CrO 3 /, 4g of NaF / (5% by weight of CrO 3 ) and a bath temperature of 50℃.
A first electrolytic chromic acid treatment was performed at a current density of 50 A/dm 2 for 0.2 seconds. Figure 3 shows the EPMA line analysis of the Cr OX film at this time. Then,
Contains CrO 3 60g/, Na 2 SiF 6 4g/, bath temperature 40
at a current density of 15 A/dm 2 in an aqueous solution of chromic acid at
A second electrolytic chromic acid treatment was performed for 1.0 seconds. Figure 4 shows the EPMA line analysis of the Cr OX film at this time. In addition, 400x optical microscope photos are shown in the 6th section.
As shown in the figure. As a comparison, after chromium plating, it was immersed in the same solution for 5 seconds and then immersed for 1.0 seconds at a current density of 15 A/dm 2 in a chromic acid bath containing 60 g of CrO 3 and 4 g of Na 2 SiF 6 at a bath temperature of 40°C. Electrolytic chromic acid treatment was applied. Figure 5 shows line analysis of the Cr OX film at this time using EPMA, and Figure 7 shows an optical micrograph at 400x magnification. Looking at the results of line analysis, we can see that the products treated according to the present invention shown in Figures 3 and 4 are those after chrome plating (Figure 1) and those after reverse electrolysis (Figure 2). , after conventional chromic acid treatment (No. 5
It can be seen that there is less abnormal precipitation of Cr OX and the film is more uniform than in Figure). Furthermore, looking at the micrographs, it is clear that the Cr OX film formed by the present invention (Fig. 6) is homogeneous and even, but it is clear that the Cr OX film formed by the conventional electrolytic chromic acid treatment (Fig. 7) is uniform. It can be seen that many non-uniform irregularities (looking like black spots) are generated in the Cr OX film. Table 1 below shows the evaluation of the unevenness of the Cr OX film and the results of the T-peel test as described below for the above-mentioned inventive examples and comparative examples.

【表】 (CrOX量の測定) 作成した試料を100℃、300g/のカ性ソーダ
溶液に10分間浸漬した前後のCr量測定値の差よ
り検量線を用いて定量した。 CrOX量の測定は螢光X線法(Xray40KV60m
A、モニター60秒)によつた。 (EPMAの測定) CrOX皮膜をカーボン膜で固定し、次いで素地鋼
側から金属クロムをナイタールで溶解した後、清
浄な白金箔上にのせ、EPMAでラインアナリシ
スを行つた。 加速電圧 20KV 電子ビーム強度 0.02μA ビーム径 2μ 次に本発明を実施例につき具体的に説明する。 実施例 1 板厚0.22mmの冷延鋼板を5%ホメサゾン溶液中
で80℃、15A/dm2の電流密度で10秒間の電解脱
脂を行つた後に水洗し、常温10%の硫酸中の5秒
間浸漬して水洗した後下記の条件で本処理を行つ
た。 クロムめつき処理 浴組成 CrO3 250g/ H2SO4 2.5g/ 浴温 55℃ 電解条件 50A/dm2×1.5秒 上記クロムめつき後同液中で次の条件で逆電解
処理を施した。 逆電解条件 15A/dm2×0.2秒 この後水洗し、直ちに以下の条件の電解クロム
酸処理を施した。 電解クロム酸第1処理 浴組成 CrO3 80g/ NaF 4g/ 浴温 50℃ 電解条件 50A/dm2×0.2秒 電解クロム酸第2処理 浴組成 CrO3 60g/ Na2SiF6 4g/ 浴温 40℃ 電解条件 15A/dm2×1.0秒 電解クロム酸第2処理後直ちに水洗してさらに
湯洗後乾燥して試料を作成した。 実施例 2 下記の条件で電解クロム酸処理を行つた以外は
実施例1と同様の処理を行つた。 電解クロム酸第1処理 浴組成 CrO3 50g/ HF 4g/ 浴温 40℃ 電解条件 30A/dm2×0.2秒 電解クロム酸第2処理 浴組成 CrO3 60g/ HBF4 3g/ 浴温 40℃ 電解条件 15A/dm2×1.0秒 実施例 3 下記の条件で電解クロム酸処理を行つた以外は
実施例1と同様の処理を行つた。 電解クロム酸第1処理 浴組成 CrO3 50g/ Na2Cr2O7 10g/ NH4F 5g/ 浴温 40℃ 電解条件 15A/dm2×0.2秒 電解クロム酸第2処理 浴組成 CrO3 60g/ Na2AlF6 5g/ 浴温 40℃ 電解条件 15A/dm2×1.0秒 比較例 1 前記のクロムめつき後同液中で5秒間浸漬し、
下記の条件で電解クロム酸処理を行つた以外は実
施例1と同様の処理を行つた。 電解クロム酸処理 浴組成 CrO3 60g/ Na2SiF6 4g/ 浴温 40℃ 電解条件 15A/dm2×1.0秒 比較例 2 前述のクロムめつき後同液中で5秒間浸漬し、
下記の条件で電解クロム酸処理を行つた以外は実
施例1と同様の処理を行つた。 電解クロム酸第1処理 浴組成 CrO3 80g/ NaF 4g/ 浴温 50℃ 電解条件 50A/dm2×0.2秒 電解クロム酸第2処理 浴組成 CrO3 60g/ Na2SIF6 4g/ 浴温 40℃ 電解条件 15A/dm2×1.0秒 以上のようにして得られたテインフリー鋼板に
対してT型剥離試験を行つた。 上記各テインフリー鋼板の片面を50±5mg/d
m2でサイジング塗装し、190℃で10分焼付した後、
残つた反対面に同量のゴールド塗装を施し、210
℃で10分の焼付を行つた。この後、サイジング塗
装した面とゴールド塗装した面との間にナイロン
系の接着用合成樹脂テープ(厚み100μm、幅5
mm)を狭み、ホツトプレスにより190℃、1Kg/
cm2で30秒間の圧着を行つて接着させ、複数個のテ
ストピースを作成した。これらの接着直後のテス
トピースについて、インストロン引張り試験機を
用いて200mm/minの一定引張速度でT型剥離試
験を行い、剥離強度を測定した。 さらに、別のテストピースを用いて蔗糖15g/
を含み、くえん酸でPH3.3に調整した糖酸液に
70℃で7日間浸漬した後の剥離強度を前記と同じ
条件で測定した。 いずれの試験も各テストピースを5個づつ用い
て行つた。試験結果を下表2に示すが、結果はそ
の平均値で示す。接着直後のT型剥離試験値は塗
装後の塗膜の密着性を判定するものである。また
高温殺菌などのレトルト処理を行う場合に、塗膜
を透過して侵入してきた水に溶解するCrOXの成分
が多いと、塗膜とCrOXとの間の接着力が低下し、
耐レトルト処理性が悪くなる。70℃、7日間浸漬
後のT型剥離試験値はこの評価を行うものであ
る。 また、表2の試験結果から、本発明によるテイ
ンフリー鋼板(実施例1〜3)においてはCrOX
膜にむらの発生もなく、耐レトルト処理性も優れ
ているが、従来例1および2においてはCrOX皮膜
にむらが発生し、耐レトルト処理性も劣つている
ことが明らかである。 以上説明した処から明らかなように、本発明に
よれば塗料との密着性や耐レトルト処理性の良好
なCrOX皮膜の均質なテインフリー鋼板が得られ、
これはレトルト処理用コーヒー缶や食缶の他、接
着缶であればガロン缶や雑缶にも利用できる。ま
また、塗装に用いる塗料はサイジングまたはゴー
ルドと称される塗料に限らず、有機溶剤による塗
料であれば良く、また接着剤もサイロン系のみに
限定されることはない。
[Table] (Measurement of Cr OX amount) The prepared sample was immersed in a 300 g/caustic soda solution at 100°C for 10 minutes, and the Cr amount was quantified using a calibration curve based on the difference between the measured values before and after. The amount of Cr OX was measured using the fluorescent X-ray method (Xray40KV60m
A. Monitored for 60 seconds). (EPMA measurement) The Cr OX film was fixed with a carbon film, and then metallic chromium was dissolved with nital from the base steel side, and then placed on a clean platinum foil, and line analysis was performed using EPMA. Accelerating voltage: 20KV Electron beam intensity: 0.02μA Beam diameter: 2μ Next, the present invention will be specifically explained with reference to examples. Example 1 A cold-rolled steel plate with a thickness of 0.22 mm was electrolytically degreased in a 5% fomethazone solution at 80°C and at a current density of 15 A/dm 2 for 10 seconds, then washed with water, and then degreased in 10% sulfuric acid at room temperature for 5 seconds. After immersion and washing with water, the main treatment was performed under the following conditions. Chromium plating treatment Bath composition: 250 g of CrO 3 / 2.5 g of H 2 SO 4 / Bath temperature: 55° C. Electrolytic conditions: 50 A/dm 2 × 1.5 seconds After the above chromium plating, a reverse electrolytic treatment was performed in the same solution under the following conditions. Reverse electrolysis conditions: 15A/dm 2 ×0.2 seconds After this, the sample was washed with water and immediately subjected to electrolytic chromic acid treatment under the following conditions. Electrolytic chromic acid 1st treatment Bath composition CrO 3 80g / NaF 4g / Bath temperature 50℃ Electrolytic conditions 50A/dm 2 × 0.2 seconds Electrolytic chromic acid 2nd treatment Bath composition CrO 3 60g / Na 2 SiF 6 4g / Bath temperature 40℃ Electrolysis conditions: 15 A/dm 2 ×1.0 seconds Immediately after the second electrolytic chromic acid treatment, samples were prepared by washing with water, further washing with hot water, and drying. Example 2 The same treatment as in Example 1 was performed except that electrolytic chromic acid treatment was performed under the following conditions. Electrolytic chromic acid 1st treatment Bath composition CrO 3 50g / HF 4g / Bath temperature 40℃ Electrolytic conditions 30A/dm 2 × 0.2 seconds Electrolytic chromic acid 2nd treatment Bath composition CrO 3 60g / HBF 4 3g / Bath temperature 40℃ Electrolytic conditions 15 A/dm 2 ×1.0 seconds Example 3 The same treatment as in Example 1 was performed except that electrolytic chromic acid treatment was performed under the following conditions. Electrolytic chromic acid 1st treatment Bath composition CrO 3 50g/ Na 2 Cr 2 O 7 10g/ NH 4 F 5g/ Bath temperature 40℃ Electrolytic conditions 15A/dm 2 × 0.2 seconds Electrolytic chromic acid 2nd treatment Bath composition CrO 3 60g/ 5g of Na 2 AlF 6 / Bath temperature 40℃ Electrolysis conditions 15A/dm 2 × 1.0 seconds Comparative example 1 After the above chromium plating, immerse in the same solution for 5 seconds,
The same treatment as in Example 1 was performed except that the electrolytic chromic acid treatment was performed under the following conditions. Electrolytic chromic acid treatment Bath composition: 60 g of CrO 3 / 4 g of Na 2 SiF 6 / Bath temperature: 40°C Electrolytic conditions: 15 A/dm 2 × 1.0 seconds Comparative example 2 After the chromium plating described above, immerse in the same solution for 5 seconds,
The same treatment as in Example 1 was performed except that the electrolytic chromic acid treatment was performed under the following conditions. Electrolytic chromic acid 1st treatment Bath composition CrO 3 80g / NaF 4g / Bath temperature 50℃ Electrolytic conditions 50A/dm 2 × 0.2 seconds Electrolytic chromic acid 2nd treatment Bath composition CrO 3 60g / Na 2 SIF 6 4g / Bath temperature 40℃ Electrolysis conditions: 15 A/dm 2 ×1.0 seconds A T-peel test was conducted on the stain-free steel sheet obtained as described above. 50±5mg/d on one side of each of the above stain-free steel plates
After painting the sizing with m2 and baking at 190℃ for 10 minutes,
Apply the same amount of gold paint to the remaining opposite side, 210
Baking was carried out for 10 minutes at ℃. After this, a nylon adhesive synthetic resin tape (thickness 100 μm, width 5
mm) and hot press at 190℃, 1Kg/
A plurality of test pieces were created by adhesion by pressing at cm 2 for 30 seconds. These test pieces immediately after adhesion were subjected to a T-peel test using an Instron tensile tester at a constant tensile speed of 200 mm/min to measure the peel strength. Furthermore, using another test piece, 15 g of sucrose/
Contains sugar acid solution adjusted to PH3.3 with citric acid.
The peel strength after immersion at 70°C for 7 days was measured under the same conditions as above. All tests were conducted using five test pieces of each type. The test results are shown in Table 2 below, and the results are expressed as average values. The T-peel test value immediately after adhesion is used to judge the adhesion of the coating after painting. Furthermore, when performing retort processing such as high-temperature sterilization, if there is a large amount of Cr OX dissolved in the water that has penetrated the paint film, the adhesive strength between the paint film and Cr OX will decrease.
Retort processing resistance deteriorates. The T-peel test value after 7 days of immersion at 70°C is used for this evaluation. In addition, from the test results in Table 2, the stain-free steel sheets according to the present invention (Examples 1 to 3) have no unevenness in the Cr OX film and have excellent retort treatment resistance, but in the conventional examples 1 and 2, It is clear that unevenness occurs in the Cr OX film and the retort treatment resistance is also poor. As is clear from the above explanation, according to the present invention, a homogeneous stain-free steel sheet with a Cr OX film having good adhesion to paint and retort treatment resistance can be obtained.
This can be used for coffee cans and food cans for retort processing, as well as gallon cans and miscellaneous cans as long as they are adhesive cans. Further, the paint used for painting is not limited to a paint called sizing or gold, but any paint made of an organic solvent may be used, and the adhesive is not limited to only a silon type.

【表】【table】 【図面の簡単な説明】[Brief explanation of the drawing]

第1図はクロムめつき後のCrOX皮膜のEPMA
ラインアナリシス図、第2図は逆電解後のCrOX
膜のEPMAラインナアリシス図、第3図は電解
クロム酸第1処理後のCrOX皮膜のEPMAライン
アナリシス図、第4図は電解クロム酸第2処理後
のCrOX皮膜のEPMAラインアナリシス図、第5
図は従来の電解クロム酸処理後のCrOX皮膜の
EPMAラインアナリシス図、第6図および第7
図は金属の表面組識の400倍光学顕微鏡写真であ
り、第6図は第4図と同一試料の顕微鏡写真、第
7図と第5図と同一試料の顕微鏡写真である。
Figure 1 shows EPMA of Cr OX film after chrome plating.
Line analysis diagram, Figure 2 is an EPMA line analysis diagram of the Cr OX film after reverse electrolysis, Figure 3 is an EPMA line analysis diagram of the Cr OX film after the first electrolytic chromic acid treatment, and Figure 4 is an EPMA line analysis diagram of the Cr OX film after the first electrolytic chromic acid treatment. EPMA line analysis diagram of Cr OX film after 2 treatments, 5th
The figure shows the Cr OX film after conventional electrolytic chromic acid treatment.
EPMA line analysis diagrams, Figures 6 and 7
The figure is a 400x optical micrograph of the surface structure of a metal, FIG. 6 is a micrograph of the same sample as in FIG. 4, and micrographs of the same sample as in FIGS. 7 and 5.

Claims (1)

【特許請求の範囲】[Claims] 1 クロムめつき浴とこれに対して水洗浴を隔て
て分離された電解クロム酸処理浴とを用い、鋼板
上に金属クロム被膜とこれに重ねて被成したクロ
ム水和酸化物主体の被膜とを有するテインフリー
鋼板を製造するに当り、クロムめつき浴にて鋼板
にクロムめつきを施した後クロムめつき浴中で逆
電解を施し、クロムめつき時に生成したクロム水
和酸化物被膜の一部ならびにクロム水和酸化物被
膜中に共析した助剤アニオンを溶出せしめ、この
後に水洗浴にて十分な水洗を行ない、次いで無水
クロム酸、クロム酸塩および重クロム酸塩より選
択された小なくとも1種の化合物を主剤とし、単
純塩系弗素化合物を助剤に用いたクロム酸水溶液
中で電解クロム酸第1処理を施し、次いで無水ク
ロム酸、クロム酸塩および重クロム酸塩より選択
された少なくとも1種の化合物を主剤とし、錯塩
系弗素化合物を助剤に用いたクロム酸水溶液中で
電解クロム酸第2処理を施すことを特徴とするテ
インフリー鋼板の製造方法。
1 Using a chromium plating bath and an electrolytic chromic acid treatment bath separated from it by a water washing bath, a metallic chromium coating is formed on a steel plate, and a coating consisting mainly of chromium hydrated oxide formed over this is coated on a steel plate. In order to produce a stain-free steel sheet with chromium plating, the steel sheet is chromium plated in a chromium plating bath and then reverse electrolyzed in the chromium plating bath to remove the chromium hydrated oxide film formed during chromium plating. The auxiliary anions eutectoided in the chromium hydrated oxide film were eluted, and then thoroughly washed with water in a water washing bath. The first treatment is performed with electrolytic chromic acid in an aqueous chromic acid solution containing at least one type of compound as the main agent and a simple salt fluorine compound as an auxiliary agent, and then treated with chromic acid anhydride, chromate, and dichromate. A method for producing a stain-free steel sheet, which comprises performing a second electrolytic chromic acid treatment in an aqueous chromic acid solution using at least one selected compound as a main agent and a complex salt-based fluorine compound as an auxiliary agent.
JP6154882A 1982-04-13 1982-04-13 Production of tin-free steel plate Granted JPS58177491A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6154882A JPS58177491A (en) 1982-04-13 1982-04-13 Production of tin-free steel plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6154882A JPS58177491A (en) 1982-04-13 1982-04-13 Production of tin-free steel plate

Publications (2)

Publication Number Publication Date
JPS58177491A JPS58177491A (en) 1983-10-18
JPS639038B2 true JPS639038B2 (en) 1988-02-25

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Publication number Priority date Publication date Assignee Title
JPS60103200A (en) * 1983-11-10 1985-06-07 Kawasaki Steel Corp Tin-free steel having excellent adhesive properties
JPS60114595A (en) * 1983-11-25 1985-06-21 Kawasaki Steel Corp Tin-free steel having superior adhesive property

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