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JPS641494B2 - - Google Patents
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JPS641494B2 - - Google Patents

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Publication number
JPS641494B2
JPS641494B2 JP15635283A JP15635283A JPS641494B2 JP S641494 B2 JPS641494 B2 JP S641494B2 JP 15635283 A JP15635283 A JP 15635283A JP 15635283 A JP15635283 A JP 15635283A JP S641494 B2 JPS641494 B2 JP S641494B2
Authority
JP
Japan
Prior art keywords
general formula
group
divalent
represented
polyimide resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP15635283A
Other languages
Japanese (ja)
Other versions
JPS6049030A (en
Inventor
Yoshio Imai
Masaaki Kakimoto
Nabisahebu Marudaru Nuurumahanmada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TOKYO KOGYO DAIGAKUCHO
Original Assignee
TOKYO KOGYO DAIGAKUCHO
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TOKYO KOGYO DAIGAKUCHO filed Critical TOKYO KOGYO DAIGAKUCHO
Priority to JP15635283A priority Critical patent/JPS6049030A/en
Publication of JPS6049030A publication Critical patent/JPS6049030A/en
Publication of JPS641494B2 publication Critical patent/JPS641494B2/ja
Granted legal-status Critical Current

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  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

本発明は新規なポリイミド樹脂およびその製造
方法に関する。 従来ポリイミド樹脂は優れた耐熱性とともに優
れた電気的、機械的特性を有し、広く工業材料し
て使用された来た。しかしこれら多くのポリイミ
ド樹脂は各種有機溶剤および鉱酸のいずれにも不
溶であり、また熱的に不融でもあるので、その成
形を行なうことは極めて困難であつた。そこで本
発明者らは各種有機溶剤や鉱酸に可溶なポリイミ
ド樹脂を製造するべく鋭意努力し、本発明を完成
した。 本発明の第1の発明は、一般式 (式中、Rは4価の有機基、ArはArが1種の
場合は2価のテトラフエニルチオフエン基、Ar
が2種以上の場合はその中の1種として2価のテ
トラフエニルチオフエン基、他の種として2価の
芳香族基、nは10〜200の整数を示す) で表わされるポリイミド樹脂である。 本発明の第2の発明は、一般式 (式中、Rは4価の有機基、ArはArが1種の
場合は2価のテトラフエニルチオフエン基、Ar
が2種以上の場合はその中の1種として2価のテ
トラフエニルチオフエン基、他の種として2価の
芳香族基、nは10〜200の整数を示す) で表わされるポリイミド樹脂を製造するに当り、 一般式 H2N―Ar―NH2 () (式中、ArはArが1種の場合は2価のテトラ
フエニルチオフエン基、Arが2種以上の場合は
その中の1種として2価のテトラフエニルチオフ
エン基、他の種として2価の芳香族基を示す)で
表わされるジアミンの1種又は2種以上と 一般式 (式中、Rは4価の有機基を示す)で表わされ
るテトラカルボン酸二無水物を有機溶媒中で反応
させるポリイミド樹脂の製造方法である。 本発明の一般式()で表わされるポリイミド
樹脂は本発明の前記製造方法によつて有機溶媒溶
液として得られる特徴を有しこの溶液より容易に
ポリイミド樹脂のフイルム等の成形品を得ること
ができ、その工業的価値はきわめて高い。 上記一般式()で表わされるポリイミド樹脂
は上記一般式()で表わされるジアミンと上記
一般式()で表わされるテトラカルボン酸二無
水物から製造されるが、ジアミンとしては2価の
テトラフエニルチオフエン基からなるジアミンを
単独で使用することもできるし、あるいは、50〜
99モル%のテトラフエニルチオフエン基からなる
ジアミン50〜1モル%の1種または2種以上の2
価の芳香族基からなるジアミンを混合して使用す
ることもできる。ジアミンを混合して使用する場
合2価のテトラフエニルチオフエン基からなるジ
アミンが50モル%未満となると本発明の特徴であ
る有機溶剤や鉱酸への溶解性を十分満足しなくな
る。 上記一般式()で表わされるジアミンのう
ち、2価のテトラフエニルチオフエン基からなる
ジアミンとは2,5―ビス(4―アミノフエニ
ル)―3,4―ジフエニルチオフエンを指す。こ
のジアミンは工業的に安価に入手できる塩化ベン
ジルとイオウを原料に製造できることが知られて
いる。 例えばベー・デイルテイら(W.Dilthey)によ
りジユルナール・プラクテイツシエ・ヘミー(J.
Prakt.Chem.)第2巻第151頁と第257頁(1938
年)に発表されている。 上記一般式()で表わされるジアミンのう
ち、2価の芳香族基からなるジアミンとしては、
メタフエニレンジアミン、パラフエニレンジアミ
ン、3,3′―ジアミノビフエニル、4,4′―ジア
ミノビフエニル、3,3′―メチレンジアニリン、
4,4′―メチレンジアニリン、4,4′―エチレン
ジアニリン、4,4′―イソプロピリデンジアニリ
ン、3,3′―オキシジアニリン、4,4′―オキシ
ジアニリン、3,4′―オキシジアニリン、3,
3′―チオジアニリン、4,4′―チオジアニリン、
3,3′―カルボニルジアニリン、4,4′―カルボ
ニルジアニリン、3,3′―スルホニルジアニリ
ン、4,4′―スルホニルジアニリン、1,4′―ナ
フタレンジアミン、1,5―ナフタレンジアミ
ン、2,6―ナフタレンジアミン等を例示するこ
とができる。 本発明で使用する上記一般式()で表わされ
るテトラカルボン酸二無水物誘導体としては、た
とえばピロメリツト酸二無水物、2,3,6,7
―ナフタリンテトラカルボン酸二無水物、3,
4,3′,4′―ビフエニルテトラカルボン酸二無水
物、2,3,2′,3′―ビフエニルテトラカルボン
酸二無水物、ビス(3,4―ジカルボキシフエニ
ル)メタン二無水物、ビス(3,4―ジカルボキ
シフエニル)エーテル二無水物、ビス(3,4―
ジカルボキシフエニル)スルホン二無水物、2,
2―ビス(3,4―ジカルボキシフエニル)プロ
パン二無水物、3,4,3′,4′―ベンゾフエノン
テトラカルボン酸二無水物、ブタンテトラカルボ
ン酸二無水物等を例示することができる。 上記一般式()で表わされるポリイミド樹脂
の製造方法は有機溶剤中実質上無水の条件下で上
記一般式()で表わされるジアミン化合物と上
記一般式()で表わされるテトラカルボン酸二
無水物誘導体を0〜100℃で数十分から数日間反
応させた後、80゜〜400℃で数十分から数日間反応
させることにより行なわれるものである。この方
法において一般式()で表わされるポリイミド
樹脂の分子量は、一般式()で表わされるジア
ミン化合物と、一般式()で表わされるテトラ
カルボン酸二無水物誘導体の仕込量によつて制限
され、これらの反応成分を等モル量使用すると高
分子量の上記一般式()で表わされるポリイミ
ド樹脂を製造することができる。一般式()の
ポリイミド樹脂においてnを10〜200の整数に限
定した理由は、nが10より小ではフイルム等に成
形した成形品の機械的特性や耐熱性等の特性が十
分でなく、nが200を越えると有機溶剤等への溶
解性や成形性が悪くなるからである。 この方法に使用できる有機溶媒としては、N,
N―ジメチルホルムアミド、N,N―ジメチルア
セトアミド、N―メチル―2―ピロリドン等のア
ミド系溶媒、ジメチルスルホキシド、テトラメチ
レンスルホン等のイオウ系溶媒アニソール、ジフ
エニルエーテル、ニトロベンゼン、ベンゾニトリ
ル、クレゾール、フエノール等のベンゼン系溶媒
等を例示することができる。特にクレゾール、ニ
トロベンゼン等の水と共沸することのできる溶媒
を使用すると、これらの溶媒の沸点で後期の反応
を行なわせ、その時同時に溶媒を蒸留により除去
する等の操作を行なえばさらに高い効率で反応を
進行させることができる。またこの時、イソキノ
リン等の添加剤を加えることにより、生成する上
記一般式()で表わされるポリイミド樹脂の有
機溶媒への溶解性を調節することができる。 本発明においては、上記一般式()で表わさ
れるジアミン化合物と、上記一般式()で表わ
されるテトラカルボン酸二無水物誘導体を反応さ
せ、一般式 (式中、R,Ar,nは一般式の場合と同じ
ものを示す) で表わされるポリイミド酸誘導体を製造し、従来
より用いられている脱水環化法例えばシー・イ
ー・スルーク(C.E.Sroog)マクロモレキユラ
ー・シンセシス(Macromolecular Syntheses)
コレクテイブボリユーム第1巻、第295頁(1977
年)に記載された方法により、一般式()で表
わされる本発明のポリイミド樹脂を製造すること
もできる。上記一般式()で表わされるポリア
ミド酸誘導体は、上記一般式()で表わされる
ジアミン化合物と、上記一般式()で表わされ
るテトラカルボン酸二無水物誘導体を実質上無水
の条件下において反応させることにより容易に得
られるものである。上記一般式()で表わされ
るポリアミド酸誘導体の重合度は、上記一般式
()で表わされるジアミン化合物と上記一般式
()で表わされるテトラカルボン酸二無水物誘
導体の仕込量によつて制限され、これらの反応成
分を等モル量使用すると高分子量の上記一般式
()で表わされるポリアミド酸誘導体を製造す
ることができる。このポリアミド酸誘導体の分子
量については一般式()のポリイミド樹脂と同
様である。上記一般式()で表わされるポリア
ミド酸誘導体を製造する時に使用できる反応温度
は、0℃から300℃の間で選択することができる
が、高温での反応物はさらに反応が進行したポリ
イミド構造を含む可能性があり、60℃以下に反応
温度を制御することが好ましい。またこの反応に
使用可能な有機溶媒としては一般式()で表わ
されるポリアミド酸誘導体を経由せずにポリイミ
ド樹脂の製造を行なう前記の場合と同一の溶剤を
例示することができる。 かくして得られた上記一般式()で表わされ
るポリアミド酸誘導体の上記一般式()で表わ
されるポリイミド樹脂への環化方法の一つは、上
記一般式()で表わされるポリアミド酸誘導体
を50℃〜500℃の範囲内の温度に加熱する方法で
ある。この加熱時間は前記範囲内の加熱温度によ
つて異なるが、一般に数秒から数十時間の間であ
る。別法としては、上記一般式()で表わされ
るポリアミド酸誘導体をたとえば酢酸、プロピオ
ン酸、酪酸、安息香酸等の酸無水物で処理する如
き化学処理を行なうことによつて容易にポリイミ
ド樹脂への環化を達成し得る。ここでカルボン酸
の酸無水物には環化反応を促進する物質としてピ
リジン等を併用することが望ましい。 上記一般式()で表わされるポリイミド樹脂
を製造する方法の別法としては、上記一般式
()で表わされるポリアミド酸誘導体を製造す
る方法と同一の方法により反応を進行させ、その
後期において上記一般式()で表わされるポリ
アミド酸誘導体を単離することなく無水酢酸等の
添加剤を加えさらに0℃〜300℃の温度で数分か
ら数十時間反応させるものである。この反応に使
用し得る添加剤には、前記一般式()で表わさ
れるポリアミド酸誘導体の化学処理により前記一
般式()で表わされるポリイミド樹脂を製造す
る時と同一の添加剤を使用することができる。 かくして製造された一般式()で表わされる
ポリイミド樹脂は、使用した製造方法、使用した
一般式()で表わされるジアミンと使用した一
般式()で表わされるテトラカルボン酸二無水
物誘導体の種類により特にその溶解性が変化する
が、多くの誘導体において硫酸等の鉱酸に可溶と
なる。また一部の誘導体においては、クロロホル
ム、テトラクロロエタン、N,N―ジメチルホル
ムアミド、N,N―ジメチルアセトアミド、N―
メチル―2―ピロリドン、ジメチルスルホキシ
ド、クレゾール等の溶剤の全てに、または一部に
可溶となる。上記一般式()で表わされるポリ
イミド樹脂は、熱的に安定で500℃付近まで加熱
しても顕著な変化は認められない。 以下本発明を実施例により更に詳細に説明す
る。 実施例 1 2.5―ジ(4―アミノフエニル)―3,4―ジ
フエニルチオフエン418mg(1ミリモル)を5ml
の脱水したm―クレゾールに溶解し、窒素気流下
で40℃に加熱した。この溶液に322mg(1ミリモ
ル)の3,4,3′,4′―ベンゾフエノンテトラカ
ルボン酸二無水物を加え、2.4mlの脱水したm―
クレゾールで残存する少量のテトラカルボン酸二
無水物を流浄し、反応溶液に加えた。45℃で3時
間、150℃で3時間撹拌しながら反応させた。反
応装置に蒸留用のヘツドとリービツヒ冷却管をと
りつけ、油浴温度250℃で溶媒のm―クレゾール
を窒素気流下に蒸留した。この時反応装置内の液
量が約7mlを保つように脱水したm―クレゾール
を加えた。この操作を5時間行なつた後窒素気流
下室温に冷却し、黄色のポリイミド樹脂溶液を得
た。この溶液を300mlのメタノールに投入しポリ
イミド樹脂の沈でんを得、減圧下100℃で4時間
乾燥した。一方反応終了時のm―クレゾール溶液
をガラス板にキヤストしてポリイミドフイルムを
得た。 生成樹脂の固有粘度は0.58(0.5g/dl,m―ク
レゾール30℃)であつた。 赤外線吸収スペクトル(フイルム)cm-1; 1780,1720,1360,720 元素分析値 C H N S 計算値(%) 76.70 3.41 3.98 4.55 実測値(%) 76.02 3.36 3.64 4.51 生成したポリイミド樹脂の有機溶媒および硫酸
に対する溶解性は表に示す。 実施例 2 2.5―ジ(4―アミノフエニル)―3,4―ジ
フエニルチオフエン418mg(1ミリモル)とイソ
キノリン42mgを5mlの脱水したm―クレゾールに
溶解し窒素気流下で40℃に加熱した。この溶液に
322mg(1ミリモル)の3,4,3′,4′―ベンゾ
フエノンテトラカルボン酸二無水物を加え、2.4
mlの脱水したm―クレゾールで残存する少量のテ
トラカルボン酸二無水物を流浄し反応溶液に加え
た。45℃で3時間150℃で3時間撹拌しながら反
応させた。反応装置に蒸留用のヘツドとリービツ
ヒ冷却管をとりつけ油浴温度250℃で溶剤を窒素
気流下に蒸留した。この時反応装置内の液量が約
7mlに保つようにイソキノリン25mg/mlを含む脱
水したm―クレゾールを加えた。この操作を5時
間行なつた後窒素気流下室温に冷却し、黄色のポ
リイミド樹脂溶液を得た。この溶液を300mlのメ
タノールに投入しポリイミド樹脂の沈でんを得、
減圧下100℃で4時間乾燥した。一方反応終了時
のm―クレゾール溶液をガラス板にキヤストして
ポリイミドフイルムを得た。生成樹脂の固有粘度
は0.61g/dl,m―クレゾール,30℃)であつ
た。 赤外線吸収スペクトル(フイルム)cm-; 1780,1720,1360,720 生成したポリイミド樹脂の有機溶媒および硫酸
に対する溶解性は表1に示す。 実施例 3 2.5―ジ(4―アミノフエニル)―3,4―ジ
フエニルチオフエン418mg(1ミリモル)を5ml
の脱水したN―メチル―2―ピロリドン
(NMP)に溶解した。この溶液に322mg(1ミリ
モル)の3,4,3′,4′―ベンゾフエノンテトラ
カルボン酸二無水物を窒素気流下で加え、2.4ml
の脱水したNMPで残存する少量のテトラカルボ
ン酸二無水物を流浄し反応溶液に加えた。15℃で
1.5時間、25℃で1.5時間窒素気流下で反応させ
た。得られた黄色の溶液にピリジン4ミリモル無
水酢酸4ミリモルを加え25℃で24時間撹拌した。
この溶液を300mlのメタノールに投入しポリイミ
ド樹脂の沈でんを得、減圧下100℃で4時間乾燥
した。生成樹脂の固有粘度は0.82(0.5g/dl,
H2SO4,30℃)であつた。 赤外線吸収スペクトル(フイルム)cm-1; 1780,1720,1360,720 生成したポリイミド樹脂の有機溶媒および硫酸
に対する溶解性を表1に示す。 実施例 4 2.5―ジ(4―アミノフエニル)―3,4―ジ
フエニルチオフエン418mg(1ミリモル)を5ml
の脱水したN,N―ジメチルアセトアミド
(DMAc)に溶解した。この溶液に322mg(1ミ
リモル)の3,4,3′,4′―ベンゾフエノンテト
ラカルボン酸二無水物を窒素気流下で加え、2.4
mlの脱水したDMAcで残存する少量のテトラカ
ルボン酸二無水物を流浄し反応溶液に加えた。15
℃で1.5時間25℃で24時間窒素気流下で撹拌した。
得られた溶液を300mlのメタノールに投入し、ポ
リアミド酸の沈でんを得た。〔固有粘度0.58(0.5
g/dl,DMAc,30℃)〕一方反応終了時の溶液
をガラス板にキヤストし、空気中80℃で乾燥させ
ポリアミド酸のフイルムを得た。得られたフイル
ムをベンゼン30ml、ピリジン10ml、無水酢酸10ml
の混合液に24時間ひたした。さらに窒素気流下
300℃で1時間熱処理してポリイミドフイルムを
得た。一方ポリアミド酸フイルムを200℃5時間、
窒素気流下300℃で1時間熱処理してポリイミド
フイルムを得た。 赤外線吸収スペクトル(フイルム)cm-1; 1780,1720,1360,720 生成したポリイミドフイルムは硫酸に可溶であつ
たが、有機溶剤には不溶であつた。 実施例 5 実施例4と同様の方法により2.5―ジ(4―ア
ミノフエニル)―3,4―ジフエニルチオフエン
1ミリモルと、ピロメリツト酸二無水物1ミリモ
ルからポリアミド酸〔固有粒度0.99(0.5g/dl,
DMAc,30℃)〕を得、実施例4と同様の方法に
よりポリイミドフイルムを得た。 赤外線吸収スペクトル(フイルム)cm-1; 1780,1720,1360,720 生成したポリイミドフイルムは硫酸に可溶であ
つたが、有機溶剤には不溶であつた。 実施例 6 実施例1と同様の方法により2.5―ジ(4―ア
ミノフエニル)―3,4―ジフエニルチオフエン
0.9ミリモルと4,4′―オキシジアリニン0.1ミリ
モルと3,4,3′,4′―ベンゾフエノンテトラカ
ルボン酸二無水物1モルミリとからコポリイミド
樹脂を得た。 生成樹脂の固有粘度は0.99(0.5g/dl,
H2SO4,30℃)であつた。 赤外線吸収スペクトル(フイルム)cm-1; 1780,1720,1360,720 生成したコポリイミド樹脂の有機溶媒および硫
酸に対する溶解性は表1に示す。 実施例 7 実施例1と同様の方法により2.5―ジ(4―ア
ミノフエニル)―3,4―ジフエニルチオフエン
0.8ミリモルと4,4′―オキシジアニリン0.2ミリ
モルと3,4,3′,4′―ベンゾフエノンテトラカ
ルボン酸二無水物1ミリモルとからコポリイミド
樹脂を得た。 生成樹脂の固有粘度は1.06(0.5g/dl,
H2SO4,30℃)であつた。 赤外線吸収スペクトル(フイルム)cm-1; 1780,1720,1360,720 生成したコポリイミド樹脂の有機溶媒および硫
酸に対する溶解性は表1に示す。
The present invention relates to a novel polyimide resin and a method for producing the same. Conventionally, polyimide resins have excellent heat resistance as well as excellent electrical and mechanical properties, and have been widely used as industrial materials. However, many of these polyimide resins are insoluble in various organic solvents and mineral acids, and are also thermally infusible, making it extremely difficult to mold them. Therefore, the present inventors have made earnest efforts to produce polyimide resins that are soluble in various organic solvents and mineral acids, and have completed the present invention. The first invention of the present invention is based on the general formula (In the formula, R is a tetravalent organic group, Ar is a divalent tetraphenylthiophene group when there is only one type of Ar, Ar
When there are two or more types, one of them is a divalent tetraphenylthiophene group, the other is a divalent aromatic group, and n is an integer from 10 to 200). be. The second invention of the present invention is the general formula (In the formula, R is a tetravalent organic group, Ar is a divalent tetraphenylthiophene group when there is only one type of Ar, Ar
When there are two or more types, one of them is a divalent tetraphenylthiophene group, the other is a divalent aromatic group, and n is an integer of 10 to 200). During production, the general formula H 2 N―Ar―NH 2 () (in the formula, Ar is a divalent tetraphenylthiophene group when there is one type of Ar, and when there are two or more types of Ar, it is a divalent tetraphenylthiophene group). one type or two or more diamines represented by a divalent tetraphenylthiophene group as one type and a divalent aromatic group as the other type, and the general formula This is a method for producing a polyimide resin in which a tetracarboxylic dianhydride represented by the formula (wherein R represents a tetravalent organic group) is reacted in an organic solvent. The polyimide resin represented by the general formula () of the present invention has the characteristic that it can be obtained as an organic solvent solution by the production method of the present invention, and molded products such as polyimide resin films can be easily obtained from this solution. , its industrial value is extremely high. The polyimide resin represented by the above general formula () is produced from the diamine represented by the above general formula () and the tetracarboxylic dianhydride represented by the above general formula (). Diamines consisting of ruthiophene groups can be used alone, or
50 to 1 mol% of one or more diamines consisting of 99 mol% of tetraphenylthiophene groups
It is also possible to use a mixture of diamines consisting of aromatic groups. When using a mixture of diamines, if the diamine consisting of divalent tetraphenylthiophene groups is less than 50 mol%, the solubility in organic solvents and mineral acids, which is a feature of the present invention, will not be sufficiently satisfied. Among the diamines represented by the above general formula (), the diamine consisting of a divalent tetraphenylthiophene group refers to 2,5-bis(4-aminophenyl)-3,4-diphenylthiophene. It is known that this diamine can be produced from benzyl chloride and sulfur, which are industrially available at low cost. For example, W. Dilthey et al.
Prakt.Chem.) Volume 2, pages 151 and 257 (1938
It was published in 2013). Among the diamines represented by the above general formula (), the diamines consisting of a divalent aromatic group include:
Metaphenylene diamine, paraphenylene diamine, 3,3'-diaminobiphenyl, 4,4'-diaminobiphenyl, 3,3'-methylene dianiline,
4,4'-methylene dianiline, 4,4'-ethylene dianiline, 4,4'-isopropylidene dianiline, 3,3'-oxydianiline, 4,4'-oxydianiline, 3,4' -Oxydianiline, 3,
3′-thiodianiline, 4,4′-thiodianiline,
3,3'-carbonyldianiline, 4,4'-carbonyldianiline, 3,3'-sulfonyldianiline, 4,4'-sulfonyldianiline, 1,4'-naphthalenediamine, 1,5-naphthalenediamine , 2,6-naphthalenediamine, and the like. Examples of the tetracarboxylic dianhydride derivative represented by the above general formula () used in the present invention include pyromellitic dianhydride, 2,3,6,7
- Naphthalene tetracarboxylic dianhydride, 3,
4,3',4'-biphenyltetracarboxylic dianhydride, 2,3,2',3'-biphenyltetracarboxylic dianhydride, bis(3,4-dicarboxyphenyl)methane dianhydride bis(3,4-dicarboxyphenyl)ether dianhydride, bis(3,4-
dicarboxyphenyl) sulfone dianhydride, 2,
Examples include 2-bis(3,4-dicarboxyphenyl)propane dianhydride, 3,4,3',4'-benzophenonetetracarboxylic dianhydride, butanetetracarboxylic dianhydride, etc. I can do it. A method for producing a polyimide resin represented by the above general formula () is to prepare a diamine compound represented by the above general formula () and a tetracarboxylic dianhydride derivative represented by the above general formula () in an organic solvent under substantially anhydrous conditions. The reaction is carried out by reacting at 0 to 100°C for several tens of minutes to several days, and then at 80° to 400°C for several tens of minutes to several days. In this method, the molecular weight of the polyimide resin represented by the general formula () is limited by the amount of the diamine compound represented by the general formula () and the tetracarboxylic dianhydride derivative represented by the general formula (), When these reaction components are used in equimolar amounts, a high molecular weight polyimide resin represented by the above general formula () can be produced. The reason why n is limited to an integer between 10 and 200 in the polyimide resin of general formula () is that if n is smaller than 10, the mechanical properties and heat resistance of the molded product formed into a film etc. will not be sufficient. This is because if it exceeds 200, the solubility in organic solvents and moldability will deteriorate. Organic solvents that can be used in this method include N,
Amide solvents such as N-dimethylformamide, N,N-dimethylacetamide, N-methyl-2-pyrrolidone, sulfur solvents such as dimethyl sulfoxide and tetramethylene sulfone, anisole, diphenyl ether, nitrobenzene, benzonitrile, cresol, phenol. Examples include benzene-based solvents such as . In particular, when using a solvent that can azeotrope with water, such as cresol or nitrobenzene, the latter stage of the reaction can be carried out at the boiling point of these solvents, and if the solvent is removed at the same time by distillation, even higher efficiency can be achieved. The reaction can proceed. Further, at this time, by adding an additive such as isoquinoline, the solubility of the produced polyimide resin represented by the above general formula () in the organic solvent can be adjusted. In the present invention, a diamine compound represented by the above general formula () is reacted with a tetracarboxylic dianhydride derivative represented by the above general formula (), and the general formula (In the formula, R, Ar, and n are the same as in the general formula.) A polyimide acid derivative represented by Macromolecular Syntheses
Collective Volume Volume 1, Page 295 (1977
The polyimide resin of the present invention represented by the general formula () can also be produced by the method described in 2006). The polyamic acid derivative represented by the above general formula () is produced by reacting the diamine compound represented by the above general formula () with the tetracarboxylic dianhydride derivative represented by the above general formula () under substantially anhydrous conditions. It can be easily obtained by The degree of polymerization of the polyamic acid derivative represented by the above general formula () is limited by the amount of the diamine compound represented by the above general formula () and the tetracarboxylic dianhydride derivative represented by the above general formula (). When these reaction components are used in equimolar amounts, a high molecular weight polyamic acid derivative represented by the above general formula () can be produced. The molecular weight of this polyamic acid derivative is the same as that of the polyimide resin of general formula (). The reaction temperature that can be used to produce the polyamic acid derivative represented by the above general formula () can be selected between 0°C and 300°C, but the reactants at high temperatures will form a polyimide structure that has undergone further reaction. It is preferable to control the reaction temperature to 60°C or less. Examples of organic solvents that can be used in this reaction include the same solvents as used in the above-mentioned case in which the polyimide resin is produced without using the polyamic acid derivative represented by the general formula (). One method for cyclizing the thus obtained polyamic acid derivative represented by the above general formula () into a polyimide resin represented by the above general formula () is to cyclize the polyamic acid derivative represented by the above general formula () at 50°C. This method involves heating to a temperature within the range of ~500°C. This heating time varies depending on the heating temperature within the above range, but is generally between several seconds and several tens of hours. Alternatively, a polyamic acid derivative represented by the above general formula () can be easily converted into a polyimide resin by chemically treating it with an acid anhydride such as acetic acid, propionic acid, butyric acid, or benzoic acid. Cyclization can be achieved. Here, it is desirable to use pyridine or the like together with the carboxylic acid anhydride as a substance that promotes the cyclization reaction. As an alternative method for producing the polyimide resin represented by the above general formula (), the reaction proceeds by the same method as the method for producing the polyamic acid derivative represented by the above general formula (), and in the latter stage, the above-mentioned general formula Additives such as acetic anhydride are added to the polyamic acid derivative represented by the formula () without isolating it, and the mixture is further reacted at a temperature of 0° C. to 300° C. for several minutes to several tens of hours. As additives that can be used in this reaction, it is possible to use the same additives used when producing the polyimide resin represented by the general formula () by chemically treating the polyamic acid derivative represented by the general formula (). can. The thus produced polyimide resin represented by the general formula () depends on the manufacturing method used, the diamine represented by the general formula () used, and the type of tetracarboxylic dianhydride derivative represented by the general formula () used. In particular, its solubility varies, but many derivatives are soluble in mineral acids such as sulfuric acid. In addition, some derivatives include chloroform, tetrachloroethane, N,N-dimethylformamide, N,N-dimethylacetamide, N-
It becomes soluble in all or part of solvents such as methyl-2-pyrrolidone, dimethyl sulfoxide, and cresol. The polyimide resin represented by the above general formula () is thermally stable and shows no noticeable change even when heated to around 500°C. The present invention will be explained in more detail below with reference to Examples. Example 1 418 mg (1 mmol) of 2.5-di(4-aminophenyl)-3,4-diphenylthiophene in 5 ml
was dissolved in dehydrated m-cresol and heated to 40°C under a nitrogen stream. To this solution was added 322 mg (1 mmol) of 3,4,3',4'-benzophenonetetracarboxylic dianhydride, and 2.4 ml of dehydrated m-
A small amount of remaining tetracarboxylic dianhydride was washed away with cresol and added to the reaction solution. The reaction was carried out with stirring at 45°C for 3 hours and at 150°C for 3 hours. A distillation head and a Liebig condenser were attached to the reaction apparatus, and the solvent m-cresol was distilled under a nitrogen stream at an oil bath temperature of 250°C. At this time, dehydrated m-cresol was added so that the liquid volume in the reactor was maintained at about 7 ml. After performing this operation for 5 hours, the mixture was cooled to room temperature under a nitrogen stream to obtain a yellow polyimide resin solution. This solution was poured into 300 ml of methanol to obtain a polyimide resin precipitate, which was dried under reduced pressure at 100° C. for 4 hours. On the other hand, the m-cresol solution at the end of the reaction was cast on a glass plate to obtain a polyimide film. The intrinsic viscosity of the resulting resin was 0.58 (0.5 g/dl, m-cresol at 30°C). Infrared absorption spectrum (film) cm -1 ; 1780, 1720, 1360, 720 Elemental analysis value C H N S Calculated value (%) 76.70 3.41 3.98 4.55 Actual value (%) 76.02 3.36 3.64 4.51 Organic solvent of the produced polyimide resin and Solubility in sulfuric acid is shown in the table. Example 2 418 mg (1 mmol) of 2.5-di(4-aminophenyl)-3,4-diphenylthiophene and 42 mg of isoquinoline were dissolved in 5 ml of dehydrated m-cresol and heated to 40°C under a nitrogen stream. In this solution
Add 322 mg (1 mmol) of 3,4,3',4'-benzophenonetetracarboxylic dianhydride to 2.4
A small amount of remaining tetracarboxylic dianhydride was washed away with ml of dehydrated m-cresol and added to the reaction solution. The reaction was carried out at 45°C for 3 hours and at 150°C for 3 hours with stirring. A distillation head and a Liebig condenser were attached to the reaction apparatus, and the solvent was distilled under a nitrogen stream at an oil bath temperature of 250°C. At this time, dehydrated m-cresol containing 25 mg/ml of isoquinoline was added so that the liquid volume in the reactor was maintained at about 7 ml. After performing this operation for 5 hours, the mixture was cooled to room temperature under a nitrogen stream to obtain a yellow polyimide resin solution. Pour this solution into 300ml of methanol to obtain a precipitate of polyimide resin.
It was dried under reduced pressure at 100°C for 4 hours. On the other hand, the m-cresol solution at the end of the reaction was cast on a glass plate to obtain a polyimide film. The intrinsic viscosity of the resulting resin was 0.61 g/dl (m-cresol, 30°C). Infrared absorption spectrum (film) cm ; 1780, 1720, 1360, 720 The solubility of the produced polyimide resin in organic solvents and sulfuric acid is shown in Table 1. Example 3 418 mg (1 mmol) of 2.5-di(4-aminophenyl)-3,4-diphenylthiophene in 5 ml
was dissolved in dehydrated N-methyl-2-pyrrolidone (NMP). To this solution was added 322 mg (1 mmol) of 3,4,3',4'-benzophenonetetracarboxylic dianhydride under a nitrogen stream, and 2.4 ml of
A small amount of remaining tetracarboxylic dianhydride was washed away with dehydrated NMP and added to the reaction solution. at 15℃
The reaction was carried out for 1.5 hours and at 25° C. for 1.5 hours under a nitrogen stream. 4 mmol of pyridine and 4 mmol of acetic anhydride were added to the resulting yellow solution, and the mixture was stirred at 25°C for 24 hours.
This solution was poured into 300 ml of methanol to obtain a polyimide resin precipitate, which was dried under reduced pressure at 100° C. for 4 hours. The intrinsic viscosity of the produced resin is 0.82 (0.5g/dl,
H 2 SO 4 , 30°C). Infrared absorption spectrum (film) cm -1 ; 1780, 1720, 1360, 720 Table 1 shows the solubility of the produced polyimide resin in organic solvents and sulfuric acid. Example 4 418 mg (1 mmol) of 2.5-di(4-aminophenyl)-3,4-diphenylthiophene in 5 ml
was dissolved in dehydrated N,N-dimethylacetamide (DMAc). To this solution was added 322 mg (1 mmol) of 3,4,3',4'-benzophenonetetracarboxylic dianhydride under a nitrogen stream.
A small amount of remaining tetracarboxylic dianhydride was washed away with 1 ml of dehydrated DMAc and added to the reaction solution. 15
The mixture was stirred at 25°C for 1.5 hours and at 25°C for 24 hours under a nitrogen stream.
The obtained solution was poured into 300 ml of methanol to obtain a precipitate of polyamic acid. [Intrinsic viscosity 0.58 (0.5
g/dl, DMAc, 30°C)] On the other hand, the solution at the end of the reaction was cast on a glass plate and dried in air at 80°C to obtain a polyamic acid film. The obtained film was mixed with 30 ml of benzene, 10 ml of pyridine, and 10 ml of acetic anhydride.
Soaked in a mixture of for 24 hours. Further under nitrogen flow
A polyimide film was obtained by heat treatment at 300°C for 1 hour. On the other hand, polyamic acid film was heated at 200℃ for 5 hours.
A polyimide film was obtained by heat treatment at 300° C. for 1 hour under a nitrogen stream. Infrared absorption spectrum (film) cm -1 ; 1780, 1720, 1360, 720 The produced polyimide film was soluble in sulfuric acid, but insoluble in organic solvents. Example 5 Polyamic acid [specific particle size 0.99 (0.5 g/ dl,
DMAc, 30°C)] and a polyimide film was obtained in the same manner as in Example 4. Infrared absorption spectrum (film) cm -1 ; 1780, 1720, 1360, 720 The produced polyimide film was soluble in sulfuric acid, but insoluble in organic solvents. Example 6 2.5-di(4-aminophenyl)-3,4-diphenylthiophene was prepared in the same manner as in Example 1.
A copolyimide resin was obtained from 0.9 mmol of 4,4'-oxydialinine and 1 mmol of 3,4,3',4'-benzophenonetetracarboxylic dianhydride. The intrinsic viscosity of the produced resin is 0.99 (0.5g/dl,
H 2 SO 4 , 30°C). Infrared absorption spectrum (film) cm -1 ; 1780, 1720, 1360, 720 The solubility of the produced copolyimide resin in organic solvents and sulfuric acid is shown in Table 1. Example 7 2.5-di(4-aminophenyl)-3,4-diphenylthiophene was prepared in the same manner as in Example 1.
A copolyimide resin was obtained from 0.8 mmol of 4,4'-oxydianiline and 1 mmol of 3,4,3',4'-benzophenonetetracarboxylic dianhydride. The intrinsic viscosity of the resulting resin is 1.06 (0.5g/dl,
H 2 SO 4 , 30°C). Infrared absorption spectrum (film) cm -1 ; 1780, 1720, 1360, 720 The solubility of the produced copolyimide resin in organic solvents and sulfuric acid is shown in Table 1.

【表】 ;室温で可溶 +;熱時で可溶 ±;一部可溶
−;不溶
本発明は一般式()で表わされるポリイミド
樹脂およびこのポリイミド樹脂の有利な製造方法
を提供する。従来のポリイミド樹脂の多くが有機
溶媒や鉱酸のいずれにも不溶で且つ不融であるた
め成形が著しく困難であつたのに対して、本発明
のポリイミド樹脂は有機溶剤及び/又は鉱酸に可
溶で、成形容易であり、しかも優れた耐熱性、電
気的特性、機械的特性を有するので工業材料とし
ての価値が大きい。
[Table] ;Soluble at room temperature +;Soluble at heat ±;Partially soluble
-: insoluble The present invention provides a polyimide resin represented by the general formula () and an advantageous method for producing this polyimide resin. Most conventional polyimide resins are insoluble and infusible in both organic solvents and mineral acids, making it extremely difficult to mold them, whereas the polyimide resin of the present invention is resistant to organic solvents and/or mineral acids. It is soluble, easy to mold, and has excellent heat resistance, electrical properties, and mechanical properties, so it has great value as an industrial material.

Claims (1)

【特許請求の範囲】 1 一般式 (式中、Rは4価の有機基、ArはArが1種の
場合は2価のテトラフエニルチオフエン基、Ar
が2種以上の場合はその中の1種として2価のテ
トラフエニルチオフエン基、他の種として2価の
芳香族基、nは10〜200の整数を示す) で表わされるポリイミド樹脂。 2 一般式 (式中、Rは4価の有機基、ArはArが1種の
場合は2価のテトラフエニルチオフエン基、Ar
が2種以上の場合はその中の1種として2価のテ
トラフエニルチオフエン基、他の種として2価の
芳香族基、nは10〜200の整数を示す) で表わされるポリイミド樹脂を製造するに当り、 一般式 H2N―Ar―NH2 (式中、ArはArが1種の場合は2価のテトラ
フエニルチオフエン基、Arが2種以上の場合は
その中の1種として2価のテトラフエニルチオフ
エン基、他の種として2価の芳香族基を示す)で
表わされるジアミンの1種又は2種以上と 一般式 (式中、Rは4価の有機基を示す)で表わされ
るテトラカルボン酸二無水物を有機溶媒中で反応
させることを特徴とするポリイミド樹脂の製造方
法。
[Claims] 1. General formula (In the formula, R is a tetravalent organic group, Ar is a divalent tetraphenylthiophene group when there is only one type of Ar, Ar
When there are two or more types, one of them is a divalent tetraphenylthiophene group, the other type is a divalent aromatic group, and n is an integer of 10 to 200. 2 General formula (In the formula, R is a tetravalent organic group, Ar is a divalent tetraphenylthiophene group when there is only one type of Ar, Ar
When there are two or more types, one of them is a divalent tetraphenylthiophene group, the other is a divalent aromatic group, and n is an integer of 10 to 200). During production, the general formula H 2 N-Ar-NH 2 (wherein, Ar is a divalent tetraphenylthiophene group when there is one type of Ar, and one of them when there are two or more types of Ar) One or more diamines represented by a divalent tetraphenylthiophene group as a species and a divalent aromatic group as another species, and the general formula A method for producing a polyimide resin, which comprises reacting a tetracarboxylic dianhydride represented by the formula (wherein R represents a tetravalent organic group) in an organic solvent.
JP15635283A 1983-08-29 1983-08-29 Polyimide resin and its manufacture Granted JPS6049030A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15635283A JPS6049030A (en) 1983-08-29 1983-08-29 Polyimide resin and its manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15635283A JPS6049030A (en) 1983-08-29 1983-08-29 Polyimide resin and its manufacture

Publications (2)

Publication Number Publication Date
JPS6049030A JPS6049030A (en) 1985-03-18
JPS641494B2 true JPS641494B2 (en) 1989-01-11

Family

ID=15625876

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Link
JP (1) JPS6049030A (en)

Also Published As

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