JPS643139B2 - - Google Patents
Info
- Publication number
- JPS643139B2 JPS643139B2 JP59221221A JP22122184A JPS643139B2 JP S643139 B2 JPS643139 B2 JP S643139B2 JP 59221221 A JP59221221 A JP 59221221A JP 22122184 A JP22122184 A JP 22122184A JP S643139 B2 JPS643139 B2 JP S643139B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- fluorine
- fluorine gas
- neutralizing agent
- concentration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000007789 gas Substances 0.000 claims description 65
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 43
- 229910052731 fluorine Inorganic materials 0.000 claims description 43
- 239000011737 fluorine Substances 0.000 claims description 43
- 239000003795 chemical substances by application Substances 0.000 claims description 18
- 230000003472 neutralizing effect Effects 0.000 claims description 18
- 239000002912 waste gas Substances 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 12
- 238000010438 heat treatment Methods 0.000 claims description 9
- 239000007787 solid Substances 0.000 claims 1
- 229910052734 helium Inorganic materials 0.000 description 8
- 239000001307 helium Substances 0.000 description 5
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 5
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000007865 diluting Methods 0.000 description 3
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 150000002222 fluorine compounds Chemical class 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000001291 vacuum drying Methods 0.000 description 2
- 230000002745 absorbent Effects 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 238000003915 air pollution Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000003682 fluorination reaction Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
Landscapes
- Treating Waste Gases (AREA)
Description
産業上の利用分野
本発明は比較的低濃度の元素状フツ素ガス(以
下フツ素ガスと略す)を含有するガスからフツ素
ガスを除去する方法に関するものである。
現在フツ素ガスは、プラスチツクの表面フツ素
化、各種フツ化物の合成及びエキシマレーザー等
にひんぱんに使用されているが、使用後の廃ガス
は、N2、Ar、He、Ne等の不活性ガスで希釈さ
れた希薄フツ素ガスの状態である事が多く、これ
らを安全な低濃度(許容濃度1ppm以下)まで除
去する必要があるが、本発明はその除去方法を提
供するものである。
従来技術
従来、フツ素ガスの除去方法としては、ソーダ
石灰、活性アルミナ等(以後中和剤という。)を
充てんした固定床に室温でフツ素ガス含有廃ガス
を通して脱フツ素する乾式法やKOH及びNaOH
水溶液等を用いたアルカリスクラバーにフツ素ガ
ス含有廃ガスを通して脱フツ素する湿式法等があ
つた。
これら種々の方法のうち中和剤を充てんした固
定床で室温で、フツ素ガス含有廃ガスを処理しよ
うとした場合、廃ガス中のフツ素濃度が、高濃度
の場合には中和剤との反応が容易に生ずるため、
処理後の排ガス中のフツ素ガス濃度を1ppm以下
にする事は可能であつた。しかし、廃ガス中のフ
ツ素ガス濃度が30vol%以下の低濃度になるに従
い、廃ガスの不活性ガス(N2、He、Ar、Ne等)
が相対的に増加し、低濃度のフツ素ガスとの反応
不足を生ずるため、排ガス中に1ppm以上の未反
応フツ素ガスが残存し、外気に該排ガスを放出し
た場合、大気汚染の原因になることは避けられな
かつた。
一方、アルカリスクラバータイプにおいては各
種濃度のフツ素ガスを含む廃ガスを許容濃度以下
に処理出来るものの、ガス線速度を数cm/秒とい
う小さな値しかとれないため装置が大型化し、さ
らに除害系内を真空状態に保つ事はできずもつぱ
ら加圧もしくは、若干減圧状態時のみ、有効であ
り、しかも吸収剤を溶液として取り扱かわねばな
らず取扱い上非常に不便なものであつた。
発明が解決しようとする問題点
本発明は廃ガス中に比較的低濃度で含有されて
いるフツ素ガスの除去において、乾式法における
除去効率の低さおよび湿式法における取扱い上の
不便さ、装置の大型化を解決するものである。
問題点を解決するための手段
本発明者らは、乾式法において、低濃度フツ素
ガスの中和剤への吸収率は、温度に強く依存する
ことを見出し、本発明に到達したものである。
即ち、排ガス中のフツ素濃度は、フツ素含有廃
ガスを中和剤を充てんした固定床で処理しようと
した場合、フツ素濃度、ガス線速度、中和
剤の床の厚さ、中和剤の温度の関数であると考
えられ、この中でも特に中和剤の温度が、実質上
フツ素ガス除去反応を強く支配する事が判明し
た。
本発明における中和剤の適用温度は70〜600℃
好ましくは100〜300℃の範囲であり、600℃を越
えると中和剤に吸着しているフツ素の脱離が若干
進行する傾向があり、排ガス中のフツ素濃度を
1ppm以下に保つ事が、非常に困難になると同時
に中和剤の固結が生じたり装置の内部腐食が進行
するので好ましくない。また、70℃未満ではフツ
素ガスの除去が十分におこなわれず、1ppm以下
とすることは困難である。
本発明で、使用する中和剤はソーダ石灰、活性
アルミナ、Ca(CH)2およびCaO等が用いられ、
形状はか粒状が好ましいが、粉末でも使用でき
る。また付着水分を除去するため100℃以上で数
時間加熱真空乾燥して、中和剤の附着水分を除去
した後使用するのが有利である。
本発明において、適用されるフツ素ガス含有廃
ガスの組成は、He、O2、N2、CO2、Ar、Neや
化学的に不活性なガス状フツ化物、たとえば、
CoF2o+2、SF6等の混合ガスが、一般的であり、
特にフツ素ガス濃度30vol%以下の廃ガスに有用
である。
以下、実施例を挙げ本発明を詳述する。
実施例 1
フツ素ガスをヘリウムガスで各濃度に希釈調整
したガス100を120℃で120分間加熱真空乾燥し
た5〜15メツシユの粒状ソーダ石灰175grを充て
んした内径2.5cm、長さ60cmの固定床式立型反応
器上部より、吸収線速度4m/sec及び室温(25
℃)大気圧下で、供給して処理した。処理後のガ
ス中のフツ素ガス濃度を分析した結果を第1表に
示す。
INDUSTRIAL APPLICATION FIELD The present invention relates to a method for removing fluorine gas from a gas containing a relatively low concentration of elemental fluorine gas (hereinafter abbreviated as fluorine gas). Currently, fluorine gas is frequently used for surface fluorination of plastics, synthesis of various fluorides, and excimer lasers, but the waste gas after use is inert gas such as N 2 , Ar, He, Ne, etc. Fluorine is often in the form of diluted fluorine gas, and it is necessary to remove it to a safe low concentration (tolerable concentration of 1 ppm or less), and the present invention provides a method for its removal. Conventional technology Conventionally, methods for removing fluorine gas include a dry method in which waste gas containing fluorine gas is passed through a fixed bed filled with soda lime, activated alumina, etc. (hereinafter referred to as a neutralizing agent) at room temperature, and a KOH method. and NaOH
There was a wet method to remove fluoride by passing fluorine gas-containing waste gas through an alkaline scrubber using an aqueous solution. Among these various methods, when attempting to treat fluorine gas-containing waste gas at room temperature using a fixed bed filled with a neutralizing agent, if the fluorine concentration in the waste gas is high, the neutralizing agent and the Because the reaction easily occurs,
It was possible to reduce the fluorine gas concentration in the exhaust gas after treatment to 1 ppm or less. However, as the fluorine gas concentration in the waste gas becomes lower than 30vol%, the inert gas (N 2 , He, Ar, Ne, etc.) in the waste gas decreases.
This results in a relative increase in fluorine gas and insufficient reaction with low-concentration fluorine gas, so if 1 ppm or more of unreacted fluorine gas remains in the exhaust gas and the exhaust gas is released into the outside air, it may cause air pollution. It was inevitable that it would happen. On the other hand, although the alkaline scrubber type can treat waste gas containing various concentrations of fluorine gas to below the permissible concentration, the gas linear velocity can only be set to a small value of several cm/sec, making the equipment large and the removal system It is not possible to maintain a vacuum inside, and it is only effective when the pressure is either partially pressurized or slightly reduced, and the absorbent must be handled as a solution, which is extremely inconvenient in terms of handling. Problems to be Solved by the Invention The present invention solves the problems of the low removal efficiency in the dry method and the inconvenience of handling in the wet method in the removal of fluorine gas, which is contained in waste gas at a relatively low concentration. This solves the problem of increasing the size of the Means for Solving the Problems The present inventors discovered that in a dry method, the absorption rate of low concentration fluorine gas into a neutralizing agent strongly depends on temperature, and the present invention was achieved based on this finding. . In other words, when attempting to treat fluorine-containing waste gas with a fixed bed filled with a neutralizing agent, the fluorine concentration in exhaust gas is determined by the fluorine concentration, gas linear velocity, bed thickness of the neutralizing agent, and neutralization. It is thought that the temperature of the neutralizing agent is a function of the temperature of the neutralizing agent, and it has been found that the temperature of the neutralizing agent in particular strongly controls the fluorine gas removal reaction. The application temperature of the neutralizer in the present invention is 70 to 600℃
Preferably, the temperature is in the range of 100 to 300°C; if the temperature exceeds 600°C, the desorption of fluorine adsorbed on the neutralizer tends to proceed slightly, and the fluorine concentration in the exhaust gas is lowered.
It is undesirable because it becomes extremely difficult to maintain the concentration below 1 ppm, and at the same time, the neutralizing agent caking occurs and internal corrosion of the equipment progresses. Furthermore, at temperatures below 70°C, fluorine gas is not removed sufficiently, making it difficult to reduce the temperature to 1 ppm or less. In the present invention, the neutralizing agent used is soda lime, activated alumina, Ca(CH) 2 , CaO, etc.
The shape is preferably granular, but powder can also be used. Further, in order to remove adhering moisture, it is advantageous to use the neutralizer after heating and vacuum drying at 100° C. or higher for several hours to remove adhering moisture. In the present invention, the composition of the applied fluorine gas-containing waste gas includes He, O 2 , N 2 , CO 2 , Ar, Ne, and chemically inert gaseous fluorides, such as
Mixed gases such as C o F 2o+2 and SF 6 are common;
It is particularly useful for waste gas with a fluorine gas concentration of 30 vol% or less. Hereinafter, the present invention will be explained in detail with reference to Examples. Example 1 A fixed bed with an inner diameter of 2.5 cm and a length of 60 cm filled with 5 to 15 meshes of granular soda lime 175 gr prepared by diluting fluorine gas with helium gas to various concentrations and heating and vacuum drying the gas at 120°C for 120 minutes. From the top of the vertical reactor, an absorption linear velocity of 4 m/sec and room temperature (25
°C) under atmospheric pressure. Table 1 shows the results of analyzing the fluorine gas concentration in the gas after treatment.
【表】
実施例 2
フツ素ガスをヘリウムガスで1Vol%に希釈調
整したガス100を実施例1と同じ反応器及び中
和剤を用いて、反応器外部をヒーターで加熱しな
がら種々の温度に調整して、大気圧下で供給し
た。得られたガスの分析値を第2表に示す。[Table] Example 2 Gas 100 prepared by diluting fluorine gas with helium gas to 1 Vol% was heated to various temperatures using the same reactor and neutralizing agent as in Example 1 while heating the outside of the reactor with a heater. It was adjusted and fed under atmospheric pressure. The analytical values of the obtained gas are shown in Table 2.
【表】
実施例 3
フツ素ガスをヘリウムガスで各濃度に希釈調整
したガス100を実施例1と同じ反応器及び中和
剤を用いて、反応器外部をヒーターで加熱しなが
ら、温度を200℃に保ちつつ、大気圧下で反応器
内線速度を5.0m/secとして供給した。得られた
ガスの分析値を第3表に示す。[Table] Example 3 Using the same reactor and neutralizing agent as in Example 1, dilute fluorine gas with helium gas to various concentrations and adjust the gas temperature to 200 °C while heating the outside of the reactor with a heater. The reactor was supplied at a linear velocity of 5.0 m/sec under atmospheric pressure while maintaining the temperature at °C. The analytical values of the obtained gas are shown in Table 3.
【表】
実施例 4
フツ素ガスをヘリウムガスで1Vol%に希釈調
整したガス1を実施例1と同じ反応器及び中和
剤を用いて、反応器外部をヒーターで加熱しなが
ら温度を250℃に保ちつつ、真空ポンプを使用し
て各減圧下で供給した。得られたガスの分析値を
第4表に示す。[Table] Example 4 Using the same reactor and neutralizing agent as in Example 1, gas 1 prepared by diluting fluorine gas with helium gas to 1 vol% was heated to 250°C while heating the outside of the reactor with a heater. A vacuum pump was used to supply each under reduced pressure. The analytical values of the obtained gas are shown in Table 4.
【表】
実施例 5
フツ素ガスをヘリウムガスで1Vol%に希釈調
整したガス100を実施例1と同じ反応器及び中
和剤を用いて、反応器外部をヒーターで加熱しな
がら温度を200℃に保ちつつ、種々の線速度に調
整して大気圧下で供給した。得られたガスの分析
値を第5表に示す。[Table] Example 5 Using the same reactor and neutralizing agent as in Example 1, the temperature was raised to 200°C while heating the outside of the reactor with a heater. It was supplied under atmospheric pressure while adjusting the linear velocity to various values. The analytical values of the obtained gas are shown in Table 5.
【表】
実施例 6
フツ素ガスをヘリウムガスで1Vol%に希釈調
整したガス100を1〜100メツシユの各中和剤を
120℃、120分加熱真空乾燥したもの200grを充て
んした実施例1と同じ反応器を用いて反応器外部
をヒーターで加熱しながら温度を250℃に保ちつ
つ、大気圧下で供給した。得られたガスの分析値
を第6表に示す。[Table] Example 6 Fluorine gas was diluted to 1 Vol% with helium gas and 1 to 100 mesh of each neutralizing agent was added to the gas.
Using the same reactor as in Example 1, which was filled with 200g of the product that had been heated and vacuum dried at 120°C for 120 minutes, the reactor was supplied under atmospheric pressure while heating the outside of the reactor with a heater and maintaining the temperature at 250°C. The analytical values of the obtained gas are shown in Table 6.
【表】
実施例 7
フツ素ガスを化学的に不活性なガス状フツ化物
(CF4、SF6)で、1Vol%に希釈調整したガス100
を実施例1と同じ反応器及び中和剤を用いて、
反応器外部をヒーターで加熱しながら温度を200
℃に保ちつつ、大気圧下で供給した。得られたガ
スの分析値を第7表に示す。[Table] Example 7 Fluorine gas diluted to 1 Vol% with chemically inert gaseous fluoride (CF 4 , SF 6 ) 100
Using the same reactor and neutralizing agent as in Example 1,
While heating the outside of the reactor with a heater, raise the temperature to 200℃.
It was supplied under atmospheric pressure while being maintained at ℃. Table 7 shows the analytical values of the obtained gas.
【表】
発明の効果
本発明のフツ素ガス除去方法は、低濃度、特に
30Vol%以下のフツ素ガス含有廃ガスの処理に極
めて有効であり、処理後の排出ガス中のフツ素ガ
ス濃度を確実に0.1ppm以下とすることができる。
さらに、原料ガスを真空系で用いる必要のある
用途においては、真空ポンプのオイルが、フツ素
ガスにより変性を受けるため、真空ポンプより前
に除害する必要があるが、真空状態でも十分に除
去能を有するものである。[Table] Effects of the Invention The method for removing fluorine gas of the present invention is effective for removing fluorine gas at low concentrations, especially
It is extremely effective in treating waste gas containing fluorine gas of 30 Vol% or less, and can reliably reduce the fluorine gas concentration in the exhaust gas after treatment to 0.1 ppm or less. Furthermore, in applications that require raw material gas to be used in a vacuum system, the oil in the vacuum pump is denatured by fluorine gas, so it must be removed before the vacuum pump is used, but it can be removed sufficiently even in a vacuum. It has the ability.
Claims (1)
フツ素分を分離除去するに際して固形中和剤を70
℃以上に加熱しつつ、当該ガスをこれらに接触さ
せ該ガスの出口排ガスフツ素濃度を100ppb以下
に保つ事を特徴とするフツ素ガスの除去方法。1 When separating and removing fluorine content in waste gas containing 30 vol% or less of fluorine gas, use a solid neutralizing agent at 70% by volume.
A method for removing fluorine gas, which comprises bringing the gas into contact with these while heating the gas to a temperature above 0.degree.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59221221A JPS61101231A (en) | 1984-10-23 | 1984-10-23 | Removal of fluorine gas |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59221221A JPS61101231A (en) | 1984-10-23 | 1984-10-23 | Removal of fluorine gas |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61101231A JPS61101231A (en) | 1986-05-20 |
| JPS643139B2 true JPS643139B2 (en) | 1989-01-19 |
Family
ID=16763361
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59221221A Granted JPS61101231A (en) | 1984-10-23 | 1984-10-23 | Removal of fluorine gas |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61101231A (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IT1229210B (en) * | 1988-03-31 | 1991-07-25 | Central Glass Co Ltd | METHOD AND DEVICE FOR ANALYZING GASES CONTAINING FLUORINE. |
| US5417934A (en) * | 1988-06-04 | 1995-05-23 | Boc Limited | Dry exhaust gas conditioning |
| GB8813270D0 (en) * | 1988-06-04 | 1988-07-06 | Plasma Products Ltd | Dry exhaust gas conditioning |
| US6060034A (en) * | 1998-06-02 | 2000-05-09 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Abatement system for ClF3 containing exhaust gases |
| US6309618B1 (en) | 1999-03-12 | 2001-10-30 | Showa Denko K. K. | Method for treating exhaust gas containing fluorine-containing interhalogen compound, and treating agent and treating apparatus |
| GB0520468D0 (en) | 2005-10-07 | 2005-11-16 | Boc Group Plc | Fluorine abatement |
| JPWO2017094418A1 (en) * | 2015-12-01 | 2018-09-20 | 昭和電工株式会社 | Method for treating exhaust gas containing elemental fluorine |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5210418A (en) * | 1975-07-10 | 1977-01-26 | Katayama Chem Works Co Ltd | Controlling agent against adhesive organisms living in the sea |
-
1984
- 1984-10-23 JP JP59221221A patent/JPS61101231A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61101231A (en) | 1986-05-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |