JPS6463918A - Photoplotter - Google Patents
PhotoplotterInfo
- Publication number
- JPS6463918A JPS6463918A JP62221535A JP22153587A JPS6463918A JP S6463918 A JPS6463918 A JP S6463918A JP 62221535 A JP62221535 A JP 62221535A JP 22153587 A JP22153587 A JP 22153587A JP S6463918 A JPS6463918 A JP S6463918A
- Authority
- JP
- Japan
- Prior art keywords
- moval
- carriage
- deltay
- uniaxial
- equation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 abstract 3
- 230000006866 deterioration Effects 0.000 abstract 1
Landscapes
- Dot-Matrix Printers And Others (AREA)
- Laser Beam Printer (AREA)
- Mechanical Optical Scanning Systems (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To accomplish highly accurate plotting by detecting errors of one uniaxial moval carriage's yawing movement, previously deflecting position errors of laser spot, thereby canceling them. CONSTITUTION:An arithmetic processing part obtains the yawing error theta of the unaxial moval carriage from an equation theta=(y2-y1)/L and a moving amount DELTAy in coordinates (x, y) of a plotting point from an equation DELTAy=-xtheta, and finally calculates a correction deviation angle alpha from an optical length L1 between an audio-optical deflector 3 according to an equation alpha=DELTAy/L1. Said deflector 3 deflects a laser optical axis by the correction deviation angle alpha, shifts the spot 6 of laser beams by DELTAy on photosensitive material, and has said optical axis follow deviation caused by errors of the uniaxial moval carriage's yawing movement. Thus, deterioration in plotting accuracy around the uniaxial moval carriage can be prevented.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62221535A JPS6463918A (en) | 1987-09-03 | 1987-09-03 | Photoplotter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62221535A JPS6463918A (en) | 1987-09-03 | 1987-09-03 | Photoplotter |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6463918A true JPS6463918A (en) | 1989-03-09 |
Family
ID=16768241
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62221535A Pending JPS6463918A (en) | 1987-09-03 | 1987-09-03 | Photoplotter |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6463918A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03239598A (en) * | 1990-02-16 | 1991-10-25 | Jujo Paper Co Ltd | Laser plotter |
| JP2003515255A (en) * | 1999-11-17 | 2003-04-22 | マイクロニック レーザー システムズ アクチボラゲット | Beam positioning in microlithography writing |
| JP2007180553A (en) * | 2000-08-24 | 2007-07-12 | Asml Netherlands Bv | Lithographic projection apparatus calibration method |
| US7561270B2 (en) | 2000-08-24 | 2009-07-14 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and device manufactured thereby |
-
1987
- 1987-09-03 JP JP62221535A patent/JPS6463918A/en active Pending
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03239598A (en) * | 1990-02-16 | 1991-10-25 | Jujo Paper Co Ltd | Laser plotter |
| JP2003515255A (en) * | 1999-11-17 | 2003-04-22 | マイクロニック レーザー システムズ アクチボラゲット | Beam positioning in microlithography writing |
| JP2011124586A (en) * | 1999-11-17 | 2011-06-23 | Micronic Laser Systems Ab | Beam positioning in microlithography writing |
| JP2007180553A (en) * | 2000-08-24 | 2007-07-12 | Asml Netherlands Bv | Lithographic projection apparatus calibration method |
| US7561270B2 (en) | 2000-08-24 | 2009-07-14 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and device manufactured thereby |
| JP2009164618A (en) * | 2000-08-24 | 2009-07-23 | Asml Netherlands Bv | Lithographic projection device |
| US7633619B2 (en) | 2000-08-24 | 2009-12-15 | Asml Netherlands B.V. | Calibrating a lithographic apparatus |
| US7940392B2 (en) | 2000-08-24 | 2011-05-10 | Asml Netherlands B.V. | Lithographic apparatus, device manufacturing method and device manufactured thereby |
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