JPS647543B2 - - Google Patents
Info
- Publication number
- JPS647543B2 JPS647543B2 JP54022639A JP2263979A JPS647543B2 JP S647543 B2 JPS647543 B2 JP S647543B2 JP 54022639 A JP54022639 A JP 54022639A JP 2263979 A JP2263979 A JP 2263979A JP S647543 B2 JPS647543 B2 JP S647543B2
- Authority
- JP
- Japan
- Prior art keywords
- transfer
- ccd
- signal
- photodetecting
- section
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000003384 imaging method Methods 0.000 claims description 19
- 238000001514 detection method Methods 0.000 claims description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
Landscapes
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
Description
【発明の詳細な説明】
本発明は半導体撮像装置、更に詳しくは複数個
の光検知素子を一次元に配列した固体撮像装置に
関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a semiconductor imaging device, and more particularly to a solid-state imaging device in which a plurality of photodetecting elements are arranged in one dimension.
以前より固体撮像装置の研究は行われていた
が、近年CCD(電荷結合素子)の研究が進むにつ
れ、CCD撮像装置の開発が非常に進みその応用
も活発に行なわれてきた。中でも1次元撮像装置
は、フアクシミリの普及、高速化に必要欠くべか
らざるものとなりつつある。しかしながらCCD
撮像装置を使用したフアクシミリには現在次のよ
うな問題がある。以下この問題点をCCD撮像装
置の概念とフアクシミリの概念を説明しながら明
らかにしていく。 Research on solid-state imaging devices has been conducted for some time, but as research into CCDs (charge-coupled devices) has progressed in recent years, the development of CCD imaging devices has progressed significantly and its applications have been actively pursued. Among these, one-dimensional imaging devices are becoming indispensable for the widespread use and speeding up of facsimile machines. However, CCD
Currently, facsimile using an imaging device has the following problems. Below, we will clarify this problem by explaining the concept of CCD imaging devices and the concept of facsimile.
一次元光検知型CCD撮像装置は第1図に示す
如く、半導体基板1表面に酸化シリコン膜等の光
透過性絶縁膜2を介して多結晶シリコン薄膜等か
ら成る多数の光透過性ゲート電極3,3…を一次
元に配列して光検知部4を構成すると共に、この
光検知部4を該検知部4に並設したCCD信号移
送部5に関連付けた構造となつている。尚、具体
的には光検知部4とCCD移送部5とは信号転送
手段の転送ゲート6,6…を介して電気的に連つ
ている。 As shown in FIG. 1, a one-dimensional light-detecting CCD imaging device has a large number of light-transmissive gate electrodes 3 made of a polycrystalline silicon thin film or the like on the surface of a semiconductor substrate 1 with a light-transparent insulating film 2 such as a silicon oxide film interposed therebetween. , 3 . Specifically, the photodetector section 4 and the CCD transfer section 5 are electrically connected via transfer gates 6, 6, . . . of signal transfer means.
このような構成に於て光検知部4のゲート電極
3,3…に検知電圧(VO)を印加する事に依つ
て基板1の各電極3,3…直下に反転層7,7…
が発生し、その時に照射される光に依つて生じた
電荷がこの反転層7,7…に蓄積され、その電荷
を転送ゲート6,6…に依つてCCD5に転送し、
CCD5の出力端子に撮像出力信号を得る。 In such a configuration, by applying a detection voltage (V O ) to the gate electrodes 3, 3, . . . of the photodetecting section 4, inversion layers 7, 7, .
is generated, and the charges generated by the light irradiated at that time are accumulated in the inversion layers 7, 7..., and the charges are transferred to the CCD 5 by the transfer gates 6, 6...
An imaging output signal is obtained at the output terminal of CCD5.
一方一次元撮像装置を使用したフアクシミリは
第1図に示した撮像装置10の光検知部4に第2
図に示す如く、螢光灯11で照明された図面等の
対象物12の1ラインを光学系13を用いて結像
させ、1ラインづつの画像信号を取り出すもので
ある。このようにして取り出された1ライン分の
信号はシンクロスコープで観察すると、第3図で
示す如く、対象物12の暗いところ、即ち例えば
図面の場合字や線のある黒いところに該当する出
力レベルは低く、逆に白いところ(明るいとこ
ろ)の出力レベルは高くなる。このような出力信
号は所定の閾値電圧(VT)と比較して画像の白
黒の判定を行う。 On the other hand, in facsimile using a one-dimensional imaging device, a second
As shown in the figure, one line of an object 12 such as a drawing illuminated by a fluorescent lamp 11 is imaged using an optical system 13, and image signals are extracted for each line. When the signal for one line extracted in this way is observed with a synchroscope, the output level corresponds to a dark area of the object 12, for example, a black area with letters or lines in a drawing, as shown in Figure 3. is low, and conversely, the output level of white areas (bright areas) is high. Such an output signal is compared with a predetermined threshold voltage (V T ) to determine whether the image is black or white.
然し乍ら対象物(図面)が大きい場合、光学系
の問題から対象物の周辺部の明るさが中央部に比
して暗くなり、出力信号は第3図に示す如く周辺
部で出力レベルの全体的低下が見られる。しかも
場合に依つては周辺部での明るいところ(白いと
ころ)に該当する出力レベルが閾値電圧〔VT)
より低くなつてしまう場合がある。勿論その時の
閾値電圧(VT)を下げるとこのような周辺部で
の問題は解消されるが、中央部では白黒の判別が
出来なくなつてしまう。 However, if the object (drawing) is large, the brightness at the periphery of the object will be darker than the center due to problems with the optical system, and the output signal will be lower than the overall output level at the periphery, as shown in Figure 3. A decline is seen. Moreover, depending on the case, the output level corresponding to bright areas (white areas) in the periphery may be the threshold voltage [V T ].
It may become lower. Of course, lowering the threshold voltage (V T ) at that time will solve this problem in the peripheral areas, but it will no longer be possible to distinguish between black and white in the central area.
本発明はこのような問題点に鑑みて為されたも
のであつて、その構成は第4図に示されている。 The present invention has been made in view of these problems, and its configuration is shown in FIG. 4.
同図に3,4,5,6は夫々第1図と同様に光
透過性ゲート電極、光検知部、CCD移送部、転
送ゲート、を示しており、本発明に於てはこの転
送ゲート6,6…に印加する信号転送レベルに主
たる特徴がある。即ちこの第4図からも明らかな
如く各転送ゲート6,6…は夫々抵抗8,8…を
介して縦続接続されており、その中央部の転送ゲ
ート61は接地抵抗9を介して接地され、両端の
ゲート62,62は一括接続されて光検知部4か
らの信号をCCD移送部6に転送する際の信号転
送レベルを設定する転送電圧源10に連つてい
る。 In the figure, numerals 3, 4, 5, and 6 respectively indicate a light-transmissive gate electrode, a light detection section, a CCD transfer section, and a transfer gate as in FIG. , 6... The main feature lies in the signal transfer level applied to the signals. That is, as is clear from FIG. 4, the transfer gates 6, 6, . . . are cascade-connected via resistors 8, 8, . The gates 62, 62 at both ends are connected together and connected to a transfer voltage source 10 that sets a signal transfer level when transferring a signal from the photodetector 4 to the CCD transfer section 6.
ここで信号転送手段に於ける転送動作について
考察してみる。第5図に示す如く、光検知部の光
透過性ゲート電極3の直下の反転層7には照射光
量に応じた電荷qが蓄積されており、この電荷q
を転送ゲート6に転送信号を印加する事に依つて
CCD移送部5のゲート領域に転送するのである
が、同図イに示す如く多量の電荷qがある場合
と、ロに示す如く小量の電荷qしか存在しない時
に転送ゲート6,6…に同じ信号転送レベルを設
定すると転送電荷量が相違し、第3図に示した不
都合が生じる事は先にも説明した。そこで本発明
に於てはこの第5図に示す如く、多量の蓄積電荷
qがある箇所イの転送レベル(ET)を少量の電
荷の箇所ロの転送レベル(ET′)より高く設定す
る事に依つてCCD移送部5への転送電荷量の均
一化を図つている。 Let us now consider the transfer operation in the signal transfer means. As shown in FIG. 5, a charge q corresponding to the amount of irradiated light is accumulated in the inversion layer 7 directly under the light-transmissive gate electrode 3 of the photodetecting section, and this charge q
By applying a transfer signal to the transfer gate 6,
It is transferred to the gate area of the CCD transfer unit 5, and when there is a large amount of charge q as shown in A of the same figure, and when there is only a small amount of charge q as shown in B of the figure, the same happens to the transfer gates 6, 6, etc. As previously explained, when the signal transfer level is set, the amount of transferred charge differs, causing the inconvenience shown in FIG. 3. Therefore, in the present invention, as shown in FIG. 5, the transfer level (E T ) at a location (a) where a large amount of accumulated charge q is present is set higher than the transfer level (E T ′) at a location (b) where a small amount of charge is present. Depending on the situation, the amount of charge transferred to the CCD transfer unit 5 is made uniform.
即ち第6図に示す如く、各転送ゲート6,6…
のポテンシヤルは抵抗8,8…並びに接地抵抗9
に依つて分圧され、同図の(ET)で示す如く中
央部が低く、両端部に向うに従つて順次高くなつ
ており、一方逆に光検知部4での蓄積電荷量qは
中央部に於て多く、両端部に於て低くなるので、
この両者が重畳され、結果的に出力信号は第7図
に示す如く、場所に依る変化は認められず略均一
なものとする事が出来る。 That is, as shown in FIG. 6, each transfer gate 6, 6...
The potential of is resistance 8, 8... and ground resistance 9
As shown by ( E It increases at the end and decreases at both ends, so
These two signals are superimposed, and as a result, as shown in FIG. 7, the output signal does not vary depending on the location and can be made substantially uniform.
この様に光検知部4での各透過性ゲート電極
3,3…下の反転層7,7…に電荷が蓄積される
毎に上述の転送ゲート6,6…に依つて、平担化
された電荷がCCD5に転送され、このCCD5の
出力端子から撮像出力信号として外部に取り出さ
れる事となるが、この1ライン分の撮像出力信号
が取り出される毎に各転送ゲート6,6…での転
送レベルに対応して各透過性ゲート電極3,3…
下の反転層7,7…に残存した電荷は、直ちに消
去されるのである。即ち、斯る残存電荷の消去法
としては、光検知部4で光電変換を開始する直前
に転送ゲート6の転送電圧源10の電圧を一時的
に高くして、上記残存電荷を全てCCD5に転送
し、このCCD5を高速で駆動して直ちに残存電
荷を外部に掃き出す方法が採用される。又、上記
透過性ゲート電極3,3……に隣接して残存電荷
用転送ゲート及び残存電荷吸収用ドレインを設
け、各転送ゲート6,6…への転送信号の印加が
終了した時点につづいて残存電荷用転送ゲートに
転送信号を印加して各透過性ゲート電極3,3…
下の全ての残存電荷を残存電荷吸収用ドレインに
排出せしめる方法、あるいは単にゲート電極への
検知電圧(VO)を零とするかもしくは逆極性に
反転する事に依つてゲート電極3,3…下の反転
送を消滅せしめ残存電荷を半導体基板1中で再結
合させる方法を採用しても良い。 In this way, each time charges are accumulated in the inversion layers 7, 7 below each of the transparent gate electrodes 3, 3 in the photodetector 4, they are flattened by the transfer gates 6, 6... The charge is transferred to the CCD 5, and is taken out from the output terminal of the CCD 5 as an imaging output signal, but each time this one line of imaging output signal is taken out, it is transferred at each transfer gate 6, 6, etc. Each transparent gate electrode 3, 3... corresponds to the level.
The charges remaining in the lower inversion layers 7, 7, . . . are immediately erased. That is, a method for erasing such residual charges is to temporarily increase the voltage of the transfer voltage source 10 of the transfer gate 6 immediately before starting photoelectric conversion in the photodetector 4, and transfer all the remaining charges to the CCD 5. However, a method is adopted in which the CCD 5 is driven at high speed to immediately flush out the remaining charges to the outside. In addition, a transfer gate for residual charge and a drain for absorbing residual charge are provided adjacent to the transparent gate electrodes 3, 3, . A transfer signal is applied to the transfer gate for residual charge to transfer each transparent gate electrode 3, 3...
The gate electrodes 3, 3... can be drained by draining all the remaining charges below to the drain for absorbing the remaining charges, or by simply setting the detection voltage (V O ) to the gate electrode to zero or inverting it to the opposite polarity. A method may be adopted in which the lower anti-transfer is eliminated and the remaining charges are recombined in the semiconductor substrate 1.
尚、各転送ゲート6,6…間に設ける抵抗8,
8…は撮像装置のIC内に組み込まれるが、接地
抵抗9は外付部品として接続される。従つてこの
抵抗値を変化させる事に依つて転送電圧源10の
各電極6,6…に対する分圧比を変える事が出来
るので、転送ゲート電極6,6…に対するポテン
シヤル変位度、即ち傾きを制御する事が出来る事
となり、常に最良の状態で撮像機能を得る事が可
能となる。 Note that a resistor 8, which is provided between each transfer gate 6, 6...
8 are incorporated into the IC of the imaging device, but the ground resistor 9 is connected as an external component. Therefore, by changing this resistance value, the voltage division ratio of the transfer voltage source 10 to each electrode 6, 6... can be changed, so the degree of potential displacement, that is, the slope, to the transfer gate electrodes 6, 6... can be controlled. This makes it possible to always obtain the imaging function in the best condition.
本発明は以上の説明から明らかな如く、電荷転
送手段の信号転送の際の転送レベルを中央部と両
端部とを変化させているので、撮像出力信号レベ
ルが平坦化され、安定した特性の撮像装置を得る
事が出来る。 As is clear from the above description, the present invention changes the transfer level during signal transfer by the charge transfer means between the center and both ends, so that the imaging output signal level is flattened and imaging with stable characteristics is achieved. You can get the equipment.
第1図は従来装置の構造を示す平面図並びに縦
横断面図、第2図はフアクシミリの概念を示す光
学系図、第3図は従来装置の出力信号を示す波形
図、第4図は本発明撮像装置の構造を示す平面
図、第5図イ,ロは電荷転送状況を説明する為の
要部の断面図、第6図は本発明の主要部の電気回
路図並びにそのポテンシヤルレベル図、第7図は
本発明装置の出力信号を示す波形図であつて、3
は光透過性ゲート電極、5はCCD移送部、6は
転送ゲート、7は反転層、8は抵抗、9は接地抵
抗、を夫々示している。
Fig. 1 is a plan view and a longitudinal and cross-sectional view showing the structure of a conventional device, Fig. 2 is an optical system diagram showing the concept of facsimile, Fig. 3 is a waveform diagram showing the output signal of the conventional device, and Fig. 4 is an imaging method according to the present invention. FIG. 5 is a plan view showing the structure of the device; FIGS. 5A and 5B are sectional views of essential parts for explaining the charge transfer situation; FIG. The figure is a waveform diagram showing the output signal of the device of the present invention.
5 indicates a light-transmissive gate electrode, 5 indicates a CCD transfer section, 6 indicates a transfer gate, 7 indicates an inversion layer, 8 indicates a resistor, and 9 indicates a grounding resistor.
Claims (1)
ら成る光検知部と、この光検知部から得られる検
知信号を該光検知部に並設されたCCD信号移送
部に転送せしめる転送手段と、を備え、該転送手
段の信号転送の際の転送レベルをその中央部と両
端部とを変化せしめた事を特徴とするCCDを用
いた固体撮像装置。 2 上記転送手段は光検知素子の各ゲート領域と
CCDの各ゲート領域とに跨つた複数個の転送ゲ
ートに依つて構成され、これ等の転送ゲートは抵
抗を介して継続接続されると共にその中央部と一
括接続両端部との間に転送手段の信号転送レベル
を設定する転送電圧を印加する事を特徴とした特
許請求の範囲第1項記載のCCDを用いた固体撮
像装置。[Scope of Claims] 1. A photodetecting section consisting of a plurality of photodetecting elements arranged one-dimensionally, and a CCD signal transfer section arranged in parallel to the photodetecting section to transfer detection signals obtained from the photodetecting section. 1. A solid-state imaging device using a CCD, comprising: a transfer means for transmitting a signal, and a transfer level during signal transfer of the transfer means is changed between a central portion and both ends thereof. 2 The above transfer means is connected to each gate region of the photodetecting element.
It is composed of a plurality of transfer gates spanning each gate region of the CCD, and these transfer gates are continuously connected via a resistor, and a transfer means is connected between the central part and both ends of the collective connection. A solid-state imaging device using a CCD according to claim 1, characterized in that a transfer voltage for setting a signal transfer level is applied.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2263979A JPS55115776A (en) | 1979-02-27 | 1979-02-27 | Solidstate image sensor using ccd |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2263979A JPS55115776A (en) | 1979-02-27 | 1979-02-27 | Solidstate image sensor using ccd |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55115776A JPS55115776A (en) | 1980-09-05 |
| JPS647543B2 true JPS647543B2 (en) | 1989-02-09 |
Family
ID=12088401
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2263979A Granted JPS55115776A (en) | 1979-02-27 | 1979-02-27 | Solidstate image sensor using ccd |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55115776A (en) |
-
1979
- 1979-02-27 JP JP2263979A patent/JPS55115776A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS55115776A (en) | 1980-09-05 |
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