JPS64782B2 - - Google Patents
Info
- Publication number
- JPS64782B2 JPS64782B2 JP58129040A JP12904083A JPS64782B2 JP S64782 B2 JPS64782 B2 JP S64782B2 JP 58129040 A JP58129040 A JP 58129040A JP 12904083 A JP12904083 A JP 12904083A JP S64782 B2 JPS64782 B2 JP S64782B2
- Authority
- JP
- Japan
- Prior art keywords
- cavity
- holder
- processed
- cooling
- small holes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000463 material Substances 0.000 claims description 46
- 238000001816 cooling Methods 0.000 claims description 16
- 239000012530 fluid Substances 0.000 claims description 7
- 238000007789 sealing Methods 0.000 claims description 6
- 239000007779 soft material Substances 0.000 description 15
- 238000001312 dry etching Methods 0.000 description 5
- 239000012809 cooling fluid Substances 0.000 description 4
- 239000000112 cooling gas Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 229920002379 silicone rubber Polymers 0.000 description 2
- 239000004945 silicone rubber Substances 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3435—Target holders (includes backing plates and endblocks)
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明はイオンビームドライエツチング装置や
荷電粒子線露光装置等の被処理材料の冷却保持装
置に関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an apparatus for cooling and holding a material to be processed, such as an ion beam dry etching apparatus or a charged particle beam exposure apparatus.
例えば、イオンビームドライエツチング装置等
においては被処理材料を変形なく保持しなければ
ならないと同時に処理材料の加熱を防止する必要
があるが、これらの装置は材料の処理が減圧下
(例えば真空中)で行なわれるため、精密な材料
保持と効率の良い冷却を両立させることは大変に
難しい。 For example, in ion beam dry etching equipment, etc., it is necessary to hold the material to be processed without deformation, and at the same time, it is necessary to prevent heating of the material to be processed. It is extremely difficult to achieve both precise material retention and efficient cooling.
[従来技術]
第1図及び第2図は従来使用されている材料保
持装置の一例を示す断面図で、先ず第1図に示す
ように熱伝導の良好な金属材料を使用した材料固
定用のホルダー1の上に弾性を有する軟質材料
(例えばシリコンゴム)2を載せる。該ホルダー
には排気用の溝3が設けてあり、該溝は貫通孔4
によりホルダーの下側と連通している。上記軟質
材料には多数の小孔5が穿つてあり、該小孔は前
記ホルダーの排気溝と連通している。被処理材料
6は前記軟質材料2の上に載置され、吸引治具7
に前記ホルダーを載せて適宜な真空ポンプにより
該治具内を排気すると前記ホルダーの貫通孔4、
溝3及び軟質材料2の小孔5内の空気は排除さ
れ、ホルダー1、軟質材料2及び被処理材料6が
密着して一体化する。前記ホルダー1の上面、軟
質材料2の両面及び被処理材料の面は充分に研磨
され光沢があり、表面に凹凸がないので、夫々は
強い吸着状態を保持し、前記治具内の排気を止め
て内部に空気を流入させても3者の分離は生じな
い。そこで、第2図に示すように一体化されたホ
ルダー、軟質材料及び被処理材料をイオンドライ
エツチング装置等の処理室内の冷却テーブル8に
金具9により取付け、該テーブル内に冷却水を導
入すると被処理材料6は冷却されながら処理が行
なわれることになる。この時、ホルダーや被処理
材料の周囲を減圧状態にしても前記3者は吸着し
合つたままであり、被処理材料がはがれ落ちるこ
とはない。[Prior Art] Figures 1 and 2 are cross-sectional views showing an example of a conventionally used material holding device. First, as shown in Figure 1, a material holding device using a metal material with good thermal conductivity is used. A soft material (for example, silicone rubber) 2 having elasticity is placed on the holder 1 . The holder is provided with a groove 3 for exhaust, and the groove is connected to a through hole 4.
communicates with the lower side of the holder. A large number of small holes 5 are bored in the soft material, and the small holes communicate with the exhaust grooves of the holder. The material to be processed 6 is placed on the soft material 2, and the suction jig 7
When the holder is placed on the jig and the inside of the jig is evacuated using a suitable vacuum pump, the through hole 4 of the holder is removed.
The air in the groove 3 and the small hole 5 of the soft material 2 is removed, and the holder 1, the soft material 2, and the material to be processed 6 are brought into close contact and integrated. The upper surface of the holder 1, both sides of the soft material 2, and the surface of the material to be processed are sufficiently polished and shiny, and there are no irregularities on the surface, so each maintains a strong suction state and prevents exhaust from inside the jig. Even if air is allowed to flow into the interior, separation of the three will not occur. Therefore, as shown in Fig. 2, the integrated holder, soft material, and material to be processed are attached to a cooling table 8 in a processing chamber of an ion dry etching device or the like using metal fittings 9, and cooling water is introduced into the table. The processing material 6 will be processed while being cooled. At this time, even if the pressure around the holder and the material to be processed is reduced, the three components remain adsorbed to each other, and the material to be processed does not peel off.
しかしながら、上記従来の装置では材料ホルダ
ー1を被処理材料の交換毎にテーブル8より取外
し、治具7上に載せ換えねばならないので、操作
が極めて厄介で自動化が困難であり、且つテーブ
ルからの熱吸収がホルダーを介しての間接的なも
のとなるため、接触による熱伝導の低下は防ぎ得
ず、冷却効率が悪いと言う欠点がある。 However, in the conventional apparatus described above, the material holder 1 must be removed from the table 8 and placed on the jig 7 each time the material to be processed is replaced, making the operation extremely cumbersome and difficult to automate. Since the absorption is indirect through the holder, it is impossible to prevent a decrease in heat conduction due to contact, which has the disadvantage of poor cooling efficiency.
[発明の目的]
本発明は上記従来の欠点を解消することを目的
とするもので、操作性と熱伝導の効率を両立させ
ることの可能な材料保持装置を提供する。[Object of the Invention] The present invention aims to eliminate the above-mentioned conventional drawbacks, and provides a material holding device that can achieve both operability and heat conduction efficiency.
[発明の構成]
本発明の構成は内部に空洞部を有し且つ上面に
該空洞部に通ずる多数の小孔を有するホルダー、
該ホルダーの上に載せられ前記小孔と連通する小
孔を有したシート状の弾性部材、該弾性部材上に
載置される被処理材料、前記空洞部内に配置され
前記小孔を閉鎖するシール部材を保持した移動
板、該シール部材による小孔の開閉を行なうため
に該移動板を空洞部内で移動させる機構、前記空
洞部内を排気する手段及び前記空洞部内に冷却又
は恒温流体を導入する手段を備えている材料保持
装置に特徴がある。[Configuration of the Invention] The configuration of the present invention includes a holder having a cavity inside and a large number of small holes communicating with the cavity on the top surface;
A sheet-like elastic member placed on the holder and having a small hole communicating with the small hole, a material to be processed placed on the elastic member, and a seal placed in the cavity to close the small hole. A moving plate holding a member, a mechanism for moving the moving plate within the cavity in order to open and close the small hole by the sealing member, means for evacuating the interior of the cavity, and means for introducing cooling or constant temperature fluid into the cavity. The material holding device is characterized by:
[実施例]
以下本発明を図面に示した実施例に基づき説明
する。[Example] The present invention will be described below based on an example shown in the drawings.
第3図乃至第6図はその一実施例を示すもの
で、10はイオンドライエツチング装置等の処理
室を示している。11は被処理材料のホルダーで
処理室内に置かれている。該ホルダーは実際には
所望の移動機構によりX、Y移動、回転及び傾斜
ができる構造になつている。このホルダーの内部
は空洞12になつており、この空洞部内に移動板
13が配置されている。又、ホルダー11の上面
には空洞部12まで達する小孔14が多数穿つて
あり(第5図参照)、更に該ホルダー上にはシリ
コンゴム等の弾性を有するシート状の軟質材料1
5が載置されている。この軟質材料にも多数の小
孔16が穿つてあり、前記ホルダーの小孔と連通
している。前記軟質材料15の上には被処理材料
17が置かれている。前記移動板には小孔に対応
する位置に球形のシール部材18が多数保持して
あり、移動板を上方に移動させることにより該球
形のシール部材が各小孔の端部を塞ぐ構成となつ
ている。該球形シールの構造は第6図に示してあ
る。球形シール18は移動板13を摺動自在に貫
通するシールピン19に固定されており、又該シ
ールピンはばね20により上方に押し上げられて
いる。第6図は球形シールが丁度シール状態、つ
まり小孔の端部を閉鎖した状態を示している。第
3図及び第4図に戻つて、移動板の中央部下面に
は駆動用の筒状体21が固定してあり、該筒状体
はホルダー11の筒状部22を気密を保つて貫通
し、下方に突出している。前記筒状体21の内部
及び該筒状体とホルダーの筒状部22との間は冷
却又は恒温流体の通路及び真空排気の通路として
利用される。23は冷却流体の導入パイプであ
り、処理室10を通して外部に取出され、バルブ
24を介して流体導入源に接続している。又、2
5は冷却流体の排出パイプであり、該パイプも処
理室10を貫通して外部に取出され、バルブ26
を介して廃液槽に導かれ、又は流体導入源に戻さ
れる。前記導入パイプにはバルブ27を介して真
空ポンプ28が接続され、前記パイプ23を通し
て空洞部12内の排気が行なえる。前記筒状体2
1の下端は偏心カム29などの駆動源に接続して
おり、該カムを回転させると筒状体は第3図と第
4図に示す間で移動し、移動板13は上下に移動
され、球形シール18の開閉が行なわれる。即
ち、第3図は移動板13が最下端の状態であり、
シール18は下方に位置し、小孔14の下端は開
放の状態である。これに対し、第4図は移動板が
最上端にあり、球形シール18により各小孔は閉
鎖されている。 3 to 6 show one embodiment of the present invention, and numeral 10 indicates a processing chamber such as an ion dry etching device. Reference numeral 11 denotes a holder for the material to be processed, which is placed inside the processing chamber. The holder actually has a structure that allows it to be moved in X and Y directions, rotated, and tilted by a desired movement mechanism. The interior of this holder is a cavity 12, and a movable plate 13 is disposed within this cavity. Further, the upper surface of the holder 11 has a large number of small holes 14 that reach the cavity 12 (see Fig. 5), and a sheet-like soft material 1 having elasticity such as silicone rubber is placed on the holder.
5 is placed. This soft material also has a large number of small holes 16, which communicate with the small holes of the holder. A material to be treated 17 is placed on the soft material 15 . The movable plate holds a large number of spherical seal members 18 at positions corresponding to the small holes, and by moving the movable plate upward, the spherical seal members close the ends of each small hole. ing. The structure of the spherical seal is shown in FIG. The spherical seal 18 is fixed to a seal pin 19 that slidably passes through the movable plate 13, and the seal pin is pushed upward by a spring 20. FIG. 6 shows the spherical seal just sealed, ie closing the end of the stoma. Returning to FIGS. 3 and 4, a cylindrical body 21 for driving is fixed to the lower surface of the center of the movable plate, and this cylindrical body passes through the cylindrical part 22 of the holder 11 in an airtight manner. and protrudes downward. The inside of the cylindrical body 21 and the space between the cylindrical body and the cylindrical part 22 of the holder are used as a cooling or constant temperature fluid passage and a vacuum exhaust passage. Reference numeral 23 denotes a cooling fluid introduction pipe, which is taken out to the outside through the processing chamber 10 and connected to a fluid introduction source via a valve 24. Also, 2
Reference numeral 5 denotes a cooling fluid discharge pipe, which also passes through the processing chamber 10 and is taken out to the outside, and is connected to a valve 26.
to a waste tank or returned to the fluid introduction source. A vacuum pump 28 is connected to the introduction pipe via a valve 27, and the inside of the cavity 12 can be evacuated through the pipe 23. Said cylindrical body 2
The lower end of 1 is connected to a driving source such as an eccentric cam 29, and when the cam is rotated, the cylindrical body moves between the positions shown in FIGS. 3 and 4, and the moving plate 13 is moved up and down, The spherical seal 18 is opened and closed. That is, in FIG. 3, the movable plate 13 is at the lowest end,
The seal 18 is located below, and the lower end of the small hole 14 is open. In contrast, in FIG. 4, the movable plate is at the uppermost end, and each small hole is closed by a spherical seal 18.
30は処理室10の排気用真空ポンプであり、
パイプ31及びバルブ32を介して処理室に連絡
している。該パイプの途中にはリークバルブ33
が接続されている。 30 is a vacuum pump for exhausting the processing chamber 10;
It communicates with the processing chamber via a pipe 31 and a valve 32. There is a leak valve 33 in the middle of the pipe.
is connected.
このような装置において、先ず移動板13を最
下端の位置に置き、リークバルブ33を開、バル
ブ32を閉の状態にして処理室10内の真空を破
り、軟質材料15上に被処理材料17を設置す
る。次に、冷却流体導入用のバルブ24及び26
を閉の状態にし、バルブ27を開にして真空ポン
プ28によりホルダー11の空洞部12内を排気
する(第3図の状態)。この排気により処理室1
0内の大気圧により被処理材料は空洞方向に強く
押圧され、その結果ホルダー11、軟質材料15
及び被処理材料17は吸着により一体化され、該
被処理材料はホルダーに保持される。この状態に
おいて、第4図に示すように偏心カムを回転して
移動板13を最上端に移動させると、球形シール
18が各小孔の下端を閉鎖し、小孔14及び16
内の真空を保持する。そこで、バルブ27を閉、
24及び26を開にして導入源より任意な冷却ガ
スを空洞部12内に導入するとホルダー11及び
軟質材料15を介して被処理材料17は冷却状態
になる。その後、リークバルブ33を閉にし、バ
ルブ32を開にすれば真空ポンプ31による処理
室10内の排気がなされ、被処理材料は所望の処
理がなされる。処理の終了した材料を交換する場
合は、バルブ24,26及び32を閉じ、リーク
バルブ33を開にして処理室内を大気に戻し、次
いで偏心カム29を回転して移動板13を下げ
る。これにより、球形シール18は小孔の閉鎖を
解除するので空洞内に残存する冷却ガスの圧力が
各小孔14,16を通して被処理材料の背面に圧
力を掛けるので、該被処理材料は軟質材料15か
ら剥離する。 In such an apparatus, first, the movable plate 13 is placed at the lowest position, the leak valve 33 is opened and the valve 32 is closed to break the vacuum in the processing chamber 10, and the material to be processed 17 is placed on the soft material 15. Set up. Next, valves 24 and 26 for introducing cooling fluid.
is closed, the valve 27 is opened, and the inside of the cavity 12 of the holder 11 is evacuated by the vacuum pump 28 (the state shown in FIG. 3). Due to this exhaust gas, the processing chamber 1
The material to be processed is strongly pressed in the direction of the cavity due to the atmospheric pressure within 0, and as a result, the holder 11 and the soft material
and the material to be processed 17 are integrated by adsorption, and the material to be processed is held in a holder. In this state, when the eccentric cam is rotated to move the moving plate 13 to the uppermost end as shown in FIG. 4, the spherical seal 18 closes the lower end of each small hole and the small holes 14 and 16
Maintain the vacuum inside. Therefore, close the valve 27,
When 24 and 26 are opened and a desired cooling gas is introduced into the cavity 12 from the introduction source, the material 17 to be processed is cooled via the holder 11 and the soft material 15. Thereafter, by closing the leak valve 33 and opening the valve 32, the inside of the processing chamber 10 is evacuated by the vacuum pump 31, and the material to be processed is subjected to the desired processing. When replacing the processed material, the valves 24, 26, and 32 are closed, the leak valve 33 is opened to return the processing chamber to the atmosphere, and then the eccentric cam 29 is rotated to lower the movable plate 13. This causes the spherical seal 18 to unblock the stoma so that the pressure of the cooling gas remaining in the cavity applies pressure through each of the stomas 14, 16 to the back side of the material to be treated, which is a soft material. Peel off from 15.
以上の動作は偏心カム29と各バルブの操作の
みで行なえ、且つ従来のように治具などを使用し
ないので、取扱いは簡単であると同時にホルダー
11が直接冷却されるので被処理材料の冷却効率
は極めて良好である。 The above operations can be performed only by operating the eccentric cam 29 and each valve, and there is no need to use jigs as in the conventional case, so handling is simple. At the same time, the holder 11 is directly cooled, which improves the cooling efficiency of the material to be processed. is extremely good.
第7図乃至第9図は本発明の他の実施例であ
り、第3図乃至第6図の実施例と同一符号は同様
な構成物を示している。この実施例は被処理材料
の大きさが種々異なる場合でも利用できるように
構成したもので、球形シール部の構造と移動板の
駆動機構の部分のみが相違している。第7図にお
いて17a,17b,17c,17d,17eは
各種の被処理材料を示し、小さな材料、例えば1
7aの場合中央部の小孔を除く小孔は材料の吸着
に寄与しないばかりか空洞部12と処理室10と
の間のシールができなくなるので、該吸着に使用
される小孔以外の小孔は常に閉鎖しておく必要が
ある。そのため、夫々同心円上にある球形シール
18a,18b,18c,18d,18eは中央
部から外側に行くに従つて一定の間隔でホルダー
11の上壁に近くなるように構成してある。又駆
動機構は回転ローラ34と階段状板35からな
り、該階段状板を矢印方向に移動させることによ
り、任意なシールを行なうことが可能である。第
8図は被処理材料として17cを用いた場合であ
り、階段状板はCのステツプが選択され、全閉の
位置と該Cの位置との間で移動がなされる。全閉
の位置に移動板を移動した場合は第4図と同様な
状態になることは勿論である。第9図はシール部
分の拡大図で18eと18dは小孔14を閉鎖し
ているが18cは未だ閉鎖するまで上方に移動さ
れていない。図から解るように、各シールのシー
ルピン19e,19d,19c……の長さが異な
つている。 7 to 9 show other embodiments of the present invention, and the same reference numerals as in the embodiment of FIGS. 3 to 6 indicate similar components. This embodiment is constructed so that it can be used even when the sizes of the materials to be treated are different, and only the structure of the spherical seal portion and the drive mechanism of the moving plate are different. In FIG. 7, 17a, 17b, 17c, 17d, and 17e indicate various materials to be processed, and small materials such as 1
In the case of 7a, the small holes other than the small hole in the center not only do not contribute to the adsorption of the material, but also make it impossible to seal between the cavity 12 and the processing chamber 10. must remain closed at all times. Therefore, the spherical seals 18a, 18b, 18c, 18d, and 18e located on concentric circles are arranged so that they approach the upper wall of the holder 11 at regular intervals as they go outward from the center. The drive mechanism includes a rotating roller 34 and a stepped plate 35, and by moving the stepped plate in the direction of the arrow, it is possible to perform arbitrary sealing. FIG. 8 shows the case where 17c is used as the material to be treated, and the stepped plate is moved between the fully closed position and the C position with step C selected. Of course, when the movable plate is moved to the fully closed position, the state will be similar to that shown in FIG. 4. FIG. 9 is an enlarged view of the seal portion where 18e and 18d have closed the small hole 14, but 18c has not yet been moved upwardly to close it. As can be seen from the figure, the seal pins 19e, 19d, 19c, . . . of each seal have different lengths.
この構成となせば、どのような大きさの被処理
材料でも処理可能となり、実用上有益である。 With this configuration, any size of material to be processed can be processed, which is useful in practice.
[効果]
以上詳説したように、本発明では被処理材料の
ホルダーと冷却テーブルとを別々にせずに、直接
ホルダーに被処理材料を載せる構成であるから冷
却効率は極めて良好であり、又シールピンが移動
板に垂直方向に取付けられているので、冷却流体
がそれらの間を容易に通過でき且つホルダーとの
接触面も充分に確保でき、更に適当な乱流が生ず
るので冷却効率は益々良好になる。更に被処理材
料の固定手段と冷却手段とが兼用されているの
で、複雑な部品は不要で、しかも相互の機能は阻
害せず、更には被処理材料をホルダーに載せるだ
けで後は外部から操作できるので、取り扱いが容
易で且つ操作の自動化が可能である。[Effect] As explained in detail above, in the present invention, the material to be processed is placed directly on the holder without separating the holder for the material to be processed and the cooling table, so the cooling efficiency is extremely good. Since they are installed vertically on the moving plate, the cooling fluid can easily pass between them, and the contact surface with the holder is also secured, and appropriate turbulence is generated, so the cooling efficiency is even better. . Furthermore, since the means for fixing the material to be processed and the means for cooling it are both used, there is no need for complicated parts and they do not interfere with each other's functions.Furthermore, the material to be processed can be simply placed on the holder and then operated from the outside. Therefore, it is easy to handle and can be automated.
尚、上記は本発明の実施例であり、実用上は
種々の変更が可能である。例えば、上記はイオン
ドライエツチング装置を例に説明したが、冷却を
必要とする装置であればどのような装置にも適用
可能である。又、冷却のみでなく加熱を含む被処
理材料の恒温に使用しても良い。更に又、冷却や
恒温流体としては使用雰囲気が真空内でなければ
ガスのみでなく、液体であつても良い。更に又、
小孔は図示のような形状、数、分布に限られず任
意に変更し得るし、シール部材は移動板に摺動可
能に取付ける必要はなく固定しても良い。 Note that the above is an example of the present invention, and various changes can be made in practice. For example, although the above description has been made using an ion dry etching device as an example, the present invention can be applied to any device that requires cooling. Further, it may be used not only for cooling but also for constant temperature of the material to be processed, including heating. Furthermore, the cooling or constant-temperature fluid may be not only a gas but also a liquid, as long as the atmosphere in which it is used is not in a vacuum. Furthermore,
The small holes are not limited to the shape, number, and distribution as shown in the drawings, and can be changed arbitrarily, and the sealing member does not need to be slidably attached to the movable plate, but may be fixed.
第1図及び第2図は従来の装置を説明するため
の断面図、第3図乃至第6図は本発明の一実施例
を示す図、第7図乃至第9図は本発明の他の実施
例を示す図である。
11:被処理材料のホルダー、12:空洞部、
13:移動板、14,16:小孔、15:シート
状軟質材料、17:被処理材料、18:球形シー
ル、19:シールピン、20:ばね、21:筒状
体、22:筒状部、23,25:パイプ、24,
26,27,32:バルブ、28,31:真空ポ
ンプ、29:偏心カム。
FIGS. 1 and 2 are cross-sectional views for explaining a conventional device, FIGS. 3 to 6 are views showing one embodiment of the present invention, and FIGS. 7 to 9 are views showing other embodiments of the present invention. It is a figure showing an example. 11: Holder for material to be processed, 12: Cavity part,
13: moving plate, 14, 16: small hole, 15: sheet-like soft material, 17: material to be treated, 18: spherical seal, 19: seal pin, 20: spring, 21: cylindrical body, 22: cylindrical part, 23, 25: pipe, 24,
26, 27, 32: valve, 28, 31: vacuum pump, 29: eccentric cam.
Claims (1)
ずる多数の小孔を有するホルダー、該ホルダーの
上に載せられ前記小孔と連通する小孔を有したシ
ート状の弾性部材、該弾性部材上に載置される被
処理材料、前記空洞部内に配置され前記小孔を閉
鎖するシール部材を保持した移動板、該シール部
材による小孔の開閉を行なうために該移動板を空
洞部内で移動させる機構、前記空洞部内を排気す
る手段及び前記空洞部内に冷却又は恒温流体を導
入する手段を備えていることを特徴とする材料保
持装置。 2 前記シール部材の空洞部上壁との間隔を同心
円的に異ならせ、前記移動板の移動範囲を複数段
に切換え可能に構成した特許請求の範囲第1項記
載の材料保持装置。 3 前記空洞部に導入する冷却又は恒温流体の導
入経路の一部を兼用して空洞部内の排気を行なう
特許請求の範囲第1項又は第2項記載の材料保持
装置。[Scope of Claims] 1. A holder having a hollow portion inside and a large number of small holes communicating with the hollow portion on the upper surface, and a sheet-like shape placed on the holder and having small holes communicating with the small holes. an elastic member, a material to be processed placed on the elastic member, a movable plate holding a sealing member arranged in the cavity and closing the small hole, and a moving plate for opening and closing the small hole with the sealing member. A material holding device comprising a mechanism for moving a moving plate within a cavity, a means for evacuating the interior of the cavity, and a means for introducing cooling or constant temperature fluid into the cavity. 2. The material holding device according to claim 1, wherein the distance between the sealing member and the upper wall of the cavity is varied concentrically, and the moving range of the movable plate can be switched to a plurality of stages. 3. The material holding device according to claim 1 or 2, wherein a part of the introduction path for the cooling or constant temperature fluid introduced into the cavity is used to exhaust the inside of the cavity.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58129040A JPS6020438A (en) | 1983-07-15 | 1983-07-15 | Material holding device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58129040A JPS6020438A (en) | 1983-07-15 | 1983-07-15 | Material holding device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6020438A JPS6020438A (en) | 1985-02-01 |
| JPS64782B2 true JPS64782B2 (en) | 1989-01-09 |
Family
ID=14999608
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58129040A Granted JPS6020438A (en) | 1983-07-15 | 1983-07-15 | Material holding device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6020438A (en) |
-
1983
- 1983-07-15 JP JP58129040A patent/JPS6020438A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6020438A (en) | 1985-02-01 |
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