JPS649724B2 - - Google Patents
Info
- Publication number
- JPS649724B2 JPS649724B2 JP58184528A JP18452883A JPS649724B2 JP S649724 B2 JPS649724 B2 JP S649724B2 JP 58184528 A JP58184528 A JP 58184528A JP 18452883 A JP18452883 A JP 18452883A JP S649724 B2 JPS649724 B2 JP S649724B2
- Authority
- JP
- Japan
- Prior art keywords
- varistor
- diffusing agent
- voltage
- diffusion
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000003795 chemical substances by application Substances 0.000 claims description 23
- 229910052751 metal Inorganic materials 0.000 claims description 22
- 239000002184 metal Substances 0.000 claims description 22
- 238000000034 method Methods 0.000 claims description 15
- 238000009792 diffusion process Methods 0.000 claims description 14
- 239000000919 ceramic Substances 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 8
- 239000008149 soap solution Substances 0.000 claims description 6
- 239000011259 mixed solution Substances 0.000 claims description 5
- 150000003839 salts Chemical class 0.000 claims description 4
- 239000011230 binding agent Substances 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims description 3
- 239000002562 thickening agent Substances 0.000 claims description 2
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- 229910052797 bismuth Inorganic materials 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 239000000344 soap Substances 0.000 description 5
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 229910052573 porcelain Inorganic materials 0.000 description 3
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 229910052745 lead Inorganic materials 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000012266 salt solution Substances 0.000 description 2
- 238000005204 segregation Methods 0.000 description 2
- 238000002791 soaking Methods 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000005324 grain boundary diffusion Methods 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 1
- 238000005036 potential barrier Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
Landscapes
- Thermistors And Varistors (AREA)
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、導電性セラミツク磁器の粒界に拡散
剤を熱拡散させ、粒界に優れたバリスタ特性を持
つた高抵抗層を形成させることによつて、得られ
る焼結体自体が電圧非直線性を有するバルク形の
バリスタの製造方法に関するものである。[Detailed Description of the Invention] (Industrial Application Field) The present invention is to thermally diffuse a diffusing agent into the grain boundaries of conductive ceramic porcelain to form a high resistance layer with excellent varistor properties at the grain boundaries. The present invention relates to a method for manufacturing a bulk type varistor whose obtained sintered body itself has voltage nonlinearity.
(従来例の構成とその問題点)
バリスタとは、印加電圧によつて著しく抵抗値
が変わり、電圧−電流特性が非直線性を示す固体
素子の総称である。動作原理は種類によつて違う
が、共通して云えることは、半導体やセラミツク
の表面または内部におけるPN接合や、シヨツト
キ障壁などのポテンシヤル障壁を通過する電流の
非直線性を利用したものである。(Structure of conventional example and its problems) Varistor is a general term for solid-state elements whose resistance value changes significantly depending on applied voltage and whose voltage-current characteristics exhibit nonlinearity. The operating principle differs depending on the type, but what they have in common is that they utilize the nonlinearity of the current that passes through potential barriers such as PN junctions on the surface or inside of semiconductors and ceramics, and shotgun barriers. .
一般に、バリスタの電圧−電流特性は、I=
(V/C)〓で表わされる。ここで、αはバリスタの電
圧非直線指数と呼び、非オーム性の程度、即ちバ
リスタの性能を表わし、バリスタの種類、材料あ
るいは製造条件によつて大幅に異なり、Cは印加
電圧Vにおけるバリスタの抵抗値で、印加電圧V
の値によつて変化する。 Generally, the voltage-current characteristic of a varistor is I=
It is expressed as (V/C)〓. Here, α is called the voltage nonlinearity index of the varistor, and it represents the degree of non-ohmic property, that is, the performance of the varistor, and it varies greatly depending on the type, material, or manufacturing conditions of the varistor, and C is the voltage nonlinearity index of the varistor at the applied voltage V. The resistance value is the applied voltage V
It changes depending on the value of.
従来の粒界層を利用したバリスタ、例えば、
ZnOにBi、Pb、Mn、Co、Baなどの酸化物を加
えて焼結させ、粒界層にこれら添加物を偏析させ
たバリスタでは、偏析の程度が温度、結晶粒子
径、原料粒径等により変動するため電圧非直線指
数αがばらつき、また、粒界層の厚みの薄い所が
できるためサージ耐量が小さくなる等の欠点を有
していた。また、Bi、Pb等の添加物成分を固体
粉末としてビヒクルに分散させた拡散剤を塗布
し、粒界に熱拡散させる方法もあるが、ZnO表面
に拡散剤層を均一成分、均一膜でつけることが非
常に困難であり、また拡散する為に次なる反応
Bi2O3→2Bi3++302-
をZnO表面で行なう必要があるが、0.5〜1μmの
粒子径である為、Bi等の見掛けの粒界拡散係数
が小さくなり、拡散温度が高温化する等の欠点を
有していた。 Varistors using conventional grain boundary layers, e.g.
In varistors, which are made by adding oxides such as Bi, Pb, Mn, Co, and Ba to ZnO and sintering them, the degree of segregation is determined by temperature, crystal grain size, raw material grain size, etc. This has disadvantages such as variations in the voltage nonlinearity index α due to fluctuations in the voltage, and a decrease in surge resistance due to the formation of thin grain boundary layers. Another method is to apply a diffusing agent in which additive components such as Bi and Pb are dispersed as a solid powder in a vehicle, and then thermally diffuse them to the grain boundaries.However, a diffusing agent layer with uniform components and a uniform film is applied to the ZnO surface. It is very difficult to do so, and the next reaction Bi 2 O 3 →2Bi 3+ +30 2- must be carried out on the ZnO surface in order to diffuse, but since the particle size is 0.5 to 1 μm, it is difficult to This has disadvantages such as a decrease in the apparent grain boundary diffusion coefficient and an increase in the diffusion temperature.
(発明の目的)
本発明は上記のような従来の欠点を除去し、電
圧非直線指数αが安定であり、粒界層に均一な高
抵抗層を形成させることが可能なバリスタの製造
方法を提供するものである。(Object of the invention) The present invention eliminates the above-mentioned conventional drawbacks, provides a method for manufacturing a varistor that has a stable voltage nonlinearity index α, and can form a uniform high-resistance layer in the grain boundary layer. This is what we provide.
(発明の構成)
本発明はバリスタ用セラミツク基板を、拡散剤
の金属成分を含有する有機系金属石けん液または
その有機系金属石けん液と有機バインダよりなる
混合溶液もしくは無機金属塩と増粘剤より成る混
合溶液に漬けた後乾燥してセラミツク表面に金属
成分層を形成させ、拡散処理を施すことにより安
定な電圧非直線指数αを有するバリスタを得るこ
とができるようにしたものである。(Structure of the Invention) The present invention provides a ceramic substrate for a varistor using an organic metal soap solution containing a metal component as a diffusing agent, a mixed solution of the organic metal soap solution and an organic binder, or an inorganic metal salt and a thickener. A varistor having a stable voltage non-linearity index α can be obtained by soaking the ceramic in a mixed solution and drying it to form a metal component layer on the ceramic surface, and then performing a diffusion treatment.
(実施例の説明)
以下本発明のバリスタの製造方法についてその
一実施例を説明する。(Description of an Example) An example of the method for manufacturing a varistor of the present invention will be described below.
試料の調整工程としては工業用原料(純度99.9
%以上)であるZnO、Nb2O5、Bi2O3、BiCl3を準
備する。ZnO粉末にNb2O5粉末を加え充分均一に
混合した後、直径13mm厚さ3mmの円板型に圧縮成
型し、1400〜1450℃の温度範囲で焼成する。この
ようにして得られた焼結素体は比抵抗の小さい酸
化物半導体である。 In the sample preparation process, industrial raw materials (purity 99.9
% or more), ZnO, Nb 2 O 5 , Bi 2 O 3 , and BiCl 3 are prepared. After adding Nb 2 O 5 powder to ZnO powder and mixing thoroughly and uniformly, it is compression molded into a disk shape with a diameter of 13 mm and a thickness of 3 mm, and fired at a temperature in the range of 1400 to 1450°C. The sintered body thus obtained is an oxide semiconductor with low resistivity.
拡散剤としては、ナフテン酸ビスマスをメタノ
ール、ブタノール混合溶剤で希釈した溶液、
BiCl3のメタノール、IPA、ブタノール混合溶液
及び従来例AとしてBi2O3をビヒクルでペースト
状にしたものを準備した。上記拡散剤を用い、本
実施例では半導体磁器素子を弗素樹脂系ネツトに
入れ、金属石けん液または無機金属塩溶液に漬け
た後、半導体磁器素子を80〜100℃で大気中にて
乾燥させた。従来例Aではペースト状拡散剤を、
半導体磁器素子表面にむらなく塗布した。 As a diffusing agent, a solution of bismuth naphthenate diluted with a mixed solvent of methanol and butanol,
A mixed solution of BiCl 3 in methanol, IPA, and butanol, and a conventional example A in which Bi 2 O 3 was made into a paste with a vehicle were prepared. Using the above-mentioned diffusing agent, in this example, the semiconductor ceramic element was placed in a fluororesin net, immersed in a metal soap solution or an inorganic metal salt solution, and then dried in the air at 80 to 100°C. . In conventional example A, the paste-like diffusing agent was
It was applied evenly to the surface of the semiconductor ceramic element.
以上のように拡散剤を塗布した半導体磁器素子
を大気中700〜1200℃の温度にて拡散処理を行つ
た。この熱拡散処理に当つては塗布した拡散成分
が蒸発、溶融流失、試料外への拡散などにより試
料外に失なわれないよう留意した。このようにし
て得られた磁器の両面にAg−Ni系のオーミツク
電極を形成させてバリスタ素子とし、第1図〜第
4図に示す各諸特性を調べた。 The semiconductor ceramic element coated with the diffusing agent as described above was subjected to a diffusion treatment in the atmosphere at a temperature of 700 to 1200°C. In this thermal diffusion treatment, care was taken to ensure that the applied diffusion component was not lost to the outside of the sample due to evaporation, melting, or diffusion to the outside of the sample. Ag--Ni ohmic electrodes were formed on both sides of the porcelain thus obtained to form a varistor element, and various characteristics shown in FIGS. 1 to 4 were investigated.
第1図は粒界層の高抵抗化法の違いによる電圧
非直線指数αの変動、第2図は拡散剤の相違によ
る拡散温度有効範囲、第3図は粒界層の高抵抗化
法の相違によるサージ電圧に対する電流耐圧の関
係、第4図は拡散剤の相違による拡散剤使用量の
関係をそれぞれ示すグラフである。 Figure 1 shows the variation of the voltage nonlinearity index α due to different methods of increasing the resistance of the grain boundary layer, Figure 2 shows the effective diffusion temperature range due to different diffusing agents, and Figure 3 shows the method of increasing the resistance of the grain boundary layer. FIG. 4 is a graph showing the relationship between the current withstand voltage and the surge voltage depending on the difference, and FIG. 4 is a graph showing the relationship between the usage amount of the diffusing agent and the difference in the diffusing agent.
各図において1は金属石けん法による場合、2
は無機金属塩法による場合、3A及び3Bはそれ
ぞれ従来例A及び従来例Bの場合を示している。 In each figure, 1 means 2 when using the metal soap method.
3A and 3B show the case of conventional example A and conventional example B, respectively.
従来例Bは拡散剤を用いない例であり、ZnOに
Nb2O5、Bi2O3を加え充分均一に混合した後、直
径13mm厚さ3mmの円板型に圧縮成型し、1400〜
1450℃の温度範囲で焼成する。このようにして得
られた焼結素体は半導体化した結晶粒と、Bi2O3
分の偏析により高抵抗化した結晶粒界層より成
る。この磁器に前記と同様の方法でAg−Ni系オ
ーミツク電極を形成させ、バリスタ素子としたも
のである。 Conventional example B is an example in which no diffusing agent is used, and ZnO
After adding Nb 2 O 5 and Bi 2 O 3 and mixing them thoroughly, they were compression molded into a disc shape with a diameter of 13 mm and a thickness of 3 mm.
Fired at a temperature range of 1450℃. The sintered body thus obtained contains semiconducting crystal grains and Bi 2 O 3
It consists of grain boundary layers with high resistance due to segregation of particles. Ag--Ni ohmic electrodes were formed on this porcelain in the same manner as described above, and a varistor element was obtained.
第1図〜第4図に於いて本発明の実施例は拡散
法による金属石けん法及び無機金属塩法であり、
他は比較例である。上記各グラフより明らかなよ
うに、本発明により得られるバリスタは電圧非直
線指数α、拡散温度、電流耐量、拡散剤使用量と
もに優れている。これらの好結果は、バリスタ用
基板表面に拡散剤成分が微粒子状に均一に付着す
ることにより得られるものである。 1 to 4, examples of the present invention are a metal soap method and an inorganic metal salt method using a diffusion method,
The others are comparative examples. As is clear from the above graphs, the varistor obtained by the present invention is excellent in voltage nonlinearity index α, diffusion temperature, current withstand capacity, and amount of diffusing agent used. These good results are obtained by uniformly adhering the diffusing agent component in the form of fine particles to the surface of the varistor substrate.
なお、第3図の粒界層の高抵抗化法の相違によ
るサージ電圧に対する電流耐量の関係において、
●は常用耐量、〇は破壊耐量を示し、これらは、
8×20μSの標準衝撃電流波形の場合のデータで
ある。また、第4図の拡散剤の相違による拡散剤
使用量の関係において、拡散剤量は酸化物粉末に
換算したときの量である。 In addition, in the relationship between the current withstand capacity against surge voltage due to the difference in the method of increasing the resistance of the grain boundary layer in Fig. 3,
● indicates normal use capacity, 〇 indicates destructive capacity, and these are:
This data is for a standard impulse current waveform of 8×20μS. In addition, in the relationship between the amount of diffusing agent used depending on the difference in the diffusing agent shown in FIG. 4, the amount of diffusing agent is the amount when converted to oxide powder.
上記説明ではバリスタ用セラミツク基板を漬け
る溶液として金属石けん溶液を使用したが、その
液とPVB等有機バインダ液の混合液でも同等の
結果が得られる。また、金属石けんとしてオフテ
ン酸ビスマスを用いたが、オクチル酸ビスマスな
どの他の金属石けんでもよく、また拡散剤として
Biを用いたが、粒界層を高抵抗化する成分であ
れば他の成分でもよい。また、無機金属塩として
BiCl3を用いたが、拡散処理時にBi2O3等の酸化
物になるものであれば特に限定はしない。また、
バリスタ基板としてZnOを用いたが、TiO2、
BaTiO3等他の成分でも同等の結果が得られる。
また、バリスタ基板に金属石けんまたは無機金属
塩溶液を塗布する方法としては、吹き付け等でも
同等の結果が得られる。 In the above explanation, a metal soap solution was used as the solution for soaking the ceramic substrate for the varistor, but equivalent results can be obtained with a mixture of that solution and an organic binder solution such as PVB. In addition, although bismuth ofthenate was used as the metal soap, other metal soaps such as bismuth octylate may also be used, and as a diffusing agent.
Although Bi was used, other components may be used as long as they increase the resistance of the grain boundary layer. Also, as an inorganic metal salt
Although BiCl 3 was used, there is no particular limitation as long as it becomes an oxide such as Bi 2 O 3 during the diffusion treatment. Also,
Although ZnO was used as the varistor substrate, TiO 2 ,
Similar results can be obtained with other components such as BaTiO 3 .
Further, as a method of applying metal soap or inorganic metal salt solution to the varistor substrate, equivalent results can be obtained by spraying or the like.
(発明の効果)
以上説明したように本発明のバリスタの製造方
法は、電圧非直線指数αの値が高くしかも安定で
あり、拡散温度を下げることも可能となり、ま
た、サージ電圧に対する電流耐量が高い等の利点
があり、工業的量産化においても著しく安定なも
のである等の優れたものであり、産業的価値は極
めて大なるものである。(Effects of the Invention) As explained above, the varistor manufacturing method of the present invention has a high value of the voltage non-linearity index α and is stable, it is also possible to lower the diffusion temperature, and the current withstand capacity against surge voltage is high. It has advantages such as high price and is extremely stable even in industrial mass production, and has extremely great industrial value.
第1図は粒界層の高抵抗化法の相違による電圧
非直線指数αの変動を示すグラフ、第2図は拡散
剤の相違による拡散温度有効範囲を示すグラフ、
第3図は粒界層の高抵抗化法の相違によるサージ
電圧に対する電流耐量の関係を示すグラフ、第4
図は拡散剤の相違による拡散剤使用量の関係を示
すグラフである。
Fig. 1 is a graph showing the variation of the voltage nonlinearity index α due to different methods of increasing the resistance of the grain boundary layer, Fig. 2 is a graph showing the effective range of diffusion temperature due to different diffusing agents,
Figure 3 is a graph showing the relationship between current withstand capacity and surge voltage due to different methods of increasing the resistance of the grain boundary layer.
The figure is a graph showing the relationship between the amount of diffusing agent used and the amount of diffusing agent used.
Claims (1)
成分を含有する有機系金属石けん液またはその有
機系金属石けん液と有機バインダよりなる混合溶
液に漬け、その後に乾燥処理を行ない、セラミツ
ク基板表面に金属成分層を形成させ、拡散処理を
施すことを特徴とするバリスタの製造方法。 2 バリスタ用セラミツク基板を、拡散剤の金属
成分を含有する無機金属塩と増粘剤より成る混合
溶液に漬けた後乾燥させ、拡散処理することを特
徴とするバリスタの製造方法。[Scope of Claims] 1. A ceramic substrate for a varistor is immersed in an organic metal soap solution containing a metal component of a diffusing agent or a mixed solution of the organic metal soap solution and an organic binder, and then subjected to a drying treatment, A method for manufacturing a varistor, which comprises forming a metal component layer on the surface of a ceramic substrate and subjecting it to a diffusion treatment. 2. A method for manufacturing a varistor, which comprises immersing a ceramic substrate for a varistor in a mixed solution of a thickener and an inorganic metal salt containing a metal component of a diffusing agent, and then drying and performing a diffusion treatment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58184528A JPS6077401A (en) | 1983-10-04 | 1983-10-04 | Method of producing varistor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58184528A JPS6077401A (en) | 1983-10-04 | 1983-10-04 | Method of producing varistor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6077401A JPS6077401A (en) | 1985-05-02 |
| JPS649724B2 true JPS649724B2 (en) | 1989-02-20 |
Family
ID=16154771
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58184528A Granted JPS6077401A (en) | 1983-10-04 | 1983-10-04 | Method of producing varistor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6077401A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2019002167A (en) * | 2017-06-13 | 2019-01-10 | 有限会社わたなべ | Rotating tool for level setting bar material |
-
1983
- 1983-10-04 JP JP58184528A patent/JPS6077401A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2019002167A (en) * | 2017-06-13 | 2019-01-10 | 有限会社わたなべ | Rotating tool for level setting bar material |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6077401A (en) | 1985-05-02 |
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