JPH0121227B2 - - Google Patents
Info
- Publication number
- JPH0121227B2 JPH0121227B2 JP14263180A JP14263180A JPH0121227B2 JP H0121227 B2 JPH0121227 B2 JP H0121227B2 JP 14263180 A JP14263180 A JP 14263180A JP 14263180 A JP14263180 A JP 14263180A JP H0121227 B2 JPH0121227 B2 JP H0121227B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- ions
- bath
- molybdenum
- plating bath
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- -1 molybdenum ions Chemical class 0.000 claims description 17
- 229910052750 molybdenum Inorganic materials 0.000 claims description 16
- 239000011733 molybdenum Substances 0.000 claims description 16
- 238000007772 electroless plating Methods 0.000 claims description 10
- 229910001429 cobalt ion Inorganic materials 0.000 claims description 6
- XLJKHNWPARRRJB-UHFFFAOYSA-N cobalt(2+) Chemical compound [Co+2] XLJKHNWPARRRJB-UHFFFAOYSA-N 0.000 claims description 6
- 229910021645 metal ion Inorganic materials 0.000 claims description 6
- 239000007864 aqueous solution Substances 0.000 claims description 3
- 239000000872 buffer Substances 0.000 claims description 3
- 239000003638 chemical reducing agent Substances 0.000 claims description 3
- 229910001453 nickel ion Inorganic materials 0.000 claims description 3
- 239000008139 complexing agent Substances 0.000 claims description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 1
- 238000007747 plating Methods 0.000 description 14
- 239000000203 mixture Substances 0.000 description 5
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 2
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 2
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 2
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 2
- 235000011130 ammonium sulphate Nutrition 0.000 description 2
- 229910000361 cobalt sulfate Inorganic materials 0.000 description 2
- 229940044175 cobalt sulfate Drugs 0.000 description 2
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 2
- PRWXGRGLHYDWPS-UHFFFAOYSA-L sodium malonate Chemical compound [Na+].[Na+].[O-]C(=O)CC([O-])=O PRWXGRGLHYDWPS-UHFFFAOYSA-L 0.000 description 2
- 235000015393 sodium molybdate Nutrition 0.000 description 2
- 239000011684 sodium molybdate Substances 0.000 description 2
- TVXXNOYZHKPKGW-UHFFFAOYSA-N sodium molybdate (anhydrous) Chemical compound [Na+].[Na+].[O-][Mo]([O-])(=O)=O TVXXNOYZHKPKGW-UHFFFAOYSA-N 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 1
- WPUMTJGUQUYPIV-JIZZDEOASA-L disodium (S)-malate Chemical compound [Na+].[Na+].[O-]C(=O)[C@@H](O)CC([O-])=O WPUMTJGUQUYPIV-JIZZDEOASA-L 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- MEFBJEMVZONFCJ-UHFFFAOYSA-N molybdate Chemical compound [O-][Mo]([O-])(=O)=O MEFBJEMVZONFCJ-UHFFFAOYSA-N 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 239000003002 pH adjusting agent Substances 0.000 description 1
- 235000019265 sodium DL-malate Nutrition 0.000 description 1
- 239000001394 sodium malate Substances 0.000 description 1
- 229940074404 sodium succinate Drugs 0.000 description 1
- ZDQYSKICYIVCPN-UHFFFAOYSA-L sodium succinate (anhydrous) Chemical compound [Na+].[Na+].[O-]C(=O)CCC([O-])=O ZDQYSKICYIVCPN-UHFFFAOYSA-L 0.000 description 1
Landscapes
- Chemically Coating (AREA)
Description
【発明の詳細な説明】
本発明は磁気デイスク等の磁気記録体に用いら
れる磁気記憶媒体（磁性膜）を作製する無電解め
つき浴に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an electroless plating bath for producing magnetic storage media (magnetic films) used in magnetic recording bodies such as magnetic disks.
近年、高密度磁気記録体として、記憶媒体がめ
つき法により作製されためつき磁気デイスク等が
用いられ始めた。磁気記録装置は記録再生ヘツド
および記憶媒体の主構成部から構成され、要求さ
れる記録密度、記録再生速度などにより使用され
るヘツドの性能および記憶媒体の特性が決定され
る。記録密度及び出力は同一ヘツドを用いる場
合、記憶媒体の磁気特性（保磁力（Hc）、残留磁
束密度（Br））と膜厚δにより決まり、次の様な
関係がある。 In recent years, as a high-density magnetic recording medium, a plated magnetic disk or the like, in which a storage medium is manufactured by a plating method, has begun to be used. A magnetic recording device is composed of the main components of a recording/reproducing head and a storage medium, and the performance of the head used and the characteristics of the storage medium are determined by the required recording density, recording/reproducing speed, etc. When the same head is used, the recording density and output are determined by the magnetic properties (coercive force (Hc), residual magnetic flux density (Br)) and film thickness δ of the storage medium, and have the following relationship.
（記録密度）∝（Hc／Br・δ）1/2 (1)
（出力）∝（Br・δ・Hc）1/2 (2)
従つて要求される記録密度及び出力に適する磁
性膜を得るためには磁性膜の磁気特性及び膜厚を
一定の許容されうる範囲内に保つ必要がある。 (Recording density)∝(Hc/Br・δ) 1/2 (1) (Output)∝(Br・δ・Hc) 1/2 (2) Therefore, obtain a magnetic film suitable for the required recording density and output. In order to achieve this, it is necessary to maintain the magnetic properties and film thickness of the magnetic film within a certain allowable range.
ところが無電解めつき法を用いて磁性膜を作製
する場合、ある一定組成で調製した無電解めつき
浴より得られる磁性膜の磁気特性を変化させるこ
とは容易でない。電気めつき法の場合は電流密度
を変えることにより得られる磁気特性を容易に変
化させることができるが、無電解めつき法では浴
のPH、浴温などのめつき条件を大幅に変動させる
操作が必要であり、これらの操作は浴寿命の低
下、作業性の低下などを伴うことが多く実用上問
題がある。従つて所要の磁気特性の磁性膜を得る
にはその特性に応じて別個の無電解めつき浴を開
発しなければならないという問題があつた。 However, when producing a magnetic film using an electroless plating method, it is not easy to change the magnetic properties of the magnetic film obtained from an electroless plating bath prepared with a certain composition. In the case of electroplating, the magnetic properties obtained can be easily changed by changing the current density, but in the case of electroless plating, the plating conditions such as bath pH and bath temperature must be changed significantly. These operations are often accompanied by a reduction in bath life and workability, which poses practical problems. Therefore, in order to obtain a magnetic film with the desired magnetic properties, a separate electroless plating bath must be developed depending on the properties.
本発明の目的は、これらの問題点を改善して無
電解めつき浴にモリブデンイオンを加えることに
より磁気特性を制御して所要の特性を有する磁性
膜を得ることのできる無電解めつき浴を提供する
ことにある。 The purpose of the present invention is to improve these problems and provide an electroless plating bath that can control magnetic properties and obtain a magnetic film with desired properties by adding molybdenum ions to the electroless plating bath. It is about providing.
本発明による無電解めつき浴は、コバルトイオ
ン、またはコバルトイオンおよびニツケルイオ
ン、これら金属イオンの還元剤、PH緩衝剤、PH調
節剤、前記金属イオンの錯化剤を含む水溶液にモ
リブデンイオンを加えることを特徴としており、
これにより磁気特性が制御され所要の特性を有す
る磁性膜が得られる。 In the electroless plating bath according to the present invention, molybdenum ions are added to an aqueous solution containing cobalt ions, or cobalt ions and nickel ions, a reducing agent for these metal ions, a PH buffer, a PH adjusting agent, and a complexing agent for the metal ions. It is characterized by
As a result, the magnetic properties are controlled and a magnetic film having the desired properties can be obtained.
以下、本発明による無電解めつき浴の特長を実
施例により説明する。 Hereinafter, the features of the electroless plating bath according to the present invention will be explained using examples.
実施例 １
非磁性基板上に下記のめつき浴組成およびめつ
き条件にてCo―Ｐ磁性膜（δ500Å）を形成し
た。Example 1 A Co-P magnetic film (δ500 Å) was formed on a non-magnetic substrate using the following plating bath composition and plating conditions.
めつき浴組成
硫酸コバルト 0.05mol／
次亜リン酸ナトリウム 0.20mol／
マロン酸ナトリウム 0.50mol／
硫酸アンモニウム 0.50mol／
モリブデン酸ナトリウム ０〜１×10-3mol／
めつき条件
浴のPH9.15（25℃の時NH4OHで調節）
浴温 80℃
めつき浴のモリブデンイオン濃度を０から１×
10-3mol／まで変化させてHcの値のモリブデ
ンイオン濃度依存性を調べた結果を第１図に示
す。図は横軸にめつき浴のモリブデンイオン濃度
をとり、縦軸にめつきされた磁性膜のHcをとつ
たものである。モリブデンイオン濃度が０の時の
Hcは535エルステツド（Oe）であり、モリブデ
ンイオン濃度増加にしたがつてHcが減少した。
モリブデンイオン濃度が１×10-3mol／では、
Hcが390Oeとなつたが、それ以上の濃度ではめ
つきの析出が抑制された。Plating bath composition Cobalt sulfate 0.05 mol / Sodium hypophosphite 0.20 mol / Sodium malonate 0.50 mol / Ammonium sulfate 0.50 mol / Sodium molybdate 0 to 1 x 10 -3 mol / Plating conditions Bath PH9.15 (25℃) (Adjust with NH 4 OH when
Figure 1 shows the results of investigating the dependence of the Hc value on molybdenum ion concentration by changing the concentration up to 10 -3 mol/. In the figure, the horizontal axis represents the molybdenum ion concentration in the plating bath, and the vertical axis represents the Hc of the plated magnetic film. When molybdenum ion concentration is 0
Hc was 535 oersted (Oe), and Hc decreased as the molybdenum ion concentration increased.
When the molybdenum ion concentration is 1×10 -3 mol/,
Although Hc was 390 Oe, plating precipitation was suppressed at higher concentrations.
この様に微量のモリブデンイオンをめつき浴に
加えることにより得られるHcの値を減少させる
ことができた。 In this way, by adding a small amount of molybdenum ions to the plating bath, it was possible to reduce the Hc value obtained.
実施例 ２
非磁性基板上に下記のめつき浴組成及びめつき
条件にてCo―Ni―Ｐ磁性膜（δ500Å）を形成
した。Example 2 A Co--Ni--P magnetic film (δ500 Å) was formed on a non-magnetic substrate using the following plating bath composition and plating conditions.
めつき浴組成
硫酸コバルト 0.06mol／
硫酸ニツケル 0.04mol／
次亜リン酸ナトリウム 0.20mol／
硫酸アンモニウム 0.10mol／
マロン酸ナトリウム 0.30mol／
リンゴ酸ナトリウム 0.40mol／
コハク酸ナトリウム 0.50mol／
モリブデン酸ナトリウム０〜6.3×10-3mol／
めつき条件
浴のPH9.2（25℃の時NH4OHで調節）
浴温 80℃
実施例１と同様にHcの値のモリブデンイオン
イオン濃度依存性を調べた結果を第２図に示す。
モリブデンイオン濃度が０の時のHcは650Oeで
あり、モリブデンイオン濃度増加にしたがつて
Hcが減少した。モリブデンイオン濃度が6.3×
10-4mol／では、Hcが475Oeになつたが、それ
以上の濃度ではめつきの析出が抑制された。この
様に微量のモリブデンイオンを加えることにより
Co―Ni―Ｐ磁性膜のHcの値を減少させることが
できた。Plating bath composition Cobalt sulfate 0.06mol / Nickel sulfate 0.04mol / Sodium hypophosphite 0.20mol / Ammonium sulfate 0.10mol / Sodium malonate 0.30mol / Sodium malate 0.40mol / Sodium succinate 0.50mol / Sodium molybdate 0 to 6.3 ×10 -3 mol/ Plating conditions Bath PH9.2 (adjusted with NH 4 OH at 25°C) Bath temperature 80°C Similar to Example 1, the results of investigating the dependence of Hc value on molybdenum ion concentration were Shown in Figure 2.
When the molybdenum ion concentration is 0, Hc is 650 Oe, and as the molybdenum ion concentration increases,
Hc decreased. Molybdenum ion concentration is 6.3×
At 10 -4 mol/Hc, Hc reached 475 Oe, but at higher concentrations, plating precipitation was suppressed. By adding a small amount of molybdenum ions like this,
It was possible to reduce the Hc value of the Co--Ni--P magnetic film.
以上、実施例１、２で示された様に、本発明に
よれば、コバルトイオン、またはコバルトイオン
およびニツケルイオン、これら金属イオンの還元
剤、PH緩衝剤、PH調節剤、前記金属イオンの錯化
剤を含む水溶液にモリブデンイオンを加えること
により、磁気特性が制御され所要の特性を有する
磁性膜が得られる。 As described above in Examples 1 and 2, according to the present invention, cobalt ions, cobalt ions and nickel ions, reducing agents for these metal ions, PH buffers, PH regulators, complexes of the metal ions, By adding molybdenum ions to an aqueous solution containing a curing agent, magnetic properties can be controlled and a magnetic film having desired properties can be obtained.
第１図は、実施例１で用いためつき浴における
モリブデンイオン濃度とHcの関係を示す図、第
２図は実施例２で用いためつき浴における同様の
関係を示す図である。
FIG. 1 is a diagram showing the relationship between molybdenum ion concentration and Hc in the accumulating bath used in Example 1, and FIG. 2 is a diagram showing a similar relationship in the accumulating bath used in Example 2.
Claims (1)
びニツケルイオン、これら金属イオンの還元剤、
PH緩衝剤、PH調節剤、前記金属イオンの錯化剤を
含む水溶液にモリブデンイオンを加えたことを特
徴とする無電解めつき浴。1 Cobalt ion, or cobalt ion and nickel ion, reducing agent for these metal ions,
An electroless plating bath characterized in that molybdenum ions are added to an aqueous solution containing a PH buffer, a PH regulator, and a complexing agent for the metal ions.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14263180A JPS5767156A (en) | 1980-10-13 | 1980-10-13 | Electroless plating bath |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14263180A JPS5767156A (en) | 1980-10-13 | 1980-10-13 | Electroless plating bath |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5767156A JPS5767156A (en) | 1982-04-23 |
| JPH0121227B2 true JPH0121227B2 (en) | 1989-04-20 |
Family
ID=15319827
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14263180A Granted JPS5767156A (en) | 1980-10-13 | 1980-10-13 | Electroless plating bath |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5767156A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62136574A (en) * | 1985-12-10 | 1987-06-19 | Nippon Sheet Glass Co Ltd | Electroless plating bath |
| US6251475B1 (en) | 1998-10-26 | 2001-06-26 | Agfa-Gevaert | Preparation of a magnetic layer |
| EP0997918B1 (en) * | 1998-10-26 | 2004-07-14 | Agfa-Gevaert | Preparation of a magnetic layer |
-
1980
- 1980-10-13 JP JP14263180A patent/JPS5767156A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5767156A (en) | 1982-04-23 |
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