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JPH0123413B2 - - Google Patents
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JPH0123413B2 - - Google Patents

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Publication number
JPH0123413B2
JPH0123413B2 JP56204699A JP20469981A JPH0123413B2 JP H0123413 B2 JPH0123413 B2 JP H0123413B2 JP 56204699 A JP56204699 A JP 56204699A JP 20469981 A JP20469981 A JP 20469981A JP H0123413 B2 JPH0123413 B2 JP H0123413B2
Authority
JP
Japan
Prior art keywords
aqueous solution
silica sol
alkali metal
added
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56204699A
Other languages
Japanese (ja)
Other versions
JPS58110417A (en
Inventor
Juzo Takase
Motomu Miwa
Shuichi Tada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Adeka Corp
Original Assignee
Asahi Denka Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Denka Kogyo KK filed Critical Asahi Denka Kogyo KK
Priority to JP20469981A priority Critical patent/JPS58110417A/en
Publication of JPS58110417A publication Critical patent/JPS58110417A/en
Publication of JPH0123413B2 publication Critical patent/JPH0123413B2/ja
Granted legal-status Critical Current

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Description

【発明の詳細な説明】[Detailed description of the invention]

本発明はシリカゾルに含まれるシリカ粒子の粒
子径を成長せしめ、所望の粒子径で粒子径分布の
狭いシリカ粒子からなるシリカゾルを製造する方
法に関する。 尚、本明細書で述べるシリカの平均粒子径と
は、メチルレツド吸着法により測定された表面積
S(m2/g)をを次式に基づき粒子径d(mμ)に
換算したものである。 d(mμ)=2720/S(m2/g) 又、シリカの粒子径分布とは、電子顕微鏡によ
り測定した値を示す。 一般にシリカゾルの製法は珪酸ナトリウム等の
珪酸アルカリ金属塩、珪酸エチル、珪酸クロライ
ド、珪酸金属等を原料とし、イオン交換、加水分
解、電気透析等の手法を用いて、一度希薄なシリ
カゾル水溶液を作り、次いでこの希薄なシリカゾ
ル水溶液を濃縮して市販に供する濃度まで高めて
いる。現在用いられている濃縮方法は希薄シリカ
ゾル水溶液を加熱して水分を除くいわゆる蒸発濃
縮法である。他方、限外過法を用いた希薄シリ
カゾル水溶液の濃縮例はすでに公知であり、例え
ば米国特許第396926号明細書にその例が開示され
ている。 これらの方法によつて製造されたシリカゾル水
溶液中のシリカ粒子の平均粒子径は一般に10〜14
mμであり、しかも粒子径分布の広いものが多
い。この様なものはシリカゾルの用途に応じ所望
の粒子径のものの提供を充分果たすことができな
いばかりでなく、粒子径が小さいことと粒子径分
布が大きいことから高濃度に濃縮した場合ゲル化
し易く、又、高粘稠物となり易い欠点がある。 そのため高温加熱処理し粒子径を大きくするこ
とが2〜3提案されている。例えば米国特許第
2680721号においては、シリカゾルを管を通過中
に迅速に均一に加熱し粒子を増大せしめる方法を
提案している。しかしこの方法でも管内のスケー
リングが激しいこと、及び熱交換力の低下による
不均一加熱からくるゲル化が問題となり工業的規
模での実施は困難である。更に又、特公昭49−
4639号公報では、シリカゾルをオートクレーブを
用いて高温加熱処理することでシリカ粒子径の増
大及び粒子径分布をせまくしているが、200℃〜
300℃との高温で処理することから設備費が多く
かかる欠点がある。 本発明者らは、工業的に有利な方法でシリカ粒
子径の増大及び粒子径分布のせまいシリカゾルの
製造方法について種々検討した結果、円滑に粒子
径を増大せしめ且つ粒子径分布のせまいシリカゾ
ルの安価な製造方法を見い出すに至り本発明を完
成した。 即ち、本発明の方法は、活性な酸性シリカゾル
水溶液を70℃以上のアルカリ水溶液に、添加速度
が1分間当り酸性シリカゾル水溶液中のシリカゾ
ル(SiO2換算)とアルカリ水溶液中のアルカリ
(R2O換算、Rはアルカリ金属又はNH4)のモル
比(SiO2/R2O)が10以下となる様に加えて安定
なシリカゾル水溶液を得るに際して、酸性シリカ
ゾル水溶液の添加をアルカリ金属の可溶性塩40〜
1000ppmの存在下で行うことを特徴とするもので
ある。 本発明で用いられる活性な酸性シリカゾル水溶
液とは例えばアルカリ金属珪酸塩を水素型の陽イ
オン交換樹脂で反応処理して得られる酸性シリカ
ゾル水溶液等のPH4以下の非常に不安定な酸性シ
リカゾル水溶液をさす。この時の酸性シリカゾル
水溶液中の珪酸(SiO2)濃度は通常2〜10%
(重量基準、以下同じ)が普通である。 本発明では酸性シリカゾル水溶液及び/又はア
ルカリ水溶液中に40〜1000ppmのアルカリ金属の
可溶性塩を存在せしめてシリカゾルを得る。 このアルカリ金属の可溶性塩としてはリチウ
ム、ナトリウム、カリウム又はセシウムの塩酸、
硫酸、硝酸、炭酸、リン酸、アルミン酸塩が好ま
しいものとして挙げられ、更にこのアルカリ金属
の可溶性塩は、単独もしくは複数塩で使用しても
良く、その量は総量で40〜1000ppmが好ましく、
40〜500ppm、なるべくは50ppm以上がより好ま
しい。40ppm未満においては触媒の効果を発揮で
きず、粒子径の小さいものしか得られない。他
方、1000ppm以上においては必要十分でありこれ
以上多量加えてもその効果は出ないからでであ
る。 このアルカリ金属可溶性塩の酸性シリカゾル水
溶液への添加方法としては酸性シリカゾル水溶液
に直接もしくは水で一度溶解希釈した後加えても
よく、更に又、アルカリ水溶液に酸性シリカゾル
水溶液を連続的に添加する直前に混合しても良
い。 このアルカリ金属可溶性塩の量と酸性シリカゾ
ル水溶液の珪酸(SiO2)濃度と安定化されたシ
リカゾル水溶液中のシリカ平均粒子径との間には
重要な関係がある。即ち、アルカリ金属可溶性塩
の濃度の増加にともない、安定化されたシリカゾ
ル水溶液中のシリカ粒子径が増大する。アルカリ
金属可溶性塩の働く機構がどのようなものである
かさだかではないが、珪酸のシラノール基の水酸
基脱水縮合に一種の触媒として重要な働きをもつ
ているものと考えられる。 本発明においてアルカリ等の存在下でアルカリ
金属可溶性塩を含んだ酸性シリカゾル水溶液を安
定なシリカゾル水溶液に変える安定化槽は通常、
槽容量の1/10〜1/2の水溶液をみたし70℃以上の
温度で十分撹拌する。安定化槽中の水溶液として
は、モル比SiO2/R2Oが0〜200、SiO2濃度0〜
40%、R2O濃度0.01〜1.0%のものが良い。R2O源
としてはNaOH、LiOH、KOH、CsOH、
NH4OH、四級アルキルアンモニウムハイドライ
ド、及びこれらの珪酸塩が挙げられる。又、かか
る安定化槽中のアルカリ水溶液中にアルカリ金属
可溶性塩を入れても良い。 更に又、本発明の方法によつて得られた安定な
シリカゾル水溶液を安定化槽に入れ、更に珪酸ナ
トリウム等のアルカリを添加し、この中にアルカ
リ金属可溶性塩を含んだ酸性シリカゾル水溶液を
上記SiO2/R2Oのモル比で連続的に添加していく
こともできる。 更に又、アルカリ金属可溶性塩を含んだ酸性シ
リカゾル水溶液をアルカリ水溶液に連続的に添加
する時において、アルカリ水溶液の温度は70℃以
上に保つ必要があり、これ以下では、シリカ粒子
の成長がおそく、不適当である(更に好ましくは
80℃以上である)。又、該酸性シリカゾル水溶液
をアルカリ水溶液に連続的に添加する速度は、安
定化されたシリカゾル水溶液中のシリカ粒子分布
と重要な関係があり、アルカリ水溶液中に1分間
当り該酸性シリカゾル水溶液中のSiO2とアルカ
リ水溶液中のR2Oとのモル比SiO2/R2Oが10以下
となる添加速度で連続的に添加する必要がある。
より好ましくはSiO2/R2Oが0.1〜8の範囲であ
る。0.1以下では、添加速度が遅く、工業的に不
利であり実用的でない。又、10を越えた添加速度
では、添加される酸性シリカゾル水溶液中の珪酸
がコロイド粒子に成長する時間がなく、極部的な
ゲル化、時として全体的なゲル化を起こし、工業
的製法において問題を生ずるばかりでなく、最終
的に安定化されたシリカゾル水溶液中のシリカ粒
子の粒子径分布が大きくなり本発明の目的にそぐ
わない。 この場合のSiO2とは、あくまでも連続的に安
定化槽に添加される酸性シリカゾル水溶液中の珪
酸をさし、既に安定化槽中に存在する水溶液中の
珪酸分は含まない。なぜならば、安定化槽中の水
溶液中に存在する珪酸はすぐに安定化されコロイ
ド粒子に成長しているからである。 安定化槽への酸性シリカゾル水溶液の添加は最
終製品として望みうるSiO2/R2Oモル比のところ
で止めれば良いがモル比20〜1000が好ましく、40
〜500がより好ましい。 安定化槽で安定化されたシリカゾル水溶液は、
そのまま冷却しても十分安定であるが、好ましく
は0.5〜4時間、70℃以上の温度で更に熱処理し
た方がより、シリカ粒子の粒子径分布がせまくな
る。 この様にして得られたシリカゾル水溶液を常法
の蒸発濃縮法、もしくは限外過法により濃縮し
て本発明の粒子径のコントロールされたシリカゾ
ル水溶液を得る。 触媒としてシリカゾル水溶液の中に入つている
アルカリ金属可溶性塩は少量であり、使用上問題
はないが、場合によつては水酸基型の陰イオン交
換樹脂や活性白土の様な吸着剤により処理して取
り除くこともできる。 本発明はシリカゾルに含まれるシリカ粒子の粒
子径を成長せしめ任意の粒子径で、しかも粒子径
分布の狭いシリカ粒子からなるシリカゾルをより
工業的、経済的に有利な方法で提供するものであ
り、以下製造例、実施例をもつて本発明を説明す
るが、本発明はこれらの範囲にとどまるものでは
ない。 製造例 1 珪酸ソーダJIS3号(旭電化工業(株)製品、
SiO229%、Na2O9.0%)を水で希釈し、SiO26.0
%、Na2O1.86%の希薄珪酸ソーダ水溶液を作つ
た。この希薄珪酸ソーダ水溶液をあらかじめ通常
の方法で調整された水素型陽イオン交換樹脂(オ
ルガノ(株)製品、アルバーライトIR−120B)に通
液し、SiO26.0%の酸性シリカゾル水溶液を得た
(PH2.5)。 塩化ナトリウム(特級)11.7gを蒸留水にとか
し塩化ナトリウム11.7%の水溶液を得た。これを
触媒水溶液Iとする。 上記、酸性シリカゾル水溶液400gに触媒水溶
液I0.4gを加えて触媒入り酸性シリカゾル水溶液
約400g(SiO26.0%、NaCl117ppm)を得た。 この触媒入り酸性シリカゾル水溶液400gを90
℃に保ちつつ十分撹拌されているNa2O0.31%水
溶液100gの中に1分間20g/分の速度で添加し
た。添加は約20分で終わり、次いでそのまま90
℃、2時間撹拌して冷却し安定なシリカゾル水溶
液500gを得た。 製造例 2 製造例1で用いたものと同じ酸性シリカゾル水
溶液400gに製造例1で用いたものと同じ触媒水
溶液I0.2gを加え、触媒入り酸性シリカゾル水溶
液約400gを得た。この触媒入り酸性シリカゾル
水溶液400gを90℃に保ちつつ十分に撹拌されて
いるNa2O0.31%水溶液100gの中に1分間あた
り、5g/分の速度で添加した。添加は約80分か
かり、次いでそのまま90℃、1時間撹拌して冷却
し安定なシリカゾル水溶液500gを得た。 製造例 3 製造例1で用いたものと同じ酸性シリカゾル水
溶液400gに製造例1で用いたものと同じ触媒水
溶液I0.8gを加え、触媒入り酸性シリカゾル水溶
液約400gを得た。この触媒入り酸性シリカゾル
水溶液400gを90℃に保ちつつ十分に撹拌されて
いるNa2O0.31%水溶液100gの中に1分間当り10
g/分の速度で添加した。添加は約40分かかり、
次いでそのまま90℃−1.5時間撹拌して冷却し、
安定なシリカゾル水溶液500gを得た。 製造例 4 製造例3の中で触媒水溶液Iの添加量を1.2g
にしたほかは全て同じ処理をした。 製造例 5 製造例1の中で触媒水溶液を硫酸ナトリウム
14.2%水溶液(以後触媒水溶液という)に変え
たほかは全て同じ処理をした。 製造例 6 製造例1の中で触媒水溶液を塩化カリウム
14.9%水溶液(以後触媒水溶液という)に変え
たほかは全て同じ処理をした。 製造例 7 製造例3で得られた安定なコロイダルシリカ
96.5gに3号珪曹3.5gを加えて安定化槽に入れ
るアルカリ水溶液(SiO25.6%、Na2O0.37%、
NaCl180ppm)を調整した後、酸性シリカゾル水
溶液400gに触媒水溶液0.4gを加えて、触媒入
り酸性シリカゾル水溶液約400g(SiO26.0%、
NaCl117ppm)を得た。この触媒入り酸性シリカ
ゾル水溶液400gを90℃に保ちつつ十分に撹拌さ
れているアルカリ水溶液100g(SiO25.6%、
Na2O0.37%、NaCl180ppm)の中に1分間当り
20g/分の速度で添加した。添加は約20分で終わ
り、次いでそのまま90℃、2時間撹拌して冷却し
安定なシリカゾル水溶液500gを得た。 比較製造例 1 製造例1で用いたものと同じ酸性シリカゾル水
溶液400gを、90℃に保ちつつ十分撹拌されてい
るNa2O0.31%アルカリ水溶液100g中に1分間当
り20g/分の速度で添加した。添加は約20分で終
わり、次いでそのまま、90℃、2時間撹拌して冷
却し安定なシリカゾル水溶液500gを得た。 比較製造例 2 製造例1の中で触媒水溶液の量を0.04gに変
えたほかは製造例1と全く同じ操作を行つて安定
なシリカゾル水溶液500gを得た。 比較製造例 3 製造例1で用いた触媒入り酸性シリカゾル水溶
液400gを90℃に保ちつつ十分に撹拌されている
Na2O0.31%アルカリ水溶液100g中に1分間当り
80g/分の速度で添加した。添加が速いのでアル
カリ水溶液の温度は一時的に80℃に下がつた。
又、局部的にケイ酸のゲル化物もできたが、撹拌
には問題とならなかつた。添加終了後90℃で2時
間撹拌して冷却し安定なシリカゾル水溶液を得
た。 比較製造例 4 製造例1で用いた触媒入り酸性シリカゾル水溶
液400gを40℃に保ちつつ十分に撹拌されている
Na2O0.31%アルカリ水溶液100gの中に1分間当
り20g/分の速度で添加した。添加は約20分で終
了した。その後1℃/分の速度で全体を昇温し
た。温度が60℃になつた時全体がゲル化した。そ
のまま2時間撹拌したらゲルは再溶解した。時に
昇温して90℃にし90℃で1時間撹拌して冷却し安
定なシリカゾル500gを得た。 以上の結果を表−1に示す。
The present invention relates to a method for producing a silica sol consisting of silica particles having a desired particle size and a narrow particle size distribution by increasing the particle size of silica particles contained in a silica sol. Incidentally, the average particle diameter of silica described in this specification is the surface area S (m 2 /g) measured by the methyl red adsorption method converted into a particle diameter d (mμ) based on the following formula. d (mμ) = 2720/S (m 2 /g) In addition, the particle size distribution of silica refers to a value measured using an electron microscope. In general, silica sol is manufactured by using alkali metal silicate salts such as sodium silicate, ethyl silicate, silicate chloride, metal silicate, etc. as raw materials, and using techniques such as ion exchange, hydrolysis, and electrodialysis, a dilute aqueous silica sol solution is made once. This dilute aqueous silica sol solution is then concentrated to a concentration that can be sold commercially. The concentration method currently used is the so-called evaporation concentration method in which a dilute aqueous silica sol solution is heated to remove water. On the other hand, an example of concentrating a dilute aqueous silica sol solution using an ultrafiltration method is already known, and an example thereof is disclosed in US Pat. No. 396,926, for example. The average particle diameter of silica particles in the silica sol aqueous solution produced by these methods is generally 10 to 14
mμ, and many have a wide particle size distribution. Such materials are not only unable to sufficiently provide the desired particle size depending on the intended use of the silica sol, but also tend to gel when concentrated to a high concentration due to the small particle size and wide particle size distribution. Another disadvantage is that it tends to become highly viscous. Therefore, a few proposals have been made to increase the particle size by performing high-temperature heat treatment. For example, U.S. Patent No.
No. 2,680,721 proposes a method of rapidly and uniformly heating silica sol while it passes through a tube to increase the size of the particles. However, even with this method, there are problems such as severe scaling inside the pipe and gelation caused by uneven heating due to a decrease in heat exchange power, making it difficult to implement on an industrial scale. Furthermore, the special public service in 1977-
In Publication No. 4639, silica sol is heated at high temperature using an autoclave to increase the silica particle size and narrow the particle size distribution.
The drawback is that the equipment costs are high because it is processed at a high temperature of 300°C. As a result of various studies on industrially advantageous methods for increasing the silica particle size and producing silica sol with a narrow particle size distribution, the present inventors have found that they can smoothly increase the particle size and produce a silica sol with a narrow particle size distribution at an inexpensive price. The present invention was completed by discovering a manufacturing method. That is, in the method of the present invention, an active acidic silica sol aqueous solution is added to an alkaline aqueous solution at a temperature of 70°C or higher , and the addition rate is 1 minute per minute. , R is an alkali metal or NH 4 ), and in order to obtain a stable silica sol aqueous solution, the molar ratio (SiO 2 /R 2 O) of NH 4 ) is 10 or less.
It is characterized by being carried out in the presence of 1000 ppm. The active acidic silica sol aqueous solution used in the present invention refers to a very unstable acidic silica sol aqueous solution with a pH of 4 or less, such as an acidic silica sol aqueous solution obtained by reacting an alkali metal silicate with a hydrogen-type cation exchange resin. . The silicic acid (SiO 2 ) concentration in the acidic silica sol aqueous solution at this time is usually 2 to 10%.
(based on weight, the same applies hereinafter) is normal. In the present invention, a silica sol is obtained by allowing 40 to 1000 ppm of a soluble salt of an alkali metal to be present in an acidic silica sol aqueous solution and/or an alkaline aqueous solution. Soluble salts of alkali metals include lithium, sodium, potassium or cesium hydrochloride;
Preferred examples include sulfuric acid, nitric acid, carbonic acid, phosphoric acid, and aluminate salts, and the soluble salts of alkali metals may be used alone or in the form of multiple salts, and the total amount thereof is preferably 40 to 1000 ppm.
It is more preferably 40 to 500 ppm, preferably 50 ppm or more. If the amount is less than 40 ppm, the catalyst cannot exhibit its effect and only particles with small particle sizes can be obtained. On the other hand, at 1000 ppm or more, it is necessary and sufficient, and even if a larger amount is added, no effect will be produced. The alkali metal soluble salt may be added to the acidic silica sol aqueous solution directly or after being dissolved and diluted with water, or immediately before the acidic silica sol aqueous solution is continuously added to the alkaline aqueous solution. May be mixed. There is an important relationship between the amount of this alkali metal soluble salt, the silicic acid (SiO 2 ) concentration in the acidic silica sol aqueous solution, and the average particle diameter of silica in the stabilized silica sol aqueous solution. That is, as the concentration of the alkali metal soluble salt increases, the silica particle size in the stabilized silica sol aqueous solution increases. Although it is not clear exactly how the soluble alkali metal salt works, it is thought that it plays an important role as a kind of catalyst in the dehydration condensation of the hydroxyl group of the silanol group of silicic acid. In the present invention, the stabilization tank that converts an acidic silica sol aqueous solution containing an alkali metal soluble salt into a stable silica sol aqueous solution in the presence of an alkali or the like usually includes:
Fill the tank with 1/10 to 1/2 of the aqueous solution and stir thoroughly at a temperature of 70°C or higher. The aqueous solution in the stabilization tank has a molar ratio SiO 2 /R 2 O of 0 to 200 and a SiO 2 concentration of 0 to 200.
40%, and R 2 O concentration of 0.01 to 1.0% is good. R2O sources include NaOH, LiOH, KOH, CsOH,
Examples include NH 4 OH, quaternary alkyl ammonium hydrides, and silicates thereof. Further, an alkali metal soluble salt may be added to the aqueous alkali solution in the stabilizing tank. Furthermore, the stable silica sol aqueous solution obtained by the method of the present invention is placed in a stabilizing tank, and an alkali such as sodium silicate is added to the acidic silica sol aqueous solution containing the alkali metal soluble salt. It can also be added continuously at a molar ratio of 2 /R 2 O. Furthermore, when an acidic silica sol aqueous solution containing an alkali metal soluble salt is continuously added to an alkaline aqueous solution, the temperature of the alkali aqueous solution must be kept at 70°C or higher; if it is lower than this, the growth of silica particles will be slow; inappropriate (more preferably
80℃ or higher). In addition, the rate at which the acidic silica sol aqueous solution is continuously added to the alkaline aqueous solution has an important relationship with the silica particle distribution in the stabilized silica sol aqueous solution, and SiO in the acidic silica sol aqueous solution is added per minute to the alkaline aqueous solution. It is necessary to continuously add at a rate such that the molar ratio SiO 2 /R 2 O between 2 and R 2 O in the alkaline aqueous solution is 10 or less.
More preferably, SiO 2 /R 2 O is in the range of 0.1 to 8. If it is less than 0.1, the addition rate is slow, which is industrially disadvantageous and impractical. In addition, if the addition rate exceeds 10, the silicic acid in the acidic silica sol aqueous solution added does not have time to grow into colloidal particles, causing local gelation and sometimes total gelation, which is difficult to achieve in industrial production methods. This not only causes problems, but also increases the particle size distribution of the silica particles in the final stabilized aqueous silica sol solution, which is not suitable for the purpose of the present invention. In this case, SiO 2 refers only to the silicic acid in the acidic silica sol aqueous solution that is continuously added to the stabilization tank, and does not include the silicic acid content in the aqueous solution that already exists in the stabilization tank. This is because the silicic acid present in the aqueous solution in the stabilization tank is immediately stabilized and grows into colloidal particles. The addition of the acidic silica sol aqueous solution to the stabilizing tank can be stopped at the desired SiO 2 /R 2 O molar ratio for the final product, but a molar ratio of 20 to 1000 is preferable, and 40
~500 is more preferred. The silica sol aqueous solution stabilized in the stabilization tank is
Although it is sufficiently stable even if it is cooled as it is, the particle size distribution of the silica particles becomes narrower when it is further heat-treated preferably at a temperature of 70° C. or higher for 0.5 to 4 hours. The silica sol aqueous solution thus obtained is concentrated by a conventional evaporation concentration method or an ultrafiltration method to obtain a silica sol aqueous solution with a controlled particle size according to the present invention. The alkali metal soluble salt contained in the silica sol aqueous solution as a catalyst is small and poses no problem in use, but in some cases it may be treated with an adsorbent such as a hydroxyl group-type anion exchange resin or activated clay. It can also be removed. The present invention provides a silica sol consisting of silica particles having an arbitrary particle size and a narrow particle size distribution by growing the particle size of the silica particles contained in the silica sol in a more industrially and economically advantageous method. The present invention will be explained below with reference to production examples and examples, but the present invention is not limited to these scopes. Production example 1 Sodium silicate JIS No. 3 (Asahi Denka Kogyo Co., Ltd. product,
SiO 2 29%, Na 2 O 9.0%) was diluted with water, SiO 2 6.0
%, Na 2 O 1.86% dilute aqueous solution of sodium silicate was prepared. This diluted sodium silicate aqueous solution was passed through a hydrogen-type cation exchange resin (Albarite IR-120B, manufactured by Organo Co., Ltd.) prepared in advance in a conventional manner to obtain an acidic silica sol aqueous solution containing 6.0% SiO 2 ( PH2.5). 11.7 g of sodium chloride (special grade) was dissolved in distilled water to obtain a 11.7% aqueous solution of sodium chloride. This is referred to as catalyst aqueous solution I. 0.4 g of catalyst aqueous solution I was added to 400 g of the above acidic silica sol aqueous solution to obtain about 400 g of a catalyst-containing acidic silica sol aqueous solution (SiO 2 6.0%, NaCl 117 ppm). 90g of this acidic silica sol aqueous solution containing catalyst
It was added at a rate of 20 g/min for 1 minute into 100 g of a 0.31% Na 2 O aqueous solution that was sufficiently stirred while maintaining the temperature at °C. Addition takes about 20 minutes, then 90 minutes
℃ for 2 hours and cooled to obtain 500 g of a stable silica sol aqueous solution. Production Example 2 0.2 g of the same catalyst aqueous solution I used in Production Example 1 was added to 400 g of the same acidic silica sol aqueous solution used in Production Example 1 to obtain about 400 g of an acidic silica sol aqueous solution containing a catalyst. 400 g of this catalyst-containing acidic silica sol aqueous solution was added at a rate of 5 g/min to 100 g of a 0.31% Na 2 O aqueous solution which was being sufficiently stirred while maintaining the temperature at 90°C. The addition took about 80 minutes, and then the mixture was stirred at 90° C. for 1 hour and cooled to obtain 500 g of a stable aqueous silica sol solution. Production Example 3 To 400 g of the same acidic silica sol aqueous solution used in Production Example 1, 0.8 g of the same catalyst aqueous solution I used in Production Example 1 was added to obtain about 400 g of a catalyst-containing acidic silica sol aqueous solution. 400 g of this catalyst-containing acidic silica sol aqueous solution is added to 100 g of a 0.31% Na 2 O aqueous solution that is sufficiently stirred while keeping the temperature at 90°C.
It was added at a rate of g/min. Addition takes approximately 40 minutes;
Then, the mixture was stirred at 90°C for 1.5 hours and cooled.
500 g of a stable aqueous silica sol solution was obtained. Production Example 4 In Production Example 3, the amount of catalyst aqueous solution I added was 1.2g.
I did everything else the same way. Production Example 5 In Production Example 1, the catalyst aqueous solution was replaced with sodium sulfate.
All treatments were the same except that the 14.2% aqueous solution (hereinafter referred to as catalyst aqueous solution) was used. Production Example 6 In Production Example 1, the catalyst aqueous solution was replaced with potassium chloride.
All treatments were the same except that the 14.9% aqueous solution (hereinafter referred to as catalyst aqueous solution) was used. Production Example 7 Stable colloidal silica obtained in Production Example 3
Add 3.5 g of No. 3 silica to 96.5 g and put into a stabilizing tank .
After adjusting 0.4 g of catalyst aqueous solution to 400 g of acidic silica sol aqueous solution, about 400 g of acidic silica sol aqueous solution containing catalyst (SiO 2 6.0%,
NaCl (117 ppm) was obtained. 400 g of this catalyst-containing acidic silica sol aqueous solution was mixed with 100 g of an alkaline aqueous solution (SiO 2 5.6%,
per minute in Na 2 O 0.37%, NaCl 180ppm)
Addition was made at a rate of 20 g/min. The addition was completed in about 20 minutes, and then the mixture was stirred and cooled at 90° C. for 2 hours to obtain 500 g of a stable aqueous silica sol solution. Comparative Production Example 1 400 g of the same acidic silica sol aqueous solution used in Production Example 1 was added at a rate of 20 g/min to 100 g of a 0.31% Na 2 O alkaline aqueous solution that was sufficiently stirred while maintaining the temperature at 90°C. did. The addition was completed in about 20 minutes, and then the mixture was stirred and cooled at 90° C. for 2 hours to obtain 500 g of a stable aqueous silica sol solution. Comparative Production Example 2 500 g of a stable silica sol aqueous solution was obtained by carrying out exactly the same operation as in Production Example 1 except that the amount of catalyst aqueous solution was changed to 0.04 g. Comparative Production Example 3 400g of the catalyst-containing acidic silica sol aqueous solution used in Production Example 1 was sufficiently stirred while being kept at 90°C.
per minute in 100 g of Na 2 O 0.31% alkaline aqueous solution
Addition was made at a rate of 80 g/min. Because the addition was rapid, the temperature of the alkaline aqueous solution temporarily dropped to 80°C.
In addition, a gelled product of silicic acid was formed locally, but this did not pose a problem for stirring. After the addition was completed, the mixture was stirred at 90° C. for 2 hours and cooled to obtain a stable aqueous silica sol solution. Comparative Production Example 4 400g of the acidic silica sol aqueous solution containing catalyst used in Production Example 1 was sufficiently stirred while being kept at 40℃.
It was added to 100 g of 0.31% Na 2 O aqueous alkaline solution at a rate of 20 g/min. The addition was completed in about 20 minutes. Thereafter, the entire temperature was raised at a rate of 1° C./min. When the temperature reached 60°C, the whole gelatinized. After stirring for 2 hours, the gel was redissolved. The temperature was then raised to 90°C, stirred at 90°C for 1 hour, and cooled to obtain 500 g of stable silica sol. The above results are shown in Table-1.

【表】 実施例1〜7、比較例1〜4 製造例1〜7及び比較製造例1〜4によつて得
られたシリカゾル水溶液をSiO240%まで蒸発濃
縮した。その結果を表−2に示す。 表−2から明らかなように本発明の方法は比較
例に比べて粘度が低く、シリカ粒子径が大きくし
かも粒子径分布巾が小さいシリカゾル水溶液が得
られることがわかる。
[Table] Examples 1 to 7, Comparative Examples 1 to 4 The silica sol aqueous solutions obtained in Production Examples 1 to 7 and Comparative Production Examples 1 to 4 were evaporated and concentrated to 40% SiO 2 . The results are shown in Table-2. As is clear from Table 2, the method of the present invention yields an aqueous silica sol solution with lower viscosity, larger silica particle size, and narrower particle size distribution than the comparative example.

【表】【table】

Claims (1)

【特許請求の範囲】 1 活性な酸性シリカゾル水溶液を70℃以上のア
ルカリ水溶液に、添加速度が1分間当たり酸性シ
リカゾル水溶液中のシリカゾル(SiO2換算)と
アルカリ水溶液中のアルカリ(R2O換算、Rはア
ルカリ金属又はNH4)のモル比(SiO2/R2O)
が10以下となる様に加えて安定なシリカゾル水溶
液を得るに際して、酸性シリカゾル水溶液の添加
をアルカリ金属の可溶性塩40〜1000ppmの存在下
で行うことを特徴とするシリカゾルの製造法。 2 アルカリ金属の可溶性塩がリチウム、ナトリ
ウム、カリウム又はセシウムの塩酸、硫酸、硝
酸、炭酸、アルミン酸又はリン酸塩である特許請
求の範囲第1項記載の製造法。 3 アルカリ金属の可溶性塩が酸性シリカゾル水
溶液に加えられる特許請求の範囲第1項記載の製
造法。 4 アルカリ金属の可溶性塩がアルカリ水溶液に
加えられる特許請求の範囲第1項記載の製造法。 5 得られたシリカゾル水溶液を更に濃縮する特
許請求の範囲第1項記載の製造法。 6 濃縮方法が限外過法又は蒸発濃縮法である
特許請求の範囲第5項記載の製造法。 7 更に70℃以上で0.5〜4時間熱処理を行う特
許請求の範囲第1項記載の製造法。
[Scope of Claims] 1. An active acidic silica sol aqueous solution is added to an alkaline aqueous solution at a temperature of 70°C or higher , and the addition rate is 1 minute per minute. R is the alkali metal or NH 4 ) molar ratio (SiO 2 /R 2 O)
A method for producing a silica sol, which comprises adding an acidic silica sol aqueous solution in the presence of 40 to 1000 ppm of a soluble salt of an alkali metal, in order to obtain a stable silica sol aqueous solution such that the silica sol is 10 or less. 2. The manufacturing method according to claim 1, wherein the soluble salt of the alkali metal is hydrochloric acid, sulfuric acid, nitric acid, carbonic acid, aluminic acid, or phosphate of lithium, sodium, potassium, or cesium. 3. The manufacturing method according to claim 1, wherein a soluble salt of an alkali metal is added to the acidic silica sol aqueous solution. 4. The manufacturing method according to claim 1, wherein a soluble salt of an alkali metal is added to an aqueous alkaline solution. 5. The manufacturing method according to claim 1, wherein the obtained silica sol aqueous solution is further concentrated. 6. The manufacturing method according to claim 5, wherein the concentration method is an ultrafiltration method or an evaporative concentration method. 7. The manufacturing method according to claim 1, further comprising heat treatment at 70°C or higher for 0.5 to 4 hours.
JP20469981A 1981-12-18 1981-12-18 Manufacture of silica sol Granted JPS58110417A (en)

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JP20469981A JPS58110417A (en) 1981-12-18 1981-12-18 Manufacture of silica sol

Publications (2)

Publication Number Publication Date
JPS58110417A JPS58110417A (en) 1983-07-01
JPH0123413B2 true JPH0123413B2 (en) 1989-05-02

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Country Link
JP (1) JPS58110417A (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6345113A (en) * 1986-08-13 1988-02-26 Catalysts & Chem Ind Co Ltd Silica sol having low turbidity and low viscosity
DE10230982A1 (en) 2002-07-10 2004-01-22 H.C. Starck Gmbh Silica sol containing guanidine carbonate

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5039578B2 (en) * 1972-07-10 1975-12-18
JPS5233899A (en) * 1975-09-11 1977-03-15 Shokubai Kasei Kogyo Kk Process for production of silica sol

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