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JPH0125137B2 - - Google Patents
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JPH0125137B2 - - Google Patents

Info

Publication number
JPH0125137B2
JPH0125137B2 JP23028482A JP23028482A JPH0125137B2 JP H0125137 B2 JPH0125137 B2 JP H0125137B2 JP 23028482 A JP23028482 A JP 23028482A JP 23028482 A JP23028482 A JP 23028482A JP H0125137 B2 JPH0125137 B2 JP H0125137B2
Authority
JP
Japan
Prior art keywords
cleaning
magnetic disk
pad
disk
magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP23028482A
Other languages
Japanese (ja)
Other versions
JPS59124032A (en
Inventor
Takashi Watanabe
Kazuo Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP23028482A priority Critical patent/JPS59124032A/en
Publication of JPS59124032A publication Critical patent/JPS59124032A/en
Publication of JPH0125137B2 publication Critical patent/JPH0125137B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84Processes or apparatus specially adapted for manufacturing record carriers

Landscapes

  • Manufacturing Of Magnetic Record Carriers (AREA)

Description

【発明の詳細な説明】 (a) 発明の技術分野 本発明は、電子計算機の外部記憶装置として使
用される磁気デイスク装置の記憶媒体である磁気
デイスクを製造する工程における磁気デイスクの
洗浄・清浄方法に関する。
Detailed Description of the Invention (a) Technical Field of the Invention The present invention relates to a method for washing and cleaning a magnetic disk in the process of manufacturing a magnetic disk, which is a storage medium of a magnetic disk device used as an external storage device of a computer. Regarding.

(b) 技術の背景 磁気デイスク装置は、磁気デイスク(デイス
ク)を高速回転させながら、磁気ヘツドで情報の
読書きを行なうが、その際磁気ヘツドをデイスク
面に接触させた状態で情報の読書きを行なう方式
と、磁気ヘツドを数μ程度デイスク面から浮上さ
せて、読書きする方式がある。浮上式の場合、磁
気ヘツドが浮上した状態でデイスク面上にロード
したりアンロードしたりする方式と、デイスクの
回転開始および終了時には、磁気ヘツドがデイス
ク面と接触し、デイスクが高速回転している最中
のみデイスク面から浮上する方式とがある。
(b) Background of the technology A magnetic disk drive uses a magnetic head to read and write information while rotating a magnetic disk at high speed. There are two methods: one in which the magnetic head is read and written by raising the magnetic head several micrometers above the disk surface. In the case of a floating type, there are two methods in which the magnetic head is loaded onto and unloaded from the disk surface while it is floating, and another method in which the magnetic head comes into contact with the disk surface at the start and end of disk rotation, causing the disk to rotate at high speed. There is a method in which the disk floats up from the surface of the disk only while it is in use.

浮上式の場合でも、デイスク面と磁気ヘツドと
のギヤツプは極めて小さいため、デイスク面に異
物が有つたりすると、ヘツドクラツシユを招いた
り、異物が磁気ヘツドとデイスク面との間に挾ま
つてデイスク面を傷つける恐れがある。このよう
にして磁気塗膜に傷が発生すると、情報書込みの
際の磁化が不安定で書込みが確実に行なわれなく
なつたり、書込まれた情報が破壊されたりして、
情報の読書きのエラーを引き起す恐れがある。
Even in the case of a floating type, the gap between the disk surface and the magnetic head is extremely small, so if there is a foreign object on the disk surface, it may cause the head to crash, or the foreign object may get caught between the magnetic head and the disk surface and damage the disk surface. There is a risk of injury. If the magnetic coating is scratched in this way, the magnetization during information writing may become unstable, making it impossible to write reliably, or the written information may be destroyed.
This may lead to errors in reading and writing information.

最近は高密度記録媒体を得るべく、媒体塗膜を
薄膜化し磁気ヘツドの浮上ギヤツプも微小化する
傾向があるので、前記のようなデイスク面での傷
やスクラツチを招く恐れのある切粉やエラー原因
となる汚れなどは完全に除去する必要がある。こ
のような要求に対応できるように、デイスクは、
平面加工された面精度の高いアルミニウム円盤
に、磁性塗膜を塗布、乾燥させ、焼付を行なつて
から、塗膜の平面仕上げを行ない、洗浄乾燥させ
ることによつて磁気デイスクを完成する方法が一
般に採られている。
Recently, in order to obtain high-density recording media, there is a tendency to make the media coating thinner and the flying gap of the magnetic head smaller, so chips and errors that can cause scratches and scratches on the disk surface as described above are becoming more and more difficult. It is necessary to completely remove any dirt that may be the cause. In order to meet these demands, disks are
A method of completing a magnetic disk is to apply a magnetic coating film to a flat-finished aluminum disk with high surface precision, dry it, and bake it, then finish the coating film flat, wash it, and dry it. Generally adopted.

しかしながらアルミニウム基板の平面仕上げや
磁性塗膜の平面仕上げが良好に行なわれても、最
後の塗膜仕上げ後の洗浄・清浄工程が不完全なた
めに汚れやシミ、加工変質層などが残ると、それ
までの精密仕上げが水泡に帰してしまう。
However, even if the flat surface finishing of the aluminum substrate or the flat surface finishing of the magnetic coating film is performed well, if the washing and cleaning process after the final coating film finishing is incomplete, dirt, stains, and damaged layers remain. The precision finishing that had been done up to that point came to nothing.

(C) 従来技術とその問題点 従来の磁気デイスク製造工程における洗浄・清
浄方法としては、次のような方法が有る。
(C) Prior art and its problems The following methods are available as cleaning and cleaning methods in the conventional magnetic disk manufacturing process.

(1) 磁気デイスクを高速回転させ、温水や純水な
どの溶媒を磁気デイスク表面に噴射させなが
ら、多孔質スポンジパツドやブラシパツドなど
のパツドを回転させながら押し付け、切粉を溶
媒と共に排除し、その後磁気デイスクを高速回
転させて遠心力で水分を振り切つて乾燥させ、
または温風を吹き付けて乾燥する。
(1) While rotating the magnetic disk at high speed and spraying a solvent such as hot water or pure water onto the surface of the magnetic disk, press a pad such as a porous sponge pad or brush pad while rotating to remove chips along with the solvent, and then apply the magnetic Rotate the disk at high speed and use centrifugal force to shake off the moisture and dry it.
Or blow dry with warm air.

(2) フレオン、トリクレン、ソルベントナフサ等
の溶液ないし蒸気内で超音波をかけて洗浄する
超音波洗浄方法。
(2) An ultrasonic cleaning method in which ultrasonic waves are applied to clean in a solution or vapor of Freon, trichlene, solvent naphtha, etc.

(3) 磁気デイスク塗膜の平面加工後水洗いを行な
つてから、溶剤や綿や合成繊維に浸し、手作業
で拭いて置換乾燥する。
(3) After flattening the magnetic disk coating, wash it with water, then soak it in a solvent, cotton, or synthetic fiber, wipe it by hand, and dry it by displacement.

これらの方法のうち(1)(2)の方法は、微小な切粉
や異物はほとんど除去できるが、乾燥過程におい
て部分的に汚点や洗浄液の乾燥シミが発生する欠
点がある。また(3)の方法は、シミの発生は除去で
きる完全な水分除去および微小切粉の除去ができ
ない欠点がある。
Among these methods, methods (1) and (2) can remove most of the minute chips and foreign matter, but have the disadvantage that dirt and dry stains of the cleaning solution are generated locally during the drying process. Furthermore, the method (3) has the drawback that it cannot completely remove moisture and remove fine chips, although stains can be removed.

(d) 発明の目的 本発明の目的は、従来の磁気デイスクの洗浄・
清浄工程におけるこのような欠点を解消し、磁気
デイスクの塗膜加工仕上げ後、切粉を完全に除去
し、水分の乾燥、表面変質層の除去を効果的に行
なうことにより、磁気デイスク上のシミ、異物、
汚れを確実に除去して、磁気ヘツドの低浮上を満
足させ得る平滑な表面状態を実現することにあ
る。
(d) Purpose of the Invention The purpose of the present invention is to improve the cleaning and cleaning of conventional magnetic disks.
By eliminating these drawbacks in the cleaning process and effectively removing chips, drying moisture, and removing surface deterioration layers after finishing the magnetic disk coating, stains on the magnetic disk can be eliminated. , foreign matter,
The objective is to reliably remove dirt and achieve a smooth surface condition that satisfies the low flying height of the magnetic head.

(e) 発明の構成 この目的を達成するために本発明は、磁気デイ
スクを製造する際の洗浄・清浄工程において、 1つの室内に、洗浄水の噴射装置と、多孔質ス
ポンジパツドやブラシパツドなどの洗浄パツド
と、拭き取り装置とを有し、 拭き取り装置を磁気デイスクから退避させた状
態で、噴射装置による洗浄液の噴射と洗浄パツド
による洗浄を行なつた後、洗浄パツドを退避させ
て拭き取り装置を磁気デイスクに当接させ、溶剤
を供給しながら拭き取りを行なう工程を有する方
法を採つている。
(e) Structure of the Invention In order to achieve this object, the present invention includes a cleaning water injection device and a cleaning device for cleaning porous sponge pads, brush pads, etc. in one room during the cleaning and cleaning process when manufacturing magnetic disks. With the wiping device retracted from the magnetic disk, the spraying device sprays the cleaning liquid and the cleaning pad cleans the magnetic disk. A method is adopted that includes a step of wiping while supplying a solvent.

(f) 発明の実施例 次に本発明による磁気デイスクの製造方法が実
際上どのように具体化さるかを実施例で説明す
る。図は本発明による磁気デイスクの洗浄・清浄
方法で洗浄・清浄を行なう装置の内部構成を示す
もので、第1図は正面図、第2図は左側面図、第
3図は底面図である。1洗浄・清浄室で、洗浄水
や溶剤などが外部に飛散しないように、外壁2で
ほぼ密閉されている。3は磁気デイスクで、スピ
ンドル4のチヤツク部5に、図示されていないロ
ボツトで自動的に着脱される。スピンドル4は、
洗浄、乾燥およびクリーニングに応じて回転数が
制御される。
(f) Embodiments of the Invention Next, examples will be used to explain how the method for manufacturing a magnetic disk according to the present invention is actually implemented. The figures show the internal structure of an apparatus for cleaning and cleaning magnetic disks using the method of cleaning and cleaning magnetic disks according to the present invention. Figure 1 is a front view, Figure 2 is a left side view, and Figure 3 is a bottom view. . 1 A cleaning/cleaning room, which is almost sealed with an outer wall 2 to prevent washing water, solvents, etc. from scattering outside. Reference numeral 3 denotes a magnetic disk, which is automatically attached to and removed from the chuck portion 5 of the spindle 4 by a robot (not shown). Spindle 4 is
The rotation speed is controlled according to washing, drying and cleaning.

洗浄・清浄室1内には、この磁気デイスク3を
洗浄・清浄するために、洗浄水の噴射装置10、
多孔質スポンジパツドやブラシパツドなどのパツ
ド6および拭き取り装置7が内蔵され、しかも磁
気デイスク3の両面を同時に洗浄・清浄できるよ
うに1対ずつ対向配設されている。噴射装置10
は、磁気デイスク3の上方に、噴射口を磁気デイ
スク3に向けて配置されており、磁気デイスク3
の洗浄時およびパツド6の解除後ただちに温水を
噴射して切粉を流出させる。
In the washing/cleaning chamber 1, a washing water injection device 10 is installed in order to wash/clean the magnetic disk 3.
Pads 6 such as porous sponge pads or brush pads and a wiping device 7 are built-in, and pairs of pads 6, such as porous sponge pads or brush pads, and a wiping device 7 are arranged facing each other so that both sides of the magnetic disk 3 can be washed and cleaned at the same time. Injection device 10
is arranged above the magnetic disk 3 with the injection port facing the magnetic disk 3, and
When cleaning the pad 6 and immediately after releasing the pad 6, warm water is injected to flush out the chips.

パツド6は、アーム8を介して揺動軸9に取付
けられており、第1図に示すように洗浄時は揺動
軸9の回転により磁気デイスク3の正面に移動さ
れて洗浄を行ない、磁気デイスク3の着脱の際
は、その邪魔にならないように、鎖線で示す位置
に退避される。パツド6は、アーム9に取付けら
れた駆動モータMとベルトで連結されており、モ
ータMによつて回転される。また揺動軸9は、そ
の軸方向に直線移動することによつて、パツド6
を磁気デイスク3に押し付けたり、磁気デイスク
3から離間させる。従つて磁気デイスク3をチヤ
ツク部5に着脱する際は、揺動軸9がパツド6を
磁気デイスク3から離間させる方向に移動して、
パツド6を磁気デイスク3から浮上させ、更にア
ーム8を回転させて鎖線位置に退避させる。退避
状態で磁気デイスク3がチヤツク部5に装着され
ると、揺動軸9が回転して実線で示すように磁気
デイスク3の正面位置までパツド6を移動させ
る。そして揺動軸9が軸方向に移動して、パツド
6を磁気デイスク3に圧接させ、次いでモータM
によつてパツド6を回転駆動させる。
The pad 6 is attached to a swing shaft 9 via an arm 8, and during cleaning, as shown in FIG. When the disk 3 is attached or detached, it is evacuated to the position shown by the chain line so as not to get in the way. The pad 6 is connected by a belt to a drive motor M attached to an arm 9, and is rotated by the motor M. Further, by moving linearly in the axial direction, the swing shaft 9 moves the pad 6.
is pressed against the magnetic disk 3 or separated from the magnetic disk 3. Therefore, when attaching or detaching the magnetic disk 3 to the chuck portion 5, the swing shaft 9 moves in a direction to separate the pad 6 from the magnetic disk 3.
The pad 6 is made to float above the magnetic disk 3, and the arm 8 is further rotated to retreat to the position indicated by the chain line. When the magnetic disk 3 is attached to the chuck portion 5 in the retracted state, the swing shaft 9 rotates to move the pad 6 to a position in front of the magnetic disk 3 as shown by the solid line. Then, the swing shaft 9 moves in the axial direction to press the pad 6 against the magnetic disk 3, and then the motor M
The pad 6 is driven to rotate.

拭き取り装置7は、左右のフレーム板11,1
2間に、コツトン帯が巻かれたコツトンロール1
3やゴムロール16などが取付けられており、こ
のコツトンロール13から繰出されたコツトン帯
14がガイドロール15、ゴムロール16、ピン
チローラ17およびガイドロール18を経由して
巻取りロール19で巻取られる。巻取りロール1
9およびコツトンロール13は、図示されていな
い駆動モータで回転される。またガイドロール1
5とゴムロール16との間には、これらと平行に
パイプ20が配設され、該パイプ20に開けられ
た噴射穴から溶剤が、コツトン帯14に供給され
る。
The wiping device 7 is connected to the left and right frame plates 11 and 1.
Kotton roll 1 with a Kotton obi wrapped between 2
3 and a rubber roll 16 are attached, and the strip 14 fed out from the strip roll 13 is wound up by a take-up roll 19 via a guide roll 15, a rubber roll 16, a pinch roller 17, and a guide roll 18. . Winding roll 1
9 and the cotton roll 13 are rotated by a drive motor (not shown). Also, guide roll 1
5 and the rubber roll 16, a pipe 20 is disposed in parallel thereto, and the solvent is supplied to the cotton strip 14 through injection holes made in the pipe 20.

またこのように構成された拭き取り装置7は、
図示されていないエアシリンダなどのアクチユエ
ータで、矢印a2方向に駆動される。即ち磁気デイ
スク3をチヤツク部5に着脱する際は、磁気デイ
スク3の外側に退避され、拭き取りを行なう場合
は、鎖線で示すように磁気デイスク3の正面位置
に移動される。また磁気デイスク3の正面位置に
移動されると、自動的に拭き取り装置7が全体的
に磁気デイスク3側に移動してデイスク面に圧接
するような機構になつている。
Moreover, the wiping device 7 configured in this way is
It is driven in the two directions of arrow a by an actuator such as an air cylinder (not shown). That is, when the magnetic disk 3 is attached to and removed from the chuck portion 5, it is retracted to the outside of the magnetic disk 3, and when wiping is performed, it is moved to a position in front of the magnetic disk 3 as shown by the chain line. Further, when the wiping device 7 is moved to a position in front of the magnetic disk 3, the entire wiping device 7 automatically moves toward the magnetic disk 3 and comes into pressure contact with the disk surface.

次に洗浄・清浄動作を説明する。パツド6およ
び拭き取り装置7を退避させた状態で、チヤツク
部5に磁気デイスク3を装着する。そして磁気デ
イスク3をスピンドル駆動モータによつて、3000
〜4000rpmの高速で回転させ、噴射装置10で30
〜60℃程度の温水を噴射し、切粉を洗い流す。次
に揺動軸9でパツド6を磁気デイスク3の正面に
移動させ、モータMによつて100〜200回転させ、
温水を噴射させながら或いは噴射しないで、デイ
スク表面に付着している切粉などを剥離して除去
する。このときパツド6は、1.6〜2.5Kg/cm2程度
でデイスク面に押し付ける。またパツド6の回転
速度は高いほどよい。このように水で濡れた面を
ブラツシングするものとしては、モールドプレー
ンなどのスポンジやナイロンブラシなどのブラシ
が適しており、また表面積が大きく磁気デイスク
表面を傷つけないような軟質のものがよい。
Next, the washing/cleaning operation will be explained. With the pad 6 and the wiping device 7 retracted, the magnetic disk 3 is attached to the chuck portion 5. Then, the magnetic disk 3 is driven by a spindle drive motor for 3000
Rotate at a high speed of ~4000rpm, injector 10 for 30
Spray warm water at ~60°C to wash away the chips. Next, the pad 6 is moved to the front of the magnetic disk 3 using the swing shaft 9, and rotated 100 to 200 times by the motor M.
Chips and the like adhering to the disk surface are peeled off and removed with or without spraying hot water. At this time, the pad 6 is pressed against the disk surface at about 1.6 to 2.5 kg/cm 2 . Further, the higher the rotation speed of the pad 6, the better. A sponge such as a mold plane or a nylon brush is suitable for brushing such a wet surface, and a soft brush that has a large surface area and does not damage the surface of the magnetic disk is preferable.

パツド6による洗浄後、揺動軸9の軸方向移動
でパツド6を磁気デイスク3から離間させ、かつ
アーム8を揺動させて、パツド6を磁気デイスク
3の外へ退避させる。そして磁気デイスク3が高
速回転している状態で、再度温水を噴射し剥離し
た切粉を洗い流す。
After cleaning with the pad 6, the pad 6 is moved away from the magnetic disk 3 by the axial movement of the swing shaft 9, and the pad 6 is retracted out of the magnetic disk 3 by swinging the arm 8. Then, while the magnetic disk 3 is rotating at high speed, hot water is again injected to wash away the peeled chips.

次に温水噴射を止め、磁気デイスク3を3500〜
4200rpm程度で高速回転させて、遠心力で水分を
振り切り乾燥させる。
Next, stop the hot water injection and set the magnetic disk 3 to 3500~
Rotate at a high speed of about 4200 rpm and use centrifugal force to shake off moisture and dry.

その後回転数を1000〜1500rpm程度に下げると
共に、拭き取り装置7を図示されていないエアシ
リンダで、鎖線で示すように磁気デイスク3の正
面位置に移動させる。そして巻取りロール19、
繰出しロール13およびゴムロール16をモータ
駆動して、コツトン帯14の新しい面をゴムロー
ル位置に供給し、かつパイプ20からコツトン帯
14の全幅にわたつて溶剤を供給して浸した状態
で、ゴムロール16によつてコツトン帯14を磁
気デイスク3に押し付ける。このように溶剤で拭
き取ることによつて、微小な汚れやシミ、変質層
が除去される。このとき使用する溶剤としては、
パークロルエチレン、イソプロピルアルコール、
パークレンとイソプロピルアルコールとの混合液
などが適している。またコツトン帯14の磁気デ
イスク3への押し付け圧力は、0.6〜1.4Kg/cm2
度がよい。
Thereafter, the rotational speed is lowered to about 1000 to 1500 rpm, and the wiping device 7 is moved to a position in front of the magnetic disk 3 as shown by the chain line using an air cylinder (not shown). And the winding roll 19,
The feed roll 13 and the rubber roll 16 are driven by a motor to supply a new surface of the cotton strip 14 to the rubber roll position, and a solvent is supplied from the pipe 20 over the entire width of the cotton strip 14 to soak it in the rubber roll 16. Then, the strip 14 is pressed against the magnetic disk 3. By wiping with a solvent in this manner, minute dirt, stains, and deteriorated layers are removed. The solvent used at this time is
perchlorethylene, isopropyl alcohol,
A mixture of percrene and isopropyl alcohol is suitable. Further, the pressing pressure of the cotton band 14 against the magnetic disk 3 is preferably about 0.6 to 1.4 kg/cm 2 .

なお磁気デイスク3の径に対し拭き取り装置の
コツトン帯14の幅およびパツド6の径が小さい
場合は、拭き取り装置7およびパツド6を磁気デ
イスク面上で移動させて、磁気デイスク3の全面
を洗浄・清浄できるようにする。
If the width of the strip 14 and the diameter of the pad 6 of the wiping device are smaller than the diameter of the magnetic disk 3, move the wiping device 7 and pad 6 on the surface of the magnetic disk to clean the entire surface of the magnetic disk 3. Make it possible to clean.

溶剤によるクリーニングで洗浄・清浄は終了
し、拭き取り装置7を磁気デイスク3から実線で
示す位置に退避させて、磁気デイスク3をチヤツ
ク部5から取外す。
Cleaning and cleaning are completed by cleaning with a solvent, and the wiping device 7 is retracted from the magnetic disk 3 to the position shown by the solid line, and the magnetic disk 3 is removed from the chuck portion 5.

このような方法に基づき、磁気デイスク3の回
転数1000〜1500rpm、溶剤:パークレン、パーク
レンとイソプロピルアルコールとの混合比10:1の
液、コツトン帯14の押し付け圧力0.6〜1.4Kg/
cm2、磁気デイスク3の表面温度30〜40℃の条件で
洗浄・清浄を行なつた結果、切粉などの異物が確
実に除去できるほか、従来の方法で解決できなか
つた微小な汚れ、シミ、加工変質層などが、確実
に消失した。
Based on this method, the rotational speed of the magnetic disk 3 is 1000 to 1500 rpm, the solvent is perchloren, a liquid with a mixing ratio of perchloren and isopropyl alcohol of 10:1, and the pressing pressure of the cotton band 14 is 0.6 to 1.4 kg/
cm 2 , and the surface temperature of the magnetic disk 3 is 30 to 40 degrees Celsius.As a result, foreign matter such as chips can be reliably removed, and minute dirt and stains that could not be resolved with conventional methods can be removed. , processing-affected layers, etc., have definitely disappeared.

(g) 発明の効果 以上のように本発明によれば、1つの室内に、
洗浄水の噴射装置と、スポンジやブラシなどの洗
浄パツドと、拭き取り装置とを備え、拭き取り装
置を磁気デイスクから退避させた状態で、温水噴
射と洗浄パツドによる洗浄および振り切り乾燥を
行なつた後、拭き取り装置を磁気デイスクに当接
させ、溶剤を供給しながら拭き取りを行なう方法
を採つている。そのため、切粉などの異物の除去
と洗浄・乾燥を行なつた直後に、同じ室内で引続
いて溶剤を浸したコツトン帯で拭き取りを行なう
ことにより、微小切粉などの除去も、従来乾燥工
程などで発生した汚点や洗浄液の乾燥シミ、変質
層なども確実に除去することができる。
(g) Effects of the invention As described above, according to the present invention, in one room,
It is equipped with a cleaning water spraying device, a cleaning pad such as a sponge or brush, and a wiping device, and with the wiping device evacuated from the magnetic disk, after cleaning with hot water jetting and the cleaning pad, and shaking off to dry, A method is adopted in which a wiping device is brought into contact with the magnetic disk and the wiping is performed while supplying a solvent. Therefore, immediately after removing foreign substances such as chips, washing and drying, by wiping with a cotton cloth soaked in solvent in the same room, the removal of fine chips can also be done using the conventional drying process. It can also reliably remove dirt, dry stains from cleaning fluid, and deteriorated layers.

【図面の簡単な説明】[Brief explanation of drawings]

図面は本発明による磁気デイスクの洗浄・清浄
方法によつて洗浄・清浄を行なう装置の内部構成
を示す図で、第1図は正面図、第2図は左側面
図、第3図は底面図である。 図において、1は洗浄・清浄室、3は磁気デイ
スク、4はスピンドル、5はチヤツク部、6はパ
ツド、7は拭き取り装置、8はアーム、10は噴
射装置、14はコツトン帯、20は溶剤供給パイ
プをそれぞれ示す。
The drawings are diagrams showing the internal structure of an apparatus for cleaning and cleaning magnetic disks by the method of cleaning and cleaning magnetic disks according to the present invention, in which Figure 1 is a front view, Figure 2 is a left side view, and Figure 3 is a bottom view. It is. In the figure, 1 is a cleaning/cleaning room, 3 is a magnetic disk, 4 is a spindle, 5 is a chuck, 6 is a pad, 7 is a wiping device, 8 is an arm, 10 is an injection device, 14 is a cotton strip, and 20 is a solvent Each supply pipe is shown.

Claims (1)

【特許請求の範囲】 1 磁気デイスクを製造する際の洗浄・清浄工程
において、 1つの室内に、洗浄水の噴射装置と、多孔質ス
ポンジパツドやブラシパツドなどの洗浄パツド
と、拭き取り装置とを有し、 拭き取り装置を磁気デイスクから退避させた状
態で、噴射装置による洗浄液の噴射と洗浄パツド
による洗浄を行なつた後、洗浄パツドを退避させ
て拭き取り装置を磁気デイスクに当接させ、溶剤
を供給しながら拭き取りを行なう工程を有するこ
とを特徴とする磁気デイスクの製造方法。
[Scope of Claims] 1. In the cleaning and cleaning process when manufacturing magnetic disks, a cleaning water spraying device, a cleaning pad such as a porous sponge pad or a brush pad, and a wiping device are provided in one room, With the wiping device retracted from the magnetic disk, spray the cleaning liquid with the spray device and clean with the cleaning pad, then retract the cleaning pad and bring the wiping device into contact with the magnetic disk, while supplying the solvent. A method for manufacturing a magnetic disk, comprising the step of wiping.
JP23028482A 1982-12-29 1982-12-29 Manufacture of magnetic disk Granted JPS59124032A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23028482A JPS59124032A (en) 1982-12-29 1982-12-29 Manufacture of magnetic disk

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23028482A JPS59124032A (en) 1982-12-29 1982-12-29 Manufacture of magnetic disk

Publications (2)

Publication Number Publication Date
JPS59124032A JPS59124032A (en) 1984-07-18
JPH0125137B2 true JPH0125137B2 (en) 1989-05-16

Family

ID=16905395

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23028482A Granted JPS59124032A (en) 1982-12-29 1982-12-29 Manufacture of magnetic disk

Country Status (1)

Country Link
JP (1) JPS59124032A (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0616325B2 (en) * 1985-10-11 1994-03-02 日立電子エンジニアリング株式会社 Disk member cleaning device
JPS62112223A (en) * 1985-11-12 1987-05-23 Hitachi Electronics Eng Co Ltd Drying method for disk member
JPS62154391A (en) * 1985-12-27 1987-07-09 Hitachi Plant Eng & Constr Co Ltd Disk group cleaning equipment
JPS6386177A (en) * 1986-09-29 1988-04-16 Speedfam Co Ltd Cleaning device
JP2808542B2 (en) * 1988-12-16 1998-10-08 三菱化学株式会社 Manufacturing method of magnetic recording medium

Also Published As

Publication number Publication date
JPS59124032A (en) 1984-07-18

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