Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JPH0131283B2 - - Google Patents
[go: Go Back, main page]

JPH0131283B2 - - Google Patents

Info

Publication number
JPH0131283B2
JPH0131283B2 JP59109245A JP10924584A JPH0131283B2 JP H0131283 B2 JPH0131283 B2 JP H0131283B2 JP 59109245 A JP59109245 A JP 59109245A JP 10924584 A JP10924584 A JP 10924584A JP H0131283 B2 JPH0131283 B2 JP H0131283B2
Authority
JP
Japan
Prior art keywords
electrodes
resistor
conductor
electrode
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP59109245A
Other languages
Japanese (ja)
Other versions
JPS60251603A (en
Inventor
Takafumi Katsuno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm Co Ltd
Original Assignee
Rohm Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm Co Ltd filed Critical Rohm Co Ltd
Priority to JP59109245A priority Critical patent/JPS60251603A/en
Publication of JPS60251603A publication Critical patent/JPS60251603A/en
Publication of JPH0131283B2 publication Critical patent/JPH0131283B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Apparatuses And Processes For Manufacturing Resistors (AREA)

Description

【発明の詳細な説明】 (産業上の利用分野) この発明は小型抵抗器の製造方法に関する。[Detailed description of the invention] (Industrial application field) The present invention relates to a method of manufacturing a small resistor.

(従来の技術) 周知のようにこの種小型抵抗器は、セラミツク
等からなる大型基板の表面に縦横にブレイク溝を
設けて細断自在としておき、前記ブレイク溝によ
つて区画された小型抵抗器の1個分に相当する大
きさの領域を単位領域とし、この単位領域毎に一
対の電極、前記両電極間にまたがる抵抗体を順次
印刷焼成により厚膜状に形成し、ついで前記ブレ
イク溝を利用して縦横に細断するようにして製作
していくのを普通としている。
(Prior Art) As is well known, this type of small resistor is made by providing break grooves vertically and horizontally on the surface of a large substrate made of ceramic or the like so that the small resistor can be cut into pieces. For each unit area, a pair of electrodes and a resistor spanning between the two electrodes are sequentially formed into a thick film by printing and baking, and then the break groove is formed into a thick film. It is customary to use this material and cut it into pieces vertically and horizontally.

このような製作過程で、前記のように形成され
た抵抗体についてこれを個々にトリーミングして
所望の抵抗値とすることが要求される。この作業
は大型基板を細断したあとの個々の小型抵抗器に
ついて実施するのは極めて面倒である。そのため
細断以前の大型基板の状態で実施する必要があ
る。ところがこの作業は個々の抵抗体の抵抗値を
計測しつつ行なう必要があるので、対となつてい
る電極のうちの少くとも一方は他の抵抗体に連る
電極とは分離されていなければならない。
In this manufacturing process, the resistors formed as described above are required to be individually trimmed to a desired resistance value. This operation is extremely troublesome to perform on each small resistor after cutting a large board into pieces. Therefore, it is necessary to carry out the process on the large substrate before it is shredded. However, since this work needs to be done while measuring the resistance value of each resistor, at least one of the paired electrodes must be separated from the electrode connected to the other resistor. .

一方この種電極は銀を主体とする導電材料によ
つて構成されるが、この種導電材料に含まれてい
る銀はハンダ付けの際、そのハンダ内に溶出しや
すい傾向がある。これを防ぐためにハンダに比較
的溶融し難く、かつハンダ付けの可能な金属たと
えばニツケル、銅等をメツキすることが行なわれ
ている。又この種金属は酸化されやすく、その酸
化によつてハンダしにくくなるので、これを防ぐ
ために更に酸化防止膜たとえばスズ膜をメツキす
ることが行なわれている。
On the other hand, this type of electrode is made of a conductive material containing silver as a main component, but the silver contained in this type of conductive material tends to be easily eluted into the solder during soldering. In order to prevent this, the solder is plated with a metal that is relatively difficult to melt and that can be soldered, such as nickel or copper. Furthermore, this type of metal is easily oxidized, and the oxidation makes it difficult to solder, so in order to prevent this, an oxidation-preventing film, such as a tin film, is further plated.

この種のメツキに電解メツキ法を利用すること
が考えられるが、前記のように抵抗体に連なる電
極は少くとも一方は他の電極に対して独立してい
るので、もし電解メツキを実施しようとすれば、
他の電極とは独立している電極に個々にメツキ用
電極を接続しなければならないことになる。この
ようなことは大型基板内の単位領域の数から言つ
ても極めて面倒な作業となつてしまう。
It is conceivable to use the electrolytic plating method for this type of plating, but as mentioned above, at least one of the electrodes connected to the resistor is independent from the other electrodes, so if you want to perform electrolytic plating, if,
The plating electrodes would have to be individually connected to electrodes that are independent of the other electrodes. This becomes an extremely troublesome task considering the number of unit areas within a large substrate.

そのため従来では大型基板を細断して得た抵抗
器の複数を回転パルスに入れ、これを回転させる
ことによつて電解メツキを行なつていた。しかし
このような回転バレルを用いる電解メツキ法はメ
ツキむらが生じやすく、均一なメツキ膜が得られ
ないといつた欠点がある。
Conventionally, therefore, electrolytic plating was performed by placing a plurality of resistors obtained by cutting a large substrate into pieces into a rotating pulse and rotating the resistors. However, the electrolytic plating method using such a rotating barrel has the drawback that it tends to cause uneven plating and a uniform plating film cannot be obtained.

(発明が解決しようとする問題点) この発明は抵抗器を個々に細断する以前に電極
表面への電解メツキを容易に可能とすることを目
的とする。
(Problems to be Solved by the Invention) An object of the present invention is to easily enable electrolytic plating on the electrode surface before cutting the resistor into individual pieces.

(問題点を解決するための手段) この発明は基板の細断にさきだつて、各単位領
域内の電極のうち互いに隣り合う電極同志を接続
するように導体を形成する。この導体は導体ペー
ストの印刷焼成によつて厚膜状に形成する。この
導体を電解メツキ用の電極に接続し、電解メツキ
液に浸漬してメツキする。
(Means for Solving the Problems) In the present invention, prior to cutting a substrate into pieces, a conductor is formed so as to connect adjacent electrodes among the electrodes in each unit area. This conductor is formed into a thick film by printing and baking a conductor paste. This conductor is connected to an electrode for electrolytic plating, and plated by immersing it in an electrolytic plating solution.

(作用) 前記導体を用いて電解メツキを施すと、この導
体はもちろん抵抗体に連なる各電極の表面にメツ
キ層が形成される。回転バレル法によらないから
メツキ膜は均一となる。又各電極を電解メツキ用
の電極に個々に接続する必要は全くない。したが
つてメツキ作業は極めて容易となる。
(Function) When electroplating is performed using the conductor, a plating layer is formed not only on the conductor but also on the surface of each electrode connected to the resistor. Since the rotating barrel method is not used, the plating film is uniform. Also, there is no need to individually connect each electrode to an electrode for electrolytic plating. Therefore, plating work becomes extremely easy.

(実施例) この発明の実施例を図によつて説明する。第1
図はこの発明方法の一例によつて製作された小型
抵抗器の概略を示すものである。同図において、
1はセラミツク等の基板、2は基板1の表面に設
けられた一対の電極、3は両電極2間にまたがつ
て設けられた抵抗体、4は電極2の一部の表面に
重なるように設けられた導体、5は抵抗体3及び
電極2の一部を覆うガラス等からなる保護層であ
る。
(Example) An example of the present invention will be described with reference to the drawings. 1st
The figure schematically shows a small resistor manufactured by an example of the method of this invention. In the same figure,
1 is a substrate made of ceramic or the like, 2 is a pair of electrodes provided on the surface of the substrate 1, 3 is a resistor provided across both electrodes 2, and 4 is a resistor provided so as to partially overlap the surface of the electrode 2. The provided conductor 5 is a protective layer made of glass or the like that covers a portion of the resistor 3 and the electrode 2.

第1図に示す小型抵抗器6は次のようにして製
作する。まず第2図に示すようにセラミツク製の
大型基板11が用意される。そしてその表面を縦
方向のスクライブ溝12及び横方向のスクライブ
溝13を多数平行に設ける。縦横両スクライブ溝
によつて区画される領域を単位領域14とする。
この単位領域が小型抵抗器1個分に相当する。
The small resistor 6 shown in FIG. 1 is manufactured as follows. First, as shown in FIG. 2, a large ceramic substrate 11 is prepared. A large number of vertical scribe grooves 12 and horizontal scribe grooves 13 are provided in parallel on the surface. The area defined by the vertical and horizontal scribe grooves is defined as a unit area 14.
This unit area corresponds to one small resistor.

各単位領域14の左右両側に第3図のように互
いに向かい合う一対の電極2を形成する。これは
Agを主体とする導電ペーストたとえばAg−Pdペ
ーストを印刷し焼成することにより形成する。各
電極2は互いに独立して形成されるのが原則であ
るが、図の例のように縦方向のスクライブ溝12
をはさんでその両側に位置する電極同志は互いに
一体的に連なつていてもよい。これは次工程で形
成される抵抗体の抵抗値を個々に測定するのに何
ら支障ないからである。
A pair of electrodes 2 facing each other are formed on both left and right sides of each unit region 14 as shown in FIG. this is
It is formed by printing and firing a conductive paste mainly composed of Ag, such as an Ag-Pd paste. In principle, each electrode 2 is formed independently from each other, but as shown in the example shown in the figure, vertical scribe grooves 12
The electrodes located on both sides of the electrode may be integrally connected to each other. This is because there is no problem in individually measuring the resistance values of the resistors formed in the next step.

つぎに各単位領域14内において向かい合つて
対となつている電極2間にまたがつて抵抗体3を
形成する。これは抵抗ベーストたとえばRuO3
ーストを印刷し焼成することにより形成する。こ
のあと対となる電極を用いて抵抗体3の抵抗値を
測定しながら所望の値となるようにトリーミング
たとえばレーザトリーミングを行なう(第4図参
照。)。図中15はトリーミング跡を示す。このト
リーミングは各単位領域14内の両電極が他の単
位領域内の電極とは電気的に分離しているので、
各抵抗体の抵抗値が他の抵抗体に何ら邪魔される
ことなく測定されることにより、簡単に実行でき
る。
Next, a resistor 3 is formed across each pair of electrodes 2 in each unit region 14 . This is formed by printing and firing a resistor base, for example RuO 3 paste. Thereafter, while measuring the resistance value of the resistor 3 using a pair of electrodes, trimming, for example, laser trimming, is performed to obtain a desired value (see FIG. 4). In the figure, 15 indicates a trimming trace. This trimming is performed because both electrodes in each unit area 14 are electrically separated from electrodes in other unit areas.
This can be easily carried out because the resistance value of each resistor is measured without any interference from other resistors.

ついで各単位領域14内での電極2のうち互い
に向かい合う方向と直交する方向すなわち図の例
では縦方向に並ぶ電極2を一括接続する。この接
続は導体4により行なう。すなわち縦方向に並ぶ
電極2の表面に重ねて導体4を設ける。具体的に
は導電ペーストを印刷し焼成することにより形成
する(第5図参照。)。この場合各導体4は縦方向
に並ぶ他の導体4とは電気的に分離することが必
要であるが、横方向に並ぶ単位領域同志の互いに
電気的に一体の電極2同志については同じ導体4
で接続するようにしてもよい。
Next, among the electrodes 2 in each unit area 14, the electrodes 2 arranged in a direction perpendicular to the directions facing each other, that is, in the illustrated example, in a vertical direction, are collectively connected. This connection is made by the conductor 4. That is, the conductor 4 is provided to overlap the surfaces of the electrodes 2 arranged in the vertical direction. Specifically, it is formed by printing and baking a conductive paste (see FIG. 5). In this case, each conductor 4 needs to be electrically separated from other conductors 4 arranged in the vertical direction, but for electrodes 2 that are electrically integrated with each other in unit areas arranged in the horizontal direction, the same conductor 4 is required.
You may also connect with

このようにして導体4を形成したあと、各導体
4を電解メツキ用の電極に接続し、これを電解メ
ツキ液に浸漬してハンダ可能層、酸化防止層を形
成する。この場合大型基板毎に電解メツキしても
よいが、これを縦方向に沿うスクライブ溝12に
沿つてスクライブして帯状基板に分離し、各帯状
基板の導体4を電解メツメ用の電極に接続して電
解メツキをほどこすようにしてもよい。そしてそ
のあとスクライブ溝13を用いて細断する。
After forming the conductors 4 in this manner, each conductor 4 is connected to an electrode for electrolytic plating, and is immersed in an electrolytic plating solution to form a solderable layer and an anti-oxidation layer. In this case, each large substrate may be electrolytically plated, but it is separated into strip-shaped substrates by scribing along the vertical scribe grooves 12, and the conductor 4 of each strip-shaped substrate is connected to an electrode for electrolytic plating. Alternatively, electrolytic plating may be applied. After that, it is shredded using the scribe groove 13.

なお保護層5を設ける必要があるときは、メツ
キ処理工程以前において導体4のための導体ペー
ストを印刷したあと、抵抗体3を覆うようにガラ
スを印刷し、これを導体4とを同時に焼成するよ
うにするとよい。これはもし両者を別個に焼成し
たとすると、抵抗体3がすでにトリーミングされ
ているので抵抗値がドリフトしてしまう恐れがあ
るからである。
Note that when it is necessary to provide the protective layer 5, a conductor paste for the conductor 4 is printed before the plating process, and then glass is printed to cover the resistor 3, and this and the conductor 4 are fired at the same time. It is better to do this. This is because if the two were fired separately, the resistance value might drift since the resistor 3 has already been trimmed.

電解メツキ処理のあと各スクライブ溝を用いて
細分すれば第1図に示すような小型抵抗器が得ら
れるようになる。なお第1図に示す小型抵抗器は
基板1の端面及び裏面にまで延長して電極を形成
していない。このような形状の抵抗器は導電性の
支持板上に設置される小型抵抗器として適してい
る。この場合他の回路素子等との接続は導体4又
は電極2へのワイヤボンデイング又は半田付けに
より可能となる。
After electrolytic plating, the resistor is subdivided using each scribe groove to obtain a small resistor as shown in FIG. Note that the small resistor shown in FIG. 1 does not have electrodes extending to the end surface and back surface of the substrate 1. A resistor having such a shape is suitable as a small resistor installed on a conductive support plate. In this case, connection with other circuit elements etc. is possible by wire bonding or soldering to the conductor 4 or electrode 2.

(発明の効果) 以上詳述したようにこの発明によれば、電極表
面への電解メツキ処理が基板の細断以前に実施で
き、したがつて抵抗体のトリーミングを可能にし
てもなおメツキ処理を容易に実行することができ
るといつた効果を奏する。
(Effects of the Invention) As detailed above, according to the present invention, the electrolytic plating process on the electrode surface can be performed before the substrate is shredded. It has the advantage of being easy to implement.

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの発明方法によつて製作した小型抵
抗器の斜視図、第2図乃至第5図はこの発明の製
作工程を示す平面図である。 11……大型基板、2……電極、3……抵抗
体、4……導体、12,13……スクライブ溝、
14……単位領域。
FIG. 1 is a perspective view of a small resistor manufactured by the method of this invention, and FIGS. 2 to 5 are plan views showing the manufacturing process of this invention. 11...Large substrate, 2...Electrode, 3...Resistor, 4...Conductor, 12, 13...Scribe groove,
14...Unit area.

Claims (1)

【特許請求の範囲】[Claims] 1 縦横のスクライブ溝によつて細断自在とさ
れ、かつ前記縦横のスクライブ溝によつて単位領
域に多数区画されてある大型の基板の、前記単位
領域毎に互いに向かい合つて対となす電極を、前
記向かい合う方向と直交する方向に並ぶ他の単位
領域の電極とは互いに電気的に分離して形成する
工程、前記単位領域毎に対となす電極間に抵抗体
を形成する工程、電気的に分離して形成された電
極を電気的に接続するように導体を形成する工
程、前記導体を電解メツキ用の電極に接続して前
記電極及び導体の表面を電解メツキする工程及び
前記スクライブ溝を用いて基板を細断する工程と
からなる小型抵抗器の製造方法。
1. A large substrate which can be cut into pieces by vertical and horizontal scribe grooves and which is divided into a large number of unit areas by the vertical and horizontal scribe grooves, has a pair of electrodes facing each other in each unit area. , a step of forming electrodes electrically separated from each other from electrodes of other unit regions arranged in a direction perpendicular to the facing direction, a step of forming a resistor between a pair of electrodes for each unit region, a step of forming a resistor between electrodes of a pair in each unit region, a step of forming a conductor to electrically connect electrodes formed separately; a step of connecting the conductor to an electrode for electrolytic plating and electrolytically plating the surfaces of the electrode and the conductor; and using the scribe groove. A method of manufacturing a small resistor, which comprises the step of cutting the substrate into small pieces.
JP59109245A 1984-05-28 1984-05-28 Method of producing small-sized resistor Granted JPS60251603A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59109245A JPS60251603A (en) 1984-05-28 1984-05-28 Method of producing small-sized resistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59109245A JPS60251603A (en) 1984-05-28 1984-05-28 Method of producing small-sized resistor

Publications (2)

Publication Number Publication Date
JPS60251603A JPS60251603A (en) 1985-12-12
JPH0131283B2 true JPH0131283B2 (en) 1989-06-26

Family

ID=14505291

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59109245A Granted JPS60251603A (en) 1984-05-28 1984-05-28 Method of producing small-sized resistor

Country Status (1)

Country Link
JP (1) JPS60251603A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01216502A (en) * 1988-02-25 1989-08-30 Koa Corp Chip-shaped electronic component
JP2672568B2 (en) * 1988-04-30 1997-11-05 シャープ株式会社 Method of manufacturing magnetoresistive thin film magnetic head
JP2535441B2 (en) * 1990-08-21 1996-09-18 ローム株式会社 Manufacturing method of chip resistor

Also Published As

Publication number Publication date
JPS60251603A (en) 1985-12-12

Similar Documents

Publication Publication Date Title
US4400762A (en) Edge termination for an electrical circuit device
KR100730850B1 (en) Chip resistor and method for manufacturing same
JPH0131283B2 (en)
JP3167968B2 (en) Manufacturing method of chip resistor
JP3426988B2 (en) Multi-cavity wiring board
JP3118509B2 (en) Chip resistor
JP3838560B2 (en) Chip resistor having low resistance value and manufacturing method thereof
JP2939425B2 (en) Surface mount type resistor and its manufacturing method
JPH0513201A (en) Square chip resistor
JP3353037B2 (en) Chip resistor
JP2001118705A (en) Chip resistor
JP3462198B2 (en) Resistor and its manufacturing method
JPH0963805A (en) Square chip resistor
JP2559471B2 (en) Chip resistor manufacturing method
JP4457420B2 (en) Manufacturing method of chip resistor
JPH0778701A (en) Net work resistor and manufacture thereof
JPH11307304A (en) Chip resistor and manufacture of the same
JPH09330801A (en) Resistor and manufacturing method thereof
JP4059967B2 (en) Chip-type composite functional parts
JPH0653004A (en) Rectangular chip resistor and its manufacture
JPH11204303A (en) Resistor and manufacturing method thereof
JPS6027101A (en) Multistage chip resistor
JPH05152101A (en) Rectangular chip resistor, manufacturing method thereof, and taping component assembly thereof
JPH0677001A (en) Chip-shaped electronic component and manufacturing method thereof
JPS60154501A (en) Method of producing chiplike electronic part