JPH0133919B2 - - Google Patents
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- Publication number
- JPH0133919B2 JPH0133919B2 JP53141398A JP14139878A JPH0133919B2 JP H0133919 B2 JPH0133919 B2 JP H0133919B2 JP 53141398 A JP53141398 A JP 53141398A JP 14139878 A JP14139878 A JP 14139878A JP H0133919 B2 JPH0133919 B2 JP H0133919B2
- Authority
- JP
- Japan
- Prior art keywords
- charged particle
- gun chamber
- electron gun
- chamber
- particle gun
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
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- Particle Accelerators (AREA)
- Electron Sources, Ion Sources (AREA)
Description
【発明の詳細な説明】
本発明は電界放出現象によつて発生する荷電粒
子線、例えば電子線を100KV程度以上に加速す
る手段を備えた走査電子顕微鏡等の荷電粒子線装
置に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a charged particle beam device such as a scanning electron microscope that is equipped with means for accelerating a charged particle beam, such as an electron beam, generated by a field emission phenomenon to about 100 KV or more.
電界放出現象を利用した電子銃は他の型の電子
銃に比較して高輝度が得られるため、高い分解能
の走査像を得るための走査電子顕微鏡等に広く利
用されている。しかしながら、安定した電界放出
を維持するためには、エミツタの近傍を10-11
Torr程度の高真空度に保つ必要があるため、電
界放出によつて得られた電子線を更に高い電圧に
加速することは以下に述べる如く困難である。 Electron guns that utilize the field emission phenomenon have higher brightness than other types of electron guns, and are therefore widely used in scanning electron microscopes and the like for obtaining high-resolution scanning images. However, in order to maintain stable field emission, the vicinity of the emitter must be 10 -11
Since it is necessary to maintain a high degree of vacuum on the order of Torr, it is difficult to accelerate the electron beam obtained by field emission to a higher voltage, as described below.
第１図は熱電子放出によつて発生する電子線を
200KV程度に加速するための装置を示す概略図
である。図中フイラメント加熱陰極１、ウエーネ
ルト電極２及び第１アノード３ａが形成する電場
によつてフイラメントから第１アノード３ａを通
過する熱電子は初め−200KVの電位にあるが、
４つの多段加速電極３ａ，３ｂ，……と最終段ア
ノード電極４を通過する毎に例えば40KVづつ加
速され、接地電位に保たれた最終段アノード電極
４を通過する際には200KVに加速される。従つ
て、各アノード（加速）電極を支持する部材５
や、フイラメント１とウエーネルト電極２を取り
付ける部材６はアルミナ硝子等の絶縁物で形成す
る必要があり、又、各アノード電極を収納する加
速室内は真空にするため気密に保持されている。
更に、電子銃室の外壁７には絶縁ケーブル８の端
末部９が取り付けられており陰極１とウエーネル
ト電極２へ負の高電圧を印加すると共に、分割抵
抗器１０を介して各アノード電極３ａ，３ｂ，…
…に電圧を印加しており、これらの電極や抵抗器
の放電を防止するため外壁７と絶縁部材５との間
にはフレオンガス等の絶縁ガスが３気圧程度の圧
力で満たされる。このような構造の電子線発生装
置の真空排気を行うためにはどうしても接地電位
側から行なわなければならず、例えば走査電子顕
微鏡の鏡筒１１の上部に設けた排気管１２を介し
てスパツタ・イオン・ポンプ等に接続する必要が
ある。従つて、陰極近傍は加速管室を経て排気さ
れているために、排気速度の高い真空ポンプを用
いても陰極近傍を10-11Torr程度にまで排気する
ことは極めて困難であつた。このような事情から
電界放出現象を利用した高加速電圧の電子線発生
装置は殆んど実用化されていなかつた。 Figure 1 shows the electron beam generated by thermionic emission.
It is a schematic diagram showing a device for accelerating to about 200KV. In the figure, thermionic electrons passing from the filament to the first anode 3a are initially at a potential of -200 KV due to the electric field formed by the filament heating cathode 1, the Wehnelt electrode 2, and the first anode 3a.
Each time it passes through the four multistage accelerating electrodes 3a, 3b, . . . and the final stage anode electrode 4, it is accelerated by, for example, 40 KV, and when it passes through the final stage anode electrode 4 kept at the ground potential, it is accelerated to 200 KV. . Therefore, the member 5 supporting each anode (acceleration) electrode
The member 6 for attaching the filament 1 and the Wehnelt electrode 2 must be made of an insulating material such as alumina glass, and the acceleration chamber housing each anode electrode is kept airtight to create a vacuum.
Furthermore, a terminal portion 9 of an insulated cable 8 is attached to the outer wall 7 of the electron gun chamber, and a negative high voltage is applied to the cathode 1 and the Wehnelt electrode 2, and the terminal portion 9 of the insulated cable 8 is connected to each anode electrode 3a, via a dividing resistor 10. 3b,...
..., and in order to prevent discharge of these electrodes and resistors, an insulating gas such as Freon gas is filled between the outer wall 7 and the insulating member 5 at a pressure of about 3 atmospheres. In order to evacuate an electron beam generator with such a structure, it must be done from the ground potential side. For example, spatter ions and -Needs to be connected to a pump, etc. Therefore, since the area near the cathode is evacuated through the acceleration tube chamber, it is extremely difficult to evacuate the area near the cathode to a pressure of about 10 -11 Torr even if a vacuum pump with a high pumping speed is used. Due to these circumstances, high acceleration voltage electron beam generators that utilize field emission phenomena have hardly been put into practical use.
本発明は前述した問題に鑑み、真空ポンプによ
りエミツター近傍を10-11程度の高真空度にする
事により、電界放出現象を利用した高加速電圧の
荷電粒子線装置を実現する事を目的とするもので
ある。 In view of the above-mentioned problems, the present invention aims to realize a high acceleration voltage charged particle beam device that utilizes the field emission phenomenon by creating a high degree of vacuum near the emitter with a vacuum pump of about 10 -11 . It is something.
第２図は本発明の一実施例装置の要部を示す略
図である。 FIG. 2 is a schematic diagram showing the main parts of an apparatus according to an embodiment of the present invention.
図中１１は走査電子顕微鏡等の鏡筒を示し、該
鏡筒の上部には真空バルブ１３を介して載置され
た排気基台１４に取り付けられた電子線発生装置
が設けられている。該電子線発生装置は加速管部
１５、電子銃室１６及びスパツタ・イオン・ポン
プ１７等を収納する容器１８、装置の電源（図示
せず）及び容器と電源を接続する絶縁ケーブル８
から構成される。前記排気基台１４と容器１８は
共に接地電位に保たれているが、アルミナ碍子１
９と加速電極３ａ，３ｂ，３ｃ……によつて組み
上げられた加速管部の上部に載せられた電子銃室
１６は例えば負の加速電圧200KVが印加されて
いる。又、加速管部上部と排気基台１４との間に
設けられた分割抵抗器１０により各加速電極３
ａ，３ｂ，３ｃ……には高電圧が印加される。 In the figure, reference numeral 11 indicates a lens barrel of a scanning electron microscope or the like, and an electron beam generator is provided on the upper part of the lens barrel via a vacuum valve 13 and attached to an exhaust base 14 mounted thereon. The electron beam generator includes an acceleration tube section 15, an electron gun chamber 16, a container 18 that houses a sputter ion pump 17, etc., a power source for the device (not shown), and an insulated cable 8 that connects the container and the power source.
It consists of Both the exhaust base 14 and the container 18 are kept at ground potential, but the alumina insulator 1
For example, a negative accelerating voltage of 200 KV is applied to the electron gun chamber 16 mounted on the upper part of the accelerating tube section assembled by the accelerating electrodes 9 and accelerating electrodes 3a, 3b, 3c, . . . . In addition, each accelerating electrode 3 is
A high voltage is applied to a, 3b, 3c....
第３図は第２図の装置における電子銃室１６の
近傍の詳細を示す断面図である。電子銃室内上部
には加熱用フイラメントに支持されたエミツタ陰
極２０と制御電極２１を保持する基体２２が絶縁
材２３により（第１）陽極２４に対向するように
取り付けられており、該電子銃室内は排気管２５
により接続されるスパツタ・イオン・ポンプ１７
により10-11Torr程度の高真空度に排気される。
該電子銃室と加速管との間には絶縁バルブ機構２
６が設けられており、電子銃室内と加速管室内の
下部の基体に取り付けられた仕切弁２７の移動に
よつて連通又は遮断されるが、連通させた場合に
も陽極２４の下方にはオリフイス板２８が設けら
れているため電子銃室内と加速管室内との圧力差
を保つことができる。従つて加速管内の圧力が
10-7〜10-8Torr程度であつても電子銃室内を
10-11Torr程度に保つことが可能であり、又電子
銃室内の容積は加速管内の容積に比較して極めて
小さいため、電子銃室内を高真空度に排気する真
空ポンプも小型のものを用いることが可能とな
る。 FIG. 3 is a sectional view showing details of the vicinity of the electron gun chamber 16 in the apparatus shown in FIG. In the upper part of the electron gun chamber, a base body 22 holding an emitter cathode 20 supported by a heating filament and a control electrode 21 is attached with an insulating material 23 so as to face a (first) anode 24. is exhaust pipe 25
sputter ion pump 17 connected by
The vacuum is evacuated to a high degree of vacuum of approximately 10 -11 Torr.
An insulating valve mechanism 2 is provided between the electron gun chamber and the acceleration tube.
6 is provided in the electron gun chamber and the acceleration tube chamber, and the communication is made or shut off by moving the gate valve 27 attached to the base at the bottom of the electron gun chamber and the acceleration tube chamber. Since the plate 28 is provided, the pressure difference between the electron gun chamber and the acceleration tube chamber can be maintained. Therefore, the pressure inside the accelerator tube is
Even if the temperature is around 10 -7 to 10 -8 Torr, the inside of the electron gun chamber cannot be
It is possible to maintain the electron gun chamber at around 10 -11 Torr, and since the volume inside the electron gun chamber is extremely small compared to the volume inside the accelerator tube, a small vacuum pump is used to evacuate the electron gun chamber to a high degree of vacuum. becomes possible.
前記仕切弁２７は押圧体２９によつて左右に移
動し、図に示す如く電子銃底部に取り付けたスト
ツパ３０の位置まで左端に寄せると仕切弁２７が
電子銃室下部の電子線通過孔を塞ぐと共に、押圧
体２９により上部に押圧される。押圧体２９は弁
座３１に設けられた溝３２に沿つて左右に移動
し、その移動手段として絶縁バルブ機構２６の外
壁に取り付けられたエアシリンダー機構３３が設
けられている。即ち押圧体２９はロツド３４によ
つてピストン３５につながれており、ピストン３
５とシリンダー３６とで形成される気密室３７の
気圧とピストン３５を押圧するスプリング３８の
押圧力のバランスが崩れたときにピストン３５が
左右に移動する。前記気密室３７へは電気絶縁物
製パイプ３９を介してガス圧制御手段４０から絶
縁気体が供給されており、該ガス圧制御手段４０
から供給するガス圧を増減することによりピスト
ン３５、押圧体２９及び仕切弁２７を左右へ移動
させることができる。 The gate valve 27 is moved left and right by a pressing member 29, and when it is brought to the left end to the position of a stopper 30 attached to the bottom of the electron gun as shown in the figure, the gate valve 27 closes the electron beam passage hole at the bottom of the electron gun chamber. At the same time, it is pressed upward by the pressing body 29. The pressing body 29 moves left and right along a groove 32 provided in the valve seat 31, and an air cylinder mechanism 33 attached to the outer wall of the insulating valve mechanism 26 is provided as a means for moving the pressing body 29. That is, the pressing body 29 is connected to a piston 35 by a rod 34, and the piston 3
When the balance between the air pressure in the airtight chamber 37 formed by the piston 5 and the cylinder 36 and the pressing force of the spring 38 that presses the piston 35 is lost, the piston 35 moves left and right. Insulating gas is supplied to the airtight chamber 37 from a gas pressure control means 40 via an electrically insulating pipe 39.
By increasing or decreasing the gas pressure supplied from the piston 35, the pressing body 29, and the gate valve 27 can be moved left and right.
電子銃室１６及びスパツタ・イオン・ポンプ１
７とその電源（図示せず）との間は第２図に示す
絶縁ケーブル８の端末部９の先端部に設けられた
コネクタに取り付けられる絶縁ケーブル４１，４
２によつて接続されている。通常の稼動状態では
エミツタ陰極２０の電位が例えば−200KVであ
るとすると、制御電極２１の電位は−195KVに
保たれ、第１陽極２４、イオンポンプ１７及び絶
縁バルブ機構２６は夫々−190KVに保たれる。
又このような高電位の印加された電子銃、イオン
ポンプ及び加速管等を放電から保護するため、こ
れらを収納する容器１８の内部は気密に保たれ例
えば３気圧のフレオンガスで満たされる。 Electron gun chamber 16 and spatuta ion pump 1
7 and its power source (not shown) are insulated cables 41 and 4 attached to a connector provided at the tip of the terminal portion 9 of the insulated cable 8 shown in FIG.
2. Under normal operating conditions, if the potential of the emitter cathode 20 is, for example, -200KV, the potential of the control electrode 21 is maintained at -195KV, and the first anode 24, ion pump 17, and insulating valve mechanism 26 are each maintained at -190KV. drooping
In order to protect the electron gun, ion pump, accelerator tube, etc. to which such a high potential is applied from discharge, the interior of the container 18 housing them is kept airtight and filled with Freon gas at, for example, 3 atmospheres.
次に前述した実施例装置においてエミツタ陰極
を交換する場合の手順を説明する。 Next, the procedure for replacing the emitter cathode in the above-described embodiment apparatus will be explained.
先ず始めに、電子銃電源の出力をオフ状態にし
た後、容器１８の上蓋１８ａを開け、絶縁ケーブ
ル４１と４２を端末部９の先端に設けられたコネ
クタから外し、同様に容器の壁に取り付けられた
パイプ・コネクタ３９ａからの絶縁パイプ３９を
取り外ずす。この状態で加速管下方の真空バルブ
１３を閉状態として加速管内の真空を破り絶縁バ
ルブ機構２６を加速管から取り外ずし、予じめ準
備しておいた予備のものと交換する。 First, after turning off the output of the electron gun power supply, open the top lid 18a of the container 18, disconnect the insulated cables 41 and 42 from the connector provided at the tip of the terminal part 9, and attach them to the wall of the container in the same way. Remove the insulated pipe 39 from the pipe connector 39a. In this state, the vacuum valve 13 below the accelerating tube is closed to break the vacuum inside the accelerating tube, and the insulating valve mechanism 26 is removed from the accelerating tube and replaced with a spare one prepared in advance.
該予備の絶縁バルブ機構２６は電子銃室１６と
イオン・ポンプ１７と一体化されており、他の調
整用装置において、真空焼出しや、エミツタ陰極
先端の処理が行われて10-11Torr程度の真空状態
で仕切弁２７によつて真空シールされる。即ち、
低（一段）加速電圧での電界放出電子銃として作
動可能な状態に調整されている。 The spare insulating valve mechanism 26 is integrated with the electron gun chamber 16 and the ion pump 17, and vacuum baking and treatment of the emitter cathode tip are performed in other adjustment equipment to reduce the temperature to about 10 -11 Torr. It is vacuum-sealed by the gate valve 27 in the vacuum state of . That is,
It is adjusted to be able to operate as a field emission electron gun at low (single-stage) acceleration voltage.
前記調整済の予備の電子銃を加速管上部に取り
付けた後、絶縁ケーブル４１，４２と絶縁パイプ
３９を夫々コネクタに接続し、容器１８の蓋１８
ａを閉じて容器内に絶縁ガスを充たす。次に加速
管内を排気管１４ａに接続された真空ポンプ（図
示せず）によつて10-7〜10-8Torr程度にまで排
気し、電子銃室内をイオンポンプ１７で10-11
Torr程度に排気する。この状態でガス圧制御装
置４０を操作して第３図における押圧体２９を左
端から右端に移動させて、電子銃室と加速管室と
をオリフイス板の孔を介して連通させる。次に電
子銃電極と加速管の各電極に所定の高電圧を印加
すれば高電圧で加速された電界放出電子線を取り
出すことができる。又、この様な稼動状態におい
てイオンポンプ１７の電源出力電流を測定する等
の方法によつて電子銃室内の真空度をモニターす
ることができるが、前記ガス圧制御装置４０を制
御して電子銃室内の真空度が一定値以下にまで下
がると自動的に電子銃室内と加速管室内とを仕切
弁２７によつて遮断することが好ましい。第２図
中、４３に示す安全回路はこのための手段であ
り、電子銃室内の真空度をモニターし、該真空度
が一定値以下に達したときガス圧制御手段４０を
制御してエアシリンダー機構３３へ供給するガス
圧を減少させてピストン３５とロツド３４を介し
て押圧体２９を左方向へ移動させ、仕切弁２７に
よつて電子銃室と加速管部との遮断を行うことが
できる。 After attaching the adjusted spare electron gun to the upper part of the acceleration tube, the insulated cables 41 and 42 and the insulated pipe 39 are connected to the connectors, respectively, and the lid 18 of the container 18 is connected.
Close a and fill the container with insulating gas. Next, the inside of the acceleration tube is evacuated to about 10 -7 to 10 -8 Torr by a vacuum pump (not shown) connected to the exhaust pipe 14a, and the inside of the electron gun chamber is evacuated to about 10 -11 Torr by the ion pump 17.
Exhaust to around Torr. In this state, the gas pressure control device 40 is operated to move the pressing body 29 from the left end to the right end in FIG. 3, thereby communicating the electron gun chamber and the acceleration tube chamber through the hole in the orifice plate. Next, by applying a predetermined high voltage to each electrode of the electron gun electrode and the acceleration tube, a field emission electron beam accelerated by the high voltage can be extracted. In addition, the degree of vacuum inside the electron gun chamber can be monitored by measuring the power output current of the ion pump 17 in such an operating state, but the degree of vacuum in the electron gun chamber can be monitored by controlling the gas pressure control device 40. It is preferable that the gate valve 27 automatically shuts off the electron gun chamber and the acceleration tube chamber when the degree of vacuum in the chamber falls below a certain value. The safety circuit shown at 43 in FIG. 2 is a means for this purpose, and monitors the degree of vacuum in the electron gun chamber, and when the degree of vacuum reaches a certain value or less, controls the gas pressure control means 40 to control the air cylinder. By reducing the gas pressure supplied to the mechanism 33 and moving the pressing body 29 to the left via the piston 35 and rod 34, the gate valve 27 can shut off the electron gun chamber and the acceleration tube section. .
以上詳説した如く、本発明装置においては真空
ポンプを荷電粒子銃室と同電位に保つ事により該
荷電粒子銃室の極く近傍に専用の真空ポンプを取
付ける事が出来、その為に該ポンプにより該荷電
粒子銃室内を効率良く排気する事が出来る。その
為、該荷電粒子銃室内を10-11Torr程度の高真空
度に排気出来、その為に、電界放出現象を利用し
た高加速電圧の荷電粒子線装置を実現する事が出
来る。 As explained in detail above, in the device of the present invention, by keeping the vacuum pump at the same potential as the charged particle gun chamber, a dedicated vacuum pump can be installed very close to the charged particle gun chamber. The inside of the charged particle gun chamber can be efficiently evacuated. Therefore, the charged particle gun chamber can be evacuated to a high degree of vacuum of about 10 -11 Torr, and therefore a charged particle beam device with a high acceleration voltage that utilizes field emission phenomenon can be realized.
又、荷電粒子銃部を、該荷電粒子銃部の荷電粒
子取出し部に設けたオリフイスと仕切弁を介して
多段加速管の上部に取外し可能に取付ける様に成
したので、エミツターの交換も容易に出来る。 In addition, since the charged particle gun section is configured to be removably attached to the upper part of the multistage acceleration tube via an orifice and gate valve provided in the charged particle extraction section of the charged particle gun section, the emitter can be easily replaced. I can do it.
尚、本発明は前述した実施例装置に限定される
ものではなく、例えば第３図の実施例では電子銃
部と絶縁バルブ機構２６を一体として取り外すよ
うにしているが、絶縁バルブ機構における仕切弁
２７のみを電子銃下面に移動可能に取り付け、電
子銃とイオンポンプのみを絶縁バルブ機構から取
り外すように構成することも容易である。 It should be noted that the present invention is not limited to the apparatus of the embodiment described above. For example, in the embodiment shown in FIG. It is also easy to configure such that only the electron gun 27 is movably attached to the bottom surface of the electron gun, and only the electron gun and the ion pump are removed from the insulating valve mechanism.
第１図は従来の多段加速型電子銃の構造を示す
断面図、第２図は本発明の一実施例装置を示す略
図、第３図は第２図の要部を示す略図である。
３ａ，３ｂ……加速電極、８，４１，４２……
絶縁ケーブル、９……端末部、１０……分割抵抗
器、１１……鏡筒、１３……真空バルブ、１４…
…排気基台、１５……加速管部、１６……電子銃
室、１７……スパツタ・イオン・ポンプ、１８…
…容器、１９……絶縁物、２０……エミツタ陰
極、２１……制御電極、２４……（第１）アノー
ド電極、２６……絶縁バルブ機構、２７……仕切
弁、２９……押圧体、３９……絶縁パイプ、４０
……ガス圧制御手段、４３……安全回路。
FIG. 1 is a cross-sectional view showing the structure of a conventional multi-stage acceleration type electron gun, FIG. 2 is a schematic view showing an apparatus according to an embodiment of the present invention, and FIG. 3 is a schematic view showing the main parts of FIG. 3a, 3b... accelerating electrode, 8, 41, 42...
Insulated cable, 9... Terminal section, 10... Division resistor, 11... Lens barrel, 13... Vacuum valve, 14...
...Exhaust base, 15...Acceleration tube section, 16...Electron gun chamber, 17...Sputter ion pump, 18...
... Container, 19 ... Insulator, 20 ... Emitter cathode, 21 ... Control electrode, 24 ... (First) anode electrode, 26 ... Insulation valve mechanism, 27 ... Gate valve, 29 ... Pressing body, 39...Insulated pipe, 40
...Gas pressure control means, 43...Safety circuit.
Claims (1)
ミツター電極の先端に強電界を発生させる為の制
御電極等を配置した荷電粒子銃室、該荷電粒子銃
室に排気管を介して取り付けられた真空ポンプ、
該荷電粒子銃室の荷電粒子線取出し部に設けられ
たオリフイス、該荷電粒子銃室に一体化され、仕
切弁の移動量に応じて荷電粒子銃室内と多段加速
管内の連通か遮断を行なう絶縁バルブ機構、該絶
縁バルブ機構を介して取外し可能に取付けられた
多段加速管、及び、上記荷電粒子銃室、真空ポン
プ、絶縁バルブ機構及び多段加速管を収納し、且
つ、内部に絶縁ガスを充満させた容器から成る荷
電粒子線発生装置。1 A charged particle gun chamber in which an emitter electrode that emits a field inside the room and a control electrode for generating a strong electric field are placed at the tip of the emitter electrode, and a vacuum pump that is attached to the charged particle gun chamber via an exhaust pipe. ,
An orifice provided in the charged particle beam extraction section of the charged particle gun chamber, and an insulation integrated with the charged particle gun chamber to communicate or cut off communication between the charged particle gun chamber and the multistage accelerator tube depending on the amount of movement of the gate valve. A valve mechanism, a multi-stage accelerator tube removably attached via the insulating valve mechanism, the charged particle gun chamber, a vacuum pump, an insulating valve mechanism, and a multi-stage accelerator tube are housed therein, and the inside is filled with an insulating gas. A charged particle beam generator consisting of a container with
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14139878A JPS5568096A (en) | 1978-11-16 | 1978-11-16 | Electron beam generator |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14139878A JPS5568096A (en) | 1978-11-16 | 1978-11-16 | Electron beam generator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5568096A JPS5568096A (en) | 1980-05-22 |
| JPH0133919B2 true JPH0133919B2 (en) | 1989-07-17 |
Family
ID=15291062
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14139878A Granted JPS5568096A (en) | 1978-11-16 | 1978-11-16 | Electron beam generator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5568096A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7494386B2 (en) * | 2021-04-15 | 2024-06-03 | 株式会社日立ハイテク | Charged particle beam equipment |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4413760Y1 (en) * | 1965-10-11 | 1969-06-09 |
-
1978
- 1978-11-16 JP JP14139878A patent/JPS5568096A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5568096A (en) | 1980-05-22 |
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